JPH05317328A - Laser therapeutic device - Google Patents

Laser therapeutic device

Info

Publication number
JPH05317328A
JPH05317328A JP4146763A JP14676392A JPH05317328A JP H05317328 A JPH05317328 A JP H05317328A JP 4146763 A JP4146763 A JP 4146763A JP 14676392 A JP14676392 A JP 14676392A JP H05317328 A JPH05317328 A JP H05317328A
Authority
JP
Japan
Prior art keywords
light
laser
polarization plane
irradiation light
optical means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4146763A
Other languages
Japanese (ja)
Inventor
Tatsuo Tsunoda
辰夫 角田
Kazuhiro Tsunoda
一広 角田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Topcon Corp
Original Assignee
Topcon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Topcon Corp filed Critical Topcon Corp
Priority to JP4146763A priority Critical patent/JPH05317328A/en
Publication of JPH05317328A publication Critical patent/JPH05317328A/en
Pending legal-status Critical Current

Links

Landscapes

  • Radiation-Therapy Devices (AREA)
  • Laser Surgery Devices (AREA)

Abstract

PURPOSE:To sample the random polarized radiation light simply and accurately by providing a split optical means having a reflecting polarization plane inclined to the laser radiation light and a split optical means having a reflecting polarization plane faced to this reflecting polarization plane and inclined to the reflected light to make the reflection efficiency of the radiation light constant. CONSTITUTION:The first and second beam splitters 1, 2 have the same characteristics, and the first beam splitter 1 is inserted at the incidence angle theta1 of 45 deg. to the radiation optical path OP or the radiation light LI. The radiation light LI from a laser transmitter 14 is divided into the sample light LS and the radiation light LO by the first beam splitter 1, part of the radiation light LI is reflected by 90 deg. on the reflecting polarization plane 6 of the first beam splitter 1 into the sample light LS, and the remaining portion is transmitted through the reflecting polarization plane 6 into the radiation light LO. Reflecting polarization planes 6, 5 of the first and second beam splitters 1, 2 are arranged at positions rotated by 90 deg., and the sample light LS is reflected on the reflecting polarization plane 5 into the sample light LSO.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、照射光の強度をモニ
タする機能を備えたレーザ治療装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laser treatment apparatus having a function of monitoring the intensity of irradiation light.

【0002】[0002]

【従来の技術】レーザ治療装置、たとえばYAGレーザ
光凝固手術装置は、1枚のビームスプリッタをレーザ光
の照射光路中に挿入している。この1枚のビームスプリ
ッタで反射もしくは透過したレーザ光(照射光)の一部
の光をサンプリングして照射光の強度をモニタする方法
が一般的である。
2. Description of the Related Art In a laser treatment apparatus, for example, a YAG laser photocoagulation surgical apparatus, one beam splitter is inserted in the irradiation optical path of laser light. A general method is to monitor the intensity of irradiation light by sampling part of the laser light (irradiation light) reflected or transmitted by this one beam splitter.

【0003】[0003]

【発明が解決しようとする課題】このような従来の方法
による照射光強度のモニタでは、照射光がランダム偏光
の場合には、偏光方向により反射率および透過率が変化
し、正確に照射光強度をモニタすることが不可能であ
る。特に、無コートのビームスプリッタの場合にはP偏
光とS偏光の反射率の差が顕著である。ビームスプリッ
タにコーティングを施すことにより、偏光方向による反
射率の差を減少させることが可能であるが、P偏光とS
偏光の比を完全な1:1にすることは不可能であるた
め、変化するランダム偏光の正確なモニタは不可能であ
る。
In the irradiation light intensity monitor according to the conventional method as described above, when the irradiation light is randomly polarized, the reflectance and the transmittance change depending on the polarization direction, and the irradiation light intensity is accurately measured. Is impossible to monitor. Particularly, in the case of an uncoated beam splitter, the difference in reflectance between P-polarized light and S-polarized light is remarkable. By coating the beam splitter, it is possible to reduce the difference in reflectance depending on the polarization direction.
Accurate monitoring of changing random polarization is not possible because it is not possible to have a perfect 1: 1 ratio of polarizations.

【0004】この発明は、ランダム偏光の照射光のサン
プリングを、特別なコーティングを施すことなしに、簡
易にかつ正確に行なうことができるレーザ治療装置を提
供することを目的とする。
It is an object of the present invention to provide a laser treatment apparatus capable of sampling randomly polarized irradiation light easily and accurately without applying a special coating.

【0005】[0005]

【課題を解決するための手段】この発明は、レーザ発振
手段からのレーザ照射光に対し所定角度その第1反射偏
光面を傾斜させて配置した第1分割光学手段と、第1反
射偏光面と対向する第2反射偏光面を有し第1分割光学
手段からの反射光に対し所定角度傾斜させて配置した第
2分割光学手段とからなり、レーザ照射光の反射効率を
その偏向成分に拘らず一定にするように構成した光学系
を備えたことを特徴とするレーザ治療装置を要旨として
いる。
SUMMARY OF THE INVENTION According to the present invention, there is provided a first splitting optical means having a first reflection polarization plane inclined with respect to a laser irradiation light from a laser oscillation means at a predetermined angle, and a first reflection polarization plane. And a second splitting optical unit having a second reflecting polarization plane facing each other and arranged at a predetermined angle with respect to the reflected light from the first splitting optical unit, regardless of the deflection component of the reflection efficiency of the laser irradiation light. The gist is a laser treatment apparatus characterized by including an optical system configured to be constant.

【0006】この発明は、レーザ発振手段からのレーザ
照射光に対し所定角度その第1反射偏光面を傾斜させて
配置した第1分割光学手段と、第1反射偏光面と対向す
る第2反射偏光面を有し第1分割光学手段からの第1反
射光に対し所定角度傾斜させ設けられ、レーザ照射光と
一定角度をなす方向に第2反射光を反射させるように配
置した第2分割光学手段とからなり、レーザ照射光の反
射効率をその偏光成分に拘らず一定にするように構成し
た光学系を備えたことを特徴とするレーザ治療装置を要
旨としている。
According to the present invention, the first splitting optical means is disposed so that its first reflection polarization plane is inclined with respect to the laser irradiation light from the laser oscillation means, and the second reflection polarization plane opposite to the first reflection polarization plane. Second split optical means having a surface and provided so as to be inclined at a predetermined angle with respect to the first reflected light from the first split optical means, and arranged to reflect the second reflected light in a direction forming a constant angle with the laser irradiation light. The gist of the laser treatment apparatus is that it is provided with an optical system configured to make the reflection efficiency of the laser irradiation light constant regardless of its polarization component.

【0007】また好ましくは第1分割光学手段をレーザ
照射光に対し45°傾斜させて配置しかつ第2分割光学
手段を第1分割光学手段からの反射光に対し45°傾斜
させて配置したことを特徴とするレーザ治療装置であ
る。さらに好ましくはレーザ照射光と直角をなす方向に
第2反射光を反射させるように第2分割手段を配置した
ことを特徴とするレーザ治療装置である。
Preferably, the first splitting optical means is arranged at a 45 ° angle with respect to the laser irradiation light, and the second splitting optical means is arranged at a 45 ° tilt with respect to the reflected light from the first splitting optical means. It is a laser treatment device characterized by. More preferably, the laser treatment apparatus is characterized in that the second dividing means is arranged so as to reflect the second reflected light in a direction perpendicular to the laser irradiation light.

【0008】[0008]

【作用】第1分割光学手段と第2分割光学手段により、
レーザ照射光(サンプル光)のP偏光とS偏光の比を
1:1にする。これにより、レーザ照射光がランダム偏
光であっても偏光方向の変化に関係なくレーザ照射光の
サンプリングを行なう。
With the first splitting optical means and the second splitting optical means,
The ratio of P-polarized light and S-polarized light of laser irradiation light (sample light) is set to 1: 1. Thus, even if the laser irradiation light is randomly polarized, the laser irradiation light is sampled regardless of the change in the polarization direction.

【0009】[0009]

【実施例】図1はこの発明のレーザ治療装置の好適な実
施例である眼科用YAGレーザ光凝固手術装置を示して
いる。
FIG. 1 shows an ophthalmic YAG laser photocoagulation surgical apparatus which is a preferred embodiment of the laser treatment apparatus of the present invention.

【0010】YAGレーザ光凝固手術装置は、本体10
とプローブ12を有する。本体10とプローブ12は光
ファイバ16で接続されている。本体10には、Qスイ
ッチパルスYAGレーザ発振装置14と光学系20が配
置されている。レーザ発振装置14から出るレーザ照射
光(以下照射光という)LIは、光学系20を通りレー
ザ照射光(以下照射光という)LOとして光ファイバ1
6に導光される。照射光LOは光ファイバ16を通り、
プローブ12から眼の治療部位に照射される。
The YAG laser photocoagulation surgical apparatus has a main body 10
And a probe 12. The main body 10 and the probe 12 are connected by an optical fiber 16. A Q switch pulse YAG laser oscillator 14 and an optical system 20 are arranged in the main body 10. Laser irradiation light (hereinafter referred to as irradiation light) LI emitted from the laser oscillator 14 passes through the optical system 20 and serves as laser irradiation light (hereinafter referred to as irradiation light) LO as the optical fiber 1.
It is guided to 6. The irradiation light LO passes through the optical fiber 16,
The probe 12 irradiates the treatment area of the eye.

【0011】一方、照射光LIは光学系20において強
度測定用のサンプル光LSOに分離されて強度測定メー
タ22に入射される。この強度測定メータ22でサンプ
ル光LSOの強度が測定される。
On the other hand, the irradiation light LI is separated into intensity measuring sample light LSO in the optical system 20 and is incident on the intensity measuring meter 22. The intensity of the sample light LSO is measured by the intensity measuring meter 22.

【0012】光学系20は図2に示す構成である。光学
系20は第1ビームスプリッタ1と第2ビームスプリッ
タ2を有する。第1ビームスプリッタ1と第2ビームス
プリッタ2は、同特性を有し、特別なコーティングは必
要としない。第1ビームスプリッタ1は、図2で示すよ
うに照射光路OPもしくは照射光L1に対して入射角θ
1が45°で挿入されている。レーザ発振器14からの
照射光LIは、第1ビームスプリッタ1によりサンプル
光LSと照射光LOに分けられる。つまり、照射光LI
の一部が第1ビームスプリッタ1の反射偏光面6で90
°で反射されて反射光としてサンプル光LSとなり、照
射光LIの残りの部分が第1ビームスプリッタ1の反射
偏光面5に透過されて照射光LOとなる。
The optical system 20 has the structure shown in FIG. The optical system 20 has a first beam splitter 1 and a second beam splitter 2. The first beam splitter 1 and the second beam splitter 2 have the same characteristics and do not require any special coating. The first beam splitter 1 has an incident angle θ with respect to the irradiation light path OP or the irradiation light L1 as shown in FIG.
1 is inserted at 45 °. The irradiation light LI from the laser oscillator 14 is split into the sample light LS and the irradiation light LO by the first beam splitter 1. That is, the irradiation light LI
Is partially reflected by the reflective polarization plane 6 of the first beam splitter 1
The sample light LS is reflected as reflected light at an angle of °, and the remaining portion of the irradiation light LI is transmitted to the reflection polarization plane 5 of the first beam splitter 1 to become irradiation light LO.

【0013】第2ビームスプリッタ2は、サンプル光L
Sを第1ビームスプリッタ1による反射偏光方向に対し
て90°回転した偏光方向に入射角θ2が45°となる
ように反射させるようになっている。言換えれば、第1
ビームスプリッタ1の反射偏光面6と第2ビームスプリ
ッタ2の反射偏光面5は90°回転した位置に配置され
ている。サンプル光LSは反射偏光面5で反射されてサ
ンプル光LSOとなる。
The second beam splitter 2 receives the sample light L
The S is reflected so that the incident angle θ2 is 45 ° in the polarization direction rotated by 90 ° with respect to the polarization direction reflected by the first beam splitter 1. In other words, the first
The reflection polarization plane 6 of the beam splitter 1 and the reflection polarization plane 5 of the second beam splitter 2 are arranged at positions rotated by 90 °. The sample light LS is reflected by the reflective polarization plane 5 to become the sample light LSO.

【0014】第1ビームスプリッタ1と第2ビームスプ
リッタ2の組合せにより、それぞれ1枚でのP偏光とS
偏光の反射率差がキャンセルされて、照射光LIがたと
えランダム偏光であっても偏光方向の変化に関係なく正
確なサンプリングとモニタが可能になる。
By combining the first beam splitter 1 and the second beam splitter 2, one P-polarized light beam and one S-polarized light beam are obtained.
Since the reflectance difference of the polarized light is canceled, even if the irradiation light LI is randomly polarized light, accurate sampling and monitoring can be performed regardless of the change of the polarization direction.

【0015】したがって第1ビームスプリッタ1と第2
ビームスプリッタ2は、特にコーティングを施してP偏
光とS偏光の反射率を均等にする必要がなく、無コーテ
ィングでも使用可能である。しかも同じ特性を有する第
1ビームスプリッタ1と第2ビームスプリッタ2を合計
2枚組合せるだけでよい。
Therefore, the first beam splitter 1 and the second beam splitter 1
The beam splitter 2 does not need to be particularly coated to make the reflectances of P-polarized light and S-polarized light equal, and can be used without coating. Moreover, it is only necessary to combine a total of two first beam splitters 1 and second beam splitters 2 having the same characteristics.

【0016】図2では、照射光LI、サンプル光LS、
サンプル光LSOについてそれぞれ偏光成分について
X,Y方向の表示が矢印で示してある。照射光LIの
X、Y方向と、サンプル光LSOのX、Y向を見比べる
と、90°回っている。サンプル光LSOは照射光LI
と直角を成している。
In FIG. 2, irradiation light LI, sample light LS,
The X and Y directions of the polarization components of the sample light LSO are indicated by arrows. When the X and Y directions of the irradiation light LI and the X and Y directions of the sample light LSO are compared, they are rotated by 90 °. Sample light LSO is irradiation light LI
And a right angle.

【0017】照射光LIの偏光成分をX方向とY方向に
分離してみる。第1と第2ビームスプリッタ1,2に無
コーティング板を使用した場合には、偏光方向による反
射率の差は図3に示す特性をもつ。図3は入射角θ1,
θ2と反射率の関係を示している。図3の曲線(a)
は、垂直方向の反射率を表している。この反射率はY成
分(P偏光)を示す。図3の曲線(b)は、平行方向の
反射率を表している。この反射率はX成分(S偏光)を
示す。照射光LIを第1ビームスプリッタ1に45°の
入射角θ1で入射すると、X成分はS偏光でY成分はP
偏光となり、その反射率は入射角θ1が45°のときの
図3の曲線(a)の値で示すように、S偏光が9%で、
曲線(b)の値で示すようにP偏光が2%である。
The polarization component of the irradiation light LI will be separated in the X and Y directions. When uncoated plates are used for the first and second beam splitters 1 and 2, the difference in reflectance depending on the polarization direction has the characteristic shown in FIG. FIG. 3 shows the incident angle θ1,
The relationship between θ2 and reflectance is shown. Curve (a) in FIG.
Represents the reflectance in the vertical direction. This reflectance indicates the Y component (P polarized light). The curve (b) in FIG. 3 represents the reflectance in the parallel direction. This reflectance indicates the X component (S polarized light). When the irradiation light LI is incident on the first beam splitter 1 at an incident angle θ1 of 45 °, the X component is S polarized light and the Y component is P polarized light.
It becomes polarized light, and its reflectance is 9% for S-polarized light, as shown by the value of the curve (a) in FIG. 3 when the incident angle θ1 is 45 °.
P-polarized light is 2% as shown by the value of the curve (b).

【0018】第2ビームスプリッタ2においては、逆に
X成分がP偏光で、Y成分がS偏光となり、反射率は入
射角θ2が45°のときの図3の曲線(a)の値で示す
ように、P偏光が2%で、曲線(b)で表すようにS偏
光が9%である。すなわち、2枚の第1と第2ビームス
プリッタ1,2で反射した後にはX成分、Y成分は、と
もに0.18%と等しくなる。つまりP偏光とS偏光の
サンプル光量の比を完全な1:1にすることができる。
In the second beam splitter 2, conversely, the X component is P polarized light, the Y component is S polarized light, and the reflectance is shown by the value of the curve (a) in FIG. 3 when the incident angle θ2 is 45 °. Thus, P polarization is 2% and S polarization is 9% as represented by curve (b). That is, after being reflected by the two first and second beam splitters 1 and 2, both the X component and the Y component become equal to 0.18%. That is, the ratio of the sample light amounts of P-polarized light and S-polarized light can be made completely 1: 1.

【0019】今、照射光の偏光成分が極端に変化した場
合を想定する。X成分100%、Y成分0%の照射光の
場合と、X成分0%、Y成分100%の照射光の場合を
比較する。1枚のビームスプリッタの場合には、サンプ
ル光量がそれぞれ9%と2%となり、入射光量が同じ場
合においてもそれぞれの照射光からのサンプル光量は
4.5倍もの差を生じる。しかし本発明の構成によれ
ば、偏光成分の変化に拘らず、入射光量が同じであれば
図1の強度測定メータ22には常に0.18%の一定の
サンプル光量が得られる。
Now, assume that the polarization component of the irradiation light changes extremely. The case of irradiation light of X component 100% and Y component 0% is compared with the case of irradiation light of X component 0% and Y component 100%. In the case of one beam splitter, the sample light amounts are 9% and 2%, respectively, and even when the incident light amount is the same, the sample light amounts from the respective irradiation lights differ by 4.5 times. However, according to the configuration of the present invention, a constant sample light amount of 0.18% can always be obtained by the intensity measuring meter 22 of FIG. 1 regardless of the change of the polarization component if the incident light amount is the same.

【0020】ところでこの発明は上述した実施例に限定
されず、この発明は眼科用YAGレーザ光凝固手術装置
の他のレーザ治療装置やその他レーザ加工装置などに適
用することができる。
By the way, the present invention is not limited to the above-mentioned embodiments, but the present invention can be applied to other laser treatment apparatus of the YAG laser photocoagulation surgical apparatus for ophthalmology and other laser processing apparatus.

【0021】[0021]

【発明の効果】この発明によれば、ランダム偏光特性を
有するレーザ照射光のサンプリングを、特別なコーティ
ングを施すことなしに、簡易かつ正確に行なうことがで
きる。したがって正確なレーザ照射光の強度でレーザ照
射光を得ることができる。
According to the present invention, the laser irradiation light having the random polarization characteristic can be sampled easily and accurately without applying a special coating. Therefore, the laser irradiation light can be obtained with an accurate laser irradiation light intensity.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明のレーザ治療装置の好適な実施例であ
る眼科用YAGレーザ光凝固手術装置を示す図。
FIG. 1 is a view showing a YAG laser photocoagulation surgical apparatus for ophthalmology, which is a preferred embodiment of the laser treatment apparatus of the present invention.

【図2】この発明のレーザ治療装置の好適な実施例であ
る眼科用YAGレーザ光凝固手術装置のサンプリング用
光学系を示す斜視図。
FIG. 2 is a perspective view showing a sampling optical system of an ophthalmic YAG laser photocoagulation surgical apparatus which is a preferred embodiment of the laser treatment apparatus of the present invention.

【図3】この発明における入射角と反射率の関係を示す
図。
FIG. 3 is a diagram showing a relationship between an incident angle and reflectance in the present invention.

【符号の説明】[Explanation of symbols]

1 第1ビームスプリッタ(第1分割光学手段) 2 第2ビームスプリッタ(第2分割光学手段) 5 反射偏光面(第2反射偏光面) 6 反射偏光面(第1反射偏光面) 10 本体 14 レーザ発振装置 20 光学系 22 出力測定メータ LI 照射光(レーザ照射光) LO 照射光(レーザ照射光) LS サンプル光 LSO サンプル光 ◆ DESCRIPTION OF SYMBOLS 1 1st beam splitter (1st division | segmentation optical means) 2 2nd beam splitter (2nd division | segmentation optical means) 5 Reflection polarization plane (2nd reflection polarization plane) 6 Reflection polarization plane (1st reflection polarization plane) 10 Main body 14 Laser Oscillator 20 Optical system 22 Output measurement meter LI irradiation light (laser irradiation light) LO irradiation light (laser irradiation light) LS sample light LSO sample light ◆

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 レーザ発振手段からのレーザ照射光に対
し所定角度その第1反射偏光面を傾斜させて配置した第
1分割光学手段と、 第1反射偏光面と対向する第2反射偏光面を有し第1分
割光学手段からの反射光に対し所定角度傾斜させて配置
した第2分割光学手段とからなり、 レーザ照射光の反射効率をその偏向成分に拘らず一定に
するように構成した光学系を備えたことを特徴とするレ
ーザ治療装置。
1. A first splitting optical means arranged with its first reflection polarization plane tilted at a predetermined angle with respect to the laser irradiation light from the laser oscillation means, and a second reflection polarization plane facing the first reflection polarization plane. And a second split optical means arranged to be tilted at a predetermined angle with respect to the reflected light from the first split optical means, and configured to make the reflection efficiency of the laser irradiation light constant regardless of its deflection component. A laser treatment apparatus having a system.
【請求項2】 レーザ発振手段からのレーザ照射光に対
し所定角度その第1反射偏光面を傾斜させて配置した第
1分割光学手段と、 第1反射偏光面と対向する第2反射偏光面を有し第1分
割光学手段からの第1反射光に対し所定角度傾斜させて
設けられ、レーザ照射光と一定角度をなす方向に第2反
射光を反射させるように配置した第2分割光学手段とか
らなり、 レーザ照射光の反射効率をその偏光成分に拘らず一定に
するように構成した光学系を備えたことを特徴とするレ
ーザ治療装置。
2. A first splitting optical means having a first reflection polarization plane inclined with respect to a laser irradiation light from the laser oscillation means at a predetermined angle, and a second reflection polarization plane facing the first reflection polarization plane. Second split optical means which is provided to be inclined with respect to the first reflected light from the first split optical means by a predetermined angle and is arranged to reflect the second reflected light in a direction forming a constant angle with the laser irradiation light. And a laser treatment apparatus comprising an optical system configured to make the reflection efficiency of laser irradiation light constant regardless of its polarization component.
【請求項3】 請求項1または請求項2のレーザ治療装
置において、第1分割光学手段をレーザ照射光に対し4
5°傾斜させて配置しかつ第2分割光学手段を第1分割
光学手段からの反射光に対し45°傾斜させて配置した
ことを特徴とするレーザ治療装置。
3. The laser treatment apparatus according to claim 1 or 2, wherein the first splitting optical means is set to 4 for the laser irradiation light.
A laser treatment apparatus characterized in that it is arranged at an angle of 5 ° and the second dividing optical means is arranged at an angle of 45 ° with respect to the reflected light from the first dividing optical means.
【請求項4】 請求項1ないし請求項3のいずれか1項
のレーザ治療装置において、レーザ照射光と直角をなす
方向に第2反射光を反射させるように第2分割光学手段
を配置したことを特徴とするレーザ治療装置。
4. The laser treatment apparatus according to claim 1, wherein the second splitting optical means is arranged so as to reflect the second reflected light in a direction perpendicular to the laser irradiation light. Laser treatment device characterized by.
JP4146763A 1992-05-14 1992-05-14 Laser therapeutic device Pending JPH05317328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4146763A JPH05317328A (en) 1992-05-14 1992-05-14 Laser therapeutic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4146763A JPH05317328A (en) 1992-05-14 1992-05-14 Laser therapeutic device

Publications (1)

Publication Number Publication Date
JPH05317328A true JPH05317328A (en) 1993-12-03

Family

ID=15415016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4146763A Pending JPH05317328A (en) 1992-05-14 1992-05-14 Laser therapeutic device

Country Status (1)

Country Link
JP (1) JPH05317328A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011049842A3 (en) * 2009-10-19 2011-07-28 Ipg Photonics Corporation Assembly for monitoring power of randomly polarized light
DE102004052651B4 (en) * 2003-10-31 2012-10-04 Nidek Co., Ltd. Laser treatment apparatus
CN111366241A (en) * 2020-03-31 2020-07-03 北京科益虹源光电技术有限公司 Laser pulse energy measurement apparatus, system and method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004052651B4 (en) * 2003-10-31 2012-10-04 Nidek Co., Ltd. Laser treatment apparatus
WO2011049842A3 (en) * 2009-10-19 2011-07-28 Ipg Photonics Corporation Assembly for monitoring power of randomly polarized light
CN102667426A (en) * 2009-10-19 2012-09-12 Ipg光子公司 Assembly for monitoring power of randomly polarized light
JP2013508688A (en) * 2009-10-19 2013-03-07 アイピージー フォトニクス コーポレーション Random polarization output monitoring assembly
EP2491358A4 (en) * 2009-10-19 2015-07-29 Ipg Photonics Corp Assembly for monitoring power of randomly polarized light
CN111366241A (en) * 2020-03-31 2020-07-03 北京科益虹源光电技术有限公司 Laser pulse energy measurement apparatus, system and method

Similar Documents

Publication Publication Date Title
JP2585565B2 (en) Optical device with improved SN ratio
US4412720A (en) Optical system coupling a rectangular light source to a circular light receiver
JP6685296B2 (en) Device for emitting and detecting polarized light
JPH11326832A (en) Polarizing beam device
JPH05317328A (en) Laser therapeutic device
JPH0219702A (en) Optical feedback isolator
US5002371A (en) Low coupling beam splitter and laser power or position monitor using same
US5132528A (en) Arrangement for measuring laser power incorporating a first partially transmitting mirror and a second partially transmitting mirror positioned by 90° degrees
JPH0530761U (en) Defect observation device
CN211236531U (en) Lens capable of eliminating self stray light
EP1074816A2 (en) Method and system for measurement of a characteristic of a lens
JP3340824B2 (en) Optical system including total reflection prism
JPH0419522B2 (en)
JP3513566B2 (en) Optical interface dimension measuring device
JPH08285697A (en) Interferometer
JPH09292544A (en) Optical collimator coupler
JPH09171152A (en) Laser branching device
RU2001386C1 (en) Multistroke optical system
Baccaro et al. Optical properties of lead tungstate (PbWO4) crystal for LHC em-calorimetry
KR19990003025A (en) Eccentricity measuring device of aspherical lens
JPH03116005A (en) Non-polarization beam splitter
JPS6354790A (en) Laser oscillator
JPS63284518A (en) Optical isolator
WO2000058689A1 (en) Self tracking beam delivery system
JPS63172116A (en) Optical delay device