JPH0557556B2 - - Google Patents
Info
- Publication number
- JPH0557556B2 JPH0557556B2 JP62213377A JP21337787A JPH0557556B2 JP H0557556 B2 JPH0557556 B2 JP H0557556B2 JP 62213377 A JP62213377 A JP 62213377A JP 21337787 A JP21337787 A JP 21337787A JP H0557556 B2 JPH0557556 B2 JP H0557556B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- stage
- fixed
- tilting
- hinge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000006073 displacement reaction Methods 0.000 description 16
- 235000012431 wafers Nutrition 0.000 description 12
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Details Of Measuring And Other Instruments (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62213377A JPS6454393A (en) | 1987-08-26 | 1987-08-26 | Flap stage |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62213377A JPS6454393A (en) | 1987-08-26 | 1987-08-26 | Flap stage |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6454393A JPS6454393A (en) | 1989-03-01 |
JPH0557556B2 true JPH0557556B2 (US06330241-20011211-M00004.png) | 1993-08-24 |
Family
ID=16638184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62213377A Granted JPS6454393A (en) | 1987-08-26 | 1987-08-26 | Flap stage |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6454393A (US06330241-20011211-M00004.png) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4679172B2 (ja) * | 2005-02-23 | 2011-04-27 | 株式会社日立ハイテクノロジーズ | 表示用パネル基板の露光装置、表示用パネル基板の露光方法、及び表示用パネル基板の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5993249A (ja) * | 1982-10-19 | 1984-05-29 | バリアン・アソシエイツ・インコ−ポレイテツド | 局部的真空処理のための間隙制御装置 |
JPS6069593A (ja) * | 1983-09-26 | 1985-04-20 | オムロン株式会社 | 微動ステ−ジ機構 |
-
1987
- 1987-08-26 JP JP62213377A patent/JPS6454393A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5993249A (ja) * | 1982-10-19 | 1984-05-29 | バリアン・アソシエイツ・インコ−ポレイテツド | 局部的真空処理のための間隙制御装置 |
JPS6069593A (ja) * | 1983-09-26 | 1985-04-20 | オムロン株式会社 | 微動ステ−ジ機構 |
Also Published As
Publication number | Publication date |
---|---|
JPS6454393A (en) | 1989-03-01 |
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