JPH05249488A - Active matrix type liquid crystal display device - Google Patents

Active matrix type liquid crystal display device

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Publication number
JPH05249488A
JPH05249488A JP4932992A JP4932992A JPH05249488A JP H05249488 A JPH05249488 A JP H05249488A JP 4932992 A JP4932992 A JP 4932992A JP 4932992 A JP4932992 A JP 4932992A JP H05249488 A JPH05249488 A JP H05249488A
Authority
JP
Japan
Prior art keywords
liquid crystal
pixel
electrode
gate line
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4932992A
Other languages
Japanese (ja)
Inventor
Hiroyuki Hamabe
浩之 浜部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP4932992A priority Critical patent/JPH05249488A/en
Publication of JPH05249488A publication Critical patent/JPH05249488A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain the active matrix type liquid crystal display device which enables the removal of the point defects to become bright points without adversely affecting ambient liquid crystals with relatively simple operations. CONSTITUTION:When a picture element of a defective TFT is discovered at the time of production, this picture element electrode 7 is electrically connected to a gate line 2. The connection of the gate line 2 and the picture element electrode 7 is executed by extending the extended part 4a of a gate electrode 4 or the branch part of the gate line 2 to the lower side of the picture element electrode 7 and thermally welding only the overlap part of this picture element electrode 7 and the extended part 4a or the branch part for the picture element having the defect by a laser beam, etc.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、薄膜トランジスタ(以
下TFTと略称する)を各画素毎に設置してスイッチン
グ動作させ、画像を表示するをアクティブマトリックス
型液晶表示装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an active matrix type liquid crystal display device in which a thin film transistor (hereinafter abbreviated as TFT) is provided for each pixel and a switching operation is performed to display an image.

【0002】[0002]

【従来の技術】この種のアクティブマトリックス型液晶
表示装置は、基本的には、一方のガラス基板上にゲート
ラインとソースラインがマトリックス状に配設され、そ
れらの交差位置にTFT及び画素電極を設けてアレイ基
板が形成され、他方のガラス基板上に共通電極を形成し
た対向基板が形成され、アレイ基板と対向基板の上面に
配向膜を形成し、間隙をおいて平行に貼り合せたアレイ
基板と対向基板の間に液晶を封入して構成される。
2. Description of the Related Art Basically, an active matrix type liquid crystal display device of this type has gate lines and source lines arranged in a matrix on one glass substrate, and TFTs and pixel electrodes are provided at the intersections thereof. An array substrate is provided on which an array substrate is formed, an opposite substrate having a common electrode formed on the other glass substrate is formed, an alignment film is formed on the upper surfaces of the array substrate and the opposite substrate, and the substrates are bonded in parallel with a gap. A liquid crystal is sealed between the counter substrate and the counter substrate.

【0003】液晶表示装置を駆動する場合、各画素毎に
配置されたTFTをスイッチング動作させて、各画素電
極と対向電極間に印加する電圧を制御して行うが、一般
に、TFTをオフ制御したとき、各画素はバックライト
からの光を透過させ、TFTをオン制御したとき、各画
素はバックライトからの光を遮光するように画面表示が
行われる。
When a liquid crystal display device is driven, a TFT arranged in each pixel is switched to control a voltage applied between each pixel electrode and a counter electrode. Generally, the TFT is turned off. At this time, each pixel transmits light from the backlight, and when the TFT is on-controlled, screen display is performed so that each pixel blocks light from the backlight.

【0004】このため、各画素毎に配置された多くのT
FTの極一部に断線欠陥等があった場合、駆動時でも、
欠陥TFTがオフのままとなり、バックライトを通過さ
せるため、その部分が常に輝点として現れ、非常に目立
つ点欠陥が生じる。
Therefore, a large number of Ts arranged for each pixel are provided.
If there is a disconnection defect in a very small part of the FT,
Since the defective TFT remains off and passes through the backlight, that portion always appears as a bright spot, resulting in a very conspicuous point defect.

【0005】[0005]

【発明が解決しようとする課題】そこで、従来、液晶表
示装置の製造段階において、この種の点欠陥が現れた場
合、点欠陥部のアレイ基板上おける画素電極全体を、レ
ーザ光等の照射によって除去し、輝点となる点欠陥を暗
点とすることが提案されている(特開平2−12761
4号公報等参照)。
Therefore, conventionally, when this kind of point defect appears in the manufacturing stage of a liquid crystal display device, the whole pixel electrode on the array substrate of the point defect portion is irradiated with laser light or the like. It has been proposed to remove the point defect that becomes a bright point and make it a dark point (Japanese Patent Laid-Open No. 2-12761).
No. 4, etc.).

【0006】しかし、従来のこの方法は、点欠陥をとな
る画素電極全体をレーザ光等の照射によって熱溶融し除
去するため、画素が大形のものや画素の形状が複雑なも
のでは、レーザ光により画素電極全体を除去する作業
は、熟練技術と共に多くの時間を必要とし、作業効率が
低下する問題があった。また、画素電極全体という比較
的広い範囲にレーザ光を長時間照射して画素電極を熱溶
融させるため、溶融時に液晶パネル内に発生するガスが
周囲の液晶内に侵入し、液晶分子の配列動作を悪化させ
たり、表示画面上にシミを発生させる問題があった。
However, in this conventional method, the entire pixel electrode which causes a point defect is thermally melted and removed by irradiation with laser light or the like, and therefore, when the pixel is large or the pixel shape is complicated, The work of removing the entire pixel electrode by light requires a lot of time together with the skill and has a problem that work efficiency is lowered. Further, since the relatively large area of the entire pixel electrode is irradiated with laser light for a long time to thermally melt the pixel electrode, the gas generated in the liquid crystal panel at the time of melting penetrates into the surrounding liquid crystal and the liquid crystal molecules are aligned. There is a problem that it worsens or causes spots on the display screen.

【0007】本発明は、上記の点に鑑みてなされたもの
で、その目的とするところは、比較的簡単な作業で輝点
となる点欠陥を、周囲の液晶に悪影響を与えずに除去す
ることができるアクティブマトリックス型液晶表示装置
を提供することである。
The present invention has been made in view of the above points, and it is an object of the present invention to remove a point defect which becomes a bright spot by a relatively simple operation without adversely affecting the surrounding liquid crystal. It is an object of the present invention to provide an active matrix type liquid crystal display device which can be manufactured.

【0008】[0008]

【課題を解決するための手段】本発明の第一発明のアク
ティブマトリックス型液晶表示装置は、マトリックス状
に配設された各ゲートラインと各ソースラインとで囲ま
れる部分に多数の画素電極が配設されると共に、各ゲー
トラインと各ソースラインの各交差位置に多数の薄膜ト
ランジスタが配設されてなるアレイ基板と、共通電極を
形成した対向電極との間に液晶を封入してなるアクティ
ブマトリックス型液晶表示装置において、欠陥を有する
画素部分の画素電極が前記ゲートラインと電気的に接続
されていることを特徴とする。
In the active matrix type liquid crystal display device of the first invention of the present invention, a large number of pixel electrodes are arranged in a portion surrounded by each gate line and each source line arranged in a matrix. An active matrix type in which liquid crystal is sealed between an array substrate having a large number of thin film transistors arranged at each intersection of each gate line and each source line and a counter electrode having a common electrode. A liquid crystal display device is characterized in that a pixel electrode of a defective pixel portion is electrically connected to the gate line.

【0009】また、第二発明のアクティブマトリックス
型液晶表示装置は、マトリックス状に配設された各ゲー
トラインと各ソースラインとで囲まれる部分に多数の画
素電極が配設されると共に、各ゲートラインと各ソース
ラインの各交差位置に多数の薄膜トランジスタが配設さ
れてなるアレイ基板と、共通電極を形成した対向電極と
の間に液晶を封入してなるアクティブマトリックス型液
晶表示装置において、各ゲートライン又はソースライン
に沿って欠陥用給電線が配設され、欠陥用給電線が欠陥
を有する画素部分の画素電極に接続されていることを特
徴とする。
Further, in the active matrix type liquid crystal display device of the second invention, a large number of pixel electrodes are arranged in a portion surrounded by each gate line and each source line arranged in a matrix and each gate line is formed. In an active matrix type liquid crystal display device in which liquid crystal is enclosed between an array substrate having a large number of thin film transistors arranged at each intersection of a line and each source line, and a counter electrode having a common electrode, each gate A power supply line for a defect is arranged along the line or the source line, and the power supply line for the defect is connected to a pixel electrode of a pixel portion having a defect.

【0010】[0010]

【作用・効果】第一発明のアクティブマトリックス型液
晶表示装置では、駆動時、ゲートラインに走査信号電圧
が印加されるが、断線欠陥等でオフしたままのTFTの
画素電極にもゲートラインからの電圧が印加され、その
画素電極と対向電極間の電位差によって、その画素の液
晶が駆動され、欠陥によって輝点となるはずの画素が暗
点表示され、欠陥としての輝点は現れない。
In the active matrix type liquid crystal display device of the first invention, the scanning signal voltage is applied to the gate line at the time of driving, but the pixel electrode of the TFT which remains off due to a disconnection defect or the like is also connected to the gate line from the gate line. A voltage is applied, the liquid crystal of the pixel is driven by the potential difference between the pixel electrode and the counter electrode, the pixel which should be a bright spot due to the defect is displayed as a dark spot, and the bright spot as the defect does not appear.

【0011】また、製造時におけるゲートラインと画素
電極との接続は、ゲートラインの延長部を画素電極の下
までのばし、欠陥を有する画素について、その画素電極
と延長部との重なり部分のみを、レーザ光等で熱溶融さ
せて接続すればよいため、比較的簡単に作業を行うこと
ができ、周囲の液晶に悪影響を与えることが少ない。
Further, the connection between the gate line and the pixel electrode at the time of manufacturing is such that the extension of the gate line is extended to the bottom of the pixel electrode, and for a defective pixel, only the overlapping portion between the pixel electrode and the extension is Since it suffices to heat-melt and connect with a laser beam or the like, the work can be performed relatively easily, and the surrounding liquid crystal is hardly adversely affected.

【0012】第二発明のアクティブマトリックス型液晶
表示装置では、駆動時、各ゲートライン又はソースライ
ンに沿って配設された欠陥用給電線に、所定の電圧を印
加する。このため、欠陥を持つTFTの画素電極には、
欠陥用給電線を介して電圧が印加され、その画素電極と
対向電極間の電位差によって、その画素の液晶が駆動さ
れ、欠陥によって輝点となるはずの画素が暗点表示さ
れ、欠陥としての輝点は現れない。
In the active matrix type liquid crystal display device of the second invention, at the time of driving, a predetermined voltage is applied to the defect power supply line arranged along each gate line or source line. Therefore, the pixel electrode of the defective TFT is
A voltage is applied through the defect power supply line, the liquid crystal of that pixel is driven by the potential difference between the pixel electrode and the counter electrode, and the pixel that should be the bright spot due to the defect is displayed as a dark spot, and the bright spot as the defect is displayed. No dots appear.

【0013】また、製造時における欠陥用給電線と画素
電極との接続は、欠陥用給電線の延長部を画素電極の下
までのばし、欠陥を有する画素について、その画素電極
と延長部との重なり部分のみを、レーザ光等で熱溶融さ
せて接続すればよいため、比較的簡単に作業を行うこと
ができ、周囲の液晶に悪影響を与えることが少ない。
The connection between the defective power supply line and the pixel electrode at the time of manufacturing is performed by extending the extended part of the defective power supply line to the position below the pixel electrode, and for a defective pixel, the pixel electrode and the extended part overlap each other. Since only a part needs to be heat-melted and connected by a laser beam or the like, the work can be performed relatively easily and the surrounding liquid crystal is hardly adversely affected.

【0014】[0014]

【実施例】以下、本発明の実施例を図面に基づいて説明
する。
Embodiments of the present invention will be described below with reference to the drawings.

【0015】図1〜図5は上記第一発明の実施例を示
し、図1はアクティブマトリックス型液晶表示装置にお
けるアレイ基板10の概略平面図を示している。1はソ
ースライン、2はゲートラインであり、ガラス基板8上
にマトリックス状に配設される。ソースライン1は例え
ばアルミニウム、ゲートライン2はクロム等の金属を用
いて、スパッタリング法及びホトリソグラフィー法等に
より形成され、ソースライン1とゲートライン2の交差
位置に、a−Si等の絶縁層13が介挿される。
1 to 5 show an embodiment of the first invention, and FIG. 1 shows a schematic plan view of an array substrate 10 in an active matrix type liquid crystal display device. Reference numeral 1 is a source line, and 2 is a gate line, which are arranged in a matrix on the glass substrate 8. The source line 1 is formed of a metal such as aluminum and the gate line 2 is formed of a metal such as chromium by a sputtering method, a photolithography method, or the like, and an insulating layer 13 such as a-Si is formed at the intersection of the source line 1 and the gate line 2. Is inserted.

【0016】各ソースライン1とゲートライン2の各々
の交差位置にはTFT6が配置され、各ソースライン1
とゲートライン2が囲む各々の領域にはITO等により
画素電極7が形成される。
TFTs 6 are arranged at the intersections of the source lines 1 and the gate lines 2, respectively.
The pixel electrode 7 is formed of ITO or the like in each region surrounded by the gate line 2.

【0017】TFT6は、図2の断面図に示すように、
ガラス基板8上にゲート電極4がクロム等の金属により
ゲートライン2と接続して形成され、ゲート電極4上に
窒化ケイ素等の絶縁膜12が形成され、絶縁膜12上に
活性層9がa−Si等により形成され、その上にn型a
−Si等のドーピング層14が形成される。そして、ド
ーピング層14の上にソース電極3及びドレイン電極5
がアルミニウム等により形成され、ソース電極3はソー
スライン1に、ドレイン電極5は画素電極7に接続され
る。
The TFT 6, as shown in the sectional view of FIG.
The gate electrode 4 is formed on the glass substrate 8 by connecting it to the gate line 2 by a metal such as chromium, the insulating film 12 such as silicon nitride is formed on the gate electrode 4, and the active layer 9 is formed on the insulating film 12 by a. -Si or the like, on which n-type a is formed
A doping layer 14 such as -Si is formed. Then, the source electrode 3 and the drain electrode 5 are formed on the doping layer 14.
Are formed of aluminum or the like, the source electrode 3 is connected to the source line 1, and the drain electrode 5 is connected to the pixel electrode 7.

【0018】さらに、TFT6のゲート電極4には延長
部4aが設けられ、その延長部4aが、図3に示すよう
に画素電極7の下側に入り込み、延長部4aと画素電極
7の間に上記の絶縁膜12が介挿される。
Further, an extension portion 4a is provided on the gate electrode 4 of the TFT 6, and the extension portion 4a enters under the pixel electrode 7 as shown in FIG. 3 and is located between the extension portion 4a and the pixel electrode 7. The insulating film 12 is inserted.

【0019】このように形成されたアレイ基板10の表
面には、窒化ケイ素等の保護膜11が画素電極7を除く
部分に形成され、さらに、ポリイミド等からなる配向膜
16が形成され、一方、アレイ基板10と対向して配設
される対向基板(図示せず)は、別のガラス基板上にI
TO等からなる共通電極を形成し、その表面に配向膜を
形成して構成される。
On the surface of the array substrate 10 thus formed, a protective film 11 made of silicon nitride or the like is formed on the portion except the pixel electrode 7, and an alignment film 16 made of polyimide or the like is further formed. An opposite substrate (not shown) arranged so as to face the array substrate 10 is I on another glass substrate.
A common electrode made of TO or the like is formed, and an alignment film is formed on the surface of the common electrode.

【0020】そして、上記アレイ基板10と対向基板の
表面(配向膜側)をラビング処理した後、アレイ基板1
0と対向基板が僅かな間隙をおいて平行に貼り合され、
その間に液晶が封入され、液晶パネルが形成される。
Then, after rubbing the surfaces (the alignment film side) of the array substrate 10 and the counter substrate, the array substrate 1
0 and the counter substrate are bonded in parallel with a slight gap,
Liquid crystal is enclosed between them to form a liquid crystal panel.

【0021】その後、液晶パネルの各ソースライン1と
ゲートライン2に駆動回路が接続され、各ソースライン
1に交流駆動信号を供給し、ゲートライン2に走査信号
を供給して、液晶パネルの検査を行う。
After that, a drive circuit is connected to each source line 1 and gate line 2 of the liquid crystal panel, an AC drive signal is supplied to each source line 1, and a scanning signal is supplied to the gate line 2 to inspect the liquid crystal panel. I do.

【0022】TFTに断線欠陥等がある場合、駆動時で
もそのTFTはオフしたままとなり、その画素の液晶は
駆動されない。検査時に、このような欠陥TFTが発見
されると、欠陥TFTを有する画素については、画素電
極7とゲート電極4の延長部4aとの重なり部分に、レ
ーザ光を照射し、画素電極7とその下の絶縁膜12の一
部を熱溶融させる。
When the TFT has a disconnection defect or the like, the TFT remains off even during driving, and the liquid crystal of the pixel is not driven. If such a defective TFT is found during inspection, laser light is irradiated to the pixel electrode 7 and its extension portion 4a of the pixel having the defective TFT by irradiating the pixel electrode 7 and the pixel electrode 7 with the laser light. A part of the lower insulating film 12 is thermally melted.

【0023】これによって、欠陥TFTを有する画素で
は、画素電極7の一部がその下の延長部4aに当接し、
画素電極7とゲート電極4とが電気的に接続される。こ
のときの作業は、レーザ光を画素電極7と延長部4aと
の重なり部分にのみ照射して溶融させればよいため、従
来の画素電極全体を除去する作業に比べ、比較的簡単に
作業を行うことができ、また、ガスの発生も少なく、周
囲の液晶に与える悪影響も少ない。
As a result, in the pixel having the defective TFT, a part of the pixel electrode 7 abuts on the extension 4a therebelow,
The pixel electrode 7 and the gate electrode 4 are electrically connected. Since the work at this time may be performed by irradiating the laser light only on the overlapping portion of the pixel electrode 7 and the extension 4a to melt it, the work is relatively easy as compared with the conventional work of removing the entire pixel electrode. It can be performed, and the gas generation is small, and the adverse effect on the surrounding liquid crystal is small.

【0024】このように製造された液晶表示装置は、ソ
ースライン1に交流駆動信号を供給し、ゲートライン2
に走査信号を供給して駆動されるが、ゲートライン2の
電圧が、ゲート電極4とその延長部4aを通して欠陥T
FTを有する画素の画素電極7にも印加され、その画素
電極7と対向電極間の電位差によって、その画素の液晶
が駆動され、欠陥によって輝点となるはずの画素が暗点
表示され、欠陥としての輝点は現れない。
The liquid crystal display device manufactured in this manner supplies an AC drive signal to the source line 1 and the gate line 2
The gate line 2 is driven by supplying a scanning signal to the gate electrode 4 and the defect T through the gate electrode 4 and its extension 4a.
It is also applied to the pixel electrode 7 of the pixel having the FT, the liquid crystal of the pixel is driven by the potential difference between the pixel electrode 7 and the counter electrode, and the pixel that should be a bright spot due to the defect is displayed as a dark dot, and as a defect. Does not appear.

【0025】なお、欠陥TFTを有する画素について
は、上記のようにゲートライン2と画素電極7を接続す
ればよいから、図5に示すように、ゲートライン2の一
部に枝部2aを設け、上記延長部4aと同様に枝部2a
を画素電極7の下側までのばし、その重なり部分をレー
ザ光により接続することもできる。
For the pixel having the defective TFT, the gate line 2 and the pixel electrode 7 may be connected as described above. Therefore, as shown in FIG. 5, a branch portion 2a is provided in a part of the gate line 2. , The branch portion 2a similar to the extension portion 4a
Can be extended to the lower side of the pixel electrode 7, and the overlapping portion can be connected by laser light.

【0026】図6、図7は第二発明の実施例を示してい
る。図6のアレイ基板は、ソースライン1とゲートライ
ン2がマトリック状に配置され、その交差位置にTFT
6が配設される点で、基本的には上記と同様の構造であ
るが、欠陥TFTの画素電極7に給電するための欠陥用
給電線(例えばクロム)14がゲートライン1に沿って
配設される。
6 and 7 show an embodiment of the second invention. In the array substrate of FIG. 6, the source line 1 and the gate line 2 are arranged in a matrix, and TFTs are provided at the intersections thereof.
6 is basically the same in structure as that described above, but a defective power supply line (for example, chrome) 14 for supplying power to the pixel electrode 7 of the defective TFT is arranged along the gate line 1. Is set up.

【0027】また、欠陥用給電線14の一部に枝部14
aが設けられ、その枝部14aが画素電極7の下側まで
のび、その先端が絶縁層を介して画素電極7の下側に位
置している。なお、欠陥用給電線14とソースライン1
の交差位置、及び枝部14aとゲートライン2の交差位
置にはa−Si等の絶縁層13が介挿される。
In addition, a branch portion 14 is provided at a part of the defect power supply line 14.
a is provided, the branch portion 14a extends to the lower side of the pixel electrode 7, and the tip thereof is located below the pixel electrode 7 with the insulating layer interposed therebetween. In addition, the defect feed line 14 and the source line 1
An insulating layer 13 made of a-Si or the like is inserted at the crossing position of 1 and the crossing position of the branch line 14a and the gate line 2.

【0028】このアレイ基板を用いた液晶パネルについ
ても、その製造時、上記と同様に、駆動検査を行った
際、断線等の欠陥TFTが発見された場合、その欠陥T
FTを有する画素について、画素電極7と枝部14aと
の重なり部分に、レーザ光を照射し、画素電極7とその
下の絶縁膜12の一部を熱溶融させる。これにより、画
素電極7の一部がその下の枝部14aに当接し、画素電
極7と欠陥用給電線14とが電気的に接続される。
Also in the liquid crystal panel using this array substrate, if a defective TFT such as a disconnection is found during the driving inspection at the time of manufacturing the same as the above, the defect T
In the pixel having FT, the overlapping portion of the pixel electrode 7 and the branch portion 14a is irradiated with laser light to heat-melt the pixel electrode 7 and a part of the insulating film 12 thereunder. As a result, a part of the pixel electrode 7 comes into contact with the branch portion 14a below the pixel electrode 7, and the pixel electrode 7 and the defect power supply line 14 are electrically connected.

【0029】このときの作業も、上記と同様に、レーザ
光を画素電極7と枝14aとの重なり部分にのみ照射し
て溶融させればよいため、従来の画素電極全体を除去す
る作業に比べ、比較的簡単に作業を行うことができ、ま
た、ガスの発生も少なく、周囲の液晶に与える悪影響も
少ない。
Also in this work, as in the above, it is sufficient to irradiate the laser light only on the overlapping portion of the pixel electrode 7 and the branch 14a to melt it, and therefore, compared with the conventional work of removing the entire pixel electrode. The work can be performed relatively easily, the gas generation is small, and the adverse effect on the surrounding liquid crystal is small.

【0030】このような液晶表示装置は、ソースライン
1に交流駆動信号を供給し、ゲートライン2に走査信号
を供給すると共に、欠陥用給電線14に所定の電圧を印
加して駆動される。したがって、欠陥用給電線14から
枝部14aを通して、欠陥TFTを有する画素の画素電
極7に電圧が印加され、その画素電極7と対向電極間の
電位差によって、その画素の液晶が駆動され、欠陥によ
って輝点となるはずの画素が暗点表示され、欠陥として
の輝点は現れない。
Such a liquid crystal display device is driven by supplying an AC drive signal to the source line 1 and a scanning signal to the gate line 2 and applying a predetermined voltage to the defect power supply line 14. Therefore, a voltage is applied from the defect power supply line 14 to the pixel electrode 7 of the pixel having the defective TFT through the branch portion 14a, the liquid crystal of the pixel is driven by the potential difference between the pixel electrode 7 and the counter electrode, and the defect is caused. Pixels that should be bright spots are displayed as dark spots, and bright spots as defects do not appear.

【0031】上記の例では、欠陥用給電線14をゲート
ライン2に沿って配設したが、図7に示すように、欠陥
用給電線15をソースライン1に沿って配設することも
できる。この場合、欠陥用給電線15から出した枝部1
5aは、ソースライン1をジャンプして画素電極7の下
側に入り、欠陥TFTを有する画素については、その先
端が画素電極7に接続される。
In the above example, the defect power supply line 14 is arranged along the gate line 2, but the defect power supply line 15 may be arranged along the source line 1 as shown in FIG. .. In this case, the branch portion 1 extending from the defect power supply line 15
5a jumps the source line 1 and enters the lower side of the pixel electrode 7, and the tip of the pixel having a defective TFT is connected to the pixel electrode 7.

【図面の簡単な説明】[Brief description of drawings]

【図1】第一発明の実施例を示すアレイ基板の部分平面
図である。
FIG. 1 is a partial plan view of an array substrate showing an embodiment of the first invention.

【図2】図1のII−II拡大断面図である。FIG. 2 is an enlarged sectional view taken along line II-II of FIG.

【図3】図1の III− III拡大断面図である。3 is an enlarged sectional view taken along the line III-III in FIG.

【図4】画素電極7と延長部4aを接続した状態の同拡
大断面図である。
FIG. 4 is an enlarged cross-sectional view showing a state where a pixel electrode 7 and an extension 4a are connected.

【図5】他の実施例の部分平面図である。FIG. 5 is a partial plan view of another embodiment.

【図6】第二発明の実施例を示すアレイ基板の部分平面
図である。
FIG. 6 is a partial plan view of an array substrate showing an embodiment of the second invention.

【図7】他の実施例の部分平面図である。FIG. 7 is a partial plan view of another embodiment.

【符号の説明】[Explanation of symbols]

1−ソースライン、2−ゲートライン、4a−延長部、
6−TFT、7−画素電極、10−アレイ基板、14−
欠陥用給電線、14−枝部。
1-source line, 2-gate line, 4a-extension,
6-TFT, 7-pixel electrode, 10-array substrate, 14-
Defect feeder, 14-branch.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 マトリックス状に配設された各ゲートラ
インと各ソースラインとで囲まれる部分に多数の画素電
極が配設されると共に、該各ゲートラインと各ソースラ
インの各交差位置に多数の薄膜トランジスタが配設され
てなるアレイ基板と、共通電極を形成した対向電極との
間に液晶を封入してなるアクティブマトリックス型液晶
表示装置において、 欠陥を有する画素部分の画素電極が前記ゲートラインと
電気的に接続されていることを特徴とするアクティブマ
トリックス型液晶表示装置。
1. A large number of pixel electrodes are arranged in a portion surrounded by each gate line and each source line arranged in a matrix, and a large number of pixel electrodes are arranged at each intersecting position of each gate line and each source line. In an active matrix type liquid crystal display device in which a liquid crystal is sealed between an array substrate having thin film transistors and a counter electrode having a common electrode, the pixel electrode of a defective pixel portion is the gate line. An active matrix type liquid crystal display device characterized by being electrically connected.
【請求項2】 マトリックス状に配設された各ゲートラ
インと各ソースラインとで囲まれる部分に多数の画素電
極が配設されると共に、該各ゲートラインと各ソースラ
インの各交差位置に多数の薄膜トランジスタが配設され
てなるアレイ基板と、共通電極を形成した対向電極との
間に液晶を封入してなるアクティブマトリックス型液晶
表示装置において、 前記各ゲートライン又はソースラインに沿って欠陥用給
電線が配設され、該欠陥用給電線が欠陥を有する画素部
分の画素電極に接続されていることを特徴とするアクテ
ィブマトリックス型液晶表示装置。
2. A large number of pixel electrodes are arranged in a portion surrounded by each gate line and each source line arranged in a matrix, and a large number of pixel electrodes are arranged at each crossing position of each gate line and each source line. In an active matrix type liquid crystal display device in which liquid crystal is sealed between an array substrate on which the thin film transistors are arranged and a counter electrode on which a common electrode is formed, defect supply along each of the gate lines or the source lines. An active matrix type liquid crystal display device characterized in that an electric wire is provided and the power supply line for the defect is connected to a pixel electrode of a pixel portion having a defect.
JP4932992A 1992-03-06 1992-03-06 Active matrix type liquid crystal display device Pending JPH05249488A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4932992A JPH05249488A (en) 1992-03-06 1992-03-06 Active matrix type liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4932992A JPH05249488A (en) 1992-03-06 1992-03-06 Active matrix type liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH05249488A true JPH05249488A (en) 1993-09-28

Family

ID=12827952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4932992A Pending JPH05249488A (en) 1992-03-06 1992-03-06 Active matrix type liquid crystal display device

Country Status (1)

Country Link
JP (1) JPH05249488A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004310110A (en) * 2003-04-08 2004-11-04 Samsung Electronics Co Ltd Array substrate and liquid crystal display device having same
KR100488924B1 (en) * 1997-06-27 2005-10-25 비오이 하이디스 테크놀로지 주식회사 Manufacturing method of liquid crystal display device
US7916236B2 (en) 2005-11-29 2011-03-29 Mitsubishi Electric Corporation Display device and method of repairing the same including transmitting and reflecting regions and an opaque conductive film below a connecting portion
US9508753B2 (en) 2015-01-19 2016-11-29 Mitsubishi Electric Corporation Display apparatus
US10084014B2 (en) 2016-03-18 2018-09-25 Mitsubishi Electric Corporation Array substrate for display apparatus, display apparatus, method for producing array substrate for display apparatus, and method for producing display apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100488924B1 (en) * 1997-06-27 2005-10-25 비오이 하이디스 테크놀로지 주식회사 Manufacturing method of liquid crystal display device
JP2004310110A (en) * 2003-04-08 2004-11-04 Samsung Electronics Co Ltd Array substrate and liquid crystal display device having same
JP4677198B2 (en) * 2003-04-08 2011-04-27 三星電子株式会社 Array substrate and liquid crystal display device having the same
US7916236B2 (en) 2005-11-29 2011-03-29 Mitsubishi Electric Corporation Display device and method of repairing the same including transmitting and reflecting regions and an opaque conductive film below a connecting portion
US9508753B2 (en) 2015-01-19 2016-11-29 Mitsubishi Electric Corporation Display apparatus
US10084014B2 (en) 2016-03-18 2018-09-25 Mitsubishi Electric Corporation Array substrate for display apparatus, display apparatus, method for producing array substrate for display apparatus, and method for producing display apparatus

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