JPH05273156A - X-ray analyzer - Google Patents

X-ray analyzer

Info

Publication number
JPH05273156A
JPH05273156A JP4071088A JP7108892A JPH05273156A JP H05273156 A JPH05273156 A JP H05273156A JP 4071088 A JP4071088 A JP 4071088A JP 7108892 A JP7108892 A JP 7108892A JP H05273156 A JPH05273156 A JP H05273156A
Authority
JP
Japan
Prior art keywords
sample
rays
detector
ray
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP4071088A
Other languages
Japanese (ja)
Inventor
Takao Kosuge
孝男 小菅
Akihiko Haraguchi
明彦 原口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON DENSHI TEKUNIKUSU KK
Jeol Ltd
Original Assignee
NIPPON DENSHI TEKUNIKUSU KK
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON DENSHI TEKUNIKUSU KK, Jeol Ltd filed Critical NIPPON DENSHI TEKUNIKUSU KK
Priority to JP4071088A priority Critical patent/JPH05273156A/en
Publication of JPH05273156A publication Critical patent/JPH05273156A/en
Withdrawn legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To perform an accurate element analysis on a sample via X-rays by providing the second detector detecting the signals other than X-rays, and selectively passing the detection signal of the first second detector. CONSTITUTION:When an electron beam is radiated to a sample 4, X-rays XR are emitted from the sample 4, and reflected electrons and secondary electrons are generated besides the X-rays XR. The X-rays XR from the sample 4 are detected by an X-ray detector 6, and the secondary electrons from the sample 4 are detected by a secondary electron detector 7. The secondary electron detection signal is fed to a switch circuit 9, and the circuit 9 passes the X-ray signal while the secondary electron detection signal is kept at a fixed level or above. The X-ray signal is fed to a signal processing circuit 11 only while the electron beam is radiated to the specific region of the sample 4. The element analysis of the specific region of the sample 4 can be accurately performed based on the X-ray signal.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、試料に電子ビームを照
射し、試料から発生するX線を検出して試料の分析を行
うようにしたX線分析装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray analyzer for irradiating a sample with an electron beam and detecting X-rays generated from the sample to analyze the sample.

【0002】[0002]

【従来の技術】電子ビームを試料に照射すると、試料を
構成する元素に応じた特性X線が発生する。このX線を
分析することにより、試料の定性,定量分析を行うこと
ができる。図1(a)は、試料Sの平面図であり、斜線
を施した領域(A)と、他の領域(B)とでは含有元素
の種類が異なっている。今、図中点線で示した分析線L
に沿って電子ビームと試料の相対的な走査を行うと、図
1(b)に示すような特性X線の検出信号が得られる。
2. Description of the Related Art When a sample is irradiated with an electron beam, characteristic X-rays corresponding to the elements composing the sample are generated. By analyzing this X-ray, qualitative and quantitative analysis of the sample can be performed. FIG. 1A is a plan view of the sample S, and the shaded region (A) and the other region (B) have different kinds of contained elements. Now, the analysis line L shown by the dotted line in the figure
When the relative scanning of the electron beam and the sample is performed along, the detection signal of the characteristic X-ray as shown in FIG. 1B is obtained.

【0003】[0003]

【発明が解決しようとする課題】ところで、電子ビーム
を試料に照射した場合、電子ビームは試料内部で散乱す
る。その結果、図1(a)のA領域とB領域との境界付
近のB領域に入射した電子ビームは、A領域に散乱によ
って侵入し、A領域の構成元素から特性X線を発生す
る。この結果、飼料の各領域の元素分析を正確に行うこ
とができなくなる。
By the way, when the sample is irradiated with the electron beam, the electron beam is scattered inside the sample. As a result, the electron beam incident on the B region near the boundary between the A region and the B region in FIG. 1A penetrates into the A region by scattering and generates characteristic X-rays from the constituent elements of the A region. As a result, the elemental analysis of each region of the feed cannot be performed accurately.

【0004】本発明は、このような点に鑑みてなされた
もので、その目的は、試料内での電子ビームの散乱によ
る不要X線の影響を除去し、試料のX線による元素分析
を正確に行うことができるX線分析装置を実現するにあ
る。
The present invention has been made in view of the above points, and an object thereof is to eliminate the influence of unnecessary X-rays due to the scattering of electron beams in a sample and to accurately perform elemental analysis of the sample by X-rays. It is to realize an X-ray analysis apparatus that can perform the above.

【0005】[0005]

【課題を解決するための手段】本発明に基づくX線分析
装置は、試料への電子ビームの照射によって試料から発
生したX線を検出する第1の検出器と、試料への電子ビ
ームの照射によって試料から得られたX線以外の信号を
検出する第2の検出器と、第2の検出器の信号の強度レ
ベルに応じて選択的に第1の検出器の検出信号を通過さ
せる手段とを備えたことを特徴としている。
An X-ray analyzer according to the present invention includes a first detector for detecting X-rays generated from a sample by irradiating the sample with an electron beam, and irradiation of the sample with the electron beam. A second detector for detecting signals other than X-rays obtained from the sample by means of means, and means for selectively passing the detection signal of the first detector according to the intensity level of the signal of the second detector. It is characterized by having.

【0006】[0006]

【作用】本発明に基づくX線分析装置は、2次電子や反
射電子の検出信号に基づいて電子ビームの照射位置(分
析位置)の判別を正確に行う。
The X-ray analyzer according to the present invention accurately determines the irradiation position (analysis position) of the electron beam based on the detection signals of secondary electrons and reflected electrons.

【0007】[0007]

【実施例】以下、図面を参照して本発明の実施例を詳細
に説明する。図2は、本発明の一実施例を示しており、
1は電子銃である。電子銃1から発生した電子ビーム
は、集束レンズ2,対物レンズ3によって集束され、試
料4上に照射される。試料4に照射される電子ビーム
は、偏向コイル5に供給される走査信号に応じて走査さ
れる。試料4への電子ビームの照射によって発生したX
線XRは、エネルギー分散形のX線検出器6によって検
出される。試料4への電子ビームの照射によって発生し
た2次電子SEは、2次電子検出器7によって検出され
る。X線検出器6の検出信号は増幅器8によって増幅さ
れた後、スイッチ回路9(ゲート回路でも良い)に供給
される。また、2次電子検出器7の検出信号は、増幅器
9によって増幅された後、スイッチ回路9に供給され
る。スイッチ回路9を通過したX線検出信号は、波高分
析器などを含む信号処理回路11に供給される。信号処
理された結果は、メモリ12に記憶されたり、また、陰
極線管13に供給される。このような構成の動作を次に
説明する。
Embodiments of the present invention will now be described in detail with reference to the drawings. FIG. 2 shows an embodiment of the present invention,
1 is an electron gun. The electron beam generated from the electron gun 1 is focused by the focusing lens 2 and the objective lens 3 and is irradiated onto the sample 4. The electron beam with which the sample 4 is irradiated is scanned according to the scanning signal supplied to the deflection coil 5. X generated by irradiating the sample 4 with the electron beam
The ray XR is detected by the energy dispersive X-ray detector 6. Secondary electrons SE generated by the irradiation of the sample 4 with the electron beam are detected by the secondary electron detector 7. The detection signal of the X-ray detector 6 is amplified by the amplifier 8 and then supplied to the switch circuit 9 (may be a gate circuit). The detection signal of the secondary electron detector 7 is amplified by the amplifier 9 and then supplied to the switch circuit 9. The X-ray detection signal that has passed through the switch circuit 9 is supplied to a signal processing circuit 11 including a wave height analyzer and the like. The result of signal processing is stored in the memory 12 or supplied to the cathode ray tube 13. The operation of such a configuration will be described below.

【0008】試料4への電子ビームの照射により、試料
4からX線が発生するが、それ以外に反射電子,2次電
子なども発生する。試料4からのX線XRは、X線検出
器6によって検出され、試料4からの2次電子SEは2
次電子検出器7によって検出される。ここで、図1
(a)の分析線Lに沿って電子ビームを走査すると、X
線信号は、図1(b)に示すように変化し、また、2次
電子信号は、図1(c)に示すように変化する。この場
合、試料4から発生する2次電子は、試料4内の電子ビ
ームの散乱による影響がX線に比べて少なく、検出され
る2次電子は、ほぼ試料の電子ビームが照射された表面
部分から発生したと見なすことができる。従って、図1
(c)に示す信号により、電子ビームの照射領域の正確
な判別を行うことが可能となる。この図1(c)の2次
電子検出信号は、スイッチ回路9に供給されるが、スイ
ッチ回路9は、2次電子検出信号が一定レベル以上とな
っている期間、X線信号を通過させる。その結果、電子
ビームが試料のA領域に照射されている期間のみ、X線
信号が信号処理回路11に供給されることから、このX
線信号に基づき、A領域の元素分析を正確に行うことが
できる。
By irradiating the sample 4 with the electron beam, X-rays are generated from the sample 4, but other than that, reflected electrons, secondary electrons, etc. are also generated. The X-ray XR from the sample 4 is detected by the X-ray detector 6, and the secondary electron SE from the sample 4 is 2
It is detected by the secondary electron detector 7. Here, FIG.
When the electron beam is scanned along the analysis line L in (a), X
The line signal changes as shown in FIG. 1 (b), and the secondary electron signal changes as shown in FIG. 1 (c). In this case, the secondary electrons generated from the sample 4 are less affected by the scattering of the electron beam in the sample 4 than the X-rays, and the detected secondary electrons are almost the surface portion of the sample irradiated with the electron beam. Can be considered to have originated from. Therefore, FIG.
The signal shown in (c) makes it possible to accurately determine the irradiation area of the electron beam. The secondary electron detection signal of FIG. 1C is supplied to the switch circuit 9, but the switch circuit 9 allows the X-ray signal to pass while the secondary electron detection signal is at a certain level or higher. As a result, the X-ray signal is supplied to the signal processing circuit 11 only during the period when the electron beam is irradiated to the area A of the sample, and therefore, the X
Based on the line signal, it is possible to accurately perform elemental analysis of the area A.

【0009】以上本発明の一実施例を詳述したが、本発
明はこの実施例に限定されない。例えば、2次電子を利
用して電子ビームの照射領域の判別を行うようにした
が、反射電子などの試料から得られる他の情報を用いて
も良い。また、電子ビームを偏向して分析位置を移動さ
せるようにしたが、試料を移動させても良い。
Although one embodiment of the present invention has been described in detail above, the present invention is not limited to this embodiment. For example, the irradiation area of the electron beam is discriminated using the secondary electrons, but other information obtained from the sample such as reflected electrons may be used. Although the electron beam is deflected to move the analysis position, the sample may be moved.

【0010】[0010]

【発明の効果】以上説明したように、本発明に基づくX
線分析装置は、2次電子や反射電子の検出信号に基づい
て電子ビームの照射位置(分析位置)の判別を正確に行
うようにしたので、試料内での電子ビームの散乱による
不要X線の影響を除去し、試料のX線による元素分析を
正確に行うことができる。
As described above, X based on the present invention
Since the line analyzer accurately determines the irradiation position (analysis position) of the electron beam based on the detection signals of secondary electrons and reflected electrons, unnecessary X-rays due to scattering of the electron beam in the sample are generated. The influence can be removed, and the elemental analysis of the sample by X-ray can be performed accurately.

【図面の簡単な説明】[Brief description of drawings]

【図1】試料の平面図と、分析線に沿った特性X線と2
次電子の検出信号波形を示す図である。
FIG. 1 is a plan view of a sample and a characteristic X-ray along an analysis line and 2
It is a figure which shows the detection signal waveform of a secondary electron.

【図2】本発明に基づくX線分析装置の一実施例を示す
図である。
FIG. 2 is a diagram showing an example of an X-ray analysis apparatus according to the present invention.

【符号の説明】[Explanation of symbols]

1 電子銃 2 集束レンズ 3 対物レンズ 4 試料 5 偏向コイル 6 X線検出器 7 2次電子検出器 8,10 増幅器 9 スイッチ回路 11 信号処理回路 12 陰極線管 DESCRIPTION OF SYMBOLS 1 Electron gun 2 Focusing lens 3 Objective lens 4 Sample 5 Deflection coil 6 X-ray detector 7 Secondary electron detector 8, 10 Amplifier 9 Switch circuit 11 Signal processing circuit 12 Cathode ray tube

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 試料への電子ビームの照射によって試料
から発生したX線を検出する第1の検出器と、試料への
電子ビームの照射によって試料から得られたX線以外の
信号を検出する第2の検出器と、第2の検出器の信号の
強度レベルに応じて選択的に第1の検出器の検出信号を
通過させる手段とを備えたX線分析装置。
1. A first detector for detecting X-rays generated from a sample by irradiating the sample with an electron beam, and a signal other than X-rays obtained from the sample by irradiating the sample with an electron beam. An X-ray analysis apparatus comprising a second detector and means for selectively passing the detection signal of the first detector according to the intensity level of the signal of the second detector.
JP4071088A 1992-03-27 1992-03-27 X-ray analyzer Withdrawn JPH05273156A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4071088A JPH05273156A (en) 1992-03-27 1992-03-27 X-ray analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4071088A JPH05273156A (en) 1992-03-27 1992-03-27 X-ray analyzer

Publications (1)

Publication Number Publication Date
JPH05273156A true JPH05273156A (en) 1993-10-22

Family

ID=13450431

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4071088A Withdrawn JPH05273156A (en) 1992-03-27 1992-03-27 X-ray analyzer

Country Status (1)

Country Link
JP (1) JPH05273156A (en)

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Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 19990608