JPH05226739A - レーザ増幅器、レーザ発振器及びレーザダイオードの温度制御のための熱制御システム - Google Patents
レーザ増幅器、レーザ発振器及びレーザダイオードの温度制御のための熱制御システムInfo
- Publication number
- JPH05226739A JPH05226739A JP4089550A JP8955092A JPH05226739A JP H05226739 A JPH05226739 A JP H05226739A JP 4089550 A JP4089550 A JP 4089550A JP 8955092 A JP8955092 A JP 8955092A JP H05226739 A JPH05226739 A JP H05226739A
- Authority
- JP
- Japan
- Prior art keywords
- pump beam
- optical path
- pump
- gain medium
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 149
- 239000007787 solid Substances 0.000 claims description 71
- 230000004044 response Effects 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims 3
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000005086 pumping Methods 0.000 abstract description 8
- 238000010586 diagram Methods 0.000 description 10
- 238000003384 imaging method Methods 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000003491 array Methods 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 230000003321 amplification Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000002826 coolant Substances 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 239000002470 thermal conductor Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010017076 Fracture Diseases 0.000 description 1
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 208000013201 Stress fracture Diseases 0.000 description 1
- 208000026935 allergic disease Diseases 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 230000009610 hypersensitivity Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02423—Liquid cooling, e.g. a liquid cools a mount of the laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
- H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/042—Arrangements for thermal management for solid state lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/669,113 US5170406A (en) | 1991-03-13 | 1991-03-13 | High-power, end-pumped solid state laser |
| US669,113 | 1991-03-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05226739A true JPH05226739A (ja) | 1993-09-03 |
Family
ID=24685074
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4089550A Pending JPH05226739A (ja) | 1991-03-13 | 1992-03-13 | レーザ増幅器、レーザ発振器及びレーザダイオードの温度制御のための熱制御システム |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5170406A (enExample) |
| JP (1) | JPH05226739A (enExample) |
| DE (1) | DE4208147A1 (enExample) |
| FR (1) | FR2679709A1 (enExample) |
| GB (1) | GB2254485B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19603704B4 (de) * | 1995-02-15 | 2009-04-09 | Carl Zeiss | Optisch gepumpter Laser mit polarisationsabhängiger Absorption |
| GB9511688D0 (en) * | 1995-06-09 | 1995-08-02 | Lumonics Ltd | Laser system |
| US5748654A (en) * | 1996-06-17 | 1998-05-05 | Trw Inc. | Diode array providing either a pulsed or a CW mode of operation of a diode pumped solid state laser |
| US5900967A (en) * | 1996-12-12 | 1999-05-04 | Trw Inc. | Laser diode mounting technique to evenly deposit energy |
| US6157663A (en) * | 1998-04-16 | 2000-12-05 | 3D Systems, Inc. | Laser with optimized coupling of pump light to a gain medium in a side-pumped geometry |
| US6081542A (en) * | 1998-06-12 | 2000-06-27 | Lambda Physik Gmbh | Optically pumped laser with multi-facet gain medium |
| EP1089404A1 (en) * | 1999-09-28 | 2001-04-04 | ENEL S.p.A. | Resonator for solid-state laser source |
| US7149383B2 (en) | 2003-06-30 | 2006-12-12 | Finisar Corporation | Optical system with reduced back reflection |
| US6961489B2 (en) * | 2003-06-30 | 2005-11-01 | Finisar Corporation | High speed optical system |
| US7627016B2 (en) * | 2004-11-08 | 2009-12-01 | Laser Energetics, Inc. | Laser pumped tunable lasers |
| US20070166852A1 (en) * | 2003-09-22 | 2007-07-19 | Snake Creek Lasers Llc | Diode-pumped microlasers including resonator microchips and methods for producing the same |
| US20070121689A1 (en) * | 2003-09-22 | 2007-05-31 | Snake Creek Lasers Llc | Methods for Producing Diode-Pumped Micro Lasers |
| US20060083276A1 (en) * | 2004-09-28 | 2006-04-20 | Snake Creek Lasers, Llc. | Cryogenically cooled solid state lasers |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3582820A (en) * | 1968-04-29 | 1971-06-01 | American Optical Corp | Erbium laser device |
| US3903483A (en) * | 1974-01-07 | 1975-09-02 | Us Navy | Dye laser for holographic applications |
| FR2403666A1 (fr) * | 1977-09-14 | 1979-04-13 | Us Energy | Laser a tetrafluorure de carbone isotopique et procede pour produire une radiation infrarouge coherente |
| GB2215906B (en) * | 1988-02-10 | 1992-09-16 | Mitsubishi Electric Corp | Laser device |
| US4847851A (en) * | 1988-05-19 | 1989-07-11 | University Of South Florida | Butt-coupled single transverse mode diode pumped laser |
| US4901330A (en) * | 1988-07-20 | 1990-02-13 | Amoco Corporation | Optically pumped laser |
| US5081637A (en) * | 1989-11-28 | 1992-01-14 | Massachusetts Institute Of Technology | Multiple-laser pump optical system |
-
1991
- 1991-03-13 US US07/669,113 patent/US5170406A/en not_active Expired - Lifetime
-
1992
- 1992-02-27 GB GB9204193A patent/GB2254485B/en not_active Expired - Fee Related
- 1992-03-11 FR FR9202919A patent/FR2679709A1/fr active Granted
- 1992-03-13 JP JP4089550A patent/JPH05226739A/ja active Pending
- 1992-03-13 DE DE4208147A patent/DE4208147A1/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| GB9204193D0 (en) | 1992-04-08 |
| GB2254485B (en) | 1995-06-28 |
| US5170406A (en) | 1992-12-08 |
| FR2679709B1 (enExample) | 1995-05-05 |
| GB2254485A (en) | 1992-10-07 |
| FR2679709A1 (fr) | 1993-01-29 |
| DE4208147A1 (de) | 1992-09-17 |
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