JPH05292598A - Sound wave transducer - Google Patents

Sound wave transducer

Info

Publication number
JPH05292598A
JPH05292598A JP11692592A JP11692592A JPH05292598A JP H05292598 A JPH05292598 A JP H05292598A JP 11692592 A JP11692592 A JP 11692592A JP 11692592 A JP11692592 A JP 11692592A JP H05292598 A JPH05292598 A JP H05292598A
Authority
JP
Japan
Prior art keywords
pedestal
horn
vibrator
electrode
wave transducer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11692592A
Other languages
Japanese (ja)
Other versions
JP3259322B2 (en
Inventor
Katsuhiko Tanaka
克彦 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP11692592A priority Critical patent/JP3259322B2/en
Publication of JPH05292598A publication Critical patent/JPH05292598A/en
Application granted granted Critical
Publication of JP3259322B2 publication Critical patent/JP3259322B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To reduce the overall size of the sound wave transducer while maintaining its precise shape and to improve the directivity of an ultrasonic wave and improve the sensitivity. CONSTITUTION:A thin film type substrate part 3 is formed on the other end surface 1B of a pedestal 1 formed of a silicone material in a prismatic shape by using an oxidizing method, and the vibrator 4 consisting of electrodes 5 and 7 and a piezoelectric body 6 is provided on the top surface of the substrate part 3. A horn 8 formed of a silicone material in a prismatic shape in another process and the pedestal 1 are joined together by anode connection to manufacture the sound wave transducer. When a voltage signal is applied to the vibrator 4 through the electrodes 5 and 7, the vibrator 4 finely vibrates in opening parts 2 and 9 to generate an ultrasonic wave, which is increased in directivity by the horn 8 and sent out to an external body. A reflected wave from the body is collected by the horn 8 and sent to the vibrator 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば物体の有無、物
体までの距離等を検出する超音波センサ等に用いて好適
な音波トランスデューサに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sound wave transducer suitable for use in, for example, an ultrasonic sensor for detecting the presence or absence of an object and the distance to the object.

【0002】[0002]

【従来の技術】一般に、製品等の物体の通過検知(有無
検知)や距離測定、形状計測等に用いられる超音波セン
サには、音圧による機械的振動と電気的信号とを相互に
変換する音波トランスデューサが設けられ、該音波トラ
ンスデューサによって物体に超音波を発射しつつ、該物
体からの反射波を受信することにより、物体の有無等を
非接触で検出するようになっている。
2. Description of the Related Art Generally, an ultrasonic sensor used for detecting passage (presence / absence detection) of an object such as a product, distance measurement, shape measurement, etc. converts mechanical vibration due to sound pressure and electric signal to each other. A sound wave transducer is provided, and the presence or absence of an object or the like is detected in a non-contact manner by receiving a reflected wave from the object while emitting ultrasonic waves to the object by the sound wave transducer.

【0003】そして、このような音波トランスデューサ
として、金属材料からなる台座と、該台座上に設けら
れ、圧電体の両面に電極が形成された振動子と、該振動
子を覆うように設けられた金属製のホーンとから構成さ
れたものが知られている。
As such an acoustic wave transducer, a pedestal made of a metal material, a vibrator provided on the pedestal and having electrodes on both surfaces of a piezoelectric body, and a vibrator provided so as to cover the vibrator. It is known that it is composed of a metal horn.

【0004】[0004]

【発明が解決しようとする課題】ところで、上述した従
来技術による音波トランスデューサは、金属製のホーン
を備えているから、該金属製ホーンにより、振動子で発
生させた超音波の指向性を高めて、感度を向上させるこ
とができる。しかし、このホーンは、金属材料を用いて
所定角度で開口する形状に形成されているから、精密な
形状を保持したまま小型化するのが困難なばかりか、小
型化した場合には量産性が大幅に低下し、製造コストが
増大するという問題がある。
By the way, since the above-described sound wave transducer according to the prior art is provided with a metal horn, the directivity of the ultrasonic wave generated by the vibrator is enhanced by the metal horn. , The sensitivity can be improved. However, since this horn is made of a metal material and is formed into a shape that opens at a predetermined angle, it is difficult to reduce the size of the horn while maintaining its precise shape. There is a problem that the manufacturing cost is significantly reduced and the manufacturing cost is increased.

【0005】このため、上述した従来技術によるもので
は、圧電素子等からなる振動子自体をいくら小型化して
も、金属製ホーンのために音波トランスデューサ全体を
小型化することができず、取付けの自由度や使い勝手が
低いという問題がある。特に、物体表面を多点検出する
場合等に用いられる1次元アレイ型,2次元アレイ型の
音波トランスデューサにあっては、複数の振動子を直線
状,平面状に配設して構成されているから、それぞれの
振動子に対して金属製のホーンを設けると、全体寸法が
大型化してしまい、取付けの自由度等が大幅に低下する
という問題がある。
For this reason, in the above-mentioned conventional technique, the acoustic wave transducer cannot be downsized because of the metal horn, no matter how small the vibrator itself including the piezoelectric element or the like is downsized. There is a problem that the degree and usability are low. Particularly, in a one-dimensional array type or two-dimensional array type sound wave transducer used for detecting multiple points on an object surface, a plurality of transducers are arranged linearly or in a plane. Therefore, if a metal horn is provided for each vibrator, the overall size becomes large, and there is a problem in that the degree of freedom in mounting is greatly reduced.

【0006】一方、上記問題点を解決すべく、金属製の
ホーンを省き、シリコン材料からなる台座上に振動子を
設けた音波トランスデューサも知られており、この場合
には、フォトリソグラフィ等の半導体微細加工技術を用
いて音波トランスデューサの小型化を図ることができ
る。しかし、この音波トランスデューサを小型化する
と、振動子も小さくなって該振動子から発射する超音波
の送波出力が弱くなるから、超音波の到達距離が短くな
り、性能が大幅に低下するという問題がある。また、小
型化のためにホーンを省いているから、超音波の指向性
が低く、検出精度、信頼性が低いという問題がある。
On the other hand, in order to solve the above problems, there is also known a sound wave transducer in which a horn made of metal is omitted and a vibrator is provided on a pedestal made of a silicon material. In this case, a semiconductor such as photolithography is used. The miniaturization of the acoustic wave transducer can be achieved by using the fine processing technology. However, if this acoustic wave transducer is miniaturized, the size of the oscillator also becomes smaller and the transmission output of the ultrasonic wave emitted from the oscillator becomes weaker. Therefore, the reach distance of the ultrasonic wave becomes shorter and the performance is significantly reduced. There is. Further, since the horn is omitted for downsizing, there is a problem that the directivity of ultrasonic waves is low, and the detection accuracy and reliability are low.

【0007】本発明は上述した従来技術の問題に鑑みな
されたもので、精密な形状を保持したまま全体寸法を小
型化できる上に、超音波の指向性を高めて感度を向上で
きるようにした音波トランスデューサを提供することを
目的とする。
The present invention has been made in view of the above-mentioned problems of the prior art, and it is possible to reduce the overall size while maintaining a precise shape and to improve the directivity of ultrasonic waves to improve the sensitivity. An object is to provide a sound wave transducer.

【0008】[0008]

【課題を解決するための手段】上述した課題を解決する
ために本発明が採用する構成は、一端側から他端側に向
けて順次縮径する開口部が設けられたシリコン製の台座
と、前記開口部を施蓋するように該台座の他端側に設け
られた平板状の基板部と、該基板部の他端側に設けられ
た第1の電極と、該第1の電極の他端側に設けられた圧
電体と、該圧電体の他端側に設けられた第2の電極と、
該第2の電極の他端側に位置して前記台座に設けられ、
一端側から他端側に向けて順次拡径する開口部が形成さ
れたシリコン製のホーンとからなる。
In order to solve the above-mentioned problems, the structure adopted by the present invention is a pedestal made of silicon provided with an opening portion whose diameter is successively reduced from one end side to the other end side, A flat plate-shaped substrate portion provided on the other end side of the pedestal so as to cover the opening, a first electrode provided on the other end side of the substrate portion, and a first electrode other than the first electrode. A piezoelectric body provided on the end side, and a second electrode provided on the other end side of the piezoelectric body,
Provided on the pedestal at the other end of the second electrode,
The horn is made of silicon and has an opening that is gradually expanded from one end to the other end.

【0009】[0009]

【作用】台座とホーンとはシリコン材料から形成されて
いるから、半導体微細加工技術を用いて音波トランスデ
ューサの全体寸法を小型化することができる。そして、
このシリコン製のホーンにより、圧電体の振動によって
生じた音波の指向性を高めることができる。
Since the pedestal and the horn are made of a silicon material, semiconductor microfabrication technology can be used to reduce the overall size of the acoustic wave transducer. And
This silicon horn can enhance the directivity of the sound wave generated by the vibration of the piezoelectric body.

【0010】[0010]

【実施例】以下、本発明の実施例を図1ないし図11に
基づいて説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the present invention will be described below with reference to FIGS.

【0011】図において、1はシリコン材料から約30
0μm程度の厚さ寸法h1 を有する角筒状に形成された
台座を示し、該台座1の中央部には、一端面1Aから他
端面1Bに向けて順次縮径するテーパ状の開口部2が軸
方向に形成されている。また、該台座1の一端面1A等
には、後述する振動子4への電圧信号を供給する発振回
路や振動子4からの電圧信号を処理する受信回路(いず
れも図示せず)等がパターン形成されている。ここで、
前記開口部2は、シリコンの異方性エッチング技術を用
いることにより、シリコンの物性により定まる約55°
の角度α1 で傾斜するテーパ状に形成されている。そし
て、該開口部2は、振動子4の振動を容易にするもので
ある。
In the figure, 1 is about 30 from a silicon material.
1 shows a pedestal formed in the shape of a rectangular tube having a thickness dimension h1 of about 0 μm, and at the center of the pedestal 1, there is a tapered opening 2 whose diameter gradually decreases from one end face 1A to the other end face 1B. It is formed in the axial direction. Further, on one end surface 1A of the pedestal 1 or the like, an oscillation circuit for supplying a voltage signal to the vibrator 4 described later, a receiving circuit for processing the voltage signal from the vibrator 4 (neither shown), etc. are patterned. Has been formed. here,
The opening 2 is about 55 ° which is determined by the physical properties of silicon by using the anisotropic etching technique of silicon.
Is formed in a taper shape that is inclined at an angle α 1. The opening 2 facilitates the vibration of the vibrator 4.

【0012】3は台座1の他端面1B上に一体形成され
た二酸化珪素からなる基板部を示し、該基板部3は、図
2にも示す如く、例えばCVD法,熱酸化法等の手段を
用いて台座1の他端面1B側に0.5〜1μm程度の二
酸化珪素を成膜し、不要部分をエッチングすることによ
り、方形な薄板状の皮膜として形成され、その両端側に
は後述する各電極5,7の各リード部5A,7Aに対応
するリード部3A,3Aが一体形成され、各リード部5
A,7Aと台座1とを電気的に絶縁している。そして、
該基板部3は、薄板状に形成されているため可撓性を有
し、振動子4と共に振動するようになっている。
Reference numeral 3 denotes a substrate portion integrally formed on the other end surface 1B of the pedestal 1 and made of silicon dioxide. As shown in FIG. 2, the substrate portion 3 is provided with means such as a CVD method and a thermal oxidation method. A film of silicon dioxide having a thickness of about 0.5 to 1 μm is formed on the other end surface 1B side of the pedestal 1, and unnecessary portions are etched to form a rectangular thin plate-like film. The lead portions 3A and 3A corresponding to the lead portions 5A and 7A of the electrodes 5 and 7 are integrally formed.
A and 7A are electrically insulated from the pedestal 1. And
Since the substrate portion 3 is formed in a thin plate shape, it has flexibility and vibrates together with the vibrator 4.

【0013】4は後述の収容穴10内に位置して基板部
3の他端側に設けられた振動子を示し、該振動子4は、
基板部3の他端側に蒸着あるいはスパッタ等の手段を用
いて設けられ、アルミニウム等の金属材料からリード部
5Aを有する略方形状に形成された第1の電極5と、該
第1の電極5の他端側にCVD法あるいはスパッタ等の
手段を用いて設けられ、酸化亜鉛(ZnO)等の圧電材
料から方形な薄膜状に形成された圧電体6と、該圧電体
6の他端側に位置して前記第1の電極と同様に蒸着等の
手段を用いて設けられ、アルミニウム等の金属材料から
リード部7Aを有する略方形状に形成された第2の電極
7とから構成されている。ここで、前記各電極5,7は
例えば約0.3〜0.5μm程度の厚さ寸法をもって前
記圧電体6よりも若干小さく形成され、また、前記圧電
体6は約2〜20μm程度の厚さ寸法を有するように形
成されている。
Reference numeral 4 denotes a vibrator which is located in a housing hole 10 described later and is provided on the other end side of the substrate portion 3. The vibrator 4 is
The first electrode 5 which is provided on the other end side of the substrate portion 3 using a means such as vapor deposition or sputtering and which is formed in a substantially rectangular shape and has a lead portion 5A from a metal material such as aluminum, and the first electrode. 5, which is provided on the other end side of the piezoelectric element 5 by means such as a CVD method or a sputtering method, and is formed into a rectangular thin film from a piezoelectric material such as zinc oxide (ZnO); and the other end side of the piezoelectric element 6. And a second electrode 7 which is provided in the same manner as the first electrode using a means such as vapor deposition and is formed in a substantially rectangular shape having a lead portion 7A from a metal material such as aluminum. There is. Here, each of the electrodes 5 and 7 is formed to have a thickness dimension of, for example, about 0.3 to 0.5 μm and slightly smaller than that of the piezoelectric body 6, and the piezoelectric body 6 has a thickness of about 2 to 20 μm. Formed so as to have a sizing dimension.

【0014】そして、前記振動子4は、各電極5,7を
介して電圧信号が印加されると軸方向(図1中の上下方
向)に振動し、この電圧信号に応じた超音波を発生する
と共に、外部の物体で反射された反射波を受信すると軸
方向に振動し、この反射波に応じた電圧信号を出力する
ものである。
When a voltage signal is applied through the electrodes 5 and 7, the vibrator 4 vibrates in the axial direction (vertical direction in FIG. 1) and generates ultrasonic waves according to the voltage signal. In addition, when a reflected wave reflected by an external object is received, it vibrates in the axial direction and outputs a voltage signal corresponding to this reflected wave.

【0015】8は振動子4の他端側に位置して台座1の
他端面1B上に固着され、図3にも示す如くシリコン材
料から約300〜500μm程度の厚さ寸法h2 を有す
る略角筒状に形成されたホーンを示し、該ホーン8は、
図4に示す如く、その一端面8Aが台座1の他端面1B
に当接し、陽極接合技術等の手段を用いて該台座1上に
直接的に固着されている。また、該ホーン8には、台座
1の開口部2に対応してホーン8の中央部に位置し、一
端面8Aから他端面8Bに向けて順次拡径する開口部9
が形成され、該開口部9の一端9A側には外側に向けて
伸長する角形状の収容穴10が一体形成されている。そ
して、該収容穴10内には振動子4が収容され、これに
より該振動子4は、台座1とホーン8との間でその周辺
が挟持されている。
Numeral 8 is located on the other end side of the vibrator 4 and is fixed on the other end surface 1B of the pedestal 1, and as shown in FIG. A horn formed in a cylindrical shape is shown, and the horn 8 is
As shown in FIG. 4, the one end surface 8A is the other end surface 1B of the pedestal 1.
And is fixed directly to the pedestal 1 by means of anodic bonding technology or the like. The horn 8 has an opening 9 located at the center of the horn 8 corresponding to the opening 2 of the pedestal 1 and having a diameter gradually increasing from one end face 8A to the other end face 8B.
Is formed, and an angular accommodation hole 10 extending outward is integrally formed on one end 9A side of the opening 9. Then, the vibrator 4 is housed in the housing hole 10, so that the periphery of the vibrator 4 is sandwiched between the base 1 and the horn 8.

【0016】ここで、前記開口部9は、上述した台座1
の開口部2とほぼ同様に、シリコンの異方性エッチング
技術等の手段により、約55°の角度α2 をもって傾斜
するテーパ状に形成されている。そして、前記ホーン8
は、振動子4で生じた超音波を高い指向性をもって外部
に送り出すと共に、外部の物体で反射された反射波を集
音して振動子4に伝達するものである。
Here, the opening 9 is the pedestal 1 described above.
The opening 2 is formed in a taper shape inclined by an angle α 2 of about 55 ° by means of an anisotropic silicon etching technique or the like. And the horn 8
Is to send the ultrasonic waves generated by the oscillator 4 to the outside with high directivity, collect the reflected waves reflected by an external object, and transmit them to the oscillator 4.

【0017】本実施例による音波トランスデューサは上
述の如き構成を有するもので、次に、その製造方法につ
いて図5ないし図10を参照しつつ説明する。
The sound wave transducer according to this embodiment has the above-mentioned structure. Next, a method of manufacturing the sound wave transducer will be described with reference to FIGS.

【0018】まず、図5に示す基板部形成工程では、シ
リコン材料から厚さ寸法h1 を有する角柱状に形成され
た台座部材11の表面に、CVD法,熱酸化法等の手段
を用いて膜厚0.5〜1μmをもった方形な薄板状の基
板部3を一体形成した後、図2,図4に示す如く、各リ
ード部3Aを残すようにして外周側をエッチングにより
切除し、ホーン8と台座1とを接合する接合面を確保す
る。
First, in the substrate portion forming step shown in FIG. 5, a film is formed on the surface of the pedestal member 11 formed of a silicon material in a prismatic shape having a thickness dimension h1 by means of a CVD method, a thermal oxidation method or the like. After integrally forming a rectangular thin plate-like substrate portion 3 having a thickness of 0.5 to 1 μm, as shown in FIGS. 2 and 4, the outer peripheral side is cut off by etching so as to leave each lead portion 3A, and a horn is formed. A joint surface for joining 8 and the pedestal 1 is secured.

【0019】次に、図6に示す第1の電極形成工程で
は、前記基板部形成工程で形成された基板部3の表面
に、蒸着,スパッタ等の手段を用いて0.3〜0.5μ
m程度の厚さを有するアルミニウム製の第1の電極5を
形成する。
Next, in the first electrode forming step shown in FIG. 6, 0.3 to 0.5 μm is formed on the surface of the substrate portion 3 formed in the substrate portion forming step by means such as vapor deposition and sputtering.
The first electrode 5 made of aluminum and having a thickness of about m is formed.

【0020】そして、図7に示す圧電体形成工程では、
第1の電極5の表面に、CVD法あるいはスパッタ等の
手段を用いて約2〜20μm程度の厚さを有する酸化亜
鉛(ZnO)等の圧電材料からなる方形な薄膜状の圧電
体6を形成する。
Then, in the piezoelectric body forming step shown in FIG.
On the surface of the first electrode 5, a rectangular thin-film piezoelectric body 6 made of a piezoelectric material such as zinc oxide (ZnO) having a thickness of about 2 to 20 μm is formed on the surface of the first electrode 5 by means of CVD or sputtering. To do.

【0021】次に、図8に示す第2の電極形成工程で
は、圧電体6の表面に、前記第1の電極形成工程とほぼ
同様にして、蒸着,スパッタ等の手段を用いて0.3〜
0.5μm程度の厚さを有するアルミニウム製の第2の
電極7を形成する。これにより、圧電体6の両面に電極
5,7が形成され、振動子4が完成する。
Next, in the second electrode forming step shown in FIG. 8, a method such as vapor deposition or sputtering is used to form 0.3 on the surface of the piezoelectric body 6 in the same manner as in the first electrode forming step. ~
A second electrode 7 made of aluminum having a thickness of about 0.5 μm is formed. As a result, the electrodes 5 and 7 are formed on both surfaces of the piezoelectric body 6, and the vibrator 4 is completed.

【0022】そして、図9に示す台座形成工程では、シ
リコンの異方性エッチング技術を用いて、台座部材11
の中央部に基板部3に向けて順次縮径するテーパ状の開
口部2を形成し、これにより台座1を形成する。ここ
で、該開口部2が傾斜する角度α1 は、シリコンの物性
により定まる値で、約55°となる。
Then, in the pedestal forming step shown in FIG. 9, the pedestal member 11 is formed by using the anisotropic silicon etching technique.
A tapered opening 2 is formed in the central part of the taper 1 so that the diameter thereof is gradually reduced toward the substrate part 3, whereby the pedestal 1 is formed. Here, the angle α1 at which the opening 2 is inclined is a value determined by the physical properties of silicon and is about 55 °.

【0023】最後に、図10に示す接合工程では、シリ
コンの異方性エッチング技術により別工程で形成された
ホーン8と振動子4を設けた台座1とを、陽極接合技術
を用いて接合し、音波トランスデューサを完成させる。
Finally, in the joining step shown in FIG. 10, the horn 8 and the pedestal 1 provided with the vibrator 4 which are formed in another step by the silicon anisotropic etching technique are joined by the anodic joining technique. , Complete the sonic transducer.

【0024】本実施例による音波トランスデューサは、
このようにして製造されるもので、各電極5,7を介し
て振動子4に電圧信号を加えると、該振動子4は、各開
口部2,9内を基板部3と共に軸方向に微小振動し、こ
の電圧信号に応じた超音波を発生させる。そして、この
超音波は、ホーン8により指向性を高められつつ外部の
物体に向けて発射(送波)され、この物体にあたって反
射し、ホーン8により集音されて振動子4に伝達され
る。これにより、該振動子4は微小振動し、この反射波
に応じた電圧信号を各電極5,7を介して外部に出力す
る。
The acoustic wave transducer according to this embodiment is
It is manufactured in this way, and when a voltage signal is applied to the vibrator 4 via the electrodes 5 and 7, the vibrator 4 moves in the openings 2 and 9 together with the substrate 3 in the axial direction. It vibrates and generates ultrasonic waves according to this voltage signal. Then, the ultrasonic waves are emitted (transmitted) toward an external object while the directivity is enhanced by the horn 8, reflected by the object, collected by the horn 8 and transmitted to the vibrator 4. As a result, the vibrator 4 vibrates slightly and outputs a voltage signal corresponding to the reflected wave to the outside through the electrodes 5 and 7.

【0025】かくして、本実施例によれば、台座1とホ
ーン8とをシリコン材料からシリコンの異方性エッチン
グ技術を用いてそれぞれ形成し、両者を陽極接合等の接
合手段を用いて接合する構成としたから、音波トランス
デューサ全体を確実に小型化でき、精密な形状に形成す
ることができる。特に、シリコンの異方性エッチング技
術を用いて台座1およびホーン8を形成する構成とした
から、各開口部2,9の各角度α1 ,α2 をシリコンの
物性に基づいて一義的に定めることができ、該各開口部
2,9を精密に形成することができる。
Thus, according to this embodiment, the pedestal 1 and the horn 8 are respectively formed from a silicon material by using the anisotropic etching technique of silicon, and the two are bonded by using a bonding means such as anodic bonding. Therefore, the sound wave transducer as a whole can be surely downsized, and can be formed into a precise shape. In particular, since the pedestal 1 and the horn 8 are formed by using the anisotropic silicon etching technique, the angles α 1 and α 2 of the openings 2 and 9 can be uniquely determined based on the physical properties of silicon. Therefore, the openings 2 and 9 can be precisely formed.

【0026】この結果、シリコン製のホーン8により振
動子4からの超音波の指向性を効果的に高めて、検出感
度や性能等を大幅に向上することができ、取付けの自由
度や使い勝手を向上することができる。特に、1次元ア
レイ型,2次元アレイ型の音波トランスデューサを形成
する場合には、小さい面積中に多数の振動子を設けるこ
とができるから、物体表面の粗さや形状等の計測精度を
大幅に向上することができる。
As a result, the directivity of the ultrasonic wave from the vibrator 4 can be effectively enhanced by the silicon horn 8, and the detection sensitivity and performance can be greatly improved, and the flexibility of mounting and usability can be improved. Can be improved. In particular, when forming a one-dimensional array type or two-dimensional array type acoustic wave transducer, a large number of transducers can be provided in a small area, so the measurement accuracy of the surface roughness and shape of the object is greatly improved. can do.

【0027】また、台座1はシリコン材料から形成され
ているから、該台座1に発振回路,受信回路,温度補償
回路等の回路を容易にパターン形成することができ、回
路の集積化を図ることができる。さらに、シリコン材料
は微細加工が容易で量産性に優れているから、製造コス
トを大幅に低減することができる。
Further, since the pedestal 1 is made of a silicon material, circuits such as an oscillation circuit, a receiving circuit and a temperature compensating circuit can be easily formed on the pedestal 1 by patterning, so that the circuit can be integrated. You can Furthermore, since the silicon material is easily microfabricated and has excellent mass productivity, the manufacturing cost can be significantly reduced.

【0028】なお、前記実施例では、台座1に単一の振
動子4を設けた音波トランスデューサを例示したが、本
発明はこれに限らず、例えば図11に示す変形例の如
く、台座1上に複数の振動子4,4,…を直線状,平面
状に配設し、1次元アレイ型,2次元アレイ型の音波ト
ランスデューサとして構成してもよい。この場合には、
ホーン8,台座1に各振動子4に対応する開口部2,9
をそれぞれ形成すればよい。
In the above embodiment, the sound wave transducer in which the single vibrator 4 is provided on the pedestal 1 has been exemplified, but the present invention is not limited to this, and the pedestal 1 on the pedestal 1 is modified as shown in FIG. 11, for example. May be arranged in a linear shape or a plane shape to form a one-dimensional array type or two-dimensional array type acoustic wave transducer. In this case,
Openings 2 and 9 corresponding to each transducer 4 on the horn 8 and the pedestal 1
May be formed respectively.

【0029】また、前記実施例では、台座1,ホーン8
等を角筒状に形成するものとして述べたが、本発明はこ
れに限らず、例えばイオンビームエッチング技術等の手
段を用いて、円筒状等の他の形状に形成してもよい。
In the above embodiment, the base 1 and the horn 8 are
However, the present invention is not limited to this, and may be formed into another shape such as a cylindrical shape by using a means such as an ion beam etching technique.

【0030】さらに、前記実施例では、圧電体6は酸化
亜鉛等の圧電材料から形成するものとして述べたが、こ
れに限らず、例えばPZT、チタン酸鉛等の他の無機質
圧電材料の薄膜やセラミックバルクの薄片、ポリフッ化
ビニリデン(PVDF)等の有機質圧電材料を用いて形
成してもよい。また、第2の電極7の他面側に保護層を
設けてもよい。
Furthermore, in the above-mentioned embodiment, the piezoelectric body 6 is described as being formed of a piezoelectric material such as zinc oxide, but the present invention is not limited to this, and for example, a thin film of another inorganic piezoelectric material such as PZT or lead titanate, or the like. It may be formed using a thin piece of ceramic bulk or an organic piezoelectric material such as polyvinylidene fluoride (PVDF). Further, a protective layer may be provided on the other surface side of the second electrode 7.

【0031】さらにまた、前記実施例では、基板部3は
CVD法,熱酸化法等の手段により、シリコン製の台座
1の表面を一部酸化して、二酸化珪素の皮膜として形成
するものとして述べたが、これに替えて、例えばCVD
法により台座1に窒素を付加し、窒化物の膜として形成
してもよく、あるいは、この窒化物膜,二酸化珪素膜,
シリコン膜を任意の組合わせで積層化した多層膜として
形成してもよい。
Furthermore, in the above embodiment, the substrate portion 3 is formed as a silicon dioxide film by partially oxidizing the surface of the pedestal 1 made of silicon by means of a CVD method, a thermal oxidation method or the like. However, instead of this, for example, CVD
Nitrogen may be added to the pedestal 1 by the method to form a nitride film, or the nitride film, the silicon dioxide film,
You may form as a multilayer film which laminated | stacked the silicon film in arbitrary combinations.

【0032】[0032]

【発明の効果】以上詳述した通り、本発明によれば、一
端側から他端側に向けて順次縮径する開口部が設けられ
たシリコン製の台座と、前記開口部を施蓋するように該
台座の他端側に設けられた平板状の基板部と、該基板部
の他端側に設けられた第1の電極と、該第1の電極の他
端側に設けられた圧電体と、該圧電体の他端側に設けら
れた第2の電極と、該第2の電極の他端側に位置して前
記台座に設けられ、一端側から他端側に向けて順次拡径
する開口部が形成されたシリコン製のホーンとから構成
したから、半導体微細加工技術を用いて音波トランスデ
ューサ全体を確実に小型化することができる。この結
果、シリコン製のホーンによって圧電体で発生させた音
波の指向性を効果的に高めることができ、検出感度や性
能等を向上することができ、取付けの自由度や使い勝手
を高めることができる。
As described above in detail, according to the present invention, a silicon pedestal provided with an opening whose diameter is sequentially reduced from one end to the other end, and the opening is covered. A flat plate-shaped substrate portion provided on the other end side of the pedestal, a first electrode provided on the other end side of the substrate portion, and a piezoelectric body provided on the other end side of the first electrode A second electrode provided on the other end side of the piezoelectric body, a second electrode provided on the pedestal located on the other end side of the second electrode, and the diameter gradually increased from one end side to the other end side. Since it is composed of a silicon horn having an opening formed therein, it is possible to surely reduce the size of the entire acoustic wave transducer by using a semiconductor fine processing technique. As a result, the directivity of the sound wave generated by the piezoelectric body can be effectively increased by the silicon horn, the detection sensitivity and the performance can be improved, and the mounting flexibility and usability can be improved. ..

【0033】特に、複数の圧電体を配設した1次元アレ
イ型,2次元アレイ型の音波トランスデューサの場合に
は、物体表面の粗さや形状等の計測精度を向上すること
ができる。また、台座をシリコン材料から形成する構成
としたから、該台座に発振回路,受信回路,温度補償回
路等の回路を容易にパターン形成することができ、回路
の集積化を図ることができる。さらに、シリコン材料は
微細加工が容易で量産性に優れているから、製造コスト
を低減することができる。
In particular, in the case of a one-dimensional array type or two-dimensional array type acoustic wave transducer in which a plurality of piezoelectric bodies are arranged, it is possible to improve the measurement accuracy of the roughness or shape of the object surface. Further, since the pedestal is made of a silicon material, circuits such as an oscillation circuit, a receiving circuit, and a temperature compensation circuit can be easily patterned on the pedestal, and the circuit can be integrated. Further, since the silicon material is easily microfabricated and has excellent mass productivity, the manufacturing cost can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例による音波トランスデューサを
示す縦断面図である。
FIG. 1 is a vertical sectional view showing a sound wave transducer according to an embodiment of the present invention.

【図2】図1中の音波トランスデューサをホーンを除い
た状態で示す平面図である。
FIG. 2 is a plan view showing the sound wave transducer in FIG. 1 with a horn removed.

【図3】ホーンの平面図である。FIG. 3 is a plan view of a horn.

【図4】図1中の矢示IV−IV方向断面図である。FIG. 4 is a sectional view taken along line IV-IV in FIG.

【図5】基板部形成工程を示す縦断面図である。FIG. 5 is a vertical cross-sectional view showing a substrate portion forming step.

【図6】第1の電極形成工程を示す縦断面図である。FIG. 6 is a vertical sectional view showing a first electrode forming step.

【図7】圧電体形成工程を示す縦断面図である。FIG. 7 is a vertical sectional view showing a piezoelectric body forming step.

【図8】第2の電極形成工程を示す縦断面図である。FIG. 8 is a vertical sectional view showing a second electrode forming step.

【図9】台座形成工程を示す縦断面図である。FIG. 9 is a vertical sectional view showing a pedestal forming step.

【図10】台座とホーンとを接合する接合工程を示す縦
断面図である。
FIG. 10 is a vertical cross-sectional view showing a joining step of joining a pedestal and a horn.

【図11】本実施例の変形例を示す平面図である。FIG. 11 is a plan view showing a modified example of this embodiment.

【符号の説明】[Explanation of symbols]

1 台座 2 開口部 3 基板部 5 第1の電極 6 圧電体 7 第2の電極 8 ホーン 9 開口部 1 pedestal 2 opening part 3 substrate part 5 first electrode 6 piezoelectric body 7 second electrode 8 horn 9 opening part

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 一端側から他端側に向けて順次縮径する
開口部が設けられたシリコン製の台座と、前記開口部を
施蓋するように該台座の他端側に設けられた平板状の基
板部と、該基板部の他端側に設けられた第1の電極と、
該第1の電極の他端側に設けられた圧電体と、該圧電体
の他端側に設けられた第2の電極と、該第2の電極の他
端側に位置して前記台座に設けられ、一端側から他端側
に向けて順次拡径する開口部が形成されたシリコン製の
ホーンとから構成してなる音波トランスデューサ。
1. A pedestal made of silicon provided with an opening whose diameter is sequentially reduced from one end to the other end, and a flat plate provided on the other end of the pedestal so as to cover the opening. Shaped substrate portion, a first electrode provided on the other end side of the substrate portion,
A piezoelectric body provided on the other end side of the first electrode, a second electrode provided on the other end side of the piezoelectric body, and a pedestal located on the other end side of the second electrode. A sound wave transducer comprising: a silicon horn provided with an opening whose diameter gradually increases from one end side to the other end side.
JP11692592A 1992-04-09 1992-04-09 Sound wave transducer Expired - Lifetime JP3259322B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11692592A JP3259322B2 (en) 1992-04-09 1992-04-09 Sound wave transducer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11692592A JP3259322B2 (en) 1992-04-09 1992-04-09 Sound wave transducer

Publications (2)

Publication Number Publication Date
JPH05292598A true JPH05292598A (en) 1993-11-05
JP3259322B2 JP3259322B2 (en) 2002-02-25

Family

ID=14699080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11692592A Expired - Lifetime JP3259322B2 (en) 1992-04-09 1992-04-09 Sound wave transducer

Country Status (1)

Country Link
JP (1) JP3259322B2 (en)

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JP2007285960A (en) * 2006-04-19 2007-11-01 Denso Corp Vibration sensor and vibration detection method
WO2007132728A1 (en) * 2006-05-11 2007-11-22 Panasonic Corporation Ultrasonic receiver
JP6265578B1 (en) * 2016-09-07 2018-01-24 株式会社アルバック Device, device manufacturing method, and array-type ultrasonic probe manufacturing method
WO2018047585A1 (en) * 2016-09-07 2018-03-15 株式会社アルバック Device, method for manufacture of devce, and method for manufacture of array-type ultrasound probe

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005512478A (en) * 2001-12-19 2005-04-28 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Ultrasonic transducer for small machine and its assembly method
JP2006242650A (en) * 2005-03-01 2006-09-14 Denso Corp Ultrasonic sensor device
US7712368B2 (en) 2005-03-01 2010-05-11 Denso Corporation Ultrasonic sensor having transmission device and reception device of ultrasonic wave
JP4715236B2 (en) * 2005-03-01 2011-07-06 株式会社デンソー Ultrasonic sensor device
JP2007285960A (en) * 2006-04-19 2007-11-01 Denso Corp Vibration sensor and vibration detection method
JP4552883B2 (en) * 2006-04-19 2010-09-29 株式会社デンソー Vibration detection method
WO2007132728A1 (en) * 2006-05-11 2007-11-22 Panasonic Corporation Ultrasonic receiver
US7565842B2 (en) 2006-05-11 2009-07-28 Panasonic Corporation Ultrasonic receiver
JP6265578B1 (en) * 2016-09-07 2018-01-24 株式会社アルバック Device, device manufacturing method, and array-type ultrasonic probe manufacturing method
WO2018047585A1 (en) * 2016-09-07 2018-03-15 株式会社アルバック Device, method for manufacture of devce, and method for manufacture of array-type ultrasound probe
US10568607B2 (en) 2016-09-07 2020-02-25 Ulvac, Inc. Device, method of manufacturing the device, and method of manufacturing array type of ultrasound probe

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