JP3005273B2 - Thiazolylacetamide-3-cephem derivatives - Google Patents
Thiazolylacetamide-3-cephem derivativesInfo
- Publication number
- JP3005273B2 JP3005273B2 JP2-272357A JP27235790A JP3005273B2 JP 3005273 B2 JP3005273 B2 JP 3005273B2 JP 27235790 A JP27235790 A JP 27235790A JP 3005273 B2 JP3005273 B2 JP 3005273B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- salt
- formula
- mmol
- thiazolylacetamide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 125000000217 alkyl group Chemical group 0.000 claims description 23
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 19
- 125000006239 protecting group Chemical group 0.000 claims description 19
- 239000011780 sodium chloride Substances 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 150000003839 salts Chemical class 0.000 claims description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 125000003277 amino group Chemical group 0.000 claims description 9
- 125000003342 alkenyl group Chemical group 0.000 claims description 8
- 239000003242 anti bacterial agent Substances 0.000 claims description 6
- IQPQWNKOIGAROB-UHFFFAOYSA-N [N-]=C=O Chemical compound [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims 1
- -1 7-substituted-3-vinyl-3-cephem compound Chemical class 0.000 description 54
- 150000001875 compounds Chemical class 0.000 description 24
- XEKOWRVHYACXOJ-UHFFFAOYSA-N acetic acid ethyl ester Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 10
- 125000004432 carbon atoms Chemical group C* 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- YMWUJEATGCHHMB-UHFFFAOYSA-N methylene dichloride Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- FZWLAAWBMGSTSO-UHFFFAOYSA-N thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 7
- 238000001914 filtration Methods 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N formic acid Chemical compound OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L mgso4 Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 5
- 125000004423 acyloxy group Chemical group 0.000 description 4
- 230000000844 anti-bacterial Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 4
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 description 4
- 238000010898 silica gel chromatography Methods 0.000 description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N HCl Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- ORTIHMCNKYLOHU-UHFFFAOYSA-M 4-iodo-2,2-dimethylbutanoate Chemical compound [O-]C(=O)C(C)(C)CCI ORTIHMCNKYLOHU-UHFFFAOYSA-M 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N Anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- XOAAWQZATWQOTB-UHFFFAOYSA-N Taurine Chemical compound NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- 239000012267 brine Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000003197 catalytic Effects 0.000 description 2
- 150000001782 cephems Chemical class 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 235000008504 concentrate Nutrition 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propanol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 2
- 239000001632 sodium acetate Substances 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 2
- 238000001665 trituration Methods 0.000 description 2
- FDPGABPZORFXQR-UHFFFAOYSA-N (3,3-dimethyl-1-oxobutan-2-yl)oxy-dimethylsilicon Chemical compound C[Si](C)OC(C=O)C(C)(C)C FDPGABPZORFXQR-UHFFFAOYSA-N 0.000 description 1
- UQJXHLBZULXQBV-CQSZACIVSA-N (4-methoxyphenyl)methyl (6R)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound C1=CC(OC)=CC=C1COC(=O)C1=CCS[C@H]2N1C(=O)C2 UQJXHLBZULXQBV-CQSZACIVSA-N 0.000 description 1
- BCMYXYHEMGPZJN-UHFFFAOYSA-N 1-chloro-2-isocyanatoethane Chemical compound ClCCN=C=O BCMYXYHEMGPZJN-UHFFFAOYSA-N 0.000 description 1
- WLXGQMVCYPUOLM-UHFFFAOYSA-M 1-hydroxyethanesulfonate Chemical compound CC(O)S([O-])(=O)=O WLXGQMVCYPUOLM-UHFFFAOYSA-M 0.000 description 1
- 125000000453 2,2,2-trichloroethyl group Chemical group [H]C([H])(*)C(Cl)(Cl)Cl 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-Methylpyridine Chemical class CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- 125000000143 2-carboxyethyl group Chemical group [H]OC(=O)C([H])([H])C([H])([H])* 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002774 3,4-dimethoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C(OC([H])([H])[H])=C1OC([H])([H])[H])C([H])([H])* 0.000 description 1
- HXBPYFMVGFDZFT-UHFFFAOYSA-N 3-isocyanatoprop-1-ene Chemical compound C=CCN=C=O HXBPYFMVGFDZFT-UHFFFAOYSA-N 0.000 description 1
- XKTYXVDYIKIYJP-UHFFFAOYSA-N 3H-dioxole Chemical class C1OOC=C1 XKTYXVDYIKIYJP-UHFFFAOYSA-N 0.000 description 1
- 239000004475 Arginine Substances 0.000 description 1
- 229940009098 Aspartate Drugs 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- JUHORIMYRDESRB-UHFFFAOYSA-N Benzathine Chemical class C=1C=CC=CC=1CNCCNCC1=CC=CC=C1 JUHORIMYRDESRB-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate dianion Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- MTCFGRXMJLQNBG-UWTATZPHSA-N D-serine Chemical compound OC[C@@H](N)C(O)=O MTCFGRXMJLQNBG-UWTATZPHSA-N 0.000 description 1
- CKLJMWTZIZZHCS-UHFFFAOYSA-N DL-aspartic acid Chemical compound OC(=O)C(N)CC(O)=O CKLJMWTZIZZHCS-UHFFFAOYSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical class C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N Diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- ODKSFYDXXFIFQN-BYPYZUCNSA-P L-argininium(2+) Chemical compound NC(=[NH2+])NCCC[C@H]([NH3+])C(O)=O ODKSFYDXXFIFQN-BYPYZUCNSA-P 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical class OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical compound NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- MBBZMMPHUWSWHV-BDVNFPICSA-N Meglumine Chemical class CNC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO MBBZMMPHUWSWHV-BDVNFPICSA-N 0.000 description 1
- FEWJPZIEWOKRBE-XIXRPRMCSA-N Mesotartaric acid Chemical compound OC(=O)[C@@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-XIXRPRMCSA-N 0.000 description 1
- 229910004759 OSi Inorganic materials 0.000 description 1
- 229960003080 Taurine Drugs 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N Tetraethylammonium Chemical class CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N Trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Trimethylglycine Chemical class C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Tris Chemical class OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- CDZHZLQKNAKKEC-UHFFFAOYSA-N [bis(hydroxymethylamino)methylamino]methanol Chemical class OCNC(NCO)NCO CDZHZLQKNAKKEC-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 231100000403 acute toxicity Toxicity 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000005194 alkoxycarbonyloxy group Chemical group 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229960003121 arginine Drugs 0.000 description 1
- UPABQMWFWCMOFV-UHFFFAOYSA-N benethamine Chemical class C=1C=CC=CC=1CNCCC1=CC=CC=C1 UPABQMWFWCMOFV-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- 125000000649 benzylidene group Chemical group [H]C(=[*])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 125000002668 chloroacetyl group Chemical group ClCC(=O)* 0.000 description 1
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000003247 decreasing Effects 0.000 description 1
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000003937 drug carrier Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000008079 hexane Substances 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-N hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- DETXZQGDWUJKMO-UHFFFAOYSA-M hydroxymethanesulfonate Chemical compound OCS([O-])(=O)=O DETXZQGDWUJKMO-UHFFFAOYSA-M 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- YBCISJAPWKQOPH-UHFFFAOYSA-N iodoethane Chemical group [CH2]CI YBCISJAPWKQOPH-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229960003646 lysine Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-L maleate(2-) Chemical compound [O-]C(=O)\C=C/C([O-])=O VZCYOOQTPOCHFL-UPHRSURJSA-L 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-M methanesulfonate Chemical compound CS([O-])(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-M 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 description 1
- 230000001717 pathogenic Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229960001153 serine Drugs 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing Effects 0.000 description 1
- 239000006188 syrup Substances 0.000 description 1
- 235000020357 syrup Nutrition 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、医薬として優れた作用を有する新規なチア
ゾリルアセトアミド−3−セフェム系誘導体に関する。Description: TECHNICAL FIELD The present invention relates to a novel thiazolylacetamide-3-cephem derivative having excellent action as a medicine.
ヨーロッパ特許出願第30630号明細書には、式 (ここで、Rは低級アルキル基、低級アルケニル基、低
級アルキニル基又はカルボキシ低級アルキル基であ
る。)で表される化合物を含む7−アシルアミノ−3−
ビニルセファロスポラン酸誘導体が開示されている。European Patent Application No. 30630 describes the formula (Where R is a lower alkyl group, a lower alkenyl group, a lower alkynyl group or a carboxy lower alkyl group.) 7-acylamino-3-
Vinyl cephalosporanic acid derivatives are disclosed.
また、特開昭59−89089号公報には7−置換−3−ビ
ニル−3−セフェム化合物として、一般式 (式中、R1はアミノ基又は保護基で保護されたアミノ
基、R2はカルボキシル基又は保護基で保護されたカルボ
キシル基をそれぞれ意味する。)で表される化合物が開
示されている。JP-A-59-89089 discloses a 7-substituted-3-vinyl-3-cephem compound represented by the general formula: (Wherein, R 1 represents an amino group or an amino group protected with a protecting group, and R 2 represents a carboxyl group or a carboxyl group protected with a protecting group, respectively).
一方、特開昭62−491号公報には下記一般式で示され
る化合物が開示されている。On the other hand, JP-A-62-491 discloses a compound represented by the following general formula.
(式中、R3は水素原子又は通常のアミノ保護基であり、
R4は水素原子、1〜4個の炭素原子を有する直鎖又は枝
分かれ鎖のアルキル基、2〜4個の炭素原子を有するア
ルケニル又はアルキニル基、3〜6個の炭素原子を有す
るシクロアルキル基、3〜6員環及び4〜10個の炭素原
子を有するシクロアルキルアルキル基、あるいは2〜4
個の炭素原子を有するアルカノイル基であり、R5は水素
原子、1〜3個の炭素原子を有する低級アルキル基、1
〜3個の炭素原子を有する低級アルコキシ基、2〜3個
の炭素原子を有する低級アルカノイルオキシ基であり、
R6は水素原子又は生理的に加水分解可能なエステル基、
例えばアセトキシメチル、1−アセトキシエチル、ピバ
ロイルオキシメチル、5−メチル−2−オキソ−1,3−
ジオキソレン−4−イルメチル、1−(エトキシカルボ
ニルオキシ)エチル、又は4−グリシルオキシベンゾイ
ルオキシメチル基である)。 (Wherein R 3 is a hydrogen atom or a normal amino protecting group,
R 4 is a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, an alkenyl or alkynyl group having 2 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms A cycloalkylalkyl group having a 3-6 membered ring and 4-10 carbon atoms, or 2-4
R 5 is a hydrogen atom, a lower alkyl group having 1 to 3 carbon atoms, 1
Lower alkoxy groups having from 2 to 3 carbon atoms, lower alkanoyloxy groups having from 2 to 3 carbon atoms,
R 6 is a hydrogen atom or a physiologically hydrolyzable ester group,
For example, acetoxymethyl, 1-acetoxyethyl, pivaloyloxymethyl, 5-methyl-2-oxo-1,3-
Dioxolen-4-ylmethyl, 1- (ethoxycarbonyloxy) ethyl, or 4-glycyloxybenzoyloxymethyl group).
しかし、これらはいずれも十分な抗菌力が得られてい
ない。However, none of them has sufficient antibacterial activity.
〔課題を解決するための手段〕 本発明者らは、3位にシクロプロピルビニル基を有す
る新規なチアゾリルアセトアミドセフェム誘導体が優れ
た抗菌力を有することを見い出し、既に特許出願した。[Means for Solving the Problems] The present inventors have found that a novel thiazolylacetamide cephem derivative having a cyclopropylvinyl group at the 3-position has excellent antibacterial activity, and have already filed a patent application.
更に、検討の結果、このチアゾリルアセトアミドセフ
ェム誘導体の3位に上記と異なる特定の置換基を有する
ビニル基を導入することにより、優れた抗菌力を有する
化合物が得られることを見出し、この新規チアゾリルア
セトアミド−3−セフェム誘導体が種々の病原菌に対し
て高い活性を有する抗菌剤、特に経口投与用の抗菌剤と
して有用であることを見い出し本発明を完成するに到っ
た。Furthermore, as a result of the study, it was found that a compound having excellent antibacterial activity can be obtained by introducing a vinyl group having a specific substituent different from the above at the 3-position of the thiazolylacetamide cephem derivative. The present inventors have found that a thiazolylacetamide-3-cephem derivative is useful as an antibacterial agent having high activity against various pathogenic bacteria, particularly useful as an antibacterial agent for oral administration, and completed the present invention.
即ち、本発明は下記一般式(1)で表されるチアゾリ
ルアセトアミド−3−セフェム系誘導体及びその医薬と
して許容される塩、及びその製造法並びにそれからなる
抗菌剤を提供するものである。That is, the present invention provides a thiazolylacetamide-3-cephem derivative represented by the following general formula (1), a pharmaceutically acceptable salt thereof, a production method thereof, and an antibacterial agent comprising the same.
(式中、R1は水酸基又は低級アルコキシ基を示す。R2は
カルボキシル基又は保護基で保護されたカルボキシル基
を示す。R3は低級ハロゲン化アルキル基又は低級アルケ
ニル基を示す。) 上記式中、R1で示される低級アルコキシ基としては、
メトキシ、エトキシ、n−プロポキシ、i−プロポキ
シ、n−ブトキシ、sec−ブトキシ、t−ブトキシなど
の炭素数1〜4のアルコキシ基が挙げられる。R3で示さ
れる低級アルキル基としては、メチル、エチル、n−プ
ロピル、i−プロピル、n−ブチル、sec−ブチル、t
−ブチルなどの炭素数1〜4のアルキル基が挙げられ
る。R2のカルボキシル基の保護基としては、メチル、エ
チル、t−ブチルなどの低級アルキル基;p−メトキシベ
ンジル、p−ニトロベンジル、3,4−ジメトキシベンジ
ル、ジフェニルメチル、トリチル、フェネチルなどの置
換基を有していてもよいフェニル基で置換された低級ア
ルキル基;2,2,2−トリクロロエチル、2−ヨードエチル
などのハロゲン化低級アルキル基;ピバロイルオキシメ
チル、アセトキシメチル、プロピオニルオキシメチル、
ブチリルオキシメチル、バレリルオキシメチル、1−ア
セトキシエチル、2−アセトキシエチル、1−ピバロイ
ルオキシエチル、2−ピバロイルオキシエチルなどの低
級アルカノイルオキシ低級アルキル基;パルミトイルオ
キシエチル、ヘプタペカノイルオキシメチル、1−パル
ミトイルオキシエチルなどの高級アルカノイルオキシ低
級アルキル基;メトキシカルボニルオキシメチル、1−
ブトキシカルボニルオキシエチル、1−t−ブトキシカ
ルボニルオキシエチル、1−エトキシカルボニルオキシ
エチル、1−(イソプロポキシカルボニルオキシ)エチ
ルなどの低級アルコキシカルボニルオキシ低級アルキル
基;カルボキシメチル、2−カルボキシエチルなどのカ
ルボキシ低級アルキル基;3−フタリジルなどの複素環
基;4−グリシルオキシベンゾイルオキシメチル、4−
〔N−(t−ブトキシカルボニル)グリシルオキシ〕ベ
ンゾイルオキシメチルなどの置換基を有していてもよい
ベンゾイルオキシ低級アルキル基;(5−メチル−2−
オキソ−1,3−ジオキソレン−4−イル)メチルなどの
(置換ジオキソレン)低級アルキル基;1−シクロヘキシ
ルアセチルオキシエチルなどのシクロアルキル置換低級
アルカノイルオキシ低級アルキル基、1−シクロヘキシ
ルオキシカルボニルオキシエチルなどのシクロアルキル
オキシカルボニルオキシ低級アルキル基等が挙げられ
る。 (In the formula, R 1 represents a hydroxyl group or a lower alkoxy group. R 2 represents a carboxyl group or a carboxyl group protected by a protecting group. R 3 represents a lower halogenated alkyl group or a lower alkenyl group.) Wherein the lower alkoxy group represented by R 1 includes
Examples thereof include alkoxy groups having 1 to 4 carbon atoms such as methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, sec-butoxy, and t-butoxy. Examples of the lower alkyl group represented by R 3 include methyl, ethyl, n-propyl, i-propyl, n-butyl, sec-butyl, and t.
And an alkyl group having 1 to 4 carbon atoms such as -butyl. Examples of the protecting group for the carboxyl group of R 2 include lower alkyl groups such as methyl, ethyl and t-butyl; substitution with p-methoxybenzyl, p-nitrobenzyl, 3,4-dimethoxybenzyl, diphenylmethyl, trityl, phenethyl and the like. A lower alkyl group substituted by a phenyl group which may have a group; a halogenated lower alkyl group such as 2,2,2-trichloroethyl or 2-iodoethyl; pivaloyloxymethyl, acetoxymethyl, propionyloxymethyl ,
Lower alkanoyloxy lower alkyl groups such as butyryloxymethyl, valeryloxymethyl, 1-acetoxyethyl, 2-acetoxyethyl, 1-pivaloyloxyethyl and 2-pivaloyloxyethyl; palmitoyloxyethyl, heptapeca Higher alkanoyloxy lower alkyl groups such as noyloxymethyl and 1-palmitoyloxyethyl; methoxycarbonyloxymethyl, 1-
Lower alkoxycarbonyloxy lower alkyl groups such as butoxycarbonyloxyethyl, 1-t-butoxycarbonyloxyethyl, 1-ethoxycarbonyloxyethyl and 1- (isopropoxycarbonyloxy) ethyl; carboxy such as carboxymethyl and 2-carboxyethyl; Lower alkyl group; heterocyclic group such as 3-phthalidyl; 4-glycyloxybenzoyloxymethyl, 4-
A benzoyloxy lower alkyl group which may have a substituent such as [N- (t-butoxycarbonyl) glycyloxy] benzoyloxymethyl; (5-methyl-2-
(Substituted dioxolen) lower alkyl groups such as oxo-1,3-dioxolen-4-yl) methyl; cycloalkyl-substituted lower alkanoyloxy lower alkyl groups such as 1-cyclohexylacetyloxyethyl; 1-cyclohexyloxycarbonyloxyethyl; And a cycloalkyloxycarbonyloxy lower alkyl group.
また、医薬として許容される塩としては、例えばナト
リウム塩、カリウム塩などのアルカリ金属塩;アンモニ
ウム塩;テトラエチルアンモニウム塩、ベタイン塩など
の4級アンモニウム塩;カルシウム塩、マグネシウム塩
などのアルカリ土類金属塩;塩酸塩、臭化水素酸塩、沃
化水素酸塩、硫酸塩、炭酸塩、重炭酸塩などの無機酸
塩;酢酸塩、マレイン酸塩、乳酸塩、酒石酸塩などを有
機カルボン酸;メタンスルホン酸塩、ヒドロキシメタン
スルホン酸塩、ヒドロキシエタンスルホン酸塩、タウリ
ン塩、ベンゼンスルホン酸塩、トルエンスルホン酸塩な
どの有機スルホン酸塩;アルギニン塩、リジン塩、セリ
ン塩、アスパラギン酸塩、グルタミン酸塩、グリシン塩
などのアミノ酸塩;トリメチルアミン塩、トリエチルア
ミン塩、ピリジン塩、ブロカイン塩、ピコリン塩、ジシ
クロヘキシルアミン塩、N,N′−ジベンジルエチレンジ
アミン塩、N−メチルグルカミン塩、ジエタノールアミ
ン塩、トリエタノールアミン塩、トリス(ヒドロキシメ
チルアミノ)メタン塩、フェネチルベンジルアミン塩な
どのアミン塩などが挙げられる。Pharmaceutically acceptable salts include, for example, alkali metal salts such as sodium salt and potassium salt; ammonium salt; quaternary ammonium salts such as tetraethylammonium salt and betaine salt; alkaline earth metals such as calcium salt and magnesium salt Salts; inorganic salts such as hydrochloride, hydrobromide, hydroiodide, sulfate, carbonate, bicarbonate; organic carboxylic acids such as acetate, maleate, lactate, tartrate; Organic sulfonates such as methanesulfonate, hydroxymethanesulfonate, hydroxyethanesulfonate, taurine, benzenesulfonate and toluenesulfonate; arginine, lysine, serine, aspartate, glutamic acid Salts, amino acids such as glycine; trimethylamine, triethylamine, pyridine, Rockine salt, picoline salt, dicyclohexylamine salt, N, N'-dibenzylethylenediamine salt, N-methylglucamine salt, diethanolamine salt, triethanolamine salt, tris (hydroxymethylamino) methane salt, phenethylbenzylamine salt, etc. Amine salts and the like.
本発明化合物は次に示す方法により製造することがで
きる。The compound of the present invention can be produced by the following method.
製 法 一般式(II) (式中、R2はカルボキシル基又は保護基で保護されたカ
ルボキシル基を示す。R4はアミノ基又は保護基で保護さ
れたアミノ基を示す。R5は水酸基又は保護基で保護され
た水酸基又は低級アルコキシ基を示す。)で表される化
合物あるいはそれらの塩と、式R3−N=C=O(ここで
R3は低級ハロゲン化アルキル基又は低級アルケニル基を
示す。)で表されるイソシアネートと反応させ、必要に
よりアミノ基、水酸基又はカルボキシル基の保護基を脱
離することにより一般式(I) (式中、R1、R2、R3は前記と同様の意味を有する。)で
表される化合物及びその医薬として許容される塩を得る
ことができる。Manufacturing method General formula (II) (Wherein, R 2 represents a carboxyl group or a carboxyl group protected with a protecting group. R 4 represents an amino group or an amino group protected with a protecting group. R 5 is a hydroxyl group or a hydroxyl group protected with a protecting group. Or a lower alkoxy group) or a salt thereof, and a compound represented by the formula R 3 —N = C = O (wherein
R 3 represents a lower halogenated alkyl group or a lower alkenyl group. ), And if necessary, the protecting group for an amino group, a hydroxyl group or a carboxyl group is eliminated to obtain a compound of the formula (I) (Wherein, R 1 , R 2 and R 3 have the same meanings as described above) and a pharmaceutically acceptable salt thereof.
上記反応は、ジクロルメタン、クロロホルム、テトラ
ヒドロフラン、アセトン、酢酸エチル、メタノール、エ
タノール、ジメチルスルホキシド、ベンゼン、トルエ
ン、ヘキサン等の不活性溶媒中、反応温度−10℃〜50℃
で行うことができる。保護基の脱離は、用いた保護基の
種類に応じて、常法により行うことができる。The above reaction is carried out in an inert solvent such as dichloromethane, chloroform, tetrahydrofuran, acetone, ethyl acetate, methanol, ethanol, dimethylsulfoxide, benzene, toluene, hexane, etc., at a reaction temperature of −10 ° C. to 50 ° C.
Can be done with The elimination of the protecting group can be performed by a conventional method according to the type of the protecting group used.
R4のアミノ基の保護基としては、例えばホルミル基、
アセチル基、クロルアセチル基、ジクロルアセチル基、
フェニルアセチル基、チエニルアセチル基、t−ブトキ
シカルボニル基、ベンジルオキシカルボニル基、トリチ
ル基、p−メトキシベンジル基、ジフェニルメチル基、
ベンジリデン基、p−ニトロベンジリデン基、m−ニト
ロベンジリデン基、3,4−メチレンジオキシベンジリデ
ン基、m−クロルベンジリデン基などが挙げられる。Examples of the protecting group for the amino group of R 4 include a formyl group,
Acetyl group, chloroacetyl group, dichloroacetyl group,
Phenylacetyl group, thienylacetyl group, t-butoxycarbonyl group, benzyloxycarbonyl group, trityl group, p-methoxybenzyl group, diphenylmethyl group,
Examples include a benzylidene group, a p-nitrobenzylidene group, an m-nitrobenzylidene group, a 3,4-methylenedioxybenzylidene group, and an m-chlorobenzylidene group.
R5の低級アルコキシ基としてはR1と同様な基があげら
れる。R5の水酸基の保護基としてはトリチル基、テトラ
ハイドロピラニル基などが挙げられる。As the lower alkoxy group for R 5, the same groups as those for R 1 can be mentioned. Examples of the hydroxyl-protecting group for R 5 include a trityl group and a tetrahydropyranyl group.
上記の如き方法により得られる本発明の化合物は優れ
た抗菌活性を有し、特に経口用抗菌剤として有用であ
る。The compound of the present invention obtained by the above method has excellent antibacterial activity, and is particularly useful as an oral antibacterial agent.
本発明化合物の急性毒性値〔LD50(マウス、経口)〕
はいずれも2g/kg以上であった。Acute toxicity value of the compound of the present invention [LD 50 (mouse, oral)]
Was 2 g / kg or more.
本発明化合物を抗菌剤として使用する際には、通常1
日100mg〜5gを1〜4回にわけて経口あるいは非経口的
に投与することができる。なお、その投与量は年齢、症
状により増減される。When the compound of the present invention is used as an antibacterial agent,
It can be administered orally or parenterally in 100 mg to 5 g per day in 1 to 4 divided doses. The dose may be increased or decreased depending on age and symptoms.
製剤としては、錠剤、顆粒剤、散剤、カプセル剤、シ
ロップ剤、液剤などが挙げられる。これらは、公知の製
剤担体を加え、常法により製造することができる。Formulations include tablets, granules, powders, capsules, syrups, liquids and the like. These can be manufactured by a conventional method by adding a known pharmaceutical carrier.
次に実施例を示し、本発明を更に詳しく説明するが、
本発明はこれらの実施例に限定されるものではない。Next, the present invention will be described in more detail with reference to Examples,
The present invention is not limited to these examples.
尚、本発明の化合物の原料となる化合物の合成例を製
造例として示す。式中Trtはトリチル基を意味する。In addition, the synthesis example of the compound used as the raw material of the compound of the present invention is shown as a production example. In the formula, Trt means a trityl group.
製造例1 7−〔(Z)−2−(2−トリチルアミノチアゾール−
4−イル)−2−トリチルオキシイミノアセトアミド〕
−3−〔(Z)−3−tert−ブチルジメチルシリルオキ
シ−1−プロペニル〕−3−セフェム−4−カルボン酸
4−メトキシフェニルメチル 7−〔(Z)−2−(2−トリチルアミノチアゾール
−4−イル)−2−トリチルオキシイミノアセトアミ
ド〕−3−(トリフェニルホスホラニリデン)メチル−
3−セフェム−4−カルボン酸4−メトキシフェニルメ
チル9.07g(7.27mmol)とt−ブチルジメチルシリルオ
キシアセトアルデヒド1.8g(10.34mmol)とのジクロロ
メタン100ml溶液を室温下16時間攪拌した。溶媒を減圧
留去後、残渣をシリカゲルカラムクロマトグラフィー
(n−ヘキサン:酢酸エチル=2.5:1)で精製し、目的
化合物を4.99g(4.36mmol,60.0%)得た。Production Example 1 7-[(Z) -2- (2-tritylaminothiazole-
4-yl) -2-trityloxyiminoacetamide]
-3-[(Z) -3-tert-butyldimethylsilyloxy-1-propenyl] -3-cephem-4-carboxylate 4-methoxyphenylmethyl 7-[(Z) -2- (2-tritylaminothiazol-4-yl) -2-trityloxyiminoacetamido] -3- (triphenylphosphoranylidene) methyl-
A solution of 9.07 g (7.27 mmol) of 4-methoxyphenylmethyl 3-cephem-4-carboxylate and 1.8 g (10.34 mmol) of t-butyldimethylsilyloxyacetaldehyde in 100 ml of dichloromethane was stirred at room temperature for 16 hours. After evaporating the solvent under reduced pressure, the residue was purified by silica gel column chromatography (n-hexane: ethyl acetate = 2.5: 1) to obtain 4.99 g (4.36 mmol, 60.0%) of the desired compound.
NMR(CDCl3)δ: 0.20(6H,bs,CH3×2),1.04(9H,bs,C(CH3)3),
3.40〜3.60(2H,m,CH2),3.88(3H,s,OCH3),4.20〜4.4
0(2H,m,−CH2OSi),5.00〜5.20(1H,m,CH),5.28(2H,
s,CO2CH2),5.60〜6.40(3H,m,CH,−CH=CH−),6.56
(1H,s,チアゾールH),6.90〜7.80(34H,m) 製造例2 7−〔(Z)−2−(2−トリチルアミノチアゾール−
4−イル)−2−トリチルオキシイミノアセトアミド〕
−3−〔(Z)−3−ヒドロキシ−1−プロペニル〕−
3−セフェム−4−カルボン酸4−メトキシフェニルメ
チル 製造例1で得られた化合物4.99g(4.36mmol)のアセ
トン50ml溶液に1N−塩酸10mlを加え、室温下2時間攪拌
した。アセトンの減圧留去後、水を加え酢酸エチルで抽
出した。抽出液を水洗、飽和食塩水で洗浄後、硫酸マグ
ネシウムを加え乾燥した。溶媒を減圧下留去し、残渣を
シリカゲルカラムクロマトグラフィー(n−ヘキサン:
酢酸エチル=1:1)で精製し、目的化合物を2.2g(2.14m
mol,49.0%)得た。NMR (CDCl 3 ) δ: 0.20 (6H, bs, CH 3 × 2), 1.04 (9H, bs, C (CH 3 ) 3 ),
3.40~3.60 (2H, m, CH 2 ), 3.88 (3H, s, OCH 3), 4.20~4.4
0 (2H, m, -CH 2 OSi), 5.00~5.20 (1H, m, CH), 5.28 (2H,
s, CO 2 CH 2), 5.60~6.40 (3H, m, CH, -CH = CH -), 6.56
(1H, s, thiazole H), 6.90-7.80 (34H, m) Production Example 2 7-[(Z) -2- (2-tritylaminothiazole-
4-yl) -2-trityloxyiminoacetamide]
-3-[(Z) -3-hydroxy-1-propenyl]-
4-methoxyphenylmethyl 3-cephem-4-carboxylate To a solution of 4.99 g (4.36 mmol) of the compound obtained in Production Example 1 in 50 ml of acetone was added 10 ml of 1N hydrochloric acid, and the mixture was stirred at room temperature for 2 hours. After acetone was distilled off under reduced pressure, water was added, and the mixture was extracted with ethyl acetate. The extract was washed with water, washed with saturated saline, and dried by adding magnesium sulfate. The solvent was distilled off under reduced pressure, and the residue was subjected to silica gel column chromatography (n-hexane:
The product was purified with ethyl acetate = 1: 1) to obtain 2.2 g (2.14 m) of the desired compound.
mol, 49.0%).
NMR(CDCl3)δ: 3.24(2H,ABq,J=18.0Hz,CH2),3.80(3H,s,OCH3),
3.90〜4.10(2H,m,−CH2O−),5.02(1H,d,J=4.8Hz,C
H),5.16(2H,s,CO2CH2−),5.60〜6.00(2H,m,CH,=CH
−),6.14(1H,d,J=12.5Hz,−CH=),6.42(1H,s,チア
ゾールH),6.80〜7.70(34H)p Mass(m/z): 1029(M+),1030(M++1) 製造例3 7−〔(Z)−2−(2−トリチルアミノチアゾール−
4−イル)−2−トリチルオキシイミノアセトアミド〕
−3−〔(Z)−3−(N−(2−クロロエチル)カル
バモイルオキシ)−1−プロペニル〕−3−セフェム−
4−カルボン酸4−メトキシフェニルメチル 製造例2で得られた化合物2g(1.944mmol)の乾燥テ
トラヒドロフラン40ml溶液に2−クロロエチルイソシア
ナート1.6g(15.2mmol)、触媒量のトリエチルアミンを
加え、60℃で4時間加熱した。溶媒を減圧下留去後、残
渣をシリカゲルカラムクロマトグラフィー(ジクロロメ
タン:アセトン=95:5)で精製し、目的化合物を0.6g
(0.53mmol、27%)得た。NMR (CDCl 3 ) δ: 3.24 (2H, ABq, J = 18.0 Hz, CH 2 ), 3.80 (3H, s, OCH 3 ),
3.90~4.10 (2H, m, -CH 2 O -), 5.02 (1H, d, J = 4.8Hz, C
H), 5.16 (2H, s, CO 2 CH 2 −), 5.60 to 6.00 (2H, m, CH, = CH
−), 6.14 (1H, d, J = 12.5 Hz, −CH =), 6.42 (1H, s, thiazole H), 6.80 to 7.70 (34H) p Mass (m / z): 1029 (M + ), 1030 (M ++ 1) Production Example 3 7-[(Z) -2- (2-tritylaminothiazole-
4-yl) -2-trityloxyiminoacetamide]
-3-[(Z) -3- (N- (2-chloroethyl) carbamoyloxy) -1-propenyl] -3-cephem-
4-methoxyphenylmethyl 4-carboxylate 1.6 g (15.2 mmol) of 2-chloroethyl isocyanate and a catalytic amount of triethylamine were added to a solution of 2 g (1.944 mmol) of the compound obtained in Production Example 2 in 40 ml of dry tetrahydrofuran, and the mixture was heated at 60 ° C. for 4 hours. After evaporating the solvent under reduced pressure, the residue was purified by silica gel column chromatography (dichloromethane: acetone = 95: 5) to obtain 0.6 g of the desired compound.
(0.53 mmol, 27%).
NMR(CDCl3)δ: 3.2〜3.7(6H,m,CH2CH2Cl,CH2),3.78(3H,s,OCH3),
4.3〜4.6(2H,m,CH2),5.05(1H,d,J=5Hz,CH),5.15
(2H,s,CO2CH2),5.55〜6.00(2H,m,CH,CH=),6.22(1
H,d,J=12Hz,CH=),6.38(1H,s,チアゾールH),6.70
〜7.50(34H,m) 製造例4 7−〔(Z)−2−(2−トリチルアミノチアゾール−
4−イル)−2−トリチルオキシイミノアセトアミド〕
−3−〔(Z)−3−(N−(2−アリルカルバモイル
オキシ)−1−プロペニル〕−3−セフェム−4−カル
ボン酸4−メトキシフェニルメチル 製造例2で得られた化合物2g(1.944mmol)の乾燥テ
トラヒドロフラン40ml溶液にアリルイソシアナート1.3g
(15.6mmol)、触媒量のトリエチルアミンを加え、60℃
で4時間加熱した。溶媒を減圧下留去後、残渣をシリカ
ゲルカラムクロマトグラフィー(ジクロロメタン:アセ
トン=95:5)で精製し、目的化合物を1g(0.90mmol、46
%)得た。 NMR (CDCl 3) δ: 3.2~3.7 (6H, m, CH 2 CH 2 Cl, CH 2), 3.78 (3H, s, OCH 3),
4.3~4.6 (2H, m, CH 2 ), 5.05 (1H, d, J = 5Hz, CH), 5.15
(2H, s, CO 2 CH 2 ), 5.55-6.00 (2H, m, CH, CH =), 6.22 (1
H, d, J = 12Hz, CH =), 6.38 (1H, s, thiazole H), 6.70
-7.50 (34H, m) Production Example 4 7-[(Z) -2- (2-tritylaminothiazole-
4-yl) -2-trityloxyiminoacetamide]
-3-[(Z) -3- (N- (2-allylcarbamoyloxy) -1-propenyl] -3-cephem-4-carboxylic acid 4-methoxyphenylmethyl 1.3 g of allyl isocyanate was added to a solution of 2 g (1.944 mmol) of the compound obtained in Production Example 2 in 40 ml of dry tetrahydrofuran.
(15.6 mmol) and a catalytic amount of triethylamine, and
For 4 hours. After evaporating the solvent under reduced pressure, the residue was purified by silica gel column chromatography (dichloromethane: acetone = 95: 5) to obtain 1 g (0.90 mmol, 46
%)Obtained.
実施例1 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ヒドロキシイミノアセトアミド〕−3−
〔(Z)−3−(N−(2−クロロエチル)カルバモイ
ルオキシ)−1−プロペニル〕−3−セフェム−4−カ
ルボン酸ナトリウム塩 製造例3で得られた化合物0.6mg(0.53mmol)のアニ
ソール3ml溶液に氷冷下トリフルオロ酢酸3mlを滴下し、
その後室温で2時間攪拌した。減圧下濃縮後、濃縮溶液
をイソプロピルエーテル20ml、n−ヘキサン80mlの混合
液に滴下し析出した結晶を濾取した。結晶を90%ギ酸10
mlに加え、室温下3時間攪拌した。減圧下溶媒留去後、
残留物をイソプロピルエーテルで摩砕し、結晶を濾取し
た。結晶をメタノール20mlを溶かし、酢酸ナトリウム30
0mg(5mmol)を加え減圧下溶媒留去した。粗生成物を2
−プロパノールで摩砕し粗結晶を濾取した。粗結晶をOD
Sカラムクロマトグラフィー(7%水性メタノール)で
精製し、溶出液を減圧下濃縮後、凍結乾燥し、目的化合
物を140mg(0.25mmol,48%)得た。Example 1 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamide] -3-
[(Z) -3- (N- (2-chloroethyl) carbamoyloxy) -1-propenyl] -3-cephem-4-carboxylic acid sodium salt To a solution of 0.6 mg (0.53 mmol) of the compound obtained in Production Example 3 in 3 ml of anisole was added dropwise 3 ml of trifluoroacetic acid under ice-cooling.
Thereafter, the mixture was stirred at room temperature for 2 hours. After concentration under reduced pressure, the concentrated solution was added dropwise to a mixed solution of 20 ml of isopropyl ether and 80 ml of n-hexane, and the precipitated crystals were collected by filtration. 90% formic acid 10 crystals
Then, the mixture was stirred at room temperature for 3 hours. After evaporating the solvent under reduced pressure,
The residue was triturated with isopropyl ether, and the crystals were collected by filtration. Dissolve the crystals in 20 ml of methanol and add sodium acetate 30
0 mg (5 mmol) was added and the solvent was distilled off under reduced pressure. 2 crude products
-Trituration with propanol and filtration of the crude crystals. OD crude crystals
The product was purified by S column chromatography (7% aqueous methanol), and the eluate was concentrated under reduced pressure and freeze-dried to obtain 140 mg (0.25 mmol, 48%) of the target compound.
NMR(DMSO−d6)δ: 3.38(6H,m,NHCH2),3.59(2H,t,J=6.8Hz,CH2Cl),
3.53(2H,ABq,J=16.5Hz,CH2),4.60(2H,d,ABq,J=7H
z,13.9Hz,CH2),5.03(1H,d,J=4.8Hz,CH),5.03(1H,
m,−CH=),5.58(1H,dd,J=4.8Hz,8.4Hz,−CH),6.64
(1H,d,J=12.8Hz,−CH=),6.65(1H,s,チアゾール
H),7.09(2H,s,NH2) 実施例2 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ヒドロキシイミノアセトアミド〕−3−
〔(Z)−3−(N−(2−クロロエチル)カルバモイ
ルオキシ)−1−プロペニル〕−3−セフェム−4−カ
ルボン酸ピバロイルオキシメチル 実施例1で得られた化合物80mg(0.14mmol)の乾燥ジ
メチルホルムアミド3ml溶液に氷冷下ヨードメチルピバ
レート37mg(0.16mmol)の乾燥ジメチルホルムアミド0.
5ml溶液を滴下し、30分間攪拌した。反応液に酢酸エチ
ルを加え水洗、飽和食塩水で洗浄し、硫酸マグネシウム
を加え乾燥した。減圧下濃縮し、濃縮溶液をn−ヘキサ
ン50mlに滴下した。析出した結晶を濾過後乾燥し、目的
化合物を63mg(0.1mmol,70%)得た。 NMR (DMSO-d 6) δ : 3.38 (6H, m, NHCH 2), 3.59 (2H, t, J = 6.8Hz, CH 2 Cl),
3.53 (2H, ABq, J = 16.5Hz, CH 2), 4.60 (2H, d, ABq, J = 7H
z, 13.9Hz, CH 2 ), 5.03 (1H, d, J = 4.8Hz, CH), 5.03 (1H,
m, −CH =), 5.58 (1H, dd, J = 4.8Hz, 8.4Hz, −CH), 6.64
(1H, d, J = 12.8Hz , -CH =), 6.65 (1H, s, thiazole H), 7.09 (2H, s , NH 2) Example 2 7 - [(Z) -2- (2- Amino Thiazol-4-yl) -2-hydroxyiminoacetamide] -3-
[(Z) -3- (N- (2-chloroethyl) carbamoyloxy) -1-propenyl] -3-cephem-4-carboxylate pivaloyloxymethyl To a solution of 80 mg (0.14 mmol) of the compound obtained in Example 1 in 3 ml of dry dimethylformamide was added 37 mg (0.16 mmol) of iodomethyl pivalate in 0.3 ml of dry dimethylformamide under ice cooling.
A 5 ml solution was added dropwise and stirred for 30 minutes. Ethyl acetate was added to the reaction solution, and the mixture was washed with water and saturated brine, dried over magnesium sulfate. The mixture was concentrated under reduced pressure, and the concentrated solution was added dropwise to 50 ml of n-hexane. The precipitated crystals were filtered and dried to give 63 mg (0.1 mmol, 70%) of the target compound.
NMR(DMSO−d6)δ: 1.15(9H,s,C(CH3)3),3.29(2H,dt,J=5.9Hz,12.
1Hz,NHCH2),3.58(2H,t,J=12.1Hz,CH2Cl,3.5〜3.9(2
H,m,CH2),4.3〜4.6(2H,m,CH2),5.28(1H,d,J=4.7H
z,CH),5.5〜5.65(1H,m,=CH−),5.77(1H,dd,J=4.7
Hz,7.8Hz,CH),5.84(2H,ABq,J=3.3Hz,CH2O),6.29(1
H,d,J=11.7Hz,−CH=),6.83(1H,s,チアゾールH),
7.45(1H,t,J=5.9Hz,NH),9.68(1H,d,J=7.8Hz,NH) 実施例3 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ヒドロキシイミノアセトアミド〕−3−
〔(Z)−3−(N−アリルカルバモイルオキシ)−1
−プロペニル〕−3−セフェム−4−カルボン酸ナトリ
ウム塩 製造例4で得られた化合物1mg(0.9mmol)のアニソー
ル3ml溶液に氷冷下トリフルオロ酢酸3mlを滴下し、その
後室温で2時間攪拌した。減圧下濃縮後、濃縮溶液をイ
ソプロピルエーテル20ml、n−ヘキサン80mlの混合液に
滴下し、析出した結晶を濾取した。結晶を90%ギ酸10ml
に加え、室温下3時間攪拌した。減圧下溶媒留去後、残
留物をイソプロピルエーテルで摩砕し結晶を濾取した。
結晶をメタノール20mlに溶かし、酢酸ナトリウム300mg
(5mmol)を加え、減圧下溶媒留去した。粗生成物を2
−プロパノールで摩砕し粗結晶を濾取した。粗結晶をOD
Sカラムクロマトグラフィー(10%水性メタノール)で
精製し、溶出液を減圧下濃縮後、凍結乾燥し、目的化合
物を80mg(0.15mmol,17%)得た。 NMR (DMSO-d 6) δ : 1.15 (9H, s, C (CH 3) 3), 3.29 (2H, dt, J = 5.9Hz, 12.
1 Hz, NHCH 2 ), 3.58 (2H, t, J = 12.1 Hz, CH 2 Cl, 3.5 to 3.9 (2
H, m, CH 2), 4.3~4.6 (2H, m, CH 2), 5.28 (1H, d, J = 4.7H
z, CH), 5.5-5.65 (1H, m, = CH-), 5.77 (1H, dd, J = 4.7
Hz, 7.8Hz, CH), 5.84 (2H, ABq, J = 3.3Hz, CH 2 O), 6.29 (1
H, d, J = 11.7Hz, -CH =), 6.83 (1H, s, thiazole H),
7.45 (1H, t, J = 5.9 Hz, NH), 9.68 (1H, d, J = 7.8 Hz, NH) Example 3 7-[(Z) -2- (2-aminothiazol-4-yl)- 2-hydroxyiminoacetamide] -3-
[(Z) -3- (N-allylcarbamoyloxy) -1
-Propenyl] -3-cephem-4-carboxylic acid sodium salt To a solution of 1 mg (0.9 mmol) of the compound obtained in Production Example 4 in 3 ml of anisole was added dropwise 3 ml of trifluoroacetic acid under ice-cooling, followed by stirring at room temperature for 2 hours. After concentration under reduced pressure, the concentrated solution was added dropwise to a mixed solution of 20 ml of isopropyl ether and 80 ml of n-hexane, and the precipitated crystals were collected by filtration. Crystals 90% formic acid 10ml
And stirred at room temperature for 3 hours. After evaporating the solvent under reduced pressure, the residue was triturated with isopropyl ether and the crystals were collected by filtration.
Dissolve the crystals in methanol 20ml, sodium acetate 300mg
(5 mmol) was added and the solvent was distilled off under reduced pressure. 2 crude products
-Trituration with propanol and filtration of the crude crystals. OD crude crystals
Purification was performed by S column chromatography (10% aqueous methanol), and the eluate was concentrated under reduced pressure and lyophilized to obtain 80 mg (0.15 mmol, 17%) of the target compound.
NMR(D2O−d6)δ: 3.62(2H,ABq,J=17Hz,CH2),3.84(2H,d.J=4.8Hz,N
HCH2),4.55〜4.85(2H,m,CH2),4.87(2H,ABq,J=17.1
Hz,CH2),5.25(1H,dd,J=1.5Hz,10.3Hz,=CH2),5.30
(1H,dd,J=1.5Hz,17.2Hz,=CH2),5.42(1H,d,J=4.7H
z,CH),5.78〜5.87(1H,m,=CH−),5.92〜6.03(1H,m,
−CH=),5.97(1H,d,J=4.7Hz,CH),6.32(1H,d,J=1
1.8Hz,−CH=),7.12(1H,s,チアゾールH) 実施例4 7−〔(Z)−2−(2−アミノチアゾール−4−イ
ル)−2−ヒドロキシイミノアセトアミド〕−3−
〔(Z)−3−(N−2−アリルカルバモイルオキシ)
−1−プロペニル〕−3−セフェム−4−カルボン酸
ピバロイルオキシメチル 実施例3で得られた化合物50mg(0.09mmol)の乾燥ジ
メチルホルムアミド3ml溶液に氷冷下ヨードメチルピバ
レート24mg(0.1mmol)の乾燥ジメチルホルムアミド0.5
ml溶液を滴下し、30分間攪拌した。反応液に酢酸エチル
を加え水洗、飽和食塩水で洗浄し、硫酸マグネシウムを
加え乾燥した。減圧下濃縮し、濃縮溶液をn−ヘキサン
50mlに滴下した。析出した結晶を濾過後乾燥し、目的化
合物を35mg(0.06mmol,61%)得た。 NMR (D 2 O-d 6 ) δ: 3.62 (2H, ABq, J = 17Hz, CH 2), 3.84 (2H, dJ = 4.8Hz, N
HCH 2), 4.55~4.85 (2H, m, CH 2), 4.87 (2H, ABq, J = 17.1
Hz, CH 2 ), 5.25 (1H, dd, J = 1.5 Hz, 10.3 Hz, = CH 2 ), 5.30
(1H, dd, J = 1.5Hz , 17.2Hz, = CH 2), 5.42 (1H, d, J = 4.7H
z, CH), 5.78-5.87 (1H, m, = CH-), 5.92-6.03 (1H, m,
−CH =), 5.97 (1H, d, J = 4.7 Hz, CH), 6.32 (1H, d, J = 1)
1.8 Hz, -CH =), 7.12 (1H, s, thiazole H) Example 4 7-[(Z) -2- (2-aminothiazol-4-yl) -2-hydroxyiminoacetamido] -3-
[(Z) -3- (N-2-allylcarbamoyloxy)
-1-propenyl] -3-cephem-4-carboxylic acid
Pivaloyloxymethyl To a solution of 50 mg (0.09 mmol) of the compound obtained in Example 3 in 3 ml of dry dimethylformamide was added 24 mg (0.1 mmol) of iodomethyl pivalate in 0.5 ml of dry dimethylformamide under ice cooling.
The ml solution was added dropwise and stirred for 30 minutes. Ethyl acetate was added to the reaction solution, and the mixture was washed with water and saturated brine, dried over magnesium sulfate. Concentrate under reduced pressure, and concentrate the concentrated solution with n-hexane.
It was added dropwise to 50 ml. The precipitated crystals were filtered and dried to give 35 mg (0.06 mmol, 61%) of the target compound.
NMR(DMSO−d6)δ: 1.15(9H,s,C(CH3)3),3.55〜3.77(4H,m,CH2,C
H2),4.35〜4.65(2H,m,CH2),5.04(1H,dd,J=1.4Hz,1
0.2Hz,=CH2),5.10(1H,dd,J=1.4Hz,17.2Hz,=CH2),
5.25(1H,d,J=5.1Hz,CH),5.60〜5.70(1H,m,−CH
=),5.70〜5.90(4H,m,−CH=,OCH2,CH),6.27(1H,d,
J=11.7Hz,−CH=),6.67(1H,s,チアゾールH) NMR (DMSO-d 6) δ : 1.15 (9H, s, C (CH 3) 3), 3.55~3.77 (4H, m, CH 2, C
H 2), 4.35~4.65 (2H, m, CH 2), 5.04 (1H, dd, J = 1.4Hz, 1
0.2Hz, = CH 2 ), 5.10 (1H, dd, J = 1.4Hz, 17.2Hz, = CH 2 ),
5.25 (1H, d, J = 5.1Hz, CH), 5.60-5.70 (1H, m, -CH
=), 5.70~5.90 (4H, m , -CH =, OCH 2, CH), 6.27 (1H, d,
J = 11.7Hz, -CH =), 6.67 (1H, s, thiazole H)
───────────────────────────────────────────────────── フロントページの続き 審査官 内田 淳子 (56)参考文献 特開 昭55−154981(JP,A) 特開 平3−128381(JP,A) 米国特許4094978(US,A) (58)調査した分野(Int.Cl.7,DB名) C07D 501/00 - 501/62 A61K 31/00 - 31/80 CA(STN) REGISTRY(STN)────────────────────────────────────────────────── ─── Continuation of the front page Examiner Junko Uchida (56) References JP-A-55-154981 (JP, A) JP-A-3-128381 (JP, A) US Patent 4094978 (US, A) (58) Search Field (Int.Cl. 7 , DB name) C07D 501/00-501/62 A61K 31/00-31/80 CA (STN) REGISTRY (STN)
Claims (3)
カルボキシキル基又は保護基で保護されたカルボキシル
基を示す。R3は低級ハロゲン化アルキル基又は低級アル
ケニル基を示す。)で表されるチアゾリルアセトアミド
−3−セフェム系誘導体又はその医薬として許容される
塩。(1) Expression (In the formula, R 1 represents a hydroxyl group or a lower alkoxy group. R 2 represents a carboxy group or a carboxyl group protected by a protecting group. R 3 represents a lower halogenated alkyl group or a lower alkenyl group.) The represented thiazolylacetamide-3-cephem derivative or a pharmaceutically acceptable salt thereof.
ルボキシル基を示す。R4はアミノ基又は保護基で保護さ
れたアミノ基を示す。R5は水酸基又は保護基で保護され
た水酸基又は低級アルコキシ基を示す。)で表わされる
化合物あるいはそれらの塩と、式R3−N=C=O(ここ
でR3は低級ハロゲン化アルキル基又は低級アルケニル基
を示す。)で表されるイソシアネートと反応させ、必要
によりアミノ基、水酸基又はカルボキシル基の保護基を
離脱することを特徴とする式 (式中、R1は水酸基又は低級アルコキシ基を示す。R2は
カルボキシキル基又は保護基で保護されたカルボキシル
基を示す。R3は低級ハロゲン化アルキル基又は低級アル
ケニル基を示す。)で表されるチアゾリルアセトアミド
−3−セフェム系誘導体又はその医薬として許容される
塩の製造法。(2) (Wherein, R 2 represents a carboxyl group or a carboxyl group protected with a protecting group. R 4 represents an amino group or an amino group protected with a protecting group. R 5 is a hydroxyl group or a hydroxyl group protected with a protecting group. Or a salt thereof, or a salt thereof, and a formula R 3 —N = C = O (where R 3 represents a lower halogenated alkyl group or a lower alkenyl group). A formula characterized by reacting with an isocyanate and, if necessary, removing a protecting group for an amino group, a hydroxyl group or a carboxyl group. (In the formula, R 1 represents a hydroxyl group or a lower alkoxy group. R 2 represents a carboxy group or a carboxyl group protected by a protecting group. R 3 represents a lower halogenated alkyl group or a lower alkenyl group.) A method for producing the represented thiazolylacetamide-3-cephem derivative or a pharmaceutically acceptable salt thereof.
カルボキシキル基又は保護基で保護されたカルボキシル
基を示す。R3は低級ハロゲン化アルキル基又は低級アル
ケニル基を示す。)で表されるチアゾリルアセトアミド
−3−セフェム系誘導体又はその医薬として許容される
塩からなる抗菌剤。3. The formula: (In the formula, R 1 represents a hydroxyl group or a lower alkoxy group. R 2 represents a carboxy group or a carboxyl group protected by a protecting group. R 3 represents a lower halogenated alkyl group or a lower alkenyl group.) An antibacterial agent comprising the represented thiazolylacetamide-3-cephem derivative or a pharmaceutically acceptable salt thereof.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26515389 | 1989-10-13 | ||
JP1-265153 | 1989-10-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03204884A JPH03204884A (en) | 1991-09-06 |
JP3005273B2 true JP3005273B2 (en) | 2000-01-31 |
Family
ID=
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