JPH0534515A - Polishing and correcting device for fine pattern and frame body for fixing circuit board - Google Patents

Polishing and correcting device for fine pattern and frame body for fixing circuit board

Info

Publication number
JPH0534515A
JPH0534515A JP3195312A JP19531291A JPH0534515A JP H0534515 A JPH0534515 A JP H0534515A JP 3195312 A JP3195312 A JP 3195312A JP 19531291 A JP19531291 A JP 19531291A JP H0534515 A JPH0534515 A JP H0534515A
Authority
JP
Japan
Prior art keywords
substrate
frame body
polishing
mounting plate
movable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3195312A
Other languages
Japanese (ja)
Inventor
Mitsuhisa Hatajima
光久 畑島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP3195312A priority Critical patent/JPH0534515A/en
Publication of JPH0534515A publication Critical patent/JPH0534515A/en
Pending legal-status Critical Current

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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Optical Filters (AREA)

Abstract

PURPOSE:To decrease the driving power for polishing for the purpose of smoothing and to provide the compact device as well as to smooth the normal pattern regions of a substrate for color filters, etc., by smoothing only the defective points,of the projecting parts and build-up parts partially generated in the fine pattern forming regions of the substrate by a polishing system. CONSTITUTION:This polishing and correcting device for fine patterns and frame body for fixing the substrate have a horizontal imposing plate 2 which can be imposed and fixed with the substrate (a), an illuminating light source section which is mounted to a moving frame 3 movable in X-Y directions on the imposing plate, and a rotary polishing material 14 which is mounted with a prime moving shaft 8 slidable and movable in a vertical direction. The substrate (a) is fixed onto the imposing plate 2 by the frame body 10 for both-side attraction and the correcting points of the fine patterns formed on the surface of the substrate (a) imposed and fixed onto the imposing plate 2 are polished and corrected by the polishing material 14.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ガラス板、樹脂板、樹
脂フィルムなどの基板上、微細画像、微細パターンを施
したカラーフィルターなど画像パターン形成体におい
て、該画像パターン形成体に施された微細画像、微細パ
ターンを部分的に研磨して修正するための装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is applied to an image pattern forming body such as a glass plate, a resin plate, a resin film or the like, a fine image, a color filter having a fine pattern, and the like. The present invention relates to a device for partially polishing and correcting a fine image and a fine pattern.

【0002】[0002]

【従来の技術】従来、カラーフィルターなどガラス基板
上に微細な着色パターンを施す場合に用いられるエマル
ジョンタイプの着色剤や、パターン形成用のフォトレジ
ストなど液状材料内に、異物が混入すると、出来上がっ
たカラーフィルター表面には異物の部分が突起となって
残存したり、前記液状材料の塗布ムラによる隆起が発生
するもので、これをそのまま対向する電極用基板と相対
させてその相対間隔内に液晶を封入して液晶表示体とし
た場合、異物の発生個所における対向電極間隔が不揃い
になり、あるいは対向電極間で短絡を生じたり、表示セ
ル間でギャップムラや、液晶の配向不良が生じ易い。
2. Description of the Related Art Conventionally, when foreign substances are mixed in a liquid material such as an emulsion type coloring agent or a photoresist for pattern formation, which is used for forming a fine colored pattern on a glass substrate such as a color filter, it is completed. On the surface of the color filter, foreign matters remain as protrusions or ridges are generated due to uneven application of the liquid material.The liquid crystal is placed in the relative interval by directly facing it to the opposing electrode substrate. In the case of encapsulating the liquid crystal display, the intervals between the counter electrodes at the locations where the foreign matter is generated are uneven, short-circuits occur between the counter electrodes, gap unevenness between the display cells, and liquid crystal alignment defects are likely to occur.

【0003】そこで、従来は、この異物混入、塗布ムラ
などにより発生する突起や隆起を取り除くために、カラ
ーフィルター全面をプレスして平滑化するか、全面を研
磨して平滑化している。しかし、この方法は基板に施さ
れたパターン全面を処理するために、全面プレス、全面
研磨用の平滑化のための駆動力及び装置が大掛かりにな
り、また、フィルター面とプレス面を平行に保つことが
困難であり、また、パターンの全面を研磨する場合は、
突起部、隆起部以外のパターン領域に傷が付き易いとい
った問題があった。
Therefore, conventionally, in order to remove the protrusions and ridges caused by the inclusion of foreign matter and coating unevenness, the entire surface of the color filter is pressed and smoothed, or the entire surface is polished and smoothed. However, in this method, since the entire surface of the pattern applied to the substrate is processed, a large amount of driving force and equipment are required for the entire surface pressing, smoothing for the entire surface polishing, and the filter surface and the pressing surface are kept parallel. Is difficult, and when polishing the entire surface of the pattern,
There is a problem that the pattern area other than the protrusion and the ridge is easily scratched.

【0004】[0004]

【発明の目的】本発明は、カラーフィルターなど微細パ
ターン領域に部分的に発生する突起部や隆起部の不良個
所のみを、研磨方式により平滑化することにより、平滑
化のための研磨駆動力を逓減し、装置をコンパクトにす
るとともに、正常パターン領域に傷を付けることがない
ように平滑化することを目的とするものである。
An object of the present invention is to smooth a polishing driving force for smoothing only defective portions of protrusions and ridges partially generated in a fine pattern region such as a color filter by a polishing method. The purpose is to gradually reduce the size of the device and to smooth the normal pattern area so as not to damage it.

【0005】[0005]

【発明の構成】本発明の第1の発明は、基板を載置固定
可能な水平載置板と、該載置板上をX−Y方向に移動可
能な可動支持フレームに取付けた照明光源部及び垂直方
向に摺動移動可能な源動軸先端部に取付けた回転研磨材
とを備え、前記載置板上に載置固定した前記基板面に施
された微細パターンの修正個所を前記研磨材により研磨
修正可能にしたことを特徴とする微細パターンの研磨修
正装置である。
According to a first aspect of the present invention, a horizontal mounting plate on which a substrate can be mounted and fixed, and an illumination light source unit mounted on a movable support frame movable on the mounting plate in the XY directions. And a rotary abrasive attached to the tip of the source shaft that is slidably movable in the vertical direction. The abrasive is used to correct the fine pattern on the surface of the substrate mounted and fixed on the mounting plate. It is a fine pattern polishing / correcting device characterized by being capable of polishing / correcting by.

【0006】また、本発明の第2の発明は、四角形状、
円形状などの適宜形状の枠体であって、該枠体の下面及
び上面、又は枠体の内周面に適宜数のバキューム吸引孔
を設け、該枠体の下面を基板載置板に接触させて載せ、
該枠体を覆うように前記枠体の下面と相対する枠体の上
面に基板を載せた後、バキューム吸引して枠体の下面と
上面、又は枠体内部を真空吸引して、載置板上に基板を
固定することを特徴とする基板固定用枠体である。
A second aspect of the present invention is a quadrangular shape,
A frame body having an appropriate shape such as a circular shape, in which an appropriate number of vacuum suction holes are provided on the lower surface and the upper surface of the frame body or the inner peripheral surface of the frame body, and the lower surface of the frame body contacts the substrate mounting plate. Let me put it,
After placing the substrate on the upper surface of the frame body facing the lower surface of the frame body so as to cover the frame body, vacuum suction is performed on the lower surface and the upper surface of the frame body, or the inside of the frame body is vacuum-sucked, and the mounting plate is placed. A substrate fixing frame body having a substrate fixed thereon.

【0007】[0007]

【発明の作用】本発明の第1の発明装置によれば、パタ
ーン形成用液状材料に異物の混入があったり、材料の塗
布不良などによって、微細パターンに発生した突起、隆
起部分のみを、源動モーターの細径の駆動回転軸の先端
に取り付けらけた研磨材によって研磨して、平滑化する
ことができ、微細パターンの正常部分に傷を付けること
なく平滑化することができる。
According to the first invention device of the present invention, only the projections and raised portions generated in the fine pattern due to the inclusion of foreign matter in the pattern forming liquid material, the improper application of the material, etc. It can be smoothed by polishing with a polishing material attached to the tip of a small-diameter drive rotating shaft of a dynamic motor, and can be smoothed without damaging a normal portion of a fine pattern.

【0008】また、研磨用の研磨材は、手動操作ハンド
ルによって、水平な載置板上に載置固定された基板上
を、X−Y方向(縦横方向)に自由に移動させることが
でき、突起の発生しているパターン部分の真上に容易に
研磨材を位置決めでき、位置決めした後は、源動モータ
ーを始動回転させて、該モーター駆動軸の先端部に取り
付けられた研磨材を回転させ、操作ハンドルを該ハンド
ルに装填されたバネの付勢力に抗して押し下げることに
より、源動モーターを取り付け支持するブラケットを垂
直に下降させて、回転する研磨材を真下の突起部分に接
触させて研磨することができる。
Further, the abrasive for polishing can be freely moved in the XY directions (longitudinal and lateral directions) on the substrate mounted and fixed on the horizontal mounting plate by the manual operation handle. The abrasive can be easily positioned directly above the pattern portion where the protrusion is generated, and after positioning, the source motor is started and rotated to rotate the abrasive attached to the tip of the motor drive shaft. By pushing down the operation handle against the biasing force of the spring loaded in the handle, the bracket for attaching and supporting the source motor is vertically lowered, and the rotating abrasive is brought into contact with the projection portion directly below. It can be polished.

【0009】また、研磨を中断、あるいは終了したい場
合は、該操作ハンドルへの押し下げ力を緩めることによ
って、源動モーターのブラケットがバネの復元力によっ
て上昇して、研磨材を上方に復帰させ、突起部分より離
脱させることができる。
Further, when it is desired to interrupt or end the polishing, by loosening the pushing down force to the operation handle, the bracket of the source motor is raised by the restoring force of the spring to return the polishing material upward, It can be detached from the protruding portion.

【0010】また、本発明の第2の発明装置における基
板固定用枠体は、枠体の上面と下面とにそれぞれバキュ
ーム吸引孔を備えているため、基板固定用枠体を下面の
吸引孔によって載置板上にバキューム吸着力によって固
定でき、同時に、該枠体の上面の吸引孔によって修正す
べき基板の吸着固定ができるものである。
Since the board fixing frame in the second invention apparatus of the present invention has vacuum suction holes on the upper surface and the lower surface of the frame, respectively, the board fixing frame is formed by the suction holes on the lower surface. It is possible to fix the substrate on the mounting plate by vacuum suction force, and at the same time, to suck and fix the substrate to be corrected by the suction hole on the upper surface of the frame.

【0011】[0011]

【実施例】本発明を図1、図2に示す実施例に従って詳
細に説明する。本発明の第1の発明装置は、図1に示す
ように、フレーム1 に水平に固定され且つ微細パターン
を施した修正すべき基板a を載置固定可能な透光拡散板
など載置板2 と、該載置板2 上をX−Y方向に相対移動
可能に設けた可動支持フレーム3 と、該載置板上側又は
下側を該支持フレーム3 と一体に相対移動可能に設けた
照明光源部13と、該支持フレーム3 に前記載置板2 に対
して垂直なZ方向に摺動移動可能に設けた垂直可動ヘッ
ド5 と、該可動ヘッド5 をX−Y−Z方向に移動操作す
るための操作用ハンドル9 と、該可動ヘッド5 に前記載
置板2 に対して垂直方向面内を回転可能に設けた回転ブ
ラケット6 と、該回転ブラケット6 に取り付けられ且つ
源動軸先端部に研磨材14を取り付けた源動モーター7 と
を備えるものである。
The present invention will be described in detail with reference to the embodiments shown in FIGS. As shown in FIG. 1, a first invention device of the present invention is a mounting plate 2 such as a translucent diffusion plate which is horizontally fixed to a frame 1 and on which a substrate a to be corrected having a fine pattern can be mounted and fixed. And a movable supporting frame 3 provided on the mounting plate 2 so as to be relatively movable in the XY directions, and an illumination light source provided on the upper side or the lower side of the mounting plate 2 so as to be relatively movable integrally with the supporting frame 3. A part 13, a vertical movable head 5 provided on the support frame 3 so as to be slidable in the Z direction perpendicular to the mounting plate 2, and the movable head 5 is moved in the XYZ directions. An operating handle 9 for rotating the movable head 5, a rotary bracket 6 provided on the movable head 5 so as to be rotatable in a plane perpendicular to the mounting plate 2, and attached to the rotary bracket 6 and at the tip of the source shaft. The source motor 7 having the abrasive 14 attached thereto is provided.

【0012】図1に示すように、装置本体フレーム1 に
立設した支持脚1aを介して水平に透光拡散板などの載置
板2 を取り付け固定する。該載置板2 の下側に、前記フ
レーム1 に取り付け固定した摺動基台19上面を水平にX
方向(水平面内の縦方向)に移動自在のX方向摺動台18
を備え、該摺動台18上面を前記X方向と直交するY方向
(水平面内の横方向)に移動自在のY方向摺動台17を備
える。
As shown in FIG. 1, a mounting plate 2 such as a light-transmitting diffuser plate is horizontally attached and fixed via support legs 1a provided upright on the apparatus body frame 1. On the lower side of the mounting plate 2, the upper surface of the sliding base 19 mounted and fixed to the frame 1 is horizontally
X-direction slide 18 that can move in any direction (vertical in the horizontal plane)
The slide table 18 is provided with a Y-direction slide table 17 which is movable in the Y-direction (horizontal direction in the horizontal plane) orthogonal to the X-direction.

【0013】図2、前記Y方向摺動台17に一体に前記載
置板2 の側縁外側を立ち上がって該載置板2 の上面に平
行にアーム状に延設した可動支持フレーム3 を設ける。
載置板2 上側の該可動支持フレーム3の先端部には、ブ
ラケット4 を取り付ける。該ブラケット4 に対して垂直
方向(Z方向)にスライド可能に垂直可動ヘッド5 を設
け、該ヘッド5 に対して垂直面内を回転可能に、回転ブ
ラケット6 を設ける。
2, a movable support frame 3 is provided integrally with the Y-direction sliding base 17 so as to rise outside the side edges of the mounting plate 2 and to extend parallel to the upper surface of the mounting plate 2 in the shape of an arm. .
A bracket 4 is attached to the tip of the movable support frame 3 above the mounting plate 2. A vertically movable head 5 is provided so as to be slidable in the vertical direction (Z direction) with respect to the bracket 4, and a rotary bracket 6 is provided so as to be rotatable in a vertical plane with respect to the head 5.

【0014】図3は、前記ブラケット4 と垂直可動ヘッ
ド5 との詳細を説明する正面図であり、ブラケット4 に
対して摺動スライド可能に垂直可動ヘッド5 を備える。
該垂直可動ヘッド5 は、自由回転軸5aに取り付けた楕円
カム9aを前記ブラケット4 の円形嵌合溝部4aに嵌合し、
該カム9aには該カム9aを回転させるための手動操作ハン
ドル9 を取り付けてある。図3に示すように、回転軸5a
は、操作ハンドル9 の外側先端部側が常に上方に撥ね上
げられた状態の付勢力を与えるためのバネ5bを装備して
ある。
FIG. 3 is a front view for explaining the details of the bracket 4 and the vertically movable head 5. The vertically movable head 5 is slidably slidable with respect to the bracket 4.
The vertically movable head 5 has an elliptic cam 9a attached to a free rotating shaft 5a fitted in a circular fitting groove portion 4a of the bracket 4,
A manual operation handle 9 for rotating the cam 9a is attached to the cam 9a. As shown in FIG. 3, the rotating shaft 5a
Is equipped with a spring 5b for applying an urging force in a state in which the outer end portion side of the operation handle 9 is always flipped up.

【0015】図4、前記垂直可動ヘッド5 に対しては、
該ヘッド5 に備える摺動用ガイド5bに沿って垂直方向に
高さ( 位置) 調整可能な高さ調整ブラケット5aを備え
る。該ブラケット5aは、その片側垂直スライド面に刻設
されたラックギア5eと、その側方に前記ヘッド5 に軸支
されたピニオンギア5dとを噛合させ且つ前記ピニオンギ
ア5dを、それと一体または連動の、図2に示す手動ダイ
アル5fによって適当量回転させることによって、載置板
2 からの高さを適宜調整するものである。垂直可動ヘッ
ド5 の調整ブラケット5aの前面に、回転軸5cを介してマ
イクロモーターなど源動モーター支持用の回転ブラケッ
ト6 を軸支し、該軸5cは、止めネジ5gによってその回動
を固定する。そして、前記モーター支持用の回転ブラケ
ット6 にマイクロモーターなど源動モーター7 を取り付
け固定して、該モーター7 の回転軸8 の先端に、研磨材
14を取り付けるものである。
FIG. 4, for the vertically movable head 5,
A height adjusting bracket 5a whose height (position) can be adjusted in the vertical direction along a sliding guide 5b provided on the head 5 is provided. The bracket 5a meshes a rack gear 5e engraved on one side of the vertical slide surface thereof with a pinion gear 5d pivotally supported by the head 5 on its side, and connects the pinion gear 5d integrally or in conjunction therewith. By rotating the manual dial 5f shown in FIG.
The height from 2 is adjusted appropriately. A rotary bracket 6 for supporting a source motor such as a micromotor is pivotally supported on the front surface of the adjustment bracket 5a of the vertically movable head 5 via a rotary shaft 5c, and the shaft 5c fixes its rotation by a set screw 5g. . Then, a source motor 7 such as a micromotor is attached and fixed to the rotation bracket 6 for supporting the motor, and an abrasive material is attached to the tip of the rotation shaft 8 of the motor 7.
14 is attached.

【0016】研磨材14の材質としては、パターン修正す
べきカラーフィルターなどの有機材料系、無機材料系着
色パターン組成材料の乾燥固化状態での硬度によって異
なるものであり、着色パターンの乾燥固化状態における
硬度と同等の硬さか、またはそれよりやや柔らかい材質
のポリアミド、ポリイミド系の合成樹脂を主体とする素
材が適当であるが、それよりも硬い材質を使用すること
も可能である。
The material of the abrasive 14 differs depending on the hardness of the organic pattern material such as a color filter to be pattern-corrected or the inorganic material-based coloring pattern composition material in the dry and solidified state. A material mainly composed of a polyamide or polyimide synthetic resin having a hardness equal to or slightly softer than the hardness is suitable, but a material harder than that can also be used.

【0017】なお、前記源動モーター7 の回転軸8 の取
り付け姿勢は、通常は載置板2 に対して傾斜乃至は垂直
方向に設定する。また、図2に示すように、前記摺動板
17又は前記アーム3 に一体にアーム15を取り付け、該ア
ーム15の先端嵌合部15a に水平方向に顕微鏡16を装着す
るブラケット16a の位置調整用シャフト16b を装着嵌合
し、該嵌合部15a に螺着する止めネジ15b によってシャ
フト16b を締め付けて固定する。これによって顕微鏡ブ
ラケット16a をアーム15の先端部に対して適宜位置決め
でき、載置板2 上にて、前記研磨材14と一体に水平方向
に移動させることができる。
The mounting posture of the rotary shaft 8 of the source motor 7 is usually set to be inclined or perpendicular to the mounting plate 2. In addition, as shown in FIG.
17 or the arm 15 is integrally attached to the arm 3, and the position adjusting shaft 16b of the bracket 16a for horizontally mounting the microscope 16 is fitted and fitted to the tip fitting portion 15a of the arm 15 and the fitting portion 15a. Tighten the shaft 16b with the setscrew 15b that is screwed to. As a result, the microscope bracket 16a can be appropriately positioned with respect to the tip of the arm 15 and can be moved horizontally on the mounting plate 2 together with the abrasive material 14.

【0018】図5は、図2に示す本発明装置の図面右方
向からの側面図であり、回転軸8 の先端に取り付けた研
磨材14の先端が、載置板2 上に載置固定されたカラーフ
ィルターなど修正用基板a に接触する研磨位置を、顕微
鏡16の光軸上に一致させて位置設定した状態を示す説明
図である。本発明装置の載置板2 上に基板a を固定する
ためには、図2に示すように、固定用バキューム枠体10
を使用し、例えば、四角形の該枠体10の四辺上面と、前
記載置板2 に接する下面には、バキューム吸引孔を設け
るものである。
FIG. 5 is a side view of the apparatus of the present invention shown in FIG. 2 from the right side of the drawing. The tip of the abrasive material 14 attached to the tip of the rotary shaft 8 is placed and fixed on the placing plate 2. FIG. 7 is an explanatory view showing a state in which a polishing position in contact with the correction substrate a such as a color filter is set so as to match the optical axis of the microscope 16. In order to fix the substrate a on the mounting plate 2 of the device of the present invention, as shown in FIG.
For example, vacuum suction holes are provided on the upper surfaces of the four sides of the quadrangular frame body 10 and the lower surface in contact with the mounting plate 2.

【0019】図6(a)は、上記固定用バキューム枠体
10の側面図であり、上面及び下面にはスリット状、細孔
状、あるいはそれらの組み合わせからなる複数のバキュ
ーム吸引孔10a,10b を孔設するものである。そして、該
枠体10内部に前記吸引孔10a,10b に連通するエアー流通
路11を設け、該枠体10の適宜外側に該流通路11に連通し
てエアー吸引通路( 例えばホースなど) を接続するもの
である。
FIG. 6A shows the fixing vacuum frame body.
FIG. 10 is a side view of 10, in which a plurality of vacuum suction holes 10a and 10b each having a slit shape, a pore shape, or a combination thereof are provided on the upper surface and the lower surface. An air flow passage 11 communicating with the suction holes 10a and 10b is provided inside the frame 10, and an air suction passage (for example, a hose) is connected to the flow passage 11 outside the frame 10 as appropriate. To do.

【0020】また、図6(b)は、バキューム吸引用枠
体10の内周に、吸引孔10c を設けたもので、載置板2 と
基板a によって封鎖される枠体10内を該吸引孔10c によ
って真空吸引するものである。また、本発明において
は、枠体10の上面と下面、及び枠体10の内周とにそれぞ
れ吸引孔を孔設したバキューム枠体10を用いることは可
能である。
FIG. 6 (b) shows a vacuum suction frame 10 provided with suction holes 10c on the inner circumference thereof, and the suction inside the frame 10 closed by the mounting plate 2 and the substrate a is performed. Vacuum suction is performed through the hole 10c. Further, in the present invention, it is possible to use the vacuum frame body 10 in which suction holes are provided in the upper surface and the lower surface of the frame body 10 and in the inner periphery of the frame body 10, respectively.

【0021】本発明装置における載置板2 は、透明乃至
光拡散性のガラス板、樹脂板を用い、あるいは必要によ
っては、不透明な載置板2 を用いることができる。な
お、不透明な載置板2 を用いる場合は、照明光源13は、
載置板2 の上面に配置する必要がある。
As the mounting plate 2 in the apparatus of the present invention, a transparent or light diffusing glass plate or a resin plate can be used, or if necessary, an opaque mounting plate 2 can be used. When the opaque mounting plate 2 is used, the illumination light source 13
It is necessary to place it on the upper surface of the mounting plate 2.

【0022】[0022]

【発明の効果】本発明は、載置板上に固定した着色パタ
ーンの施された基板の研磨修正を必要とする個所に、研
磨材を位置決めして、また必要に応じて顕微鏡など拡大
光学器具を用いて修正すべき個所の微細な突起、あるい
は隆起しているパターンを拡大視しながら、研磨材を修
正すべき個所に接触回転させて、着色パターンを部分的
に研磨、切削して修正することができる。
According to the present invention, the polishing material is positioned at a position where the substrate having the colored pattern fixed on the mounting plate needs to be polished and corrected, and if necessary, a magnifying optical instrument such as a microscope. Use the to magnify the fine protrusions or raised patterns on the part to be corrected, and rotate the abrasive to contact with the part to be corrected to partially polish or cut the colored pattern to correct it. be able to.

【0023】また、従来のように、部分的な修正におい
てもパターンの全面を研磨処理して修正を行なう必要が
なく、突起、隆起部分など不良個所のみを研磨して修正
するので、良好なパターン部分を研磨して損傷してしま
うことがなく、また、修正装置を小型化できる。
Further, unlike the conventional case, it is not necessary to polish the entire surface of the pattern even in the partial correction, and only the defective portion such as a protrusion or a raised portion is polished and corrected. The part is not damaged by polishing, and the correction device can be downsized.

【0024】また、本発明の基板固定用枠体によって、
載置板上に基板を円滑に吸着固定できるものである。こ
のように本発明は、微細着色パターン、微細金属膜パタ
ーンの研磨切削による修正作業に効力を発揮するもので
ある。
Further, according to the frame for fixing a substrate of the present invention,
The substrate can be smoothly attracted and fixed onto the mounting plate. As described above, the present invention is effective in the correction work of the fine colored pattern and the fine metal film pattern by polishing and cutting.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の発明装置の側面図である。FIG. 1 is a side view of a first inventive device of the present invention.

【図2】本発明装置の全体斜視図である。FIG. 2 is an overall perspective view of the device of the present invention.

【図3】本発明の第1の発明装置の一実施例における研
磨材の上下機構を説明する側面図である。
FIG. 3 is a side view illustrating an up-and-down mechanism of an abrasive in an embodiment of the first invention device of the present invention.

【図4】本発明の第1の発明装置の一実施例における研
磨材の上下位置決め機構を説明する側面図である。
FIG. 4 is a side view for explaining a polishing material vertical positioning mechanism in one embodiment of the first invention device of the present invention.

【図5】本発明装置における研磨材と拡大光学系の関係
を示す側面図である。
FIG. 5 is a side view showing the relationship between the abrasive and the magnifying optical system in the device of the present invention.

【図6】本発明の第2の発明装置における基板固定用の
バキューム吸引用枠体の説明図である。
FIG. 6 is an explanatory diagram of a vacuum suction frame body for fixing a substrate in the second invention device of the present invention.

【符号の説明】[Explanation of symbols]

a …基板 1 …装置本体フレーム 2 …支持脚 3…X
−Y方向可動支持フレーム 4 …ブラケット 4a…円形
凹部 5 …垂直可動ヘッド 5a…カム回転軸 5b…バネ
5c…モーター取付用ブラケット回転軸 5d…ピニオン
ギア 5e…ラックギア 5f…調整ダイアル 5g…止めネ
ジ 6 …モーター取付用の回転ブラケット7 …源動モー
ター 8 …モーター駆動回転軸 9 …手動装置用ハンド
ル 9a…円形カム 10…バキューム固定用枠体 11…エ
アー流通路 12…ホース 13…照明手段 14…研磨材
15…顕微鏡支持用ブラケット 16…顕微鏡
a ... Substrate 1 ... Device body frame 2 ... Support legs 3 ... X
-Y direction movable support frame 4 ... Bracket 4a ... Circular recess 5 ... Vertical movable head 5a ... Cam rotation shaft 5b ... Spring
5c… Motor mounting bracket rotating shaft 5d… Pinion gear 5e… Rack gear 5f… Adjusting dial 5g… Set screw 6… Motor mounting rotating bracket 7… Source motor 8… Motor drive rotating shaft 9… Manual device handle 9a… Circular cam 10… Vacuum fixing frame 11… Air flow path 12… Hose 13… Lighting means 14… Abrasive material
15… Microscope support bracket 16… Microscope

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】基板を載置固定可能な水平載置板と、該載
置板上をX−Y方向に移動可能な可動支持フレームに取
付けた照明光源部及び垂直方向に摺動移動可能な源動軸
先端部に取付けた回転研磨材とを備え、前記載置板上に
載置固定した前記基板面に施された微細パターンの修正
個所を前記研磨材により研磨修正可能にしたことを特徴
とする微細パターンの研磨修正装置。
1. A horizontal mounting plate on which a substrate can be mounted and fixed, an illumination light source unit mounted on a movable support frame movable on the mounting plate in the XY directions, and slidably movable in the vertical direction. A rotary abrasive material attached to the tip of the drive shaft is provided, and the correction points of the fine pattern applied to the substrate surface mounted and fixed on the mounting plate can be polished and corrected by the abrasive material. Polishing correction device for fine patterns.
【請求項2】四角形状、円形状などの適宜形状の枠体で
あって、該枠体の下面及び上面、又は枠体の内周面に適
宜数のバキューム吸引孔を設け、該枠体の下面を基板載
置板に接触させて載せ、該枠体を覆うように前記枠体の
下面と相対する枠体の上面に基板を載せた後、バキュー
ム吸引して枠体の下面と上面、又は枠体内部を真空吸引
して、載置板上に基板を固定することを特徴とする基板
固定用枠体。
2. A frame body having an appropriate shape such as a quadrangular shape and a circular shape, wherein an appropriate number of vacuum suction holes are provided on a lower surface and an upper surface of the frame body or an inner peripheral surface of the frame body, The lower surface is placed in contact with the substrate mounting plate, and the substrate is placed on the upper surface of the frame body facing the lower surface of the frame body so as to cover the frame body, and then vacuum suction is performed to suck the lower surface and the upper surface of the frame body, or A substrate fixing frame body, characterized in that the inside of the frame body is vacuum-sucked to fix the substrate on a mounting plate.
JP3195312A 1991-08-05 1991-08-05 Polishing and correcting device for fine pattern and frame body for fixing circuit board Pending JPH0534515A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3195312A JPH0534515A (en) 1991-08-05 1991-08-05 Polishing and correcting device for fine pattern and frame body for fixing circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3195312A JPH0534515A (en) 1991-08-05 1991-08-05 Polishing and correcting device for fine pattern and frame body for fixing circuit board

Publications (1)

Publication Number Publication Date
JPH0534515A true JPH0534515A (en) 1993-02-12

Family

ID=16339065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3195312A Pending JPH0534515A (en) 1991-08-05 1991-08-05 Polishing and correcting device for fine pattern and frame body for fixing circuit board

Country Status (1)

Country Link
JP (1) JPH0534515A (en)

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