JPH0557528A - Mirror grinding with electrolytic product and its device - Google Patents

Mirror grinding with electrolytic product and its device

Info

Publication number
JPH0557528A
JPH0557528A JP21891991A JP21891991A JPH0557528A JP H0557528 A JPH0557528 A JP H0557528A JP 21891991 A JP21891991 A JP 21891991A JP 21891991 A JP21891991 A JP 21891991A JP H0557528 A JPH0557528 A JP H0557528A
Authority
JP
Japan
Prior art keywords
grindstone
electrode
contact surface
grinding wheel
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21891991A
Other languages
Japanese (ja)
Other versions
JP3251610B2 (en
Inventor
Hitoshi Omori
整 大森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP21891991A priority Critical patent/JP3251610B2/en
Publication of JPH0557528A publication Critical patent/JPH0557528A/en
Application granted granted Critical
Publication of JP3251610B2 publication Critical patent/JP3251610B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To reduce the manufacturing time and cost of a grinding wheel by easily producing it with simple and inexpensive equipment, and save the labor of grinding wheel change by reproducing the grinding wheel on a processing machine. CONSTITUTION:A conductive liquid is flowed between a conductive grinding wheel 10 having a contact surface 12 with a workpiece 16 and an electrode 20 opposite to the contact surface, voltage is applied between the grinding wheel and the electrode to form an electrolytic product 11 on the grinding wheel contact surface, and a workpiece is ground with the electrolytic product. This device is composed of the conductive grinding wheel having the contact surface with the work piece, the electrode opposite to the contact surface, a means 30 flowing the conductive liquid between the grinding wheel and the electrode, and means 40 and 42 applying voltage between the grinding wheel and the electrode, and the grinding wheel uses material including no abrasive grain and having high oxidation.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、機械加工分野における
研磨加工方法及び装置に係わり、特に、砥粒を使用せず
に電解生成物により鏡面研磨加工を行う方法及び装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing method and apparatus in the field of machining, and more particularly to a method and apparatus for performing mirror polishing by electrolytic products without using abrasive grains.

【0002】[0002]

【従来の技術】鋳鉄ファイバボンドダイヤモンド砥石等
の導電性砥石を用い、この砥石に電圧を印加し、砥石を
電解によりドレッシングする導電性砥石の電解ドレッシ
ング方法及び装置が、本願と同一の出願人による特開平
1-188266号( 特願昭63-12305号) に開示され、電子材料
であるシリコン等の半導体材料を鏡面研削することに成
功している。更に、この方法及び装置を発展させた電解
インプロセスドレッシング研削法(Electrolytic Inproc
ess Dressing: 以下 Elid 研削法という) と呼ばれる方
法及び装置が本願出願人により開発され、発表されてい
る( 理研シンボジウム「鏡面研削の最新技術動向」、平
成3年3月5日開催)。
2. Description of the Related Art A conductive grindstone such as a cast iron fiber bonded diamond grindstone is used, and an electrolytic dressing method and apparatus for a conductive grindstone in which a voltage is applied to the grindstone and the grindstone is electrolytically dressed by the same applicant as the present application. Kohei
It has been disclosed in Japanese Patent Application No. 1-188266 (Japanese Patent Application No. 63-12305) and has succeeded in mirror-finishing a semiconductor material such as silicon which is an electronic material. In addition, an electrolytic in-process dressing grinding method (Electrolytic Inproc
ess Dressing: A method and a device called “Elid grinding method” have been developed and announced by the applicant of the present application (RIKEN Symbodium “Latest Technology Trend of Mirror Grinding”, held on March 5, 1991).

【0003】この Elid 研削法は、ワークとの接触面を
有する砥石と、接触面に対向する電極と、砥石と電極と
の間に導電性液を流すノズルと、砥石と電極との間に電
圧を印加する電源及び給電体とからなる装置であり、砥
石と電極との間に導電性液を流しながら、砥石と電極と
の間に電圧を印加し、砥石を電解によりドレッシングす
るものである。
In this Elid grinding method, a grindstone having a contact surface with a work, an electrode facing the contact surface, a nozzle for flowing a conductive liquid between the grindstone and the electrode, and a voltage applied between the grindstone and the electrode. A device comprising a power source and a power feeding body for applying a voltage. A voltage is applied between the grindstone and the electrode while the conductive liquid is flowing between the grindstone and the electrode, and the grindstone is dressed electrolytically.

【0004】この Elid 研削法によるドレッシングの機
構を図6に示す。砥石の目立て開始時(A)には、砥石
と電極との間の電気抵抗が少なく比較的大きい電流(5
〜10A)が流れる。これにより、電解効果により砥石
表面の金属部(ボンド)が溶解し、非導電性のダイヤモ
ンド砥粒が突出する。更に、通電を続けると、酸化鉄(F
e2O3)を主とした絶縁被膜が砥石表面に形成され、砥石
の電気抵抗が大きくなる。これにより、電流が低下し、
ボンドの溶解が減り、砥粒の突出(砥石の目立て)が実
質的に終了する(B)。この状態で研削を開始する
(C)と、被膜が研削屑を遊離しつつ、ワークの研削に
つれてダイヤモンド砥粒が摩耗していく。更に研削を続
けると(D)、砥石表面の絶縁被膜が摩耗により除去さ
れ、砥石の電気抵抗が低下し、砥石と電極間の電流が増
大し、ボンドの溶解が増し、砥粒の突出(砥石の目立
て)が再開される。従って、 Elid 研削法による研削中
には、(B)〜(D)のように被膜の形成・除去により
ボンドの過溶出が抑えられ、砥粒の突出(砥石の目立
て)が自動的に調整される。(B)〜(D)に示す上述
したサイクルを以下 Elid サイクルと呼ぶ。
FIG. 6 shows a dressing mechanism by the Elid grinding method. At the start of grinding of the grindstone (A), the electric resistance between the grindstone and the electrode is small and a relatively large current (5
10A) flows. Thereby, the metal portion (bond) on the surface of the grindstone is dissolved by the electrolytic effect, and the non-conductive diamond abrasive grains are projected. Further, if the power is continued, iron oxide (F
An insulating film mainly composed of e 2 O 3 ) is formed on the surface of the grindstone, increasing the electric resistance of the grindstone. This reduces the current,
The dissolution of the bond is reduced, and the protrusion of abrasive grains (grinding of the grindstone) is substantially completed (B). When grinding is started in this state (C), the coating particles release grinding dust, and the diamond abrasive grains wear away as the work is ground. When the grinding is further continued (D), the insulating coating on the surface of the grindstone is removed by abrasion, the electric resistance of the grindstone is lowered, the current between the grindstone and the electrode is increased, the dissolution of the bond is increased, and the protrusion of the abrasive grains (grinding stone Is reopened. Therefore, during grinding by the Elid grinding method, excessive elution of the bond is suppressed by forming / removing the coating as shown in (B) to (D), and the protrusion of the abrasive grains (sharpening of the grindstone) is automatically adjusted. It The above-described cycles shown in (B) to (D) are hereinafter referred to as Elid cycles.

【0005】[0005]

【発明が解決しようとする課題】上述した Elid 研削に
用いる砥石には、鋳鉄ファイバボンド砥石、青銅ボンド
砥石等、種々の砥石が従来用いられているが、これらの
砥石には、次のような問題があった。すなわち、プレス
金型等の製作には、所望形状の砥石を多数使用するが、
この砥石を製作するのに、通常数箇月の期間と、砥石1
個当たり数十万円の費用を要していた。このため、プレ
ス金型等の製作期間が長期化するばかりか、金型の製作
費が高くなっていた。
Various wheels such as a cast iron fiber bond wheel and a bronze bond wheel have been conventionally used for the above-mentioned wheel used for Elid grinding. There was a problem. That is, a large number of grindstones of a desired shape are used to manufacture a press mold,
It usually takes several months to make this whetstone, and whetstone 1
It cost hundreds of thousands of yen per piece. For this reason, not only the production period of the press die and the like is prolonged, but also the die production cost is increased.

【0006】これは、鋳鉄ボンド砥石等の製作工程にお
いて、1000℃以上に加熱して金属部(ボンド)を焼
結させ、更にこれをロウ付け等で台金に結合させる必要
があり、複雑で高価な高温炉が必要なためであるこのた
め、通常の金型メーカでは、砥石を内作できなかった。
本発明は、かかる問題を解決し、簡単安価な設備で容易
に製作でき、砥石の製造時間及び製造費用を低減するこ
とができ、砥石を加工機上で再生させることができ、従
って砥石の交換の手間を省くことができる、鏡面研磨方
法及び装置を提供することにある。
[0006] In the manufacturing process of a cast iron bond grindstone or the like, it is necessary to heat the metal part (bond) to 1000 ° C or more to sinter the metal part (bond) and then to bond it to the base metal by brazing or the like, which is complicated. This is because an expensive high-temperature furnace is required. Therefore, a normal die manufacturer could not produce a grindstone in-house.
The present invention solves such a problem, can be easily manufactured with simple and inexpensive equipment, can reduce the manufacturing time and manufacturing cost of the grindstone, and can regenerate the grindstone on the processing machine, and therefore the replacement of the grindstone An object of the present invention is to provide a mirror-polishing method and device that can save the trouble of.

【0007】[0007]

【課題を解決するための手段】上記問題を解決するた
め、本発明の発明者は、電解ドレッシング中に砥石表面
に生成される被膜の主成分が硬度の高い酸化物であるこ
とに着眼し、この被膜すなわち電解生成物により鏡面研
磨を行うことを研究し本発明を完成させた。すなわち、
本発明によれば、被加工物との接触面を有する導電性砥
石と前記接触面に対向する電極との間に導電性液を流
し、前記砥石と電極との間に電圧を印加して砥石の前記
接触面に電解生成物を形成し、該電解生成物により被加
工物を研磨する、ことを特徴とする電解生成物による鏡
面研磨方法が提供される。
In order to solve the above problems, the inventor of the present invention has noticed that the main component of the film formed on the surface of the grindstone during electrolytic dressing is an oxide having high hardness, The present invention has been completed by studying mirror polishing with this coating or electrolytic product. That is,
According to the present invention, a conductive liquid is caused to flow between a conductive grindstone having a contact surface with a workpiece and an electrode facing the contact surface, and a voltage is applied between the grindstone and the electrode to grind the grindstone. A method for mirror-polishing with an electrolytic product is provided, in which an electrolytic product is formed on the contact surface, and a workpiece is polished with the electrolytic product.

【0008】更に、本発明によれば、被加工物との接触
面を有する導電性砥石と、前記接触面に対向する電極
と、前記砥石と電極との間に導電性液を流す手段と、前
記砥石と電極との間に電圧を印加する手段とからなり、
前記砥石は砥粒を含まない酸化性の高い材料である、こ
とを特徴とする電解生成物による鏡面研磨装置が提供さ
れる。
Further, according to the present invention, a conductive grindstone having a contact surface with the workpiece, an electrode facing the contact surface, and a means for flowing a conductive liquid between the grindstone and the electrode, Consisting of means for applying a voltage between the grindstone and the electrode,
There is provided a specular polishing apparatus using an electrolytic product, wherein the grindstone is a highly oxidizable material that does not contain abrasive grains.

【0009】前記砥石はアルミ系材料である、ことが好
ましい。
The whetstone is preferably made of an aluminum material.

【0010】[0010]

【作用】上述した本発明による方法及び装置によれば、
砥石は、砥粒を含まない導電材料、好ましくはアルミ系
材料から作られるので、アルミ系材料の機械加工のみで
容易に砥石を製作することができる。また、砥石の接触
面に電解生成物を形成し、この電解生成物により被加工
物を研磨するので、砥石を加工機上で簡単に再生するこ
とができる。
According to the above-described method and apparatus of the present invention,
Since the grindstone is made of a conductive material that does not contain abrasive grains, preferably an aluminum-based material, the grindstone can be easily manufactured only by machining the aluminum-based material. Further, since the electrolytic product is formed on the contact surface of the grindstone and the workpiece is polished by this electrolytic product, the grindstone can be easily regenerated on the processing machine.

【0011】従って、簡単安価な設備で容易に製作で
き、砥石の製造時間及び製造費用を低減することがで
き、砥石を加工機上で再生させることができ、従って砥
石の交換の手間を省くことができる、鏡面研磨方法及び
装置を提供することができる。
Therefore, the grindstone can be easily manufactured with simple and inexpensive equipment, the manufacturing time and the manufacturing cost of the grindstone can be reduced, and the grindstone can be regenerated on the processing machine. Therefore, the labor of exchanging the grindstone can be saved. It is possible to provide a mirror polishing method and apparatus capable of performing the above.

【0012】[0012]

【実施例】以下、本発明の好適な一実施例を図面を参照
して説明する。図1は、本発明による鏡面研磨装置を模
式的に示す図である。この図において、10は、垂直な
軸線を有するほぼ円板状の導電性砥石であり、この砥石
10は、図示しない加工機の上部ヘッドに水平に回転可
能に固定されている。この上部ヘッドは、砥石10と共
に水平方向及び垂直方向に移動できるようになってい
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram schematically showing a mirror polishing apparatus according to the present invention. In this figure, 10 is a substantially disk-shaped conductive grindstone having a vertical axis, and this grindstone 10 is horizontally rotatably fixed to an upper head of a processing machine (not shown). This upper head can move horizontally and vertically with the grindstone 10.

【0013】上部ヘッドの下方には、加工機のテーブル
14が垂直軸を中心に設けられている。このテーブル1
4は、通常完全に固定されているが、水平方向及び/又
は垂直方向に移動できるようになっていてもよい。テー
ブル14の上面には、保持具15を介して通常周知の仕
方で被加工物すなわちワーク16が固定される。ワーク
16が導体である場合には、保持具15はワーク16を
テーブル14から絶縁させるために、絶縁されているの
が好ましい。砥石10の下面すなわちワーク16との接
触面12は、水平な研磨面であり、回転する砥石10の
接触面12をワーク16に接触させることにより、ワー
ク16が研磨される。
Below the upper head, a table 14 of the processing machine is provided around a vertical axis. This table 1
4 is normally completely fixed, but it may be movable horizontally and / or vertically. A work piece, that is, a work 16 is fixed to the upper surface of the table 14 via a holder 15 in a generally known manner. When the work piece 16 is a conductor, the holder 15 is preferably insulated in order to insulate the work piece 16 from the table 14. The lower surface of the grindstone 10, that is, the contact surface 12 with the work 16 is a horizontal polishing surface, and the work 16 is polished by bringing the contact surface 12 of the rotating grindstone 10 into contact with the work 16.

【0014】砥石10のワーク16と接触しない部分の
下方には、砥石10の接触面12の形状とほぼ一致する
形状の電極20が砥石10の接触面12に対向して設け
られている。砥石10の周囲には複数のノズル30が設
けられ、これにより、図示しない供給パイプを介して砥
石10と電極20との間に弱導電性である切削液すなわ
ちクーラントを流すようになっている。このノズル30
は、砥石10とワーク16との間にもクーラントを流す
ように設けるのが好ましい。
Below the portion of the grindstone 10 that does not come into contact with the workpiece 16, an electrode 20 having a shape that substantially matches the shape of the contact surface 12 of the grindstone 10 is provided facing the contact surface 12 of the grindstone 10. A plurality of nozzles 30 are provided around the grindstone 10, so that a weakly conductive cutting fluid, that is, a coolant is caused to flow between the grindstone 10 and the electrode 20 via a supply pipe (not shown). This nozzle 30
Is preferably provided so that the coolant also flows between the grindstone 10 and the work 16.

【0015】更に、この装置には電源40が設けられ、
砥石10の円周面に接触するようになった給電体42を
介して砥石10に+の電圧を印加し、一方電極20に−
の電圧を印加できるようになっている。この電源40
は、パルス電源或いはパルスと直流を混在させた電源が
好ましい。砥石10は、砥粒を含まない酸化性の高い材
料で作られる。表1に鉄系材質、銅系材質、アルミ系材
質の特性の比較を示す。鉄系材質の酸化被膜はある塊で
剥離し易く、研磨に寄与する時間が短い。また、銅系材
質の酸化被膜では溶出が早すぎる。これに対して、アル
ミ系材質では、電解により母材のドレッシングが行われ
るが、それ以上に酸化被覆、すなわちアルミナの生成が
早く、ドレッシングと被覆生成とが並行して起こり、出
来た被覆の母材への結合が強く、また、酸化被覆、すな
わちアルミナがほぼ粒状に形成されるため、砥粒と同様
な機能を有する。従って、電解生成物により鏡面研磨を
行うには、アルミ系材質が最も適していることがわかっ
た。
Further, the apparatus is provided with a power supply 40,
A + voltage is applied to the grindstone 10 via the power supply body 42 that comes into contact with the circumferential surface of the grindstone 10, and the electrode 20 has a − voltage.
The voltage can be applied. This power supply 40
Is preferably a pulse power source or a power source in which pulse and DC are mixed. The grindstone 10 is made of a highly oxidizable material that does not contain abrasive grains. Table 1 shows a comparison of the characteristics of iron-based materials, copper-based materials, and aluminum-based materials. The iron-based oxide film is easy to peel off in a certain mass, and the time that contributes to polishing is short. In addition, the oxide film of copper-based material elutes too quickly. On the other hand, with aluminum-based materials, dressing of the base material is performed by electrolysis, but the oxide coating, that is, the formation of alumina is faster than that, and dressing and coating formation occur in parallel, and the base material of the resulting coating is formed. Since it is strongly bonded to the material and the oxide coating, that is, the alumina is formed into a substantially granular shape, it has a function similar to that of abrasive grains. Therefore, it was found that the aluminum-based material is most suitable for mirror-polishing with the electrolytic product.

【0016】[0016]

【表1】 [Table 1]

【0017】使用において、上述した Elid サイクルと
同様のサイクル、すなわちドレッシング、被膜生成、被
膜による研磨、被膜の摩耗のサイクルにより、被膜の生
成と被膜によるワークの研磨が行われる。図2に電解生
成物による研磨機構を示す。図に示すように研磨は砥石
10、すなわちアルミニウムの表面に生成した酸化被膜
11、例えばアルミナにより行われる。従って、被膜の
摩耗と被膜生成をバランスさせることにより、常に適当
を被膜を保持することができ、砥石を加工機内で再生
し、砥石交換の手間を省くことができる。 実施例1 アルミ系材料である超ジュラルミン盤を砥石(径180
mm−厚さ10mm) とし、これを正極とし、対向電極を負
極とし、表2に示す研削機械、電源及び被削材等を使用
して研磨を実施した。この研磨では、電解生成物を発生
させつつ研磨するため、定圧切り込みが望ましく、垂直
方向の荷重(FZ 荷重)が2kgf 以内であるように調整
した。得られた結果を図3〜5に示す。
In use, a cycle similar to the Elid cycle described above, that is, a cycle of dressing, coating formation, polishing with a coating, and abrasion of a coating, produces a coating and polishes a work with the coating. FIG. 2 shows a polishing mechanism using an electrolytic product. As shown in the figure, the polishing is performed by a grindstone 10, that is, an oxide film 11 formed on the surface of aluminum, for example, alumina. Therefore, by balancing the wear of the coating and the formation of the coating, the coating can be held appropriately at all times, and the grindstone can be regenerated in the processing machine to save the labor of exchanging the grindstone. Example 1 A super duralumin machine, which is an aluminum-based material, was ground with a grindstone (diameter 180
mm-thickness 10 mm), this was used as the positive electrode, the counter electrode was used as the negative electrode, and polishing was performed using the grinding machine, power supply, work material, etc. shown in Table 2. In this polishing, a constant pressure incision is desirable because polishing is performed while generating electrolytic products, and the vertical load (FZ load) was adjusted to be within 2 kgf. The obtained results are shown in FIGS.

【0018】[0018]

【表2】 [Table 2]

【0019】(1)電解による電流・電圧の変化 図3に電流・電圧の変化を示す。電解生成物の堆積によ
り電流低減が生じた。被覆厚さは約20分の通電で約1
70μmであり、鋳鉄等の電解被覆(40〜50μm)
の3〜4倍の厚さが得られた。電解生成物は乳白色でア
ルミナ系の成分と思われる。電解生成物は顕微鏡観察に
よると、アルミの母材に粒子状のアルミナが結合してい
た。 (2)鏡面研磨特性 研磨加工の負荷変化を図4に示す。総切り込み量が70
〜90μmまでは、荷重値がさほど高くならなかった。 (3)加工面粗さ 窒素珪素仕上面の粗さパターンを図5に示す。#600
(Rmax 1.503μm)の加工面(図5A)は光沢の
ない梨地であったが、この面が研磨されてRmax 0.1
70μmの光沢のある良好な鏡面(図5B)が得られ
た。この鏡面は、#2000の砥石による Elid 研削面
に匹敵するものであった。
(1) Change in current / voltage due to electrolysis FIG. 3 shows changes in current / voltage. The current reduction was caused by the deposition of electrolysis products. The coating thickness is about 1 after about 20 minutes of energization.
70 μm, electrolytic coating such as cast iron (40 to 50 μm)
3 to 4 times the thickness was obtained. The electrolysis product is milky white and seems to be an alumina-based component. Microscopic observation of the electrolysis product showed that particulate alumina was bonded to the aluminum base material. (2) Mirror polishing property Fig. 4 shows the load change of polishing process. Total cutting depth is 70
Up to 90 μm, the load value did not become so high. (3) Processed Surface Roughness The roughness pattern of the nitrogen silicon finished surface is shown in FIG. # 600
The processed surface (FIG. 5A) of (Rmax 1.503 μm) was matte with no gloss, but this surface was polished and Rmax 0.1.
A good mirror surface with a gloss of 70 μm (FIG. 5B) was obtained. This mirror surface was comparable to the Elid ground surface with a # 2000 wheel.

【0020】[0020]

【発明の効果】上述した本発明による砥石及びその製造
方法によれば、砥石は、砥粒を含まない導電材料、好ま
しくはアルミ系材料から作られるので、アルミ系材料の
機械加工のみで容易に砥石を製作することができる。ま
た、砥石の接触面に電解生成物を形成し、この電解生成
物により被加工物を研磨するので、砥石を加工機上で簡
単に再生することができる。
According to the above-described grindstone and the manufacturing method thereof according to the present invention, since the grindstone is made of a conductive material containing no abrasive grains, preferably an aluminum-based material, it is easy to machine the aluminum-based material. A grindstone can be manufactured. Further, since the electrolytic product is formed on the contact surface of the grindstone and the workpiece is polished by this electrolytic product, the grindstone can be easily regenerated on the processing machine.

【0021】従って、簡単安価な設備で容易に製作で
き、砥石の製造時間及び製造費用を低減することがで
き、砥石を加工機上で再生させることができ、従って砥
石の交換の手間を省くことができる、鏡面研磨方法及び
装置を提供することができる。
Therefore, it can be easily manufactured with simple and inexpensive equipment, the manufacturing time and the manufacturing cost of the grindstone can be reduced, and the grindstone can be regenerated on the processing machine. Therefore, the labor of exchanging the grindstone can be saved. It is possible to provide a mirror polishing method and apparatus capable of performing the above.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による電解ドレッシング装置を模式的に
示す図である。
FIG. 1 is a diagram schematically showing an electrolytic dressing device according to the present invention.

【図2】電解生成物による研磨機構を示す図である。FIG. 2 is a diagram showing a polishing mechanism by an electrolytic product.

【図3】電解による電流・電圧の変化を示す図である。FIG. 3 is a diagram showing changes in current and voltage due to electrolysis.

【図4】研磨加工の負荷変化を示す図である。FIG. 4 is a diagram showing a load change of polishing.

【図5】研磨前後の面粗さを示す図である。FIG. 5 is a diagram showing surface roughness before and after polishing.

【図6】Elid 研削法における Elid サイクルを示す説
明図である。
FIG. 6 is an explanatory diagram showing an Elid cycle in the Elid grinding method.

【符号の説明】[Explanation of symbols]

10 砥石 12 接触面 14 テーブル 16 ワーク 18 上部ヘッド 20 電極 30 ノズル 40 電源 42 給電体 10 Grinding Stone 12 Contact Surface 14 Table 16 Workpiece 18 Upper Head 20 Electrode 30 Nozzle 40 Power Supply 42 Feeder

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 被加工物との接触面を有する導電性砥石
と前記接触面に対向する電極との間に導電性液を流し、
前記砥石と電極との間に電圧を印加して砥石の前記接触
面に電解生成物を形成し、該電解生成物により被加工物
を研磨する、ことを特徴とする電解生成物による鏡面研
磨方法。
1. A conductive liquid is caused to flow between a conductive grindstone having a contact surface with a workpiece and an electrode facing the contact surface,
A voltage is applied between the grindstone and the electrode to form an electrolytic product on the contact surface of the grindstone, and a workpiece is polished by the electrolytic product, which is a mirror polishing method using the electrolytic product. ..
【請求項2】 被加工物との接触面を有する導電性砥石
と、前記接触面に対向する電極と、前記砥石と電極との
間に導電性液を流す手段と、前記砥石と電極との間に電
圧を印加する手段とからなり、前記砥石は砥粒を含まな
い酸化性の高い材料である、ことを特徴とする電解生成
物による鏡面研磨装置。
2. A conductive grindstone having a contact surface with a workpiece, an electrode facing the contact surface, a means for flowing a conductive liquid between the grindstone and the electrode, and the grindstone and the electrode. And a means for applying a voltage therebetween, wherein the grindstone is a highly oxidizable material that does not contain abrasive grains.
【請求項3】 前記砥石はアルミ系材料である、ことを
特徴とする請求項2に記載の電解生成物による鏡面研磨
装置。
3. The mirror-polishing device with electrolytic products according to claim 2, wherein the grindstone is an aluminum-based material.
JP21891991A 1991-08-29 1991-08-29 Mirror polishing method and apparatus using electrolytic products Expired - Fee Related JP3251610B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21891991A JP3251610B2 (en) 1991-08-29 1991-08-29 Mirror polishing method and apparatus using electrolytic products

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21891991A JP3251610B2 (en) 1991-08-29 1991-08-29 Mirror polishing method and apparatus using electrolytic products

Publications (2)

Publication Number Publication Date
JPH0557528A true JPH0557528A (en) 1993-03-09
JP3251610B2 JP3251610B2 (en) 2002-01-28

Family

ID=16727378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21891991A Expired - Fee Related JP3251610B2 (en) 1991-08-29 1991-08-29 Mirror polishing method and apparatus using electrolytic products

Country Status (1)

Country Link
JP (1) JP3251610B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6922657B2 (en) 2002-04-25 2005-07-26 Kabushiki Kaisha Toshiba Apparatus and method of diagnosing machinery damage factor
CN104308298A (en) * 2014-09-28 2015-01-28 黄河科技学院 High-accuracy numerical control electrolytic grinding machine tool for processing ultrathin and superhard conductive material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6922657B2 (en) 2002-04-25 2005-07-26 Kabushiki Kaisha Toshiba Apparatus and method of diagnosing machinery damage factor
CN104308298A (en) * 2014-09-28 2015-01-28 黄河科技学院 High-accuracy numerical control electrolytic grinding machine tool for processing ultrathin and superhard conductive material

Also Published As

Publication number Publication date
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