JPH05258279A - Magnetic recording medium and its production - Google Patents

Magnetic recording medium and its production

Info

Publication number
JPH05258279A
JPH05258279A JP35761792A JP35761792A JPH05258279A JP H05258279 A JPH05258279 A JP H05258279A JP 35761792 A JP35761792 A JP 35761792A JP 35761792 A JP35761792 A JP 35761792A JP H05258279 A JPH05258279 A JP H05258279A
Authority
JP
Japan
Prior art keywords
nickel
boron
magnetic
platinum
coercive force
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP35761792A
Other languages
Japanese (ja)
Inventor
Makoto Imagawa
誠 今川
Kenro Miyamura
賢郎 宮村
Michinobu Suekane
通信 末包
Chien Tsu
チェン ツ
Tomu Yamashita Tsutomu
トム ヤマシタ ツトム
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of JPH05258279A publication Critical patent/JPH05258279A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To improve the coercive force by adding specified elements to a cobalt-nickel-chromium-platinum magnetic film. CONSTITUTION:A magnetic layer containing at least one of nickel and chromium, and cobalt, platinum and boron is formed on a nonmagnetic substrate having a nonmagnetic base layer essentially comprising nickel and phosphorus formed by sputtering. The nickel-phosphorus base layer has an effect to form a desired microstructure and shape of the crystal structure of the magnetic film. The magnetic layer thus formed on the nickelphosphorus base layer shows isotropic magnetic characteristics in the plane direction without influenced by the shape and direction of the texture. Thereby, the obtd. magnetic recording medium has high coercive force even with fine texture, since the magnetic layer is not influenced by the structure of the texture.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁気ディスク装置など
の磁気記録媒体に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium such as a magnetic disk device.

【0002】[0002]

【従来の技術】高密度記録を達成するには、高い保磁力
と大きな信号対雑音比(S/N比)を持つ磁気記録媒体
と、そのような高保磁力を持つ媒体に消去・書き込みが
できるヘッドが必要となる。近年、ヘッドの材質が改良
され、またヘッド浮上量が低下して、高い保磁力(18
00 Oe以上)を持つ磁気記録媒体を用いて高密度の
磁気記録を実現することが可能となってきた。これまで
に報告されている高い保磁力を持つ磁気記録媒体とし
て、例えば、特開平3−49021号に、Cr層上にC
oCrNiBを負の基板バイアスをかけて製造すること
が示されているが、保磁力は2000 Oe以下に止ま
っている。
2. Description of the Related Art In order to achieve high density recording, a magnetic recording medium having a high coercive force and a large signal-to-noise ratio (S / N ratio), and erasing / writing on such a medium having a high coercive force are possible. A head is needed. In recent years, the material of the head has been improved, and the flying height of the head has decreased, resulting in a high coercive force (18
It has become possible to realize high-density magnetic recording using a magnetic recording medium having a magnetic field density of at least 00 Oe. As a magnetic recording medium having a high coercive force that has been reported so far, for example, Japanese Patent Laid-Open No. 3-49021 discloses C on a Cr layer.
It has been shown that oCrNiB is manufactured by applying a negative substrate bias, but the coercive force remains below 2000 Oe.

【0003】また、Cr/CoCrPtBで約2500
Oeの保磁力を得た例も報告されている(第14回日
本応用磁気学会学術講演概要集 29頁 1990年1
0月)が、Cr膜を下地膜とする系では、高保磁力を得
るために高温(300℃)での基板加熱、−200Vと
いう高い基板バイアス電圧が必要であるので、生産の安
定性や歩留まりがよくないという問題点がある。
In addition, Cr / CoCrPtB is about 2500
An example of obtaining the coercive force of Oe has also been reported (Proceedings of the 14th Annual Meeting of the Applied Magnetics Society of Japan, page 29, 1990, 1
(October) However, in a system using a Cr film as a base film, substrate heating at a high temperature (300 ° C.) and a high substrate bias voltage of −200 V are required to obtain a high coercive force, and therefore production stability and yield are improved. There is a problem that is not good.

【0004】一方、今後の高記録密度化に対応するに
は、ヘッドの浮上高さを下げなければならない。このた
めには、テクスチャーをより微細なファインテクスチャ
ーにしなければならない。ところが、Cr/CoCrP
tB系の場合には基板上の同心円状のテクスチャー形状
を利用して、その円周方向に磁化の方向を揃えることに
よって、保磁力や記録特性を向上させているので、この
テクスチャーが微細になると高い保磁力や十分な記録特
性を得ることができない(図8参照)。また、テクスチ
ャーが微細になるとヘッドとディスクとの機械的摺動特
性(CSS性能)が劣化するので、テクスチャーを微細
化する際にはテクスチャー形状も重要な因子となる。
On the other hand, the flying height of the head must be lowered in order to cope with the future increase in recording density. For this purpose, the texture must be made finer and finer. However, Cr / CoCrP
In the case of the tB system, the coercive force and the recording characteristics are improved by utilizing the concentric circular texture shape on the substrate and aligning the direction of magnetization in the circumferential direction, so that this texture becomes fine. High coercive force and sufficient recording characteristics cannot be obtained (see FIG. 8). Further, when the texture becomes fine, the mechanical sliding property (CSS performance) between the head and the disk deteriorates, so the texture shape is also an important factor when making the texture fine.

【0005】すなわち、テクスチャーをその形態によっ
て、溝状テクスチャーと多数の独立した山からなるテク
スチャー(以下山状テクスチャーという)に分類したと
き、良好なCSS性能を得るためには山状テクスチャー
のほうが一般的には優れているといえる。ところが、C
r/CoCrPtB系の場合には前述のように、基板上
の同心円状のテクスチャー形状を利用して、保磁力や記
録特性を向上させているので、このような山状テクスチ
ャーを有する基板あるいはテクスチャーの全くない基板
に対しては高い保磁力や良好な磁気記録特性が得られな
い。つまり、これまでに提案されているCr/CoCr
PtB系では良好な記録特性と良好な機械特性を両立す
ることが難しい。
That is, when the texture is classified into a groove-like texture and a texture composed of a large number of independent mountains (hereinafter referred to as a mountain-like texture) according to its form, the mountain-like texture is generally more preferable in order to obtain good CSS performance. Can be said to be excellent. However, C
In the case of the r / CoCrPtB system, as described above, the concentric circular texture shape on the substrate is used to improve the coercive force and the recording characteristics. A high coercive force and good magnetic recording characteristics cannot be obtained for a substrate that does not have at all. In other words, the Cr / CoCr proposed so far
In the PtB system, it is difficult to achieve both good recording characteristics and good mechanical characteristics.

【0006】[0006]

【発明が解決しようとする課題】本発明は、上述の課題
を解決しようとしてなされたものであり、ファインな山
状のテクスチャーに対しても高保磁力、高S/N比がオ
ーバーライト(上書き)特性を犠牲にすることなく得ら
れ、しかも耐食性など総合的な特性に優れた磁気記録媒
体を得ることを目的とするものである。
SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems and has a high coercive force and a high S / N ratio that is overwritten (overwritten) even with fine mountain-like textures. It is an object of the present invention to obtain a magnetic recording medium which can be obtained without sacrificing the characteristics and which is excellent in overall characteristics such as corrosion resistance.

【0007】[0007]

【課題を解決するための手段】本発明は、前述の課題を
解決すべくなされたものであり、スパッタ法により形成
したニッケルとリンを主成分とする非磁性下地層を有す
る非磁性基板の該非磁性下地層の上に、ニッケルおよび
クロムのうち少なくとも一種とコバルト、白金およびホ
ウ素を含む磁性層を形成してなることを特徴とする磁気
記録媒体を提供するものである。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and it is a non-magnetic substrate having a non-magnetic underlayer containing nickel and phosphorus as main components formed by a sputtering method. A magnetic recording medium comprising a magnetic underlayer on which a magnetic layer containing at least one of nickel and chromium and cobalt, platinum and boron is formed.

【0008】また本発明は、スパッタ法により形成した
ニッケルとホウ素を主成分とする非磁性下地層を有する
非磁性基板の該非磁性下地層の上に、ニッケルおよびク
ロムのうち少なくとも一種とコバルト、白金およびホウ
素を含む磁性層を形成してなることを特徴とする磁気記
録媒体を提供するものである。
According to the present invention, at least one of nickel and chromium and cobalt or platinum is formed on the nonmagnetic underlayer of the nonmagnetic substrate having the nonmagnetic underlayer containing nickel and boron as main components formed by the sputtering method. A magnetic recording medium comprising a magnetic layer containing boron and boron.

【0009】本発明において、スパッタ法により形成し
たニッケルとリンを主成分とする非磁性下地層またはス
パッタ法により形成したニッケルとホウ素を主成分とす
る非磁性下地層の上に形成された前記磁性層中に原子%
で、ニッケルが3〜10%、白金が8〜15%、ホウ素
が0.5〜6%およびコバルトが65〜80%含まれる
ことを特徴とする。
In the present invention, the magnetic layer formed on a non-magnetic underlayer containing nickel and phosphorus as main components formed by sputtering or a non-magnetic underlayer containing nickel and boron as main components formed by sputtering. Atomic% in layers
In addition, nickel is contained in an amount of 3 to 10%, platinum is included in an amount of 8 to 15%, boron is included in an amount of 0.5 to 6%, and cobalt is included in an amount of 65 to 80%.

【0010】また本発明において、スパッタ法により形
成したニッケルとリンを主成分とする非磁性下地層また
はスパッタ法により形成したニッケルとホウ素を主成分
とする非磁性下地層の上に形成された前記磁性層中に原
子%で、ニッケルが3〜10%、クロムが3〜15%、
白金が8〜15%、ホウ素が0.5〜6%およびコバル
トが65〜80%含まれることを特徴とする。
In the present invention, the non-magnetic underlayer containing nickel and phosphorus as main components formed by sputtering or the nonmagnetic underlayer containing nickel and boron as main components formed by sputtering is preferably formed on the nonmagnetic underlayer. In the magnetic layer, in atomic%, nickel is 3 to 10%, chromium is 3 to 15%,
It is characterized by containing 8 to 15% of platinum, 0.5 to 6% of boron and 65 to 80% of cobalt.

【0011】また、本発明は前記磁性層中に添加元素と
してTi,Zr,Ta,MoおよびWのうちから選ばれ
る一種を、原子%で0.5〜6%含むことを特徴とす
る。
Further, the present invention is characterized in that the magnetic layer contains 0.5 to 6% in atomic% of one element selected from Ti, Zr, Ta, Mo and W as an additive element.

【0012】また本発明は、非磁性基板上にスパッタ法
により、ニッケルとリンまたはニッケルとホウ素を主成
分とする非磁性下地層を形成し、該非磁性下地層の上に
ニッケルおよびクロムのうち少なくとも一種とコバル
ト、白金およびホウ素を含む磁性層を順次形成すること
を特徴とする磁気記録媒体の製造方法を提供するもので
ある。
Further, according to the present invention, a nonmagnetic underlayer containing nickel and phosphorus or nickel and boron as main components is formed on a nonmagnetic substrate by a sputtering method, and at least nickel and chromium are formed on the nonmagnetic underlayer. The present invention provides a method for manufacturing a magnetic recording medium, which comprises sequentially forming a magnetic layer containing one kind and cobalt, platinum and boron.

【0013】本発明における磁性層(磁性膜ともいう)
は、CoNiPtB系、CoNiCrPtB系またはC
oCrPtB系である。
Magnetic layer (also referred to as magnetic film) in the present invention
Is a CoNiPtB system, a CoNiCrPtB system or C
oCrPtB system.

【0014】本発明において、非磁性基板と前記非磁性
下地層(下地膜ともいう)の間に必要に応じて所要の中
間層を設けることができる。例えば、ガラス基板上に基
板への付着力を高めるためにおよそ100〜500Å程
度の厚さのCr層を設けることができる。ただし、この
Cr層は、前記非磁性下地層(NiP,NiB)の存在
のために記録再生特性には何の影響も及ぼすことはな
い。
In the present invention, a required intermediate layer may be provided between the non-magnetic substrate and the non-magnetic underlayer (also referred to as an underlayer), if necessary. For example, a Cr layer having a thickness of about 100 to 500 Å can be provided on the glass substrate in order to enhance the adhesion to the substrate. However, the Cr layer does not affect the recording / reproducing characteristics due to the existence of the non-magnetic underlayer (NiP, NiB).

【0015】つまり、スパッタ法により形成されたニッ
ケル、リンまたはニッケル、ホウ素を主成分とする下地
膜は粒構造からなるが、その粒は、ほとんどアモルファ
スであって、膜の厚さは、その下側にある基板表面の状
態や付着力改善のための層、例えばCr層の存在が磁性
層に影響を及ぼすのを阻止するのに十分な厚さ(例えば
5〜200nm)を有する。しかも、スパッタされたニ
ッケル−リン層またはニッケル−ホウ素層は磁性層の核
形成および結晶成長を制御できるような再現性を有し、
かつ粒径の分布が場所によらない均一な表面を有する下
地層として形成される。
That is, the underlying film mainly composed of nickel, phosphorus or nickel, boron formed by the sputtering method has a grain structure, but the grains are almost amorphous, and the thickness of the film is below that. It has a sufficient thickness (for example, 5 to 200 nm) to prevent the state of the substrate surface on the side and the presence of a layer for improving the adhesive force, for example, a Cr layer, from affecting the magnetic layer. Moreover, the sputtered nickel-phosphorus layer or nickel-boron layer has reproducibility such that nucleation and crystal growth of the magnetic layer can be controlled,
In addition, it is formed as an underlayer having a uniform surface whose particle size distribution does not depend on the location.

【0016】したがって、このニッケル−リン下地層ま
たはニッケル−ホウ素下地層は、磁性膜の結晶構造が所
望のマイクロ構造および形態を有するようにする働きを
有し、ニッケル−リン層またはニッケル−ホウ素層を下
地層とする本磁性層はテクスチャーの形状、方向に影響
を受けず、面内で等方的な磁気特性を示す。その結果、
本発明になる磁気記録媒体はテクスチャーの構造に左右
されずにファインなテクスチャーでも高い保持力を得る
ことができる。
Therefore, the nickel-phosphorus underlayer or the nickel-boron underlayer has a function of making the crystal structure of the magnetic film have a desired microstructure and morphology, and thus the nickel-phosphorus layer or the nickel-boron layer. The present magnetic layer, which has an underlayer of, is not affected by the shape and direction of the texture, and exhibits in-plane isotropic magnetic characteristics. as a result,
The magnetic recording medium according to the present invention can obtain a high coercive force even with a fine texture without being influenced by the texture structure.

【0017】上記ニッケル−リン下地層は原子比でNi
5 P〜Ni2 P(重量%でリンが約10〜20%)の範
囲の組成を有し、典型的にはNi3 P(重量%でリンが
約10〜15%)で表される。また、上記ニッケル−ホ
ウ素下地層は原子比でNi8020〜Ni5050の範囲の
組成を有し、典型的にはNi7525で表される。
The nickel-phosphorus underlayer is Ni in atomic ratio.
It has a composition in the range of 5 P to Ni 2 P (wt% about 10 to 20% phosphorus), and is typically represented by Ni 3 P (wt% about 10 to 15% phosphorus). The nickel-boron underlayer has a composition in the atomic ratio of Ni 80 B 20 to Ni 50 B 50 , and is typically represented by Ni 75 B 25 .

【0018】この2種類の下地膜を比較すると、NiB
膜の方がNiP膜よりも構成する粒の粒径が細かい。こ
のため表3に示されているように、CoNiCrPtB
の磁性膜と組み合わせた場合、S/N比の観点からはN
iB膜の方が優れている。
Comparing these two types of base films, NiB
The grain size of the film is smaller than that of the NiP film. Therefore, as shown in Table 3, CoNiCrPtB
From the viewpoint of S / N ratio when combined with the magnetic film of
The iB film is superior.

【0019】磁性層中の各元素の作用として、ニッケル
の組成範囲は3〜10%であるが、3%より少ないと保
磁力の増加が少なく、10%より多い場合では保磁力は
一定となるためである。クロムの組成範囲は3〜15%
であるが、3%より少ないと耐蝕性が悪く、15%より
多いと飽和磁化の低下、保磁力の低下をまねくためであ
る。白金の組成範囲は8〜15%であるが、8%より少
ないと保磁力の増加が少なく、15%より多い場合で
は、飽和磁化の低下をまねくためである。
As a function of each element in the magnetic layer, the composition range of nickel is 3 to 10%, but if it is less than 3%, the increase in coercive force is small, and if it is more than 10%, the coercive force becomes constant. This is because. Chromium composition range is 3 to 15%
However, if it is less than 3%, the corrosion resistance is poor, and if it is more than 15%, the saturation magnetization and the coercive force are lowered. The composition range of platinum is 8 to 15%, but if it is less than 8%, the coercive force does not increase much, and if it is more than 15%, the saturation magnetization decreases.

【0020】また、磁性層中のホウ素にも磁性粒子を微
細にする働きがあり、このため磁性粒子が単磁区粒子の
大きさに近づく作用を有し、その結果高い保磁力が得ら
れると同時に粒間の分離が促進されて高いS/N比が得
られると考えられる。このような効果が認められるホウ
素の組成範囲は0.5〜6原子%であるが、より好まし
くは1.5〜3.5原子%の範囲である。ホウ素の割合
が0.5原子%より少ないと高い保磁力を得る効果が不
十分であり、6原子%より多い場合は粒径が小さくなり
すぎてその結果やはり高い保磁力が得られない。
Further, boron in the magnetic layer also has a function of making the magnetic particles fine, and therefore, the magnetic particles have an effect of approaching the size of single domain particles, and as a result, a high coercive force can be obtained. It is considered that separation between grains is promoted and a high S / N ratio is obtained. The composition range of boron in which such an effect is recognized is 0.5 to 6 atom%, and more preferably 1.5 to 3.5 atom%. If the proportion of boron is less than 0.5 atom%, the effect of obtaining a high coercive force is insufficient, and if it is more than 6 atom%, the particle size becomes too small, and as a result, a high coercive force cannot be obtained.

【0021】一方、このようなB添加による弊害として
角形性(S,S* )の劣化が考えられる。ここで、S=
Mr/Ms(Msは飽和磁化、Mrは残留磁化である)
であり、S* は保磁力角形比と呼ばれるものである。一
般的に、粒間分離により保磁力を増加しようとすると
S,S* が小さくなって記録再生時のオーバーライト特
性が劣化する。これを阻止するには、つまり、高い保磁
力を保ったまま、高いS,S* を得るには、さらに新た
な元素を添加することが有効であることを見いだした。
即ち、該磁性膜に対してさらに、Ti,Zr,Ta,M
o,Wなどの高融点金属の中の一種を、0.5〜6原子
%加えることによりS,S* の減少が抑えられる。例え
ば、CoNiPtB系にTiを添加する場合、0.5〜
3原子%がより好ましい範囲であり、Zrを添加する場
合に、0.5〜2原子%がより好ましい範囲である。
On the other hand, deterioration of the squareness (S, S * ) is considered as an adverse effect due to the addition of B. Where S =
Mr / Ms (Ms is saturation magnetization, Mr is remanent magnetization)
And S * is what is called the coercive force squareness ratio. Generally, if an attempt is made to increase the coercive force due to the separation between grains, S and S * will be small, and the overwrite characteristic at the time of recording and reproduction will be deteriorated. It has been found that in order to prevent this, that is, in order to obtain high S and S * while maintaining high coercive force, it is effective to add a new element.
That is, Ti, Zr, Ta, M is further added to the magnetic film.
The addition of 0.5 to 6 atomic% of one of refractory metals such as o and W suppresses the reduction of S and S * . For example, when Ti is added to the CoNiPtB system, 0.5 to
3 atomic% is a more preferable range, and when Zr is added, 0.5 to 2 atomic% is a more preferable range.

【0022】即ち、本発明は非磁性基板の上方にスパッ
タ法により形成された前記ニッケルとリンまたはニッケ
ルとホウ素を主成分とする下地層と該下地層に隣接して
スパッタ法により形成された前記磁性層とからなること
を特徴とするものである。
That is, according to the present invention, the underlayer mainly composed of nickel and phosphorus or nickel and boron formed above the non-magnetic substrate by the sputtering method, and the underlayer formed adjacent to the underlayer by the sputtering method. And a magnetic layer.

【0023】[0023]

【実施例】以下、本発明を実施例によって詳細に説明す
るが、本発明はこれらの実施例に限定されるものではな
い。
EXAMPLES The present invention will now be described in detail with reference to examples, but the present invention is not limited to these examples.

【0024】図1において、磁気記録媒体の非磁性基板
1として外径95mm、内径25mm、厚み1.27m
mのドーナツ状アルミニウム円板を準備し、該基板表面
をラッピングした。次にこの基板1の上に非磁性金属層
として無電解メッキ法でニッケル−リンからなる厚さ1
0μmの硬質層2を設け、該硬質層を鏡面にポリッシン
グし通常手段によりテクスチャーを形成した。
In FIG. 1, the non-magnetic substrate 1 of the magnetic recording medium has an outer diameter of 95 mm, an inner diameter of 25 mm, and a thickness of 1.27 m.
A donut-shaped aluminum disk of m was prepared and the surface of the substrate was lapped. Next, a nonmagnetic metal layer having a thickness of 1 made of nickel-phosphorus is formed on the substrate 1 by electroless plating.
A hard layer 2 having a thickness of 0 μm was provided, the hard layer was polished to a mirror surface, and a texture was formed by a usual means.

【0025】次に、この無電解ニッケル−リンの硬質層
2の上にニッケル−リンまたはニッケル−ホウ素のスパ
ッタを行い、ニッケル−リンまたはニッケル−ホウ素か
らなる非磁性層下地層3を形成した。次に、このニッケ
ル−リン下地層またはニッケル−ホウ素下地層の上に磁
性層4としてコバルト−ニッケル−白金−ホウ素、また
はコバルト−ニッケル−クロム−白金−ホウ素をスパッ
タした。次に、保護膜5として膜厚約250Åのカーボ
ン膜をスパッタにより形成した。最後に、該カーボン膜
の上に約30Å厚の液体潤滑層を形成して得られた試料
の電磁変換特性の測定を行った。
Then, nickel-phosphorus or nickel-boron was sputtered on the hard layer 2 of electroless nickel-phosphorus to form a nonmagnetic underlayer 3 made of nickel-phosphorus or nickel-boron. Next, cobalt-nickel-platinum-boron or cobalt-nickel-chromium-platinum-boron was sputtered as the magnetic layer 4 on the nickel-phosphorus underlayer or the nickel-boron underlayer. Next, a carbon film having a thickness of about 250 Å was formed as the protective film 5 by sputtering. Finally, the electromagnetic conversion characteristics of the sample obtained by forming a liquid lubricating layer having a thickness of about 30Å on the carbon film were measured.

【0026】以下実施例1〜5において、試料は何れも
硬質層2としてニッケル−リン無電解メッキ層を、保護
膜5としてカーボンスパッタ膜を有し、非磁性下地層3
と磁性層4の組成を変化させた。スパッタはCo−Ni
−PtまたはCoNiCrPtターゲットとCoBター
ゲットとを用いるコスパッタ法を用いた。
In the following Examples 1 to 5, each of the samples has a nickel-phosphorus electroless plating layer as the hard layer 2 and a carbon sputtered film as the protective film 5, and has a non-magnetic underlayer 3
The composition of the magnetic layer 4 was changed. Sputter is Co-Ni
-A co-sputtering method using a Pt or CoNiCrPt target and a CoB target was used.

【0027】[実施例1]前記組成比のニッケル−リン
下地膜上にホウ素の含有量を変えてコバルト−ニッケル
−白金−ホウ素磁性膜を形成し、保磁力を測定した。ホ
ウ素含有量に対する保磁力の変化を図2(a)に、ホウ
素含有量に対する角形比(S,S* )の変化を図2
(b)に示す。ホウ素濃度約2原子%のときに保磁力が
最大となり、ホウ素なしの場合より約600 Oeの増
加が認められた。しかし、このとき角形比(S,S*
は少し減少している。最大のHC の得られる2原子%の
ホウ素を添加した磁性膜の耐食性能を0.62%HNO
3 中へ浸漬した場合の飽和磁化の減少により評価した。
図3に示すように2原子%のホウ素添加により耐食性も
改善されている。コバルト−ニッケル−白金磁性膜に2
原子%のホウ素を添加したときと、全くホウ素を添加し
ないときのS/N比の比較を表1に示す。ホウ素添加に
よりS/N比も著しく改善されている。
[Example 1] Cobalt-nickel-platinum-boron magnetic films were formed on the nickel-phosphorus base film having the above composition ratio while changing the boron content, and the coercive force was measured. Fig. 2 (a) shows the change in coercive force with respect to the boron content, and Fig. 2 shows the change in the squareness ratio (S, S * ) with respect to the boron content.
It shows in (b). The maximum coercive force was obtained when the boron concentration was about 2 atomic%, and an increase of about 600 Oe was observed as compared with the case without boron. However, at this time, the squareness ratio (S, S * )
Is a little decreasing. Corrosion resistance of the magnetic film containing 2 atomic% of boron, which gives the maximum H C , of 0.62% HNO
It was evaluated by the decrease in saturation magnetization when immersed in 3 .
As shown in FIG. 3, the corrosion resistance is also improved by adding 2 atomic% of boron. 2 for cobalt-nickel-platinum magnetic film
Table 1 shows a comparison of the S / N ratios when the atomic% boron was added and when no boron was added. The S / N ratio is also significantly improved by adding boron.

【0028】[0028]

【表1】 [Table 1]

【0029】[実施例2]前記組成比のニッケル−リン
下地膜上にチタンの含有量を変えて(Co78Ni8 Pt
1221-x Tix (x=0〜4.3)で表わされるコ
バルト−ニッケル−白金−ホウ素−チタン磁性膜を形成
し、保磁力と角形比(S,S* )を測定した。チタン含
有量に対する両者の変化をそれぞれ図4(a),(b)
に示す。保磁力の増加は顕著でないが、S,S* の増加
は著しく、チタン添加の効果がはっきり認められる。
Example 2 The content of titanium was changed on the nickel-phosphorus base film having the above composition ratio (Co 78 Ni 8 Pt).
Cobalt-nickel-platinum-boron-titanium magnetic film represented by 12 B 2 ) 1-x Ti x (x = 0 to 4.3) was formed, and coercive force and squareness ratio (S, S * ) were measured. .. The changes of both with respect to the titanium content are shown in FIGS.
Shown in. The increase in coercive force is not remarkable, but the increase in S and S * is remarkable, and the effect of titanium addition is clearly recognized.

【0030】[実施例3]前記組成比のニッケル−リン
下地膜上にジルコニウムの含有量を変えて(Co78Ni
8 Pt1221-x Zrx (x=0〜4.3)で表わさ
れるコバルト−ニッケル−白金−ホウ素−ジルコニウム
磁性膜を形成し、保磁力と角形比(S,S * )を測定し
た。ジルコニウム含有量に対する両者の変化をそれぞれ
図5(a),(b)に示す。保磁力の増加はほとんど見
られないが、S,S* は増加しておりジルコニウム添加
の効果が認められる。
[Example 3] Nickel-phosphorus having the above composition ratio
By changing the content of zirconium on the base film (Co78Ni
8 Pt12B2 )1-x Zrx Represented by (x = 0 to 4.3)
Cobalt-nickel-platinum-boron-zirconium
A magnetic film is formed, and coercive force and squareness ratio (S, S * ) Is measured
It was The changes of both with respect to the zirconium content
5 (a) and 5 (b). Almost no increase in coercive force
No, but S, S* Is increasing and zirconium addition
The effect of is recognized.

【0031】[実施例4]前記組成比のニッケル−リン
下地膜上にホウ素の含有量を変えてコバルト−ニッケル
−クロム−白金−ホウ素磁性膜を形成し、保磁力を測定
した。ホウ素含有量に対する保磁力の変化を図6に示
す。ホウ素濃度約2原子%のときに保磁力が最大とな
り、約900 Oeの増加が認められた。このときの耐
食性能を0.62%HNO3 中へ浸漬した場合の飽和磁
化の減少により評価した。図7に示すようにホウ素添加
により耐食性も改善されている。コバルト−ニッケル−
クロム−白金磁性膜に2原子%のホウ素を添加したとき
と、ホウ素を全く添加しないときの電磁変換特性の比較
を表2に示す。ホウ素添加により電磁変換特性が総合的
に著しく改善されている。
[Example 4] Cobalt-nickel-chromium-platinum-boron magnetic films were formed on the nickel-phosphorus base film having the above composition ratio while varying the boron content, and the coercive force was measured. The change in coercive force with respect to the boron content is shown in FIG. When the boron concentration was about 2 atomic%, the coercive force became maximum, and an increase of about 900 Oe was observed. The corrosion resistance at this time was evaluated by the reduction of the saturation magnetization when immersed in 0.62% HNO 3 . As shown in FIG. 7, the corrosion resistance is also improved by adding boron. Cobalt-Nickel-
Table 2 shows a comparison of electromagnetic conversion characteristics when 2 atomic% of boron was added to the chromium-platinum magnetic film and when no boron was added at all. Electromagnetic conversion characteristics are significantly improved overall by adding boron.

【0032】[0032]

【表2】 [Table 2]

【0033】[実施例5]表面粗さの大きさRaを変化
させたテクスチャー基板を準備し、該基板を用いて前記
組成比のニッケル−リン下地膜上にコバルト−ニッケル
−クロム−白金−ホウ素の磁性膜、前記組成比のニッケ
ル−ホウ素下地膜上にコバルト−ニッケル−クロム−白
金−ホウ素の磁性膜を形成した試料とクロム下地膜(5
00Å厚)上にコバルト−クロム−白金−ホウ素の磁性
膜を形成した試料をつくった。それらについて表面粗さ
の変化に対応した保磁力の変化を図8に示す。クロム下
地膜の場合、表面粗さ、すなわちテクスチャー条件によ
って磁気特性が大きく影響されるが、ニッケル−リン下
地膜およびニッケル−ホウ素下地膜の場合には、保磁力
はテクスチャー条件によらず一定で、しかも高い保磁力
が得られる。また、表面粗さRaが34Åの基板を用
い、保磁力を1800 Oeに合わせたときのS/N比
を比較した結果を表3に示す。クロム下地膜に比べてニ
ッケル−ホウ素下地膜によりS/N比が大きく改善され
ている。
[Embodiment 5] A textured substrate having a surface roughness Ra changed was prepared, and cobalt-nickel-chromium-platinum-boron was formed on the nickel-phosphorus base film having the above composition ratio using the substrate. Magnetic film, a sample in which a cobalt-nickel-chromium-platinum-boron magnetic film is formed on the nickel-boron underlayer having the above composition ratio, and a chromium underlayer (5
A sample was prepared by forming a magnetic film of cobalt-chromium-platinum-boron on (00Å thickness). FIG. 8 shows changes in coercive force corresponding to changes in surface roughness. In the case of a chromium underlayer, surface roughness, that is, the magnetic properties are greatly affected by the texture conditions, but in the case of nickel-phosphorus underlayer and nickel-boron underlayers, the coercive force is constant regardless of the texture conditions, Moreover, a high coercive force can be obtained. Table 3 shows the results of comparing the S / N ratios when a substrate having a surface roughness Ra of 34 Å was used and the coercive force was set to 1800 Oe. The S / N ratio is greatly improved by the nickel-boron underlayer as compared with the chromium underlayer.

【0034】[0034]

【表3】 [Table 3]

【0035】[実施例6]前記の実施例1および4にお
いて、ホウ素の添加により耐食性が改善されることが示
されたが、CoNiCrPtB合金のCrの濃度を増加
させることも耐食性を改善するのに有効である。本実施
例では膜中のCr濃度が変ったときの耐食性能の変化を
調べた。すなわち、前記組成比のNi−P下地膜の上
に、Co78Ni8 Pt122 ターゲットと純Crターゲ
ットとを用いるコスパッタ法により、2ないし12%の
範囲で膜中のCr濃度が異なる試料を作製し、これを
0.62%HNO3 溶液中に浸漬した場合の残留磁化の
減少を測定した。図9に示すようにCr濃度が6原子%
以上で著しく耐食性能が改善している。本実施例では磁
性膜の上に保護膜を堆積していないが、Cr濃度が10
原子%以上になると保護膜のない過酷な条件でも耐食性
能は非常に良い。また、保護膜にZrO2 など耐食性能
に優れる保護膜を用いれば、Cr濃度が6原子%程度で
も実用上全く問題がない。実際にこのCoNiCrPt
B合金材料をディスクに適用する際には、Cr濃度の増
加による耐食性の向上と飽和磁化や保磁力の減少とのバ
ランスを取って、要求される品質に応じたCr濃度を決
定すればよい。
[Example 6] In Examples 1 and 4 described above, it was shown that the addition of boron improves the corrosion resistance, but increasing the Cr concentration in the CoNiCrPtB alloy also improves the corrosion resistance. It is valid. In this example, the change in corrosion resistance performance when the Cr concentration in the film changed was investigated. That is, a sample in which the Cr concentration in the film is different in the range of 2 to 12% by the co-sputtering method using the Co 78 Ni 8 Pt 12 B 2 target and the pure Cr target on the Ni—P base film having the above composition ratio. Was prepared, and the decrease in remanent magnetization when it was immersed in a 0.62% HNO 3 solution was measured. As shown in FIG. 9, the Cr concentration is 6 atomic%.
The corrosion resistance performance is remarkably improved by the above. In this embodiment, the protective film is not deposited on the magnetic film, but the Cr concentration is 10
If it is more than atomic%, the corrosion resistance is very good even under severe conditions without a protective film. Further, if a protective film having excellent corrosion resistance such as ZrO 2 is used as the protective film, there is no problem in practical use even if the Cr concentration is about 6 atomic%. Actually this CoNiCrPt
When the B alloy material is applied to the disc, the Cr concentration according to the required quality may be determined by balancing the improvement of the corrosion resistance due to the increase of the Cr concentration and the reduction of the saturation magnetization and the coercive force.

【0036】[0036]

【発明の効果】コバルト−ニッケル−白金系またはコバ
ルト−ニッケル−クロム−白金系の磁性膜にホウ素を添
加することにより、今後必要とされる2000 Oe以
上の高い保磁力が得られる。
By adding boron to a cobalt-nickel-platinum-based or cobalt-nickel-chromium-platinum-based magnetic film, a high coercive force of 2000 Oe or more required in the future can be obtained.

【0037】さらに、従来から用いられているクロム下
地膜ではなく、ニッケル−ホウ素下地膜またはニッケル
−リン下地膜を用いることにより、単に高い保磁力を得
るだけでなく、高いS/N比を同時に得ることができ
る。
Further, by using a nickel-boron underlayer film or a nickel-phosphorus underlayer film instead of the conventionally used chromium underlayer film, not only a high coercive force is obtained, but also a high S / N ratio is obtained at the same time. Obtainable.

【0038】特に、この下地膜と磁性膜の組合せによ
り、今後必要とされるファインテクスチャー、あるいは
テクスチャーのない研磨面を持つ基板に対しても、所望
の高い磁気特性を得ることができる。
In particular, the combination of the undercoating film and the magnetic film makes it possible to obtain desired high magnetic characteristics even for a substrate having a fine textured or textureless polished surface, which is required in the future.

【0039】また、磁性膜にホウ素を添加したり、Cr
濃度を増加させたりすることにより耐食性能も向上する
ので、信頼性に優れた磁気記録媒体を提供できる。
Further, boron is added to the magnetic film, or Cr is added.
Since the corrosion resistance is improved by increasing the concentration, it is possible to provide a highly reliable magnetic recording medium.

【0040】ホウ素を添加した磁性膜に、さらにTiや
Zrを添加することによりS,S*が改善されるので、
S/N比の向上と同時にオーバーライト特性の劣化防止
が可能となる。
Since S and S * are improved by further adding Ti or Zr to the magnetic film containing boron,
It is possible to prevent the deterioration of the overwrite characteristic at the same time as improving the S / N ratio.

【0041】以上の結果から、本発明は非磁性下地膜と
してニッケ−リンまたはニッケル−ホウ素からなるスパ
ッタ膜を用いることにより基板テクスチャーの影響を受
けず、また磁性層にホウ素を添加することにより保磁力
の大幅な増加、信号対雑音比の向上および耐食性能の改
善をもたらす優れた特徴を有する。
From the above results, the present invention is not affected by the texture of the substrate by using the sputtered film made of nickel-phosphorus or nickel-boron as the non-magnetic undercoat film, and is protected by adding boron to the magnetic layer. It has excellent features that provide a significant increase in magnetic force, improved signal-to-noise ratio and improved corrosion resistance performance.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の磁気記録媒体の一実施例の部分断面図FIG. 1 is a partial sectional view of an embodiment of a magnetic recording medium of the present invention.

【図2】(a)ニッケル−リン下地膜上のコバルト−ニ
ッケル−白金磁性膜へのホウ素添加による保磁力の変化
のグラフ、(b)ニッケル−リン下地膜上のコバルト−
ニッケル−白金磁性膜へのホウ素添加による角形比
(S,S* )の変化のグラフ
FIG. 2 (a) is a graph showing changes in coercive force due to the addition of boron to a cobalt-nickel-platinum magnetic film on a nickel-phosphorus underlayer, (b) cobalt-on a nickel-phosphorus underlayer.
Graph of changes in squareness ratio (S, S * ) due to addition of boron to nickel-platinum magnetic film

【図3】ニッケル−リン下地膜上のコバルト−ニッケル
−白金−ホウ素磁性膜の耐食性[比較試験]のグラフ
FIG. 3 is a graph of a corrosion resistance [comparative test] of a cobalt-nickel-platinum-boron magnetic film on a nickel-phosphorus base film.

【図4】(a)ニッケル−リン下地膜上のコバルト−ニ
ッケル−白金−ホウ素磁性膜へのチタン添加による保磁
力の変化のグラフ、(b)ニッケル−リン下地膜上のコ
バルト−ニッケル−白金−ホウ素磁性膜へのチタン添加
による角形比(S,S* )の変化のグラフ
FIG. 4 (a) is a graph showing changes in coercive force due to addition of titanium to a cobalt-nickel-platinum-boron magnetic film on a nickel-phosphorus underlayer, (b) cobalt-nickel-platinum on a nickel-phosphorus underlayer. -Graph of change in squareness ratio (S, S * ) by adding titanium to boron magnetic film

【図5】(a)ニッケル−リン下地膜上のコバルト−ニ
ッケル−白金−ホウ素磁性膜へのジルコニウム添加によ
る保磁力の変化のグラフ、(b)ニッケル−リン下地膜
上のコバルト−ニッケル−白金−ホウ素磁性膜へのジル
コニウム添加による角形比(S,S* )の変化のグラフ
FIG. 5 (a) is a graph showing changes in coercive force due to the addition of zirconium to a cobalt-nickel-platinum-boron magnetic film on a nickel-phosphorus underlayer, (b) cobalt-nickel-platinum on a nickel-phosphorus underlayer. -Graph of change in squareness ratio (S, S * ) due to addition of zirconium to boron magnetic film

【図6】ニッケル−リン下地膜上のコバルト−ニッケル
−クロム−白金磁性膜へのホウ素添加による保磁力の変
化のグラフ
FIG. 6 is a graph showing changes in coercive force due to addition of boron to a cobalt-nickel-chromium-platinum magnetic film on a nickel-phosphorus underlayer.

【図7】ニッケル−リン下地膜上のコバルト−ニッケル
−クロム−白金−ホウ素磁性膜の耐食性[比較試験]の
グラフ
FIG. 7 is a graph of corrosion resistance [comparative test] of a cobalt-nickel-chromium-platinum-boron magnetic film on a nickel-phosphorus base film.

【図8】保磁力に及ぼす基板表面粗さの影響のグラフFIG. 8 is a graph showing the effect of substrate surface roughness on coercive force.

【図9】ニッケル−リン下地膜上のコバルト−ニッケル
−クロム−白金−ホウ素磁性膜の硝酸中浸漬による残留
磁化の変化(耐食性試験)のグラフ
FIG. 9 is a graph of changes in residual magnetization (corrosion resistance test) of a cobalt-nickel-chromium-platinum-boron magnetic film on a nickel-phosphorus underlayer by immersion in nitric acid.

【符号の説明】[Explanation of symbols]

1:基板 2:無電解ニッケル−リンメッキ膜 3:ニッケル−リン下地膜またはニッケル−ホウ素下地
膜 4:磁性膜 5:保護膜
1: Substrate 2: Electroless nickel-phosphorus plating film 3: Nickel-phosphorus base film or nickel-boron base film 4: Magnetic film 5: Protective film

───────────────────────────────────────────────────── フロントページの続き (72)発明者 ツ チェン アメリカ合衆国 カリフォルニア州 95030 モンテセレノ グレゴリープレイ ス 18225 (72)発明者 ツトム トム ヤマシタ アメリカ合衆国 カリフォルニア州 95035 ミルピタス グレンビュードライ ブ 2305 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Tuchen, USA 95030 Monteseleno Gregory Place 18225 (72) Inventor Tustom Tom Yamashita, California 95035 Milpitas Glenview Drive 2305

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】スパッタ法により形成したニッケルとリン
を主成分とする非磁性下地層を有する非磁性基板の該非
磁性下地層の上に、ニッケルおよびクロムのうち少なく
とも一種とコバルト、白金およびホウ素を含む磁性層を
形成してなることを特徴とする磁気記録媒体。
1. A nonmagnetic substrate having a nonmagnetic underlayer containing nickel and phosphorus as main components formed by a sputtering method, and at least one of nickel and chromium and cobalt, platinum and boron are deposited on the nonmagnetic underlayer. A magnetic recording medium comprising a magnetic layer containing the same.
【請求項2】スパッタ法により形成したニッケルとホウ
素を主成分とする非磁性下地層を有する非磁性基板の該
非磁性下地層の上に、ニッケルおよびクロムのうち少な
くとも一種とコバルト、白金およびホウ素を含む磁性層
を形成してなることを特徴とする磁気記録媒体。
2. A nonmagnetic substrate having a nonmagnetic underlayer containing nickel and boron as main components formed by a sputtering method, and at least one of nickel and chromium and cobalt, platinum and boron are deposited on the nonmagnetic underlayer. A magnetic recording medium comprising a magnetic layer containing the same.
【請求項3】請求項1または2において、磁性層に原子
%で、ニッケルが3〜10%、白金が8〜15%、ホウ
素が0.5〜6%およびコバルトが65〜80%含まれ
ることを特徴とする磁気記録媒体。
3. The magnetic layer according to claim 1, wherein the magnetic layer contains 3 to 10% of nickel, 8 to 15% of platinum, 0.5 to 6% of boron and 65 to 80% of cobalt in atomic%. A magnetic recording medium characterized by the above.
【請求項4】請求項1または2において、磁性層に原子
%で、ニッケルが3〜10%、クロムが3〜15%、白
金が8〜15%、ホウ素が0.5〜6%およびコバルト
が65〜80%含まれることを特徴とする磁気記録媒
体。
4. The magnetic layer according to claim 1, wherein the magnetic layer has an atomic% of 3 to 10% of nickel, 3 to 15% of chromium, 8 to 15% of platinum, 0.5 to 6% of boron and cobalt. Of 65 to 80% is contained in the magnetic recording medium.
【請求項5】請求項1または2において、磁性層に添加
元素としてTi,Zr,Ta,MoおよびWのうちから
選ばれる一種を、原子%で0.5〜6%含むことを特徴
とする磁気記録媒体。
5. The magnetic layer according to claim 1, wherein the magnetic layer contains 0.5 to 6% in atomic% of one element selected from Ti, Zr, Ta, Mo and W as an additive element. Magnetic recording medium.
【請求項6】非磁性基板上にスパッタ法により、ニッケ
ルとリンまたはニッケルとホウ素を主成分とする非磁性
下地層を形成し、そののち該非磁性下地層の上にニッケ
ルおよびクロムのうち少なくとも一種とコバルト、白金
およびホウ素を含む磁性層を形成することを特徴とする
磁気記録媒体の製造方法。
6. A nonmagnetic underlayer containing nickel and phosphorus or nickel and boron as main components is formed on a nonmagnetic substrate by a sputtering method, and then at least one of nickel and chromium is formed on the nonmagnetic underlayer. And a magnetic layer containing cobalt, platinum, and boron is formed.
JP35761792A 1991-12-28 1992-12-24 Magnetic recording medium and its production Withdrawn JPH05258279A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP35921191 1991-12-28
JP3-359211 1991-12-28

Publications (1)

Publication Number Publication Date
JPH05258279A true JPH05258279A (en) 1993-10-08

Family

ID=18463331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35761792A Withdrawn JPH05258279A (en) 1991-12-28 1992-12-24 Magnetic recording medium and its production

Country Status (1)

Country Link
JP (1) JPH05258279A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002328074A (en) * 2001-05-01 2002-11-15 Fujitsu Ltd Method for evaluating quality of surface protecting film and method for manufacturing magnetic recording medium
JP2008127591A (en) * 2006-11-17 2008-06-05 Sanyo Special Steel Co Ltd Co-B-BASED TARGET MATERIAL AND MANUFACTURING METHOD THEREFOR

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002328074A (en) * 2001-05-01 2002-11-15 Fujitsu Ltd Method for evaluating quality of surface protecting film and method for manufacturing magnetic recording medium
JP2008127591A (en) * 2006-11-17 2008-06-05 Sanyo Special Steel Co Ltd Co-B-BASED TARGET MATERIAL AND MANUFACTURING METHOD THEREFOR

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