JPH05275831A - Production of conductive pattern - Google Patents

Production of conductive pattern

Info

Publication number
JPH05275831A
JPH05275831A JP6615092A JP6615092A JPH05275831A JP H05275831 A JPH05275831 A JP H05275831A JP 6615092 A JP6615092 A JP 6615092A JP 6615092 A JP6615092 A JP 6615092A JP H05275831 A JPH05275831 A JP H05275831A
Authority
JP
Japan
Prior art keywords
film
fatty acid
organic fatty
precursor
conductive pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6615092A
Other languages
Japanese (ja)
Inventor
Yutaka Kato
裕 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP6615092A priority Critical patent/JPH05275831A/en
Publication of JPH05275831A publication Critical patent/JPH05275831A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Electric Cables (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To form a fine submicron conductive pattern not only on a flat plane but also on an edge, a side and a curved part without using a mask by patterning a base layer of organic fatty acid LB (Langmuir-Blodgett) film, laminating a conductive precursor and permitting topochemical polymerization. CONSTITUTION:An extremely thin film is manufactured by laminating monomolecular films layer by layer. After patterning an organic fatty acid film manufactured by LB method, a precursor that becomes conductive after polymerization is laminated on the organic fatty acid by LB method, the precursor part on the organic fatty acid is selectively polymerized by applying light so as to allow conductivity and a conductive pattern is manufactured. The inclination of the molecular chain of a reactive precursor molecular LB film 303 formed on the organic fatty acid LB film 302 formed on a board 301 and the inclination of the molecular chain of a non-reactive precursor molecular LB film 304 formed on a part whereupon the organic fatty acid LB film is not present are different and polymerization is allowed only for the inclination of the former.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はエレクトロニクス用部品
に用いる半導体集積回路やプリント回路基板の製造方法
に関わり、特に微細な導電性パターンの製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a semiconductor integrated circuit or a printed circuit board used for electronic parts, and more particularly to a method for manufacturing a fine conductive pattern.

【0002】[0002]

【従来の技術】エレクトロニクス用部品間の配線に使わ
れる導電性プリント回路基板は、素子密度の向上とあい
まって、近年ますます高密度化微細化が計られている。
プリント回路基板の従来の製造方法は、以下のようなも
のである。
2. Description of the Related Art In recent years, conductive printed circuit boards used for wiring between electronic parts have been increasingly densified and miniaturized in combination with the improvement of element density.
A conventional method for manufacturing a printed circuit board is as follows.

【0003】ポリイミド、ガラスエポキシ等の樹脂の上
に銅やアルミニウムの金属薄膜をメッキ、蒸着、スッパ
ター法で形成する。この場合に金属膜の厚みは概ね十数
μmである。この樹脂板の上に微細な導電性のパターン
を形成するためには、通常フォトエッチング法を用い
る。これは紫外線の照射により硬化(ネガ型)もしくは
分解する(ポジ型)いずれかのタイプのフォトレジスト
をスピンコート、デイッピングなどから選択した手段に
より金属膜上のコートする。
A metal thin film of copper or aluminum is formed on a resin such as polyimide or glass epoxy by plating, vapor deposition and spattering. In this case, the thickness of the metal film is about ten and several μm. In order to form a fine conductive pattern on this resin plate, a photo etching method is usually used. In this method, a photoresist that is either cured (negative type) or decomposed (positive type) by irradiation with ultraviolet rays is coated on the metal film by means selected from spin coating, dipping, and the like.

【0004】マスクに密着してもフォトレジストがつか
ない程度に乾燥させた後、遮光性パターンを有するマス
クを基板に密着させ紫外線を照射する。これを適当な溶
剤で溶解現像し、導電性パターン以外のレジスト部分を
洗い流す。このあと金属膜をエッチングして所望のパタ
ーン以外の部分を溶解させて取り除く。残存するレジス
トを剥離して導電性パターンを形成するものである。
After the photoresist is dried to such an extent that it does not come into contact with the mask even if it is in close contact with the mask, a mask having a light-shielding pattern is in close contact with the substrate and is irradiated with ultraviolet rays. This is dissolved and developed with an appropriate solvent to wash away the resist portion other than the conductive pattern. After that, the metal film is etched to dissolve and remove the portion other than the desired pattern. The remaining resist is peeled off to form a conductive pattern.

【0005】コート方法はスピンコート、デイッピン
グ、印刷法などから用途目的に応じて選ばれる。パタニ
ングするためには目的とする線幅以下の厚みのフォトレ
ジストを導電性金属膜の上に均一にコートする必要があ
る。線幅が微細になるとフォトレジストもそれに応じて
薄くする必要がある。
The coating method is selected from spin coating, dipping, printing, etc. according to the purpose of use. For patterning, it is necessary to uniformly coat the conductive metal film with a photoresist having a thickness equal to or smaller than the intended line width. As the line width becomes finer, the photoresist needs to be thinned accordingly.

【0006】したがって、こうした制限のもとでは基板
の側面や端面あるいは一定の曲率を有する湾曲部分等は
均一なコートが極めて困難である。したがって、一枚の
基板で側面を通して裏側に微細な配線するなどのことは
不可能であった。
Therefore, under such a limitation, it is extremely difficult to uniformly coat the side surface and the end surface of the substrate or the curved portion having a constant curvature. Therefore, it is impossible to make fine wiring on the back side through the side surface with one substrate.

【0007】スピンコート以外の印刷法などでは、均一
にサブミクロン以下の厚みでフォトレジストをコートし
て微細なパターンを得ることができないのは言うまでも
ない。それゆえサブミクロン程度の線幅の導電性模様の
パタニングが出来ないのが現状である。
Needless to say, it is not possible to obtain a fine pattern by uniformly coating a photoresist with a thickness of submicron or less by a printing method other than spin coating. Therefore, under the present circumstances, it is impossible to pattern a conductive pattern having a line width of about submicron.

【0008】[0008]

【発明が解決しようとする課題】本発明は、サブミクロ
ン程度の線幅の導電性模様のパタニングを可能とし、あ
わせて、基板の側面や端面あるいは一定の曲率を有する
湾曲部分に対しても、微細な配線を施すことを可能にす
る方法を提供することにある。
The present invention enables the patterning of a conductive pattern having a line width on the order of submicrons, and at the same time, even for a side surface or an end surface of a substrate or a curved portion having a constant curvature, It is to provide a method that enables fine wiring.

【0009】[0009]

【課題を解決するための手段】本発明は、こうした点を
解決するために、ラングミュアーブロッジェット法によ
り製膜した有機脂肪酸膜をパタニングした後、重合する
と導電性を示す前駆体を前記有機脂肪酸上にラングミュ
アーブロッジェット法により積層し、光照射により該有
機脂肪酸上の前駆体部分を選択的に重合させ導電性を付
与することにより導電性パターンを製造するものであ
る。
In order to solve the above problems, the present invention is directed to a method of patterning an organic fatty acid film formed by the Langmuir-Blodgett method, and then producing a precursor which exhibits conductivity when polymerized by the organic fatty acid. A conductive pattern is produced by laminating the precursors on the organic fatty acid by light irradiation and selectively polymerizing the precursor portion on the organic fatty acid to give conductivity.

【0010】ラングミュアーブロジェット法(以下単に
LB法という)は、単分子膜を一層ずつ積層する超薄膜
の製造方法である。これは両親媒性の有機物を水の比重
より軽く水に不溶な低沸点の溶媒に溶かした後、水面
(203)上に展開する。図2に示すように、こうする
と溶媒が速やかに蒸発し有機物の親水基(201)が下
側、疎水基(202)が上側(空気側)を向いて水面
(203)上に不規則に浮かぶ。これにバリヤー(20
4)を用いて、一定の圧力をかけて分子を凝集させる
と、両親媒性有機物の2次元の固体膜が形成できる(図
3参照)。
The Langmuir-Blodgett method (hereinafter simply referred to as the LB method) is a method for producing an ultrathin film in which monomolecular films are laminated one by one. This is because an amphipathic organic substance is dissolved in a solvent having a low boiling point, which is lighter than the specific gravity of water and insoluble in water, and then spreads on the water surface (203). As shown in FIG. 2, this causes the solvent to evaporate rapidly, and the hydrophilic group (201) of the organic substance floats on the water surface (203) with the hydrophilic group (201) facing downward and the hydrophobic group (202) facing upward (air side). .. Barrier (20
When 4) is used and a certain pressure is applied to agglomerate the molecules, a two-dimensional solid film of an amphipathic organic substance can be formed (see FIG. 3).

【0011】この状態を基板(205)に押し付けるよ
うに膜面に垂直に基板(205)を上下させる垂直侵漬
法により一層毎に写しとることで有機物の超薄膜を形成
できる(図4参照)。この他の積層法としては、水面に
展開した図3に示す状態で水面に基板を密着させて膜を
写しとる水平付着法も行なえる。
An ultrathin film of an organic material can be formed by copying this state layer by layer by the vertical dipping method in which the substrate (205) is vertically moved up and down so that it is pressed against the substrate (205) (see FIG. 4). .. As another lamination method, a horizontal attachment method in which a substrate is brought into close contact with the water surface and the film is copied in the state shown in FIG.

【0012】いずれかの手段または若干の修正で平面基
板のみならず、基板の側面などの幅の狭い部分、一定の
曲率を有する曲面にも有機物の超薄膜を形成することが
できるという利点がある。
There is an advantage that an ultrathin film of an organic substance can be formed not only on a flat substrate but also on a narrow portion such as a side surface of the substrate or a curved surface having a constant curvature by any means or by slight modification. ..

【0013】本発明は、種々の両親媒性有機物をLB法
により積層する過程で見い出された次の知見に基づいて
いる。それは疎水化処理を施した基板上に脂肪酸(CH
3(CH2) n C00H)の一種であるアラキジン酸(n=18)を1
〜2層累積した場合と、アラキジン酸を累積しない場合
のそれぞれに、重合すると導電性を有するポリジアセチ
レンの両親媒性前駆体(化1)を積層した。
In the present invention, various amphipathic organic substances are treated by the LB method.
Based on the following findings found in the process of stacking by
There is. It is a fatty acid (CH
3(CH2) nArachidic acid (n = 18), a type of C00H)
~ When two layers are accumulated and when arachidic acid is not accumulated
Polydiacetyl which has conductivity when polymerized
An amphipathic precursor of len (Chemical Formula 1) was laminated.

【0014】[0014]

【化1】 [Chemical 1]

【0015】これに紫外光の照射を行ない、前駆体が重
合するかどうかを調べた。そうしたところアラキジン酸
を積層した場合に限って前駆体の重合反応が進み結晶化
したポリジアセチレン膜が生成されることが判明した。
即ち重合反応が進むためには下地の有機脂肪酸膜が不可
欠であった。
This was irradiated with ultraviolet light to examine whether the precursor was polymerized. As a result, it was revealed that the polymerization reaction of the precursor proceeded only when the arachidic acid was laminated to produce a crystallized polydiacetylene film.
That is, the underlying organic fatty acid film was essential for the progress of the polymerization reaction.

【0016】この理由としては、前駆体の重合反応が進
行するには前駆体分子の反応性官能基が互いに接近する
ように一定の規則的配向をなしていることが必要である
ことを示している。この様子を図5に示すが、基板(3
01)の上に形成された有機脂肪酸のLB膜(302)
の上に形成される反応可能な前駆体分子LB膜(30
3)の分子鎖の傾きと、有機脂肪酸LB膜の存在しない
場所に形成される反応が不可能な前駆体分子LB膜(3
04)の分子鎖の傾きとが、異なっており、前者の傾き
の場合にのみ重合反応が進行するためと考えられる。
The reason for this is that in order for the polymerization reaction of the precursor to proceed, it is necessary for the reactive functional groups of the precursor molecule to have a certain regular orientation so as to approach each other. There is. This state is shown in FIG.
01) LB film of organic fatty acid formed on (302)
Reactive precursor molecule LB film (30
3) The inclination of the molecular chain and the precursor molecule LB film (3
It is considered that the inclination of the molecular chain of 04) is different, and the polymerization reaction proceeds only in the former inclination.

【0017】前駆体の重合は、いわゆるトポケミカル反
応(分子の立体的な配置によって起こったり起こらなか
ったりする化学反応)に属するものだからである。
This is because the polymerization of the precursor belongs to a so-called topochemical reaction (a chemical reaction that may or may not occur depending on the steric arrangement of molecules).

【0018】この発見は、下地の有機脂肪酸LB膜をパ
タニングした後、導電性前駆体を積層しトポケミカル重
合を起こせば下地のパターンに対応した部分だけが重合
することを示唆している。重合しない部分は適当な溶剤
で洗い流せるので基板上に導電性パターンが形成され
る。
This finding suggests that if the underlying organic fatty acid LB film is patterned and then a conductive precursor is laminated to cause topochemical polymerization, only the portion corresponding to the underlying pattern is polymerized. Since the non-polymerized portion can be washed away with a suitable solvent, a conductive pattern is formed on the substrate.

【0019】下地に脂肪酸のパターンを形成する手段と
しては真空下において不用な部分に電子線あるいは波長
の短いエキシマレーザー光を照射して飛ばすことが考え
られる。あるいはマスクをかけてプラズマ処理を行なっ
て不要な部分を除去することも可能である。但しこの方
法ではマスクの精度にパターンが制限されパターンの微
細化には限度がある。非常に微細なパターンを描くため
には前者のビームを使う方が好ましい。
As a means for forming a fatty acid pattern on the substrate, it is possible to irradiate an unnecessary portion with an electron beam or excimer laser light having a short wavelength in a vacuum to fly it. Alternatively, a mask may be applied and plasma treatment may be performed to remove unnecessary portions. However, with this method, the pattern is limited by the accuracy of the mask and there is a limit to the miniaturization of the pattern. It is preferable to use the former beam to draw a very fine pattern.

【0020】これらによればサブミクロンの線幅のライ
ンを描くことが可能である。またスピンコートの使えな
い様な端面などにもLB膜の積層は可能であり、ビーム
あるいは光照射によるパタニングもまた可能である。
According to these, it is possible to draw a line having a submicron line width. Further, the LB film can be laminated on the end surface where spin coating cannot be used, and patterning by beam or light irradiation is also possible.

【0021】こうして得られた基板(101)上の導電
性パターン(103)を図1に示すが、さらに表面を保
護するために絶縁性の有機物膜をLB法により製膜して
もよい。下地に使用可能な有機脂肪酸としては炭素数n
が17〜23の長鎖脂肪酸でも同様な結果が得られた。
The conductive pattern (103) on the substrate (101) thus obtained is shown in FIG. 1, but an insulating organic material film may be formed by the LB method to further protect the surface. The number of carbon atoms is n as an organic fatty acid that can be used as a base
Similar results were obtained with long-chain fatty acids of 17-23.

【0022】[0022]

【作用】本発明は、ラングミュアーブロッジェット法を
巧みに利用し、トポケミカル反応の性質を用いるので、
サブミクロン程度の極めて微細な導電性パターンをマス
クを用いずに平面上のみならず従来ではパターンの描け
なかった端面や側面あるいは湾曲部分にも形成すること
が可能である。
The present invention makes good use of the Langmuir-Blodgett method and utilizes the properties of the topochemical reaction.
It is possible to form an extremely fine conductive pattern of sub-micron level not only on a plane without using a mask but also on an end face, a side face, or a curved portion where a pattern cannot be conventionally drawn.

【0023】[0023]

【実施例】<実施例1>よく洗浄したガラス基板または
シリコンウェハーを(化2)のヘキサメチルジシラザン
飽和蒸気下に1昼夜曝し疎水化処理を施した。
Example 1 A well-cleaned glass substrate or silicon wafer was exposed to the hexamethyldisilazane saturated vapor of (Chemical Formula 2) for a whole day and night for hydrophobic treatment.

【0024】[0024]

【化2】〔(CH3)3 Si〕2 NHEmbedded image [(CH 3 ) 3 Si] 2 NH

【0025】この基板にLB膜製造装置(日本レーザー
電子(株):NLーLB301ーMWH)を用いて先ず
垂直侵漬法によりアラキジン酸を30ダインの一定膜圧
で一層写し取る。これをEB照射装置の下にセットし、
目的とする導電性パターンが描かれるように基板を移動
して不要な部分を除去した。ついで前記の(化1)で表
されるポリジアセチレンの前駆体を水平付着法により一
層積層した。
First, arachidic acid was further transferred onto this substrate by a vertical dipping method at a constant film pressure of 30 dynes using an LB film manufacturing apparatus (NL-LB301-MWH, manufactured by Nippon Laser Electronics Co., Ltd.). Set this under the EB irradiation device,
The substrate was moved so that a desired conductive pattern was drawn, and unnecessary portions were removed. Then, the polydiacetylene precursor represented by the above (formula 1) was further laminated by the horizontal deposition method.

【0026】この後、前駆体の感光波長を含む紫外線を
約30分間全面に照射した。偏光顕微鏡下で観察する
と、下地の脂肪酸が残っているパターンの部分だけが干
渉色が見え、それ以外は暗視野のままであり、干渉色の
見える部分だけで重合反応が進んだことを示していた。
この後プラズマアッシングにより洗浄すると、基板上に
はポリジアセチレンの導電性パターンが製造された。
After that, the entire surface was irradiated with ultraviolet rays containing the photosensitive wavelength of the precursor for about 30 minutes. When observed under a polarizing microscope, the interference color was visible only in the part of the pattern where the underlying fatty acid remained, and the rest was in the dark field, indicating that the polymerization reaction proceeded only in the part where the interference color was visible. It was
After that, the substrate was washed by plasma ashing to form a conductive pattern of polydiacetylene on the substrate.

【0027】さらに30ダインの膜圧に保った前駆体L
B膜に対して、基板を水中から引き上げることによりも
う一層前駆体膜を積層した。その後、紫外光照射と洗浄
を行ない導電性パターンを重ねて2層形成した。以上の
過程を5回繰り返すことにより10層の厚みのポリジア
セチレン導電性パターンを形成した。この方法で製造可
能なポリジアセチレンの線幅は0.4μmであった。導
電率は概ね0.05ジーメンスである。
Precursor L kept at a film pressure of 30 dynes
The precursor film was laminated on the B film by pulling up the substrate from water. After that, irradiation with ultraviolet light and washing were performed to overlap the conductive patterns to form two layers. By repeating the above process 5 times, a polydiacetylene conductive pattern having a thickness of 10 layers was formed. The line width of polydiacetylene that can be produced by this method was 0.4 μm. The conductivity is approximately 0.05 Siemens.

【0028】<実施例2>下地の脂肪酸LB膜として、
n=20のベヘン酸を用いた。実施例1と全く同様な手順
を繰り返すことによりポリジアセチレン導電性パターン
が得られた。
<Embodiment 2> As the underlying fatty acid LB film,
Behenic acid with n = 20 was used. By repeating the same procedure as in Example 1, a polydiacetylene conductive pattern was obtained.

【0029】[0029]

【発明の効果】本発明によれば、サブミクロン程度の極
めて微細な導電性パターンを、マスクを用いずに平面上
のみならず従来ではパターンの描けなかった端面や側面
あるいは湾曲部分にも形成することが可能である。
According to the present invention, an extremely fine conductive pattern of the order of submicron is formed not only on a plane without using a mask but also on an end face, a side face or a curved portion where a pattern cannot be drawn conventionally. It is possible.

【0030】[0030]

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による導電性パターンを模式的に示す説
明図である。
FIG. 1 is an explanatory view schematically showing a conductive pattern according to the present invention.

【図2】LB膜の製造方法を模式的に示す説明図であ
る。
FIG. 2 is an explanatory view schematically showing a method of manufacturing an LB film.

【図3】LB膜の製造方法を模式的に示す説明図であ
る。
FIG. 3 is an explanatory view schematically showing a method for manufacturing an LB film.

【図4】LB膜の製造方法を模式的に示す説明図であ
る。
FIG. 4 is an explanatory view schematically showing a method of manufacturing an LB film.

【図5】下地の有機脂肪酸膜が、重合性前駆体の配向状
態に影響を与えることを示す模式的に示す説明図であ
る。
FIG. 5 is an explanatory view schematically showing that the underlying organic fatty acid film affects the alignment state of the polymerizable precursor.

【符号の説明】[Explanation of symbols]

(101) 基板 (102) 有機脂肪酸LB膜 (102) ポリジアセチレンLB膜 (201) 親水性基 (202) 疎水性基 (203) 水面 (204) バリアー (205) 基板 (301) 基板 (302) ステアリン酸LB膜 (303) 反応可能な前駆体分子LB膜 (304) 反応が不可能な前駆体分子LB膜 (101) Substrate (102) Organic fatty acid LB film (102) Polydiacetylene LB film (201) Hydrophilic group (202) Hydrophobic group (203) Water surface (204) Barrier (205) Substrate (301) Substrate (302) Stearin Acid LB film (303) Reactive precursor molecule LB film (304) Unreactable precursor molecule LB film

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】ラングミュアーブロッジェット法により製
膜した有機脂肪酸膜をパタニングした後、重合すること
により導電性を示す反応性前駆体を前記有機脂肪酸上に
ラングミュアーブロッジェット法により積層し、光照射
により該有機脂肪酸上の前駆体部分を選択的に重合させ
導電性を付与することを特徴とする導電性パターンの製
造方法。
1. An organic fatty acid film formed by the Langmuir-Blodgett method is patterned, and then a reactive precursor exhibiting conductivity by polymerization is laminated on the organic fatty acid by the Langmuir-Blodgett method, A method for producing a conductive pattern, which comprises selectively polymerizing a precursor portion on the organic fatty acid by irradiation to impart conductivity.
JP6615092A 1992-03-24 1992-03-24 Production of conductive pattern Pending JPH05275831A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6615092A JPH05275831A (en) 1992-03-24 1992-03-24 Production of conductive pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6615092A JPH05275831A (en) 1992-03-24 1992-03-24 Production of conductive pattern

Publications (1)

Publication Number Publication Date
JPH05275831A true JPH05275831A (en) 1993-10-22

Family

ID=13307556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6615092A Pending JPH05275831A (en) 1992-03-24 1992-03-24 Production of conductive pattern

Country Status (1)

Country Link
JP (1) JPH05275831A (en)

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