JPH05269450A - Injection type ultrasonic cleaning apparatus - Google Patents

Injection type ultrasonic cleaning apparatus

Info

Publication number
JPH05269450A
JPH05269450A JP9855092A JP9855092A JPH05269450A JP H05269450 A JPH05269450 A JP H05269450A JP 9855092 A JP9855092 A JP 9855092A JP 9855092 A JP9855092 A JP 9855092A JP H05269450 A JPH05269450 A JP H05269450A
Authority
JP
Japan
Prior art keywords
ultrasonic
cleaning
storage tank
cleaning liquid
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9855092A
Other languages
Japanese (ja)
Other versions
JPH0673657B2 (en
Inventor
Sadao Kanai
貞夫 金井
Masaki Kusuhara
昌樹 楠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Watanabe Shoko KK
Kokusai Electric Corp
Original Assignee
Watanabe Shoko KK
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Watanabe Shoko KK, Kokusai Electric Corp filed Critical Watanabe Shoko KK
Priority to JP9855092A priority Critical patent/JPH0673657B2/en
Publication of JPH05269450A publication Critical patent/JPH05269450A/en
Publication of JPH0673657B2 publication Critical patent/JPH0673657B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Special Spraying Apparatus (AREA)

Abstract

PURPOSE:To improve cleaning efficiency by converging an ultrasonic vibrational energy to a cleaning liq. ejected from an ejecting hole of an ejecting type ultrasonic cleaning apparatus. CONSTITUTION:An acoustic lens barrier 12 separating a cooling water on an oscillator 2 side and a cleaning water on an ejecting hole 10 side is provided in a liq. storing tank 1 made of quartz glass. An ultrasonic wave face-radiated from an oscillator part 2 is converged by means of this acoustic lens barrier 12 so as to make an ejecting hole 10 to be a focus.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は超音波洗浄装置に関し、
特に、超音波振動を加えた洗浄液を被洗浄物に噴射させ
て洗浄を行う噴射形超音波洗浄装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrasonic cleaning device,
In particular, the present invention relates to a jet type ultrasonic cleaning device that performs cleaning by spraying a cleaning liquid to which ultrasonic vibration has been applied onto an object to be cleaned.

【0002】[0002]

【従来の技術】半導体関連のシリコンウエーハ,化合物
半導体ウエーハ,ガラスマスク,液晶用のガラス基板等
の精密洗浄用として1MHz程度の高周波の超音波洗浄
装置が用いられている。洗浄を行う際の除去せねばなら
ない粒子の大きさは0.1μmオーダであり、洗浄液中
には金属イオンの溶出があってはならない。ガラス基板
のサイズが300×400mm、または半導体ウエーハ
のサイズが8インチ等、表面処理や加工する工程での寸
法を大型にして生産効率を上げることが現今のエレクト
ロニクス産業のすう勢であるが、この程度の大きさにな
ると1つのキャリアに例えば25枚ずつウエーハを入れ
て同時に各工程の処理を行うことは難しく、1枚ずつの
処理(これを枚葉処理という)で行っている。この枚葉
処理は通常コンベアでワーク(処理物)を移送し、この
過程で種々の必要な処理が行われている。この処理の形
態としては、真空も含めた空中で行われるものと、溶液
中で行われるものとがある。
2. Description of the Related Art Ultrasonic cleaning equipment of high frequency of about 1 MHz is used for precision cleaning of semiconductor-related silicon wafers, compound semiconductor wafers, glass masks, glass substrates for liquid crystals and the like. The size of the particles that must be removed during cleaning is on the order of 0.1 μm, and there should be no elution of metal ions in the cleaning liquid. It is the current trend of the electronics industry to increase the production efficiency by increasing the size of the surface treatment and processing steps such as the size of glass substrate is 300 x 400 mm or the size of semiconductor wafer is 8 inches. In such a case, it is difficult to put, for example, 25 wafers each in one carrier and to perform the processing in each step at the same time, the processing is performed one by one (this is called a single-wafer processing). In this single-wafer processing, a work (processing object) is usually transferred by a conveyor, and various necessary processing is performed in this process. As the form of this processing, there are a method performed in air including a vacuum and a method performed in a solution.

【0003】図9は上述の超音波洗浄工程の説明図であ
り、(A)は洗浄槽を備えた超音波洗浄装置51を用い
た場合の側面図を示し、(B)は洗浄液54を吹き付け
る噴射形超音波洗浄装置53を用いた場合の側面図を示
している。(A)の場合、コンベア52を部分的に洗浄
槽内に沈める必要があり、コンベアの動きに上下方向の
落差を設けるために構造が複雑になり、さらに、被洗浄
物に付着していた汚れが洗浄槽中に蓄積してまうという
問題がある。(B)はこのような問題点を排除した方法
であり、常に洗浄液を新しく汚れのないものにするため
にコンベア55の進行方向に対して水平状態のまま被洗
浄物を移送し、噴射形洗浄装置53によって洗浄を行う
方法である。
FIG. 9 is an explanatory view of the above-mentioned ultrasonic cleaning step, (A) shows a side view when an ultrasonic cleaning device 51 having a cleaning tank is used, and (B) sprays a cleaning liquid 54. The side view when the jet type ultrasonic cleaning device 53 is used is shown. In the case of (A), it is necessary to partially immerse the conveyor 52 in the cleaning tank, and since the movement of the conveyor has a vertical drop, the structure becomes complicated, and further, the dirt attached to the object to be cleaned. However, there is a problem that is accumulated in the cleaning tank. (B) is a method that eliminates such problems, and in order to constantly make the cleaning liquid new and free of contamination, the object to be cleaned is transferred in a horizontal state with respect to the traveling direction of the conveyor 55, and jet cleaning is performed. This is a method of cleaning with the device 53.

【0004】図8は従来の噴射形超音波洗浄装置の構造
を示す斜視図(A)と原理を説明する断面図(B)であ
る。図8において、41は洗浄液を充満させる金属製の
貯液槽であり、洗浄液供給口42から所定の圧力がかけ
られた洗浄液が供給される。44は洗浄液の噴射口であ
り、下方の被洗浄物6に対して洗浄液を噴射して吹き付
ける。被洗浄物6は矢印方向に水平移動する。2は振動
子部であり貯液槽41の上部にパッキン4を介して固定
されている。3は超音波発振器(図示は省略した)から
のコードである。43はオーバフロー口であり、ここか
ら流出する液の量を加減することにより貯液槽41内に
充満した洗浄液の圧力を調節して噴射口44からの噴出
速度を制御する。このようにして振動子部2からの超音
波振動が噴射洗浄液に伝えられる。5は貯液槽41の支
持具である。このような従来の噴射形超音波洗浄装置で
は、洗浄液が接する超音波振動子部の振動板や貯液槽の
材質として、ステンレス等の金属が用いられている。こ
れは超音波振動子の振動効率を高め、振動板による損失
や減衰を少なくし、またその損失や減衰によって生ずる
熱量を洗浄液で冷却して温度上昇を抑え、樹脂を用いた
場合に発生する軟化や破損を防ぐためである。
FIG. 8 is a perspective view (A) showing a structure of a conventional jet type ultrasonic cleaning apparatus and a sectional view (B) for explaining the principle. In FIG. 8, reference numeral 41 is a metal storage tank filled with the cleaning liquid, and the cleaning liquid supplied with a predetermined pressure is supplied from the cleaning liquid supply port 42. Reference numeral 44 denotes an injection port for the cleaning liquid, which injects and sprays the cleaning liquid onto the article 6 to be cleaned below. The object to be cleaned 6 horizontally moves in the direction of the arrow. Reference numeral 2 denotes a vibrator portion, which is fixed to the upper part of the liquid storage tank 41 via a packing 4. Reference numeral 3 is a code from an ultrasonic oscillator (not shown). An overflow port 43 controls the ejection speed from the ejection port 44 by adjusting the pressure of the cleaning liquid filled in the liquid storage tank 41 by adjusting the amount of the liquid flowing out from this overflow port. In this way, the ultrasonic vibration from the vibrator part 2 is transmitted to the jet cleaning liquid. Reference numeral 5 is a support for the liquid storage tank 41. In such a conventional jet type ultrasonic cleaning device, a metal such as stainless steel is used as a material for the diaphragm of the ultrasonic transducer portion and the liquid storage tank which are in contact with the cleaning liquid. This enhances the vibration efficiency of the ultrasonic vibrator, reduces the loss and attenuation due to the diaphragm, and cools the heat generated by the loss and attenuation with a cleaning liquid to suppress the temperature rise and softening that occurs when resin is used. This is to prevent damage.

【0005】しかしながら、洗浄の対象となる素子の記
憶容量が16メガビット,64メガビット用の集積回路
の場合、配線導体のパターン幅は0.2μm以下であ
り、付着している微粒子の大きさは0.05μm以上は
許されず、洗浄時に金属イオンの溶出があってはならな
い。そこで本発明者は、振動板や貯液槽からの金属イン
オンの溶出をなくすために、貯液槽の材質を石英ガラス
とし、かつ、その内部に振動板側と噴射口側を隔離する
隔壁を設けて振動板側には振動子による発熱を抑えるた
めの冷却水を充満流通させ、噴射口側には超純水の洗浄
液を充満噴射させる構造の噴射形超音波洗浄装置を先に
提案した(特願平4−40720号参照)。
However, in the case of an integrated circuit for which the memory capacity of the element to be cleaned is 16 megabits or 64 megabits, the pattern width of the wiring conductor is 0.2 μm or less and the size of the adhered fine particles is 0. No more than 0.05 μm is allowed and no metal ions should be eluted during washing. Therefore, in order to prevent elution of metal inons from the diaphragm and the liquid storage tank, the present inventor uses quartz glass as the material of the liquid storage tank, and has a partition wall separating the diaphragm side and the injection port side therein. First, we proposed an injection type ultrasonic cleaning device with a structure in which cooling water for suppressing heat generation by the vibrator is filled and circulated on the diaphragm side, and the cleaning liquid of ultrapure water is filled and sprayed on the injection port side ( See Japanese Patent Application No. 4-40720).

【0006】図4は先の提案の構造を示す斜視図(A)
と原理を説明する断面図(B)である。図において、1
は例えば石英ガラス製の貯液槽であり、不純物の溶出が
少ない材質であれば石英ガラス以外のものでもよい。1
1は隔壁であり、液の中を進行する超音波が反射されず
に透過するように超音波伝搬方向に直角の面に対して所
定の角度を有するように斜めに設けられている。振動子
部2の冷却水は、冷却水供給口7から供給され振動子部
2と隔壁11の間に充満し冷却水流出口8から流出す
る。超純水の洗浄液は、洗浄液供給口9から供給され隔
壁11と噴射口10の間に充満し噴射口10から被洗浄
物6に噴射される。図4では噴射口10が細長いスリッ
ト状であり、噴射される洗浄液は線状噴射となる。例え
ば、400×300mmのガラス基板を洗浄する場合
は、噴射口10のスリットの長さは400mm、幅は2
mm程度に設定され、洗浄液に加える圧力は洗浄液が連
続した水流となって超音波振動が被洗浄物に伝達される
ように設定される。図5は先の提案の第2の実施例の斜
視図であり、噴射口10は小円孔状であり、噴射される
洗浄液は点状噴射となる。図4の4及び図5の40は貯
液槽1に振動子部2を取付けるときのパッキンである。
FIG. 4 is a perspective view showing the structure of the above proposal (A).
FIG. 3B is a sectional view (B) illustrating the principle. In the figure, 1
Is a liquid storage tank made of, for example, quartz glass, and any material other than quartz glass may be used as long as it is a material that hardly elutes impurities. 1
Reference numeral 1 is a partition wall, which is obliquely provided so as to have a predetermined angle with respect to a plane perpendicular to the ultrasonic wave propagation direction so that the ultrasonic wave traveling in the liquid is transmitted without being reflected. The cooling water of the vibrator part 2 is supplied from the cooling water supply port 7, fills the space between the vibrator part 2 and the partition wall 11, and flows out from the cooling water outlet port 8. The cleaning liquid of ultrapure water is supplied from the cleaning liquid supply port 9, fills the space between the partition wall 11 and the spray port 10, and is sprayed from the spray port 10 to the object 6 to be cleaned. In FIG. 4, the ejection port 10 has an elongated slit shape, and the cleaning liquid to be ejected is a linear ejection. For example, when cleaning a glass substrate of 400 × 300 mm, the slit of the injection port 10 has a length of 400 mm and a width of 2
The pressure applied to the cleaning liquid is set to about mm so that the cleaning liquid forms a continuous water flow and ultrasonic vibrations are transmitted to the object to be cleaned. FIG. 5 is a perspective view of the previously proposed second embodiment, in which the injection port 10 is in the shape of a small circular hole, and the cleaning liquid to be injected is a dot injection. 4 and 40 in FIG. 5 are packings for mounting the vibrator portion 2 on the liquid storage tank 1.

【0007】[0007]

【発明が解決しようとする課題】上述の先の提案による
貯液槽1の構造は、振動子部2の振動板から法線方向に
放射される超音波振動の一部が噴射口10から噴射する
洗浄液に伝えられる構造であり、超音波振動エネルギー
の噴射液への伝達効率が低いという問題点がある。例え
ば、図4の線状噴射形洗浄装置では、噴射口10のスリ
ット幅が2mmの場合、振動子部2の振動面の幅は40
mmとなっているので伝達効率は単純計算で2/40=
1/20である。また、通常の単位面積当りの超音波振
動の強度は4W/cm2 程度である。また、隔壁11から
噴射口10にかけて貯液槽1の内壁がホーン状に狭くな
っており、超音波エネルギーが集束されるように考えら
れるが、超音波周波数が10kHz〜30kHzの場合
はホーンの長さ方向の寸法を半波長の50〜100mm
程度とすれば集束効果が得られるが、1MHz付近の高
周波では半波長が2〜3mmとなり実用上ホーンによる
集束効果を利用することはできない。本発明の目的は、
上述の問題点を解決し振動子部から面放射される超音波
エネルギーを効率よく噴射口に集束させるようにした噴
射形超音波洗浄装置を提供することにある。
In the structure of the liquid storage tank 1 proposed above, a part of the ultrasonic vibration radiated in the normal direction from the vibration plate of the vibrator portion 2 is injected from the injection port 10. The structure is transmitted to the cleaning liquid, and there is a problem that the transmission efficiency of ultrasonic vibration energy to the spray liquid is low. For example, in the linear jet cleaning apparatus of FIG. 4, when the slit width of the jet port 10 is 2 mm, the width of the vibrating surface of the vibrator unit 2 is 40 mm.
Since it is mm, the transmission efficiency is 2/40 =
It is 1/20. In addition, the strength of normal ultrasonic vibration per unit area is about 4 W / cm 2 . Further, it is considered that the inner wall of the liquid storage tank 1 is narrowed like a horn from the partition wall 11 to the injection port 10 and the ultrasonic energy is focused. However, when the ultrasonic frequency is 10 kHz to 30 kHz, the length of the horn is long. Half-wavelength 50-100 mm
The focusing effect can be obtained with a certain degree, but at a high frequency near 1 MHz, the half wavelength is 2 to 3 mm, and the focusing effect by the horn cannot be practically used. The purpose of the present invention is to
An object of the present invention is to provide an injection type ultrasonic cleaning device that solves the above-mentioned problems and efficiently focuses the ultrasonic energy surface-emitted from the vibrator portion on the injection port.

【0008】[0008]

【課題を解決するための手段】本発明の噴射形超音波洗
浄装置は、超音波振動子が取付けられた振動板から面放
射される超音波エネルギーを音響レンズによって噴射口
付近に集束させ、強力で無駄のない超音波洗浄を行わし
めるようにしたものであり、その構成は、石英ガラス製
の貯液槽の内部を上下に分割し所定の傾斜角を有する隔
壁が設けられ、上の空間に該貯液槽の上部に設けられた
超音波振動子の発熱を抑えるための冷却水を充満供給
し、下の空間に該貯液槽の下端部に設けられた噴射口か
ら洗浄液を噴射させるための洗浄液を充満供給し、前記
超音波振動子からの超音波振動エネルギーを前記噴射口
から噴射する洗浄液に加えて被洗浄物に吹きつけるよう
に構成された噴射形超音波洗浄装置において、前記隔壁
は、前記超音波振動子から放射される平面波が集束され
て前記噴射口部分に焦点を結ぶような音響レンズ隔壁で
あることを特徴とするものである。
The jet type ultrasonic cleaning apparatus of the present invention is capable of concentrating ultrasonic energy surface-emitted from a vibration plate to which an ultrasonic vibrator is attached near an injection port by an acoustic lens, and strongly It is designed to perform ultrasonic cleaning without waste.The structure is such that the inside of a quartz glass storage tank is divided into upper and lower parts and a partition wall with a predetermined inclination angle is provided, and the upper space is To supply the cooling water for suppressing heat generation of the ultrasonic transducer provided in the upper part of the liquid storage tank and to inject the cleaning liquid into the lower space from the injection port provided in the lower end of the liquid storage tank In the injection type ultrasonic cleaning device, which is configured so as to be fully supplied with the cleaning liquid, and to apply ultrasonic vibration energy from the ultrasonic vibrator to the cleaning liquid ejected from the ejection port and to spray the cleaning target on the cleaning target. Is the ultrasonic vibration It is characterized in that a plane wave radiated is acoustic lens barrier ribs such as to focus on the ejection port portion is focused from.

【0009】また、石英ガラス製の貯液槽の内部を上下
に分割し所定の傾斜角を有する隔壁が設けられ、上の空
間に該貯液槽の上部に設けられた超音波振動子の発熱を
抑えるための冷却水を充満供給し、下の空間に該貯液槽
の下端部に設けられた噴射口から洗浄液を噴射させるた
めの洗浄液を充満供給し、前記超音波振動子からの超音
波振動エネルギーを前記噴射口から噴射する洗浄液に加
えて被洗浄物に吹きつけるように構成された噴射形超音
波洗浄装置において、前記隔壁にほぼ並行するように固
定され、前記超音波振動子から放射される平面波が集束
されて前記噴射口部分に焦点を結ぶ石英ガラス製の音響
レンズを備えたことを特徴とするものである。
Further, a partition wall having a predetermined inclination angle is provided by vertically dividing the inside of the liquid storage tank made of quartz glass, and the heat generated by the ultrasonic transducer provided above the liquid storage tank is provided in the upper space. Is supplied with cooling water to suppress the above, and a lower space is filled with a cleaning liquid for injecting the cleaning liquid from the injection port provided at the lower end of the liquid storage tank, and ultrasonic waves from the ultrasonic transducer are supplied. In an injection type ultrasonic cleaning device configured to spray vibration energy to a cleaning liquid in addition to the cleaning liquid ejected from the injection port, the vibration is fixed substantially parallel to the partition wall and radiated from the ultrasonic vibrator. It is characterized in that it is provided with an acoustic lens made of quartz glass which focuses the plane wave to be focused and focuses on the injection port portion.

【0010】さらに、石英ガラス製の貯液槽の内部を上
下に分割し所定の傾斜角を有する隔壁が設けられ、上の
空間に該貯液槽の上部に設けられた超音波振動子の発熱
を抑えるための冷却水を充満供給し、下の空間に該貯液
槽の下端部に設けられた噴射口から洗浄液を噴射させる
ための洗浄液を充満供給し、前記超音波振動子からの超
音波振動エネルギーを前記噴射口から噴射する洗浄液に
加えて被洗浄物に吹きつけるように構成された噴射形超
音波洗浄装置において、前記超音波振動子が取付けられ
前記貯液槽の内部に面する振動板の材質を石英ガラスと
し、前記隔壁の代わりに、前記超音波振動子から放射さ
れる平面波が集束されて前記噴射口部分に焦点を結ぶ石
英ガラス製の音響レンズを備えたことを特徴とするもの
である。
Furthermore, a quartz glass liquid storage tank is vertically divided into upper and lower partition walls having a predetermined inclination angle, and an ultrasonic transducer provided above the liquid storage tank in the upper space generates heat. Is supplied with cooling water to suppress the above, and a lower space is filled with a cleaning liquid for injecting the cleaning liquid from the injection port provided at the lower end of the liquid storage tank, and ultrasonic waves from the ultrasonic transducer are supplied. In a jet type ultrasonic cleaning device configured to spray vibration energy to the cleaning liquid in addition to the cleaning liquid sprayed from the spray port, the vibration facing the inside of the liquid storage tank with the ultrasonic vibrator attached. The material of the plate is quartz glass, and instead of the partition wall, an acoustic lens made of quartz glass is provided which focuses the plane wave radiated from the ultrasonic transducer and focuses on the injection port portion. It is a thing.

【0011】すなわち、前述の先に提案した構成におけ
る貯液槽内の隔壁を音響レンズとすることによって、ス
リット状または小円孔状をなす噴射口に超音波エネルギ
ーを集束させ、強力で無駄ない超音波洗浄が行われるよ
うにしたものである。ここで音響レンズとは、光に対す
る幾何光学の原理に従い、音波を屈折させるように形成
した物質である。音速を集束させるには、構成体の屈折
率nがn>1のとき凸レンズ、n<1のとき凹レンズと
なる。この音響レンズの材質は、例えば石英ガラスのよ
うに音速が洗浄液中の音速と異なればよく、不純物の溶
出が極めて少なく熱的にも安定したものであればよい。
That is, by using the partition wall in the liquid storage tank of the above-mentioned structure as an acoustic lens, the ultrasonic energy is focused on the slit-shaped or small circular hole-shaped injection port, which is powerful and is not wasted. Ultrasonic cleaning is performed. Here, the acoustic lens is a substance formed to refract a sound wave according to the principle of geometrical optics for light. To focus the speed of sound, a convex lens is used when the refractive index n of the structure is n> 1, and a concave lens is used when n <1. The acoustic lens may be made of any material as long as it has a sound velocity different from the sound velocity in the cleaning liquid, such as quartz glass, and has little elution of impurities and is thermally stable.

【0012】さらに、立方体または円筒形状の貯液槽に
洗浄液を供給充満し、該貯液槽の上部に設けられた超音
波振動子からの超音波振動エネルギーを前記洗浄液に与
えて前記貯液槽の下端部に設けられたスリット状または
小孔状の噴射口から前記洗浄液を被洗浄物に吹きつける
ことによって被洗浄物を洗浄する噴射形超音波洗浄装置
において、前記貯液槽の中間部分の側壁に、前記超音波
振動子から放射される平面波を透過させるために所定の
傾斜角を有し、かつ、前記平面波が集束されて前記噴射
口部分に線状または小円状の焦点を結ぶような音響レン
ズが固定され、該音響レンズによって区切られた上の空
間に前記超音波振動子の温度上昇を抑えるための冷却水
を供給充満させる供給口と流出口が設けられ、下の空間
に前記噴射口から洗浄液を噴射させるための洗浄液を供
給充満させる供給口が設けられたことを特徴とするもの
である。
Further, the cubic or cylindrical storage tank is filled with the cleaning solution, and ultrasonic vibration energy from an ultrasonic transducer provided above the storage tank is applied to the cleaning solution to supply the cleaning tank. In an injection type ultrasonic cleaning device for cleaning an object to be cleaned by spraying the cleaning liquid onto the object to be cleaned from a slit-shaped or small-hole-shaped nozzle provided at the lower end of the liquid tank, The side wall has a predetermined inclination angle for transmitting the plane wave radiated from the ultrasonic transducer, and the plane wave is converged so that a linear or small circular focus is formed on the injection port portion. A transparent acoustic lens is fixed, and a supply port and a flow outlet for supplying and filling cooling water for suppressing a temperature rise of the ultrasonic transducer are provided in an upper space partitioned by the acoustic lens, and the lower space is provided with the above-mentioned From the jet It is characterized in that the cleaning liquid supply port for supplying charges for ejecting washing liquid is provided.

【0013】一般に、空気中の光の速度(CA )と光学
ガラス中の光の速度(CG )の比はCA /CG =1.5
〜1.7であり、これを屈折率と呼び平行光を集束させ
るには凸レンズが用いられる。本発明の場合、水中の音
の速度(VW =1500m/sec)と石英ガラス中の
横波の速度(VG =3760m/sec)の比VW /V
G ≒0.4が屈折率であり、これは1より小さいので、
音を集束させるには凹レンズを用いることになる。他の
材質では音速によって屈折率が異なるため、その屈折率
によってレンズの曲率を決め、音速が水よりも小さい場
合は凸レンズを用いればよい。
Generally, the ratio of the speed of light in air (C A ) to the speed of light in optical glass (C G ) is C A / C G = 1.5.
Is 1.7 and is called a refractive index, and a convex lens is used to focus parallel light. For the present invention, the ratio V W / V of the velocity of the transverse wave of the quartz glass speed of sound in water (V W = 1500m / sec) (V G = 3760m / sec)
G ≈ 0.4 is the refractive index, which is less than 1, so
A concave lens will be used to focus the sound. Since other materials have different refractive indices depending on the speed of sound, the curvature of the lens is determined by the refractive index, and if the speed of sound is lower than that of water, a convex lens may be used.

【0014】[0014]

【実施例】図1は本発明の第1の実施例を示す斜視図
(A)と原理を説明する断面図(B)及び要部を示す部
分斜視図(C)である。図において、1は貯液槽、2は
振動子部、3は発振器(図示は省略した)からのコー
ド、4はパッキン、5は貯液槽1の支持具、6は矢印方
向に水平移動する被洗浄物、7は超音波媒体液(冷却
水)の供給口、8は冷却水の流出口、9は洗浄液(例え
ば純水)の供給口、10は洗浄液の噴出口である。12
は音響レンズ隔壁であり、洗浄液と冷却水を完全に隔離
するとともに、超音波伝搬方向の直角面に対して約15
°〜30°の傾斜角θを有しており、更に噴射口10ま
での距離50〜100mmを焦点距離とした凹レンズの
機能を備えている。この音響レンズ12の形状は、同図
(C)に示したように、方形状の一辺すなわち噴射口1
0のスリットの長手方向と並行する方向の断面は細長矩
形状をなし、それと直角をなす他辺の断面は凹レンズの
断面形状となるように形成され、振動子部から放射され
る平面波の一方向のみが集束されて噴射口10のスリッ
ト付近が線状焦点となるように形成されている。このよ
うな形状の音響レンズ隔壁12が貯液槽1の内部に傾斜
状態で設けられる。傾斜角θは、例えば音の屈折率が
0.4で焦点距離が75mmの場合θ=15°〜28°
であり角度の許容範囲は広い。
FIG. 1 is a perspective view (A) showing a first embodiment of the present invention, a sectional view (B) for explaining the principle, and a partial perspective view (C) showing the main part. In the figure, 1 is a storage tank, 2 is a vibrator part, 3 is a code from an oscillator (not shown), 4 is packing, 5 is a support tool for the storage tank 1, and 6 is horizontally moved in the arrow direction. An object to be cleaned, 7 is an ultrasonic medium liquid (cooling water) supply port, 8 is a cooling water outflow port, 9 is a cleaning liquid (for example, pure water) supply port, and 10 is a cleaning liquid jet port. 12
Is an acoustic lens partition, which completely separates the cleaning liquid and the cooling water, and is about 15 degrees away from the plane perpendicular to the ultrasonic wave propagation direction.
It has a tilt angle θ of 30 ° to 30 °, and further has a function of a concave lens having a focal distance of 50 to 100 mm to the ejection port 10. The shape of the acoustic lens 12 is, as shown in FIG.
The cross section parallel to the longitudinal direction of the slit of 0 has an elongated rectangular shape, and the cross section of the other side that is perpendicular to it is formed to be the cross sectional shape of the concave lens, and one direction of the plane wave radiated from the transducer part. Only the light is focused so that the vicinity of the slit of the ejection port 10 becomes a linear focus. The acoustic lens partition 12 having such a shape is provided inside the liquid storage tank 1 in an inclined state. The inclination angle θ is, for example, θ = 15 ° to 28 ° when the refractive index of sound is 0.4 and the focal length is 75 mm.
Therefore, the allowable range of angles is wide.

【0015】洗浄液供給口9から供給される洗浄液の単
位時間当りの流量は、洗浄液が槽内に充満し、かつ洗浄
液の噴射水圧を制御するように決められる。例えば噴射
口10のスリット幅が2mmの場合、スリットの長さ1
0mm当りの流量は毎分0.5〜1リットルであり、ス
リットの長さが400mmの場合では毎分20〜40リ
ットルとなる。冷却水は、振動子部2の放射面との間に
充満して超音波エネルギーの媒体液となるように供給さ
れ、振動子部2の温度上昇を抑制する。例えば前記の噴
射口の大きさで振動子の電気的入力が500Wの場合、
水温が10℃〜25℃の市水が毎分2〜4リットルの流
量で供給される。
The flow rate of the cleaning liquid supplied from the cleaning liquid supply port 9 per unit time is determined so that the cleaning liquid fills the tank and the jet pressure of the cleaning liquid is controlled. For example, when the slit width of the injection port 10 is 2 mm, the slit length 1
The flow rate per 0 mm is 0.5 to 1 liter per minute, and is 20 to 40 liters per minute when the slit length is 400 mm. The cooling water is supplied so as to fill the space between the radiation surface of the vibrator unit 2 and the medium liquid of ultrasonic energy, and suppress the temperature rise of the vibrator unit 2. For example, when the size of the injection port and the electric input of the vibrator are 500 W,
City water having a water temperature of 10 ° C to 25 ° C is supplied at a flow rate of 2 to 4 liters per minute.

【0016】図2は本発明の第2の実施例を示す断面図
である。振動素子の取付けは図1(B)の第1の実施例
と同じ金属板とし、隔壁11とほぼ平行に石英ガラス製
の音響レンズ13が超音波透過率が最大となる角度θで
取付けられている。音響レンズ13と隔壁11はそれぞ
れ異なる機能を分担し、音響レンズ13は音響エネルギ
ーを集束させ、隔壁11は貯液槽を2つに隔離する機能
を果たす。音響レンズ13と隔壁11は横波を利用した
斜め入射とすることにより、超音波透過率を最大にして
いる。
FIG. 2 is a sectional view showing a second embodiment of the present invention. The vibrating element is mounted on the same metal plate as that of the first embodiment shown in FIG. 1B, and the acoustic lens 13 made of quartz glass is mounted substantially parallel to the partition wall 11 at an angle θ that maximizes the ultrasonic transmittance. There is. The acoustic lens 13 and the partition wall 11 share different functions, the acoustic lens 13 focuses acoustic energy, and the partition wall 11 serves to separate the liquid storage tank into two. The acoustic lens 13 and the partition wall 11 are obliquely incident using a transverse wave to maximize the ultrasonic transmittance.

【0017】図3は本発明の第3の実施例を示す断面図
である。振動素子を石英ガラス板製振動板14に接着剤
で取付けてイオンの溶出をなくし、音響レンズ13は貯
液槽1にスポット溶接等の簡易的な方法で固定する。こ
の音響レンズ13は超音波エネルギーを効率良く透過し
て集束させるために設けられ、洗浄液と媒体液との隔離
は完全でなくてよい。
FIG. 3 is a sectional view showing a third embodiment of the present invention. The vibrating element is attached to the vibrating plate 14 made of a quartz glass plate with an adhesive to eliminate the elution of ions, and the acoustic lens 13 is fixed to the liquid storage tank 1 by a simple method such as spot welding. The acoustic lens 13 is provided to efficiently transmit and focus the ultrasonic energy, and the cleaning liquid and the medium liquid need not be completely isolated.

【0018】図5は本発明の第4の実施例を示す仰角斜
視図(A)と内部レンズの断面図(B)である。内部の
音響レンズは円形である。全体の構造が円筒形であり、
内部構造は図1(B),図2または図3と同じである。
FIG. 5 is an elevation perspective view (A) showing a fourth embodiment of the present invention and a sectional view (B) of the internal lens. The acoustic lens inside is circular. The whole structure is cylindrical,
The internal structure is the same as in FIG. 1 (B), FIG. 2 or FIG.

【0019】図6は図1(B)の第1の実施例、図2の
第2の実施例、図3の第3の実施例の応用例を示す平面
図(A)と側面図(B)である。被洗浄物6がガラス板
等の板状の場合であり、ガラス板6を垂直にして搬送用
ローラ56でガラス板6の上端と下端を挟みローラ56
を回転させてガラス板6を矢印の方向へ移動させ、その
両側面の所定の位置に配置した箱形貯液槽を有する線噴
射形超音波洗浄装置53から斜めに洗浄液54を噴射し
て洗浄が行われる。噴射方向を斜めにすることによって
剥離した汚れが再付着することはない。
FIG. 6 is a plan view (A) and a side view (B) showing an application example of the first embodiment of FIG. 1 (B), the second embodiment of FIG. 2 and the third embodiment of FIG. ). In the case where the article 6 to be cleaned is in the form of a plate such as a glass plate, the glass plate 6 is set vertically, and the upper and lower ends of the glass plate 6 are sandwiched between the rollers 56 for transporting.
Is rotated to move the glass plate 6 in the direction of the arrow, and the cleaning liquid 54 is obliquely sprayed from the linear spray ultrasonic cleaning device 53 having box-shaped liquid storage tanks arranged at predetermined positions on both side surfaces thereof for cleaning. Is done. By making the jet direction oblique, the peeled dirt does not reattach.

【0020】図7は図5の第4の実施例の応用例を示す
斜視図である。被洗浄物59が半導体ウエーハのような
円板状の場合、ウエーハ59を回転台60の上に載置し
て回転させ、上方に配置した円筒形貯液槽を有する点噴
射形超音波洗浄装置57から洗浄液58を斜めに噴射し
て洗浄が行われる。この場合、回転しているウエーハ5
9に向って洗浄装置57の先端を左右に振って均一な洗
浄を行う。なお、図7,図8は説明のために主要部のみ
を画き他は図示を省略した。また、噴出口は点噴射形で
は中央に、線噴射形では線方向の中央にしてあるが、斜
め入射のレンズの場合、音の進行方向が若干屈折するた
め、レンズの曲率の補正が必要である。レンズの曲率を
補正する代りに噴射口の位置を音の進行方向の屈折分だ
け偏らせればよい。
FIG. 7 is a perspective view showing an application example of the fourth embodiment of FIG. In the case where the object to be cleaned 59 is a disk shape like a semiconductor wafer, the wafer 59 is placed on a rotating table 60 and rotated, and a point jet type ultrasonic cleaning apparatus having a cylindrical liquid storage tank arranged above the wafer 59 is rotated. Cleaning is performed by injecting the cleaning liquid 58 obliquely from 57. In this case, the rotating wafer 5
9, the tip of the cleaning device 57 is shaken left and right to perform uniform cleaning. For the sake of explanation, FIGS. 7 and 8 only show the main part, and the other parts are omitted. In addition, although the jet outlet is located at the center of the point jet type and at the center of the line direction of the line jet type, in the case of a lens with an oblique incidence, the traveling direction of the sound is slightly refracted, so it is necessary to correct the lens curvature. is there. Instead of correcting the curvature of the lens, the position of the ejection port may be deviated by the amount of refraction in the sound traveling direction.

【0021】以上の説明は音響レンズが一枚の場合につ
いてなされた。しかし、本発明はそれに限定されること
なく音響レンズが複数枚の場合にも適用されることは勿
論である。また複数枚の音響レンズとして凹レンズと凸
レンズ等を組合せて使用する場合にも当然適用される。
例えば凹レンズと凸レンズとを組合せ、振動子からの距
離に対し振動エネルギーの強さがほぼ一定に保たれるビ
ーム状の音場を形成する等の場合にも適用されることは
勿論である。
The above description has been made for the case of one acoustic lens. However, it goes without saying that the present invention is not limited to this and can be applied to the case where a plurality of acoustic lenses are provided. Further, it is naturally applied when a concave lens and a convex lens are used in combination as a plurality of acoustic lenses.
For example, it is of course applicable to a case where a concave lens and a convex lens are combined to form a beam-like sound field in which the intensity of vibration energy is kept substantially constant with respect to the distance from the vibrator.

【0022】以上の第1〜第4の実施例は、洗浄対象と
して半導体ウエーハ等の超純水洗浄を行う場合に用いら
れるが、1Mビット未満のICやディスクリート(個別
半導体)のトランジスタ、またはダイオード用のウエー
ハあるいは一部のガラス基板等を洗浄する場合は、金属
イオンの溶出を厳密に抑える必要がないので、洗浄槽は
従来の金属製のものを用いることができる。しかし、従
来の装置では超音波振動エネルギーが噴射口に集束され
ないため洗浄効率は低い。そこで、本発明の音響レンズ
を装着し、かつ、超音波透過率を向上するために所定の
傾斜角をもたせて取付ける。図10は本発明の第5の実
施例を示す部分断面図である。この第5の実施例は図1
(A)に示す線噴射形超音波洗浄装置の石英ガラス製の
貯液槽1を金属製貯液槽20にしたものである。図10
(A)は貯液槽20の断面図、(B),(C)は貯液槽
20の内部に装着する音響レンズ15の取付け部分の拡
大部分断面図である。図10の符号2,4,6,7,
8,9,10は図1(B)と同じ部分を示す。15は音
響レンズであり、超音波振動の透過率がほぼ100%に
なるような所定の傾斜角θをもたせ、かつ、噴射口10
に振動エネルギーが集中するように貯液槽20内壁に取
付けられている。図10(B)は音響レンズ15の取付
け構造を示しており、16は貯液槽20の内壁にスポッ
ト溶接された取付具、17はパッキンである。18はね
じであり、音響レンズ15に設けられた孔を貫通して取
付具16に設けられたタップに締め付け固定される。図
10(C)の19は抑え具であり、音響レンズ15には
孔がなく、音響レンズの縁部を挟んでねじ18で固定さ
れている。本実施例の場合、洗浄液と冷却水は同じもの
でよいが、内部に液体を充満させるためそれぞれの供給
口7及び9から供給される。音響レンズ15の取付け部
分から多少のリーク(漏れ)があってもよく、その漏れ
量を利用して水圧を加減することもできる。また、音響
レンズの材質は、冷却水(洗浄液)と音速(屈折率)が
異なり音響的に透明であり、比較的堅い物質であれば良
く、例えば石英ガラスでなくても一般の光学ガラスが用
いられる。図10の第5の実施例は、線噴射形超音波洗
浄装置について示したが、図5に示す点噴射形洗浄装置
にも適用できることはいうまでもない。
The above-described first to fourth embodiments are used when cleaning a semiconductor wafer or the like with ultrapure water as a cleaning target. However, ICs of less than 1 Mbit, discrete (individual semiconductor) transistors, or diodes are used. When cleaning a wafer for use or a part of a glass substrate or the like, it is not necessary to strictly suppress the elution of metal ions, and therefore, a conventional cleaning tank made of metal can be used. However, in the conventional device, the ultrasonic vibration energy is not focused on the ejection port, so that the cleaning efficiency is low. Therefore, the acoustic lens of the present invention is mounted and mounted with a predetermined inclination angle in order to improve ultrasonic transmittance. FIG. 10 is a partial sectional view showing the fifth embodiment of the present invention. This fifth embodiment is shown in FIG.
A liquid storage tank 1 made of quartz glass in the line injection type ultrasonic cleaning apparatus shown in (A) is replaced with a metal storage tank 20. Figure 10
(A) is a cross-sectional view of the liquid storage tank 20, and (B) and (C) are enlarged partial cross-sectional views of a mounting portion of the acoustic lens 15 mounted inside the liquid storage tank 20. Reference numerals 2, 4, 6, 7, in FIG.
Reference numerals 8, 9, and 10 denote the same parts as in FIG. Reference numeral 15 denotes an acoustic lens, which has a predetermined inclination angle θ such that the transmittance of ultrasonic vibration is almost 100%, and the injection port 10
It is attached to the inner wall of the liquid storage tank 20 so that the vibration energy is concentrated on the inside. FIG. 10 (B) shows a mounting structure of the acoustic lens 15, 16 is a mounting tool spot welded to the inner wall of the liquid storage tank 20, and 17 is a packing. Reference numeral 18 denotes a screw, which penetrates a hole provided in the acoustic lens 15 and is fastened and fixed to a tap provided in the fixture 16. Reference numeral 19 in FIG. 10 (C) is a retainer, which does not have a hole in the acoustic lens 15 and is fixed with a screw 18 with the edge of the acoustic lens sandwiched. In the case of the present embodiment, the cleaning liquid and the cooling water may be the same, but are supplied from the respective supply ports 7 and 9 in order to fill the liquid inside. There may be some leakage from the mounting portion of the acoustic lens 15, and the amount of leakage can be used to adjust the water pressure. The material of the acoustic lens may be a relatively hard substance that is acoustically transparent and has a different sound velocity (refractive index) from the cooling water (cleaning liquid), and for example, general optical glass may be used instead of quartz glass. Be done. Although the fifth embodiment of FIG. 10 is shown for the linear jet ultrasonic cleaning apparatus, it goes without saying that it can be applied to the point jet cleaning apparatus shown in FIG.

【0023】[0023]

【発明の効果】以上詳細に説明したように、本発明を実
施することにより、洗浄液に金属イオンが溶出する恐れ
はなく、超音波エネルギーが集束されるため、洗浄効率
が上昇し、半導体製造関連の洗浄装置として実用上極め
て大きい効果がある。さらに、一般の洗浄の場合も洗浄
効率が著しく向上される。
As described in detail above, by carrying out the present invention, there is no fear of elution of metal ions in the cleaning liquid, and ultrasonic energy is focused, so that cleaning efficiency is increased and semiconductor manufacturing related It is extremely effective in practical use as a cleaning device. Furthermore, in the case of general cleaning, the cleaning efficiency is significantly improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例を示す斜視図(A),断
面図(B)と本発明の構成要素となる音響レンズの斜視
図(C)である。
FIG. 1 is a perspective view (A) showing a first embodiment of the present invention, a cross-sectional view (B) and a perspective view (C) of an acoustic lens which is a component of the present invention.

【図2】本発明の第2の実施例の断面図である。FIG. 2 is a sectional view of a second embodiment of the present invention.

【図3】本発明の第3の実施例の断面図である。FIG. 3 is a sectional view of a third embodiment of the present invention.

【図4】先に提案した発明の実施例を示す斜視図
(A),断面図(B)である。
FIG. 4 is a perspective view (A) and a sectional view (B) showing an embodiment of the previously proposed invention.

【図5】本発明の第4の実施例を示す斜視図(A)と本
発明の構成要素となる音響レンズの断面図(B)であ
る。
FIG. 5 is a perspective view (A) showing a fourth embodiment of the present invention and a sectional view (B) of an acoustic lens which is a constituent element of the present invention.

【図6】図1〜図3の応用例を示す平面図(A)と側面
図(B)である。
FIG. 6 is a plan view (A) and a side view (B) showing an application example of FIGS.

【図7】図5の応用例を示す斜視図である。FIG. 7 is a perspective view showing an application example of FIG.

【図8】従来構造の斜視図(A)と断面図(B)であ
る。
FIG. 8 is a perspective view (A) and a sectional view (B) of a conventional structure.

【図9】洗浄工程を説明する側面図である。FIG. 9 is a side view illustrating a cleaning process.

【図10】本発明の第5の実施例を示す断面図である。FIG. 10 is a sectional view showing a fifth embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 貯液槽 2 振動子部 3 コード 4 パッキン 5 支持具 6 被洗浄物 7 冷却水供給口 8 冷却水流出口 9 洗浄液供給口 10 噴射口 11 隔壁 12 音響レンズ隔壁 13 音響レンズ 14 石英ガラスの振動板 15 音響レンズ 16 取付具 17 パッキン 18 ねじ 19 抑え具 20 貯液槽 41 貯液槽 42 洗浄液供給口 43 オーバーフロー口 44 噴射口 51 洗浄槽を備えた超音波洗浄装置 52 コンベア 53 線状噴射式超音波洗浄装置 54 洗浄液 55 コンベア 56 ローラ 57 点状噴射式洗浄装置 58 洗浄液 59 半導体ウエーハ 60 回転台 DESCRIPTION OF SYMBOLS 1 Liquid storage tank 2 Transducer part 3 Code 4 Packing 5 Supporting tool 6 Cleaning object 7 Cooling water supply port 8 Cooling water outlet 9 Cleaning solution supply port 10 Jet port 11 Partition wall 12 Acoustic lens partition wall 13 Acoustic lens 14 Quartz glass diaphragm 15 Acoustic Lens 16 Mounting Tool 17 Packing 18 Screw 19 Holding Tool 20 Liquid Storage Tank 41 Liquid Storage Tank 42 Cleaning Liquid Supply Port 43 Overflow Port 44 Jet Port 51 Ultrasonic Cleaning Device with Cleaning Tank 52 Conveyor 53 Linear Jet Ultrasonic Wave Cleaning device 54 Cleaning liquid 55 Conveyor 56 Roller 57 Point jet cleaning device 58 Cleaning liquid 59 Semiconductor wafer 60 Rotating table

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 石英ガラス製の貯液槽の内部を上下に分
割し所定の傾斜角を有する隔壁が設けられ、上の空間に
該貯液槽の上部に設けられた超音波振動子の発熱を抑え
るための冷却水を充満供給し、下の空間に該貯液槽の下
端部に設けられた噴射口から洗浄液を噴射させるための
洗浄液を充満供給し、前記超音波振動子からの超音波振
動エネルギーを前記噴射口から噴射する洗浄液に加えて
被洗浄物に吹きつけるように構成された噴射形超音波洗
浄装置において、 前記隔壁は、前記超音波振動子から放射される平面波が
集束されて前記噴射口部分に焦点を結ぶような音響レン
ズ隔壁であることを特徴とする噴射形超音波洗浄装置。
1. A quartz glass liquid storage tank is vertically divided into partition walls having a predetermined inclination angle, and a heat generated by an ultrasonic transducer provided above the liquid storage tank in the upper space. Is supplied with cooling water to suppress the above, and a lower space is filled with a cleaning liquid for injecting the cleaning liquid from the injection port provided at the lower end of the liquid storage tank, and ultrasonic waves from the ultrasonic transducer are supplied. In an injection type ultrasonic cleaning device configured to spray vibration energy to a cleaning liquid in addition to the cleaning liquid sprayed from the spray port, the partition wall is a plane wave emitted from the ultrasonic transducer is focused. An injection-type ultrasonic cleaning device, characterized in that the injection-type ultrasonic cleaning device is an acoustic lens partition that focuses on the injection port portion.
【請求項2】 石英ガラス製の貯液槽の内部を上下に分
割し所定の傾斜角を有する隔壁が設けられ、上の空間に
該貯液槽の上部に設けられた超音波振動子の発熱を抑え
るための冷却水を充満供給し、下の空間に該貯液槽の下
端部に設けられた噴射口から洗浄液を噴射させるための
洗浄液を充満供給し、前記超音波振動子からの超音波振
動エネルギーを前記噴射口から噴射する洗浄液に加えて
被洗浄物に吹きつけるように構成された噴射形超音波洗
浄装置において、 前記隔壁にほぼ並行するように固定され、前記超音波振
動子から放射される平面波が集束されて前記噴射口部分
に焦点を結ぶ石英ガラス製の音響レンズを備えたことを
特徴とする噴射形超音波洗浄装置。
2. A quartz glass liquid storage tank is vertically divided into upper and lower partition walls having a predetermined inclination angle, and an ultrasonic transducer provided above the liquid storage tank in the upper space generates heat. Is supplied with cooling water to suppress the above, and a lower space is filled with a cleaning liquid for injecting the cleaning liquid from the injection port provided at the lower end of the liquid storage tank, and ultrasonic waves from the ultrasonic transducer are supplied. In an injection type ultrasonic cleaning device configured to spray vibration energy to a cleaning liquid in addition to the cleaning liquid sprayed from the spray port, the vibration is fixed substantially parallel to the partition wall and radiated from the ultrasonic vibrator. An ultrasonic cleaning device of the jet type, comprising: an acoustic lens made of quartz glass that focuses the plane wave to be focused on the jet port portion.
【請求項3】 石英ガラス製の貯液槽の内部を上下に分
割し所定の傾斜角を有する隔壁が設けられ、上の空間に
該貯液槽の上部に設けられた超音波振動子の発熱を抑え
るための冷却水を充満供給し、下の空間に該貯液槽の下
端部に設けられた噴射口から洗浄液を噴射させるための
洗浄液を充満供給し、前記超音波振動子からの超音波振
動エネルギーを前記噴射口から噴射する洗浄液に加えて
被洗浄物に吹きつけるように構成された噴射形超音波洗
浄装置において、 前記超音波振動子が取付けられ前記貯液槽の内部に面す
る振動板の材質を石英ガラスとし、 前記隔壁の代わりに、前記超音波振動子から放射される
平面波が集束されて前記噴射口部分に焦点を結ぶ石英ガ
ラス製の音響レンズを備えたことを特徴とする噴射形超
音波洗浄装置。
3. A quartz glass liquid storage tank is divided into upper and lower portions with a partition wall having a predetermined inclination angle, and heat generated by an ultrasonic transducer provided above the liquid storage tank in the upper space. Is supplied with cooling water to suppress the above, and a lower space is filled with a cleaning liquid for injecting the cleaning liquid from the injection port provided at the lower end of the liquid storage tank, and ultrasonic waves from the ultrasonic transducer are supplied. In a jet-type ultrasonic cleaning device configured to spray vibration energy to a cleaning liquid in addition to the cleaning liquid sprayed from the spray port, the ultrasonic vibrator is attached, and vibrations facing the interior of the liquid storage tank are provided. The material of the plate is quartz glass, and in place of the partition wall, an acoustic lens made of quartz glass is provided which focuses the plane wave emitted from the ultrasonic transducer and focuses on the injection port portion. Jet type ultrasonic cleaning device.
【請求項4】 立方体または円筒形状の貯液槽に洗浄液
を供給充満し、該貯液槽の上部に設けられた超音波振動
子からの超音波振動エネルギーを前記洗浄液に与えて前
記貯液槽の下端部に設けられたスリット状または小孔状
の噴射口から前記洗浄液を被洗浄物に吹きつけることに
よって被洗浄物を洗浄する噴射形超音波洗浄装置におい
て、 前記貯液槽の中間部分の側壁に、前記超音波振動子から
放射される平面波を透過させるために所定の傾斜角を有
し、かつ、前記平面波が集束されて前記噴射口部分に線
状または小円状の焦点を結ぶような音響レンズが固定さ
れ、 該音響レンズによって区切られた上の空間に前記超音波
振動子の温度上昇を抑えるための冷却水を供給充満させ
る供給口と流出口が設けられ、下の空間に前記噴射口か
ら洗浄液を噴射させるための洗浄液を供給充満させる供
給口が設けられたことを特徴とする噴射形超音波洗浄装
置。
4. A cubic or cylindrical liquid storage tank is filled with a cleaning liquid, and ultrasonic vibration energy from an ultrasonic transducer provided above the liquid storage tank is applied to the cleaning liquid to provide the liquid storage tank. In the injection type ultrasonic cleaning device for cleaning an object to be cleaned by spraying the cleaning liquid onto the object to be cleaned from a slit-shaped or small-hole-shaped nozzle provided at the lower end of the liquid tank, The side wall has a predetermined inclination angle for transmitting the plane wave radiated from the ultrasonic transducer, and the plane wave is converged so that a linear or small circular focus is formed on the injection port portion. A transparent acoustic lens is fixed, and a supply port and a flow outlet for supplying and filling cooling water for suppressing a temperature rise of the ultrasonic transducer are provided in an upper space partitioned by the acoustic lens, and the lower space is provided with Cleaning liquid from the jet Injection type ultrasonic washing apparatus, characterized in that the cleaning liquid supply port for supplying filled is provided for ejecting.
JP9855092A 1992-03-26 1992-03-26 Jet type ultrasonic cleaning device Expired - Lifetime JPH0673657B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9855092A JPH0673657B2 (en) 1992-03-26 1992-03-26 Jet type ultrasonic cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9855092A JPH0673657B2 (en) 1992-03-26 1992-03-26 Jet type ultrasonic cleaning device

Publications (2)

Publication Number Publication Date
JPH05269450A true JPH05269450A (en) 1993-10-19
JPH0673657B2 JPH0673657B2 (en) 1994-09-21

Family

ID=14222804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9855092A Expired - Lifetime JPH0673657B2 (en) 1992-03-26 1992-03-26 Jet type ultrasonic cleaning device

Country Status (1)

Country Link
JP (1) JPH0673657B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0919667A (en) * 1995-07-04 1997-01-21 Shibaura Eng Works Co Ltd Ultrasonic washing device
JPH0919665A (en) * 1995-07-04 1997-01-21 Shibaura Eng Works Co Ltd Ultrasonic washing device
JPH09206715A (en) * 1996-01-31 1997-08-12 Puretetsuku:Kk High frequency washing method
JP2007253121A (en) * 2006-03-24 2007-10-04 Hitachi Plant Technologies Ltd Ultrasonic cleaning device
DE102007030572A1 (en) * 2007-07-02 2009-01-08 Heidelberger Druckmaschinen Ag Washing device for a cylinder in a printing machine
KR101394090B1 (en) * 2007-10-22 2014-05-13 주식회사 케이씨텍 Cooling structure of wet station
KR20220167482A (en) * 2021-06-14 2022-12-21 주식회사 한진기공 Wet foreign matter filtering device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0919667A (en) * 1995-07-04 1997-01-21 Shibaura Eng Works Co Ltd Ultrasonic washing device
JPH0919665A (en) * 1995-07-04 1997-01-21 Shibaura Eng Works Co Ltd Ultrasonic washing device
JPH09206715A (en) * 1996-01-31 1997-08-12 Puretetsuku:Kk High frequency washing method
JP2007253121A (en) * 2006-03-24 2007-10-04 Hitachi Plant Technologies Ltd Ultrasonic cleaning device
DE102007030572A1 (en) * 2007-07-02 2009-01-08 Heidelberger Druckmaschinen Ag Washing device for a cylinder in a printing machine
US8528476B2 (en) 2007-07-02 2013-09-10 Heidelberger Druckmaschinen Ag Washing device for a cylinder in a printing press
KR101394090B1 (en) * 2007-10-22 2014-05-13 주식회사 케이씨텍 Cooling structure of wet station
KR20220167482A (en) * 2021-06-14 2022-12-21 주식회사 한진기공 Wet foreign matter filtering device

Also Published As

Publication number Publication date
JPH0673657B2 (en) 1994-09-21

Similar Documents

Publication Publication Date Title
US4326553A (en) Megasonic jet cleaner apparatus
TWI464019B (en) Ultrasonic cleaning device and ultrasonic cleaning method
CN210497445U (en) Ultrasonic cleaning device and ultrasonic cleaning system
JP2004515053A (en) Wafer cleaning method and apparatus
KR102616530B1 (en) Laser processing apparatus
US20020096578A1 (en) Megasonic cleaning device and process
JP6704714B2 (en) Cutting equipment
JPH05269450A (en) Injection type ultrasonic cleaning apparatus
US11090762B2 (en) Laser processing apparatus
JP3071398B2 (en) Cleaning equipment
JPH0777209B2 (en) Jet type ultrasonic cleaning device
JP3322163B2 (en) Ultrasonic cleaning method and apparatus
JP2005131602A (en) Cleaner
JPH06106144A (en) Ultrasonic cleaning method and device therefor
JPH10296200A (en) Ultrasonic washing method and washing device thereby
JP2019084562A (en) Laser processing device
JP2019072746A (en) Laser processing device
JP7295621B2 (en) Wafer cutting method and wafer division method
JP2010238744A (en) Ultrasonic cleaning unit, and ultrasonic cleaning device
JP2004167377A (en) Ultrasonic washing machine
JP2008080293A (en) Washing apparatus
JP2002086068A (en) Ultrasonic vibration unit, ultrasonic cleaner, and ultrasonic cleaning method
JP2883844B2 (en) High frequency cleaning method
JP2009208005A (en) Ultrasonic washing apparatus
JPH01304089A (en) Ultrasonic washing apparatus

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313115

R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 14

Free format text: PAYMENT UNTIL: 20080921

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 15

Free format text: PAYMENT UNTIL: 20090921

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 16

Free format text: PAYMENT UNTIL: 20100921

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110921

Year of fee payment: 17

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 17

Free format text: PAYMENT UNTIL: 20110921

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 18

Free format text: PAYMENT UNTIL: 20120921

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 18

Free format text: PAYMENT UNTIL: 20120921