JPH0523430B2 - - Google Patents

Info

Publication number
JPH0523430B2
JPH0523430B2 JP60293415A JP29341585A JPH0523430B2 JP H0523430 B2 JPH0523430 B2 JP H0523430B2 JP 60293415 A JP60293415 A JP 60293415A JP 29341585 A JP29341585 A JP 29341585A JP H0523430 B2 JPH0523430 B2 JP H0523430B2
Authority
JP
Japan
Prior art keywords
film
substrate
plasma
initiator
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60293415A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61189639A (ja
Inventor
Haruto Anderusu
Ito Hiroshi
Aasaa Makudonarudo Sukotsuto
Guranto Uiruson Kaaruton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS61189639A publication Critical patent/JPS61189639A/ja
Publication of JPH0523430B2 publication Critical patent/JPH0523430B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60293415A 1985-02-19 1985-12-27 陰画レジスト像を形成する方法 Granted JPS61189639A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/702,514 US4551418A (en) 1985-02-19 1985-02-19 Process for preparing negative relief images with cationic photopolymerization
US702514 1985-02-19

Publications (2)

Publication Number Publication Date
JPS61189639A JPS61189639A (ja) 1986-08-23
JPH0523430B2 true JPH0523430B2 (en, 2012) 1993-04-02

Family

ID=24821515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60293415A Granted JPS61189639A (ja) 1985-02-19 1985-12-27 陰画レジスト像を形成する方法

Country Status (5)

Country Link
US (1) US4551418A (en, 2012)
EP (1) EP0192078B1 (en, 2012)
JP (1) JPS61189639A (en, 2012)
CA (1) CA1250177A (en, 2012)
DE (1) DE3667553D1 (en, 2012)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4981909A (en) * 1985-03-19 1991-01-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4751170A (en) * 1985-07-26 1988-06-14 Nippon Telegraph And Telephone Corporation Silylation method onto surface of polymer membrane and pattern formation process by the utilization of silylation method
US4702792A (en) * 1985-10-28 1987-10-27 International Business Machines Corporation Method of forming fine conductive lines, patterns and connectors
DE3541327A1 (de) * 1985-11-22 1987-05-27 Schwerionenforsch Gmbh Streuplatte zum auffangen eines reellen bildes in optischen systemen
DE3782833T2 (de) * 1986-02-10 1993-05-19 Loctite Ireland Ltd Im vakuum aufgebrachte photolacke aus anionisch polymerisierbaren monomeren.
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
EP0258719A3 (de) * 1986-08-30 1989-07-05 Ciba-Geigy Ag Zweischichtensystem
NL8700421A (nl) * 1987-02-20 1988-09-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting.
US4768291A (en) * 1987-03-12 1988-09-06 Monarch Technologies Corporation Apparatus for dry processing a semiconductor wafer
US4764247A (en) * 1987-03-18 1988-08-16 Syn Labs, Inc. Silicon containing resists
US4968582A (en) * 1988-06-28 1990-11-06 Mcnc And University Of Nc At Charlotte Photoresists resistant to oxygen plasmas
US5114827A (en) * 1988-06-28 1992-05-19 Microelectronics Center Of N.C. Photoresists resistant to oxygen plasmas
US5041362A (en) * 1989-07-06 1991-08-20 Texas Instruments Incorporated Dry developable resist etch chemistry
CA2019669A1 (en) * 1989-11-21 1991-05-21 John Woods Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists
US4988741A (en) * 1989-11-27 1991-01-29 General Electric Company Controlled release compositions and use
US5464538A (en) * 1989-12-29 1995-11-07 The Dow Chemical Company Reverse osmosis membrane
US5310581A (en) * 1989-12-29 1994-05-10 The Dow Chemical Company Photocurable compositions
US5238747A (en) * 1989-12-29 1993-08-24 The Dow Chemical Company Photocurable compositions
EP0453610B1 (de) * 1990-04-27 1996-06-26 Siemens Aktiengesellschaft Verfahren zur Erzeugung einer Resiststruktur
EP0492256B1 (de) * 1990-12-20 1996-08-14 Siemens Aktiengesellschaft Photolithographische Strukturerzeugung
US5550007A (en) * 1993-05-28 1996-08-27 Lucent Technologies Inc. Surface-imaging technique for lithographic processes for device fabrication
CN1149341A (zh) * 1994-05-25 1997-05-07 西门子公司 可干法显影的正性抗蚀剂
US5707783A (en) * 1995-12-04 1998-01-13 Complex Fluid Systems, Inc. Mixtures of mono- and DI- or polyfunctional silanes as silylating agents for top surface imaging

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4175963A (en) * 1974-05-02 1979-11-27 General Electric Company Method of exposing and curing an epoxy composition containing an aromatic onium salt
US3924520A (en) * 1974-06-27 1975-12-09 Hercules Inc Preparing lithographic plates utilizing vinyl monomers containing hydrolyzable silane groups
US4307177A (en) * 1975-12-09 1981-12-22 General Electric Company Method of using polymerizable compositions containing onium salts
US4081276A (en) * 1976-10-18 1978-03-28 General Electric Company Photographic method
FR2389922B1 (en, 2012) * 1977-05-03 1981-08-28 Thomson Csf
JPS5886726A (ja) * 1981-11-19 1983-05-24 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法
US4426247A (en) * 1982-04-12 1984-01-17 Nippon Telegraph & Telephone Public Corporation Method for forming micropattern
US4460436A (en) * 1983-09-06 1984-07-17 International Business Machines Corporation Deposition of polymer films by means of ion beams
WO1985002030A1 (en) * 1983-11-02 1985-05-09 Hughes Aircraft Company GRAFT POLYMERIZED SiO2 LITHOGRAPHIC MASKS
US4552833A (en) * 1984-05-14 1985-11-12 International Business Machines Corporation Radiation sensitive and oxygen plasma developable resist

Also Published As

Publication number Publication date
EP0192078A2 (en) 1986-08-27
US4551418A (en) 1985-11-05
CA1250177A (en) 1989-02-21
EP0192078A3 (en) 1988-07-13
JPS61189639A (ja) 1986-08-23
DE3667553D1 (de) 1990-01-18
EP0192078B1 (en) 1989-12-13

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