JPH0543406B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a gas-liquid mixing device for mixing gas into a liquid, and particularly to increasing the output flow rate thereof.

[Conventional technology]

FIG. 7 is a vertical cross-sectional view of a conventional gas-liquid mixing device using the Bench-Lily effect, in which 1 is connected to a pressure liquid source (not shown) and receives liquid from the pressure liquid source in the direction of arrow 2. It is a liquid introduction tube, and its tip is tapered to form a throttle opening 3. 4 is a suction nozzle that sucks gas to be mixed with the liquid, 5 is a mixing chamber provided continuously downstream from the throttle port 3, and the liquid discharged from the throttle port 3 flows into the mixing chamber as shown by the dotted line. Diverge within 5. Due to this divergence, the surrounding area 6 becomes under negative pressure. Thus, the suction nozzle 4 opens at a portion where the negative pressure is generated, and the gas is sucked into the mixing chamber 5 by this negative pressure and mixed with the liquid.

[Problem to be solved by the invention]

The conventional gas-liquid mixing device is configured as described above.
Since the liquid from the pressure liquid source is once throttled, the output flow rate is significantly lower than the supply capacity of the pressure liquid source, and there is a problem that an output flow rate commensurate with the supply capacity of the pressure liquid source cannot be obtained. Ta.

The present invention was made in order to solve the problems of the conventional devices, and an object of the present invention is to provide a gas-liquid mixing device that can increase the output flow rate by fully utilizing the supply capacity of a pressure liquid source. That is.

[Means to solve the problem]

In order to achieve the above object, the gas-liquid mixing device according to the present invention includes a gas-liquid mixing device downstream of an ejector having a first nozzle for discharging liquid from a pressure liquid source as a focused flow and a second nozzle for sucking gas. A negative pressure forming plate is provided at the end to form a negative pressure by receiving the focused flow, and a third nozzle is further provided downstream from the negative pressure forming plate to strengthen the negative pressure. A mixing chamber is provided with a nozzle protruding inward, and this mixing chamber is provided with a tapered cylindrical body surrounding the nozzle opening of the third nozzle, and facing the third nozzle. A discharge port is provided, and a bypass path is provided that bypasses the ejector and connects the pressure liquid source to the mixing chamber at a position within the length of the cylindrical body.

[Effect]

In the gas-liquid mixing device configured as above, gas is sucked into the ejector by the negative pressure formed by the negative pressure forming plate and the third nozzle,
Gas and liquid are mixed in the ejector and the nozzle opening of the third nozzle. Then, by opening the bypass passage within the axial length of the tapered cylindrical body in the mixing chamber and providing a discharge port opposite to the third nozzle, the liquid coming out of the bypass passage is discharged from the third nozzle. A mixing chamber is provided between the third nozzle to assist in discharging the gas-liquid mixture from the third nozzle and to flow toward the discharge port with a velocity component in the same direction as the gas-liquid mixture to be discharged. is homogeneously mixed with the gas-liquid mixture from the third nozzle.

〔Example〕

Hereinafter, one embodiment of the present invention will be described with reference to FIGS. 1 to 4.

FIG. 1 is a partial vertical cross-sectional view of a gas-liquid mixing device according to an embodiment of the present invention, FIG. 2 is a vertical cross-sectional view of the main part of the gas-liquid mixing device shown in FIG. 1, and FIG. A front view of the pressure forming plate, FIG. 4 is a sectional view taken along the line - in FIG. 1.

In the figure, 7 is connected to a pressure liquid source (not shown) via an on-off valve 8 and is connected to an arrow 9 from the pressure liquid source.
10 is an ejector provided continuously with the liquid introduction pipe 7, and this ejector is tapered to squeeze the liquid introduced into the liquid introduction pipe 7. Aperture part 1
01, and a focused flow forming section 102 of uniform diameter that is formed continuously with the constriction section 101 and discharges the liquid flow constricted by the constriction section 101 as a high-speed flow 11. The ejector 10 further has a second nozzle 10B for sucking the gas to be mixed with the liquid, and this second nozzle 10B is connected to a gas supply source (not shown) and allows the gas to flow in the direction of the arrow 12. A check valve 103 is provided that allows only the passage of water. Note that 104 is an internal space of the ejector 10.

13 is a negative pressure forming plate provided at the downstream end of the ejector 10 facing the first nozzle 10A,
This negative pressure forming plate 13 has a central hole 131 located concentrically with the first nozzle 10A and having a diameter smaller than the diameter of the liquid collecting flow 11, and a central hole 131 which is distributed at equal intervals in the circumferential direction around the central hole 131. Multiple peripheral holes provided 1
32.

14 is a third nozzle provided continuously from the negative pressure forming plate 13 to the downstream side, and has a nozzle opening 141 formed in its center and an outer peripheral surface 142.
is tapered. In this embodiment, the negative pressure forming plate 13 is connected to the nozzle port 141.
is fitted and held at the upstream end of the

Reference numeral 15 denotes a mixing chamber in which a third nozzle 14 is projected, and a discharge port 1 facing the third nozzle 14 from which the finally obtained gas-liquid mixing device is discharged.
It has 51. The area of the discharge port 151 is approximately the same as the cross-sectional area of the liquid introduction pipe 7, and the discharge port 151 is connected to a discharge conduit provided with an on-off valve (not shown).

Reference numeral 16 denotes a bypass passage that connects the pressure liquid source to the mixing chamber 15 by bypassing the ejector 10, the inlet 161 of which is connected to the liquid introduction pipe 7, and the outlet 1
62 is the tapered outer peripheral surface 14 of the third nozzle 13
It opens into the mixing chamber 15 within a range of 2 axial lengths. As shown in FIG. 4, the outlet 162 of the bypass passage 16 opens in a direction eccentric to the axis of the third nozzle 14 (tangential direction to the third nozzle 14). In addition, 17 is a flow rate adjustment valve provided in the bypass path 16.

Next, the operation will be explained. It is assumed that, at the start of the operation, the internal space 104 of the ejector 10, the nozzle port 141 of the third nozzle 14, and the mixing chamber 15 are filled with liquid.

In this state, when the on-off valve provided on the discharge conduit and the on-off valve 8 of the liquid introduction pipe 7 are opened, the liquid from the pressure liquid source flows into the ejector 10 as shown by the arrow 18 in FIG. first nozzle 10A
ejector 10 at high velocity as concentrated flow 11 by
is discharged into the internal space 104 of. This internal space 1
04. The liquid filling the nozzle port 141 and the mixing chamber 15 flows out through the discharge conduit in an amount greater than the amount supplied by the focused flow 11 due to the outflow force due to its own weight and the discharge pressure of the focused flow 11. On the other hand, air flows into the internal space 104 from the outside through the opposite route. As a result, all of the liquid in the internal space 104, nozzle port 141, and mixing chamber 15 above the bottom of the discharge port 151 is replaced with air from the outside.

In this state, the focused flow 11 continues to collide with the negative pressure forming plate 13, but since the diameter of the center hole 131 of the negative pressure forming plate 13 is smaller than the diameter of the focused liquid flow 11, the center of the focused liquid flow 11 is arrow 21 (second
As shown in FIG.
The portions outside the center are reflected at high speed rearward and outward as indicated by arrows 19 at the periphery of the center hole 131 and become mist-like. As the liquid is reflected backward and outward at high speed in this manner, the outer portion 105 of the reflected liquid becomes in a strong negative pressure state. In addition, the air in the rear outer peripheral part 143 of the nozzle opening (141) flows into the part 105 due to the negative pressure in the part 105, and the focused flow 11 that has passed through the center hole 131 spreads as shown by the arrow 21, so the part 143 also has a negative pressure. The negative pressure in the portion 143 and the portion 105 is the internal space 10 of the ejector 10.
4 and is sucked into the internal space 104 through the second nozzle 10B to
It flows towards 5.

A part of the gas flowing toward the portion 105 in this way comes into contact with the atomized liquid reflected in the direction of the arrow 19, causing gas-liquid mixing, and is carried backward by this reflected liquid flow. The gas that once reached the portion 105 by passing through the atomized liquid flow reflected in the direction of arrow 19 also tries to return in the direction of arrow 19 riding on this reflected liquid flow, During this time, gas-liquid mixing also occurs. Furthermore, a portion of the liquid that has passed through the center hole 131 of the negative pressure forming plate 13 is also scattered around because the outer circumferential portion 143 is under negative pressure, and this scattered mist liquid becomes negative as shown by the arrow 20. It flows into the portion 105 through the peripheral hole 132 of the pressure-forming plate 13, during which time it comes into contact with gas and is mixed with gas and liquid. A part of the gas sucked into the internal space 104 also comes into contact with the focused flow 11 itself and is mixed into the focused flow 11 . The gas-liquid mixture mixed in the space around the focused flow 11 in the internal space 104 of the ejector 10 as described above is discharged to the third nozzle 14 riding on the focused flow 11.

By opening the flow rate adjustment valve 17, the remainder of the liquid that has flowed into the liquid introduction pipe 7 flows into the bypass passage 16 as shown by the arrow 22, and flows into the mixing chamber 15 from the outlet 162. The inflowing liquid is opened in the range of the axial length of the outer circumferential surface 142 of the third nozzle 14 at the outlet 162;
The outer circumferential surface 142 is tapered, the discharge port 151 of the mixing chamber 15 is provided opposite the third nozzle 14, and the outlet 162 of the bypass path 16 is The outlet 162 of the bypass passage 16 is opened to direct the liquid in a direction eccentric to the axis of the third nozzle 14, that is, in a tangential direction to the outer peripheral surface 142 of the third nozzle 14. From mixing chamber 15
As shown by the arrow 23 in FIG. It flows toward the discharge port 151. Thus, the discharge of the gas-liquid mixture from the third nozzle 14 is assisted by the vortex, and the formation of negative pressure in the portion 143 is promoted. Furthermore, since the pressure at the center of the vortex tends to decrease, the vortex liquid (bypassed liquid) tends to head toward the center, where it is homogeneously mixed with the gas-liquid mixture from the third nozzle 14 and discharged from the discharge port 151. It is discharged from. In addition,
The outlet 162 of the bypass passage 16 is connected to the third nozzle 14
Opening within the axial length of the outer circumferential surface 142 increases the axial velocity of the bypassed liquid and also increases the nozzle opening 1 of the third nozzle 14.
inhibiting the discharge of the gas-liquid mixture discharged from 42;
This is to prevent the negative pressure formation described above from being inhibited.

As described above, according to the present invention, a homogeneous gas-liquid mixture can be obtained in which the amount of liquid flowing through the bypass path 16 is greater than the amount of liquid passing through the ejector 10,
This means that the liquid supply capacity of the pressure liquid source can be fully utilized. Regarding this point, to explain the function of the flow rate adjustment valve 17, if it is fully opened, the mixing chamber 15
The area of the discharge port 151 is approximately the same size as the cross-sectional area of the liquid introduction pipe 7, and together with this, it is possible to obtain an output flow rate that is the same as the supply capacity of the liquid pressure source.
If the flow rate adjustment valve 17 is throttled down, the bypass amount of the liquid will be reduced accordingly, but a highly concentrated gas-liquid mixture can be obtained, and by providing the flow rate adjustment valve 17, such a situation is possible. That's why it happens. However, the flow rate adjustment valve 17 is not necessarily required and may be omitted.

In order to increase the output flow rate of the gas-liquid mixture, the gas-liquid mixture obtained by the conventional method shown in Fig. 7 is collected in a storage tank, and unmixed liquid is supplied to this storage tank using a hose, etc. It is also possible to mix the gas and liquid, but this would not only be expensive as it would require a means to connect the pressure liquid source to a separate hose and a stirring device, but it would also be difficult to achieve homogeneous gas-liquid mixing.
It cannot be adopted practically. In addition, in the conventional device shown in FIG. 7, the outer circumferential surface of the mixing chamber 5 is tapered toward the tip, and further, the mixing chamber 5 similar to that of the present invention is
It is also conceivable to make this tapered outer circumferential surface protrude into the inner circumferential surface of the pipe 5 and discharge the bypass liquid flow from the outer circumferential surface in the same manner as in the present invention, but if this is done,
This method cannot be adopted either, since the flow rate and pressure passing through the throttle port 3 are reduced by the amount of the bypass flow, and a sufficient vent lily effect cannot be obtained at the throttle port 3. In this regard, in the present invention, the liquid is transported in a high-speed focused flow 1
1, and by colliding with the negative pressure forming plate 13 and reflecting it at high speed, a negative pressure is forcibly formed, so even if a bypass path 16 is provided to bypass a part of the liquid. Negative pressure formation is not impaired.

In the above embodiment, the outlet 162 of the bypass passage 16 is opened in a direction eccentric to the axis of the outer peripheral surface 142 of the third nozzle 14, and as shown in FIG. You can let me. In this case, the bypassed liquid is transferred to the mixing chamber 15.
Although a vortex flow does not occur in the inner part as in the one in FIG. Because the third nozzle 1 is tapered and the discharge port 151 of the mixing chamber 15 is provided opposite the third nozzle 14, the third nozzle 1
The third nozzle 14 still has an axial velocity component of 4, and therefore assists in discharging the gas-liquid mixture from the third nozzle 14.

Further, in the above embodiment, the outer circumferential surface 142 of the third nozzle 14 itself is a tapered cylindrical body, but instead of making the outer circumferential surface 142 tapered,
As shown in FIG. 6, surrounding the nozzle opening 142,
A tapered cylindrical body 24 may be provided separately. The point is that a tapered cylindrical body that surrounds the nozzle opening 142 is sufficient. This cylindrical body serves to assist the discharge of the bypass liquid flow to the gas-liquid mixture discharged from the third nozzle 14 and to equalize the mixing of the gas-liquid mixture and the bypass liquid flow in the circumferential direction. , is preferably concentric with the nozzle opening 142.

Next, one application of the embodiment of FIG. 1 will be explained. In addition, in FIG. 1, 25 is a silver ingot,
It is fitted adjacent to the discharge port 151 and protrudes into the mixing chamber 15 . In this embodiment, when water is introduced into the first nozzle 10A from the liquid introduction pipe 7 and ozone O ₃ is sucked through the second nozzle 10B, ozone is contained in the mixing chamber 15 due to the gas-liquid mixing action described above. Water is discharged and produced. At this time, the silver mass 25 and ozone come into contact to cause the following reaction, and sterilized water containing silver oxide 3Ag ₂ O and active oxygen O ^- can be easily produced.

6Ag+2O ₃ →3Ag ₂ O ₂ →Ag ₂ O+30 ^- [Effects of the Invention] As described above, according to the present invention, output can be achieved by fully utilizing the supply capacity of the pressure liquid source without impairing gas-liquid mixing. The effect of increasing the flow rate is achieved.

[Brief explanation of the drawing]

FIG. 1 is a partial vertical cross-sectional view of a gas-liquid mixing device according to an embodiment of the present invention, FIG. 2 is a vertical cross-sectional view of the main part of the gas-liquid mixing device shown in FIG. 1, and FIG. 4 is a sectional view taken along the line - in FIG. 1; FIG. 5 is a sectional view similar to FIG. 4, showing a modified example of the outlet of the bypass passage; FIG. 7 is a longitudinal sectional view of a third nozzle portion showing a modification of the tapered cylindrical body, and FIG. 7 is a longitudinal sectional view of a conventional gas-liquid mixing device. In the figure, 10 is an ejector, 10A is a first nozzle, 10B is a second nozzle, 11 is a focused flow,
13 is a negative pressure forming plate, 131 is a center hole, 132 is a peripheral hole, 14 is a third nozzle, 141 is a nozzle opening,
142 and 24 are cylindrical bodies, 15 is a mixing chamber, 151 is a discharge port, 16 is a bypass path, and 162 is an outlet. In each figure, the same reference numerals indicate the same or equivalent parts.

Claims (1)

[Claims] 1. An ejector connected to a pressure liquid source and having a first nozzle that discharges liquid from the pressure liquid source as a focused flow and a second nozzle that sucks gas;
a center provided at the downstream end of the ejector opposite to the first nozzle, located concentrically with the first nozzle and having a diameter smaller than the diameter of the focused stream of liquid ejected from the first nozzle; a negative pressure forming plate having a hole and a plurality of peripheral holes provided circumferentially distributed around the central hole; a third nozzle provided continuously downstream from the negative pressure forming plate; A mixing chamber having a discharge port that projects the third nozzle inward, receives the gas-liquid mixture discharged from the third nozzle, and discharges the gas-liquid mixture facing the third nozzle; a bypass passage that bypasses the ejector and connects a pressure liquid source to the mixing chamber; and a bypass passage that surrounds the nozzle opening of the third nozzle and is provided within the mixing chamber and is tapered toward the discharge opening. 1. A gas-liquid mixing device, comprising: a cylindrical body, wherein an outlet of the bypass passage opens into the mixing chamber within an axial length of the cylindrical body. 2. A gas-liquid mixing device characterized in that the outlet of the bypass path is opened in a direction eccentric to the axis of the cylindrical body. 3. The gas-liquid mixing device according to claim 1, wherein the cylindrical body comprises a third nozzle. 4. The gas-liquid mixing device according to claim 1, characterized in that a flow rate regulating valve is provided in the bypass path.