JPH0532927Y2 - - Google Patents
Info
- Publication number
- JPH0532927Y2 JPH0532927Y2 JP7368586U JP7368586U JPH0532927Y2 JP H0532927 Y2 JPH0532927 Y2 JP H0532927Y2 JP 7368586 U JP7368586 U JP 7368586U JP 7368586 U JP7368586 U JP 7368586U JP H0532927 Y2 JPH0532927 Y2 JP H0532927Y2
- Authority
- JP
- Japan
- Prior art keywords
- correction
- focus correction
- pole piece
- charged particle
- particle beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002245 particle Substances 0.000 claims description 9
- 238000010894 electron beam technology Methods 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Description
【考案の詳細な説明】
[産業上の利用分野]
本考案は荷電粒子線装置に関し、詳しくは荷電
ビームの光軸よりのずれを防止して焦点補正を高
速に行なうことを可能にした荷電粒子線装置に関
する。[Detailed description of the invention] [Field of industrial application] The present invention relates to a charged particle beam device, and more specifically, a charged particle beam device that prevents the charged beam from shifting from the optical axis and makes it possible to perform focus correction at high speed. Regarding line equipment.
[従来技術]
従来の電子ビーム露光装置等においては、第2
図に示すように電子銃1よりの電子ビーム2を集
束レンズ3及び対物レンズ4で集束して試料5上
に結像照射すると共に、対物レンズ4の例えば電
子銃1側に配置した焦点補正用コイル6に焦点補
正用の補正信号(励磁電流)を供給することによ
つて焦点補正を行なつている。[Prior art] In conventional electron beam exposure equipment, etc., the second
As shown in the figure, an electron beam 2 from an electron gun 1 is focused by a focusing lens 3 and an objective lens 4, and is irradiated onto a sample 5 in an image manner. Focus correction is performed by supplying a correction signal (excitation current) for focus correction to the coil 6.
又、第3図に示すように、対物レンズ4が形成
する磁界内に焦点補正用の補正電極7を配置し、
この補正電極7に補正用電源8より補正信号(電
圧)を供給して、補正電極7によつて形成される
電界強度を変化させることにより焦点補正を行つ
ている。 Further, as shown in FIG. 3, a correction electrode 7 for focus correction is arranged within the magnetic field formed by the objective lens 4,
Focus correction is performed by supplying a correction signal (voltage) to the correction electrode 7 from a correction power source 8 and changing the electric field strength formed by the correction electrode 7.
[考案が解決しようとする問題点]
ところで上述した従来装置おいては、例えば前
者の焦点補正用コイル6による焦点補正では、焦
点補正用コイル6に補正信号を供給した場合、焦
点補正用コイル6のインダクタンスによる磁界変
化の遅れにより焦点を所定距離高速で移動させる
ことができず、従つて、焦点補正を高速で行なう
ことはできない。又、対物レンズ4と焦点補正用
コイル6の機械的な軸を完全に一致させること
は、加工精度及び組立て精度等により極めて困難
である。そのため、焦点補正用コイル6に補正信
号を供給して動作させた場合に、対物レンズ4の
レンズ軸と焦点補正用コイル6の補正軸とが必ず
しも一致せず電子ビーム2が光軸Zよりずれてし
まう。又、後者の補正電極7による焦点補正で
は、前者の焦点補正用コイル6による焦点補正の
ように磁界変化の遅れによる焦点補正の遅れはあ
まり問題とならないが、対物レンズ4のレンズ軸
と補正電極7の補正軸を一致させることは前者同
様に困難であり、従つて、後者の補正電極7によ
つても電子ビーム2が光軸Zよりずれてしまう欠
点があつた。[Problems to be Solved by the Invention] In the conventional device described above, for example, in the former focus correction coil 6, when a correction signal is supplied to the focus correction coil 6, the focus correction coil 6 The focal point cannot be moved a predetermined distance at high speed due to the delay in magnetic field change due to the inductance, and therefore, the focus cannot be corrected at high speed. Furthermore, it is extremely difficult to completely align the mechanical axes of the objective lens 4 and the focus correction coil 6 due to processing precision, assembly precision, and the like. Therefore, when a correction signal is supplied to the focus correction coil 6 to operate it, the lens axis of the objective lens 4 and the correction axis of the focus correction coil 6 do not necessarily match, and the electron beam 2 deviates from the optical axis Z. It ends up. In addition, in the latter focus correction using the correction electrode 7, the delay in focus correction due to the delay in magnetic field change does not pose much of a problem as in the former focus correction using the focus correction coil 6, but the lens axis of the objective lens 4 and the correction electrode It is difficult to match the correction axes of the electrodes 7 and 7, and therefore, the latter correction electrode 7 also has the disadvantage that the electron beam 2 is deviated from the optical axis Z.
本考案は以上の点に鑑みなされたもので、焦点
補正による電子ビームの光軸よりのずれを防止し
焦点補正を高速で行ない得る装置を提供すること
を目的としている。 The present invention has been developed in view of the above points, and an object of the present invention is to provide an apparatus that can prevent an electron beam from being deviated from the optical axis due to focus correction and can perform focus correction at high speed.
[問題点を解決するための手段]
本目的を達成するための本考案は、荷電粒子ビ
ームを集束するための磁界型レンズのポールピー
スを、荷電粒子線装置を構成するカラムより電気
的に絶縁して、該ポールピースに焦点補正用の電
位を与えるように構成したことを特徴としてい
る。[Means for solving the problem] The present invention for achieving the present purpose is to electrically insulate the pole piece of a magnetic field type lens for focusing a charged particle beam from a column constituting a charged particle beam device. The pole piece is characterized in that it is configured to apply a focus correction potential to the pole piece.
[実施例] 以下本考案の実施例を図面に基づき詳述する。[Example] Embodiments of the present invention will be described in detail below with reference to the drawings.
第1図は本考案の一実施例の構成図である。第
1図において、第2図の従来装置と同一構成要素
には同一番号を付してその説明を省略する。第1
図に装置においては、対物レンズ4を構成するポ
ールピース4aを、鏡体等のカラム9より絶縁部
材10によつて電気的に絶縁し、該ポールピース
4aに補正用電源8より補正電圧を可変させて印
加できるように構成されている。 FIG. 1 is a block diagram of an embodiment of the present invention. In FIG. 1, the same components as those of the conventional device shown in FIG. 2 are given the same numbers and their explanations will be omitted. 1st
In the apparatus shown in the figure, a pole piece 4a constituting an objective lens 4 is electrically insulated from a column 9 such as a mirror body by an insulating member 10, and a correction voltage is applied to the pole piece 4a by a correction power source 8. It is configured so that it can be applied at a certain angle.
ところで、弱励磁レンズにおいて、焦点距離を
f、加速電圧を、レンズへの印加電圧をVとす
ると、f∝(−V)で表わされる。 By the way, in a weakly excitation lens, if the focal length is f, the acceleration voltage is V, and the voltage applied to the lens is V, it is expressed as f∝(-V).
従つて、ポールピース4aに印加する電圧Vを
補正用電源8によつて変化させ、該ポールピース
4aによつて形成される電界強度を変化させるこ
とにより電子ビーム2の焦点距離fが変化するた
め焦点補正を行なうことができる。又、このよう
な装置では、従来装置のようにインダクタンスに
よる磁界変化の遅れも無いため、焦点補正を高速
で行ない得る。又、ポールピース4aが補正電極
を兼ねているため、対物レンズ4のレンズ軸とポ
ールピース4aによる補正軸を完全に一致させる
ことができるため、電子ビーム2が光軸Zよりず
れることはない。 Therefore, by changing the voltage V applied to the pole piece 4a by the correction power source 8 and changing the electric field strength formed by the pole piece 4a, the focal length f of the electron beam 2 can be changed. Focus correction can be performed. Further, in such a device, there is no delay in magnetic field change due to inductance as in conventional devices, so focus correction can be performed at high speed. Further, since the pole piece 4a also serves as a correction electrode, the lens axis of the objective lens 4 and the correction axis by the pole piece 4a can be perfectly aligned, so that the electron beam 2 will not deviate from the optical axis Z.
[考案の効果]
以上詳述したように本考案によれば、荷電粒子
線装置において、荷電粒子ビームの光軸よりのず
れを防止して焦点補正を高速に行ない得る装置が
提供される。[Effects of the Invention] As described in detail above, the present invention provides a charged particle beam device that can prevent the charged particle beam from being deviated from the optical axis and perform focus correction at high speed.
第1図は本考案の一実施例の構成略図、第2図
及び第3図は従来装置を説明するための図であ
る。
1……電子銃、2……電子ビーム、3……集束
レンズ、4……対物レンズ、5……試料、8……
補正用電源、9……カラム、10……絶縁部材。
FIG. 1 is a schematic diagram of the configuration of an embodiment of the present invention, and FIGS. 2 and 3 are diagrams for explaining a conventional device. 1... Electron gun, 2... Electron beam, 3... Focusing lens, 4... Objective lens, 5... Sample, 8...
Correction power supply, 9...column, 10...insulating member.
Claims (1)
のポールピースを、荷電粒子線装置を構成するカ
ラムより電気的に絶縁して、該ポールピースに焦
点補正用の電位を与えるように構成したことを特
徴とする荷電粒子線装置。 A pole piece of a magnetic field type lens for focusing a charged particle beam is electrically insulated from a column constituting a charged particle beam device, and a potential for focus correction is applied to the pole piece. Charged particle beam device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7368586U JPH0532927Y2 (en) | 1986-05-16 | 1986-05-16 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7368586U JPH0532927Y2 (en) | 1986-05-16 | 1986-05-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62186362U JPS62186362U (en) | 1987-11-27 |
JPH0532927Y2 true JPH0532927Y2 (en) | 1993-08-23 |
Family
ID=30918236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7368586U Expired - Lifetime JPH0532927Y2 (en) | 1986-05-16 | 1986-05-16 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0532927Y2 (en) |
-
1986
- 1986-05-16 JP JP7368586U patent/JPH0532927Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS62186362U (en) | 1987-11-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4806766A (en) | Magnetic lens system | |
JPS5871545A (en) | Variable forming beam electron optical system | |
JP2009054581A (en) | Corrector for charged particle beam aberration, and charged particle beam device | |
US2547994A (en) | Electronic microscope | |
JPS5972658A (en) | Optical apparatus for deflection or positional adjustment ofradiation beam | |
JPH0532927Y2 (en) | ||
JPH02230647A (en) | Multi-position device and its manufacture | |
JP2886277B2 (en) | Electron beam exposure equipment | |
JPS6358747A (en) | Electron microscope | |
US2926254A (en) | Electron lenses | |
KR20040034600A (en) | Slit lens arrangement for particle beams | |
JPS5953658B2 (en) | electronic lens | |
JPH0234751Y2 (en) | ||
JPS59130365U (en) | Sample energizing device in electron microscope | |
JPH0525161Y2 (en) | ||
JPS62219445A (en) | Electron beam device | |
JP3618568B2 (en) | Electromagnetic field superposition type lens | |
JPS5942945B2 (en) | cathode ray tube device | |
JPH0234414B2 (en) | ||
JP2004199912A (en) | Aberration correcting device for electrically-charged particle beam device | |
SU997133A1 (en) | Method of adjusting quadrupole duplicate | |
JPS61202869U (en) | ||
SU1631625A1 (en) | Device for cathode-ray tube electron beam control | |
JPS5914262U (en) | Automatic photographing device in electron microscope | |
Nunan | Alternating gradient lenses for reducing the Area of a Beam |