JPH05295514A - Thermal spraying method of metal - Google Patents

Thermal spraying method of metal

Info

Publication number
JPH05295514A
JPH05295514A JP4124106A JP12410692A JPH05295514A JP H05295514 A JPH05295514 A JP H05295514A JP 4124106 A JP4124106 A JP 4124106A JP 12410692 A JP12410692 A JP 12410692A JP H05295514 A JPH05295514 A JP H05295514A
Authority
JP
Japan
Prior art keywords
metal
light
base material
molten metal
transmitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4124106A
Other languages
Japanese (ja)
Other versions
JP2939047B2 (en
Inventor
Masao Kubo
雅男 久保
Sakuo Kamata
策雄 鎌田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP4124106A priority Critical patent/JP2939047B2/en
Publication of JPH05295514A publication Critical patent/JPH05295514A/en
Application granted granted Critical
Publication of JP2939047B2 publication Critical patent/JP2939047B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Coating By Spraying Or Casting (AREA)

Abstract

PURPOSE:To form a metallic film at a high film forming speed on a base material surface by packing a molten metal into a light transparent pipe made of a light transparent member, irradiating the pipe with a laser beam from the outside to the inside of the pipe, ejecting the molten metal from the pipe and bringing the molten metal into collision against the surface of the base material. CONSTITUTION:SnPb eutectic solder is put into the light transparent pipe 1 (about 0.1mm inside diameter) consisting of quartz and is held at a molten state at about 200 deg.C with a heater 4. A pressure is kept applied on the pipe in the direction of the end face 1a of the pipe. This molten metal 2 is irradiated with a laser beam through the light transparent pipe 1 and the molten metal 2 is ejected from the end face 1a side of the pipe. The microregion on an Ag layer provided on a base material 5 is coated with the solder. The inside diameter of the light transparent pipe 1 and the power of the laser beam 3 are set, by that, the ejection rate of the molten metal 2 is freely controlled and the formation of the film to the microregion is facilitated.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は金属の溶射方法に関す
る。
FIELD OF THE INVENTION The present invention relates to a method for spraying metal.

【0002】[0002]

【従来の技術】従来技術として例えばプラズマ溶射で
は、アルゴン、窒素、水素等の気体をプラズマ化させ、
その熱と体積膨張で金属材料を溶融噴出させ、基材表面
に皮膜を形成させている。微細領域への皮膜形成方法は
マスクを用いたメッキや蒸着の方法が用いられている。
2. Description of the Related Art As a conventional technique, for example, in plasma spraying, a gas such as argon, nitrogen or hydrogen is made into plasma,
The heat and volume expansion cause the metal material to be melted and ejected to form a film on the surface of the base material. As a method for forming a film on a fine region, a plating method using a mask or a vapor deposition method is used.

【0003】[0003]

【発明が解決しようとする課題】しかし、従来のプラズ
マ溶射では原理的に溶射ガンの小型化が困難で、微細領
域での皮膜形成ができない。またマスクを用いたメッキ
や蒸着による微細領域への皮膜形成方法では工程が複雑
で皮膜材質や皮膜形成形状の自由度が低く、かつ成膜速
度が遅いという問題がある。
However, in the conventional plasma spraying, it is difficult in principle to reduce the size of the spray gun, and it is impossible to form a film in a fine region. Further, in the method of forming a film on a fine region by plating or vapor deposition using a mask, there are problems that the process is complicated, the degree of freedom of the film material and the film formation shape is low, and the film formation rate is slow.

【0004】本発明はこのような点に鑑みてなされたも
のであり、微細領域への皮膜形成ができ、皮膜材質や皮
膜形成形状の自由度があり、かつ成膜速度が速い金属の
溶射方法を提供することを目的とする。
The present invention has been made in view of the above circumstances, and it is a method of thermal spraying a metal capable of forming a film on a fine region, having flexibility in a film material and a film forming shape, and having a high film forming rate. The purpose is to provide.

【0005】[0005]

【課題を解決するための手段】上記課題を解決するため
に本発明による金属の溶射方法は、透光部材からなる透
光管内に溶融金属を充填させ、透光管外から内方へレー
ザ光を照射し、透光管端面から溶融金属を噴出させて基
材の表面に衝突させ、基材表面に金属膜を形成すること
に特徴を有している。
In order to solve the above-mentioned problems, the metal spraying method according to the present invention is to fill a transparent tube made of a transparent member with a molten metal, and to apply laser light from the outside to the inside of the transparent tube. It is characterized in that a metal film is formed on the surface of the base material by irradiating the surface of the light-transmitting tube and ejecting molten metal from the end surface of the light-transmitting tube to collide with the surface of the base material.

【0006】[0006]

【作用】透光管内に溶融金属を充填し、透光管外から内
方へレーザ光を照射し、そのレーザエネルギーで溶融金
属を局部的に蒸発させ、その時の体積膨張による圧力で
透光管端面から溶融金属を噴出させ、溶射を行う。
[Function] The molten metal is filled in the light-transmitting tube, the laser light is irradiated from the outside to the inside of the light-transmitting tube, the molten metal is locally evaporated by the laser energy, and the light-transmitting tube is pressurized by the volume expansion at that time. Molten metal is ejected from the end face to perform thermal spraying.

【0007】[0007]

【実施例】以下、本発明の一実施例を図面に基づいて説
明する。先ず第1実施例を図1〜図3を用いて説明す
る。図2のように、例えば石英の透光管1の内(内径約
0.1mm )にSnPb共晶はんだを入れ、ヒータ4で約200
℃に保ち溶融状態にする。この時図の矢印の方向に圧力
を加えておく。図3のように、この溶融金属2に透光管
1ごしにレーザ光3、例えばパルスYAGレーザ(〜5
J/P)を照射することで、溶融金属2を透光管端面1
a側から噴出させる。図1のように、噴出した一部の溶
融金属2は、基材上に設けたAg層上の微小領域にはんだ
をコーティングすることができる。透光管1の内径とレ
ーザ光3のパワーを設定することで、溶融金属2の噴出
量を自由に制御でき、かつ微細領域への皮膜形成が容易
にでき、微細電気回路等を作ることも可能である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. First, a first embodiment will be described with reference to FIGS. As shown in FIG. 2, for example, the inside of the light-transmitting tube 1 made of quartz (inner diameter approximately
SnPb eutectic solder in 0.1mm)
Keep at ℃ and put in molten state. At this time, pressure is applied in the direction of the arrow in the figure. As shown in FIG. 3, laser light 3, for example, pulse YAG laser (~ 5
(J / P) to irradiate the molten metal 2 with the end face 1 of the transparent tube.
Eject from the a side. As shown in FIG. 1, a part of the molten metal 2 that has been ejected can coat the solder on a minute region on the Ag layer provided on the base material. By setting the inner diameter of the light-transmitting tube 1 and the power of the laser light 3, it is possible to freely control the ejection amount of the molten metal 2 and to easily form a film on a fine region, and to form a fine electric circuit or the like. It is possible.

【0008】図4は本発明の第2実施例であり、基材5
の表面に凹凸(例えば表面粗さ1〜5μm程度)、また
は孔を設けることで、噴出された溶融金属2の基材5へ
の密着性が向上する。
FIG. 4 shows a second embodiment of the present invention, in which a base material 5 is used.
By providing irregularities (for example, a surface roughness of about 1 to 5 μm) or holes on the surface of, the adhesion of the jetted molten metal 2 to the substrate 5 is improved.

【0009】図5は本発明の第3実施例であり、基材5
の表面にレーザ光3を照射し、基材5の表面を溶融また
は昇温させながら溶融金属2を基材5へ衝突させる。金
属の皮膜と基材5が界面で融合し密着性が向上する。ま
たレーザ光3の照射と溶融金属2の噴出を時間的に調整
することで、金属の皮膜の緻密化や基材5との合金化が
可能になる。
FIG. 5 shows the third embodiment of the present invention, in which the base material 5 is used.
The surface of the substrate is irradiated with the laser beam 3 to cause the molten metal 2 to collide with the substrate 5 while melting or raising the temperature of the surface of the substrate 5. The metal film and the base material 5 are fused at the interface to improve the adhesiveness. Further, by adjusting the irradiation of the laser beam 3 and the jetting of the molten metal 2 with respect to time, it becomes possible to densify the metal film and alloy it with the base material 5.

【0010】図6は本発明の第4実施例であり、基材5
に超音波振動(例えば10〜100KHz)を印加する
ことで、噴出された溶融金属2が基材5の表面にぬれや
すくなり密着性が向上する。
FIG. 6 shows a fourth embodiment of the present invention, in which the base material 5 is used.
By applying ultrasonic vibration (for example, 10 to 100 KHz) to the surface of the base material 5, the jetted molten metal 2 easily wets the surface of the base material 5 and the adhesion is improved.

【0011】図7は本発明の第5実施例であり、溶融金
属2の噴出を複数回行い膜厚制御することで電気接点や
バンプ形成が可能となる。電気接点:Cu合金基材上にAg
を溶射する。バンプ:Siウェハー上にAuまたははんだを
溶射する。
FIG. 7 shows a fifth embodiment of the present invention, in which electric contacts and bumps can be formed by ejecting the molten metal 2 a plurality of times to control the film thickness. Electrical contact: Ag on Cu alloy substrate
To spray. Bump: Spray Au or solder onto Si wafer.

【0012】図8は本発明の第6実施例であり、透光管
を複数設け複数の溶融金属2の噴出を同時または別々に
行うことで、異なった材料による積層皮膜や傾斜組成皮
膜、及び合金皮膜の形成が可能になる。
FIG. 8 shows a sixth embodiment of the present invention, in which a plurality of light-transmitting tubes are provided and a plurality of molten metals 2 are jetted simultaneously or separately, so that a laminated film or a gradient composition film made of different materials, and It becomes possible to form an alloy film.

【0013】図9は本発明の第7実施例であり、溶融金
属2を透光管1の内部に設けるには金属の溶融保持温度
より高い耐熱性が必要である。またレーザ光3を透光管
1ごしに溶融金属2に照射するには用いるレーザの波長
を透過するような材料を透光管1に用いる必要がある。
そこで、用いるレーザ波長と溶融金属材質に合わせ、透
光部材として、ガラス、石英、または透光セラミックス
が選定される。例えばアルミナ、イットリア、トリア、
酸化スカンジウム、スピネル、マグネシア、リチウムア
ルミネート、ハフニウム、酸化ディスプロシウム、酸化
エルビウム等である。
FIG. 9 shows a seventh embodiment of the present invention. In order to provide the molten metal 2 inside the light-transmitting tube 1, heat resistance higher than the melting and holding temperature of the metal is required. Further, in order to irradiate the molten metal 2 with the laser light 3 through the transparent tube 1, it is necessary to use a material that transmits the wavelength of the laser used for the transparent tube 1.
Therefore, glass, quartz, or translucent ceramics is selected as the translucent member according to the laser wavelength to be used and the molten metal material. For example, alumina, yttria, thoria,
Examples thereof include scandium oxide, spinel, magnesia, lithium aluminate, hafnium, dysprosium oxide, erbium oxide and the like.

【0014】図10は上記の第7実施例で用いられる高
透光性セラミックスの波長と透明度を示す図である。上
から順に、リチウムアルミネート、マグネシア(融点〜
2800℃)、酸化ディスプロシウム(融点〜2300
℃)、スピネル(融点〜2135℃)、酸化スカンジウ
ム(融点〜2405℃)、トリア(融点〜3000
℃)、イットリア(融点〜2400℃)、アルミナであ
る。
FIG. 10 is a diagram showing the wavelength and transparency of the highly translucent ceramics used in the above seventh embodiment. From top to bottom, lithium aluminate, magnesia (melting point ~
2800 ° C), dysprosium oxide (melting point ~ 2300
C.), spinel (melting point to 2135 C.), scandium oxide (melting point to 2405 C.), thoria (melting point to 3000).
C.), yttria (melting point to 2400.degree. C.), and alumina.

【0015】図11は本発明の第8実施例であり、レー
ザ光としてエキシマレーザ3bを用いることで、その短
波長(紫外線域)と高エネルギーの効果で金属が蒸発
(アブレーション)しやすいため、溶融金属2の噴出を
容易に効率よく行うことができる。例えばAgに対するレ
ーザ光の吸収率はYAGレーザ(1.06μm),CO
2 レーザ(10.6μm)で5%以下であるが、248
nmの波長を持つエキシマレーザ(KrF)では吸収率
が約70%に向上し蒸発が起こりやすくなる。
FIG. 11 shows an eighth embodiment of the present invention. By using the excimer laser 3b as the laser light, the metal easily evaporates (ablates) due to its short wavelength (ultraviolet region) and high energy. The molten metal 2 can be easily and efficiently ejected. For example, the absorption rate of laser light for Ag is YAG laser (1.06 μm), CO
5% or less with 2 lasers (10.6 μm), but 248
In the excimer laser (KrF) having a wavelength of nm, the absorptance is improved to about 70% and evaporation is likely to occur.

【0016】図12は本発明の第9実施例であり、レー
ザ光3を照射する透光管1の端面近傍部分1bの内径を
他部分より小さくすることで、その部分熱容量が小さく
なり、低いレーザエネルギーでも溶融金属2を蒸発させ
ることが可能になり溶融金属2の噴出効率が向上する。
FIG. 12 shows a ninth embodiment of the present invention. By making the inner diameter of the portion 1b near the end face of the transparent tube 1 for irradiating the laser beam 3 smaller than the other portions, the partial heat capacity becomes small and low. The molten metal 2 can be vaporized even with laser energy, and the ejection efficiency of the molten metal 2 is improved.

【0017】図13は本発明の第10実施例であり、透
光管1の内部での金属の溶融保持を、透光管1の外から
内方へのレーザ光3aの照射による入熱で行うことによ
り、Ni等の高融点金属でも容易に溶融状態にすることが
可能になる。
FIG. 13 shows a tenth embodiment of the present invention, in which melting and holding of metal inside the light-transmitting tube 1 is performed by heat input by irradiating the laser beam 3a from the outside to the inside of the light-transmitting tube 1. By doing so, even a refractory metal such as Ni can be easily brought into a molten state.

【0018】図14は本発明の第11実施例であり、管
状体6のレーザ光3を照射する透光窓6cだけを透光材
料にすることで、管状体6を自由に形状設計することが
でき、かつレーザ波長と溶融金属材質に合わせた透光部
材の使用を必要最小限に抑えることができる。
FIG. 14 shows an eleventh embodiment of the present invention, in which the tubular body 6 can be freely designed by using only a transparent window 6c for irradiating the laser beam 3 of the tubular body 6 with a transparent material. In addition, it is possible to minimize the use of the light-transmissive member according to the laser wavelength and the molten metal material.

【0019】[0019]

【発明の効果】以上説明したように、本発明による金属
の溶射方法は、透光部材からなる透光管内に溶融金属を
充填させ、透光管外から内方へレーザ光を照射し、透光
管端面から溶融金属を噴出させて基材の表面に衝突さ
せ、基材表面に金属膜を形成するようにしたので、微細
領域への皮膜形成ができ、皮膜材質や皮膜形成形状の自
由度があり、かつ成膜速度が速い皮膜形成が可能にな
る。
As described above, in the metal spraying method according to the present invention, the molten metal is filled in the light-transmitting tube made of the light-transmitting member, and the laser beam is irradiated from the outside to the inside of the light-transmitting tube to transmit the light. Molten metal is ejected from the end surface of the light tube and collides with the surface of the base material to form a metal film on the surface of the base material, so that a film can be formed in a minute area, and the degree of freedom of the film material and film formation shape In addition, it is possible to form a film having a high film forming speed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例における金属の溶射を説明
する説明図である。
FIG. 1 is an explanatory view illustrating thermal spraying of metal in a first embodiment of the present invention.

【図2】本発明の第1実施例における金属溶融工程を説
明する説明図である。
FIG. 2 is an explanatory diagram illustrating a metal melting step in the first embodiment of the present invention.

【図3】本発明の第1実施例におけるレーザ照射気化工
程を説明する説明図である。
FIG. 3 is an explanatory diagram illustrating a laser irradiation vaporization step in the first embodiment of the present invention.

【図4】本発明の第2実施例における基材に凹凸を設け
た場合の説明図である。
FIG. 4 is an explanatory diagram in the case where unevenness is provided on the base material in the second embodiment of the present invention.

【図5】本発明の第3実施例における基材表面にレーザ
光を照射した場合の説明図である。
FIG. 5 is an explanatory diagram in the case where a laser beam is applied to the surface of the base material in the third embodiment of the present invention.

【図6】本発明の第4実施例における基材に超音波振動
を印加した場合の説明図である。
FIG. 6 is an explanatory diagram in the case where ultrasonic vibration is applied to the base material in the fourth embodiment of the present invention.

【図7】本発明の第5実施例における基材上の膜厚を制
御する場合の説明図である。
FIG. 7 is an explanatory diagram for controlling a film thickness on a base material according to a fifth embodiment of the present invention.

【図8】本発明の第6実施例における基材上の膜質を制
御する場合の説明図である。
FIG. 8 is an explanatory diagram for controlling the film quality on the base material in the sixth embodiment of the present invention.

【図9】本発明の第7実施例における透光管の材質を説
明する説明図である。
FIG. 9 is an explanatory diagram illustrating a material of a light-transmitting tube according to a seventh embodiment of the present invention.

【図10】本発明の第7実施例における透光管の材質で
ある高透光性セラミックスの波長と透明度を示す図であ
る。
FIG. 10 is a diagram showing the wavelength and the transparency of the highly transparent ceramics which is the material of the transparent tube in the seventh embodiment of the present invention.

【図11】本発明の第8実施例におけるエキシマレーザ
光を用いた場合の説明図である。
FIG. 11 is an explanatory diagram when an excimer laser beam is used in an eighth example of the present invention.

【図12】本発明の第9実施例における透光管の形状を
説明する説明図である。
FIG. 12 is an explanatory diagram illustrating the shape of a light-transmitting tube according to a ninth embodiment of the present invention.

【図13】本発明の第10実施例におけるレーザ光によ
る金属の溶融保持を説明する説明図である。
FIG. 13 is an explanatory diagram illustrating melting and holding of metal by laser light according to the tenth embodiment of the present invention.

【図14】本発明の第11実施例における管状体に透光
窓を設けた場合の説明図である。
FIG. 14 is an explanatory diagram of a case where a tubular body is provided with a light transmitting window in the eleventh embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 透光管 1a 透光管端面 1b 端面近傍部分 1c 透光窓 2 溶融金属 3 レーザ光 3a 金属溶融用レーザ光 3b エキシマレーザ光 4 ヒータ 5 基材 6 管状体 6a 管状体端面 6c 透光窓 1 translucent tube 1a translucent tube end face 1b end face vicinity part 1c translucent window 2 molten metal 3 laser light 3a metal melting laser light 3b excimer laser light 4 heater 5 base material 6 tubular body 6a tubular body end surface 6c translucent window

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 透光部材からなる透光管内に溶融金属を
充填させ、透光管外から内方へレーザ光を照射し、透光
管端面から溶融金属を噴出させて基材の表面に衝突さ
せ、基材表面に金属膜を形成することを特徴とする金属
の溶射方法。
1. A molten metal is filled in a light-transmitting tube made of a light-transmitting member, a laser beam is irradiated from the outside of the light-transmitting tube inward, and the molten metal is ejected from the end surface of the light-transmitting tube to the surface of the base material. A method for thermal spraying of metal, which comprises colliding and forming a metal film on the surface of the base material.
【請求項2】 前記基材の表面に凹凸または孔を設けた
ことを特徴とする請求項1記載の金属の溶射方法。
2. The method for spraying a metal according to claim 1, wherein the surface of the base material is provided with irregularities or holes.
【請求項3】 前記基材の表面にレーザ光を照射するこ
とを特徴とする請求項1記載の金属の溶射方法。
3. The metal spraying method according to claim 1, wherein the surface of the base material is irradiated with laser light.
【請求項4】 前記基材に超音波振動を印加することを
特徴とする請求項1記載の金属の溶射方法。
4. The method for thermal spraying of a metal according to claim 1, wherein ultrasonic vibration is applied to the base material.
【請求項5】 前記溶融金属の噴出を同位置で数回行
い、膜厚制御することを特徴とする請求項1記載の金属
の溶射方法。
5. The metal spraying method according to claim 1, wherein the molten metal is jetted several times at the same position to control the film thickness.
【請求項6】 前記透光管を複数設け複数の溶融金属の
噴出を同時又は別々に行い、形成される膜質を制御する
ことを特徴とする請求項1記載の金属の溶射方法。
6. The metal spraying method according to claim 1, wherein a plurality of said light-transmitting tubes are provided and a plurality of molten metals are jetted simultaneously or separately to control the quality of the formed film.
【請求項7】 前記透光管の透光部材として、ガラス、
石英、又は透光セラミックス、例えばアルミナ、イット
リア、トリア、酸化スカンジウム、スピネル、マグネシ
ア、リチウムアルミネート、ハフニウム、酸化ディスプ
ロシウム、酸化エルビウム等を用いることを特徴とする
請求項1記載の金属の溶射方法。
7. The transparent member of the transparent tube is glass,
Quartz, or translucent ceramics such as alumina, yttria, thoria, scandium oxide, spinel, magnesia, lithium aluminate, hafnium, dysprosium oxide, erbium oxide, etc. Method.
【請求項8】 前記レーザ光としてエキシマレーザを用
いることを特徴とする請求項1記載の金属の溶射方法。
8. The metal spraying method according to claim 1, wherein an excimer laser is used as the laser light.
【請求項9】 レーザ光を照射する前記透光管の端面近
傍部分の内径を他部分より小さくしたことを特徴とする
請求項1記載の金属の溶射方法。
9. The metal spraying method according to claim 1, wherein an inner diameter of a portion near the end face of the light-transmitting tube for irradiating the laser beam is smaller than other portions.
【請求項10】 透光管内部での金属の溶融保持を透光
管外から内方へのレーザ光照射による入熱で行うことを
特徴とする請求項1記載の金属の溶射方法。
10. The method for thermal spraying of a metal according to claim 1, wherein melting and holding of the metal inside the light-transmitting tube is performed by heat input from the outside of the light-transmitting tube to the inside by irradiation of laser light.
【請求項11】 管状体内に溶融金属を充満させ、管状
体の一部に設けたレーザ透光体からなる透光窓の外から
内方へレーザ光を照射し、管状体端面から溶融金属を噴
出させて基材の表面に衝突させ、基材表面に金属膜を形
成することを特徴とする金属の溶射方法。
11. A tubular body is filled with molten metal, and a laser beam is irradiated from outside to inside of a light-transmitting window made of a laser-transmitting body provided in a part of the tubular body, so that the molten metal is discharged from the end surface of the tubular body. A thermal spraying method for a metal, which comprises ejecting and colliding with a surface of a base material to form a metal film on the surface of the base material.
JP4124106A 1992-04-17 1992-04-17 Metal spraying method Expired - Lifetime JP2939047B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4124106A JP2939047B2 (en) 1992-04-17 1992-04-17 Metal spraying method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4124106A JP2939047B2 (en) 1992-04-17 1992-04-17 Metal spraying method

Publications (2)

Publication Number Publication Date
JPH05295514A true JPH05295514A (en) 1993-11-09
JP2939047B2 JP2939047B2 (en) 1999-08-25

Family

ID=14877071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4124106A Expired - Lifetime JP2939047B2 (en) 1992-04-17 1992-04-17 Metal spraying method

Country Status (1)

Country Link
JP (1) JP2939047B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009007609A (en) * 2007-06-27 2009-01-15 Meidensha Corp Method for repairing metallic member

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009007609A (en) * 2007-06-27 2009-01-15 Meidensha Corp Method for repairing metallic member

Also Published As

Publication number Publication date
JP2939047B2 (en) 1999-08-25

Similar Documents

Publication Publication Date Title
US4987006A (en) Laser transfer deposition
TWI538277B (en) A method for deposition of at least one electrically conducting film on a substrate
US5292559A (en) Laser transfer process
JP5670862B2 (en) Method for forming densified layer in thermal spray coating
US7674395B2 (en) Laser etching method and apparatus therefor
US8962151B2 (en) Method of bonding solid materials
US7358169B2 (en) Laser-assisted deposition
US20080085368A1 (en) Method and Apparatus for Coating a Substrate
WO2003028943A1 (en) Method and apparatus for fine liquid spray assisted laser material processing
JP2002076043A (en) Bump forming method, semiconductor device, and bump forming device
JP2939047B2 (en) Metal spraying method
JPH0450381B2 (en)
JP2011228495A (en) Method of manufacturing glass substrate for forming semiconductor device penetration electrode and glass substrate for forming semiconductor device penetration electrode
JP2001168061A (en) Target for forming film on semiconductor substrate by laser irradiation and method of production
JP2003001830A (en) Method for manufacturing ink ejection port of ink jet recording head, and ink jet recording head having ink ejection port to be manufactured by the same method
JP5553795B2 (en) Liquid dripping device
US20120318776A1 (en) Method and apparatus for machining a workpiece
RU2316612C1 (en) Method for applying film coatings with use of laser ablation
KR20180028465A (en) A vacuum insulated glass (VIG) unit with a metallic peripheral edge seal and / or a method of manufacturing the same
JPS642187B2 (en)
JP2006297270A (en) Method and apparatus for fabricating structure and structure
WO2024085004A1 (en) Method for producing ceramic/metal bonded object
JP2001212680A (en) Laser beam processing method
JP3468949B2 (en) Laser marking method and apparatus therefor
JP2003204149A (en) Method and apparatus for soldering electronic component

Legal Events

Date Code Title Description
FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090611

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090611

Year of fee payment: 10

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090611

Year of fee payment: 10

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100611

Year of fee payment: 11

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100611

Year of fee payment: 11

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110611

Year of fee payment: 12

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120611

Year of fee payment: 13

EXPY Cancellation because of completion of term