JPH05343281A - Table apparatus - Google Patents

Abstract

PURPOSE:To separate a substrate to be exposed from a mask by a much smaller driving force in a table apparatus for placing the substrate to be exposed for a contact type or proximity type exposure unit for transferring a pattern of a mask formed with a predetermined pattern to the substrate to be exposed. CONSTITUTION:A holding base 7 for placing a substrate 20 to be exposed is so inclined as to separate it gradually from its one end from a mask 21, thereby separating the substrate 20 to be exposed from the mask 21 by a much smaller force.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a table device, and is particularly suitable for being applied to a table device of a contact type or proximity type exposure apparatus.

[0002]

2. Description of the Related Art Conventionally, in a contact type or proximity type exposure apparatus, irradiation light from a light source is radiated onto an exposure target substrate placed on a holding table.
A predetermined pattern is formed by exposure on the substrate to be exposed.

At this time, a mask on which an exposure pattern is formed is brought into close contact with the exposed surface of the substrate to be exposed or is arranged with a gap of about several tens [μm] between the mask and the mask pattern. It is designed to be transferred onto an exposed substrate.

[0004]

By the way, in this type of exposure apparatus, when the exposed substrate placed on the holding table is removed after the exposure is completed, the holding table is moved in the direction perpendicular to the mask surface. By doing so, the substrate to be exposed and the mask are separated.

However, since the gap between the substrate to be exposed and the mask is zero or minute, when the holder is moved in the direction perpendicular to the mask surface, the space between the substrate to be exposed and the mask placed on the holder is increased. There is a problem that the substrate to be exposed and the mask are attracted by the static electricity or the intervening air generated on the substrate and it is difficult to separate them from each other.

In this case, if the driving force for moving the holding table is increased to separate the exposure target substrate from the mask, the suction force disappears when the exposure target substrate is separated from the mask. The holding table is moved with an excessive driving force, and it becomes difficult to stop the holding table within the moving area of the holding table (overshoot), which causes a problem of damaging the holding table.

The present invention has been made in consideration of the above points, and it is an object of the present invention to propose a table device capable of separating the substrate to be exposed from the mask by an even smaller driving force.

[0008]

In order to solve such a problem, in the first invention, exposure of a contact system or a proximity system in which a pattern of a mask 21 on which a predetermined pattern is formed is transferred onto a substrate 20 to be exposed. Of the device,
In the table device 1 on which the substrate to be exposed 20 is placed, a holding table 7 on which the substrate to be exposed 20 is placed, and a support table 6 which rotatably supports an end portion of the holding table 7 by a turning shaft 6B. And a drive means 10 for rotating the holding table 7 in the direction opposite to the mask about the rotating shaft 6B.

Further, in the second invention, the driving means 10
Is a rotary actuator 12 fixed to the support base 6,
Eccentric cam 13 rotated by a rotary actuator 12
And the rotation speed of the holding table 7 is variable.

[0010]

By tilting the holding table 7 using the eccentric cam 13, the exposed substrate 20 placed on the holding table 7 is
The mask 21 that is in close contact with the exposed surface of the substrate 20 to be exposed or that is arranged on the exposed surface with a slight gap therebetween is gradually separated, and can be easily separated with a smaller force.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail with reference to the drawings.

In FIG. 1, reference numeral 1 denotes a table apparatus as a whole, and an X stage 3 is mounted on a base 2 by a guide 2A of the base 2 so that the X stage 3 can be finely moved in the direction of arrow X. A Y stage 4 is mounted on the X stage 3 and can be moved finely in the arrow Y direction by a guide 3A of the X stage 3. A Z stage 5 is mounted on the Y stage 4 and is capable of coarse and fine movement in the arrow Z direction.
A support base 6 is mounted on the Z stage 5, and a holding base 7 is mounted on a protrusion 6A of the support base 6 via a rotary shaft 6B.
7B is pivotally supported at its end. Accordingly, the holding table 7 has an end portion 7C indicated by an arrow R with the rotation shaft 6B as a rotation center.
It can be rotated in the direction indicated by or in the opposite direction.

A leveling table 16 is mounted on the holding table 7, and a holder 17 is mounted on the leveling table 16. Further, the exposed substrate 20 is mounted on the holder 17 by using a vacuum suction method.

A mask 21 is provided in close contact with the exposed surface of the substrate 20 to be exposed, or a mask 21 is provided with a gap of several tens [μm] therebetween, and irradiation light from a light source (not shown) is exposed through the mask 21. By irradiating the exposed surface of the exposure substrate 20,
A predetermined pattern can be exposed and formed on the exposed surface.

A drive means 10 for rotating the holding table 7 is fixed to the end of the supporting table 6. The drive means 10 is composed of a rotary actuator 12 and an eccentric cam 13 which are electrically driven, and by rotating the rotary actuator 12, the eccentric cam 13 can be rotated via an output rotary shaft 14. it can.

Further, as shown in FIG. 2, the eccentric cam 13 is formed with a circular cam groove 13A.
A bearing 7A having a rotation center axis fixed to a holding base 7 is slidably engaged with 3A.

Further, as shown in FIG. 3, the rotation center O ₂ of the eccentric cam 13 is displaced from the center O _{1 of} the circle formed by the cam groove 13A by a predetermined amount. Accordingly, by rotating the eccentric cam 13, the bearing 7A slides in the cam groove 13A, whereby the end portion 7C of the holding table 7 is moved in the direction indicated by the arrow R or in accordance with the rotation direction of the eccentric cam 13. It rotates in the opposite direction.

In the above configuration, the table device 1 is configured to hold the exposed substrate 20 held by the holder 17 by suction after the exposure process is completed.
Enter the process to remove from. In this case, the exposed substrate 2
It is necessary to separate the substrate 20 to be exposed from the mask 21 that is closely attached to the exposed surface of 0 or fixed with a gap of several tens of [μm].

In this case, the substrate to be exposed 20 and the mask 21
Since the spaces are adhered to each other or provided with a minute gap therebetween, the exposed substrate 20 is attracted to the mask 21 by static electricity or intervening air between the exposed substrate 20 and the mask 21, In the table device 1,
By rotating the holding table 7 in the direction indicated by the arrow R by the driving means 10 about the rotation center axis 6B, the holding table 7 can be inclined with respect to the mask 21.

Accordingly, the substrate 20 to be exposed is gradually separated from the end portion 7C with respect to the mask 21, thereby avoiding the adsorption phenomenon due to static electricity or intervening air, and the substrate 20 to be exposed from the mask 21 with a smaller force. It can be separated. Further, by rotating the holding table 7 by means of the rotary actuator 12 and the eccentric cam 13, the rotation speed of the holding table 7 can be made variable. Therefore, the exposed substrate 2
In the initial state in which 0 is separated from the mask 21, the holding table 7
The exposed substrate 20 can be easily separated from the mask 21 by increasing the rotation speed of. At this time, even if the eccentric cam 13 is rotated more than necessary, the holding table 7 can be prevented from colliding with the support table 6 by rotating the holding table 7 in the vertical direction in the rotation region. ..

Further, unlike the conventional case, since a large force that overcomes the adsorption phenomenon when vertically separating is not required, the holder 7 is tilted and the substrate 20 to be exposed is separated from the mask 21, The substrate 20 to be exposed can be removed by lowering the Z stage 5 at a low speed. Therefore, it is possible to avoid an overshoot in which the Z stage 5 moves to the end of the moving area as in the related art, and thus it is possible to prevent the Z stage 5 from being damaged by the overshoot.

According to the above construction, the drive means 10 separates the substrate 20 to be exposed while inclining it from the mask 21, thereby preventing damage to the Z stage 5 due to overshoot. You can

By the way, since the rotary shaft 6B of the holding table 7 is arranged outside the end portion of the substrate 20 to be exposed, the holding table 7 is formed.
It is possible to prevent the end portion of the exposed substrate 20 from coming into contact with the mask 21 when tilted, so that the tilt amount is not limited.

[0024]

As described above, according to the present invention, the holder for mounting the substrate to be exposed is inclined from one end thereof so as to be gradually separated from the mask. It can be separated from the mask.

[Brief description of drawings]

FIG. 1 is a perspective view showing an embodiment of a table device according to the present invention.

FIG. 2 is a side view for explaining a case where a holding table is tilted by an eccentric cam.

FIG. 3 is a sectional view showing a configuration of an eccentric cam.

[Explanation of symbols]

1 ... table device, 5 ... Z stage, 6 ... support base, 6B ... rotating shaft, 7 ... holding base, 7A ... bearing, 10 ... driving means, 12 ... rotary actuator,
13 ... Eccentric cam, 13A ... Guide groove, 20 ... Exposed substrate, 21 ... Mask.

Claims (2)

[Claims] 1. A table device for placing the substrate to be exposed in a contact type or proximity type exposure device for transferring the pattern of a mask having a predetermined pattern formed on the substrate to be exposed. A holding table on which a substrate is placed, a support table that rotatably supports an end portion of the holding table with a rotating shaft, and a direction opposite to the mask with the holding table around the rotating shaft. A table device, comprising: 2. The drive means comprises a rotary actuator fixed to the support base and an eccentric cam rotated by the rotary actuator, and the rotational speed of the holding base is variable. The table device according to claim 1.