JPH05266472A - Formation of resin layer - Google Patents
Formation of resin layerInfo
- Publication number
- JPH05266472A JPH05266472A JP4062746A JP6274692A JPH05266472A JP H05266472 A JPH05266472 A JP H05266472A JP 4062746 A JP4062746 A JP 4062746A JP 6274692 A JP6274692 A JP 6274692A JP H05266472 A JPH05266472 A JP H05266472A
- Authority
- JP
- Japan
- Prior art keywords
- resin layer
- resin
- high speed
- base board
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、基板上への樹脂層の毛
性方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of forming a resin layer on a substrate.
【０００２】[0002]
【従来の技術】スピンコート法は、光ディスク、光磁気
ディスク等におけるプラスチック基板や記録媒体薄膜の
保護層、帯電防止層等の樹脂層の作製、あるいは半導体
製造における密着露光法の際のレジスト塗布等に用いら
れている。2. Description of the Related Art Spin coating is a method for producing a resin layer such as a protective layer for a plastic substrate or a recording medium thin film or an antistatic layer for an optical disk, a magneto-optical disk or the like, or a resist coating for a contact exposure method in semiconductor manufacturing. Is used for.
【０００３】これらのスピンコート法においては、ま
ず、スピンナーテーブル上にチャッキングされた基板を
低速で回転させつつ基板の内周部に樹脂が滴下される。
滴下終了後、スピンナーテーブルは樹脂滴下時より速い
所定の回転数、回転時間で回転し、樹脂層の塗布が完了
する。その後、例えば紫外線硬化型樹脂であれば、紫外
線を照射して樹脂を硬化させることで樹脂層が形成され
る。In these spin coating methods, first, a substrate chucked on a spinner table is rotated at a low speed while a resin is dropped on the inner peripheral portion of the substrate.
After the dropping, the spinner table is rotated at a predetermined number of rotations and at a rotation time faster than when the resin is dropped, and the application of the resin layer is completed. Then, for example, in the case of an ultraviolet curable resin, a resin layer is formed by irradiating ultraviolet rays to cure the resin.
【０００４】[0004]
【発明が解決しようとする課題】上記のようなスピンコ
ート法で樹脂層を形成した場合には、通常、外周ほど樹
脂層の膜厚が厚くなり、外周部近傍では図６に示すよう
な樹脂層の盛り上がり部分及び基板端面への樹脂の回り
込みが存在する。前記盛り上がり部分は、樹脂滴下量、
スピンナー回転数、回転時間等を半径方向の膜厚の分布
を極力押えるような条件に設定しても完全に除去するこ
とは難しい。また、前記盛り上がり部分の膜厚は例えば
図６でその一例を示したように、樹脂層本来の膜厚が２
〜３μmであるのに対して、１５〜２０μmにもなってし
まう場合がある。さらに基板端面への回り込みも数十μ
mにもなることがある。When the resin layer is formed by the spin coating method as described above, the thickness of the resin layer usually becomes thicker toward the outer periphery, and the resin as shown in FIG. 6 is formed near the outer periphery. There is swelling of the layer and resin wraparound to the end face of the substrate. The raised portion is a resin dropping amount,
It is difficult to completely remove the spinner rotation speed, rotation time, etc. even if the conditions are set so as to suppress the radial film thickness distribution as much as possible. Further, the film thickness of the raised portion is, for example, as shown in FIG.
Although it is ˜3 μm, it may be 15 to 20 μm. Furthermore, the wraparound to the substrate end face is several tens of μ
It can be m.
【０００５】前記盛り上がり部分は以下のような点で問
題となる。密着露光法等では、盛り上がり部分があるこ
とによってレジストとマスクの間に隙間ができてしまう
ので完全にマスクすることができなくなり露光部分と非
露光部分の境界があいまいになってしまう。また、浮上
ヘッド型の光磁気ディスク装置等においては、ディスク
とヘッドとの距離が小さいため前記樹脂盛り上がり部分
でディスクとヘッドが接触してしまう。The raised portion causes problems as follows. In the contact exposure method or the like, a gap is formed between the resist and the mask due to the presence of the raised portion, so that the mask cannot be completely formed and the boundary between the exposed portion and the non-exposed portion becomes ambiguous. Further, in a flying head type magneto-optical disk device or the like, since the distance between the disk and the head is small, the disk and the head come into contact with each other at the resin rising portion.
【０００６】さらに、使用した樹脂が紫外線硬化型樹脂
である場合には、盛り上がり部分の膜厚が厚すぎるた
め、硬化に用いられる紫外線照射光が樹脂層の深さ方向
の深部まで充分に到達しない。そのため、前記盛り上が
り部分では樹脂層の表面部分のみが硬化され、樹脂層と
下地との界面部分は充分な硬化がなされず、樹脂層と下
地との密着力が低下したり、界面部分を通って外部から
の水分が侵入し易くなる。これは結果として、樹脂層が
下地から剥離してしまうこととなる。このような剥離が
発生すると、例えば記録媒体上に設けられた樹脂層であ
る場合には、記録媒体の腐食が発生、促進される結果も
招いてしまう。このような剥離、腐食は基板端面におい
ても問題となる。Further, when the resin used is an ultraviolet curable resin, the ultraviolet irradiation light used for curing does not sufficiently reach the deep portion in the depth direction of the resin layer because the film thickness of the raised portion is too thick. .. Therefore, only the surface portion of the resin layer is cured in the raised portion, the interface portion between the resin layer and the base is not sufficiently cured, the adhesion between the resin layer and the base is reduced, or Water from the outside easily enters. As a result, the resin layer is peeled off from the base. If such peeling occurs, for example, in the case of a resin layer provided on the recording medium, the recording medium may be corroded and promoted. Such peeling and corrosion also pose a problem on the end face of the substrate.
【０００７】本発明は、前記のような問題点を解決し、
樹脂層端部、及び端面での樹脂の盛り上がりを抑えた基
板上への樹脂層の形成方法を提案することを目的とする
ものである。The present invention solves the above problems,
It is an object of the present invention to propose a method for forming a resin layer on a substrate in which resin swelling at the resin layer end portion and the end surface is suppressed.
【０００８】[0008]
【課題を解決するための手段】上述の目的を達成するた
め本発明は、スピンコート法による樹脂層の製造方法に
おいて、樹脂滴下後のスピンナー回転中に、樹脂層外周
部近傍に気体を吹き付けながら、樹脂層形成を行うこと
を特徴とする樹脂層の形成方法である。In order to achieve the above object, the present invention provides a method for producing a resin layer by a spin coating method, in which a gas is blown near the outer peripheral portion of the resin layer during rotation of a spinner after dropping a resin. The method for forming a resin layer is characterized in that the resin layer is formed.
【０００９】[0009]
【作用】樹脂滴下後のスピンナーの高速回転中に樹脂層
外周部に気体を吹き付けることにより、樹脂層端部での
樹脂の盛り上がり、及び基板端面への樹脂の回り込みを
抑えることができ、前記樹脂層端部での樹脂の硬化を充
分に行うことができる。By spraying a gas on the outer peripheral portion of the resin layer during high-speed rotation of the spinner after dropping the resin, it is possible to prevent the resin from rising at the end portion of the resin layer and from flowing into the end surface of the substrate. The resin can be sufficiently cured at the edge of the layer.
【００１０】[0010]
(実施例１)図１は本発明の実施例を示す図である。図１
において、１はモータにより回転するスピンナーテーブ
ル、２は円盤状のポリカーボネート製の光磁気ディスク
基板、３は帯電防止効果を有する紫外線硬化型樹脂層か
らなる樹脂層である。４は気体吹き付け用ノズルであ
り、レギュレータにより所望の圧力に調整された窒素が
ノズル先端から吹き出すようになっている。(Embodiment 1) FIG. 1 is a view showing an embodiment of the present invention. Figure 1
In the above, 1 is a spinner table rotated by a motor, 2 is a disc-shaped magneto-optical disc substrate made of polycarbonate, and 3 is a resin layer made of an ultraviolet curable resin layer having an antistatic effect. Reference numeral 4 denotes a gas blowing nozzle, and nitrogen adjusted to a desired pressure by a regulator blows out from the nozzle tip.
【００１１】本発明の製造方法においては、まず樹脂粘
度が約３０cPSの紫外線硬化型帯電防止剤をディスク基
板２の内周部に滴下させる。このとき、ディスク基板２
はスピンナーテーブル１に真空チャッキングされてお
り、５０〜１００rpm程度の低速で回転している。滴下
終了後、スピンナーテーブル１を２０００〜３０００rp
m程度で高速回転させて樹脂層３を得るのであるが、こ
の高速回転中に吹き出しノズル４からディスク基板２の
外周部付近に窒素ガスを吹き付ける。高速回転停止後、
真空チャッキングを解除し、樹脂層３が形成されたディ
スク基板２を紫外線照射装置に搬送して、樹脂層３の上
方から紫外線を照射して、樹脂層３を硬化させて樹脂層
形成が完了する。In the manufacturing method of the present invention, first, an ultraviolet curable antistatic agent having a resin viscosity of about 30 cPS is dropped on the inner peripheral portion of the disk substrate 2. At this time, the disk substrate 2
Is vacuum chucked on the spinner table 1 and rotates at a low speed of about 50 to 100 rpm. After finishing the dropping, spinner table 1 is set to 2000-3000rp.
The resin layer 3 is obtained by rotating at a high speed of about m, and nitrogen gas is blown from the blowing nozzle 4 to the vicinity of the outer peripheral portion of the disk substrate 2 during the high speed rotation. After the high speed rotation is stopped,
The vacuum chucking is released, the disk substrate 2 on which the resin layer 3 is formed is conveyed to an ultraviolet irradiation device, and ultraviolet rays are irradiated from above the resin layer 3 to cure the resin layer 3 to complete the resin layer formation. To do.
【００１２】図２に本発明の製造方法を用いて作成した
光磁気ディスクの概略断面図を示す。樹脂層本来の膜厚
２〜３μmに対して、該端部盛り上がり部分の膜厚は最
大でも５μm程度であり従来法で作製した場合の膜厚１
５〜２０μmに比べると大幅に低減された。また、端面
に回り込んだ樹脂層の膜厚も１０μm程度に低減され
た。FIG. 2 shows a schematic sectional view of a magneto-optical disk produced by the manufacturing method of the present invention. The film thickness of the edge raised portion is about 5 μm at the maximum, whereas the film thickness of the resin layer originally is 2 to 3 μm.
It was significantly reduced compared to 5 to 20 μm. In addition, the film thickness of the resin layer wrapping around the end face was also reduced to about 10 μm.
【００１３】更に、上記の光磁気ディスクの信頼性を確
認するために行った環境テストの結果を以下に述べる。
環境テスト条件は基板としてポリカーボネートを使用し
た場合の光磁気ディスクの信頼性を評価する場合の条件
としては、最も厳しい部類に属する８０℃、９０％Ｒ．
Ｈ．とした。この環境テスト条件で、本発明の製造方法
と従来の製造方法で作製した光磁気ディスクを投入して
剥離の状況を調べた。その結果、従来方法による光磁気
ディスクにおいては、テスト開始から１５０〜２４０時
間経過後に、基板外端部から樹脂層の剥離が生じ、更に
時間経過と共に剥離部がディスク内周側へ進行した。こ
れに対し、本発明の製造方法による光磁気ディスクにお
いては３５０時間経過後も何ら変化は生じなかった。Further, the results of the environmental test conducted to confirm the reliability of the above magneto-optical disk will be described below.
The environmental test conditions are 80 ° C. and 90% RH which belong to the most severe category as the conditions for evaluating the reliability of the magneto-optical disk when polycarbonate is used as the substrate.
H. And Under this environmental test condition, the magneto-optical disk manufactured by the manufacturing method of the present invention and the conventional manufacturing method were put in and the state of peeling was examined. As a result, in the magneto-optical disk according to the conventional method, the resin layer was peeled from the outer end portion of the substrate after 150 to 240 hours from the start of the test, and the peeled portion proceeded to the inner circumferential side of the disk with the passage of time. On the other hand, in the magneto-optical disk manufactured by the manufacturing method of the present invention, no change occurred after 350 hours.
【００１４】本実施例における吹き出しノズルの内径は
約０．３〜０．４mmである。また、吹き出し用気体とし
ては、上記実施例で述べた窒素の他に空気で行ってみた
が、同様の結果が得られた。なお、本実施例の光磁気デ
ィスクにおいてはディスク端部での膜厚は少なくとも１
０μm以下にすることが必要である。図３は吹き付ける
窒素の圧力と盛り上がり部分の膜厚との関係を示した図
である。窒素圧力が０．６kg/cm2の時は充分な効果は得
られず１kg/cm2以上必要であり、２〜３kg/cm2であれば
端部での膜厚が４〜５μmとなり、より良い結果を得ら
れた。The inner diameter of the blowing nozzle in this embodiment is about 0.3 to 0.4 mm. As the blowing gas, air was used in addition to the nitrogen described in the above example, but similar results were obtained. In the magneto-optical disk of this embodiment, the film thickness at the disk end is at least 1.
It is necessary to make it 0 μm or less. FIG. 3 is a diagram showing the relationship between the pressure of nitrogen to be sprayed and the film thickness of the raised portion. Nitrogen pressure is required sufficient effect was not 1 kg / cm 2 or more obtained when the 0.6 kg / cm 2, thickness 4~5μm next at the end if 2-3 kg / cm 2, more I got good results.
【００１５】また、吹き出し用ノズルのディスクに対す
る設定角度は、ディスク面から４０〜６０度程度で膜厚
が４〜５μmとなるが、かなり広い範囲で効果が得られ
た。吹き出し用ノズル先端のディスクからの距離は１０
mm以下で、１〜５mm程度にすると膜厚が４〜５μmとな
る。また、ノズルのディスク外端からの半径方向の距離
は５mm前後であるが、これより大きくても効果は得られ
た。Further, the setting angle of the blowing nozzle with respect to the disk is 40 to 60 degrees from the disk surface, and the film thickness is 4 to 5 μm, but the effect was obtained in a considerably wide range. The distance from the disc at the tip of the blowing nozzle is 10
If the thickness is less than mm and is about 1 to 5 mm, the film thickness is 4 to 5 μm. Further, the radial distance from the outer edge of the disk of the nozzle is about 5 mm, but the effect was obtained even if it was larger than this.
【００１６】以上述べてきたような、圧力、吹き出し用
ノズル径、ノズルのディスクに対する設定角度、あるい
はノズル先端からディスクまでの距離等の条件は光磁気
ディスクの基板保護層の作製の為の条件であるが、その
他の用途に用いるときはそれぞれ樹脂粘度、スピンナー
回転数等に加えて樹脂層端部での膜厚の必要精度を考慮
して、適切な値を選べば良い。The conditions such as the pressure, the diameter of the nozzle for jetting, the setting angle of the nozzle with respect to the disk, the distance from the nozzle tip to the disk, etc. as described above are the conditions for manufacturing the substrate protective layer of the magneto-optical disk. However, when used for other purposes, an appropriate value may be selected in consideration of the required accuracy of the film thickness at the resin layer end portion in addition to the resin viscosity, the spinner rotation speed, and the like.
【００１７】(実施例２)本発明の他の実施例を説明す
る。樹脂の粘度が５００cPSである他は実施例１と同様
である。全体の膜厚６μmの樹脂層において、吹き出し
ガスの圧力を３kg/cm2、スピンナーテーブルの高速回転
時の回転数を３０００rpmにした時、盛り上がり部分の
膜厚は１５〜２０μmであったものが１０μm程度に低減
された。(Embodiment 2) Another embodiment of the present invention will be described. Same as Example 1 except that the viscosity of the resin is 500 cPS. When the pressure of the blowing gas is 3 kg / cm 2 and the rotation speed of the spinner table at high speed rotation is 3000 rpm in the resin layer having a total film thickness of 6 μm, the film thickness of the raised portion is 15 to 20 μm Was reduced to a degree.
【００１８】(実施例３)本発明の他の実施例を図４、図
５に基づいて説明する。図４、図５は図１のディスク基
板２の外周部のみを拡大して示した図である。２はスピ
ンナーテーブル上に置かれた円盤状の光磁気ディスク基
板で、３は帯電防止効果を有する紫外線硬化型樹脂であ
る。４、５は気体吹き付け用ノズルでありレギュレータ
により所望の圧力に調整された窒素がノズル先端から吹
き出すようになっている。(Embodiment 3) Another embodiment of the present invention will be described with reference to FIGS. 4 and 5 are enlarged views showing only the outer peripheral portion of the disk substrate 2 of FIG. Reference numeral 2 is a disk-shaped magneto-optical disk substrate placed on a spinner table, and 3 is an ultraviolet curable resin having an antistatic effect. Nozzles 4 and 5 are gas blowing nozzles, and nitrogen adjusted to a desired pressure by a regulator blows out from the nozzle tip.
【００１９】本実施例の製造方法では樹脂を低速で回転
しているスピンナーテーブル上のディスク基板２の外周
部に滴下し、高速回転させる所までは実施例１と同様で
あるが、高速回転中にディスク基板２に気体を吹き付け
るためのノズルは、実施例１と同様なディスク基板２の
内周側から外周側に向かって気体が吹き付けられるよう
なノズル４の他に、ディスク基板２の端面に気体が吹き
付けられるような角度に設定された吹き出しノズル５が
設けられており、双方から窒素を吹き付ける。前記ノズ
ル５は図４においては樹脂層端面の斜め上方から、図５
においては斜め下方から吹き付けるように設置されてい
る。In the manufacturing method of this embodiment, the resin is dropped on the outer peripheral portion of the disk substrate 2 on the spinner table rotating at a low speed and is rotated at a high speed in the same manner as in the first embodiment, but during the high speed rotation. In addition to the nozzle 4 for blowing gas toward the outer peripheral side from the inner peripheral side of the disc substrate 2 similar to the first embodiment, the nozzle for blowing gas onto the disc substrate 2 is provided on the end surface of the disc substrate 2. A blowing nozzle 5 is provided which is set at an angle such that gas is blown, and nitrogen is blown from both sides. The nozzle 5 is shown in FIG.
In, it is installed so as to spray from diagonally below.
【００２０】図４、図５のどちらの例においても、ノズ
ル４からの窒素圧力が２〜３kg/cm2の時、樹脂層盛り上
がり部の膜厚が３〜５μmとなる。又、ノズル５からは
圧力２〜３kg/cm2で窒素を吹き付けることにより、ディ
スク基板２の端面へ回り込んだ樹脂層も５μm程度にな
り、剥離防止の点からも見栄えの点からも更に良好なデ
ィスクを製造することができる。In both examples of FIGS. 4 and 5, when the nitrogen pressure from the nozzle 4 is 2 to 3 kg / cm 2 , the film thickness of the resin layer rising portion is 3 to 5 μm. Further, by blowing nitrogen from the nozzle 5 at a pressure of 2 to 3 kg / cm 2 , the resin layer wrapping around the end surface of the disk substrate 2 is also about 5 μm, which is even better from the standpoint of peeling prevention and appearance. Discs can be manufactured.
【００２１】[0021]
【発明の効果】以上述べてきたように、本発明の樹脂層
の製造方法では、樹脂層端部の膜厚の増加を抑えること
ができ、その結果、樹脂層端部での下地からの樹脂の剥
離や、樹脂層、下地層の腐食を防ぐことができ、信頼性
に優れた高品質の樹脂層を得ることができる。As described above, according to the method for producing a resin layer of the present invention, it is possible to suppress an increase in the film thickness at the resin layer end portion, and as a result, the resin from the base at the resin layer end portion can be suppressed. It is possible to prevent peeling of the resin and corrosion of the resin layer and the underlayer, and it is possible to obtain a high-quality resin layer having excellent reliability.
【００２２】また、樹脂層端面への樹脂の回り込みが抑
えられ、外観上きれいな樹脂層を得ることができる。Further, the resin is prevented from wrapping around the end face of the resin layer, and a resin layer having a clean appearance can be obtained.
【図１】本発明の実施例の樹脂層の形成方法の概略説明
図である。FIG. 1 is a schematic explanatory view of a resin layer forming method according to an embodiment of the present invention.
【図２】本発明の実施例で作製した光磁気ディスクの外
周部分の概略説明図である。FIG. 2 is a schematic explanatory view of an outer peripheral portion of a magneto-optical disk manufactured in an example of the present invention.
【図３】本発明の実施例において、吹き付ける窒素の圧
力と盛り上がり部分の膜厚との関係を示した図である。FIG. 3 is a diagram showing a relationship between a pressure of nitrogen to be sprayed and a film thickness of a raised portion in an example of the present invention.
【図４】本発明の他の実施例の樹脂層の形成方法の概略
説明図である。FIG. 4 is a schematic explanatory diagram of a method for forming a resin layer according to another embodiment of the present invention.
【図５】本発明の他の実施例の樹脂層の形成方法の概略
説明図である。FIG. 5 is a schematic explanatory view of a resin layer forming method according to another embodiment of the present invention.
【図６】従来の製造方法で作成された光磁気ディスクの
外周部分の概略説明図である。FIG. 6 is a schematic explanatory view of an outer peripheral portion of a magneto-optical disk created by a conventional manufacturing method.
１ スピンナーテーブル ２ ディスク基板 ３ 樹脂層 ４ 気体吹き付け用ノズル ５ 気体吹き付け用ノズル 1 Spinner Table 2 Disk Substrate 3 Resin Layer 4 Gas Spraying Nozzle 5 Gas Spraying Nozzle
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｈ０１Ｌ 21/027 (72)発明者 太田 賢司 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Internal reference number FI Technical location H01L 21/027 (72) Inventor Kenji Ota 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Prefecture Sharp Shares In the company
Claims (1)
において、樹脂滴下後のスピンナー回転中に、樹脂層外
周部近傍に気体を吹き付けながら、樹脂層形成を行うこ
とを特徴とする樹脂層の形成方法。1. A method for producing a resin layer by a spin coating method, wherein the resin layer is formed while blowing a gas near the outer peripheral portion of the resin layer during rotation of the spinner after dropping the resin. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4062746A JP2939040B2 (en) | 1992-03-19 | 1992-03-19 | Method of forming resin layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4062746A JP2939040B2 (en) | 1992-03-19 | 1992-03-19 | Method of forming resin layer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05266472A true JPH05266472A (en) | 1993-10-15 |
| JP2939040B2 JP2939040B2 (en) | 1999-08-25 |
Family
ID=13209276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4062746A Expired - Lifetime JP2939040B2 (en) | 1992-03-19 | 1992-03-19 | Method of forming resin layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2939040B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007173360A (en) * | 2005-12-20 | 2007-07-05 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus and substrate treatment method |
| US7790262B2 (en) | 2005-11-15 | 2010-09-07 | Canon Kabushiki Kaisha | Optical recording medium and method for manufacturing the same |
| JP2011100538A (en) * | 2010-11-29 | 2011-05-19 | Toshiba Corp | Method for manufacturing magnetic recording medium |
| US8070968B2 (en) | 2009-03-13 | 2011-12-06 | Kabushiki Kaisha Toshiba | Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| US8173029B2 (en) | 2009-03-18 | 2012-05-08 | Kabushiki Kaisha Toshiba | Magnetic recording medium manufacturing method |
| US8372575B2 (en) | 2009-03-13 | 2013-02-12 | Kabushiki Kaisha Toshiba | Ultraviolet-curing resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| JP2014080000A (en) * | 2012-10-18 | 2014-05-08 | Fujitsu Ltd | Imprint apparatus and imprint method |
| WO2016152308A1 (en) * | 2015-03-25 | 2016-09-29 | 株式会社Ｓｃｒｅｅｎホールディングス | Coating method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62160171A (en) * | 1986-01-10 | 1987-07-16 | Rohm Co Ltd | Method for coating resin |
| JPS6447474A (en) * | 1987-08-19 | 1989-02-21 | Fujitsu Ltd | Method for applying high-viscosity resin |
-
1992
- 1992-03-19 JP JP4062746A patent/JP2939040B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62160171A (en) * | 1986-01-10 | 1987-07-16 | Rohm Co Ltd | Method for coating resin |
| JPS6447474A (en) * | 1987-08-19 | 1989-02-21 | Fujitsu Ltd | Method for applying high-viscosity resin |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7790262B2 (en) | 2005-11-15 | 2010-09-07 | Canon Kabushiki Kaisha | Optical recording medium and method for manufacturing the same |
| JP2007173360A (en) * | 2005-12-20 | 2007-07-05 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus and substrate treatment method |
| JP4698407B2 (en) * | 2005-12-20 | 2011-06-08 | 大日本スクリーン製造株式会社 | Substrate processing apparatus and substrate processing method |
| US8070968B2 (en) | 2009-03-13 | 2011-12-06 | Kabushiki Kaisha Toshiba | Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| US8372575B2 (en) | 2009-03-13 | 2013-02-12 | Kabushiki Kaisha Toshiba | Ultraviolet-curing resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| US8551685B2 (en) | 2009-03-13 | 2013-10-08 | Kabushiki Kaisha Toshiba | Ultraviolet-curing resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| US8173029B2 (en) | 2009-03-18 | 2012-05-08 | Kabushiki Kaisha Toshiba | Magnetic recording medium manufacturing method |
| JP2011100538A (en) * | 2010-11-29 | 2011-05-19 | Toshiba Corp | Method for manufacturing magnetic recording medium |
| JP2014080000A (en) * | 2012-10-18 | 2014-05-08 | Fujitsu Ltd | Imprint apparatus and imprint method |
| WO2016152308A1 (en) * | 2015-03-25 | 2016-09-29 | 株式会社Ｓｃｒｅｅｎホールディングス | Coating method |
| US10569297B2 (en) | 2015-03-25 | 2020-02-25 | SCREEN Holdings Co., Ltd. | Coating method |
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| Publication number | Publication date |
|---|---|
| JP2939040B2 (en) | 1999-08-25 |
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