JPH05307254A - Photosensitive material processing device - Google Patents

Photosensitive material processing device

Info

Publication number
JPH05307254A
JPH05307254A JP13556792A JP13556792A JPH05307254A JP H05307254 A JPH05307254 A JP H05307254A JP 13556792 A JP13556792 A JP 13556792A JP 13556792 A JP13556792 A JP 13556792A JP H05307254 A JPH05307254 A JP H05307254A
Authority
JP
Japan
Prior art keywords
rinse
tank
photosensitive material
solution
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13556792A
Other languages
Japanese (ja)
Inventor
Takeshi Nakamura
武 中村
Masahito Hirano
雅人 平野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP13556792A priority Critical patent/JPH05307254A/en
Publication of JPH05307254A publication Critical patent/JPH05307254A/en
Pending legal-status Critical Current

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  • Photographic Processing Devices Using Wet Methods (AREA)

Abstract

PURPOSE:To provide a photosensitive material processing device without using much rinse liquid and enable developing processing of the photosensitive material to be carried unit without having processing ununiformity caused. CONSTITUTION:A rinse tank 11 is provided between a developing tank and a fixing tank, rolls 12a and 12b which are partially immersed in a rinse liquid 13 of a rinse tank 11 in rotating and carries a photosensitive material 1 are provided, and a circulation path 21 and a pump P which allow the rinse liquid 13 to flow out of the rinse tank at once and to return to circulate are provided. Thus, a mixing of a developer into a fixing tank is prevented and consuming amount of the rinse liquid and a waste liquid amount can be reduced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、露光された撮影用フィ
ルム等の感光材料を処理液に浸漬することにより現像処
理する感光材料処理装置に関し、更に詳しくは機能の異
なる処理液の混入による処理ムラを防止するように構成
した感光材料処理装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing apparatus for developing a photosensitive material such as an exposed photographic film by immersing it in a processing solution. More specifically, it relates to processing by mixing processing solutions having different functions. The present invention relates to a photosensitive material processing apparatus configured to prevent unevenness.

【0002】[0002]

【従来の技術】露光された撮影用フィルムや印画紙等の
写真感光材料を現像処理する感光材料処理装置には、感
光材料を現像槽から定着槽、更に水洗槽等に順次浸漬し
て現像処理を行うように構成したものがある。感光材料
が現像槽から定着槽に搬送される場合を例に述べると、
感光材料は現像液が付着した状態で定着槽に搬送される
ので、現像処理を続けている間に現像液が定着液に混入
し、処理ムラが生じる。そこで、本願出願人は特開平1
−2123839号公報に開示した如く、現像槽と定着
槽との間の空中部分(クロスオーバー部)にリンス槽を
設け、現像液をリンス液で濯いでから定着槽に搬送する
感光材料処理装置を提案した。この提案によれば、感光
材料をリンスしてから定着槽に搬送するのであるから、
前記処理ムラを解消することができる。
2. Description of the Related Art A photosensitive material processing apparatus for developing an exposed photographic material such as a photographic film or photographic paper is developed by immersing the photosensitive material from a developing tank to a fixing tank and then to a washing tank. Some are configured to do. Taking the case where the photosensitive material is conveyed from the developing tank to the fixing tank as an example,
Since the photosensitive material is conveyed to the fixing tank with the developing solution adhered thereto, the developing solution mixes with the fixing solution during continuous development processing, resulting in uneven processing. Therefore, the applicant of the present application filed JP
As disclosed in JP-A-2123839, there is provided a photographic material processing apparatus which comprises a rinse tank in an aerial portion (crossover portion) between a developing tank and a fixing tank, rinses the developing solution with the rinse solution, and then conveys it to the fixing tank. Proposed. According to this proposal, the photosensitive material is rinsed and then conveyed to the fixing tank.
The processing unevenness can be eliminated.

【0003】[0003]

【発明が解決しようとする課題】しかし、新鮮液が少な
いと処理ムラが生じるので、リンスを充分に行うために
は、リンス槽に多量の新鮮液を供給し続けなければなら
ず、従って給液と同時に排液を続ける必要がある。とこ
ろが、新鮮液を流し続けるということは、現像液成分を
含む廃液量が多くなることであり、環境、コストのいず
れの面から見ても好ましくない。本発明の目的は、多量
のリンス液を使用することなく、且つ感光材料の現像処
理を処理ムラなく行い得るように構成した感光材料処理
装置を提供することにある。
However, if the amount of fresh liquid is small, unevenness in processing occurs. Therefore, in order to perform sufficient rinsing, it is necessary to continue supplying a large amount of fresh liquid to the rinse tank. At the same time, it is necessary to continue draining. However, the continuous flow of the fresh solution means that the amount of the waste solution containing the developer solution increases, which is not preferable from the aspects of environment and cost. An object of the present invention is to provide a light-sensitive material processing apparatus configured so that development processing of a light-sensitive material can be performed without processing unevenness without using a large amount of rinse liquid.

【0004】[0004]

【課題を解決するための手段】本発明に係る前記目的
は、下記(1)〜(3)の構成により達成される。 (1) 露光済の感光材料を所定処理液に順次浸漬して
現像処理する感光材料処理装置において、現像槽と定着
槽との間にリンス槽を設けるとともに、前記リンス槽内
のリンス液に少なくとも一部浸漬された状態で前記感光
材料を搬送するローラ対を設け、且つ前記リンス液を前
記リンス槽と外部との間で還流させる循環路を設けたこ
とを特徴とする感光材料処理装置。
The above object according to the present invention is achieved by the following constitutions (1) to (3). (1) In a light-sensitive material processing apparatus for sequentially exposing exposed light-sensitive material to a predetermined processing solution for development, a rinse tank is provided between a developing tank and a fixing tank, and at least the rinse solution in the rinse tank is A photosensitive material processing apparatus comprising: a pair of rollers for conveying the photosensitive material in a partially immersed state; and a circulation path for circulating the rinse liquid between the rinse tank and the outside.

【0005】(2) 露光済の感光材料を所定処理液に
順次浸漬して現像処理する感光材料処理装置において、
現像槽と定着槽との間にリンス槽を設けるとともに、前
記リンス槽内のリンス液に少なくとも一部浸漬された状
態で前記感光材料を搬送するローラ対を設け、且つ前記
リンス液を前記リンス槽と外部との間で還流させる循環
路を設け、前記リンス液中に持ち込まれた現像液濃度が
70%以下の状態でリンス処理することを特徴とする感
光材料処理装置。
(2) In a light-sensitive material processing apparatus in which exposed light-sensitive materials are sequentially dipped in a predetermined processing liquid to perform development processing,
A rinse tank is provided between the developing tank and the fixing tank, and a roller pair is provided for conveying the photosensitive material in a state of being at least partially immersed in the rinse solution in the rinse tank, and the rinse solution is provided in the rinse tank. A photographic material processing apparatus, characterized in that a circulation path is provided between the rinsing liquid and the outside, and the rinsing processing is performed in a state where the concentration of the developing solution brought into the rinsing solution is 70% or less.

【0006】(3) 露光済の感光材料を所定処理液に
順次浸漬して現像処理する感光材料処理装置であって、
現像槽で感光材料を搬送する最終ローラが現像液中にあ
る処理装置において、現像槽と定着槽との間にリンス槽
を設けるとともに、前記リンス槽内のリンス液に少なく
とも一部浸漬された状態で前記感光材料を搬送するロー
ラ対を設け、且つ前記リンス液を前記リンス槽と外部と
の間で還流させる循環路を設けたことを特徴とする感光
材料処理装置。
(3) A photosensitive material processing apparatus for sequentially exposing exposed light-sensitive material in a predetermined processing liquid to perform development processing,
In a processing device in which the final roller for conveying the photosensitive material in the developing tank is in the developing solution, a rinsing tank is provided between the developing tank and the fixing tank, and at least a part of the rinsing solution is immersed in the rinsing solution. A pair of rollers for conveying the photosensitive material, and a circulation path for circulating the rinse liquid between the rinse tank and the outside are provided.

【0007】[0007]

【作用】前記感光材料処理装置によれば、現像槽と定着
槽との間にリンス槽を設け、該リンス槽内でリンス液に
少なくとも一部浸漬状態で感光材料を搬送するローラ対
を設けたので、前記感光材料はローラにより搬送される
間にリンス液によりリンスされ、現像液の定着槽への混
入を防止することができる。更に、リンス液を一旦リン
ス槽外に出し、且つリンス槽内に還流させる循環路を設
けたので、リンス液中に現像液が混入してもローラの近
傍に停滞せず、新鮮なリンス液を供給し続けることな
く、少量のリンス液でも良好なリンスを行うことができ
る。このため、リンス液の廃液量と消費量を大幅に低減
することができる。
According to the above-described photosensitive material processing apparatus, the rinse tank is provided between the developing tank and the fixing tank, and the pair of rollers for conveying the photosensitive material in the rinse tank at least partially immersed in the rinse liquid is provided. Therefore, the photosensitive material is rinsed by the rinse liquid while being conveyed by the rollers, and it is possible to prevent the developer from mixing into the fixing tank. Furthermore, since a circulation path is provided to let the rinse solution once out of the rinse tank and to recirculate into the rinse tank, even if the developer solution is mixed in the rinse solution, it does not stay near the roller, and a fresh rinse solution is obtained. Good rinsing can be performed with a small amount of rinsing liquid without continuously supplying the liquid. Therefore, the waste liquid amount and the consumption amount of the rinse liquid can be significantly reduced.

【0008】リンスを続けるうちにリンス液中に現像液
が持ち込まれるが、リンス液中の現像液濃度が70%ま
では、特にリンス液を補充しなくても良好にリンス処理
できる。リンス液への現像液の持ち込み量は少ない程良
いことは当然であるが、リンス液中の現像液濃度が20
%〜30%程度なら、新鮮なリンス液と同様に処理でき
何ら処理性能の問題はなく、現像液濃度が70%までは
良好に処理できる。現像液から出た後の感光材料が搬送
ローラに挟持される構成であれば、付着していた現像液
は搬送ローラによるスクイズ機能によりある程度除去さ
れるので、リンス液の汚れが少ないが、現像後にスクイ
ズ機能のない構成では、感光材料に付着した現像液がそ
のままリンス槽に入るので、リンス液がすぐ汚れてしま
う。
The developing solution is brought into the rinsing solution while continuing the rinsing. However, if the developing solution concentration in the rinsing solution is up to 70%, the rinsing process can be satisfactorily performed without supplementing the rinsing solution. As a matter of course, the smaller the amount of the developer brought into the rinse solution is, the better. However, the developer concentration in the rinse solution is 20%.
% To about 30%, the processing can be carried out in the same manner as a fresh rinse solution without any processing performance problem, and processing can be satisfactorily carried out up to a developing solution concentration of 70%. If the photosensitive material after coming out of the developing solution is sandwiched by the carrying rollers, the developing solution that has adhered is removed to some extent by the squeeze function of the carrying roller, so the rinse solution is less contaminated, but after development In the structure without the squeeze function, the developer adhering to the photosensitive material enters the rinse tank as it is, so that the rinse solution becomes dirty immediately.

【0009】しかし、本発明によれば、上記のように多
少リンス液が汚れてもムラなく濯ぐことができる。した
がって、本発明は、特に現像液から出た感光材料がスク
イズされずにリンス槽に導入される装置に好適である。
液面の開口率(液容量に対する気液接触面積の比)を下
げる目的で、現像液上に浮き蓋を設けたりすると、現像
槽の最終ローラは液中に位置してしまい、スクイズ機能
がなくなってしまうが、本発明はこのような装置に好適
である。すなわち、感光材料により現像槽から持ち出さ
れる現像液の量が多くても、感光材料はリンス処理によ
り確実に濯がれるので、定着液中へ現像液混入防止効果
が大きい。感光材料により持ち出される現像液が多いと
リンス液の汚れ具合が早くなるが、それだけ定着液への
持ち込みを防止していることになる。
However, according to the present invention, even if the rinse liquid is slightly contaminated as described above, it can be rinsed evenly. Therefore, the present invention is particularly suitable for an apparatus in which the photosensitive material emitted from the developing solution is introduced into the rinse tank without being squeezed.
If a floating lid is installed on the developer for the purpose of lowering the opening ratio of the liquid surface (ratio of gas-liquid contact area to liquid volume), the final roller of the developing tank will be located in the liquid and the squeeze function will be lost. However, the present invention is suitable for such a device. That is, even if the amount of the developing solution carried out from the developing tank by the photosensitive material is large, the photosensitive material is surely rinsed by the rinsing process, so that the effect of preventing the developing solution from being mixed into the fixing solution is great. If a large amount of the developing solution is taken out by the photosensitive material, the rinse solution becomes soiled more quickly, but this prevents the carrying-in to the fixing solution.

【0010】[0010]

【実施態様】以下、図1〜図6を参照して本発明の実施
態様を説明する。なお、図1は感光材料処理装置の全体
構成を示す模式的構成図、図2〜図6はリンス槽の各種
構成例と作用を説明するものである。本実施態様の説明
にあたっては、感光材料処理装置の全体構成について先
ず説明し、次にリンス槽について説明する。
Embodiments of the present invention will be described below with reference to FIGS. Note that FIG. 1 is a schematic configuration diagram showing the overall configuration of the photosensitive material processing apparatus, and FIGS. 2 to 6 are for explaining various configuration examples of the rinse tank and their functions. In the description of this embodiment, the overall structure of the photosensitive material processing apparatus will be described first, and then the rinse tank will be described.

【0011】感光材料処理装置100は、露光された写
真用感光材料1を現像処理するように構成されたもので
あり、写真用感光材料1は図の左方に示したガイド部材
2、ガイドローラ3により現像槽105に搬送される。
The photosensitive material processing apparatus 100 is configured to develop the exposed photographic photosensitive material 1. The photographic photosensitive material 1 is a guide member 2 and a guide roller shown on the left side of the drawing. 3 is conveyed to the developing tank 105.

【0012】ハウジング101内には、左方から右方に
向かって現像槽105、定着槽106、3個の水洗槽1
08、乾燥部109が順に設置されている。なお、現像
槽105から定着槽106に至るクロスオーバー部Aに
リンス槽11が設けられているが、その構造及び作用に
ついては後に詳細に説明する。定着槽106から水洗槽
108に至る各槽には、現像槽105内の一部に示した
ように搬送ローラ111が設けられているのであるが、
図示を省略した。感光材料1は、現像槽105内に設け
た搬送ローラ111、反転ローラ112により搬送され
つつ現像液に浸漬される。
In the housing 101, from left to right, a developing tank 105, a fixing tank 106, and three washing tanks 1
08 and the drying part 109 are installed in order. The rinse tank 11 is provided at the crossover portion A from the developing tank 105 to the fixing tank 106, and the structure and operation thereof will be described in detail later. Each of the tanks from the fixing tank 106 to the washing tank 108 is provided with a conveying roller 111 as shown in a part of the developing tank 105.
Illustration is omitted. The photosensitive material 1 is immersed in the developing solution while being conveyed by the conveying roller 111 and the reversing roller 112 provided in the developing tank 105.

【0013】現像液に浸漬された感光材料1は、リンス
槽11に搬送されて一対のローラ12a、12bにより
挟み付けられて定着槽106側に搬送されるのである
が、この搬送中にリンス液13により洗浄されて次の定
着槽106に搬送される。なお、図1に示すリンス槽1
1は模式的に示したものであり、その構成と作用につい
ては、後に図2以下を参照して詳細に説明する。そし
て、定着液に浸漬された感光材料1は水洗槽108に搬
送され、3槽の水洗槽108内に浸漬されて水洗された
感光材料1が乾燥部109に搬送される。乾燥部109
は、感光材料1の搬送経路に矢印で示すように温風を吹
き出すように構成されたものであり、温風により乾燥し
た感光材料1は、自動現像装置100から排出される。
The photosensitive material 1 dipped in the developing solution is conveyed to the rinsing tank 11, is sandwiched by the pair of rollers 12a and 12b, and is conveyed to the fixing tank 106 side. It is washed by 13 and conveyed to the next fixing tank 106. In addition, the rinse tank 1 shown in FIG.
1 is a schematic diagram, and its configuration and action will be described later in detail with reference to FIG. Then, the photosensitive material 1 immersed in the fixing solution is conveyed to the washing tank 108, and the photosensitive material 1 immersed in the three washing tanks 108 and washed is conveyed to the drying section 109. Drying section 109
Is configured to blow hot air into the conveying path of the photosensitive material 1 as indicated by an arrow, and the photosensitive material 1 dried by the hot air is discharged from the automatic developing device 100.

【0014】次に、リンス槽11の構造と作用を説明す
る。図1に示したリンス槽11の構成を更に具体的に示
すと、図2に示すように管路21、ポンプPにより構成
された循環路を備えている。即ち、リンス槽11の底部
から上部開口との間に循環路が設けられている。従っ
て、リンス槽11にリンス液13を給液した後、ポンプ
Pを駆動すれば、リンス液13はリンス槽11の底部か
ら管路21を介してリンス槽11の上部へ供給され、リ
ンス液13がリンス槽11と外部との間を循環すること
になる。
Next, the structure and operation of the rinse tank 11 will be described. When the configuration of the rinse tank 11 shown in FIG. 1 is more specifically shown, as shown in FIG. 2, the rinse tank 11 is provided with a circulation path constituted by a pipe line 21 and a pump P. That is, a circulation path is provided between the bottom of the rinse tank 11 and the upper opening. Therefore, if the pump P is driven after supplying the rinse liquid 13 to the rinse tank 11, the rinse liquid 13 is supplied from the bottom portion of the rinse tank 11 to the upper portion of the rinse tank 11 via the pipe line 21. Will circulate between the rinse tank 11 and the outside.

【0015】一方、ローラ12bは下部がリンス液13
に漬かっているので、感光材料1を搬送するため矢印方
向に回転すると、リンス液13がローラ12bに付着し
て言わば汲み上げられるようになる。従って、感光材料
1がローラ12a、12bに挟み付けられて搬送されて
いる間に、感光材料1のリンスが行われ、リンス終了後
の感光材料1が定着槽106に搬送される。感光材料1
をリンスすると、当然のことながら付着していた現像液
がリンス液中に濯ぎ落とされる。しかし、本実施態様の
構成によれば、循環路を備えることによりリンス液13
が還流するので、濯ぎ落とされた現像液が、ローラ12
bの近傍に停滞することはなく、現像液を含有してはい
るものの水等により希釈されたリンス液13によって感
光材料1がリンスされるようになる。
On the other hand, the lower part of the roller 12b is the rinse liquid 13
Since the photosensitive material 1 is soaked in the roller 12, when the photosensitive material 1 is rotated in the direction of the arrow, the rinse liquid 13 adheres to the roller 12b and is pumped up. Therefore, the photosensitive material 1 is rinsed while the photosensitive material 1 is sandwiched between the rollers 12a and 12b and conveyed, and the photosensitive material 1 after the rinse is conveyed to the fixing tank 106. Photosensitive material 1
As a matter of course, the developer that has adhered is rinsed off into the rinse liquid when rinsing is performed. However, according to the configuration of this embodiment, the rinse liquid 13 is provided by providing the circulation path.
Flow back, the rinsed developer is
There is no stagnation in the vicinity of b, and the photosensitive material 1 is rinsed by the rinse liquid 13 that contains the developing solution but is diluted with water or the like.

【0016】従って、現像液が所定含有量に達するま
で、リンス液13を廃液にすることなく使用することが
でき、リンス液を流し続けていた場合に比較して使用液
量を大幅に低減することができる。ところで、リンスを
続けていると、リンス液13中の現像液濃度が次第に高
くなることは否めない。そこで問題になるのは、1回の
給液でどの程度の感光材料をムラなく処理し得るか、で
ある。この点について本願発明者が行った実験例を説明
すると、下記のとおりである。
Therefore, the rinse liquid 13 can be used without waste until the developer reaches a predetermined content, and the amount of liquid used is greatly reduced as compared with the case where the rinse liquid is kept flowing. be able to. By the way, it cannot be denied that the concentration of the developer in the rinse liquid 13 gradually increases if the rinse is continued. Therefore, the problem is how much photosensitive material can be processed uniformly with one liquid supply. An example of an experiment conducted by the inventor of the present application in this regard will be described below.

【0017】即ち、感光材料1による現像液の持ち込み
量が2.5ml(感光材料の四つ切りサイズ当たりの
量、以下同じ。)の場合を例に述べると、本実施態様の
構成にあってはリンス液13の補充量は2.5〜5ml
程度でよい。これに対し従来の流水方式の場合、給液量
は100mlのこともあった。そして、リンス液13中
の現像液の濃度については。現像槽内の現像液濃度の7
0%程度まではムラのない処理を行うことができ、リン
ス液の補充及びリンス処理性の両面から、30〜50%
程度の濃度で使用するのが好ましいことが判明した。こ
のように、本実施態様の構成によれば、リンス液13を
循環させることにより、現像液の濃度がある程度まで高
くなっても良好な処理を行うことができ、廃液量はもと
より、使用液量を大幅に低減できることが明らかになっ
た。
That is, the case where the amount of the developer brought in by the light-sensitive material 1 is 2.5 ml (amount per quarter size of the light-sensitive material, the same applies hereinafter) will be described as an example. Replenishment amount of rinse liquid 13 is 2.5-5 ml
The degree is enough. On the other hand, in the case of the conventional running water system, the liquid supply amount was sometimes 100 ml. And about the concentration of the developing solution in the rinse solution 13. The developer concentration in the developer tank is 7
A uniform treatment can be performed up to about 0%, and 30 to 50% from the standpoint of both rinse solution replenishment and rinse processability.
It has been found to be preferable to use it at a moderate concentration. As described above, according to the configuration of the present embodiment, by circulating the rinse liquid 13, good processing can be performed even when the concentration of the developer is increased to a certain degree, and the amount of the used liquid as well as the amount of the used liquid is used. It has been revealed that can be significantly reduced.

【0018】次に、リンス槽11の他の構成を順次説明
すると、図3に示すようにローラ12a、12bに加え
てローラ22a、22bを設け、搬送中の感光材料1を
2ヵ所でリンスするように構成してもよい。この構成に
よれば、リンス効果がよりいっそう向上する。なお、リ
ンス液13の循環路は前記同様でよい。また、図4に示
すように循環するリンス液13を感光材料1の上部から
リンス槽11内に還流させるように構成してもよい。図
示の場合、感光材料1の乳剤面は下面であるが、リンス
液13は前記各例と同様に下側ローラ12b、22bに
より汲み上げられるので、乳剤面のリンスは前記同様に
行われる上に、上面に付着した現像液についても効率的
な洗浄が行われる。
Next, the other structure of the rinse tank 11 will be explained in sequence. As shown in FIG. 3, rollers 22a and 22b are provided in addition to the rollers 12a and 12b, and the photosensitive material 1 being conveyed is rinsed at two places. It may be configured as follows. With this configuration, the rinse effect is further improved. The circulation path of the rinse liquid 13 may be the same as described above. Further, as shown in FIG. 4, the circulating rinse liquid 13 may be refluxed from the upper portion of the photosensitive material 1 into the rinse tank 11. In the illustrated case, the emulsion surface of the light-sensitive material 1 is the lower surface, but since the rinse liquid 13 is pumped up by the lower rollers 12b and 22b as in the above-mentioned examples, the emulsion surface is rinsed in the same manner as described above. Efficient cleaning is also performed on the developer adhering to the upper surface.

【0019】ところで、現像槽105については、液面
近傍を蓋体105aで覆い、感光材料1の通路を形成し
たものがある。この種の構造では開口率(現像液容量
〔cm3 〕に対する、空気に接する現像液の面積〔cm
2 〕)は0.1以下であり、現像液の蒸発量を低減させ
ることができる。しかし、現像槽105内の最終ローラ
200が現像液中にあるため、感光材料1による現像液
の持ち出し量が多い。従って、従来の流水方式のリンス
槽であれば、リンス液の廃液量も大幅に増大することに
なるが、本実施態様のリンス槽11を適用することによ
り、リンス液の廃液量を増すことなく良好な現像処理を
行うことができる。更に、図5に示すような、リンス槽
11内のリンス液13が現像槽105へオーバーフロー
する構成のリンス槽11を適用すれば、感光材料1によ
り持ち出された現像液を現像槽105に戻して再利用で
きるので、感光材料1に付着して持ち出される現像液量
が増しても、必ずしも無駄にはならない。
There is a developing tank 105 in which the vicinity of the liquid surface is covered with a lid 105a to form a passage for the photosensitive material 1. In this type of structure, the area of the developing solution in contact with air [cm] with respect to the opening ratio (developing solution volume [cm 3 ])
2 ]) is 0.1 or less, and the amount of evaporation of the developer can be reduced. However, since the final roller 200 in the developing tank 105 is in the developing solution, the amount of the developing solution carried out by the photosensitive material 1 is large. Therefore, in the case of the conventional running water type rinse tank, the waste liquid amount of the rinse liquid is significantly increased. However, by applying the rinse tank 11 of the present embodiment, it is possible to increase the waste liquid amount of the rinse liquid. Good development processing can be performed. Further, when the rinse tank 11 having a configuration in which the rinse solution 13 in the rinse tank 11 overflows to the developing tank 105 as shown in FIG. 5, the developing solution carried out by the photosensitive material 1 is returned to the developing tank 105. Since it can be reused, it is not necessarily wasted even if the amount of the developer adhering to the photosensitive material 1 and taken out increases.

【0020】[0020]

【実施例】以下、実施例に基づいて本発明を説明する。 実施例1 (感光材料):富士写真フイルム製グランデックス用感
光材料GA100 (処理液) :現像液として富士写真フイルム製GR−
D1 定着液として富士写真フイルム製GR−F1 リンス液として水を用いた。ただし、リンス液が汚れる
までの時間を短縮するために、処理開始時に予め現像液
濃度を20%にした。
EXAMPLES The present invention will be described below based on examples. Example 1 (Photosensitive material): Fuji Photo Film Grandex photosensitive material GA100 (processing solution): Fuji Photo Film GR- as a developing solution
GR-F1 manufactured by Fuji Photo Film Co., Ltd. was used as the fixing solution, and water was used as the rinse solution. However, in order to shorten the time until the rinse liquid becomes dirty, the developer concentration was set to 20% in advance at the start of processing.

【0021】(処理装置):富士写真フイルム製フィル
ムプロセサーFG360Aの、現像・定着間のリンス部
を図3に示すように、リンス液が循環するように改造し
た。なお、現像槽の最終の搬送ローラ対は現像液中に完
全に浸漬状態にある。
(Processing device): The rinsing portion of the film processor FG360A manufactured by Fuji Photo Film Co., Ltd. between development and fixing was modified so as to circulate the rinsing liquid as shown in FIG. The final conveying roller pair in the developing tank is completely immersed in the developing solution.

【0022】上記条件で、四つ切り感光材料を350枚
連続処理し、処理枚数に応じたリンス液中の現像液濃度
の変化を図7に示す。図7の結果から明らかなように、
処理枚数が増えるにつれてリンス液中の現像液濃度が濃
くなり、感光材料に付着していた現像液が確実に除去さ
れてリンスされていることがわかる。処理枚数に応じた
処理後の感光材料の評価を表1に示す。なお、表中の記
号○は結果が良好であり実用上好適、△はわずかに不良
があるが実用可能、×は不良で実用不可能を表す。
Under the above conditions, 350 sheets of four-section photosensitive material were continuously processed, and the change of the developer concentration in the rinse solution according to the number of processed sheets is shown in FIG. As is clear from the result of FIG.
It can be seen that as the number of processed sheets increases, the concentration of the developing solution in the rinsing solution increases, and the developing solution adhering to the photosensitive material is reliably removed and rinsed. Table 1 shows the evaluation of the processed photosensitive materials according to the number of processed sheets. In the table, the symbol ◯ indicates a good result and is suitable for practical use, Δ indicates a slight defect but it is practical, and × indicates a defect and is not practical.

【0023】[0023]

【表1】 [Table 1]

【0024】表1に示すように、処理枚数が増えてもカ
ブリや全体にわたるムラはなかったが、現像液濃度が7
0%を越えると(300枚処理後)、感光材料の後端部
に現像液のたれによるムラが生じ、実用不可能なことが
わかった。これに対し、現像液濃度が60%〜70%で
は、感光材料の後端にわずかにたれムラが見られたが、
実用可能な範囲であった。更に、現像液濃度が55%以
下では何の障害もなく、良好に処理できた。
As shown in Table 1, even if the number of processed sheets increased, there was no fog or overall unevenness, but the developer concentration was 7
It was found that when the content exceeds 0% (after processing 300 sheets), unevenness due to dripping of the developer occurs at the trailing edge of the photosensitive material, making it impractical. On the other hand, when the developer concentration is 60% to 70%, slight unevenness of sagging is seen at the trailing edge of the photosensitive material.
It was within a practical range. Further, when the developer concentration was 55% or less, there were no problems and the processing was satisfactory.

【0025】本実施例は処理開始にあたってリンス液中
の現像液濃度を20%にしたが、当然のことながら、こ
れ以下の濃度でも良好に処理できる。以上のことから、
リンス液を循環させてリンス処理することにより、リン
ス液中の現像液が70%になるまでは実用上問題なく使
用でき、50%以下では特に良好な処理ができることが
わかった。したがって、リンス液の交換をも考慮する
と、リンス液中の現像液濃度が20%〜50%程度で使
用すれば、リンス液の交換頻度も少なく廃液も減少で
き、かつ良好に処理できるので、本発明が有効であるこ
とがわかる。
In this embodiment, the concentration of the developing solution in the rinsing solution was set to 20% at the start of processing, but it goes without saying that even if the concentration is less than this, good processing can be performed. From the above,
It was found that by performing the rinse treatment by circulating the rinse liquid, the developer in the rinse liquid can be used without any practical problems up to 70%, and at 50% or less, particularly excellent treatment can be performed. Therefore, in consideration of the replacement of the rinse liquid, if the developer concentration in the rinse liquid is about 20% to 50%, the rinse liquid can be replaced less frequently, and the waste liquid can be reduced. It can be seen that the invention is effective.

【0026】また、現像槽の最終搬送ローラ対が空中又
は液面近傍にあれば、感光材料はスクイズされるので、
リンス液への現像液の持ち込みが少なくなり、リンス液
の汚れの進行が遅くなり、長期間にわたって良好な処理
ができる。これに対し、搬送ローラ対が現像液中にある
と、感光材料はスクイズされずにリンス槽へ搬送される
ので現像液の持ち出し量が多いが、それだけリンス槽に
おけるリンス効果が大きくなる。現像液の持ち出し量は
感光材料の搬送速度にも依存し、搬送速度が高くなると
持ち出し量も増える。
If the final conveying roller pair in the developing tank is in the air or near the liquid surface, the photosensitive material is squeezed.
The carry-in of the developing solution into the rinse solution is reduced, the progress of stains in the rinse solution is delayed, and good processing can be performed for a long period of time. On the other hand, when the conveying roller pair is in the developing solution, the photosensitive material is conveyed to the rinsing tank without being squeezed, so that the amount of the developing solution taken out is large, but the rinsing effect in the rinsing tank is large. The carry-out amount of the developing solution also depends on the transport speed of the photosensitive material, and the carry-out amount increases as the transport speed increases.

【0027】図8は搬送速度に対する持出量の関係を表
すグラフである。図中、符号aで示す関係は搬送ローラ
対が液中にある場合で、符号bで示す関係は搬送ローラ
対が液面からわずかに出ている場合である。搬送ローラ
対が液中にあると、搬送速度がわずかに速くなるだけで
持出量が増えるので、搬送速度が速い場合には上記のよ
うなリンス処理が極めて有効である。
FIG. 8 is a graph showing the relationship between the carrying speed and the carry-out amount. In the figure, the relationship indicated by reference sign a is when the pair of conveying rollers is in the liquid, and the relationship indicated by reference sign b is when the pair of conveying rollers is slightly out of the liquid surface. When the pair of transport rollers is in the liquid, the carry-out amount increases only by slightly increasing the transport speed. Therefore, when the transport speed is high, the above-described rinse treatment is extremely effective.

【0028】また、現像槽の開口率を、開口率=〔気液
接触面積(cm2 )/液容量(cm3 )〕と定義した場
合、開口率が小さい場合にも本発明が有効であると言え
る。現像液の空気酸化による疲労を低減するには開口率
を低くすることが有効であり、例えば液面に浮き蓋やカ
バーを設けて液面をできる限り覆う構成が採られる。し
かし、このような構成では、感光材料を搬送するローラ
対を液面近傍に配置させることができず、液中に配置せ
ざるを得ない。液中にローラ対があると、上述のように
感光材料のスクイズ機能がないので現像液の持出量が多
くなるので、上記構成のリンス部により感光材料をリン
ス処理することが有効になってくる。
When the aperture ratio of the developing tank is defined as aperture ratio = [gas-liquid contact area (cm 2 ) / liquid volume (cm 3 )], the present invention is effective even when the aperture ratio is small. Can be said. It is effective to reduce the aperture ratio in order to reduce the fatigue of the developing solution due to air oxidation. For example, a configuration is adopted in which a floating lid or a cover is provided on the liquid surface to cover the liquid surface as much as possible. However, in such a configuration, the pair of rollers that convey the photosensitive material cannot be arranged in the vicinity of the liquid surface, and thus the roller pair must be arranged in the liquid. If there is a roller pair in the solution, the squeeze function of the photosensitive material does not exist as described above, and the carry-out amount of the developer increases, so it is effective to rinse the photosensitive material with the rinse section having the above-described configuration. come.

【0029】[0029]

【発明の効果】以上に説明したように、本発明に係る感
光材料処理装置は、現像槽と定着槽との間にリンス槽を
設け、該リンス槽内でリンス液に一部浸漬状態で回転し
ながら感光材料を搬送するローラを設け、且つリンス液
をリンス槽外に一旦出した後に還流させる循環路を設け
た。従って、前記感光材料はリンス槽内に設けたローラ
により搬送される間にリンス液によりリンスされ、現像
液が定着液へ混入することを防止することができる。
As described above, the light-sensitive material processing apparatus according to the present invention is provided with a rinse tank between the developing tank and the fixing tank, and is rotated in the rinse tank while partially immersed in the rinse liquid. On the other hand, a roller for conveying the photosensitive material was provided, and a circulation path for circulating the rinse liquid once outside the rinse tank was provided. Therefore, it is possible to prevent the developing solution from being mixed with the fixing solution due to the rinsing solution rinsing the photosensitive material while being conveyed by the rollers provided in the rinsing tank.

【0030】更に、リンス液を循環させるので、リンス
液中に濯ぎ落とされた現像液がローラの近傍に停滞せ
ず、良好な現像処理を行い得るうえに、現像液が所定濃
度に達するまでリンス液を使用することができ、廃液量
とリンス液の使用量を低減できる、等の種々の効果を奏
する。
Further, since the rinse solution is circulated, the developer rinsed in the rinse solution does not stay in the vicinity of the roller and a good developing process can be performed, and the rinse solution is rinsed until the developer reaches a predetermined concentration. A liquid can be used, and various effects such as the amount of waste liquid and the amount of rinse liquid used can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明を適用した感光材料処理装置の模式的構
成図である。
FIG. 1 is a schematic configuration diagram of a photosensitive material processing apparatus to which the present invention is applied.

【図2】リンス槽の構成と作用を説明する構成図であ
る。
FIG. 2 is a configuration diagram illustrating the configuration and operation of a rinse tank.

【図3】リンス槽の第2例を示す構成図である。FIG. 3 is a configuration diagram showing a second example of a rinse tank.

【図4】リンス槽の第3例を示す構成図である。FIG. 4 is a configuration diagram showing a third example of a rinse tank.

【図5】リンス槽の第4例を示す構成図である。FIG. 5 is a configuration diagram showing a fourth example of a rinse tank.

【図6】リンス槽の第5例を示す構成図である。FIG. 6 is a configuration diagram showing a fifth example of a rinse tank.

【図7】処理枚数とリンス液中の現像液濃度との関係を
表すグラフである。
FIG. 7 is a graph showing the relationship between the number of processed sheets and the developer concentration in the rinse liquid.

【図8】感光材料搬送速度と液持出量との関係を表すグ
ラフである。
FIG. 8 is a graph showing a relationship between a photosensitive material conveying speed and a liquid carry-out amount.

【符号の説明】 1 感光材料 11 リンス槽 12a、12b、22a、22b ローラ 13 リンス液 100 感光材料処理装置 105 現像槽 106 定着槽 108 水洗槽 109 乾燥部 200 ローラ A クロスオーバー部DESCRIPTION OF SYMBOLS 1 Photosensitive material 11 Rinse tank 12a, 12b, 22a, 22b Roller 13 Rinse liquid 100 Photosensitive material processing device 105 Developing tank 106 Fixing tank 108 Washing tank 109 Drying section 200 Roller A Crossover section

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 露光済の感光材料を所定処理液に順次浸
漬して現像処理する感光材料処理装置において、現像槽
と定着槽との間にリンス槽を設けるとともに、前記リン
ス槽内のリンス液に少なくとも一部浸漬された状態で前
記感光材料を搬送するローラ対を設け、且つ前記リンス
液を前記リンス槽と外部との間で還流させる循環路を設
けたことを特徴とする感光材料処理装置。
1. A photosensitive material processing apparatus for sequentially exposing an exposed photosensitive material to a predetermined processing solution for development processing, wherein a rinse tank is provided between a developing tank and a fixing tank, and the rinse solution in the rinse tank is provided. A photosensitive material processing apparatus, characterized in that a roller pair for conveying the photosensitive material in a state of being at least partially immersed in the roller is provided, and a circulation path for circulating the rinse liquid between the rinse tank and the outside is provided. ..
【請求項2】 露光済の感光材料を所定処理液に順次浸
漬して現像処理する感光材料処理装置において、現像槽
と定着槽との間にリンス槽を設けるとともに、前記リン
ス槽内のリンス液に少なくとも一部浸漬された状態で前
記感光材料を搬送するローラ対を設け、且つ前記リンス
液を前記リンス槽と外部との間で還流させる循環路を設
け、前記リンス液中に持ち込まれた現像液濃度が70%
以下の状態でリンス処理することを特徴とする感光材料
処理装置。
2. A photosensitive material processing apparatus for sequentially exposing exposed light-sensitive material to a predetermined processing solution for development processing, wherein a rinse tank is provided between a developing tank and a fixing tank, and the rinse solution in the rinse tank is provided. A pair of rollers for conveying the photosensitive material in a state of being at least partially immersed in the rinsing liquid is provided, and a circulation path for circulating the rinsing liquid between the rinsing tank and the outside is provided, and the development carried in the rinsing liquid is provided. Liquid concentration is 70%
A photosensitive material processing apparatus, characterized by performing a rinsing process in the following state.
【請求項3】 露光済の感光材料を所定処理液に順次浸
漬して現像処理する感光材料処理装置であって、現像槽
で感光材料を搬送する最終ローラが現像液中にある処理
装置において、現像槽と定着槽との間にリンス槽を設け
るとともに、前記リンス槽内のリンス液に少なくとも一
部浸漬された状態で前記感光材料を搬送するローラ対を
設け、且つ前記リンス液を前記リンス槽と外部との間で
還流させる循環路を設けたことを特徴とする感光材料処
理装置。
3. A photosensitive material processing apparatus for sequentially exposing exposed photosensitive material to a predetermined processing solution for development processing, wherein the final roller for conveying the photosensitive material in a developing tank is in the developing solution. A rinse tank is provided between the developing tank and the fixing tank, and a roller pair is provided for conveying the photosensitive material in a state of being at least partially immersed in the rinse solution in the rinse tank, and the rinse solution is provided in the rinse tank. A light-sensitive material processing apparatus, characterized in that a circulation path is provided between the outside and the outside for circulation.
JP13556792A 1992-04-30 1992-04-30 Photosensitive material processing device Pending JPH05307254A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13556792A JPH05307254A (en) 1992-04-30 1992-04-30 Photosensitive material processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13556792A JPH05307254A (en) 1992-04-30 1992-04-30 Photosensitive material processing device

Publications (1)

Publication Number Publication Date
JPH05307254A true JPH05307254A (en) 1993-11-19

Family

ID=15154837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13556792A Pending JPH05307254A (en) 1992-04-30 1992-04-30 Photosensitive material processing device

Country Status (1)

Country Link
JP (1) JPH05307254A (en)

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