JPH0561296B2 - - Google Patents
Info
- Publication number
- JPH0561296B2 JPH0561296B2 JP19822687A JP19822687A JPH0561296B2 JP H0561296 B2 JPH0561296 B2 JP H0561296B2 JP 19822687 A JP19822687 A JP 19822687A JP 19822687 A JP19822687 A JP 19822687A JP H0561296 B2 JPH0561296 B2 JP H0561296B2
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- film
- organometallic complex
- solvent
- metallized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920000642 polymer Polymers 0.000 claims description 45
- 125000002524 organometallic group Chemical group 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 description 16
- 239000002184 metal Substances 0.000 description 16
- 239000007789 gas Substances 0.000 description 11
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- -1 cyclic olefins Chemical class 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 206010040844 Skin exfoliation Diseases 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical group [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002239 polyacrylonitrile Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical group [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000002166 wet spinning Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
Description
【発明の詳細な説明】
産業上の利用分野
本発明は表面に金属層を有する重合体の製造方
法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for producing a polymer having a metal layer on its surface.
表面に金属層を有する重合体は、その導電性を
利用して、面発熱体、回路基板、コンデンサ、電
磁波遮蔽板又は電気伝導性繊維等として使用さ
れ、又その反射性能を利用して可視光又は赤外線
の反射体として使用される。 Polymers with a metal layer on the surface are used as surface heating elements, circuit boards, capacitors, electromagnetic shielding plates, electrically conductive fibers, etc. by utilizing their conductivity, and they are also used as visible light by utilizing their reflective properties. Or used as an infrared reflector.
従来の技術、発明が解決しようとする問題点
表面に金属層を有する重合体の製造方法とし
て、真空蒸着又はスパツタリング法が広く利用さ
れているが、これらの方法で得られる金属膜は基
材に対する付着度が小さくて剥離し易く、又その
ための装置は高価である。PRIOR ART AND PROBLEMS TO BE SOLVED BY THE INVENTION Vacuum deposition or sputtering methods are widely used as methods for producing polymers having a metal layer on the surface. The degree of adhesion is small and it is easy to peel off, and the equipment therefor is expensive.
有機金属錯体を含有する重合体フイルムの表面
を適当な金属化用基板に密着せしめ、これを熱処
理することによつて表面が金属化された重合体を
得る方法が提案されている(たとえば特開昭59−
207938号)。この方法によつて得られる金属層は
重合体と一体化しているため、剥離の問題を生じ
ないという利点を有する。しかしながら上記特開
昭59−207938号に記載された方法は、重合体の表
面を金属化基板に密着せしめることが必要なため
に、フイルム状もしくは板状の重合体にしか適用
できず、その他の形状、たとえば繊維状もしくは
棒状の重合体に対しては使用することができな
い。又熱処理温度が比較的高く(100〜350℃)、
更に製造設備も比較的高価である。 A method has been proposed in which the surface of a polymer film containing an organometallic complex is brought into close contact with a suitable substrate for metallization and then heat treated to obtain a polymer whose surface is metallized (for example, in JP-A No. Showa 59-
No. 207938). Since the metal layer obtained by this method is integrated with the polymer, it has the advantage that peeling problems do not occur. However, the method described in JP-A No. 59-207938 requires the surface of the polymer to be brought into close contact with the metallized substrate, so it can only be applied to film-like or plate-like polymers; It cannot be used for polymers in shapes such as fibers or rods. In addition, the heat treatment temperature is relatively high (100 to 350℃),
Furthermore, the manufacturing equipment is relatively expensive.
本発明の目的は、上述のような従来技術の問題
点を解消し、重合体と一体化していて剥離のおそ
れのない金属層を比較的容易に且つ低温度で得る
ことができ、しかも如何なる形状の重合体に対し
ても適用可能な、表面金属化重合体の製造方法を
提供することである。 An object of the present invention is to solve the problems of the prior art as described above, to obtain a metal layer that is integrated with a polymer and has no fear of peeling relatively easily and at a low temperature, and to be able to form a metal layer of any shape. It is an object of the present invention to provide a method for producing a surface-metallized polymer, which is applicable to the polymers of the present invention.
問題点を解決するための手段、作用
本発明の表面金属化重合体の製造方法は、重合
体及び有機金属錯体を溶媒に溶解し、この溶液か
ら有機金属錯体を含む重合体を所望形状に形成
し、次いでこの成形物を還元性ガスで還元するこ
とからなる。重合体を還元性ガス中に置くと重合
体に含まれる有機金属錯体が還元され、還元性ガ
スと接触している全表面にわたつて重合体と一体
化した金属層が形成される。Means and Effects for Solving the Problems The method for producing a surface metallized polymer of the present invention involves dissolving a polymer and an organometallic complex in a solvent, and forming a polymer containing the organometallic complex into a desired shape from this solution. The molded article is then reduced with a reducing gas. When the polymer is placed in a reducing gas, the organometallic complex contained in the polymer is reduced, forming a metal layer that is integrated with the polymer over the entire surface that is in contact with the reducing gas.
本発明に使用される重合体は、溶媒に可溶であ
り且つ有機金属錯体に対して親和性を有する限り
その種類を問わない。使用される重合体と例とし
て、ポリイミド、ポリアミド、ポリ(メタ)アク
リレート、ポリアクリルニトリル、ポリカーボネ
ート、ポリスチレン、ポリ塩化ビニル、ポリウレ
タン、飽和又は不飽和ポリエステル、エポキシ樹
脂等をあげることができる。 The type of polymer used in the present invention is not limited as long as it is soluble in a solvent and has an affinity for the organometallic complex. Examples of polymers used include polyimides, polyamides, poly(meth)acrylates, polyacrylonitrile, polycarbonates, polystyrene, polyvinyl chloride, polyurethanes, saturated or unsaturated polyesters, epoxy resins, etc.
本発明に使用される有機金属錯体としては、重
合体と共通の溶媒に対して可溶のものが選ばれ、
又大気又は湿気に対して安定なものが好ましい。
本発明で使用される有機金属錯体の中心金属とし
ては、周期律表B、B、B、B、B及
び族の各種金属が使用される。金、銀、銅、白
金、イリジウム、オスミウム、パラジウム、ロジ
ウム、ルテニウム、鉄、コバルト、ニツケル、マ
ンガン、レニウム、クロム、モリブデン、タング
ステン、バナジウム、チタン、ジルコニウム等を
例としてあげることができる。有機金属錯体の配
位子は、たとえば三級ホスフイ、三級ホスフアイ
ト、一酸化炭素、直鎖あるいは環状オレフイン、
共役オレフイン、アリール化合物、複素環化合
物、有機シアノ化合物、有機イソニトリル化合
物、有機メルカプト化合物またはアルキル基、ビ
ニル基、アリル基、エチリジン基、アシル基を有
する化合物等の一種以上の組合せより選ぶことが
できる。有機金属錯体は、使用する目的に応じて
任意の濃度で使用される。たとえば、重合体10部
に対して1部程度の錯体が使用される。 As the organometallic complex used in the present invention, one is selected that is soluble in the same solvent as the polymer,
Also, those that are stable against the atmosphere or moisture are preferred.
As the central metal of the organometallic complex used in the present invention, various metals of groups B, B, B, B, B and groups of the periodic table are used. Examples include gold, silver, copper, platinum, iridium, osmium, palladium, rhodium, ruthenium, iron, cobalt, nickel, manganese, rhenium, chromium, molybdenum, tungsten, vanadium, titanium, and zirconium. Ligands of organometallic complexes include, for example, tertiary phosphites, tertiary phosphites, carbon monoxide, linear or cyclic olefins,
Can be selected from combinations of one or more of conjugated olefins, aryl compounds, heterocyclic compounds, organic cyano compounds, organic isonitrile compounds, organic mercapto compounds, or compounds having an alkyl group, a vinyl group, an allyl group, an ethyridine group, an acyl group, etc. . The organometallic complex is used at any concentration depending on the purpose of use. For example, about 1 part of the complex is used per 10 parts of the polymer.
本発明において使用する溶媒は、重合体及び有
機金属錯体の両方に対する溶媒である。たとえ
ば、クロロホルム、塩化メチレン、トリクロロエ
チレン、テトラクロロエチレン、ベンゼン、トル
エン、キシレン、アセトン、酢酸エチル、ジメチ
ルホルムアミド、ジメチルスルホキシド、ジメチ
ルアセトアミド、N−メチルピロリドン等の単独
又は混合溶媒が用いられる。重合体に対する溶媒
の使用量は、有機金属錯体を混合するのに適当な
粘性、流動性を有するように、且つ重合体をフイ
ルム、繊維等に成形するのに適当なように選ばれ
る。 The solvent used in this invention is a solvent for both the polymer and the organometallic complex. For example, single or mixed solvents such as chloroform, methylene chloride, trichloroethylene, tetrachloroethylene, benzene, toluene, xylene, acetone, ethyl acetate, dimethylformamide, dimethyl sulfoxide, dimethylacetamide, N-methylpyrrolidone, etc. are used. The amount of solvent used for the polymer is selected so that the polymer has a viscosity and fluidity suitable for mixing the organometallic complex and is suitable for forming the polymer into a film, fiber, etc.
重合体、有機金属錯体及び溶媒からなる溶液か
ら、有機金属を含む重合体を任意の形状に成形す
る。たとえば、溶液を加温されたガラス上にキヤ
ストすることによつてフイルム状又は板状の成形
物が得られ、又繊維状重合体はたとえば湿式紡糸
によつて得られる。 A polymer containing an organometallic material is formed into an arbitrary shape from a solution consisting of a polymer, an organometallic complex, and a solvent. For example, film-like or plate-like moldings can be obtained by casting the solution onto heated glass, and fibrous polymers can be obtained, for example, by wet spinning.
本発明において還元性ガスとしては、たとえば
H2、CO、HI、H2S等が使用できる。 In the present invention, the reducing gas includes, for example,
H 2 , CO, HI, H 2 S, etc. can be used.
有機金属錯体を含む重合体成形物を、かかる還
元性ガス雰囲気中に適宜時間置くことによつて金
属化する。還元性ガスの温度は20〜90℃、圧力は
1〜2Kg/cm2が好ましく、そして反応時間は数十
秒乃至十数分程度が適当である。反応前に重合体
を予備加熱しても良い。重合体中の溶媒は還元前
に除去してもよいが、通常は、少なくとも一部が
残つた状態で還元するのが好ましく、例えばキヤ
ストによるフイルム形成後溶媒が重合体中に残留
したままで、直ちに還元を行うことができる。 A polymer molded article containing an organometallic complex is metallized by placing it in such a reducing gas atmosphere for an appropriate period of time. The temperature of the reducing gas is preferably 20 to 90°C, the pressure is preferably 1 to 2 kg/cm 2 , and the reaction time is suitably about several tens of seconds to more than ten minutes. The polymer may be preheated before the reaction. Although the solvent in the polymer may be removed before reduction, it is usually preferable to reduce the solvent with at least a portion remaining. For example, after forming a film by casting, the solvent may remain in the polymer. Refunds can be made immediately.
還元は気流中で行つてもよく、或いは密閉型の
容器中で行つてもよい。 The reduction may be carried out in a stream of air or in a closed container.
本発明の方法において、使用する重合体及び有
機金属錯体の種類を適宜選択することにより、又
還元性ガスの条件等の操作条件を変更することに
より、得られる金属化重合体の電気伝導度、表面
反射等を目的に応じて調節することができる。 In the method of the present invention, by appropriately selecting the type of polymer and organometallic complex used, and by changing operating conditions such as reducing gas conditions, the electrical conductivity of the metallized polymer obtained Surface reflection etc. can be adjusted depending on the purpose.
発明の効果
本発明は、非常に簡単で短時間且つ安価な方法
によつて表面金属化重合体を得ることを可能にす
る。金属層は重合体と一体化されているので、蒸
着、スパツタリングによる金属層のように剥離す
るおそれはない。重合体表面の金属化をガス中で
行うために、処理される重合体の形状に制限がな
く、目的に応じて任意形状の表面金属重合体を得
ることができる。又表面金属化重合体の電気伝導
度、表面反射能等の性能を目的に応じて調節する
ことも容易である。更に比較的低温度(10〜90
℃)における処理で金属化できるので、重合体の
本来の物性に悪影響を及ぼすおそれも少ない。Effects of the Invention The present invention makes it possible to obtain surface-metallized polymers by a very simple, quick and inexpensive method. Since the metal layer is integrated with the polymer, there is no risk of peeling off unlike metal layers formed by vapor deposition or sputtering. Since the polymer surface is metallized in a gas, there are no restrictions on the shape of the treated polymer, and a surface metal polymer with any shape can be obtained depending on the purpose. It is also easy to adjust the electrical conductivity, surface reflectance, and other properties of the surface metallized polymer depending on the purpose. Furthermore, relatively low temperatures (10 to 90
Since metallization can be achieved by treatment at temperatures (°C), there is little risk of adversely affecting the original physical properties of the polymer.
又ガス中で還元を行うので有機金属を含む重合
体溶液をフイルムにキヤストした後、又は糸状に
紡糸した後、該フイルム又は糸が残存溶媒を含ん
だままでも直ちに還元でき、かつ溶媒の除去を同
時に行うことができる。 In addition, since the reduction is carried out in a gas, after a polymer solution containing an organic metal is cast into a film or spun into a thread, it can be immediately reduced even if the film or thread still contains residual solvent, and the solvent can be removed easily. Can be done at the same time.
本発明の方法を利用すれば、例えば、本発明の
溶液を天然・合成繊維、ガラス繊維等の繊維表面
に浸漬又は塗布により付着させた後、還元性ガス
雰囲気中におくことによつて表面金属化繊維を得
ることができ、また、プラスチツク等に吹き付け
等で塗布して後還元性ガス雰囲気中におくことに
よつて表面金属化プラスチツクを得ることができ
る。このようにして得られるプラスチツクの金属
化表面は、メツキ下地としても利用できる。本発
明の方法の利用分野としては、その他に、軽量導
電材料として送電線、通信線電池の電極、通信用
導波管、変圧器用コア材料等に、或いは機能性材
料としてセンサー、メモリー用ハードデイスク、
コンパクトデイスク、触媒、透明導電膜等への利
用が考えられる。 If the method of the present invention is used, for example, the solution of the present invention may be applied to the surface of fibers such as natural/synthetic fibers, glass fibers, etc. by dipping or coating, and then placed in a reducing gas atmosphere to remove the surface metal. Furthermore, surface metallized plastics can be obtained by coating plastics etc. by spraying or the like and then placing them in a reducing gas atmosphere. The metallized plastic surface thus obtained can also be used as a plating base. In addition, the method of the present invention can be used as a lightweight conductive material for power transmission lines, communication line battery electrodes, communication waveguides, transformer core materials, etc., or as a functional material for sensors, memory hard disks, etc.
Possible uses include compact disks, catalysts, and transparent conductive films.
実施例 1
DMF50mlにポリアクリロニトリル(東邦レー
ヨン製)10gを溶解した後、ベンゾニトリル−Pd
錯体5gを添加し、混合溶解する。得られた混合
溶液をガラス板上にキヤストして100mm×100mm×
50μのフイルムを得た。このものを水素ガス(30
℃、1気圧)で置換された容積5の密閉容器中
に10分間置いた後容器中の水素を0.1気圧に減圧
置換して、再び同一条件(30℃、1気圧)に10分
間置いた所、フイルム表面にPd金属が析出した
金属光沢をもつフイルムが得られた。更に0.1気
圧、60℃で10分間置いてフイルム中の残留DMF
を除去した。このものの表面抵抗は300Ω/□で
あつた。Example 1 After dissolving 10 g of polyacrylonitrile (manufactured by Toho Rayon) in 50 ml of DMF, benzonitrile-Pd
Add 5g of complex and mix and dissolve. The obtained mixed solution was cast on a glass plate of 100 mm x 100 mm x
A 50μ film was obtained. Add this to hydrogen gas (30
After being placed in a closed container with a volume of 5 for 10 minutes, the hydrogen in the container was replaced with a reduced pressure of 0.1 atm, and then placed again under the same conditions (30°C, 1 atm) for 10 minutes. A film with metallic luster was obtained with Pd metal precipitated on the film surface. Further, leave the film at 0.1 atm and 60℃ for 10 minutes to remove residual DMF in the film.
was removed. The surface resistance of this material was 300Ω/□.
実施例 2
実施例1と同様にして、100mm×100mm×50μの
フイルムを得た。キヤスト後直ちに水素ガス(30
℃、1気圧)で置換された容積5の容器中で、
気流0.1/minで60分置いた所フイルム表面に
Pd金属が析出した金属光沢をもつフイルムが得
られた。更に60℃で10分間置いてフイルム中の残
留DMFを除去した。このものの表面抵抗は
100Ω/□であつた。Example 2 A film measuring 100 mm x 100 mm x 50 μm was obtained in the same manner as in Example 1. Hydrogen gas (30
in a container of volume 5 with an atmosphere of 1 atm)
After leaving it for 60 minutes with an air flow of 0.1/min, the film surface
A film with metallic luster was obtained in which Pd metal was precipitated. The film was further left at 60°C for 10 minutes to remove residual DMF in the film. The surface resistance of this material is
It was 100Ω/□.
Claims (1)
の溶液から有機金属錯体を含む重合体を所望形状
に成形し、次いでこの成形物を還元性ガスで還元
することからなる表面金属化重合体の製造方法。1. A process for producing surface metallized polymers, which consists of dissolving a polymer and an organometallic complex in a solvent, molding a polymer containing the organometallic complex into a desired shape from this solution, and then reducing this molded product with a reducing gas. Production method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19822687A JPS6443541A (en) | 1987-08-10 | 1987-08-10 | Production of surface-metallized polymer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19822687A JPS6443541A (en) | 1987-08-10 | 1987-08-10 | Production of surface-metallized polymer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6443541A JPS6443541A (en) | 1989-02-15 |
JPH0561296B2 true JPH0561296B2 (en) | 1993-09-06 |
Family
ID=16387602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19822687A Granted JPS6443541A (en) | 1987-08-10 | 1987-08-10 | Production of surface-metallized polymer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6443541A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180076752A (en) * | 2016-12-28 | 2018-07-06 | (주)넥스디스플레이 | Apparatus for polishing surface of a curved cover glass |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3022613B2 (en) * | 1991-02-27 | 2000-03-21 | 株式会社カイジョー | Wire bonding equipment |
JP2588068B2 (en) * | 1991-02-27 | 1997-03-05 | 株式会社カイジョー | Wire bonding apparatus and method |
KR20030001425A (en) | 2001-02-16 | 2003-01-06 | 스미토모덴키고교가부시키가이샤 | Hydrogen-Permeable Structure and Method for Manufacture thereof or Repair thereof |
-
1987
- 1987-08-10 JP JP19822687A patent/JPS6443541A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180076752A (en) * | 2016-12-28 | 2018-07-06 | (주)넥스디스플레이 | Apparatus for polishing surface of a curved cover glass |
Also Published As
Publication number | Publication date |
---|---|
JPS6443541A (en) | 1989-02-15 |
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