JPH0560068A - Vacuum device and method for preventing refuse from sticking - Google Patents

Abstract

PURPOSE:To prevent such a phenomenon of refuse floatng and sticking on a material to be processed when air in the chamber of a vacuum device is discharged or supplied, in relation to a method for preventing the refuses from sticking on the material being processed in the vacuum device and the chamber. CONSTITUTION:A vacuum device is provided with a vacuum piping 2 for discharging air staying in a chamber 1 for processing a material 6 to be processed a vacuum valve 2a provided between the vacuum piping 2 and the chamber 1, a vent piping 3 for supplying air into the chamber 1, and a valve 3a provided between the vent piping 3 and the chamber 1. Also, the vacuum device is provided with a needle valve 3b provided in parallel to the valve 3a, a bypass piping 4 provided between the vacuum piping 2 and the vent piping 3, a valve 4a and a needle valve 4b which are provided between the bypass piping 4 and the vacuum piping 2 or the vent piping 3, and a controller 5 for controlling opening/closing of these valves 2a, 3a, 4a, and the needle valves 3b, 4b.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum device and a method for preventing dust from adhering to an object to be processed in a chamber.

In recent vacuum devices used for manufacturing semiconductor devices, it is required to reduce the adhesion of dust to the object to be processed, but the inside of the chamber is changed from vacuum to atmospheric pressure and from atmospheric pressure to vacuum. As the room pressure changes rapidly,
The dust in the chamber of the vacuum device floats and adheres to the object to be processed.

Under the circumstances described above, there is a demand for a vacuum device and a dust adhesion preventing method capable of preventing dust from adhering to an object to be processed due to a rapid change in pressure in the chamber of the vacuum device. ..

[0004]

2. Description of the Related Art A conventional vacuum device and a dust adhesion preventing method will be described in detail with reference to FIGS.

FIG. 3 is a diagram showing a schematic structure of a conventional vacuum device, and FIG. 4 is a diagram showing changes in the pressure fluctuation rate in the conventional vacuum device. As shown in FIG. 3, the conventional vacuum apparatus has a chamber 11 for processing an object to be processed 6, a vacuum pipe 12 for exhausting gas inside the chamber 11, and a space between the vacuum pipe 12 and the chamber 11. A vacuum valve 12a is provided, a vent pipe 13 for supplying gas into the chamber 11 is provided, and a valve 13a is provided between the vent pipe 13 and the chamber 11.

When the gas in the chamber 11 of such a vacuum apparatus is exhausted, the valve 13a of the vent pipe 13 is closed and the vacuum valve 12a of the vacuum pipe 12 is opened to open the chamber 11
The gas inside is exhausted.

When supplying a gas into the chamber 11 of such a vacuum device, the vacuum valve 12a of the vacuum pipe 12 is closed and the valve 13a of the vent pipe 13 is opened.
Gas is supplied into the chamber 11.

When the gas is rapidly exhausted or supplied in this way, the pressure fluctuation rate increases rapidly in the initial stage, as shown in FIG. 4, and along with this, the dust in the chamber 11 floats and becomes covered. It is attached to the processed material 6.

[0009]

In the conventional vacuum apparatus described above, the rate of pressure fluctuation in the chamber when the valve is opened increases rapidly, and the dust in the chamber floats and adheres to the object to be processed. There is a problem that the piping is provided with an orifice to suppress the rapid fluctuation of the pressure in the chamber, but there is a problem that the effect is small and the exhaust time becomes long. The rapid fluctuation of the pressure in the chamber is suppressed by exhausting or supplying while changing the amount or supply amount, but the structure becomes complicated and the equipment cost is required. However, there is a problem that a sufficient effect cannot be obtained.

In view of the above situation, the present invention prevents dust from floating in the chamber and adhering to the object to be processed when the gas in the chamber of the vacuum apparatus is exhausted or the gas is supplied into the chamber. It is an object of the present invention to provide a vacuum device and a dust adhesion preventing method that can be performed.

[0011]

A vacuum device according to the present invention comprises a vacuum pipe for exhausting gas in a chamber for processing an object to be processed, and a vacuum valve provided between the vacuum pipe and the chamber. In a vacuum device equipped with a vent pipe for supplying gas into the chamber of this chamber and a valve provided between this vent pipe and this chamber, a needle valve provided in parallel with this valve, this vacuum pipe and this vent A bypass pipe provided between the pipe and the pipe, a valve and a needle valve provided between the bypass pipe and the vacuum pipe or the vent pipe, and a controller for controlling opening and closing of the valve and the needle valve. To configure.

The dust adhesion preventing method of the present invention is a method for preventing dust adhesion to the object to be processed in the chamber when the gas in the chamber is exhausted using the above vacuum device, and the vent pipe is used. The valve and the needle valve of are closed, the vacuum valve of this vacuum pipe is opened, the opening and closing of this valve and the needle valve of this bypass pipe are controlled by the controller based on the chamber internal pressure of this chamber, and the gas in this chamber is exhausted. To configure.

The dust adhesion preventing method of the present invention is a method for preventing dust adhesion to the object to be processed in the chamber when the gas is supplied into the chamber by using the vacuum device described above. The vacuum valve and the valve of the bypass pipe and the needle valve are closed, and the opening and closing of the valve of the vent pipe and the needle valve are controlled by the controller based on the room pressure of the chamber to supply gas into the chamber. To configure.

[0014]

In the present invention, the bypass pipe is provided between the vacuum pipe and the vent pipe, and the valve and the needle valve are provided between the bypass pipe and the vacuum pipe or the vent pipe. When the gas is exhausted, it is possible to prevent a sudden pressure change of the gas in the chamber by flowing the gas in the bypass pipe, and when supplying the gas in the chamber, the vent pipe and the chamber Since the supply amount can be controlled by the needle valve provided between the chambers, the amount of dust floating in the chamber can be reduced, and it is possible to prevent dust from adhering to the object to be processed. Since the controller can control the opening and closing of the valve by the controller, the time required to exhaust the gas in the chamber or supply the gas into the chamber is shortened. Theft is possible.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to FIGS. FIG. 1 is a diagram showing a schematic structure of a vacuum device of an embodiment according to the present invention, and FIG. 2 is a diagram showing a change situation of a pressure fluctuation rate in the vacuum device of an embodiment of the present invention.

As shown in FIG. 1, the vacuum device of this embodiment has the following structure.
The chamber 1 for processing the workpiece 6 includes the chamber 1
A vacuum valve 2a is provided between the chamber 1 and the vacuum pipe 2 for exhausting the gas inside the chamber, and between the chamber 1 and the vent pipe 3 for supplying the gas into the chamber 1. The valve 3a and the needle valve 3b are provided in parallel.

When the gas in the chamber 1 of such a vacuum device is exhausted, the controller 5 closes the valve 3a and the needle valve 3b of the vent pipe 3, and the vacuum valve 2a of the vacuum pipe 2 and the bypass pipe 4 are closed. Open the valve 4a and the needle valve 4b and control the ratio of the flow rate of the vacuum pipe 2 to the flow rate of the bypass pipe 4 to be about 1: 3 to increase the flow rate of the bypass pipe 4 to increase the inside of the chamber 1. Is exhausting the gas.

After that, when the sensor 5a provided in the chamber 1 detects that the pressure fluctuation rate in the chamber 1 has decreased, the controller 5 closes the valve 4a and the needle valve 4b of the bypass pipe 4 and only the vacuum pipe 2 is used. Since the gas can be exhausted, the exhaust time can be shortened.

Since the flow rate of the gas flowing through the vacuum pipe 2 and the bypass pipe 4 is controlled by the controller 5 as described above, it is possible to prevent the gas from being rapidly exhausted from the chamber 1. Therefore, as shown in FIG. In addition, it is possible to prevent a rapid change in the pressure in the chamber 1, suppress the floating of dust in the chamber 1, and prevent dust from adhering to the object to be processed.

When gas is supplied into the chamber 1 of such a vacuum apparatus, the vacuum valve 2a of the vacuum pipe 2, the valve 4a of the bypass pipe 4 and the needle valve 4b.
Is closed, the needle valve 3b of the vent pipe 3 is opened, and gas is supplied into the chamber 1 at a flow rate of the vent pipe 3 so that dust does not float in the chamber 1.

Then, as in the case of exhausting, if the sensor 5a provided in the chamber 1 detects that the pressure fluctuation rate in the chamber 1 has decreased, the controller 5 causes the vent pipe 3
Since it is possible to supply the gas by opening the valve 3a and increasing the flow rate, it is possible to shorten the supply time.

Since the flow rate of the gas flowing through the vent pipe 3 is regulated in this way, it is possible to prevent the sudden supply of the gas into the chamber 1, and therefore, as shown in FIG. Such fluctuations can be prevented, the floating of dust in the chamber 1 can be suppressed, and it becomes possible to prevent dust from adhering to the object to be processed.

[0023]

As is apparent from the above description, according to the present invention, it is possible to prevent dust from floating in the chamber of the vacuum apparatus and to prevent the dust from adhering to the object to be processed by a very simple structure change. In a stable state, there is an advantage that the supply and exhaust amount can be increased and the time required for supply and exhaust can be shortened, and significant economic and reliability improvement effects can be expected. It is possible to provide a vacuum device and a dust adhesion prevention method.

[Brief description of drawings]

FIG. 1 is a diagram showing a schematic structure of a vacuum device according to an embodiment of the present invention,

FIG. 2 is a diagram showing a change situation of a pressure fluctuation rate in a vacuum device according to an embodiment of the present invention,

FIG. 3 is a diagram showing a schematic structure of a conventional vacuum device,

FIG. 4 is a diagram showing a change situation of a pressure fluctuation rate in a conventional vacuum device,

[Explanation of symbols]

 1 is a chamber, 2 is a vacuum pipe, 2a is a vacuum valve, 3 is a vent pipe, 3a is a valve, 3b is a needle valve, 4 is a bypass pipe, 4a is a valve, 4b is a needle valve, 5 is a controller, 5a is a sensor, 6 is the object to be treated,

Claims (3)

[Claims] 1. A vacuum pipe (2) for exhausting gas inside a chamber (1) for processing an object (6), and the vacuum pipe (2) provided between the vacuum pipe (2) and the chamber (1). Vacuum valve (2a) and vent pipe (3) for supplying gas into the chamber (1)
A vacuum device having a valve (3a) provided between the vent pipe (3) and the chamber (1), a needle valve (3b) provided in parallel with the valve (3a), and the vacuum A bypass pipe (4) provided between the pipe (2) and the vent pipe (3), and provided between the bypass pipe (4) and the vacuum pipe (2) or the vent pipe (3) Valve (4a) and needle valve
A vacuum device comprising: (4b); and a controller (5) for controlling opening / closing of the valves (2a, 3a, 4a) and needle valves (3b, 4b). 2. The chamber (1) when the gas in the chamber (1) is exhausted by using the vacuum device according to claim 1.
A method for preventing dust from adhering to the object to be treated (6) inside, wherein the valve (3a) and the needle valve (3b) of the vent pipe (3) are
Closed, open the vacuum valve (2a) of the vacuum pipe (2), and open the valve (4a) and needle valve of the bypass pipe (4).
A method for preventing dust adhesion, comprising controlling the opening and closing of (4b) by a controller (5) based on the room pressure of the chamber (1) to exhaust the gas in the chamber (1). 3. The chamber (1) for supplying gas into the chamber (1) using the vacuum apparatus according to claim 1.
A method for preventing dust from adhering to the object to be treated (6) inside, wherein the vacuum valve (2a) of the vacuum pipe (2) and the valve (4a) and needle valve (4b) of the bypass pipe (4). And close the valve (3a) of the vent pipe (3) and the needle valve.
A dust adhesion preventing method characterized in that opening and closing of (3b) is controlled by a controller (5) based on the room pressure of the chamber (1) to supply gas into the chamber (1).