JPH0530391B2 - - Google Patents
Info
- Publication number
- JPH0530391B2 JPH0530391B2 JP61122687A JP12268786A JPH0530391B2 JP H0530391 B2 JPH0530391 B2 JP H0530391B2 JP 61122687 A JP61122687 A JP 61122687A JP 12268786 A JP12268786 A JP 12268786A JP H0530391 B2 JPH0530391 B2 JP H0530391B2
- Authority
- JP
- Japan
- Prior art keywords
- recording
- nitride
- layer
- optical recording
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 20
- 229910052714 tellurium Inorganic materials 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 4
- 239000011669 selenium Substances 0.000 claims description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 3
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 claims description 3
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- LEQRFHXXXRSFLO-UHFFFAOYSA-N [N].[Se] Chemical compound [N].[Se] LEQRFHXXXRSFLO-UHFFFAOYSA-N 0.000 description 6
- 229910001370 Se alloy Inorganic materials 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- -1 polymethylpentyl Polymers 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000007737 ion beam deposition Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/257—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24316—Metals or metalloids group 16 elements (i.e. chalcogenides, Se, Te)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24318—Non-metallic elements
- G11B2007/24322—Nitrogen
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/257—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
- G11B2007/25705—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials
- G11B2007/25713—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials containing nitrogen
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0045—Recording
- G11B7/00451—Recording involving ablation of the recording layer
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は半導体レーザ光によつて情報を記録再
生することのできる光記録媒体に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an optical recording medium on which information can be recorded and reproduced using semiconductor laser light.
(従来の技術)
レーザ光によつて情報を媒体に記録し、かつ再
生する光デイスクメモリは、記録密度が高いこと
から大容量記録装置として優れた特徴を有してい
る。この光記録媒体材料としては、Te等のカル
コゲン元素、又はこれらの化合物が使用されてい
る(特公昭47−26897)。とくにテルルセレン系合
金はよく使用されている(特公昭54−41902、特
公昭57−7919、特公昭57−56058)。(Prior Art) Optical disk memories, which record and reproduce information on a medium using laser light, have excellent characteristics as large-capacity recording devices because of their high recording density. As materials for this optical recording medium, chalcogen elements such as Te or compounds thereof are used (Japanese Patent Publication No. 47-26897). In particular, tellurium selenium alloys are often used (Japanese Patent Publication No. 54-41902, Japanese Patent Publication No. 57-7919, Japanese Patent Publication No. 57-56058).
近年、記録装置を小型化するため、レーザ光源
としては半導体レーザが使用されてきている。半
導体レーザは発振波長が8000Å前後であるが、テ
ルルセレン系合金はこの波長帯にも比較的よく適
合し、適度な反射率と適度な吸収率が得られる
(フイジカ・ステイタス・ソリダイ(phys・
stat・sol・7、189、1964))。 In recent years, in order to downsize recording devices, semiconductor lasers have been used as laser light sources. Semiconductor lasers have an oscillation wavelength of around 8000 Å, but tellurium selenium alloys are relatively well suited to this wavelength range, and can provide moderate reflectance and moderate absorption (Physica Status Solidi).
stat・sol・7, 189, 1964)).
(発明が解決しようとする問題点)
しかしながら、これらの媒体で信号品質が充分
に良好でかつ半導体レーザ記録に適するものはな
かつた。(Problems to be Solved by the Invention) However, none of these media has sufficiently good signal quality and is suitable for semiconductor laser recording.
本発明の目的は、耐候性がよく、かつ信号品質
が充分に良好で記録パワー余裕度が大きい半導体
レーザ記録に適した光記録媒体を提供することに
ある。 An object of the present invention is to provide an optical recording medium suitable for semiconductor laser recording that has good weather resistance, sufficiently good signal quality, and a large recording power margin.
(問題を解決するための手段)
本発明の光記録媒体は情報を半導体レーザ光に
よつて記録しかつ読み取る光記録媒体であつて、
シリコン窒化物又はジルコニウム窒化物又はクロ
ム窒化物又はチタン窒化物を主成分とする層と、
テルルとセレンと窒素を主成分とする層のと少な
くとも2層を有していることを特徴とする光記録
媒体。(Means for solving the problem) The optical recording medium of the present invention is an optical recording medium in which information is recorded and read by semiconductor laser light, and includes:
A layer mainly composed of silicon nitride, zirconium nitride, chromium nitride or titanium nitride,
An optical recording medium comprising at least two layers containing tellurium, selenium, and nitrogen as main components.
(作用)
光記録媒体は従来第2図のような構成になつて
いた。即ち、基板1の上に記録層21が設けられ
ている。記録用レーザ光は基板1を通して記録層
21に集光照射され、ピツト22が形成される。
基板1としてはポリカーボネイト、ポリオレフイ
ン、ポリメチルペンテル、アクリル、エポキシ樹
脂等の合成樹脂やガラスが使用される。基板に
は、ピツトが同心円状あるいはスパイラル状に一
定間隔で精度よく記録されるように案内溝が設け
られている。レーザビーム径程度の溝に光が入射
すると光は回折され、ビーム中心が溝からずれる
につれて回折光強度の空間分布が変化するので、
これを検出してレーザビームを溝の中心に入射さ
せるようにサーボ系が構成されている。溝の幅は
通常0.3〜1.3μmであり、溝の深さは使用するレ
ーザ波長の1/12から1/4の範囲に設定される。集
光に関しても同様にサーボ系が構成されている。
情報の読み出しは、記録のときよりも弱いパワー
のレーザ光をピツト上を通過するように照射する
ことにより、ピツトの有無に起因する反射率の変
化を検出して行なう。(Function) Optical recording media have conventionally had a configuration as shown in FIG. That is, the recording layer 21 is provided on the substrate 1. The recording laser beam is focused and irradiated onto the recording layer 21 through the substrate 1, and pits 22 are formed.
As the substrate 1, synthetic resins such as polycarbonate, polyolefin, polymethylpentyl, acrylic, and epoxy resins, and glass are used. Guide grooves are provided on the substrate so that pits are recorded concentrically or spirally at regular intervals with high precision. When light enters a groove with the diameter of a laser beam, the light is diffracted, and as the beam center shifts from the groove, the spatial distribution of the diffracted light intensity changes.
A servo system is configured to detect this and direct the laser beam to the center of the groove. The width of the groove is usually 0.3 to 1.3 μm, and the depth of the groove is set in the range of 1/12 to 1/4 of the laser wavelength used. A servo system is similarly configured for condensing light.
Information is read by irradiating a laser beam with a power weaker than that used during recording so as to pass over the pits, and detecting changes in reflectance caused by the presence or absence of pits.
記録層21としては種々の材料を使用できる
が、耐候性を考慮するとテルルセレン系合金膜が
望ましい。しかしながら、テルルセレン合金層の
みでは信号品質が充分に良好ではなかつた。本発
明者らは記録層をテルルとセレンと窒素を主成分
とすることにより、信号品質が良好で半導体レー
ザ記録に適した媒体となることを見出し、すでに
提案している。本発明はこれらをさらに改善した
ものであり、第1図に示すように基板1とテルル
セレン窒素層3の間に窒化物を主成分とする層2
を設けることにより、記録により形成されるピツ
トが大きく拡がらないようになる。したがつて、
ピツトをつめて記録できるので高密度記録が可能
となる。又、記録パワー変動に対する余裕度も大
きくなるので、実用的な光記録媒体となる。さら
に又、大きなピツトが形成されないためトラツキ
ングやフオーカスサーボが不安定にならないので
実用的な光記録媒体となる。ピツトが大きく拡が
らない理由は明確ではないが、テルルセレン窒素
層の有無による表面エネルギーの差が窒化物を主
成分とする層の形成により変化することによつて
いると考えられる。 Although various materials can be used for the recording layer 21, a tellurium selenium alloy film is preferable in consideration of weather resistance. However, the signal quality was not sufficiently good with only the tellurium selenium alloy layer. The inventors of the present invention have found that by making the recording layer mainly composed of tellurium, selenium, and nitrogen, a medium with good signal quality and suitable for semiconductor laser recording can be obtained, and has already proposed this method. The present invention further improves these, and as shown in FIG.
By providing this, the pits formed by recording can be prevented from expanding significantly. Therefore,
High-density recording is possible because the pits can be packed together for recording. Furthermore, since the margin against fluctuations in recording power is increased, the optical recording medium becomes a practical optical recording medium. Furthermore, since no large pits are formed, tracking and focus servo do not become unstable, making it a practical optical recording medium. The reason why the pits do not expand significantly is not clear, but it is thought to be because the difference in surface energy depending on the presence or absence of the tellurium selenium nitrogen layer changes due to the formation of a layer mainly composed of nitride.
(実施例) 以下、本発明の実施例について説明する。(Example) Examples of the present invention will be described below.
100℃で2時間アニール処理した内径15mm、外
径130mm、厚さ1.2mmのポリカーボネイト樹脂デイ
スク基板にシリコン窒化物を約100Å厚形成し、
ひきつづきこの上に、テルルセレン合金ターゲツ
トをアルゴンと窒素の混合ガスでマグネトロンス
パツタして、テルルとセレンと窒素の比が原子パ
ーセントで90対4対6のテルルセレン窒素層を約
240Å厚形成した。この光デイスクを95℃の窒素
雰囲気中で1時間アニールしたのち、波長8300Å
における基板入射反射率を測定したところ32%で
あつた。波長8300Åの半導体レーザ光を基板を通
して入射して記録層上で1.6μmφ程度に絞り、媒
体線速度5.6m/sec、記録周波数3.77MHz、記録
パルス幅70nsec、記録パワー6.5mWの条件で記
録し、0.7mWで再生した。バンド幅30KHzのキ
ヤリアーとノイズとの比(C/N)は50dBと良
好であつた。この光デイスクを70℃80%の高温高
湿度の環境に60時間保存した後、上記特性を調べ
たが変化はなく、耐候性に優れた光記録媒体であ
ることが確認された。 Silicon nitride is formed to a thickness of about 100 Å on a polycarbonate resin disk substrate with an inner diameter of 15 mm, outer diameter of 130 mm, and thickness of 1.2 mm that has been annealed at 100°C for 2 hours.
Subsequently, a tellurium selenium alloy target is magnetron sputtered with a mixed gas of argon and nitrogen to form a tellurium selenium nitrogen layer with an atomic percent ratio of tellurium to selenium to nitrogen of about 90:4:6.
A thickness of 240 Å was formed. After annealing this optical disk in a nitrogen atmosphere at 95°C for 1 hour, it was
When the incident reflectance of the substrate was measured, it was 32%. Semiconductor laser light with a wavelength of 8300 Å is incident through the substrate, focused to about 1.6 μmφ on the recording layer, and recorded under conditions of medium linear velocity of 5.6 m/sec, recording frequency of 3.77 MHz, recording pulse width of 70 nsec, and recording power of 6.5 mW. Regeneration was performed at 0.7mW. The carrier-to-noise ratio (C/N) with a bandwidth of 30 KHz was as good as 50 dB. After this optical disk was stored in a high temperature and high humidity environment of 70°C and 80% for 60 hours, the above characteristics were examined, but there were no changes, confirming that it was an optical recording medium with excellent weather resistance.
比較のためのシリコン窒化物層を設けない光デ
イスクに比べて、45dB以上のC/Nが得られる
記録パワー範囲はおよそ2倍大きくなり、記録パ
ワー変動に対する余裕度の大きいことが確認され
た。又、トラツキングやフオーカスのサーボも不
安定になることはなかつた。 Compared to a comparative optical disk without a silicon nitride layer, the recording power range in which a C/N of 45 dB or more can be obtained is approximately twice as wide, and it was confirmed that there is a large margin against recording power fluctuations. Also, the tracking and focus servos did not become unstable.
窒化物層としては種々の窒化物を使用すること
ができるが、その中では窒化シリコン、窒化ジル
コニウム、窒化クロム、窒化チタンがとくに望ま
しい。吸収のない窒化物の場合の膜厚は5Åから
2000Åの範囲が望ましい。吸収のある窒化物の場
合の膜厚は2Åから1000Åの範囲が望ましい。吸
収のある窒化物を用いた場合の記録ピツトはテル
ルセレン窒素層の孔と窒化物層の変形(孔、凹部
等)とにより形成される。また窒化物層にはピツ
トの径の拡大を抑制する効果を損なわない範囲内
で他の成分が含まれていてもよい。 Various nitrides can be used as the nitride layer, but silicon nitride, zirconium nitride, chromium nitride, and titanium nitride are particularly preferred. The film thickness for non-absorbing nitrides is from 5 Å.
A range of 2000 Å is desirable. In the case of absorbing nitride, the film thickness is preferably in the range of 2 Å to 1000 Å. When absorbing nitride is used, recording pits are formed by holes in the tellurium selenium nitrogen layer and deformations (holes, recesses, etc.) in the nitride layer. Further, the nitride layer may contain other components within a range that does not impair the effect of suppressing the enlargement of the pit diameter.
テルルセレン窒素層の厚さは180Åから400Åの
範囲が記録再生特性の観点から望ましく、窒素の
含有量は原子パーセントで2パーセント以上10パ
ーセント以下が記録再生特性、耐候性の観点から
望ましく、セレンの含有量は原子パーセントで2
パーセント以上30パーセント以下、とくに10パー
セント以上30パーセント以下の範囲が耐候性の観
点で望ましい。 The thickness of the tellurium selenium nitrogen layer is preferably in the range of 180 Å to 400 Å from the viewpoint of recording/reproducing characteristics, and the nitrogen content is preferably 2% or more and 10% or less in atomic percent from the viewpoint of recording/reproducing characteristics and weather resistance. The amount is atomic percent 2
A range of 10% to 30%, particularly 10% to 30%, is desirable from the viewpoint of weather resistance.
テルルセレン窒素層には、鉛、ヒ素、スズ、ゲ
ルマニウム、カドミウム、タリウム、リン、イン
ジウム、ガリウム、亜鉛、アルミニムウ、銅、
銀、マグネシウム、タンタル、金、バラジウム、
コバルトの群から選ばれた少なくとも1種の元素
を添加すると、ピツトの形状を良好に整える場合
がある。ただし添加量は原子パーセントで20パー
セント未満が望ましい。 The tellurium selenium nitrogen layer contains lead, arsenic, tin, germanium, cadmium, thallium, phosphorus, indium, gallium, zinc, aluminum, copper,
silver, magnesium, tantalum, gold, paladium,
Addition of at least one element selected from the group of cobalt may improve the shape of the pit. However, the amount added is preferably less than 20% in atomic percent.
成膜方法は、スパツタリング法の他に、蒸発
法、反応性蒸着法、イオン、プレーテンイング
法、イオンビームデポジシヨン法等でもよい。 In addition to the sputtering method, the film forming method may be an evaporation method, a reactive vapor deposition method, an ion, plate-tening method, an ion beam deposition method, or the like.
(発明の効果)
上記実施例から明らかなように、本発明により
耐候性がよくかつ信号品質が充分に良好で記録パ
ワー余裕度が大きく半導体レーザ記録に適した光
記録媒体が得られる。(Effects of the Invention) As is clear from the above embodiments, the present invention provides an optical recording medium that has good weather resistance, sufficiently good signal quality, a large recording power margin, and is suitable for semiconductor laser recording.
第1図は本発明の光記録媒体の一例を示す断面
図、第2図は従来の光記録媒体の断面図である。
図において、1は基板、2は窒化物を主成分と
する層、3はテルルセレン窒素を主成分とする
層、21は記録層、22はピツトを表わす。
FIG. 1 is a sectional view showing an example of the optical recording medium of the present invention, and FIG. 2 is a sectional view of a conventional optical recording medium. In the figure, 1 is a substrate, 2 is a layer mainly composed of nitride, 3 is a layer mainly composed of tellurium selenium nitrogen, 21 is a recording layer, and 22 is a pit.
Claims (1)
み取る光記録媒体において、シリコン窒化物又は
ジルコニウム窒化物又はクロム窒化物又はチタン
窒化物を主成分とする層と、テルルとセレンと窒
素を主成分とする層の少なくとも2層を有してい
ることを特徴とする光記録媒体。1. Optical recording media in which information is recorded and read by semiconductor laser light include a layer containing silicon nitride, zirconium nitride, chromium nitride, or titanium nitride as a main component, and a layer containing tellurium, selenium, and nitrogen as main components. An optical recording medium comprising at least two layers.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61122687A JPS62278095A (en) | 1986-05-27 | 1986-05-27 | Optical recording medium |
US07/043,626 US4839208A (en) | 1986-04-30 | 1987-04-28 | Optical information recording medium |
DE8787106262T DE3781926T2 (en) | 1986-04-30 | 1987-04-29 | MEDIUM FOR OPTICAL INFORMATION RECORDING. |
EP87106262A EP0243958B1 (en) | 1986-04-30 | 1987-04-29 | Optical information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61122687A JPS62278095A (en) | 1986-05-27 | 1986-05-27 | Optical recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62278095A JPS62278095A (en) | 1987-12-02 |
JPH0530391B2 true JPH0530391B2 (en) | 1993-05-07 |
Family
ID=14842138
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61122687A Granted JPS62278095A (en) | 1986-04-30 | 1986-05-27 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62278095A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1839052B (en) | 2003-08-21 | 2011-09-07 | 三菱化学媒体股份有限公司 | Recording medium |
-
1986
- 1986-05-27 JP JP61122687A patent/JPS62278095A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62278095A (en) | 1987-12-02 |
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