JPH0561069A - Matrix type liquid crystal display device - Google Patents

Matrix type liquid crystal display device

Info

Publication number
JPH0561069A
JPH0561069A JP22377891A JP22377891A JPH0561069A JP H0561069 A JPH0561069 A JP H0561069A JP 22377891 A JP22377891 A JP 22377891A JP 22377891 A JP22377891 A JP 22377891A JP H0561069 A JPH0561069 A JP H0561069A
Authority
JP
Japan
Prior art keywords
wiring
source
gate
gate wiring
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22377891A
Other languages
Japanese (ja)
Inventor
Yoshihiko Toyoda
吉彦 豊田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP22377891A priority Critical patent/JPH0561069A/en
Publication of JPH0561069A publication Critical patent/JPH0561069A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To reduce the capacity of a crossing part and to prevent the reduction of a speed at the rise time of a source signal, or a gate signal by making a wiring width in the crossing part of a gate wiring and a source wiring narrower than parts except the crossing part. CONSTITUTION:As to the matrix type liquid crystal display device provided with plural transistors, the source wiring 5 and the gate wiring 3, the width of the gate wiring 3 in the crossing part of the gate wiring 3 and the source wiring 5 is made narrower than the other parts, that means, it is made 1/N (N>1), and the length of it is made Lg times of the length of one pitch of the gate wiring 3. And also, the width of the source wiring 5 is made narrower than the other parts, that means, it is made 1/M (M>1), the length of it is made Ls times of the length of one pitch of the source wiring 5. Thus, the capacity of the crossing part becomes 1/NM. Meanwhile, the rate of increasing the resistance of the gate wiring 3 and the source wiring 5 becomes Lg(N-1) and Ls(M-1) respectively, so that the increase of the wiring resistance can be almost disregarded in comparison with the capacity of the crossing part.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明はマトリクス形液晶表示
装置、特にその配線形状に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a matrix type liquid crystal display device, and more particularly to its wiring shape.

【0002】[0002]

【従来の技術】図2は例えば特開平2−44318号公
報、特開平1−281434号公報に示された従来のマ
トリクス形液晶表示装置の平面図である。図において、
1は透明絶縁基板、2は画素電極であり、一般にITO
が使われている。3はゲート配線、4は半導体層であ
り、その下にはゲート絶縁膜が形成されている。5はソ
ース配線、6はドレイン電極であり、符号2〜6で示し
た部分は透明絶縁基板1上に形成されている。
2. Description of the Related Art FIG. 2 is a plan view of a conventional matrix type liquid crystal display device disclosed in, for example, Japanese Patent Laid-Open Nos. 2-44318 and 1-281434. In the figure,
1 is a transparent insulating substrate, 2 is a pixel electrode, generally ITO
Is used. Reference numeral 3 is a gate wiring, 4 is a semiconductor layer, and a gate insulating film is formed thereunder. Reference numeral 5 is a source wiring and 6 is a drain electrode. The portions indicated by reference numerals 2 to 6 are formed on the transparent insulating substrate 1.

【0003】次に、動作について説明する。ゲート配線
3にゲート信号電圧が印加されると、半導体層4にキャ
リアが誘起され、薄膜トランジスタはオン状態となる。
ゲート配線3に電圧が印加されていないときはオフ状態
となる。オン状態では、ソース信号電圧はそのままドレ
イン電極6に印加される。実際には、このような構成の
トランジスタがゲート配線3及びソース配線5の方向に
マトリクス状に配列されている。従って、個々のトラン
ジスタに印加されるゲート電圧やソース電圧はそれぞれ
の配線の抵抗及び配線容量で決まる時定数で立ち上がる
ことになる。
Next, the operation will be described. When a gate signal voltage is applied to the gate wiring 3, carriers are induced in the semiconductor layer 4 and the thin film transistor is turned on.
When no voltage is applied to the gate wiring 3, the gate wiring 3 is turned off. In the ON state, the source signal voltage is directly applied to the drain electrode 6. Actually, the transistors having such a configuration are arranged in a matrix in the direction of the gate wiring 3 and the source wiring 5. Therefore, the gate voltage and the source voltage applied to each transistor rise with a time constant determined by the resistance and wiring capacitance of each wiring.

【0004】[0004]

【発明が解決しようとする課題】従来の逆スタガ型薄膜
トランジスタを有する液晶表示装置は以上のように構成
されており、ソース配線5とゲート配線3間の容量につ
いてはなんら考慮されていなかった。このため、この容
量とソース配線5の抵抗及びゲート配線3の抵抗とによ
り、ソース信号あるいはゲート信号の立上り速度の低下
を招くという課題があり、この容量としてはソース配線
5とゲート配線3の交差部における容量即ち交差部容量
があった。
The conventional liquid crystal display device having the inverted stagger type thin film transistor is constructed as described above, and the capacitance between the source wiring 5 and the gate wiring 3 is not considered at all. Therefore, there is a problem in that the rising speed of the source signal or the gate signal is reduced due to this capacitance and the resistance of the source wiring 5 and the resistance of the gate wiring 3, and this capacitance has a problem. There was a capacity in the part, that is, a cross capacity.

【0005】この発明は上記のような課題を解決するた
めに成されたものであり、ソース配線とゲート配線の交
差部容量を低減し、ソース信号あるいはゲート信号の立
上り速度の低下を防止することができるマトリクス形液
晶表示装置を得ることを目的とする。
The present invention has been made in order to solve the above problems, and reduces the capacitance at the intersection of the source wiring and the gate wiring to prevent the rise rate of the source signal or the gate signal from decreasing. It is an object of the present invention to obtain a matrix type liquid crystal display device which can be manufactured.

【0006】[0006]

【課題を解決するための手段】この発明に係るマトリク
ス形液晶表示装置は、ゲート配線とソース配線の交差部
におけるゲート配線とソース配線の少なくとも一方の幅
を交差部以外の部分より細くしたものである。
In the matrix type liquid crystal display device according to the present invention, the width of at least one of the gate wiring and the source wiring at the intersection of the gate wiring and the source wiring is made narrower than the portion other than the intersection. is there.

【0007】[0007]

【作用】この発明においては、ゲート配線とソース配線
の交差部におけるゲート配線とソース配線の少なくとも
一方の幅が交差部以外の部分より細いので、交差部容量
が大幅に低減され、一方配線抵抗の増加分は僅かであ
り、ゲート信号及びソース信号の立上り速度は低下しな
い。
According to the present invention, since the width of at least one of the gate wiring and the source wiring at the intersection of the gate wiring and the source wiring is narrower than the portion other than the intersection, the capacitance at the intersection is significantly reduced and the wiring resistance of one wiring is reduced. The amount of increase is small, and the rising speeds of the gate signal and the source signal do not decrease.

【0008】[0008]

【実施例】以下、この発明の実施例を図面とともに説明
する。図1はこの実施例によるマトリクス形液晶表示装
置の構成を示し、符号1〜6で示した部分は従来と同様
である。7はゲート配線3とソース配線5の交差部にお
いてゲート配線3の幅を他の部分より細く即ち1/N
(N>1)にした部分であり、その長さはゲート配線3
の1ピッチの長さのLg 倍である。又、8は同じくゲー
ト配線3とソース配線5の交差部においてソース配線5
の幅を他の部分より細く即ち1/M(M>1)にした部
分であり、その長さはソース配線5の1ピッチの長さの
s 倍である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows the structure of a matrix type liquid crystal display device according to this embodiment, and the portions indicated by reference numerals 1 to 6 are the same as those in the prior art. Reference numeral 7 indicates that the width of the gate wiring 3 at the intersection of the gate wiring 3 and the source wiring 5 is smaller than that of the other portions, that is, 1 / N
(N> 1), and its length is the gate wiring 3
It is L g times the length of 1 pitch. Similarly, 8 is the source wiring 5 at the intersection of the gate wiring 3 and the source wiring 5.
Is smaller than the other portions, that is, 1 / M (M> 1), and its length is L s times the length of one pitch of the source wiring 5.

【0009】上記構成において、ゲート配線3とソース
配線5の交差部ではそれぞれの配線幅を他の部分の1/
N及び1/Mにしたので、交差部容量は従来に比べて1
/NMとなり、大幅に低減することができる。一方、ゲ
ート配線3及びソース配線5の1ピッチの長さに対する
細くした部分7,8の長さの比はそれぞれLg ,Ls
あり、ゲート配線3及びソース配線5の抵抗の増加の割
合はそれぞれLg (N−1),Ls (M−1)となる。
g ,Ls は通常1/10程度と小さな値であるため、
配線抵抗の増加は交差部容量に比べてほとんど無視でき
る。この結果、ゲート信号、ソース信号の立上り速度の
低下を防ぐことができる。
In the above structure, at the intersection of the gate wiring 3 and the source wiring 5, the wiring width of each is 1 / th of that of the other portion.
Since it is set to N and 1 / M, the capacitance at the intersection is 1 compared to the conventional one.
/ NM, which can be significantly reduced. On the other hand, the ratio of the lengths of the thinned portions 7 and 8 to the length of one pitch of the gate wiring 3 and the source wiring 5 is L g and L s , respectively, and the rate of increase in resistance of the gate wiring 3 and the source wiring 5 Are L g (N-1) and L s (M-1), respectively.
Since L g and L s are usually small values of about 1/10,
The increase in wiring resistance is almost negligible compared to the capacitance at the intersection. As a result, it is possible to prevent the rising speeds of the gate signal and the source signal from decreasing.

【0010】なお、上記実施例ではゲート配線3及びソ
ース配線5に共に細い部分7,8を設けたが、どちらか
一方に設けても同様の作用効果を得ることができる。
Although the thin portions 7 and 8 are provided on both the gate wiring 3 and the source wiring 5 in the above embodiment, the same operation and effect can be obtained even if they are provided on either one.

【0011】[0011]

【発明の効果】以上のようにこの発明によれば、交差部
容量を大幅に低減することができ、配線抵抗の増加は交
差部容量の低減に比べてほとんど無視することができる
ので、ゲート信号あるいはソース信号の立上り速度の低
下を防ぐことができる。
As described above, according to the present invention, the capacitance at the intersection can be significantly reduced, and the increase in wiring resistance can be almost ignored as compared with the reduction in the capacitance at the intersection. Alternatively, it is possible to prevent the rise rate of the source signal from decreasing.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明によるマトリクス形液晶表示装置の平
面図である。
FIG. 1 is a plan view of a matrix type liquid crystal display device according to the present invention.

【図2】従来のマトリクス形液晶表示装置の平面図であ
る。
FIG. 2 is a plan view of a conventional matrix type liquid crystal display device.

【符号の説明】[Explanation of symbols]

1 透明絶縁基板 3 ゲート配線 4 半導体層 5 ソース配線 6 ドレイン電極 7 ゲート配線の配線幅の細い部分 8 ソース配線の配線幅の細い部分 1 Transparent Insulating Substrate 3 Gate Wiring 4 Semiconductor Layer 5 Source Wiring 6 Drain Electrode 7 Gate Wiring Narrow Width 8 Source Wiring Narrow Width

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 複数のトランジスタとソース配線とゲー
ト配線を有するマトリクス形液晶表示装置において、ゲ
ート配線とソース配線の交差部におけるゲート配線とソ
ース配線の少なくとも一方の幅を交差部以外の部分より
細くしたことを特徴とするマトリクス形液晶表示装置。
1. In a matrix type liquid crystal display device having a plurality of transistors, a source wiring and a gate wiring, the width of at least one of the gate wiring and the source wiring at the intersection of the gate wiring and the source wiring is made narrower than the portion other than the intersection. A matrix type liquid crystal display device characterized by the above.
JP22377891A 1991-09-04 1991-09-04 Matrix type liquid crystal display device Pending JPH0561069A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22377891A JPH0561069A (en) 1991-09-04 1991-09-04 Matrix type liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22377891A JPH0561069A (en) 1991-09-04 1991-09-04 Matrix type liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH0561069A true JPH0561069A (en) 1993-03-12

Family

ID=16803567

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22377891A Pending JPH0561069A (en) 1991-09-04 1991-09-04 Matrix type liquid crystal display device

Country Status (1)

Country Link
JP (1) JPH0561069A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002311455A (en) * 2001-04-17 2002-10-23 Nec Corp Active matrix liquid crystal display and its manufacturing method
US7122835B1 (en) * 1999-04-07 2006-10-17 Semiconductor Energy Laboratory Co., Ltd. Electrooptical device and a method of manufacturing the same
US7199033B2 (en) 2003-05-28 2007-04-03 Seiko Epson Corporation Pattern forming method, device, method of manufacture thereof, electro-optical apparatus, and electronic apparatus
JP2008015488A (en) * 2006-06-30 2008-01-24 Samsung Electronics Co Ltd Display substrate and display panel having same
US7436464B2 (en) 2004-09-01 2008-10-14 Sharp Kabushiki Kaisha Active-matrix substrate and display device including the substrate wherein a bottom-gate TFT has data lines formed below the gate lines
US7864281B2 (en) 2004-08-24 2011-01-04 Sharp Kabushiki Kaisha Active matrix substrate and display unit provided with it
US9768280B2 (en) 2008-12-25 2017-09-19 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP2018109771A (en) * 2012-01-20 2018-07-12 株式会社半導体エネルギー研究所 Light emission device

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7122835B1 (en) * 1999-04-07 2006-10-17 Semiconductor Energy Laboratory Co., Ltd. Electrooptical device and a method of manufacturing the same
US7575961B2 (en) 1999-04-07 2009-08-18 Semiconductor Energy Laboratory Co., Ltd. Electrooptical device and a method of manufacturing the same
JP4718712B2 (en) * 2001-04-17 2011-07-06 Nec液晶テクノロジー株式会社 Active matrix liquid crystal display device
JP2002311455A (en) * 2001-04-17 2002-10-23 Nec Corp Active matrix liquid crystal display and its manufacturing method
US7199033B2 (en) 2003-05-28 2007-04-03 Seiko Epson Corporation Pattern forming method, device, method of manufacture thereof, electro-optical apparatus, and electronic apparatus
US7365008B2 (en) 2003-05-28 2008-04-29 Seiko Epson Corporation Pattern forming method, device, method of manufacture thereof, electro-optical apparatus, and electronic apparatus
US7864281B2 (en) 2004-08-24 2011-01-04 Sharp Kabushiki Kaisha Active matrix substrate and display unit provided with it
US7436464B2 (en) 2004-09-01 2008-10-14 Sharp Kabushiki Kaisha Active-matrix substrate and display device including the substrate wherein a bottom-gate TFT has data lines formed below the gate lines
JP2008015488A (en) * 2006-06-30 2008-01-24 Samsung Electronics Co Ltd Display substrate and display panel having same
KR101293950B1 (en) * 2006-06-30 2013-08-07 삼성디스플레이 주식회사 Display substrate and display panel having the same
US9768280B2 (en) 2008-12-25 2017-09-19 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US10483290B2 (en) 2008-12-25 2019-11-19 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US10720451B2 (en) 2008-12-25 2020-07-21 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US11158654B2 (en) 2008-12-25 2021-10-26 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP2018109771A (en) * 2012-01-20 2018-07-12 株式会社半導体エネルギー研究所 Light emission device

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