JPH05331174A - 7-acyl-3-substituted carbamoyloxycephem compound and its production - Google Patents

7-acyl-3-substituted carbamoyloxycephem compound and its production

Info

Publication number
JPH05331174A
JPH05331174A JP3040747A JP4074791A JPH05331174A JP H05331174 A JPH05331174 A JP H05331174A JP 3040747 A JP3040747 A JP 3040747A JP 4074791 A JP4074791 A JP 4074791A JP H05331174 A JPH05331174 A JP H05331174A
Authority
JP
Japan
Prior art keywords
group
compound
lower alkyl
salt
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3040747A
Other languages
Japanese (ja)
Inventor
Shigeto Negi
茂人 根木
Motosuke Yamanaka
基資 山中
Kamamasa Katsu
鎌政 勝
Isao Sugiyama
功 杉山
Takeki Komatsu
雄毅 小松
Atsushi Kamata
厚 鎌田
Akihiko Tsuruoka
明彦 鶴岡
Yoshimasa Machida
善正 町田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eisai Co Ltd
Original Assignee
Eisai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eisai Co Ltd filed Critical Eisai Co Ltd
Priority to JP3040747A priority Critical patent/JPH05331174A/en
Priority to IL9989891A priority patent/IL99898A/en
Priority to IL113744A priority patent/IL113744A/en
Priority to NZ240441A priority patent/NZ240441A/en
Priority to CA002054895A priority patent/CA2054895C/en
Priority to FI915245A priority patent/FI915245A/en
Priority to JP3317319A priority patent/JP2867192B2/en
Priority to SU915010276A priority patent/RU2091378C1/en
Priority to AU87096/91A priority patent/AU654300B2/en
Priority to CN91109453A priority patent/CN1038589C/en
Priority to AT91119065T priority patent/ATE200492T1/en
Priority to NO914375A priority patent/NO302417B1/en
Priority to EP00121333A priority patent/EP1074553A1/en
Priority to DK91119065T priority patent/DK0484966T3/en
Priority to KR1019910019872A priority patent/KR0166378B1/en
Priority to YU178391A priority patent/YU48399B/en
Priority to PT99468A priority patent/PT99468B/en
Priority to AT96116684T priority patent/ATE200291T1/en
Priority to EP91119065A priority patent/EP0484966B1/en
Priority to ES91119065T priority patent/ES2155433T3/en
Priority to HU520/91A priority patent/HU221429B/en
Priority to DE69132580T priority patent/DE69132580T2/en
Priority to EP00121335A priority patent/EP1074554A3/en
Priority to DE69132578T priority patent/DE69132578T2/en
Priority to EP96116684A priority patent/EP0761671B1/en
Priority to AU50571/93A priority patent/AU671310B2/en
Publication of JPH05331174A publication Critical patent/JPH05331174A/en
Priority to US08/209,484 priority patent/US5559225A/en
Priority to US08/393,074 priority patent/US5563265A/en
Priority to IL11374495A priority patent/IL113744A0/en
Priority to US08/463,353 priority patent/US5604217A/en
Priority to US08/464,341 priority patent/US5741902A/en
Priority to CN96102563A priority patent/CN1056847C/en
Priority to US08/671,342 priority patent/US5587473A/en
Priority to JP09212687A priority patent/JP3143829B2/en
Priority to GR20010401008T priority patent/GR3036157T3/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Cephalosporin Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Abstract

PURPOSE:To provide a new compound having a broad antibacterial spectrum, giving powerful antibacterial activity on esp. influenza virus, useful for antibacterial agents to be used in the form of injection or through oral route. CONSTITUTION:The compound of formula I [R<1> is lower alkyl, lower alkoxy- substituted lower alkyl or halogen-substituted lower alkyl; R<2> is (protected) carboxyl], e.g. 7-[(Z)-2-(2-aminothiazol-4-yl)-2-hydroxyiminoacetamido)-3-N- methylcarbamoyloxymethyl-3-cephem-carboxylic acid sodium salt. The compound of the formula I can be obtained by eliminating the protecting group in a compound which is obtained by reaction of a compound of formula II with a compound of formula III [R<3> is (protected) hydroxyl group; R<4> is (protected) amino] in the presence of a condensation agent such as N,N'-dicyclohexylcarbodiimide in a solvent such as THF.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は医薬として優れた作用を
有する新規な抗菌剤3−置換カルバモイルオキシメチル
−3−セフェム誘導体およびその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel antibacterial agent 3-substituted carbamoyloxymethyl-3-cephem derivative having excellent action as a medicine and a method for producing the same.

【0002】[0002]

【従来の技術】現在、幾つかの種類の半合成セファロス
ポリンが市販され各種感染性疾病の治療剤として用いら
れている。これまで特開昭53−34794号公報には
一般式
2. Description of the Related Art At present, several kinds of semi-synthetic cephalosporins are commercially available and used as therapeutic agents for various infectious diseases. Up to now, the general formula has been disclosed in JP-A-53-34794.

【化4】 (式中、Yは水素または求核性化合物機基を示す。)で
表わされる7−アシルアミノセフェム誘導体が開示され
ている。また特公平1−44714号公報には下記一般
式で示される化合物が開示されている。
[Chemical 4] (In the formula, Y represents hydrogen or a nucleophilic compound functional group.), And a 7-acylaminocephem derivative is disclosed. In addition, Japanese Patent Publication No. 1-47141 discloses a compound represented by the following general formula.

【化5】 (ここで、R6 はアミノ基またはアシルアミノ基、R7
はカルボキシル基または保護されたカルボキシル基、 アミノ(低級)アルキルアミノ基、低級アルキルで置換
されていてもよい1〜4個の窒素原子を含有する飽和5
もしくは6員複素環式(低級)アルキルアミノ基または
低級アルキルもしくはヒドロキシ(低級)アルキルで置
換されていてもよい2〜4個の窒素原子を含有する飽和
5もしくは6員複素環式基、Xは−S−ま しかし、これはいずれも十分な抗菌力が得られておら
ず、さらに強い抗菌力を有するセフェム系化合物の開発
が望まれている。
[Chemical 5] (Here, R 6 is an amino group or an acylamino group, R 7
Is a carboxyl group or a protected carboxyl group, Amino (lower) alkylamino group, saturated 5 containing 1 to 4 nitrogen atoms optionally substituted by lower alkyl
Or a 6-membered heterocyclic (lower) alkylamino group or a saturated 5- or 6-membered heterocyclic group containing 2 to 4 nitrogen atoms which may be substituted with lower alkyl or hydroxy (lower) alkyl, X is -S- However, none of them have obtained sufficient antibacterial activity, and development of a cephem compound having a stronger antibacterial activity is desired.

【0003】[0003]

【発明が解決しようとする課題】以上のように感染症の
治療には抗生物質が有効であるが、本発明の目的はさら
に強い抗菌力、特にインフルエンザ菌に対し強い活性を
有するセフェム系化合物を提供することにある。
As described above, antibiotics are effective for the treatment of infectious diseases, but the object of the present invention is to provide a cephem compound having a stronger antibacterial activity, especially a strong activity against Haemophilus influenzae. To provide.

【0004】[0004]

【課題を解決するための手段】本発明者らは有用な抗菌
力を有するセファロスポリン系化合物の開発を目指し鋭
意研究の結果、7位に2−(2−アミノチアゾール−2
−ハイドロキシイミノ)酢酸基を有し3位にモノ置換カ
ルバモイルオキシ基を有する新規セフェム誘導体が強い
抗菌力を発現することを見い出し本発明を完成させるに
至った。
Means for Solving the Problems As a result of earnest research aimed at developing a cephalosporin compound having a useful antibacterial activity, the present inventors have found that 2- (2-aminothiazole-2) at the 7-position.
The inventors have found that a novel cephem derivative having a (hydroxyimino) acetic acid group and a mono-substituted carbamoyloxy group at the 3-position exhibits a strong antibacterial activity, and completed the present invention.

【0005】即ち、本発明は一般式(I)That is, the present invention has the general formula (I)

【化6】 (式中、R1 は低級アルキル基、低級アルコキシ基置換
低級アルキル基またはハロゲン原子置換低級アルキル
基、R2 はカルボキシ基または保護されたカルボキシ基
を意味する。)で表わされる化合物および医薬として許
容されるその塩、さらにその製造法に関するものであ
る。
[Chemical 6] (Wherein R 1 represents a lower alkyl group, a lower alkoxy group-substituted lower alkyl group or a halogen atom-substituted lower alkyl group, and R 2 represents a carboxy group or a protected carboxy group) and a pharmaceutically acceptable compound. And a salt thereof, and a method for producing the same.

【0006】上記一般式(I)においてR1 の定義にみ
られる低級アルキル基とは炭素1〜4の直鎖状もしくは
分枝鎖状のアルキル基、例えば、メチル、エチル、n−
プロピル、イソプロピル、n−ブチル、イソブチル、s
ec−ブチルおよびtert−ブチルなどが挙げられ好
ましくはメチル、エチルなどが挙げることができる。
In the above general formula (I), the lower alkyl group found in the definition of R 1 is a linear or branched alkyl group having 1 to 4 carbon atoms, for example, methyl, ethyl or n-.
Propyl, isopropyl, n-butyl, isobutyl, s
Examples thereof include ec-butyl and tert-butyl, preferably methyl, ethyl and the like.

【0007】R1 の定義にみられる低級アルコキシ基と
は上記に記載した低級アルキル基から誘導されるアルコ
キシ基が挙げられ、低級アルコキシ置換低級アルキル基
の好ましい例として2−メトキシエチル、2−エトキシ
エチルなどが挙げられる。アルキル基に置換しえるハロ
ゲン原子とはフッ素、塩素、ヨウ素などが挙げられ、好
ましくはフッ素原子であり置換されてよい数は1〜3で
ある。
The lower alkoxy group in the definition of R 1 includes an alkoxy group derived from the above lower alkyl group, and preferable examples of the lower alkoxy-substituted lower alkyl group include 2-methoxyethyl and 2-ethoxy. Examples thereof include ethyl. Examples of the halogen atom that can be substituted on the alkyl group include fluorine, chlorine, iodine, etc., preferably a fluorine atom, and the number of which may be substituted is 1 to 3.

【0008】R2 のカルボキシル基の保護基としては、
メチル、エチル、t−ブチルなどの低級アルキル基;p
−メトキシベンジル、p−ニトロベンジル、3,4−ジ
メトキシベンジル、ジフェニルメチル、トリチル、フェ
ネチルなどの置換基を有していてもよいフェニル基で置
換された低級アルキル基;2,2,2−トリクロロエチ
ル、2−ヨードエチルなどのハロゲン化低級アルキル
基;ピバロイルオキシメチル、アセトキシメチル、プロ
ピオニルオキシメチル、ブチリルオキシメチル、バレリ
ルオキシメチル、1−アセトキシエチル、2−アセトキ
シエチル、1−ピバロイルオキシエチル、2−ピバロイ
ルオキシエチルなどの低級アルカノイルオキシ低級アル
キル基;パルミトイルオキシエチル、ヘプタベカノイル
オキシメチル、1−パルミトイルオキシエチルなどの高
級アルカノイルオキシ低級アルキル基;メトキシカルボ
ニルオキシメチル、1−ブトキシカルボニルオキシエチ
ル、1−t−ブトキシカルボニルオキシエチル、1−エ
トキシカルボニルオキシエチル、1−イソプロポキシカ
ルボニルオキシエチルなどの低級アルコキシカルボニル
オキシ低級アルキル基;カルボキシメチル、2−カルボ
キシエチルなどのカルボキシ低級アルキル基;3−フタ
リジルなどの複素環基;4−グリシルオキシベンゾイル
オキシメチル、4−〔N−(t−ブトキシカルボニル)
グリシルオキシ〕ベンゾイルオキシメチルなどの置換基
を有していてもよいベンゾイルオキシ低級アルキル基;
(5−メチル−2−オキソ−1,3−ジオキソレン−4
−イル)メチルなどの(置換ジオキソレン)低級アルキ
ル基;1−(シクロヘキシルアセチルオキシ)エチルな
どのシクロアルキル置換低級アルカノイルオキシ低級ア
ルキル基、1−(シクロヘキシルオキシカルボニルオキ
シ)エチルなどのシクロアルキルオキシカルボニルオキ
シ低級アルキル基等が挙げられる。要するに、何らかの
手段で分解されてカルボン酸となり得る保護基であれば
いかなる基でもよい。
The protecting group for the carboxyl group of R 2 is
Lower alkyl group such as methyl, ethyl, t-butyl; p
-Methoxybenzyl, p-nitrobenzyl, 3,4-dimethoxybenzyl, diphenylmethyl, trityl, phenethyl and the like, a lower alkyl group substituted by a phenyl group which may have a substituent; 2,2,2-trichloro Halogenated lower alkyl groups such as ethyl and 2-iodoethyl; pivaloyloxymethyl, acetoxymethyl, propionyloxymethyl, butyryloxymethyl, valeryloxymethyl, 1-acetoxyethyl, 2-acetoxyethyl, 1-pivalo Lower alkanoyloxy lower alkyl groups such as yloxyethyl and 2-pivaloyloxyethyl; higher alkanoyloxy lower alkyl groups such as palmitoyloxyethyl, heptabecanoyloxymethyl, 1-palmitoyloxyethyl; methoxycarbonyloxymethyl, -Lower alkoxycarbonyloxy lower alkyl groups such as butoxycarbonyloxyethyl, 1-t-butoxycarbonyloxyethyl, 1-ethoxycarbonyloxyethyl, 1-isopropoxycarbonyloxyethyl; carboxylower such as carboxymethyl and 2-carboxyethyl Alkyl group; Heterocyclic group such as 3-phthalidyl; 4-glycyloxybenzoyloxymethyl, 4- [N- (t-butoxycarbonyl)
A benzoyloxy lower alkyl group which may have a substituent such as glycyloxy] benzoyloxymethyl;
(5-methyl-2-oxo-1,3-dioxolen-4
(Substituted dioxolene) lower alkyl group such as -yl) methyl; cycloalkyl-substituted lower alkanoyloxy lower alkyl group such as 1- (cyclohexylacetyloxy) ethyl, cycloalkyloxycarbonyloxy such as 1- (cyclohexyloxycarbonyloxy) ethyl Examples include lower alkyl groups. In short, any group may be used as long as it is a protective group that can be decomposed into a carboxylic acid by some means.

【0009】また、医薬として許容される塩としては、
例えばナトリウム塩、カリウム塩などのアルカリ金属
塩;アンモニウム塩;テトラエチルアンモニウム塩、ベ
タイン塩などの4級アンモニウム塩;カルシウム塩、マ
グネシウム塩などのアルカリ土類金属塩;塩酸塩、臭化
水素酸塩、沃化水素酸塩、硫酸塩、炭酸塩、重炭酸塩な
どの無機酸塩;酢酸塩、マレイン酸塩、乳酸塩、酒石酸
塩などの有機カルボン酸塩;メタンスルホン酸塩、ヒド
ロキシメタンスルホン酸塩、ヒドロキシエタンスルホン
酸塩、タウリン塩、ベンゼンスルホン酸塩、トルエンス
ルホン酸塩などの有機スルホン酸塩;アルギニン塩、リ
ジン塩、セリン塩、アスパラギン酸塩、グルタミン酸
塩、グリシン塩などのアミノ酸塩;トリメチルアミン
塩、トリエチルアミン塩、ピリジン塩、プロカイン塩、
ピコリン塩、ジシクロヘキシルアミン塩、N,N’−ジ
ベンジルエチレンジアミン塩、N−メチルグルカミン
塩、ジエタノールアミン塩、トリエタノールアミン塩、
トリス(ヒドロキシメチルアミノ)メタン塩、フェネチ
ルベンジルアミン塩などのアミン塩などが挙げられる。
The pharmaceutically acceptable salt is
For example, alkali metal salts such as sodium salts and potassium salts; ammonium salts; quaternary ammonium salts such as tetraethylammonium salts and betaine salts; alkaline earth metal salts such as calcium salts and magnesium salts; hydrochlorides, hydrobromides, Inorganic acid salts such as hydroiodide, sulfate, carbonate, bicarbonate; organic carboxylates such as acetate, maleate, lactate, tartrate; methanesulfonate, hydroxymethanesulfonate Organic sulfonates such as hydroxyethane sulfonate, taurine salt, benzene sulfonate and toluene sulfonate; amino acid salts such as arginine salt, lysine salt, serine salt, aspartate salt, glutamate salt and glycine salt; trimethylamine Salt, triethylamine salt, pyridine salt, procaine salt,
Picoline salt, dicyclohexylamine salt, N, N'-dibenzylethylenediamine salt, N-methylglucamine salt, diethanolamine salt, triethanolamine salt,
Examples include amine salts such as tris (hydroxymethylamino) methane salt and phenethylbenzylamine salt.

【0010】本発明化合物は次に示す方法によって製造
することができる。一般式(IV)
The compound of the present invention can be produced by the following method. General formula (IV)

【化7】 (式中、R5 は水素、低級アルキル基、ハロゲン置換低
級アルキル基、低級アルコキシ基、ハロゲン置換低級ア
ルコキシ基、フェニル低級アルキル基、チエニル低級ア
ルキル基、フェニル低級アルコキシ基、R2 はカルボキ
シ基または保護されたカルボキシ基を意味する。)で表
わされる化合物あるいはそれらの塩と、N,N’−カル
ボニルジイミダゾールで反応させ活性誘導体へと導いた
[Chemical 7] (In the formula, R 5 is hydrogen, a lower alkyl group, a halogen-substituted lower alkyl group, a lower alkoxy group, a halogen-substituted lower alkoxy group, a phenyl lower alkyl group, a thienyl lower alkyl group, a phenyl lower alkoxy group, and R 2 is a carboxy group or (Which means a protected carboxy group) or a salt thereof with N, N'-carbonyldiimidazole to give an active derivative.

【化8】 (式中、R1 は低級アルキル基、低級アルコキシ基置換
低級アルキル基またはハロゲン原子置換低級アルキル基
を意味する。)で表わされる化合物またはその塩と反応
させ、必要によりスルホキシド化、スルホキシドの還元
を行い、R5 のアシル基もしくはアルコキシカルボニル
基を除去して、一般式(II)
[Chemical 8] (In the formula, R 1 represents a lower alkyl group, a lower alkoxy group-substituted lower alkyl group or a halogen atom-substituted lower alkyl group.) Or a salt thereof, and if necessary, sulfoxidation or sulfoxide reduction is carried out. Then, the acyl group or alkoxycarbonyl group of R 5 is removed to give the compound of the general formula (II)

【化9】 (式中、R1 およびR2 は前記の定義に同じ)で表わさ
れる化合物またはその塩を得、さらに一般式(III )
[Chemical 9] (Wherein R 1 and R 2 are the same as defined above) or a salt thereof, and a compound of the general formula (III)

【化10】 (式中、R3 は水酸基または保護された水酸基、R4
アミノ基または保護されたアミノ基を意味する。)で表
わされる化合物と縮合剤存在下反応させアシル化する。
縮合剤としてはカーボジイミド(N,N’−ジシクロヘ
キシルカーボジイミドなど)、カルボキシ化合物(カル
ボニルジイミダゾールなど)、イソキサゾリウ塩、アシ
ルアミノ化合物(2−エトキシ−1−エトキシカルボニ
ル1,2−ジヒドロキシキノリンなど)などが適宜使用
することができる。
[Chemical 10] (In the formula, R 3 represents a hydroxyl group or a protected hydroxyl group, and R 4 represents an amino group or a protected amino group.) The compound is reacted in the presence of a condensing agent for acylation.
Examples of the condensing agent include carbodiimide (N, N'-dicyclohexylcarbodiimide, etc.), carboxy compound (carbonyldiimidazole, etc.), isoxazolyu salt, acylamino compound (2-ethoxy-1-ethoxycarbonyl 1,2-dihydroxyquinoline, etc.), etc. It can be used as appropriate.

【0011】また、化合物(III )の反応性酸誘導体を
用いる場合にはその反応性酸誘導体としては酸無水物、
酸ハロゲン化物および活性エステル体が挙げられる。酸
無水物としては対称酸無水物、混合酸無水物が挙げら
れ、混合酸無水物は鉱酸(リン酸、硫酸、炭酸など)、
有機酸(アルカン酸、アラルカン酸、スルホン酸など)
との混合酸無水物を使用すればよい。活性エステル体と
してはN−ヒドロキシスクシンイミド、N−ヒドロキシ
フタルイミドなどとのN−ヒトロキシ化合物とのエステ
ル、チオールエステル(アラルキルチオールエステル、
異項環チオールエステルなど)およびアリールエステル
(フェニルエステル、ハロフェニルエステル、ニトロフ
ェニルエステルなど)などを適宜使用することができ
る。上記反応はジクロロメタン、クロロホルム、テトラ
ハイドロフラン、アセトン、酢酸エチル、メタノール、
エタノール、ジメチルスルホキシド、N,N−ジメチル
ホルムアミド、ベンゼン、トルエン、ヘキサン等の不活
性溶媒中、反応温度−50〜+50℃で行うことができ
る。
When a reactive acid derivative of the compound (III) is used, the reactive acid derivative is an acid anhydride,
Examples include acid halides and active ester forms. The acid anhydrides include symmetrical acid anhydrides and mixed acid anhydrides, and the mixed acid anhydrides include mineral acids (phosphoric acid, sulfuric acid, carbonic acid, etc.),
Organic acids (alkanoic acid, aralkanic acid, sulfonic acid, etc.)
A mixed acid anhydride with and may be used. As the active ester form, N-hydroxysuccinimide, N-hydroxyphthalimide and other N-humanroxy compound esters, thiol esters (aralkyl thiol ester,
Heterocyclic thiol ester, etc.) and aryl ester (phenyl ester, halophenyl ester, nitrophenyl ester, etc.) can be appropriately used. The reaction is dichloromethane, chloroform, tetrahydrofuran, acetone, ethyl acetate, methanol,
The reaction can be performed in an inert solvent such as ethanol, dimethyl sulfoxide, N, N-dimethylformamide, benzene, toluene, hexane at a reaction temperature of -50 to + 50 ° C.

【0012】また、アミノ基の保護基としては、例えば
ホルミル基、アセチル基、クロロアセチル基、ジクロロ
アセチル基、フェニルアセチル基、チエニルアセチル
基、t−ブトキシカルボニル基、ベンジルオキシカルボ
ニル基、トリチル基、p−メトキシベンジル基、ジフェ
ニルメチル基、ベンジリデン基、p−ニトロベンジリデ
ン基、m−ニトロベンジリデン基、3,4−メチレンジ
オキシベンジリデン基、m−クロロベンジリデン基など
があげられる。ハイドロキシイミノ基の保護基としては
トリチル基、テトラハイドロピラニル基などがあげられ
る。
Examples of the amino group-protecting group include formyl group, acetyl group, chloroacetyl group, dichloroacetyl group, phenylacetyl group, thienylacetyl group, t-butoxycarbonyl group, benzyloxycarbonyl group, trityl group, Examples thereof include p-methoxybenzyl group, diphenylmethyl group, benzylidene group, p-nitrobenzylidene group, m-nitrobenzylidene group, 3,4-methylenedioxybenzylidene group and m-chlorobenzylidene group. Examples of the protecting group for the hydroxyimino group include a trityl group and a tetrahydropyranyl group.

【0013】反応生成物は用いた保護基の種類に応じて
アミノ基、水酸基、カルボキシ基の脱保護を行い、一般
式(I)
The reaction product is subjected to deprotection of amino group, hydroxyl group and carboxy group depending on the type of protective group used, and then the compound of the general formula (I)

【化11】 (式中、R1 、R2 は前記の定義に同じ。)で表わされ
る化合物およびその医薬として許容される塩を得ること
ができる。またR4 がカルボキシ基あるいはその塩の時
は、必要に応じてアルカリ金属塩を加え、公知による方
法でそのアルコール反応性誘導体でエステル化を行い式
〔I〕で表わされる化合物およびその医薬として許容さ
れる塩を得ることができる。
[Chemical 11] (In the formula, R 1 and R 2 are the same as defined above.) And a pharmaceutically acceptable salt thereof can be obtained. When R 4 is a carboxy group or a salt thereof, an alkali metal salt is added, if necessary, and esterified by an alcohol-reactive derivative thereof by a known method to give a compound represented by the formula [I] and a pharmaceutically acceptable salt thereof. The salt can be obtained.

【0014】本発明化合物は優れた抗菌活性を有しR2
が保護されたカルボキシ基を有する化合物は、特に経口
用抗菌剤として有用である。本発明化合物を抗菌剤とし
て使用する際には、通常1日100mg〜5gを1〜4
回に分けて、経口あるいは非経口的に投与することがで
きる。なお、その投与量は年齢、症状によって増減され
る。製剤としては錠剤、顆粒剤、散剤、カプセル剤、シ
ロップ剤、液剤などがあげられる。これらは、公知の製
剤担体を加え、常法により製造することができる。
The compounds of the present invention have excellent antibacterial activity and R 2
A compound having a protected carboxy group is particularly useful as an oral antibacterial agent. When the compound of the present invention is used as an antibacterial agent, it is usually 100 mg to 5 g per day
It can be administered orally or parenterally in divided doses. The dose may be adjusted depending on age and symptoms. The preparation includes tablets, granules, powders, capsules, syrups, liquids and the like. These can be produced by a conventional method by adding a known pharmaceutical carrier.

【0015】[0015]

【発明の効果】次に、本発明化合物の有用性を示すため
に、下記実施例で得られた代表的な本発明化合物の各種
細菌に対する最少発育阻止濃度(MIC)測定結果を表
1に示す。
In order to show the usefulness of the compound of the present invention, Table 1 shows the results of measurement of the minimum inhibitory concentration (MIC) of various representative compounds of the present invention obtained in the following Examples against various bacteria. ..

【表1】 表1に示す如く本発明の化合物は優れた抗菌活性を、特
にヘモフィルス・インフルエンザ菌に強い抗菌力を有す
る有用な化合物である。
[Table 1] As shown in Table 1, the compound of the present invention is a useful compound having an excellent antibacterial activity, particularly a strong antibacterial activity against Haemophilus influenzae.

【0016】[0016]

【実施例】次に実施例を示し、本発明を更に詳しく説明
するが、本発明はこれらの実施例に限定されるものでは
ない。なお、本発明化合物を製造する際の出発物質は製
造例として掲げた。なお式中、Trはトリチル基をBH
はベンツヒドリル基を示す。
EXAMPLES The present invention will now be described in more detail by way of examples, which should not be construed as limiting the invention thereto. The starting materials for producing the compound of the present invention are listed as Production Examples. In the formula, Tr represents a trityl group BH
Represents a benzhydryl group.

【0017】製造例1 7−〔(Z)−2−(2−トリチルアミノチアゾール−
4−イル)−2−トリチルオキシイミノアセトアミド〕
−3−N−メチルカルバモイルオキシメチル−3−セフ
ェム−4−カルボン酸ベンズヒドリル
Production Example 1 7-[(Z) -2- (2-tritylaminothiazole-
4-yl) -2-trityloxyiminoacetamide]
-3-N-Methylcarbamoyloxymethyl-3-cephem-4-carboxylic acid benzhydryl

【化12】 7−ホルムアミド−3−モノメチルカルバモイルオキシ
メチル−3−セフェム−4−カルボン酸ベンズヒドリル
(3.54g)にテトラヒドロフラン(40ml)、メ
タノール(40ml)を加える。次いで、室温で濃塩酸
(3.6ml)を加え、同温で3時間撹拌する。反応液
を減圧下留去し、得られた残渣を酢酸エチルで希釈し、
飽和重曹水、飽和食塩水で洗浄、無水硫酸マグネシウム
で乾燥後、溶媒を留去する。得られた残渣に、別途に2
−トリチルオキシイミノ−2−(2−トリチルアミノチ
アゾール−4−イル)酢酸(4.9g)、ジシクロヘキ
シルカルボジイミド(1.52g)、1−ヒドロキシベ
ンゾトリアゾール(1.0g)をテトラヒドロフラン
(30ml)に加え30分間撹拌した溶液を室温にて加
える。同温で一晩撹拌した後、反応液を濾過し、濾液を
酢酸エチル水で希釈する。さらに1N塩酸、飽和重曹
水、飽和食塩水で洗浄、無水硫酸マグネシウムで乾燥、
溶媒を留去する。得られた残渣をカラムクロマトグラフ
ィー(SiO2 、ベンゼン: 酢酸エチル=6: 1)で精
製すると表記化合物(5.39g、収率66%)を得
た。
[Chemical formula 12] Tetrahydrofuran (40 ml) and methanol (40 ml) are added to benzhydryl 7-formamido-3-monomethylcarbamoyloxymethyl-3-cephem-4-carboxylic acid (3.54 g). Then, concentrated hydrochloric acid (3.6 ml) is added at room temperature, and the mixture is stirred at the same temperature for 3 hours. The reaction solution was evaporated under reduced pressure, the resulting residue was diluted with ethyl acetate,
The extract is washed with saturated aqueous sodium hydrogen carbonate and saturated brine, dried over anhydrous magnesium sulfate, and the solvent is evaporated. Separately add 2 to the obtained residue.
-Trityloxyimino-2- (2-tritylaminothiazol-4-yl) acetic acid (4.9 g), dicyclohexylcarbodiimide (1.52 g) and 1-hydroxybenzotriazole (1.0 g) were added to tetrahydrofuran (30 ml). The solution stirred for 30 minutes is added at room temperature. After stirring overnight at the same temperature, the reaction solution is filtered and the filtrate is diluted with ethyl acetate water. Further, washed with 1N hydrochloric acid, saturated aqueous sodium hydrogen carbonate and saturated brine, dried over anhydrous magnesium sulfate,
The solvent is distilled off. The obtained residue was purified by column chromatography (SiO 2 , benzene: ethyl acetate = 6: 1) to give the title compound (5.39 g, yield 66%).

【0018】NMR(CDCl3 .δ) 2.75(3H,d,J=5Hz)、3.25,3.5
2(2H,ABq,J=18Hz)、4.40(1H,
d,J=5Hz)、4.77,5.07(2H,AB
q,J=14Hz)、5.05(1H,d,J=5H
z)、6.10(1H,dd,J=5Hz,9Hz)、
6.43(1H,s)、6.97(1H,s)、7.2
1〜7.39(40H,m)
NMR (CDCl 3 .δ) 2.75 (3H, d, J = 5 Hz), 3.25, 3.5
2 (2H, ABq, J = 18Hz), 4.40 (1H,
d, J = 5 Hz), 4.77, 5.07 (2H, AB
q, J = 14Hz), 5.05 (1H, d, J = 5H
z), 6.10 (1H, dd, J = 5Hz, 9Hz),
6.43 (1H, s), 6.97 (1H, s), 7.2
1 to 7.39 (40H, m)

【0019】製造例2 7−〔(Z)−2−(2−トリチルアミノチアゾール−
4−イル)−2−トリチルオキシイミノアセトアミド〕
−3−N−(2−メトキシエチル)カルバモイルオキシ
メチル−3−セフェム−4−カルボン酸ベンズヒドリル
Production Example 2 7-[(Z) -2- (2-tritylaminothiazole-
4-yl) -2-trityloxyiminoacetamide]
-3-N- (2-methoxyethyl) carbamoyloxymethyl-3-cephem-4-carboxylic acid benzhydryl

【化13】 製造例1と同様にして上記化合物を得た。(収率53
%)
[Chemical 13] The above compound was obtained in the same manner as in Production Example 1. (Yield 53
%)

【0020】NMR(CDCl3 .δ) 3.32〜3.38(5H,m)、3.42(2H,
t,J=5Hz)、3.25,3.49(2H,AB
q,J=18Hz)、4.78,5.05(2H,AB
q,J=12Hz)、5.08(1H,d,J=5H
z)、6.1(1H,dd,J=5Hz,9Hz)、
6.42(1H,s)、6.94(1H,s)、7.3
〜7.4(40H,m)
NMR (CDCl 3 .δ) 3.32 to 3.38 (5H, m) 3.42 (2H,
t, J = 5 Hz), 3.25, 3.49 (2H, AB
q, J = 18Hz), 4.78, 5.05 (2H, AB
q, J = 12Hz), 5.08 (1H, d, J = 5H
z), 6.1 (1H, dd, J = 5Hz, 9Hz),
6.42 (1H, s), 6.94 (1H, s), 7.3
~ 7.4 (40H, m)

【0021】製造例3 7−〔(Z)−2−(2−トリチルアミノチアゾール−
4−イル)−2−トリチルオキシアセトアミド〕−3−
N−(2−モノフルオロエチル)カルバモイルオキシメ
チル−3−セフェム−4−カルボン酸ベンズヒドリル
Production Example 3 7-[(Z) -2- (2-tritylaminothiazole-
4-yl) -2-trityloxyacetamide] -3-
N- (2-monofluoroethyl) carbamoyloxymethyl-3-cephem-4-carboxylic acid benzhydryl

【化14】 製造例1と同様にして上記化合物を得た。[Chemical 14] The above compound was obtained in the same manner as in Production Example 1.

【0022】NMR(CDCl3 .δ) 3.1〜3.4(4H,m)、4.2〜4.4(2H,
m)、4.85(2H,ABq,J=14Hz)、4.
92(1H,d,J=4.9Hz)、6.04(1H,
dd,J=4.9Hz,8.9Hz)、6.44(1
H,s)、6.95(1H,s)、7.1〜7.5(4
0H,m)
NMR (CDCl 3 .δ) 3.1-3.4 (4H, m), 4.2-4.4 (2H,
m), 4.85 (2H, ABq, J = 14Hz), 4.
92 (1H, d, J = 4.9 Hz), 6.04 (1H,
dd, J = 4.9 Hz, 8.9 Hz), 6.44 (1
H, s), 6.95 (1H, s), 7.1 to 7.5 (4
0H, m)

【0023】製造例4 7−〔(Z)−2−(2−トリチルアミノチアゾール−
4−イル)−2−トリチルオキシアセトアミド〕−3−
N−(2,2,2−トリフルオロエチル)カルバモイル
オキシメチル−3−セフェム−4−カルボン酸ベンズヒ
ドリル製造例1と同様にして上記化合物を得た。
Production Example 4 7-[(Z) -2- (2-tritylaminothiazole-
4-yl) -2-trityloxyacetamide] -3-
Benzhydryl N- (2,2,2-trifluoroethyl) carbamoyloxymethyl-3-cephem-4-carboxylic acid The above compound was obtained in the same manner as in Production Example 1.

【化15】 [Chemical 15]

【0024】NMR(CDCl3 ) 3.21(2H,ABq,J=19Hz)、3.52
〜3.58(2H,m)、4.88(2H,ABq,J
=14Hz)、4.91(1H,d,J=4.9H
z)、6.03(1H,dd,J=4.9Hz,8.8
Hz)、6.45(1H,s)、6.95(1H,
s)、7.13〜7.47(40H,m)
NMR (CDCl 3 ) 3.21 (2H, ABq, J = 19 Hz), 3.52
~ 3.58 (2H, m), 4.88 (2H, ABq, J
= 14 Hz), 4.91 (1H, d, J = 4.9H)
z), 6.03 (1H, dd, J = 4.9 Hz, 8.8)
Hz), 6.45 (1H, s), 6.95 (1H,
s), 7.13 to 7.47 (40H, m)

【0025】実施例1 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ハイドロキシイミノアセトアミド〕−3−N
−メチルカルバモイルオキシメチル−3−セフェム−カ
ルボン酸ナトリウム塩
Example 1 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-N
-Methylcarbamoyloxymethyl-3-cephem-carboxylic acid sodium salt

【化16】 製造例1で得られた化合物(5.35g)のアニソール
(25ml)溶液に氷冷下トリフルオロ酢酸(20m
l)を加え、次いで同温で1時間撹拌する。反応液にイ
ソプロピルエーテルを加え沈澱物を濾取する。得られた
粉末状固体にギ酸(35ml)を加え、室温で1時間撹
拌する。反応液を減圧下留去し、残渣をメタノールで希
釈する。この溶液に酢酸ナトリウム(1.0g)を加え
メタノールを留去する。得られた残渣を酢酸エチルで希
釈しイソプロピルエーテルで粉末状にする。これを液体
クロマトグラフィーで精製すると表記化合物(326m
g、収率14%)が得られた。
[Chemical 16] A solution of the compound (5.35 g) obtained in Production Example 1 in anisole (25 ml) was added to trifluoroacetic acid (20 m) under ice cooling.
1) is added and then stirred at the same temperature for 1 hour. Isopropyl ether is added to the reaction solution and the precipitate is collected by filtration. Formic acid (35 ml) is added to the obtained powdery solid, and the mixture is stirred at room temperature for 1 hr. The reaction solution is evaporated under reduced pressure, and the residue is diluted with methanol. Sodium acetate (1.0 g) is added to this solution, and methanol is distilled off. The residue obtained is diluted with ethyl acetate and triturated with isopropyl ether. When purified by liquid chromatography, the title compound (326m
g, yield 14%) was obtained.

【0026】NMR(D2 O.δ) 2.54(3H,s)、3.21,3.51(2H,A
Bq,J=18Hz)4.60,4.70(2H,AB
q,J=18Hz)、5.06(1H,d,J=4.8
Hz)、5.69(1H,d,J=4.8Hz)、6.
83(1H,s)
NMR (D 2 O.δ) 2.54 (3H, s), 3.21, 3.51 (2H, A)
Bq, J = 18 Hz) 4.60, 4.70 (2H, AB
q, J = 18 Hz), 5.06 (1H, d, J = 4.8)
Hz), 5.69 (1H, d, J = 4.8Hz), 6.
83 (1H, s)

【0027】実施例2 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ハイドロキシイミノアセトアミド〕−3−N
−(2−メトキシエチル)カルバモイルオキシメチル−
3−セフェム−4−カルボン酸ナトリウム塩
Example 2 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-N
-(2-Methoxyethyl) carbamoyloxymethyl-
3-Cephem-4-carboxylic acid sodium salt

【化17】 製造例2の化合物を用い、実施例1と同様にして上記化
合物を得た。(収率46%)
[Chemical 17] The above compound was obtained in the same manner as in Example 1 except that the compound of Production Example 2 was used. (Yield 46%)

【0028】NMR(D2 O.δ) 3.17(2H,t,J=5Hz)、3.20(3H,
s)、3.26,3.53(2H,ABq,J=18H
z)、3.40(2H,t,J=5Hz)、4.55,
4.76(2H,ABq,J=12Hz)、5.09
(1H,d,J=5Hz)、5.71(1H,d,J=
5Hz)、6.85(1H,s)
NMR (D 2 O.δ) 3.17 (2H, t, J = 5 Hz), 3.20 (3H,
s), 3.26, 3.53 (2H, ABq, J = 18H)
z), 3.40 (2H, t, J = 5Hz), 4.55,
4.76 (2H, ABq, J = 12Hz), 5.09
(1H, d, J = 5Hz), 5.71 (1H, d, J =
5Hz), 6.85 (1H, s)

【0029】実施例3 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ハイドロキシイミノアセトアミド〕−3−N
−(2−モノフルオロエチル)カルバモイルオキシメチ
ル−3−セフェム−4−カルボン酸ナトリウム塩
Example 3 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-N
-(2-Monofluoroethyl) carbamoyloxymethyl-3-cephem-4-carboxylic acid sodium salt

【化18】 製造例3の化合物を使って実施例1と同様に処理し上記
化合物を得た。
[Chemical 18] The compound of Preparation Example 3 was used and treated in the same manner as in Example 1 to obtain the above compound.

【0030】NMR(D2 O.δ) 3.2〜3.5(4H,m)、4.2〜4.4(2H,
m)、4.65(2H,ABq,J=12Hz)、5.
05(1H,d,J=4.8Hz)、5.68(1H,
d,J=4.8Hz)、6.80(1H,s)
NMR (D 2 O.δ) 3.2-3.5 (4H, m) 4.2-4.4 (2H,
m), 4.65 (2H, ABq, J = 12Hz), 5.
05 (1H, d, J = 4.8Hz), 5.68 (1H,
d, J = 4.8 Hz), 6.80 (1H, s)

【0031】実施例4 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ハイドロキシイミノアセトアミド〕−3−N
−(2,2,2−トリフルオロエチル)カルバモイルオ
キシメチル−3−セフェム−4−カルボン酸ナトリウム
Example 4 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-N
-(2,2,2-Trifluoroethyl) carbamoyloxymethyl-3-cephem-4-carboxylic acid sodium salt

【化19】 製造例4の化合物を用い実施例1と同様にして上記化合
物を得た。
[Chemical 19] The above compound was obtained in the same manner as in Example 1 using the compound of Production Example 4.

【0032】NMR(D2 O.δ) 3.39(2H,ABq,J=18Hz)、3.66〜
3.73(2H,m)、4.71(2H,ABq,J=
13Hz)、5.08(1H,d,J=4.8Hz)、
5.70(1H,d,J=4.8Hz)、6.81(1
H,s)
NMR (D 2 O.δ) 3.39 (2H, ABq, J = 18 Hz), 3.66-
3.73 (2H, m), 4.71 (2H, ABq, J =
13 Hz), 5.08 (1H, d, J = 4.8 Hz),
5.70 (1H, d, J = 4.8Hz), 6.81 (1
H, s)

【0033】実施例5 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ハイドロキシイミノアセトアミド〕−3−N
−メチルカルバモイルオキシメチル−3−セフェム−4
−カルボン酸ピバロイルオキシメチル
Example 5 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-N
-Methylcarbamoyloxymethyl-3-cephem-4
-Carboxylic acid pivaloyloxymethyl

【化20】 実施例1で得られた化合物(106mg)のN,N−ジ
メチルアセタミド(2ml)溶液に氷冷下ヨードメチル
ピバレート(51mg)を加え、次いで同温で1時間撹
拌する。反応液に酢酸エチル、水を加え酢酸エチル層を
分取し、飽和食塩水で洗浄、無水硫酸マグネシウムで乾
燥し、溶媒を減圧留去する。得られた残渣を酢酸エチル
に溶かしイソプロピルエーテルを加え沈澱物を濾取し、
イソプロピルエーテルで洗浄すると表記化合物(44m
g、収率35%)が得られた。
[Chemical 20] Iodomethyl pivalate (51 mg) was added to a solution of the compound (106 mg) obtained in Example 1 in N, N-dimethylacetamide (2 ml) under ice-cooling, and then the mixture was stirred at the same temperature for 1 hour. Ethyl acetate and water are added to the reaction solution, the ethyl acetate layer is separated, washed with saturated brine and dried over anhydrous magnesium sulfate, and the solvent is evaporated under reduced pressure. The obtained residue was dissolved in ethyl acetate, isopropyl ether was added, and the precipitate was collected by filtration,
After washing with isopropyl ether, the title compound (44m
g, yield 35%) was obtained.

【0034】NMR(CDCl3 .δ) 1.13〜1.15(9H,m)、2.70(3H,
s)、3.42〜3.59(2H,m)、4.72〜
4.76(1H,m)、4.95〜5.05(2H,
m)、5.78〜5.81(1H,m)、5.81〜
5.89(2H,m)、6.93(1H,s)
NMR (CDCl 3 .δ) 1.13 to 1.15 (9H, m), 2.70 (3H,
s), 3.42 to 3.59 (2H, m), 4.72 to
4.76 (1H, m), 4.95 to 5.05 (2H,
m), 5.78 to 5.81 (1H, m), 5.81
5.89 (2H, m), 6.93 (1H, s)

【0035】実施例6 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ハイドロキシイミノアセトアミド〕−3−N
−メチルカルバモイルオキシメチル−3−セフェム−4
−カルボン酸 1−(イソプロポキシカルボニルオキ
シ)エチル
Example 6 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-N
-Methylcarbamoyloxymethyl-3-cephem-4
-Carboxylic acid 1- (isopropoxycarbonyloxy) ethyl

【化21】 実施例5と同様にして上記化合物を得た。(収率55
%)
[Chemical 21] The above compound was obtained in the same manner as in Example 5. (Yield 55
%)

【0036】NMR(CD3 OD.δ) 1.25〜1.35(9H,m)、1.51〜1.57
(3H,m)、2.70(3H,s)、3.48〜3.
70(2H,m)、4.75〜4.90(1H,m)、
5.02〜5.09(1H,ABq,J=14Hz)、
5.16〜5.21(1H,m)、5.90〜5.95
(1H,m)、6.75(1H,s)、6.84〜6.
95(1H,m)
NMR (CD 3 OD.δ) 1.25 to 1.35 (9H, m), 1.51 to 1.57
(3H, m), 2.70 (3H, s), 3.48-3.
70 (2H, m), 4.75 to 4.90 (1H, m),
5.02 to 5.09 (1H, ABq, J = 14Hz),
5.16-5.21 (1H, m), 5.90-5.95
(1H, m), 6.75 (1H, s), 6.84-6.
95 (1H, m)

【0037】実施例7 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ハイドロキシイミノアセトアミド〕−3−N
−(2−メトキシエチル)カルバモイルオキシメチル−
3−セフェム−4−カルボン酸ピバロイルオキシメチル
Example 7 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-N
-(2-Methoxyethyl) carbamoyloxymethyl-
3-Cephem-4-carboxylic acid pivaloyloxymethyl

【化22】 実施例2で得られた化合物を用い実施例5と同様にして
上記化合物を得た。
[Chemical formula 22] The above compound was obtained in the same manner as in Example 5 except that the compound obtained in Example 2 was used.

【0038】NMR(CDCl3 .δ) 1.26〜1.28(9H,m)、3.36〜3.40
(5H,m)、3.47〜3.50(3H,m)、3.
62(1H,d,J=18Hz)、4.84,5.10
(2H,ABq,J=13Hz)、5.04(1H,
d,J=3.5Hz)、5.86,5.96(2H,A
Bq,J=5Hz)、5.91〜5.94(1H,
m)、7.05(1H,s)
NMR (CDCl 3 .δ) 1.26 to 1.28 (9H, m), 3.36 to 3.40
(5H, m), 3.47 to 3.50 (3H, m), 3.
62 (1H, d, J = 18Hz), 4.84, 5.10
(2H, ABq, J = 13Hz), 5.04 (1H,
d, J = 3.5 Hz), 5.86, 5.96 (2H, A
Bq, J = 5 Hz), 5.91 to 5.94 (1H,
m), 7.05 (1H, s)

【0039】実施例8 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ハイドロキシイミノアセトアミド〕−3−N
−(2−モノフルオロエチル)カルバモイルオキシメチ
ル−3−セフェム−4−カルボン酸ピバロイルオキシメ
チル
Example 8 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-N
-(2-Monofluoroethyl) carbamoyloxymethyl-3-cephem-4-carboxylic acid pivaloyloxymethyl

【化23】 実施例3で得られた化合物を用い実施例5と同様にして
上記化合物を得た。
[Chemical formula 23] The above compound was obtained in the same manner as in Example 5 except that the compound obtained in Example 3 was used.

【0040】NMR(CD3 OD.δ) 1.22(9H,s)、3.3〜3.4(2H,m)、
3.63(2H,ABq,J=18Hz)、4.35〜
4.50(2H,m)、4.96(2H,ABq,J=
13Hz)、5.20(1H,d,J=4.8Hz)、
5.83〜5.94(3H,m)、6.76(1H,
s)
NMR (CD 3 OD.δ) 1.22 (9H, s), 3.3 to 3.4 (2H, m),
3.63 (2H, ABq, J = 18Hz), 4.35
4.50 (2H, m), 4.96 (2H, ABq, J =
13 Hz), 5.20 (1 H, d, J = 4.8 Hz),
5.83-5.94 (3H, m), 6.76 (1H,
s)

【0041】実施例9 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ハイドロキシイミノアセトアミド〕−3−N
−(2,2,2−トリフルオロエチル)カルバモイルオ
キシメチル−3−セフェム−4−カルボン酸ピバロイル
オキシメチル
Example 9 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-N
-(2,2,2-Trifluoroethyl) carbamoyloxymethyl-3-cephem-4-carboxylic acid pivaloyloxymethyl

【化24】 実施例4で得た化合物を用い実施例5と同様にして上記
化合物を得た。
[Chemical formula 24] The above compound was obtained in the same manner as in Example 5 except that the compound obtained in Example 4 was used.

【0042】NMR(CD3 OD.δ) 1.21(9H,s)、3.61(2H,ABq,J=
18Hz)、3.74〜3.81(2H,m)、5.0
0(2H,ABq,J=14Hz)、5.19(1H,
d,J=4.9Hz)、5.83〜5.94(3H,
m)、6.76(1H,s)
NMR (CD 3 OD.δ) 1.21 (9H, s), 3.61 (2H, ABq, J =
18Hz), 3.74 to 3.81 (2H, m), 5.0
0 (2H, ABq, J = 14Hz), 5.19 (1H,
d, J = 4.9 Hz), 5.83 to 5.94 (3H,
m), 6.76 (1H, s)

フロントページの続き (72)発明者 鎌田 厚 茨城県つくば市春日4−19−13 (72)発明者 鶴岡 明彦 茨城県つくば市天久保2−23−5 (72)発明者 町田 善正 茨城県つくば市下広岡500−81Front Page Continuation (72) Inventor Atsushi Kamata 4-19-13 Kasuga, Tsukuba, Ibaraki Prefecture (72) Inventor Akihiko Tsuruoka 2-23-5, Amakubo, Tsukuba, Ibaraki Prefecture (72) Yoshimasa Machida Tsukuba, Ibaraki Prefecture Shimohirooka 500-81

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 一般式(I) 【化1】 (式中、R1 は低級アルキル基、低級アルコキシ基置換
低級アルキル基またはハロゲン原子置換低級アルキル
基、R2 はカルボキシ基または保護されたカルボキシ基
を意味する。)で表わされる化合物および医薬として許
容されるその塩。
1. A compound represented by the general formula (I): (Wherein R 1 represents a lower alkyl group, a lower alkoxy group-substituted lower alkyl group or a halogen atom-substituted lower alkyl group, and R 2 represents a carboxy group or a protected carboxy group) and a pharmaceutically acceptable compound. That salt that will be.
【請求項2】 一般式(II) 【化2】 (式中、R1 は低級アルキル基、低級アルコキシ基また
はハロゲン原子で置換された低級アルキル基、R2 はカ
ルボキシ基または保護されたカルボキシ基を意味す
る。)で表わされる化合物またはそれらの塩と一般式
(III ) 【化3】 (式中、R3 は水酸基または保護された水酸基、R4
アミノ基または保護されたアミノ基を意味する。)で表
わされる化合物またはその反応誘導体、あるいはそれら
の塩を反応させ、得られた化合物が保護基を有する場合
は所望により保護基を脱離することを特長とする請求項
1記載の化合物の製造法。
2. A compound represented by the general formula (II): (Wherein R 1 represents a lower alkyl group, a lower alkoxy group or a lower alkyl group substituted with a halogen atom, and R 2 represents a carboxy group or a protected carboxy group) or a salt thereof. General formula (III): (Wherein R 3 represents a hydroxyl group or a protected hydroxyl group, R 4 represents an amino group or a protected amino group), or a reaction derivative thereof, or a salt thereof. The method for producing a compound according to claim 1, wherein when the compound has a protecting group, the protecting group is optionally removed.
JP3040747A 1990-11-09 1991-02-14 7-acyl-3-substituted carbamoyloxycephem compound and its production Pending JPH05331174A (en)

Priority Applications (35)

Application Number Priority Date Filing Date Title
JP3040747A JPH05331174A (en) 1991-02-14 1991-02-14 7-acyl-3-substituted carbamoyloxycephem compound and its production
IL9989891A IL99898A (en) 1990-11-09 1991-10-30 7-Acyl-3-substituted carbamoyloxy cephem compounds their preparation and antibacterial compositions containing them
IL113744A IL113744A (en) 1990-11-09 1991-10-30 3-cephem derivatives and their preparation
NZ240441A NZ240441A (en) 1990-11-09 1991-11-01 Thiazol- or thiadiazol-substituted 7-acyl-3-substituted carbamoyloxy cephem derivatives and antibacterial compositions thereof; cephem intermediates
CA002054895A CA2054895C (en) 1990-11-09 1991-11-04 7-acyl-3-(substituted carbamoyloxy) cephem compounds and process for their preparation
FI915245A FI915245A (en) 1990-11-09 1991-11-06 7-ACYL-3- (SUBSTITUERADKARBAMOYLOXI) CEFEMFOERENINGAR SAMT FOERFARANDE FOER FRAMSTAELLNING AV DESSA.
JP3317319A JP2867192B2 (en) 1990-11-09 1991-11-06 7-acyl-3-substituted carbamoyloxycephem compounds and method for producing the same
SU915010276A RU2091378C1 (en) 1990-11-09 1991-11-06 7-acyl-3-substituted carbamoylhydroxycephems, methods of their synthesis, substituted carbamoylhydroxy-3-cephems, methods of their synthesis and antibacterial composition
AU87096/91A AU654300B2 (en) 1990-11-09 1991-11-07 7-acyl-3-(substituted carbamoyloxy)cephem compounds and process for their preparation
AT96116684T ATE200291T1 (en) 1990-11-09 1991-11-08 CEPHEM DERIVATIVES
EP00121335A EP1074554A3 (en) 1990-11-09 1991-11-08 7-acyl-3-(substituted carbamoyloxy) cephem compounds, use thereof and process for their preparation
NO914375A NO302417B1 (en) 1990-11-09 1991-11-08 Analogous Process for Preparation of Therapeutically Active 7-Acyl-3- (Substituted Carbamoyloxy) Cephem Compounds
EP00121333A EP1074553A1 (en) 1990-11-09 1991-11-08 7-Acyl-3-(substituted carbamoyloxy) cephem compounds, use thereof and process for their preparation
DK91119065T DK0484966T3 (en) 1990-11-09 1991-11-08 7-Acrylic-3- (substituted carbamoyloxy) cephem compounds, use thereof and process thereof
KR1019910019872A KR0166378B1 (en) 1990-11-09 1991-11-08 7-acyl-3-substitued carbamoyloxy)cephem compounds and process for their preparation
YU178391A YU48399B (en) 1990-11-09 1991-11-08 COMPOUNDS OF 7-ACIL-3- (SUBSTITUTED CARBAMOYLOXES) CEPHEMES AND PROCEDURE FOR OBTAINING THEM
PT99468A PT99468B (en) 1990-11-09 1991-11-08 PROCESS FOR THE PREPARATION OF COMPOUNDS CEFEM 7-ACETYL-3- (SUBSTITUTED CARBAMOYLXI) WITH ANTIBACTERIAL PROPERTIES
CN91109453A CN1038589C (en) 1990-11-09 1991-11-08 Process for preparing 7-acyl-3-(substituted carbambytoxy) cephem compound
EP91119065A EP0484966B1 (en) 1990-11-09 1991-11-08 7-Acyl-3-(substituted carbamoyloxy) cephem compounds, use thereof and process for their preparation
ES91119065T ES2155433T3 (en) 1990-11-09 1991-11-08 COMPOUNDS OF 7-ACIL-3- (CARBAMOILOXI SUBSTITUTED) CEFEM, ITS USE AND PROCEDURE FOR MANUFACTURING.
HU520/91A HU221429B (en) 1990-11-09 1991-11-08 7-acyl-3-(substituted carbamoyloxy)-methyl-cef-3-em-4-carboxylic acid derivatives, process for their preparation and pharmaceutical compositions comprising such compounds
DE69132580T DE69132580T2 (en) 1990-11-09 1991-11-08 7-Acyl-3- (substituted carbamoyloxy) cephem compounds, process for their preparation and use
AT91119065T ATE200492T1 (en) 1990-11-09 1991-11-08 7-ACYL-3-(SUBSTITUTED CARBAMOYLOXY) CEPHEM COMPOUNDS, METHOD FOR THEIR PRODUCTION AND USE
DE69132578T DE69132578T2 (en) 1990-11-09 1991-11-08 Cephem derivatives
EP96116684A EP0761671B1 (en) 1990-11-09 1991-11-08 Cephem derivatives
AU50571/93A AU671310B2 (en) 1990-11-09 1993-11-09 The preparation of 7-acyl-3-(substituted carbamoyloxy)cephem compounds
US08/209,484 US5559225A (en) 1990-11-09 1994-03-14 7-acyl-3-(substituted carbamoyloxy) cephem compound
US08/393,074 US5563265A (en) 1990-11-09 1995-02-23 7-acyl-3-(substituted carbamoyloxy) cephem compounds
IL11374495A IL113744A0 (en) 1990-11-09 1995-05-16 3-Cephem derivatives and their preparation
US08/463,353 US5604217A (en) 1990-11-09 1995-06-05 7-acyl-3-(substituted carbamoyloxy) cephem compounds and process for their preparation
US08/464,341 US5741902A (en) 1990-11-09 1995-06-05 7-acyl-3-(substituted carbamoyloxy) cephem compounds and process for their preparation
CN96102563A CN1056847C (en) 1990-11-09 1996-02-02 7-acyl-3-(substd. carbamoyloxy) cephem compounds and their preparation process
US08/671,342 US5587473A (en) 1990-11-09 1996-06-27 7-acyl-3-(substituted carbamoyloxy) cephem compounds and process for their preparation
JP09212687A JP3143829B2 (en) 1990-11-09 1997-07-24 7-acyl-3-substituted carbamoyloxycephem compounds and process for producing the same
GR20010401008T GR3036157T3 (en) 1990-11-09 2001-06-29 7-Acyl-3-(substituted carbamoyloxy) cephem compounds, use thereof and process for their preparation.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3040747A JPH05331174A (en) 1991-02-14 1991-02-14 7-acyl-3-substituted carbamoyloxycephem compound and its production

Publications (1)

Publication Number Publication Date
JPH05331174A true JPH05331174A (en) 1993-12-14

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Country Link
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