JPH05315451A - Mask pattern design method - Google Patents

Abstract

PURPOSE:To acquire a mask pattern of good characteristics and to realize a short TAT and a small number of processes which are advantages of automatic mask pattern design. CONSTITUTION:A step 11 which is a process for making a specific signal wiring recognized and steps 12, 13 which are processes for deciding a wiring path by eliminating wiring of other signal wiring in proximity to the signal wiring recognized in the process 11 are included.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask pattern design method, and more particularly to an automatic mask pattern design method.

[0002]

2. Description of the Related Art In the conventional automatic mask pattern designing method for an integrated circuit, as shown in FIG. 6, what happens to a wiring 61 which is particularly liable to be influenced by other wiring, for example, a wiring which propagates an analog signal? No measures were taken. For this reason, wiring 6 is performed with the minimum wiring interval given to the automatic mask pattern design tool.
3 and 64 are adjacent to the upper and lower portions of the wiring 61, which is particularly disliked by the influence of other wirings. Furthermore, above and below the wiring 62, 6
5 was next to me.

Further, after the automatic mask pattern design, as shown in FIG. 7, the wiring 7 which is particularly disliked by the influence of other wiring by hand is used.
By widening the wiring adjacent to 1, the malfunction due to crosstalk was prevented.

That is, in FIG. 7, there are wirings 73 and 74 which are spaced apart from the wiring 71 which is particularly unfavorable to other influences, and wirings 72 and 75 which are adjacent to the wirings 73 and 74 above and below.

[0005]

In the conventional method shown in FIG. 6, the wirings 63 and 64, which are adjacent to the wiring 61 which is particularly affected by the influence of other wirings, change from the GND level to the VDD level or from the VDD level to the GND level. At the time of switching, the potential of the wiring 61, which is particularly disliked by the influence of other wiring, changes due to crosstalk with the wiring adjacent to it,
It has a drawback that the potential does not propagate correctly and malfunctions.

The method shown in FIG. 7 has a drawback in that the advantages of short TAT and small number of man-hours in the automatic mask pattern design are diminished due to the manual work.

An object of the present invention is to solve the above-mentioned drawbacks, to provide a mask pattern designing method which does not affect the wiring adjacent to it and does not require manual work.

[0008]

The structure of the mask pattern designing method of the present invention has a first step of causing a design tool to recognize a specific signal wiring and a signal wiring recognized in the first step. A second step of determining a wiring route by excluding the arrangement of other wiring.

[0009]

FIG. 1 is a flow chart showing a mask pattern designing method according to an embodiment of the present invention.

FIG. 2 is a plan view corresponding to step 12 of FIG. FIG. 3 is a plan view corresponding to step 13 of FIG.

In FIG. 1, the designing method of one embodiment of the present invention gives the automatic mask pattern designing tool the name of the wiring, the wiring width, etc. which are particularly unfavorable to the influence of others in step 11.
The wiring width at this time is made as thick as possible.

In step 12 (FIG. 2), the wiring which is particularly unfavorable to the influence from the other is treated as a wide wiring like the power supply / GND wiring, and based on the connection information like the other power supply / GND wiring. Connect the wires.

In step 13 (FIG. 3), after the wiring is completed, other wirings which are particularly disliked by the influence of the power supply / GND wirings are deleted, and the signal lines are arranged in the deleted paths. As a result, a malfunction is prevented by increasing the distance from the adjacent wiring and preventing the influence of the cross-talk from the other wiring on the wiring that particularly dislikes the influence of the other wiring.

FIG. 4 is a flow chart showing the second embodiment of the present invention. FIG. 5 is a plan view corresponding to step 42 of FIG.

In FIG. 4, this embodiment uses step 41.
Gives the automatic mask pattern design tool the name of the wiring, the wiring interval, etc. The wiring interval at this time is made as large as possible.

In step 42, as shown in FIG. 5, wirings which are particularly unfavorable to influences from other wirings have a wiring spacing different from that of other wirings, that is, a wide wiring spacing given in step 41, and other wirings. Similar to wiring, it is connected based on the connection information. This prevents malfunction due to crosstalk from other wirings with respect to wirings that are particularly susceptible to the influence of other wirings.

The mask pattern designing method of this embodiment eliminates the step of causing a design tool to recognize a specific signal wiring and the wiring of another wiring adjacent to the signal wiring recognized in the step. And a step of determining a wiring route.

[0018]

As described above, according to the present invention, the automatic mask pattern design tool is designed to widen the space between the adjacent wiring and the wiring which is particularly unfavorable to the influence of other wiring. There is an effect that the mask pattern correction is manually eliminated after designing, a short TAT and a small number of man-hours can be realized, and there is also an effect that the change of the algorithm of the automatic mask pattern design is small.

[Brief description of drawings]

FIG. 1 is a flow chart showing a procedure of a mask pattern designing method according to a first embodiment of the present invention.

FIG. 2 is a plan view showing a state after the first step in FIG.

FIG. 3 is a plan view showing a state after the second step in FIG.

FIG. 4 is a flowchart showing a procedure of a second exemplary embodiment of the present invention.

FIG. 5 is a plan view showing a state after the second step in FIG.

FIG. 6 is a plan view showing a state after a conventional automatic mask pattern design.

FIG. 7 is a plan view after a conventional mask pattern is designed and manually modified.

[Explanation of symbols]

21, 31, 51, 61, 71 Wirings 22 to 23, 32 to 33, 52 to 53, 62 to 65, 7 which particularly hate other influences
2 to 75 Wiring that affects wiring that particularly hate other influences 11, 12, 13, 41, 42 Steps

Claims (3)

[Claims] 1. A first step of causing a design tool to recognize a specific signal wiring, and a wiring route which excludes the wiring arranged adjacent to the signal wiring recognized in the first step And a second step of determining the mask pattern designing method. 2. The step of treating the signal wiring as a wide wiring in the second step, and connecting the signal wiring in the same manner as the other wiring, and deleting the signal wiring after the wiring is completed, and deleting the signal wiring. The method of designing a mask pattern according to claim 1, further comprising the step of wiring a signal line along the path. 3. The mask pattern designing method according to claim 1, wherein the second step has a step of widening a space between the signal wiring and a wiring adjacent to the signal wiring and connecting the wiring in the same manner as the other wiring.