JPH05327118A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPH05327118A
JPH05327118A JP13251392A JP13251392A JPH05327118A JP H05327118 A JPH05327118 A JP H05327118A JP 13251392 A JP13251392 A JP 13251392A JP 13251392 A JP13251392 A JP 13251392A JP H05327118 A JPH05327118 A JP H05327118A
Authority
JP
Japan
Prior art keywords
semiconductor laser
lead
laser device
laser element
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13251392A
Other languages
Japanese (ja)
Other versions
JP3213378B2 (en
Inventor
Yoshio Noisshiki
慶夫 野一色
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Original Assignee
Tokyo Sanyo Electric Co Ltd
Tottori Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Sanyo Electric Co Ltd, Tottori Sanyo Electric Co Ltd, Sanyo Electric Co Ltd filed Critical Tokyo Sanyo Electric Co Ltd
Priority to JP13251392A priority Critical patent/JP3213378B2/en
Publication of JPH05327118A publication Critical patent/JPH05327118A/en
Application granted granted Critical
Publication of JP3213378B2 publication Critical patent/JP3213378B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To obtain a semiconductor laser device at a low cost which is easy to focus an output beam and be manufactured. CONSTITUTION:A semiconductor laser element 4 is mounted on a lead 1, and has a cleaved output surface 5. An insulating frame 7 is formed on the periphery of the lead 1 so as to expose the output surface 5. At least the part from the rear of the semiconductor laser element 4 to a photo detector 6 on the lead 1 is desirably covered with transparent resin 10, so as to expose the output surface 5 of the semiconductor laser element 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は出射ビームの絞り易い半
導体レーザ装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor laser device in which an emitted beam can be easily focused.

【0002】[0002]

【従来の技術】近年、半導体レーザ装置の改良が数多く
なされているが、その中で例えば特開平2−12548
6号公報で開示された半導体レーザ装置を図6に示す。
この図6に於て、ステム31上に柱状体32が固着さ
れ、その上に順次、サブマウント33、半導体レーザ素
子34が固着されている。またステム31上に順次、載
置台35、受光素子36が固着されている。そしてケー
ス37の開孔部の下にガラス38が固定されている。
2. Description of the Related Art In recent years, many improvements have been made to semiconductor laser devices.
The semiconductor laser device disclosed in Japanese Patent No. 6 is shown in FIG.
In FIG. 6, a columnar body 32 is fixed on the stem 31, and a submount 33 and a semiconductor laser element 34 are sequentially fixed thereon. Further, a mounting table 35 and a light receiving element 36 are sequentially fixed on the stem 31. The glass 38 is fixed under the opening of the case 37.

【0003】[0003]

【発明が解決しようとする課題】しかして上述の半導体
レーザ装置に於て、半導体レーザ素子34が高温になる
ので、これを放熱させるために高価な材料からなるステ
ム31と柱状体32とサブマウント33を使用してい
る。そして半導体レーザ素子34からの出射光がガラス
38の表面上の凹凸により散乱するので出射ビームが絞
りにくいという欠点が有る。更に受光素子36上に大気
中の水分により結露が生じて誤動作する事を防止するた
めに、ケース37の内部に窒素39を封入しながらガラ
ス38を固定している。そのため製造時間が長くなる欠
点がある。故に本発明は上述の欠点に鑑みてなされたも
のであり、コストの安いかつ出射ビームを絞りやすいか
つ製造し易い半導体レーザ装置を提供するものである。
In the above semiconductor laser device, however, since the semiconductor laser element 34 becomes high in temperature, the stem 31, the columnar body 32, and the submount 31 made of an expensive material for radiating the heat are radiated. I am using 33. Since the emitted light from the semiconductor laser element 34 is scattered by the irregularities on the surface of the glass 38, there is a drawback that the emitted beam is difficult to narrow. Further, in order to prevent malfunction due to dew condensation caused by moisture in the atmosphere on the light receiving element 36, the glass 38 is fixed while enclosing nitrogen 39 in the case 37. Therefore, there is a drawback that the manufacturing time becomes long. Therefore, the present invention has been made in view of the above-mentioned drawbacks, and provides a semiconductor laser device which is low in cost, easy to focus an outgoing beam, and easy to manufacture.

【0004】[0004]

【課題を解決するための手段】本発明は上述の課題を解
決するために、リード上に載置されかつへき開された出
射面を有する半導体レーザ素子と、その出射面を露出す
る様にリードの周辺に絶縁枠を形成するものである。本
発明は更に望しくは、半導体レーザ素子の出射面を露出
する様に、少なくとも半導体レーザ素子の後面からリー
ド上の受光素子までを透光性樹脂で覆うものである。
SUMMARY OF THE INVENTION In order to solve the above problems, the present invention is directed to a semiconductor laser device having an emitting surface which is placed on the lead and cleaved, and a semiconductor laser device having the emitting surface exposed. An insulating frame is formed around the periphery. More preferably, the present invention covers at least the rear surface of the semiconductor laser element and the light receiving element on the lead with a transparent resin so that the emission surface of the semiconductor laser element is exposed.

【0005】[0005]

【作用】本発明は上述の様に、半導体レーザ素子を直
接、リード上に載置して放熱させるので、従来のステム
と柱状部とサブマウントが不要になりコストが安くな
る。また半導体レーザ素子のへき開面から直接出射させ
るので、散乱がなく出射ビームが絞り易い。更に結露防
止のために受光素子を透光性樹脂で覆うので、従来より
製造し易くなる。
As described above, according to the present invention, since the semiconductor laser device is directly placed on the leads to radiate heat, the conventional stem, columnar portion and submount are not required, and the cost is reduced. Further, since the light is emitted directly from the cleavage plane of the semiconductor laser element, there is no scattering and the emitted beam can be easily narrowed. Further, since the light-receiving element is covered with a light-transmissive resin to prevent dew condensation, manufacturing becomes easier than ever before.

【0006】[0006]

【実施例】以下、本発明の第1実施例を図1と図2に従
い説明する。図1は本実施例に係る半導体レーザ装置の
断面図であり、図2は図1のAA断面図である。これら
の図に於て、リード1は金属等の材料により厚みが0、
1乃至0、5mm程度の矩形板状に形成されている。他
のリード2、3も同様に金属等の材料より成り、共にリ
ード1と離れて対向な位置にある。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIGS. 1 is a sectional view of a semiconductor laser device according to the present embodiment, and FIG. 2 is a sectional view taken along the line AA of FIG. In these figures, the lead 1 has a thickness of 0 due to a material such as metal,
It is formed in a rectangular plate shape of about 1 to 0, 5 mm. Similarly, the other leads 2 and 3 are also made of a material such as metal, and are located opposite to the lead 1 apart from each other.

【0007】半導体レーザ素子4は直線状の活性層とそ
の活性層を挟むクラッド層からなるGaAlAsの発光
層からできている。半導体レーザ素子4の両端はへき開
されその上に反射膜が形成されている。半導体レーザ素
子4の出射面5がリード1の1辺の近傍に位置する様
に、リード1上に銀ペースト等の導電性接着剤又は半田
を介して半導体レーザ素子4が固着されている。また従
来は銀ペースト等は熱伝導が悪いので使用出来なかっ
た。しかし本実施例では半導体レーザ素子4をサブマウ
ントなしにリード1上に固着しても放熱特性を確保でき
るので銀ペーストを使用できる。銀ペーストの使用温度
は約160℃と低いので、リード1上に樹脂を設ける時
に樹脂が変形しない。従って従来の様に半導体レーザ素
子とサブマウントを半田付けする作業に比べて、本実施
例の銀ペーストで固着する方が作業が容易となる。
The semiconductor laser device 4 is composed of a GaAlAs light emitting layer composed of a linear active layer and a clad layer sandwiching the active layer. Both ends of the semiconductor laser device 4 are cleaved and a reflective film is formed thereon. The semiconductor laser element 4 is fixed onto the lead 1 via a conductive adhesive or solder such as silver paste so that the emission surface 5 of the semiconductor laser element 4 is located near one side of the lead 1. Further, in the past, silver paste and the like could not be used because of poor thermal conductivity. However, in the present embodiment, even if the semiconductor laser element 4 is fixed onto the lead 1 without submounting, the heat dissipation characteristic can be secured, so that the silver paste can be used. Since the use temperature of the silver paste is as low as about 160 ° C., the resin does not deform when the resin is provided on the leads 1. Therefore, as compared with the conventional work of soldering the semiconductor laser element and the submount, the work is easier to fix with the silver paste of this embodiment.

【0008】受光素子6は例えばP−I−N構造を成し
たシリコン系結晶の表面と裏面に電極を設けたものであ
る。受光素子6は半導体レーザ素子4の後方、すなわち
出射面5と反対側のリード1上に固着されている。絶縁
枠7は例えばポリカーボネート樹脂又はエポキシ樹脂等
からなり、半導体レーザ素子4の出射面5を露出する様
に平面コ字状に、かつリード1、他のリード2、3の各
表面と裏面を挟む様にトランスファーモールドによって
形成されている。また絶縁枠7はアルミナセラミック又
は絶縁処理した金属材料で構成しても良い。
The light receiving element 6 is, for example, an electrode provided on the front surface and the back surface of a silicon crystal having a P-I-N structure. The light receiving element 6 is fixed to the rear of the semiconductor laser element 4, that is, on the lead 1 opposite to the emitting surface 5. The insulating frame 7 is made of, for example, a polycarbonate resin or an epoxy resin, and has a planar U shape so as to expose the emitting surface 5 of the semiconductor laser element 4, and sandwiches the front surface and the back surface of the lead 1 and the other leads 2 and 3. Similarly, it is formed by transfer molding. The insulating frame 7 may be made of alumina ceramic or an insulating metal material.

【0009】金属細線8が半導体レーザ素子4の表面電
極と他のリード2を結ぶ様に配線され、金属細線9が受
光素子6の表面電極と他のリード3を結ぶ様に配線され
ている。透光性樹脂10は、例えばエポキシ樹脂又はシ
リコン樹脂からなり、半導体レーザ素子4の出射面5を
露出する様に、少なくとも半導体レーザ素子4の後面
(出射面5の反対側の端面)近傍から受光素子6を一体
に覆う様に形成されている。これらの部品により半導体
レーザ装置11が構成されている。
A thin metal wire 8 is wired so as to connect the surface electrode of the semiconductor laser element 4 and the other lead 2, and a thin metal wire 9 is wired so as to connect the surface electrode of the light receiving element 6 and the other lead 3. The translucent resin 10 is made of, for example, an epoxy resin or a silicon resin, and receives light from at least the vicinity of the rear surface (the end surface opposite to the emission surface 5) of the semiconductor laser element 4 so as to expose the emission surface 5 of the semiconductor laser element 4. It is formed to integrally cover the element 6. The semiconductor laser device 11 is composed of these components.

【0010】次に、上述の第1実施例を改良した本発明
の第2実施例を図3に従って説明する。図3は本実施例
に係る半導体レーザ装置の断面図である。この図に於
て、絶縁枠12は半導体レーザ素子4の出射面5を露出
する様に、平面状4辺がリード1、他のリード2、3の
周辺を囲む様に形成されている。透光性樹脂13は半導
体レーザ素子4の出射面5を露出する様に、半導体レー
ザ素子4と受光素子6と金属細線8、9を覆い、絶縁枠
12の内部を埋める様に形成されている。上述の様に金
属細線8、9を透光性樹脂13で覆う事により充電部が
露出しないので、電気的短絡を防止できる。
Next, a second embodiment of the present invention, which is an improvement of the first embodiment described above, will be described with reference to FIG. FIG. 3 is a sectional view of the semiconductor laser device according to the present embodiment. In this figure, the insulating frame 12 is formed so that the plane 4 sides surround the periphery of the lead 1 and the other leads 2 and 3 so as to expose the emitting surface 5 of the semiconductor laser element 4. The translucent resin 13 is formed so as to cover the semiconductor laser element 4, the light receiving element 6 and the thin metal wires 8 and 9 so as to expose the emission surface 5 of the semiconductor laser element 4, and to fill the inside of the insulating frame 12. . By covering the thin metal wires 8 and 9 with the translucent resin 13 as described above, the charging part is not exposed, so that an electrical short circuit can be prevented.

【0011】次に上述の第2実施例を改良した第3実施
例を図4と図5に従って説明する。図4は本実施例に係
る半導体レーザ装置の断面図であり、図5は図4のBB
断面図である。これらの図に於て、受光素子14は例え
ばP−I−N構造を成したシリコン系結晶に表面電極1
5、16と裏面電極17を設けたものである。表面電極
16はP型拡散領域18とオーミック接触して形成され
ている。
Next, a third embodiment which is an improvement of the above-mentioned second embodiment will be described with reference to FIGS. 4 and 5. 4 is a sectional view of the semiconductor laser device according to the present embodiment, and FIG. 5 is a cross-sectional view of BB of FIG.
FIG. In these figures, the light receiving element 14 is, for example, a silicon-based crystal having a P-I-N structure and a surface electrode 1
5, 16 and the back electrode 17 are provided. The surface electrode 16 is formed in ohmic contact with the P-type diffusion region 18.

【0012】半導体レーザ素子4は受光素子14の表面
電極15上に固着されている。金属細線8、9、19は
それぞれ半導体レーザ素子の表面と他のリード2との
間、表面電極16と他のリード3との間、および表面電
極15とリード1との間を結ぶ様に配線されている。透
光性樹脂20は半導体レーザ素子4の後面近傍から受光
素子14のP型拡散領域18を一体に覆う様に形成され
ている。この様に透光性樹脂20で覆うことにより、半
導体レーザ素子4の後面からの出射光が透光性樹脂20
と大気との界面で反射されP型拡散領域18に確実に入
射する。故に受光量が増えるので、受光素子14の感度
が向上する。猶、図3乃至図5で示した番号と図1と図
2で示した番号と同じものは同じ部品である事を示す。
The semiconductor laser element 4 is fixed on the surface electrode 15 of the light receiving element 14. The thin metal wires 8, 9, 19 are wired so as to connect between the surface of the semiconductor laser device and the other lead 2, between the surface electrode 16 and the other lead 3, and between the surface electrode 15 and the lead 1, respectively. Has been done. The transparent resin 20 is formed so as to integrally cover the P type diffusion region 18 of the light receiving element 14 from the vicinity of the rear surface of the semiconductor laser element 4. By thus covering with the translucent resin 20, the light emitted from the rear surface of the semiconductor laser element 4 is transmitted through the translucent resin 20.
It is reflected at the interface between the air and the atmosphere and surely enters the P-type diffusion region 18. Therefore, since the amount of light received increases, the sensitivity of the light receiving element 14 improves. For the sake of simplicity, the same numbers as those shown in FIGS. 3 to 5 and those shown in FIGS. 1 and 2 indicate the same parts.

【0013】[0013]

【発明の効果】本発明は上述の様に、半導体レーザ素子
を直接、リード上に載置して放熱させるので、従来のス
テムと柱状体とサブマウントと載置台とケースが不要と
なる。故にコストが従来の約半分となる。またリードを
絶縁枠で挟みこむので強固な構造となり得る。
As described above, according to the present invention, since the semiconductor laser device is directly mounted on the lead to radiate heat, the conventional stem, columnar body, submount, mounting table and case are not required. Therefore, the cost is about half that of conventional products. Further, since the lead is sandwiched by the insulating frame, a strong structure can be obtained.

【0014】また半導体レーザ素子のへき開面から直接
出射させるので、平坦なへき開面から出た光は散乱する
ことがないから出射ビームが絞り易い。更に結露防止の
ために受光素子を透光性樹脂で覆うので、従来の窒素封
入工程が不要となり、製造し易くなる。
Further, since the light is emitted directly from the cleavage surface of the semiconductor laser device, the light emitted from the flat cleavage surface is not scattered and the emitted beam is easily narrowed. Further, since the light-receiving element is covered with a light-transmissive resin to prevent dew condensation, the conventional nitrogen encapsulation process is not required, which facilitates manufacturing.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例に係る半導体レーザ装置の
断面図である。
FIG. 1 is a sectional view of a semiconductor laser device according to a first embodiment of the present invention.

【図2】図1のAA断面図である。FIG. 2 is a sectional view taken along the line AA in FIG.

【図3】本発明の第2実施例に係る半導体レーザ装置の
断面図である。
FIG. 3 is a sectional view of a semiconductor laser device according to a second embodiment of the present invention.

【図4】本発明の第3実施例に係る半導体レーザ装置の
断面図である。
FIG. 4 is a sectional view of a semiconductor laser device according to a third embodiment of the present invention.

【図5】図4のBB断面図である。5 is a sectional view taken along line BB of FIG.

【図6】従来の半導体レーザ装置の断面図である。FIG. 6 is a sectional view of a conventional semiconductor laser device.

【符号の説明】[Explanation of symbols]

1 リード 4 半導体レーザ素子 5 出射面 6、14 受光素子 7、12 絶縁枠 10、13、20 透光性樹脂 DESCRIPTION OF SYMBOLS 1 Lead 4 Semiconductor laser element 5 Emitting surface 6, 14 Light receiving element 7, 12 Insulating frame 10, 13, 20 Translucent resin

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 リードと、そのリード上に載置されかつ
へき開された出射面を有する半導体レーザ素子と、その
半導体レーザ素子の出射面を露出する様に前記リードの
周辺に形成された絶縁枠とを具備した事を特徴とする半
導体レーザ装置。
1. A semiconductor laser element having a lead, an emission surface placed on the lead and cleaved, and an insulating frame formed around the lead so as to expose the emission surface of the semiconductor laser element. A semiconductor laser device comprising:
【請求項2】 前記半導体レーザ素子の後方の前記リー
ド上に受光素子を配置し、前記半導体レーザ素子の出射
面を露出する様に、少なくとも前記半導体レーザ素子の
後面から前記受光素子までを透光性樹脂で覆った事を特
徴とする請求項1の半導体レーザ装置。
2. A light receiving element is arranged on the lead behind the semiconductor laser element, and at least light is transmitted from the rear surface of the semiconductor laser element to the light receiving element so as to expose the emission surface of the semiconductor laser element. The semiconductor laser device according to claim 1, wherein the semiconductor laser device is covered with a conductive resin.
JP13251392A 1992-05-25 1992-05-25 Semiconductor laser device Expired - Fee Related JP3213378B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13251392A JP3213378B2 (en) 1992-05-25 1992-05-25 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13251392A JP3213378B2 (en) 1992-05-25 1992-05-25 Semiconductor laser device

Publications (2)

Publication Number Publication Date
JPH05327118A true JPH05327118A (en) 1993-12-10
JP3213378B2 JP3213378B2 (en) 2001-10-02

Family

ID=15083099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13251392A Expired - Fee Related JP3213378B2 (en) 1992-05-25 1992-05-25 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JP3213378B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8422522B2 (en) 2008-06-17 2013-04-16 Sharp Kabushiki Kaisha Semiconductor laser device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8422522B2 (en) 2008-06-17 2013-04-16 Sharp Kabushiki Kaisha Semiconductor laser device

Also Published As

Publication number Publication date
JP3213378B2 (en) 2001-10-02

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