JPH0556562B2 - - Google Patents

Info

Publication number
JPH0556562B2
JPH0556562B2 JP138584A JP138584A JPH0556562B2 JP H0556562 B2 JPH0556562 B2 JP H0556562B2 JP 138584 A JP138584 A JP 138584A JP 138584 A JP138584 A JP 138584A JP H0556562 B2 JPH0556562 B2 JP H0556562B2
Authority
JP
Japan
Prior art keywords
magnetic head
adhesive
thin film
pattern
film magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP138584A
Other languages
Japanese (ja)
Other versions
JPS60145519A (en
Inventor
Shinichi Inoe
Shuzo Abiko
Hiroichi Goto
Masakazu Kuhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Electronics Inc
Original Assignee
Canon Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Electronics Inc filed Critical Canon Electronics Inc
Priority to JP138584A priority Critical patent/JPS60145519A/en
Publication of JPS60145519A publication Critical patent/JPS60145519A/en
Publication of JPH0556562B2 publication Critical patent/JPH0556562B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers
    • G11B5/3133Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure

Description

【発明の詳細な説明】 〔技術分野〕 本発明は薄膜磁気ヘツドに関し、特に磁性膜か
らなる素子を設けた基板上に接着剤を介して保護
板を接合した薄膜磁気ヘツドに関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a thin film magnetic head, and more particularly to a thin film magnetic head in which a protective plate is bonded via an adhesive to a substrate on which an element made of a magnetic film is provided.

〔従来技術〕[Prior art]

一般に薄膜磁気ヘツドは、フエライトなどの基
板上にセンダストやパーマロイなどの磁性膜や、
AU、CU、AL等の導電膜をスパツタリングや蒸
着などの薄膜堆積法により形成し、これらの薄膜
をフオトエツチング工程を経て記録再生を行なう
素子を構成する磁気回路及び記録再生信号を導く
電気回路のパターンを形成している。
In general, thin film magnetic heads are made of a magnetic film such as sendust or permalloy on a substrate such as ferrite.
Conductive films such as AU, CU, and AL are formed by thin film deposition methods such as sputtering and vapor deposition, and these thin films are photoetched to form magnetic circuits that make up the elements that perform recording and reproduction, as well as electrical circuits that guide recording and reproduction signals. forming a pattern.

そしてこれらの回路パターンを保護すると共に
磁気記録媒体摺動面を形成するためにパターン上
にフエライトやガラス、アルミナなどの保護板を
低融点ガラスやエポキシ系接着剤、水ガラスなど
の接着剤を用いて貼り合わせ、磁気記録媒体摺動
面側を研削して完成した薄膜磁気ヘツドを得てい
る。
In order to protect these circuit patterns and form a sliding surface for the magnetic recording medium, a protective plate made of ferrite, glass, or alumina is placed on the pattern using an adhesive such as low-melting glass, epoxy adhesive, or water glass. The magnetic recording medium sliding surface side is ground to obtain a completed thin film magnetic head.

このような薄膜磁気ヘツドを製造する工程の途
中で、基板上のパターンに保護板を貼り合わせる
際、前述したように接着剤を介して保護板を重
ね、十分に加圧しながら加熱し、接着剤の硬化を
行つている。
During the process of manufacturing such thin-film magnetic heads, when attaching the protective plate to the pattern on the substrate, the protective plates are stacked with adhesive as described above, heated while applying sufficient pressure, and the adhesive is bonded. is undergoing curing.

ところで、接着剤を用いて保護板を接着させる
構造を採用すると、接着剤の硬化時の加熱により
接着剤中の溶剤が揮発したり、保護板の貼り合わ
せの際に外気が接着剤中に取り込まれる等の原因
で接着剤中に気泡が生じる。
By the way, if a structure is adopted in which the protective plates are bonded using an adhesive, the solvent in the adhesive may evaporate due to the heating that occurs when the adhesive hardens, or the outside air may be drawn into the adhesive when the protective plates are pasted together. Air bubbles may form in the adhesive due to factors such as water leakage.

また一般的な炉により硬化の加熱を行なうと、
接着剤層の外部と内部で温度勾配が生じ、接着剤
層の外部から硬化が始まるので、上記の原因によ
り発生した気泡接着剤層中に閉じ込められてしま
う。
In addition, when heating for curing is performed using a general furnace,
A temperature gradient occurs between the outside and inside of the adhesive layer, and curing starts from the outside of the adhesive layer, so that bubbles generated due to the above reasons are trapped in the adhesive layer.

このように保護板を接合する接着剤層中に気泡
が存在すると次のような各種の問題が生じる。
The presence of air bubbles in the adhesive layer that joins the protective plates causes the following various problems.

(1) 薄膜磁気ヘツドの磁性膜から形成された素子
部近傍、特に磁気記録媒体摺動面付近に気泡が
存在すると、磁気記録媒体摺動面側を円筒面を
形成するように研削する際に接着剤層に研削だ
れが生じ、スペーシング損失を引き起こす原因
となつたり、接着剤層のクラツクやチツピング
等が発生し、磁気ヘツドの特性を著しく劣化さ
せてしまう。
(1) If air bubbles exist near the element part formed from the magnetic film of a thin-film magnetic head, especially near the sliding surface of the magnetic recording medium, it may cause problems when grinding the sliding surface of the magnetic recording medium to form a cylindrical surface. Grinding sag occurs in the adhesive layer, causing spacing loss, cracking and chipping of the adhesive layer, and significantly deteriorating the characteristics of the magnetic head.

(2) 薄膜磁気ヘツドの基板又は保護板と、接着剤
層の境界面に気泡が発生すると接着面積が減少
し、接着強度が低下し、保護板が剥離してしま
う。
(2) If air bubbles are generated at the interface between the substrate or protective plate of the thin film magnetic head and the adhesive layer, the adhesive area decreases, the adhesive strength decreases, and the protective plate peels off.

(3) 封じ込められた気泡中の気体が温度変化によ
つて膨張あるいは収縮し、磁気ヘツドの信頼性
を低下させる。
(3) The gas in the confined bubble expands or contracts due to temperature changes, reducing the reliability of the magnetic head.

(4) 磁気記録媒体摺動面側に気泡が存在すると磁
気記録媒体側の磁性粉が凹部となつた気泡の跡
に溜つてしまう。
(4) If air bubbles exist on the sliding surface side of the magnetic recording medium, magnetic powder on the magnetic recording medium side will accumulate in the traces of the air bubbles that have become recesses.

(5) 磁気記録媒体摺動面側に存在する気泡の後か
ら水が浸入して磁性膜から成る素子の腐食が発
生し易くなる。
(5) Water enters behind the bubbles existing on the sliding surface side of the magnetic recording medium, making it easy for elements made of magnetic films to corrode.

〔目的〕〔the purpose〕

本発明は上記の各問題を解決するためになされ
たもので、上述の保護板を基板上に接合する接着
剤層中に気泡が存在することのないように構成す
ることにより種々の特性および信頼性を向上させ
た薄膜磁気ヘツドの提供を目的とする。
The present invention has been made to solve the above-mentioned problems, and it improves various characteristics and reliability by configuring the above-mentioned protective plate so that no air bubbles are present in the adhesive layer that bonds it to the substrate. The purpose of this invention is to provide a thin film magnetic head with improved performance.

〔実施例〕〔Example〕

以下、添付図面を参照して本発明の実施例を詳
細に説明する。なおここでは記録再生用の素子と
して磁気抵抗効果素子(以下MR素子と呼ぶ)を
用いた磁気抵抗効果型の薄膜磁気ヘツドに本発明
を適用した例を実施例とする。
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Here, an example in which the present invention is applied to a magnetoresistive thin film magnetic head using a magnetoresistive element (hereinafter referred to as an MR element) as a recording/reproducing element will be described.

〔第1実施例〕 第1図および第2図は本発明の第1実施例によ
る薄膜磁気ヘツドの構造を示すもので、第1図は
保護板接合前の状態、第2図は保護板接合後の状
態を示している。
[First Embodiment] FIGS. 1 and 2 show the structure of a thin film magnetic head according to a first embodiment of the present invention. FIG. 1 shows the state before the protection plate is bonded, and FIG. 2 shows the state before the protection plate is bonded. It shows the later state.

第1図において符号1で示すものは矩形の平坦
なプレートに形成されたガラス基板で、このガラ
ス基板1上には、磁気記録媒体との摺動面側とな
る図中側縁に寄つた側に細長い矩形の磁性膜から
なる3個のMR素子2が所定間隔で一直線状に並
んで設けられている。
In FIG. 1, the reference numeral 1 is a glass substrate formed into a rectangular flat plate. Three MR elements 2 made of elongated rectangular magnetic films are arranged in a straight line at predetermined intervals.

また基板1上には、MR素子2の信号を導く一
直線状の信号電極3が互いに平行に6本設けられ
ており、それぞれの先端は3個のMR素子2の両
端部に一本ずつ接続されており、後端は図中下
側、すなわち摺動面の反対側に導かれている。こ
れらの信号電極は例えばアルミニウム薄膜から形
成される。
Further, on the substrate 1, six linear signal electrodes 3 for guiding signals from the MR elements 2 are provided in parallel to each other, and the tip of each electrode is connected to each end of the three MR elements 2. The rear end is guided to the lower side in the figure, that is, to the opposite side of the sliding surface. These signal electrodes are formed from aluminum thin films, for example.

また本実施例にあつては基板1上に符号4で示
す略コの字状の発熱用パターンが形成されてい
る。同図に示されるように発熱用パターン4は3
個のMR素子2の上側(摺動面側)近傍および6
本の信号電極3の両側近傍に沿つて設けられてい
る。この発熱用パターン4は例えばアルミニウム
薄膜から形成される。
Further, in this embodiment, a substantially U-shaped heat generating pattern indicated by reference numeral 4 is formed on the substrate 1. As shown in the figure, the heating pattern 4 is 3
Near the upper side (sliding surface side) of MR elements 2 and 6
They are provided near both sides of the signal electrode 3 of the book. This heating pattern 4 is formed from, for example, an aluminum thin film.

そして第2図に示すように3個のMR素子1の
全体、6本の信号電極3の上部および発熱用パタ
ーン4の上部を覆つて矩形の保護板5がガラス基
板1上に接着剤を介して接合される。保護板5は
例えばフエライトやガラス、アルミナ等からな
り、また接着剤としては例えば水ガラス等が用い
られる。
Then, as shown in FIG. 2, a rectangular protection plate 5 is placed on the glass substrate 1 with an adhesive, covering the entire three MR elements 1, the tops of the six signal electrodes 3, and the tops of the heat generating patterns 4. and are joined together. The protective plate 5 is made of, for example, ferrite, glass, alumina, etc., and the adhesive used is, for example, water glass.

本実施例にあつては接着剤により保護板5を接
合する際に接着剤を硬化させるために発熱用パタ
ーン4を発熱させ、それにより接着剤層中に発生
した気泡が閉じこめられない状態で接着剤層を硬
化させる。
In this embodiment, when bonding the protective plate 5 with an adhesive, the heating pattern 4 is made to generate heat in order to harden the adhesive, so that air bubbles generated in the adhesive layer are not trapped. harden the agent layer.

以下にその接合工程も含む薄膜磁気ヘツドの製
造工程を、第3図を参照して詳細に説明する。
The manufacturing process of the thin film magnetic head, including the bonding process, will be explained in detail below with reference to FIG.

同図に示される製造工程における最初のステツ
プS1においては先述のガラス基板1を洗浄する。
In the first step S1 in the manufacturing process shown in the figure, the glass substrate 1 mentioned above is cleaned.

次のステツプS2においてはガラス基板1の表
面上に、後に先述のMR素子2となるパーマロイ
等の磁性膜と、信号電極3および発生用パターン
4になるアルミニウム膜とを、蒸着あるいはスパ
ツタリング等の方法により堆積して形成する。こ
の場合これらの磁性膜とアルミニウム膜は相互に
連続した状態で形成される。
In the next step S2, a magnetic film such as permalloy, which will later become the MR element 2 described above, and an aluminum film, which will become the signal electrode 3 and generation pattern 4, are deposited on the surface of the glass substrate 1 by a method such as vapor deposition or sputtering. It is deposited and formed by In this case, these magnetic films and aluminum films are formed in a continuous state.

次にステツプS3において上記のアルミニウム
膜に対してフオトリソグラフイによりエツチング
を施こすことにより信号電極3および発熱用パタ
ーン4を形成する。
Next, in step S3, the signal electrode 3 and the heat generating pattern 4 are formed by photolithographically etching the aluminum film.

続いてステツプS4において上記の磁性膜に対
してフオトリングラフイによりエツチングを施こ
すことによりMR素子2を形成する。
Subsequently, in step S4, the magnetic film is etched by photolithography to form the MR element 2.

さらにステツプS5においてMR素子2と信号電
極3を被覆するように基板1上に二酸化ケイ素
(SiO2)をスパツタリングすることにより、MR
素子2と信号電極2とを保護し磁気ヘツドの耐環
境性を向上させるための保護膜を形成する。
Furthermore, in step S5, silicon dioxide (SiO 2 ) is sputtered onto the substrate 1 so as to cover the MR element 2 and the signal electrode 3.
A protective film is formed to protect the element 2 and the signal electrode 2 and improve the environmental resistance of the magnetic head.

続いてステツプS6において基板1の表面上の
摺動面側、すなわち第1図中に示す上部で上記の
保護膜と発熱用パターン4の上部を覆うように、
接着剤である水ガラスを適量塗布する。
Subsequently, in step S6, the above-mentioned protective film and the upper part of the heat generating pattern 4 are covered with the sliding surface side of the surface of the substrate 1, that is, the upper part shown in FIG.
Apply an appropriate amount of water glass adhesive.

次にステツプS7でガラス基板1上の上記の水
ガラス塗布部分、すなわち第2図に示す位置に保
護板5を重ね、貼り合わせる。
Next, in step S7, the protective plate 5 is placed on the water glass coated portion of the glass substrate 1, that is, at the position shown in FIG. 2, and bonded together.

続くステツプS8においては先のステツプS7で
貼り合わせた保護板5を基板1方向に加圧すると
ともに、発熱用パターン4に通電させ、同パター
ンを発熱させる。
In the following step S8, the protective plate 5 bonded together in the previous step S7 is pressed in the direction of the substrate 1, and the heat generating pattern 4 is energized to generate heat.

この発熱により保護板5と基板1間の水ガラス
の層が内部から硬化させられる。したがつて発熱
により水ガラス中の溶剤が揮発したり、保護板5
の貼り合わせの際に外気が水ガラス層中に取り込
まれたりして水ガラス層中に気泡が発生した場合
には、発生した気泡は水ガラス層中から外部へ逃
げることができ、水ガラス層中に閉じ込められる
ことはない。
This heat generation causes the water glass layer between the protection plate 5 and the substrate 1 to harden from the inside. Therefore, the solvent in the water glass may evaporate due to heat generation, and the protective plate 5 may
If outside air is drawn into the water glass layer during bonding and air bubbles are generated in the water glass layer, the generated air bubbles can escape from the water glass layer to the outside, and the water glass layer You won't be trapped inside.

従つて続くステツプS9において発熱用パター
ン4の発熱により水ガラス層の硬化が完了し、保
護板5の接合が完了した場合に、硬化した水ガラ
ス層中に気泡が存在することはない。
Therefore, when the hardening of the water glass layer is completed by the heat generated by the heat generating pattern 4 in the subsequent step S9 and the bonding of the protective plate 5 is completed, no air bubbles will be present in the hardened water glass layer.

特に発熱用パターン4の一部は摺動面側に沿つ
て設けられているのでこの部分での気泡の存在が
特に防止される。
In particular, since a part of the heat generating pattern 4 is provided along the sliding surface side, the presence of air bubbles in this part is particularly prevented.

以上の如くして第2図に示される状態の薄膜磁
気ヘツドが得られる。さらにこの薄膜磁気ヘツド
の磁気記録媒体摺動面側に研削加工、仕上加工を
施すことにより完成品が得られる。
In the manner described above, a thin film magnetic head as shown in FIG. 2 is obtained. Further, a finished product is obtained by grinding and finishing the magnetic recording medium sliding surface side of this thin film magnetic head.

以上のように本実施例では接着剤の水ガラスは
硬化時に内部側から硬化させられるので硬化完了
後に水ガラス層中に気泡が存在することはない。
また特に重要な摺動面近傍部分の接着剤層中での
気泡の存在が効果的に防止される。
As described above, in this embodiment, the water glass of the adhesive is hardened from the inside during curing, so that no air bubbles are present in the water glass layer after curing is completed.
Furthermore, the presence of air bubbles in the adhesive layer near the particularly important sliding surface is effectively prevented.

なお発熱パターンの形状および配置は上記実施
例のそれに限るものではなく、この点の構成が異
なる実施例を以下に説明する。
Note that the shape and arrangement of the heat generating pattern are not limited to those in the above embodiments, and embodiments with different configurations in this respect will be described below.

〔第2実施例〕 第4図は本発明の第2実施例を示すものであ
る。同図に示されるように本実施例にあつては符
号6で示す発熱用パターンは、第1実施例の発熱
用パターン4と同じ形状と配置のパターンに、3
個のMR素子2の下側近傍に沿つて一直線状に形
成されたパターン部分6aが加えられたパターン
として形成されている。
[Second Embodiment] FIG. 4 shows a second embodiment of the present invention. As shown in the figure, in this embodiment, the heat generating pattern designated by reference numeral 6 is a pattern having the same shape and arrangement as the heat generating pattern 4 of the first embodiment, and 3
The pattern is formed by adding a pattern portion 6a formed in a straight line along the lower side of each MR element 2.

以上の構造によれば発熱用パターン6の成膜お
よびエツチングプロセスは第1実施例に比較して
増加するが、3個のMR素子2全体のごく近傍が
発熱用パターン6によつて包囲される配置となる
ため、上述の製造工程における発熱用パターン6
の発熱による水ガラス層の硬化の際に、MR素子
2の近傍の加熱がより均一に行なわれる。このた
め、加熱時にこのMR素子2周辺部に発生する温
度勾配がより低くなり、特に重要なこの部分で発
泡のない接着をより効率的に行なえる。またより
広い領域で均一な硬化により接着が行なわれるた
め接着強度がより向上する。
According to the above structure, the film formation and etching processes for the heat generating pattern 6 are increased compared to the first embodiment, but the immediate vicinity of the entire three MR elements 2 is surrounded by the heat generating pattern 6. Because of the arrangement, the heating pattern 6 in the manufacturing process described above
When the water glass layer is cured by heat generation, heating in the vicinity of the MR element 2 is performed more uniformly. Therefore, the temperature gradient generated around the MR element 2 during heating becomes lower, and bonding without foaming can be performed more efficiently in this particularly important area. In addition, adhesive strength is further improved because the adhesive is cured uniformly over a wider area.

〔第3実施例〕 第5図は本発明の第3実施例の構造を示すもの
である。同図に示されるように本実施例にあつて
は符号7で示される発熱用パターンは形状が第1
実施例と同様に略コの字状に形成されているが、
上側の直線パターン部分は3個のMR素子と重ね
られ、両側の直線パターン部分は6本の信号電極
3の両側近傍に沿うように配置されている。
[Third Embodiment] FIG. 5 shows the structure of a third embodiment of the present invention. As shown in the figure, in this embodiment, the heating pattern indicated by 7 has the first shape.
Although it is formed in a substantially U-shape as in the embodiment,
The upper linear pattern portion overlaps the three MR elements, and the linear pattern portions on both sides are arranged along the vicinity of both sides of the six signal electrodes 3.

このような構造において、発熱用パターン7は
接着剤硬化の加熱用として用いられるとともに、
完成した薄膜磁気ヘツドの構成においてMR素子
2のバイアス用電極として用いられる。
In such a structure, the heating pattern 7 is used for heating for curing the adhesive, and
It is used as a bias electrode for the MR element 2 in the structure of the completed thin film magnetic head.

このように発熱用パターンとバイアス用電極を
一体に形成する構造により、接着剤の硬化時に最
も重要なMR素子2部分での発泡を最大限に防止
できるとともに、第1および第2実施例に比較し
てバイアス用電極形成のための工程を減らすこと
ができる。
With this structure in which the heating pattern and the bias electrode are integrally formed, it is possible to prevent foaming to the maximum extent in the two most important parts of the MR element when the adhesive hardens, and compared to the first and second embodiments. Thus, the number of steps for forming bias electrodes can be reduced.

なお以上に説明した構成における基板1、MR
素子2、信号電極3、保護板5、接着剤および保
護膜の形成材料、形状数、配置等の構成が上記実
施例のものと異なる薄膜磁気ヘツドについても本
発明を適用できるものは勿論であり、発熱用パタ
ーンの形状材料、形状配置、数等の構成も上記実
施例に限るものではない。
Note that the substrate 1 in the configuration described above, MR
It goes without saying that the present invention can also be applied to a thin film magnetic head in which the elements 2, signal electrodes 3, protective plate 5, adhesive and protective film are formed with different configurations, such as the material, number of shapes, arrangement, etc., from those of the above embodiments. The configuration of the heat generating pattern, such as the shape material, shape arrangement, number, etc., is not limited to the above embodiments.

またMR素子を用いず、磁気コアを構成する磁
性膜とコイルの導体パターンによるインダクテイ
ブ型の薄膜磁気ヘツドについても本発明を適用で
きるのも勿論である。
It goes without saying that the present invention can also be applied to an inductive type thin-film magnetic head that does not use an MR element but has a conductor pattern of a magnetic film and a coil constituting a magnetic core.

〔効果〕〔effect〕

以上の説明から明らかなように本発明の薄膜磁
気ヘツドによれば、素子を構成する磁性膜を形成
した基板上に、保護板の接合時に接着剤を加熱す
る発熱用パターンを形成した構造を採用したの
で、基板と保護板間の接着剤層中の発泡を防止す
ることができ、接着剤層中に気泡が存在した場合
に発生する先述の各問題を解決することができ
る。すなわち、接着剤層の研削だれによるスペー
シング損失、接着剤層のクラツクやチツピングに
よる磁気ヘツドの特性の劣化、接着強度の低下に
よる保護板の剥離、気泡の膨張収縮による磁気ヘ
ツドの信頼性の低下、摺動面の気泡の凹部への磁
性粉等のゴミの付着、水の浸入による素子の腐蝕
等の各問題が解決され、諸特性に優れ、信頼性の
向上した薄膜磁気ヘツドを提供することができ
る。
As is clear from the above description, the thin film magnetic head of the present invention employs a structure in which a heat generating pattern is formed on the substrate on which the magnetic film constituting the element is formed, to heat the adhesive when bonding the protective plate. Therefore, it is possible to prevent foaming in the adhesive layer between the substrate and the protective plate, and it is possible to solve the above-mentioned problems that occur when air bubbles are present in the adhesive layer. In other words, spacing loss due to grinding of the adhesive layer, deterioration of the characteristics of the magnetic head due to cracking or chipping of the adhesive layer, peeling of the protective plate due to a decrease in adhesive strength, and decrease in reliability of the magnetic head due to expansion and contraction of air bubbles. To provide a thin film magnetic head which solves various problems such as adhesion of dust such as magnetic powder to concave portions of air bubbles on the sliding surface, and corrosion of elements due to water intrusion, and which has excellent characteristics and improved reliability. I can do it.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図〜第3図は本発明の第1実施例を説明す
るもので、第1図は保護板接合前の構造を示す平
面図、第2図は保護板接合後の構造を示す平面
図、第3図は製造工程を示す流れ図、第4図は本
発明の第2実施例の構造を示す平面図、第5図は
本発明の第3実施例の構造を示す平面図である。 1……基板、2……MR素子、3……信号電
極、4,6,7……発熱用パターン、5……保護
板。
Figures 1 to 3 explain the first embodiment of the present invention, where Figure 1 is a plan view showing the structure before the protection plate is bonded, and Figure 2 is a plan view showing the structure after the protection plate is bonded. , FIG. 3 is a flowchart showing the manufacturing process, FIG. 4 is a plan view showing the structure of a second embodiment of the invention, and FIG. 5 is a plan view showing the structure of the third embodiment of the invention. 1... Substrate, 2... MR element, 3... Signal electrode, 4, 6, 7... Heat generating pattern, 5... Protective plate.

Claims (1)

【特許請求の範囲】 1 素子を構成する磁性膜を形成した基板上に接
着剤を介して保護板を接合した薄膜磁気ヘツドに
おいて、前記接合時に接着剤を加熱する発熱用パ
ターンを前記基板上に形成したことを特徴とする
薄膜磁気ヘツド。 2 前記発熱用パターンを前記素子の近傍に配置
したことを特徴とする特許請求の範囲第1項に記
載の薄膜磁気ヘツド。 3 前記素子近傍を包囲するように前記発熱用パ
ターンを形成したことを特徴とする特許請求の範
囲第1項または第2項に記載の薄膜磁気ヘツド。 4 前記素子は磁気抵抗効果素子であることを特
徴とする特許請求の範囲第1項から第3項までの
いずれか1項に記載の薄膜磁気ヘツド。 5 前記発熱用パターンを前記磁気抵抗効果素子
のバイアス用電極と一体に形成したことを特徴と
する特許請求の範囲第4項に記載の薄膜磁気ヘツ
ド。
[Scope of Claims] 1. In a thin film magnetic head in which a protective plate is bonded via an adhesive to a substrate on which a magnetic film constituting an element is formed, a heating pattern is provided on the substrate to heat the adhesive during bonding. A thin film magnetic head characterized by the following: 2. The thin film magnetic head according to claim 1, wherein the heating pattern is arranged near the element. 3. The thin film magnetic head according to claim 1 or 2, wherein the heating pattern is formed so as to surround the vicinity of the element. 4. The thin film magnetic head according to any one of claims 1 to 3, wherein the element is a magnetoresistive element. 5. The thin film magnetic head according to claim 4, wherein the heating pattern is formed integrally with a bias electrode of the magnetoresistive element.
JP138584A 1984-01-10 1984-01-10 Thin film magnetic head Granted JPS60145519A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP138584A JPS60145519A (en) 1984-01-10 1984-01-10 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP138584A JPS60145519A (en) 1984-01-10 1984-01-10 Thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS60145519A JPS60145519A (en) 1985-08-01
JPH0556562B2 true JPH0556562B2 (en) 1993-08-19

Family

ID=11500014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP138584A Granted JPS60145519A (en) 1984-01-10 1984-01-10 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS60145519A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267915A (en) * 1986-05-16 1987-11-20 Hitachi Ltd Thin film magnetic head

Also Published As

Publication number Publication date
JPS60145519A (en) 1985-08-01

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