JPH05224226A - Structure of transparent conductive thin film formed on film substrate and formation therefof - Google Patents

Structure of transparent conductive thin film formed on film substrate and formation therefof

Info

Publication number
JPH05224226A
JPH05224226A JP9225192A JP2519292A JPH05224226A JP H05224226 A JPH05224226 A JP H05224226A JP 9225192 A JP9225192 A JP 9225192A JP 2519292 A JP2519292 A JP 2519292A JP H05224226 A JPH05224226 A JP H05224226A
Authority
JP
Japan
Prior art keywords
transparent conductive
conductive thin
thin film
film
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9225192A
Other languages
Japanese (ja)
Inventor
Masakuni Itagaki
雅訓 板垣
Takumi Suzuki
巧 鈴木
Yuichi Ota
祐一 太田
Yuji Narumi
雄二 鳴海
Hiroshi Fujimura
浩 藤村
Hisao Takahashi
久雄 高橋
Hiroyuki Sakayori
寛幸 坂寄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP9225192A priority Critical patent/JPH05224226A/en
Publication of JPH05224226A publication Critical patent/JPH05224226A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To provide the structure of the transparent conductive thin films which eliminate the cracks generated at the time of connection in the state of lowering the specific resistance of the transparent conductive thin films and eliminates the problem that electrode patterns are visible. CONSTITUTION:A liquid crystal display cell is formed by forming the respectively striped transparent conductive thin films 2 on the inner side of a pair of film substrates 1A, 1B, sticking these film substrates 1A, 1B to each other, injecting a liquid crystal 4 therebetween and connecting the juncture S of the transparent conductive thin films 2 existing on the outer side of the film substrate 1A to the connecting terminal of a driving circuit board. The film thickness 2a of the transparent conductive thin films connected to the connecting terminal of the driving circuit board and the film thickness 26 of the parts where a sealant 3 exist are formed smaller than the film thickness in the part of the other striped transparent conductive thin film 2.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、駆動回路基板の接続端
子と接続される液晶表示素子のフイルム基板の透明導電
性薄膜の接続部及びその近傍部分の構造及びその形成方
法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a transparent conductive thin film connecting portion of a film substrate of a liquid crystal display element connected to a connecting terminal of a driving circuit substrate and its vicinity, and a method of forming the same.

【0002】[0002]

【従来の技術】液晶表示装置等に用いられるフイルム基
板に形成された透明導電性薄膜を、駆動回路基板の接続
端子に熱圧着法などにより接続すると、フイルム基板側
の透明導電性薄膜にクラックが入り、断線するという問
題を起こしている。特に、例えば、対角9〜10インチ
程度のLCDパネルに640×400ドットマトリクス
クラスの画素数を有するような、大容量のドットマトリ
クス電極をハイデューテイで駆動する場合には、透明導
電性薄膜の比抵抗を低くするために膜厚を厚くする必要
があり、この場合、膜厚は1000Å〜3000Åの厚
みを必要とし、接続により透明導電性薄膜の接続部が断
線すると言う前述した問題は顕著である。
2. Description of the Related Art When a transparent conductive thin film formed on a film substrate used for a liquid crystal display device or the like is connected to a connecting terminal of a driving circuit substrate by a thermocompression bonding method or the like, a crack is formed on the transparent conductive thin film on the film substrate side. It causes the problem of entering and breaking. In particular, when driving a large-capacity dot matrix electrode with a high duty such as having a pixel number of 640 × 400 dot matrix class in an LCD panel having a diagonal size of 9 to 10 inches, the ratio of the transparent conductive thin film is It is necessary to increase the film thickness in order to reduce the resistance. In this case, the film thickness is required to be 1000Å to 3000Å, and the above-mentioned problem that the connecting portion of the transparent conductive thin film is disconnected due to the connection is remarkable. ..

【0003】また、従来の透明導電性薄膜の膜厚におい
て、この透明導電性薄膜によって光透過率が低下し、透
明導電性薄膜のパターンのあるところとないところによ
って透過率の差が大きくなり、いわゆる,非点灯時にお
ける電極パターンの見えが問題となっている。
Further, in the film thickness of the conventional transparent conductive thin film, the light transmittance is reduced by this transparent conductive thin film, and the difference in the transmittance becomes large depending on the presence or absence of the pattern of the transparent conductive thin film. The so-called visibility of the electrode pattern when not lit is a problem.

【0004】[0004]

【発明が解決しようとする課題】本発明は、フイルム基
板に形成された透明導電性薄膜に発生する従来の問題点
を解決すると共に、透明導電性薄膜の比抵抗を低くした
状態において、接続時に発生したクラックを解消し、且
つ電極パターン見えの問題のない透明導電性薄膜の構造
を提供することを目的とするものである。
DISCLOSURE OF THE INVENTION The present invention solves the conventional problems that occur in a transparent conductive thin film formed on a film substrate and, at the time of connection, when the specific resistance of the transparent conductive thin film is low. It is an object of the present invention to provide a structure of a transparent conductive thin film that eliminates cracks that have occurred and does not cause a problem of the appearance of an electrode pattern.

【0005】[0005]

【課題を解決するための手段】本発明は、前記目的を達
成するために、駆動回路基板の接続端子に接続されるフ
イルム基板側のストライプ状に形成された透明導電性薄
膜の構成において、前記透明導電性薄膜の厚みは、スト
ライプ状に形成された透明導電性薄膜のうち、前記接続
端子との接続部を薄く形成したことを特徴とするもので
ある。
In order to achieve the above object, the present invention provides a transparent conductive thin film formed in a stripe shape on the side of a film substrate, which is connected to a connection terminal of a drive circuit substrate. The thickness of the transparent conductive thin film is characterized in that, among the transparent conductive thin films formed in a stripe shape, the connection portion with the connection terminal is formed thin.

【0006】本発明は、一対のフイルム基板の内側に夫
々ストライプ状の透明導電性薄膜を形成し、この一対の
フイルム基板を貼り合わせて液晶を注入し、フイルム基
板の外側に位置する透明導電性薄膜の接続部を駆動回路
基板の接続端子と接続する液晶表示セルにおいて、透明
導電性薄膜の膜厚は駆動回路基板の接続端子と接続され
る部分の膜厚を他のストライプ状の透明導電性薄膜の部
分よりも薄く形成したことを特徴とするものである。
According to the present invention, stripe-shaped transparent conductive thin films are formed inside a pair of film substrates, and the pair of film substrates are bonded to each other to inject a liquid crystal. In a liquid crystal display cell that connects the connection part of the thin film to the connection terminal of the drive circuit board, the film thickness of the transparent conductive thin film is the thickness of the part connected to the connection terminal of the drive circuit board, and the other stripe-shaped transparent conductive film. It is characterized in that it is formed thinner than the thin film portion.

【0007】また、本発明は、透明導電性薄膜の膜厚を
駆動回路基板の接続端子と接続される部分以外に、シー
ル剤と接触する部分、シール剤と有効表示部との間の部
分を夫々薄くすることを特徴とし、その薄くした膜厚
は、300Å以上、1000Å以下であることを特徴と
するものである。
Further, according to the present invention, the thickness of the transparent conductive thin film is not limited to the portion connected to the connection terminal of the drive circuit board, the portion contacting with the sealing agent, and the portion between the sealing agent and the effective display portion. Each is characterized by being thinned, and the thinned film thickness is characterized by being 300 Å or more and 1000 Å or less.

【0008】また、本発明は、一対のフイルム基板の内
側に夫々ストライプ状の透明導電性薄膜を形成し、この
一対のフイルム基板を貼り合わせて液晶を注入し、フイ
ルム基板の外側に位置する透明導電性薄膜の接続部を駆
動回路基板の接続端子と接続し、透明導電性薄膜として
ドットマトリクス表示部と他の表示部を備えた液晶表示
セルにおいて、透明導電性薄膜の膜厚はドットマトリク
ス表示部の膜厚を通常の厚さとし、接続される部分、ド
ットマトリクス表示部以外の部分の膜厚を薄く形成した
ことを特徴とするものである。
Further, according to the present invention, a stripe-shaped transparent conductive thin film is formed inside each of a pair of film substrates, and the pair of film substrates are bonded to each other to inject a liquid crystal. In a liquid crystal display cell in which the connection part of the conductive thin film is connected to the connection terminal of the drive circuit board and the dot matrix display part and other display part are provided as the transparent conductive thin film, the film thickness of the transparent conductive thin film is dot matrix display. It is characterized in that the thickness of the portion is set to a normal thickness, and the thickness of the portion to be connected and the portion other than the dot matrix display portion is thin.

【0009】更に、本発明は、一対のフイルム基板の内
側に夫々ストライプ状の透明導電性薄膜を形成し、この
一対のフイルム基板を貼り合わせて液晶を注入し、フイ
ルム基板の外側に位置する透明導電性薄膜の接続部を駆
動回路基板の接続端子と接続する液晶表示セルにおい
て、前記一対のフイルム基板を貼り合わせた後の液晶表
示セルをエッチング雰囲気内に配置し、外部に出ている
透明導電性薄膜の接続部の膜厚を薄く形成することを特
徴とするものである。
Further, according to the present invention, a transparent conductive thin film having a stripe shape is formed inside each of a pair of film substrates, and the pair of film substrates are bonded together to inject a liquid crystal. In a liquid crystal display cell in which the connection part of the conductive thin film is connected to the connection terminal of the drive circuit board, the liquid crystal display cell after the pair of film substrates are bonded together is placed in an etching atmosphere, and the transparent conductive film is exposed to the outside. It is characterized in that the connecting portion of the conductive thin film is formed thin.

【0010】[0010]

【作用】本発明の構成により、駆動回路基板の接続端子
に接続されるフイルム基板上の透明導電性薄膜の部分の
膜厚を薄く形成したことによって、透明導電性薄膜の比
抵抗を低くした状態において、熱圧着による接続の際
に、透明導電性薄膜にクラックを発生することなく、接
続の信頼性を確保することができた。
With the structure of the present invention, the specific resistance of the transparent conductive thin film is lowered by forming the thin film thickness of the transparent conductive thin film portion on the film substrate connected to the connection terminal of the drive circuit substrate. In, in the connection by thermocompression bonding, it was possible to secure the reliability of the connection without generating a crack in the transparent conductive thin film.

【0011】[0011]

【実施例】以下、本発明の実施例について説明する。本
発明の基本的な構成を説明するために、フイルム基板上
にストライプ状に形成される透明導電性薄膜の膜厚
(A)と、該膜厚(A)を有するフイルム基板と駆動回
路基板の接続端子とを熱圧着した場合における、透明導
電性薄膜パターンの全本数に対するクラックが発生した
透明導電性薄膜パターンの本数の割合を、表1に示して
いる。
EXAMPLES Examples of the present invention will be described below. In order to explain the basic structure of the present invention, the film thickness (A) of a transparent conductive thin film formed in stripes on a film substrate, and the film substrate having the film thickness (A) and the drive circuit substrate Table 1 shows the ratio of the number of transparent conductive thin film patterns in which cracks have occurred to the total number of transparent conductive thin film patterns when the connection terminals are thermocompression bonded.

【表1】 [Table 1]

【0012】この表1の結果は、通常の熱圧着条件より
も、熱,圧力ともに高くし、不良の検出能力を上げて熱
圧着を行ったものであり、この熱圧着条件を最適化する
ことによって、クラックの発生する膜厚の範囲を拡大す
ることは可能であるが、液晶表示装置等の製品が長期に
わたって信頼性を確保するには、前記実験の結果から、
透明導電性薄膜の膜厚を1000Å以下にする設定する
と、良い結果をもたらすことが明らかとなった。 (1 通常の透明導電性薄膜の膜厚は、また、透明導電
性薄膜の非抵抗を低くした場合の膜厚は?)
The results shown in Table 1 are obtained by performing thermocompression bonding with higher heat and pressure than normal thermocompression bonding conditions to improve the defect detection capability, and to optimize the thermocompression bonding conditions. Although it is possible to expand the range of film thickness where cracks occur, in order to ensure reliability of products such as liquid crystal display devices over a long period of time, from the results of the above experiment,
It was revealed that setting the thickness of the transparent conductive thin film to 1000 Å or less gives good results. (1 What is the film thickness of a normal transparent conductive thin film, and when the non-resistance of the transparent conductive thin film is reduced?)

【0013】次に、本発明の実施例1について説明す
る。フイルム基板1上には、酸化インヂウム・錫(IT
O)からなる透明導電性薄膜2がストライプ状のパター
ンとして形成されており、この平面図を図1、断面図を
図2に夫々示している。このフイルム基板1の透明導電
性薄膜2は、図示されていない駆動回路基板の接続端子
と接続される接続部Sを有し、該接続部Sの透明導電性
薄膜2aの膜厚Aは、透明導電性薄膜2の膜厚よりも薄
く構成されている。この実施例1において、フイルム基
板1上には、約2000Åの膜厚を有する透明導電性薄
膜2が形成され、接続部Sの透明導電性薄膜2aは80
0Åの膜厚とした。
Next, a first embodiment of the present invention will be described. On the film substrate 1, indium tin oxide (IT
The transparent conductive thin film 2 made of O) is formed as a stripe pattern, and its plan view is shown in FIG. 1 and its cross-sectional view is shown in FIG. The transparent conductive thin film 2 of the film substrate 1 has a connection portion S connected to a connection terminal of a drive circuit board (not shown), and the film thickness A of the transparent conductive thin film 2a of the connection portion S is transparent. It is configured to be thinner than the film thickness of the conductive thin film 2. In this Example 1, the transparent conductive thin film 2 having a film thickness of about 2000 Å is formed on the film substrate 1, and the transparent conductive thin film 2a of the connection portion S has a thickness of 80.
The film thickness was 0Å.

【0014】接続部Sの透明導電性薄膜2aの膜厚を1
000Å以下とすることにより、駆動回路基板との熱圧
着による接続において、透明導電性薄膜2aにクラック
が発生しないことが確認された。また、接続部Sの透明
導電性薄膜2aの膜厚が300Å以下に設定されると、
接続部Sの透明導電性薄膜2aにおける比抵抗が大きく
なるが、望ましくは、膜厚を500Å以上にすることに
よって、接続抵抗は大きく増加することはなく、製品と
して支障をきたすことがないことが明らかになった。接
続部Sの透明導電性薄膜2aの膜厚は、300Å以上、
1000Å以下であれば、従来の欠点が解消できるが、
最適の膜厚としては、800Åが採用された。
The thickness of the transparent conductive thin film 2a of the connecting portion S is set to 1
It has been confirmed that the transparent conductive thin film 2a is not cracked in the connection by thermocompression bonding to the drive circuit board by setting it to 000Å or less. Further, when the film thickness of the transparent conductive thin film 2a of the connecting portion S is set to 300 Å or less,
Although the specific resistance of the transparent conductive thin film 2a of the connection portion S is increased, it is desirable that the connection resistance is not significantly increased by setting the film thickness to 500 Å or more, and there is no problem as a product. It was revealed. The film thickness of the transparent conductive thin film 2a of the connection portion S is 300 Å or more,
If it is 1000Å or less, the conventional defects can be solved,
800 Å was adopted as the optimum film thickness.

【0015】このような接続部Sの透明導電性薄膜2a
の膜厚を得るためには、フイルム基板の対向表面に夫
々、透明導電性薄膜をマスクを介して蒸着するか、該導
電性薄膜を全面に被着し、レジスト塗布,現像,エッチ
ング,洗浄の工程を経て電極パターンを形成し、配向層
形成、ラビング処理、シール剤を介してのフイルム基板
の貼り合わせを行った後、本発明において、(CF4
2 )などのドライエッチング雰囲気、または(塩酸+
塩化第2鉄+水)のようなウェットエッチング雰囲気に
前記貼り合わせをした液晶表示セルを置くことにより、
外側に出ている駆動回路基板との接続部3の透明導電性
薄膜2aの膜厚を薄く形成することができる。
The transparent conductive thin film 2a of such a connecting portion S is formed.
In order to obtain the film thickness of, the transparent conductive thin film is vapor-deposited through a mask on the opposing surface of the film substrate respectively, or the conductive thin film is deposited on the entire surface, and resist coating, development, etching and cleaning are performed. After an electrode pattern is formed through the steps, an alignment layer is formed, a rubbing treatment is performed, and a film substrate is bonded via a sealant, the present invention provides (CF 4 +
Dry etching atmosphere such as O 2 or (hydrochloric acid +
By placing the laminated liquid crystal display cell in a wet etching atmosphere such as ferric chloride + water),
The film thickness of the transparent conductive thin film 2a of the connecting portion 3 with the drive circuit board which is exposed to the outside can be formed thin.

【0016】次に、本発明の実施例2について説明す
る。実施例2は、フイルム基板1上に形成した透明導電
性薄膜2において、実施例1における接続部Sの透明導
電性薄膜2a部分の他、シール剤3が位置する透明導電
性薄膜2b部分が、液晶4と接する透明導電性薄膜2の
膜厚よりも薄く構成したものである。二枚のフイルム基
板1A,1Bは貼り合わされるために、エポキシ系等の
シール剤3がフイルム基板1A,1Bのいずれか一方の
周辺部に塗布される。この場合、シール剤3の接するフ
イルム基板1A,1B面を荒らしておくことにより、そ
の接着力を増加させることができる。
Next, a second embodiment of the present invention will be described. In Example 2, in the transparent conductive thin film 2 formed on the film substrate 1, in addition to the transparent conductive thin film 2a portion of the connecting portion S in Example 1, the transparent conductive thin film 2b portion where the sealant 3 is located is It is configured to be thinner than the film thickness of the transparent conductive thin film 2 in contact with the liquid crystal 4. Since the two film substrates 1A and 1B are attached to each other, an epoxy-based sealing agent 3 is applied to the peripheral portion of either one of the film substrates 1A and 1B. In this case, the adhesive force can be increased by roughening the surfaces of the film substrates 1A and 1B with which the sealant 3 is in contact.

【0017】図3及び図4に示されるように、この実施
例においては、実施例1に示したと同様な方法で、フイ
ルム基板に形成された透明導電性薄膜2のうち、シール
剤3が接する部分から接続部Sに到る透明導電性薄膜2
a,2bの部分をエッチングによって薄く形成し、シー
ル剤3が位置する部分及び接続部Sの部分の表面を荒ら
し、シール剤3との接着強度を増加させたものである。
この場合、接続部Sの部分に位置する透明導電性薄膜2
aも薄く形成されるので、駆動回路基板の接続端子との
接続を良好にすることができる。
As shown in FIGS. 3 and 4, in this embodiment, the sealing agent 3 of the transparent conductive thin film 2 formed on the film substrate is brought into contact with the film in the same manner as in the first embodiment. Transparent conductive thin film 2 from part to connection part S
The portions a and 2b are thinly formed by etching to roughen the surface of the portion where the sealant 3 is located and the portion of the connection portion S, thereby increasing the adhesive strength with the sealant 3.
In this case, the transparent conductive thin film 2 located at the connecting portion S
Since a is also formed thin, the connection with the connection terminal of the drive circuit board can be improved.

【0018】また、図5,6には、本発明の実施例3が
示されている。この実施例では、フイルム基板1上に形
成した透明導電性薄膜2は、液晶表示セルの有効表示部
Hの部分を除いて薄く形成される。液晶表示セルにおい
て、一般に、シール剤3により二枚のフイルム基板1
A,1Bは貼り合わされるが、シール剤3が所望の厚さ
迄つぶれきることができず、シール剤3の近傍では、液
晶表示セルの中央部分に比べて、スペースが厚くなる傾
向がある。このような液晶表示セルでは、シール近傍に
おいて色むらが発生する。
A third embodiment of the present invention is shown in FIGS. In this embodiment, the transparent conductive thin film 2 formed on the film substrate 1 is formed thin except for the effective display portion H of the liquid crystal display cell. In a liquid crystal display cell, two film substrates 1 are generally provided with a sealant 3.
Although A and 1B are pasted together, the sealant 3 cannot be crushed to a desired thickness, and the space in the vicinity of the sealant 3 tends to be thicker than in the central portion of the liquid crystal display cell. In such a liquid crystal display cell, color unevenness occurs near the seal.

【0019】本発明の実施例では、このような液晶表示
セルにおける前記色むらの発生を防止するため、液晶表
示セルの有効表示部Hの外側に位置する透明導電性薄膜
2の膜厚,すなわち、接続部の部分2aとシール剤3が
位置する部分2bとシール剤3が位置する内側部分2c
における透明導電性薄膜の膜厚を800Å程度の薄い厚
みとした。したがって、シール剤3の内部に収容された
液晶4の厚みをシール剤3の近傍部分まで均一とするこ
とができることが判明した。
In the embodiment of the present invention, in order to prevent the occurrence of the color unevenness in the liquid crystal display cell, the film thickness of the transparent conductive thin film 2 located outside the effective display portion H of the liquid crystal display cell, that is, , A portion 2a of the connecting portion, a portion 2b where the sealant 3 is located, and an inner portion 2c where the sealant 3 is located
The film thickness of the transparent conductive thin film in the above was set to a thin thickness of about 800Å. Therefore, it was found that the thickness of the liquid crystal 4 housed inside the sealant 3 can be made uniform up to the vicinity of the sealant 3.

【0020】そして、シール剤3の近傍部分の透明導電
性薄膜2cを薄くすることにより、フイルム基板の腰が
弱くなり、シール剤3がつぶれ易くなる。また、実施例
3では、実施例1及び実施例2で示したシール強度を増
加し、駆動回路基板との接続も良好とした液晶表示装置
を実現できるものである。
By thinning the transparent conductive thin film 2c in the vicinity of the sealant 3, the film substrate becomes less stiff and the sealant 3 is easily crushed. Further, in the third embodiment, the liquid crystal display device in which the sealing strength shown in the first and second embodiments is increased and the connection with the drive circuit board is good can be realized.

【0021】図7,8には、本発明の実施例4を示して
いる。この実施例では、液晶表示装置において、ドット
マトリクス表示部Mと固定文字表示部Kとを備えてお
り、非点灯時において、固定文字表示部及びこれに付随
する配線電極のパターンがはっきり見えるという,いわ
ゆる、電極見えという問題を有している。この問題は、
特に、低抵抗の透明導電性薄膜を使用した場合に顕著で
あり、透明導電性薄膜が厚いことにより、透明導電性薄
膜のある部分と透明導電性薄膜のない部分との光透過率
の差が大きくなるためである。
7 and 8 show Embodiment 4 of the present invention. In this embodiment, the liquid crystal display device is provided with a dot matrix display portion M and a fixed character display portion K, and the pattern of the fixed character display portion and the wiring electrodes associated therewith can be clearly seen when not illuminated. There is a problem that the electrodes are visible. This problem,
In particular, it is remarkable when a low resistance transparent conductive thin film is used, and because the transparent conductive thin film is thick, the difference in light transmittance between the part with the transparent conductive thin film and the part without the transparent conductive thin film is large. This is because it becomes larger.

【0022】本発明の実施例4では、図7,8に示され
るように、有効表示部におけるドットマトリクス表示部
M以外の透明導電性薄膜の膜厚を800Å程度に薄く構
成したものである。したがって、この実施例では、電極
見えを防止することができ、併せて、実施例1〜実施例
3に示した優れた作用効果を有する液晶表示装置を実現
することができた。
In Embodiment 4 of the present invention, as shown in FIGS. 7 and 8, the transparent conductive thin film other than the dot matrix display portion M in the effective display portion is thinned to about 800 Å. Therefore, in this example, it was possible to prevent the electrodes from being seen, and at the same time, it was possible to realize the liquid crystal display device having the excellent action and effect shown in Examples 1 to 3.

【0023】[0023]

【発明の効果】本発明の構成により、フイルム基板と駆
動回路基板とを熱圧着接続する際に、透明導電性薄膜に
発生したクラックを解消する効果を有し、更に、透明導
電性薄膜を所定の範囲まで薄くすることにより、シール
剤の接着強度を増加させ、また、液晶表示セルで発生し
ている色むらを解消でき、且つ電極見えの現象を防止す
る等の効果を有する。
The structure of the present invention has the effect of eliminating cracks generated in the transparent conductive thin film when the film substrate and the driving circuit substrate are thermocompression-bonded to each other. By reducing the thickness to the above range, the adhesive strength of the sealant can be increased, the color unevenness occurring in the liquid crystal display cell can be eliminated, and the phenomenon of electrode appearance can be prevented.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例1に係わるフイルム基板上の透
明導電性薄膜の構成を示す平面図である。
FIG. 1 is a plan view showing a structure of a transparent conductive thin film on a film substrate according to a first embodiment of the present invention.

【図2】図1の透明導電性薄膜部分の断面図である。FIG. 2 is a cross-sectional view of the transparent conductive thin film portion of FIG.

【図3】本発明の実施例2に係わる一対のフイルム基板
を接合した液晶表示セルにおける透明導電性薄膜の配置
を示す平面図である。
FIG. 3 is a plan view showing an arrangement of transparent conductive thin films in a liquid crystal display cell in which a pair of film substrates according to a second embodiment of the present invention are joined.

【図4】図3における透明導電性薄膜の構成を示す断面
図である。
FIG. 4 is a cross-sectional view showing the configuration of the transparent conductive thin film in FIG.

【図5】本発明の実施例3に係わる一対のフイルム基板
を接合した液晶表示セルにおける透明導電性薄膜の配置
を示す平面図である。
FIG. 5 is a plan view showing an arrangement of transparent conductive thin films in a liquid crystal display cell in which a pair of film substrates according to Example 3 of the present invention are joined.

【図6】図5における透明導電性薄膜の構成を示す断面
図である。
6 is a cross-sectional view showing the structure of the transparent conductive thin film in FIG.

【図7】本発明の実施例4に係わるドットマトリクス表
示部と固定文字表示部とを有す液晶表示装置における透
明導電性薄膜の配置を示す平面図である。
FIG. 7 is a plan view showing an arrangement of transparent conductive thin films in a liquid crystal display device having a dot matrix display section and a fixed character display section according to Example 4 of the present invention.

【図8】図7における透明導電性薄膜の構成を示す断面
図である。
FIG. 8 is a cross-sectional view showing the configuration of the transparent conductive thin film in FIG.

【符号の説明】[Explanation of symbols]

1 フイルム基板 2 透明導電性薄膜 2a 駆動回路基板と接続する透明導電性薄膜 2b シール剤の位置する部分の透明導電性薄膜 2c 有効表示部とシール剤との間の透明導電性薄
膜 3 シール剤 4 液晶 S 駆動回路基板との接続部 H 有効表示部 M ドットマトリクス表示部 K 固定文字表示部
1 Film Substrate 2 Transparent Conductive Thin Film 2a Transparent Conductive Thin Film 2b Connected to Driving Circuit Board 2c Transparent Conductive Thin Film at the Position of Sealant 2c Transparent Conductive Thin Film between Effective Display Area and Sealant 3 Sealant 4 Liquid crystal S Connection with drive circuit board H Effective display area M Dot matrix display area K Fixed character display area

───────────────────────────────────────────────────── フロントページの続き (72)発明者 鳴海 雄二 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 藤村 浩 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 高橋 久雄 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 坂寄 寛幸 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yuji Narumi 1-3-6 Nakamagome, Ota-ku, Tokyo Within Ricoh Company (72) Inventor Hiroshi Fujimura 1-3-6 Nakamagome, Ota-ku, Tokyo Shares Inside Ricoh Company (72) Inventor Hisao Takahashi 1-3-6 Nakamagome, Ota-ku, Tokyo Stock Company Ricoh (72) Inventor Hiroyuki Sakayori 1-3-6 Nakamagome, Tokyo Stockholder Ricoh Company

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 駆動回路基板の接続端子に接続されるフ
イルム基板側のストライプ状に形成された透明導電性薄
膜の構造において、前記透明導電性薄膜の厚みは、スト
ライプ状に形成された透明導電性薄膜のうち、前記接続
端子との接続部を薄く形成したことを特徴とするフイル
ム基板に形成された透明導電性薄膜の構造。
1. A structure of a transparent conductive thin film formed in a stripe shape on the side of a film substrate connected to a connection terminal of a drive circuit board, wherein the thickness of the transparent conductive thin film is the transparent conductive film formed in a stripe shape. A structure of a transparent conductive thin film formed on a film substrate, characterized in that a connecting portion with the connection terminal is thinly formed in the conductive thin film.
【請求項2】 一対のフイルム基板の内側に夫々ストラ
イプ状の透明導電性薄膜を形成し、この一対のフイルム
基板を貼り合わせて液晶を注入し、フイルム基板の外側
に位置する透明導電性薄膜の接続部を駆動回路基板の接
続端子と接続する液晶表示セルにおいて、透明導電性薄
膜の膜厚は駆動回路基板の接続端子と接続される部分の
膜厚を他のストライプ状の透明導電性薄膜の部分よりも
薄く形成したことを特徴とする液晶表示装置のフイルム
基板に形成された透明導電性薄膜の構造。
2. A stripe-shaped transparent conductive thin film is formed inside each of a pair of film substrates, the pair of film substrates are bonded to each other to inject a liquid crystal, and a transparent conductive thin film located outside the film substrate is formed. In a liquid crystal display cell in which the connection portion is connected to the connection terminal of the drive circuit board, the thickness of the transparent conductive thin film is the thickness of the portion connected to the connection terminal of the drive circuit board to that of another stripe-shaped transparent conductive thin film. A structure of a transparent conductive thin film formed on a film substrate of a liquid crystal display device characterized by being formed thinner than a portion.
【請求項3】 透明導電性薄膜の膜厚は駆動回路基板の
接続端子と接続される部分からシール剤と接触する部分
に到る膜厚を他のストライプ状の透明導電性薄膜の部分
よりも薄く形成したことを特徴とする請求項2記載の液
晶表示装置のフイルム基板に形成された透明導電性薄膜
の構造。
3. The film thickness of the transparent conductive thin film is such that the film thickness from the part connected to the connection terminal of the drive circuit board to the part in contact with the sealant is smaller than that of the other striped transparent conductive thin film. The structure of the transparent conductive thin film formed on the film substrate of the liquid crystal display device according to claim 2, wherein the structure is thin.
【請求項4】 透明導電性薄膜の膜厚は駆動回路基板の
接続端子と接続される部分から液晶による有効表示部分
の外側に到る膜厚を有効表示部分の透明導電性薄膜の部
分よりも薄く形成したことを特徴とする請求項2記載の
液晶表示装置のフイルム基板に形成された透明導電性薄
膜の構造。
4. The film thickness of the transparent conductive thin film is such that the film thickness from the portion connected to the connection terminal of the drive circuit board to the outside of the effective display portion of the liquid crystal is more than that of the transparent conductive thin film portion of the effective display portion. The structure of the transparent conductive thin film formed on the film substrate of the liquid crystal display device according to claim 2, wherein the structure is thin.
【請求項5】 一対のフイルム基板の内側に夫々ストラ
イプ状の透明導電性薄膜を形成し、この一対のフイルム
基板を貼り合わせて液晶を注入し、フイルム基板の外側
に位置する透明導電性薄膜の接続部を駆動回路基板の接
続端子と接続し、透明導電性薄膜としてドットマトリク
ス表示部と他の表示部を備えた液晶表示セルにおいて、
透明導電性薄膜の膜厚はドットマトリクス表示部の膜厚
を通常の厚さとし、接続される部分、ドットマトリクス
表示部以外の部分の膜厚を薄く形成したことを特徴とす
る液晶表示装置のフイルム基板に形成された透明導電性
薄膜の構造。
5. A stripe-shaped transparent conductive thin film is formed inside each of a pair of film substrates, the pair of film substrates are bonded to each other to inject a liquid crystal, and a transparent conductive thin film located outside the film substrate is formed. In a liquid crystal display cell having a dot matrix display section and another display section as a transparent conductive thin film, the connection section is connected to a connection terminal of a drive circuit board,
The film thickness of the transparent conductive thin film is the film thickness of the dot matrix display portion being a normal thickness, and the film thickness of the connection portion and the portion other than the dot matrix display portion is formed thin. Structure of the transparent conductive thin film formed on the substrate.
【請求項6】 前記透明導電性薄膜において、薄くした
膜厚は、300Å以上、1000Å以下であることを特
徴とする請求項1,2,5記載のフイルム基板に形成さ
れた透明導電性薄膜の構造。
6. The transparent conductive thin film formed on the film substrate according to claim 1, wherein the thin film thickness of the transparent conductive thin film is 300 Å or more and 1000 Å or less. Construction.
【請求項7】 一対のフイルム基板の内側に夫々ストラ
イプ状の透明導電性薄膜を形成し、この一対のフイルム
基板を貼り合わせて液晶を注入し、フイルム基板の外側
に位置する透明導電性薄膜の接続部を駆動回路基板の接
続端子と接続する液晶表示セルにおいて、前記一対のフ
イルム基板を貼り合わせた後の液晶表示セルをエッチン
グ雰囲気内に配置し、外部に出ている透明導電性薄膜の
接続部の膜厚を薄く形成することを特徴とする透明導電
性薄膜の形成方法。
7. A stripe-shaped transparent conductive thin film is formed inside each of a pair of film substrates, the pair of film substrates are bonded to each other, liquid crystal is injected, and a transparent conductive thin film positioned outside the film substrate is formed. In a liquid crystal display cell in which a connection portion is connected to a connection terminal of a drive circuit board, the liquid crystal display cell after the pair of film substrates are bonded together is placed in an etching atmosphere, and a transparent conductive thin film that is exposed to the outside is connected. A method for forming a transparent conductive thin film, characterized in that the film thickness of a portion is formed thin.
JP9225192A 1992-02-12 1992-02-12 Structure of transparent conductive thin film formed on film substrate and formation therefof Withdrawn JPH05224226A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9225192A JPH05224226A (en) 1992-02-12 1992-02-12 Structure of transparent conductive thin film formed on film substrate and formation therefof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9225192A JPH05224226A (en) 1992-02-12 1992-02-12 Structure of transparent conductive thin film formed on film substrate and formation therefof

Publications (1)

Publication Number Publication Date
JPH05224226A true JPH05224226A (en) 1993-09-03

Family

ID=12159104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9225192A Withdrawn JPH05224226A (en) 1992-02-12 1992-02-12 Structure of transparent conductive thin film formed on film substrate and formation therefof

Country Status (1)

Country Link
JP (1) JPH05224226A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6683669B1 (en) 1999-08-06 2004-01-27 Sharp Kabushiki Kaisha Apparatus and method for fabricating substrate of a liquid crystal display device and interconnects therein

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6683669B1 (en) 1999-08-06 2004-01-27 Sharp Kabushiki Kaisha Apparatus and method for fabricating substrate of a liquid crystal display device and interconnects therein

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