JPH05220442A - Method for forming protective film - Google Patents

Method for forming protective film

Info

Publication number
JPH05220442A
JPH05220442A JP2692192A JP2692192A JPH05220442A JP H05220442 A JPH05220442 A JP H05220442A JP 2692192 A JP2692192 A JP 2692192A JP 2692192 A JP2692192 A JP 2692192A JP H05220442 A JPH05220442 A JP H05220442A
Authority
JP
Japan
Prior art keywords
protective film
coating
forming
liquid
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2692192A
Other languages
Japanese (ja)
Inventor
Hiroyuki Watanabe
裕之 渡辺
Yasuo Fujiwara
安夫 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP2692192A priority Critical patent/JPH05220442A/en
Publication of JPH05220442A publication Critical patent/JPH05220442A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To form a protective film having extremely uniform thickness by almost horizontally rotating the protective film forming surface of a base material and supplying a protective film forming substance to the rotating surface from a nozzle at a predetermined jet speed to form a liquid film and subsequently curing the liquid film. CONSTITUTION:In forming a protective film 7 on the protective film forming surface of a base material 1 by a spin coating method, said protective film forming surface is almost horizontally rotated and a liquid protective film forming substance whose viscosity is adjusted to 20cps or less is supplied to the rotating surface from a nozzle at a jet speed of 110cm/sec or less to form a liquid film which is, in turn, cured to form the protective film 7. As mentioned above, the viscosity at the time of coating of the curable resin used in the formation of the protective film 7 is set to 20cps or less. When said viscosity is higher than 20cps, the thickness control of the protective film becomes hard. When the jet speed of the curable resin is higher than 110cm/sec, coating irregularity is generated and non-uniformity is generated in the thickness of the protective film 7.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は保護膜の形成方法に関す
る。詳しくは、光ディスク等のような合成樹脂基材の表
面に傷つき防止のために硬質の保護膜を形成する方法に
関するものである。
FIELD OF THE INVENTION The present invention relates to a method for forming a protective film. More specifically, the present invention relates to a method of forming a hard protective film on the surface of a synthetic resin substrate such as an optical disc to prevent scratches.

【0002】[0002]

【従来の技術】近年、大容量メモリーとしてライトワン
ス型、書換え可能型等の光記録媒体が注目されている。
光記録媒体は、透明基板上の一方の面に信号の記録され
る記録層が形成されてなるが、記録、再生は通常その反
対側(以下、基板側)からレーザー収束光により行われ
る。従って基板側は大気にさらされた状態で使用され、
塵埃が付着し傷の発生の原因となる。
2. Description of the Related Art In recent years, an optical recording medium such as a write-once type or a rewritable type has attracted attention as a large capacity memory.
An optical recording medium has a recording layer on which a signal is recorded, which is formed on one surface of a transparent substrate. Recording and reproduction are usually performed by converging laser light from the opposite side (hereinafter, substrate side). Therefore, the substrate side is used while being exposed to the atmosphere,
Dust may adhere and cause scratches.

【0003】基板としては通常ポリカーボネート等の透
明樹脂基板が使用されるが、透明樹脂基板は金属等と比
較するとその表面硬度が低く、物理的衝撃により容易に
傷がつく。傷の発生は、レーザ光による記録、再生を阻
害する。そこで、基板側に紫外線硬化樹脂等の比較的硬
度の高い透明樹脂皮膜を保護膜として形成し、基板の保
護を行うという方法が知られている。
A transparent resin substrate such as polycarbonate is usually used as a substrate, but the surface hardness of the transparent resin substrate is lower than that of metal and the like, and the substrate is easily scratched by physical impact. The generation of scratches hinders recording and reproduction with laser light. Therefore, a method is known in which a transparent resin film having a relatively high hardness such as an ultraviolet curable resin is formed as a protective film on the substrate side to protect the substrate.

【0004】[0004]

【発明が解決しようとする課題】保護膜を形成する方法
としては一般的にスピンコート法が用いられるが、スピ
ンコート法を用いた場合、塗布条件によっては形成され
る保護膜の膜厚に不均一が生じることがある。さらに保
護膜の膜厚が不均一である範囲が保護膜上でのレーザー
ビーム径(1mm程度)に比較して充分には小さくない場
合、記録、再生に悪影響を与えることがある。最悪の場
合は、フォーカスエラー、トラッキングエラーが発生
し、サーボのはずれ、動作停止等を引き起こすこともあ
る。本発明はこれらの事実を鑑みてなされたものであ
り、前記保護膜の膜厚を均一とすることを目的とする。
A spin coating method is generally used as a method for forming a protective film. However, when the spin coating method is used, the thickness of the protective film formed may vary depending on the coating conditions. Uniformity may occur. Further, if the range in which the thickness of the protective film is not uniform is not sufficiently smaller than the laser beam diameter (about 1 mm) on the protective film, recording and reproduction may be adversely affected. In the worst case, a focus error and a tracking error may occur, which may cause servo misalignment and operation stop. The present invention has been made in view of these facts, and an object thereof is to make the film thickness of the protective film uniform.

【0005】[0005]

【課題を解決するための手段】本発明者等は上記目的を
達成するため鋭意検討を行なった結果、スピンコートの
条件を特殊の条件とすることにより問題を解決し得るこ
とを見出し、本発明を完成するに至った。本発明の要旨
は、スピンコート法により保護膜を形成するにあたり、
保護膜が形成される基材の保護膜形成面をほぼ水平にし
て回転させ、該回転面に粘度が20センチポイズ以下に
調製された液状の保護膜形成物質をノズルから110cm
/秒以下の噴出速度で供給して液膜を形成し、その後、
該液膜を硬化させることを特徴とする保護膜の形成方法
に存する。
Means for Solving the Problems As a result of intensive studies for achieving the above-mentioned object, the present inventors have found that the problem can be solved by making the spin coat condition a special condition, Has been completed. The gist of the present invention is to form a protective film by spin coating.
The surface of the base material on which the protective film is to be formed is rotated substantially horizontally and rotated, and a liquid protective film-forming substance having a viscosity of 20 centipoises or less is rotated 110 cm from the nozzle.
Is supplied at a jet speed of not more than / sec to form a liquid film, and then
A method for forming a protective film is characterized in that the liquid film is cured.

【0006】以下、本発明につき光記録媒体を例として
さらに詳細に説明する。光記録媒体はその構造から図1
に示すようなエアーサンドイッチ構造方式、図2に示す
ような全面密着貼り合せ方式、図3に示すような単板コ
ーティング方式等に大別される。本発明はこれらのいず
れの構造にも適用できる。図中1は基板、2は記録層、
3はスペーサ、4は空気層、5は接着層、6は保護層、
7は保護膜(オーバコート層)を示す。
The present invention will be described in more detail below by taking an optical recording medium as an example. The structure of the optical recording medium is shown in FIG.
2 is roughly classified into an air sandwich structure method as shown in FIG. 2, a whole surface contact bonding method as shown in FIG. 2 and a single plate coating method as shown in FIG. The present invention can be applied to any of these structures. In the figure, 1 is a substrate, 2 is a recording layer,
3 is a spacer, 4 is an air layer, 5 is an adhesive layer, 6 is a protective layer,
Reference numeral 7 indicates a protective film (overcoat layer).

【0007】本発明において基板1(基材)としては、
ポリカーボネート樹脂、アクリル樹脂、ポリスチレン樹
脂、ポリメチルメタクリレート樹脂等の樹脂基板が用い
られる。記録層2としては一般に公知の光記録として用
いられる層構成のものが全て使用可能である。例えば、
Te等の低融点金属からなるライトワンス型記録層。ま
た、例えば、TbFe,TbFeCo,TbCo,Dy
FeCo等の希土類と遷移金属の非晶質磁性合金、Mn
Bi,MnCuBi等の多結晶垂直磁化膜等からなる光
磁気記録層が挙げられる。光磁気記録層としては単一層
を用いても良いし、GdTbFe/TbFeのように2
層以上の記録層を重ねても良い。
In the present invention, the substrate 1 (base material) is
A resin substrate made of polycarbonate resin, acrylic resin, polystyrene resin, polymethylmethacrylate resin or the like is used. As the recording layer 2, any layer structure generally used for publicly known optical recording can be used. For example,
A write-once recording layer made of a low melting point metal such as Te. Further, for example, TbFe, TbFeCo, TbCo, Dy
Amorphous magnetic alloy of rare earth and transition metal such as FeCo, Mn
An example of the magneto-optical recording layer is a polycrystalline perpendicular magnetization film such as Bi or MnCuBi. A single layer may be used as the magneto-optical recording layer, or a single layer such as GdTbFe / TbFe may be used.
Recording layers of more layers may be stacked.

【0008】通常、ライトワンス型(穴開けタイプ)の
場合には図1に示すように、空気層4を形成するように
スペーサー3を介したエアーサンドイッチ型、光磁気記
録型の場合には図2に示すように接着層5によって2枚
の基板を貼合せた貼合せ型や図3に示すような記録層2
の表面に保護層6をコーティングしたコーティング型と
して用いられる。本発明はいずれの型式の媒体でも適用
可能である。
Normally, in the case of the write-once type (drilling type), as shown in FIG. 1, an air sandwich type in which a spacer 3 is formed so as to form an air layer 4, and a magneto-optical recording type is illustrated. As shown in FIG. 2, a bonding type in which two substrates are bonded by an adhesive layer 5 or a recording layer 2 as shown in FIG.
It is used as a coating type in which the surface of the protective layer 6 is coated. The present invention is applicable to any type of medium.

【0009】本発明において、保護膜7を形成するため
の保護膜形成物質としてはエネルギー線(例えば、紫外
線)硬化型あるいは熱硬化型等の硬化性樹脂からなる所
謂ハードコート剤が用いられる。エネルギー線(例え
ば、紫外線)硬化型樹脂としてはアクリレート又はメタ
アクリレート基を単一或るいは複数有する化合物よりな
るもの、例えばエポキシアクリレートやウレタンアクリ
レート等を主成分としたものが好適に用いられる。ま
た、熱硬化型樹脂としてはシリコン系、エポキシ系、チ
タン系等が用いられる。
In the present invention, as a protective film forming substance for forming the protective film 7, a so-called hard coat agent made of a curable resin such as an energy ray (for example, ultraviolet ray) curable type or a thermosetting type is used. As the energy ray (for example, ultraviolet ray) curable resin, a resin composed of a compound having a single or a plurality of acrylate or methacrylate groups, for example, a resin mainly containing epoxy acrylate or urethane acrylate is preferably used. In addition, as the thermosetting resin, silicon-based resin, epoxy-based resin, titanium-based resin, or the like is used.

【0010】本発明において保護膜7を形成するのに用
いる硬化性樹脂の塗布時の粘度としては20cP(センチ
ポイズ)以下、好ましくは1〜5cPの範囲である。該粘
度が20cPより高いと保護膜の膜厚調節が難しくなるの
で好ましくない。粘度は、硬化性樹脂を溶媒で希釈する
等して上記粘度に調整して使用するのがよい。さらに、
上記硬化性樹脂を塗布するスピンコート条件としては、
保護膜形成面をほぼ水平に回転させておき、塗布ノズル
から噴出線速度を110cm/秒以下、好ましくは10〜
110cm/秒として硬化性樹脂を供給して塗布する。上
記噴出線速度が110cm/秒より大きいと塗布ムラを発
生し、保護膜の膜厚に不均一が生じるので好ましくな
い。上記スピンコートの他の条件としては特に制限を設
けるものではないが、一般に塗布ノズルの内径0.5〜
2.0mm、塗布中の基板回転数300〜2000rpm 、
好ましくは400〜1000rpm の範囲で行なわれる。
In the present invention, the viscosity of the curable resin used for forming the protective film 7 at the time of application is 20 cP (centipoise) or less, preferably 1 to 5 cP. When the viscosity is higher than 20 cP, it becomes difficult to control the thickness of the protective film, which is not preferable. The viscosity is preferably adjusted to the above viscosity by diluting the curable resin with a solvent before use. further,
The spin coating conditions for applying the curable resin include:
The surface on which the protective film is formed is rotated substantially horizontally, and the jetting linear velocity from the coating nozzle is 110 cm / sec or less, preferably 10 to 10.
A curable resin is supplied and applied at a rate of 110 cm / sec. When the jet linear velocity is higher than 110 cm / sec, coating unevenness occurs and the thickness of the protective film becomes uneven, which is not preferable. Other conditions for the spin coating are not particularly limited, but generally the inner diameter of the coating nozzle is 0.5 to
2.0 mm, substrate rotation speed during coating 300-2000 rpm,
It is preferably carried out in the range of 400 to 1000 rpm.

【0011】本発明の保護膜は、通常、ディスク(基
材)基板の記録層と反対側の基板上の保護膜7の形成に
用いられるが、図3に示すような記録層上の保護層6の
形成に用いても良いことは勿論である。液膜形成後の液
膜硬化条件は各コート剤に合った硬化方法を用いれば良
く、例えばエネルギー硬化型、すなわち紫外線硬化型で
あれば紫外線を照射し、電子線硬化型であれば電子線を
照射し、また、熱硬化型であれば加熱処理するなどの方
法が採用される。
The protective film of the present invention is usually used for forming the protective film 7 on the substrate opposite to the recording layer of the disk (base material) substrate, and the protective layer on the recording layer as shown in FIG. Of course, it may be used for forming 6. For the liquid film curing conditions after the liquid film is formed, a curing method suitable for each coating agent may be used. For example, energy curing type, that is, ultraviolet curing type is irradiated with ultraviolet rays, and electron beam curing type is irradiated with electron beam. For example, a method of irradiating and heat-treating if it is a thermosetting type is adopted.

【0012】形成される保護膜の厚味(硬化後)は、通
常の場合、0.5〜100μm とするのが好ましく、よ
り好ましくは、1〜50μm である。更には1〜20μ
m 程度が好ましく、これ以上厚くすると保護膜の収縮等
の影響による基板の変形が起る場合があり、この対策を
講じなければならないし、薄すぎれば耐久性が低下す
る。
The thickness (after curing) of the protective film formed is usually preferably 0.5 to 100 μm, more preferably 1 to 50 μm. Furthermore, 1 to 20μ
About m 2 is preferable, and if it is thicker than this, deformation of the substrate may occur due to the influence of shrinkage of the protective film, and measures must be taken for this. If it is too thin, durability deteriorates.

【0013】上記説明は光記録媒体をもって説明した
が、本発明はプラスチックレンズ等の他の光学製品や、
その他の物品の保護膜の形成にも役立つことは勿論であ
る。
Although the above description has been made with reference to an optical recording medium, the present invention is applicable to other optical products such as plastic lenses,
Of course, it is also useful for forming a protective film for other articles.

【0014】[0014]

【実施例】以下に本発明の実施例を述べるが、本発明は
その要旨を越えない限り、以下の実施例によってその範
囲を制約されるものではない。本発明者らはスピンコー
ト法について詳細な検討を行い、スピンコートの条件と
膜厚ムラとの関係を求めた。膜厚ムラの簡易評価方法と
しては目視による方法、特にディスク内周部の塗布境界
線のきれいさを見る方法が簡単である。ただし最終的な
評価として、検査ドライブによるフォーカスエラー信号
およびトラッキングエラー信号の測定を行うべきであ
る。
EXAMPLES Examples of the present invention will be described below, but the scope of the present invention is not limited by the following examples unless the gist thereof is exceeded. The present inventors conducted a detailed study on the spin coating method and found the relationship between spin coating conditions and film thickness unevenness. As a simple evaluation method of the film thickness unevenness, a visual method, particularly a method of observing the cleanliness of the coating boundary line on the inner peripheral portion of the disk is easy. However, as a final evaluation, the focus error signal and the tracking error signal should be measured by the inspection drive.

【0015】スピンコートの条件としては、塗布する材
料に関わるもの、塗布ノズルに関わるもの、スピナー
(回転体)に関わるものがある。材料に関わるものとし
ては、材料の粘度がある。塗布ノズルに関わるものとし
てはノズル内径がある。スピンコート装置が、粘度の低
い材料を塗布する場合は1ミリ程度が適当である。噴出
線速度が一定の場合ノズル内径が大きい程、単位時間あ
たりの塗布量が大きくなる。
Spin coating conditions include those relating to the material to be coated, those relating to the coating nozzle, and those relating to the spinner (rotating body). Related to the material is the viscosity of the material. A nozzle inner diameter is related to the coating nozzle. When the spin coater applies a material having low viscosity, about 1 mm is suitable. When the ejection linear velocity is constant, the larger the nozzle inner diameter, the larger the coating amount per unit time.

【0016】次に基板とノズルとの距離であるが、これ
が小さすぎると塗布剤の流れに乱流が発生し、大きすぎ
ると塗布剤の散乱が大きくなる。ノズルの動かし方とし
ては、内周から外周に向かって動かす方法、外周から内
周を経由して再び外周に戻す方法、内周のみに塗布した
あとで回転の遠心力により外周まで塗り広げる方法等が
ある。特に塗布剤が溶剤で希釈されたものである場合、
基板の回転で薄く塗り広げられる際にある程度溶剤が揮
発してしまい、塗布中にある膜厚分布が決定してしまう
場合がある。ノズルを動かす速度と動く距離により、塗
布時間が決定される。また塗布時間および単位時間あた
りの塗布量により塗布剤消費量が決定される。
Next, regarding the distance between the substrate and the nozzle, if this is too small, turbulence will occur in the flow of the coating agent, and if it is too large, scattering of the coating agent will increase. The nozzles can be moved from the inner circumference to the outer circumference, from the outer circumference to the inner circumference again to the outer circumference, or after applying only the inner circumference to the outer circumference by centrifugal force of rotation. There is. Especially when the coating agent is diluted with a solvent,
In some cases, the solvent volatilizes to some extent when the substrate is thinly spread by rotation, and the film thickness distribution during coating may be determined. The application time is determined by the speed and distance traveled by the nozzle. Further, the coating agent consumption amount is determined by the coating time and the coating amount per unit time.

【0017】スピナーに関わる条件としては回転数があ
る。スピンコートの場合膜厚を均一にするために、ある
回転数で塗布したあとそれより速い回転数でしばらく回
し、余分な塗布剤を振り切るという操作を行う場合が多
い。しかし前記の溶剤希釈型の塗布剤を用いる場合、塗
布後のコート膜厚は塗布中の回転数に最も依存する。
The condition related to the spinner is the rotation speed. In the case of spin coating, in order to make the film thickness uniform, it is often the case that the coating is applied at a certain rotation speed and then rotated at a higher rotation speed for a while, and the excess coating material is shaken off. However, when the solvent-diluting type coating agent is used, the coating film thickness after coating most depends on the rotation speed during coating.

【0018】本発明者らは前記の条件のうちノズル内
径、塗布時間、噴出線速度、塗布中の回転数を変えて塗
布を試み、塗布膜厚ムラの観察を行った。その結果、膜
厚ムラの発生の有無は噴出線速度のみに依存し、ノズル
内径、塗布時間、回転数には依存しないことを見いだし
た。具体的には、塗布剤の粘度5cPにおいて、噴出線速
度110cm/sを境として、それ以下では膜厚ムラが発
生せず、それ以上では膜厚ムラが発生することを確認し
た。
The present inventors tried coating by changing the nozzle inner diameter, the coating time, the ejection linear velocity, and the rotation speed during coating among the above conditions, and observed the coating film thickness unevenness. As a result, it was found that the occurrence of film thickness unevenness depends only on the jet linear velocity and not on the nozzle inner diameter, the coating time, and the rotation speed. Specifically, it was confirmed that when the viscosity of the coating agent was 5 cP and the ejection linear velocity was 110 cm / s as a boundary, the film thickness unevenness did not occur below that, and the film thickness unevenness occurred above that.

【0019】実施例 ポリカーボネート基板上に無機ライトワンス記録層を形
成し、その反対側の面に紫外線硬化型樹脂を種々の条件
でスピンコートした。まず固定条件を以下に示す。 塗布剤粘度:5cP 振り切り回転数:1000rpm 振り切り時間:10秒 塗布ノズル高さ:1.2mm 塗布方向:外周→内周→外周
EXAMPLE An inorganic write-once recording layer was formed on a polycarbonate substrate, and the opposite surface was spin-coated with an ultraviolet curable resin under various conditions. First, the fixed conditions are shown below. Coating material viscosity: 5 cP Shaking off speed: 1000 rpm Shaking off time: 10 seconds Coating nozzle height: 1.2 mm Coating direction: outer circumference → inner circumference → outer circumference

【0020】以上の条件に対し、次に示す条件を個別に
変えていき、それぞれ膜厚ムラの発生の有無を確認し
た。なお、塗布時間は、各条件で塗布量が10gとなる
時間とした。 (1)ノズル内径 1.12,0.90mm (2)塗布量 6,8,10g (3)塗布回転数 400,600rpm (4)吐出線速度 60,80,100,110,12
0,140cm/sec 結果を表1に示す。
With respect to the above conditions, the following conditions were individually changed, and it was confirmed whether or not the film thickness unevenness occurred. The coating time was the time at which the coating amount was 10 g under each condition. (1) Nozzle inner diameter 1.12, 0.90 mm (2) Coating amount 6, 8, 10 g (3) Coating rotation speed 400, 600 rpm (4) Discharge linear velocity 60, 80, 100, 110, 12
The results of 0,140 cm / sec are shown in Table 1.

【0021】[0021]

【表1】 [Table 1]

【0022】以上より、内周塗布ムラの発生有無は吐出
線速度のみに依存し、ノズル内径、塗布量、回転数にあ
まり依存しないことがわかる。塗布ムラの発生は吐出線
速度に大きく依存するので、何らかの理由で、ある条件
を変えても、吐出線速度が所定の値を越えないように他
の条件を調整してやることにより、塗布ムラは回避でき
る。
From the above, it can be seen that the presence or absence of uneven coating on the inner circumference depends only on the discharge linear velocity, and does not depend much on the inner diameter of the nozzle, the coating amount, and the number of revolutions. The occurrence of coating unevenness greatly depends on the discharge linear velocity, so even if for some reason, you change certain conditions, adjust the other conditions so that the discharge linear velocity does not exceed the specified value, and avoid coating unevenness. it can.

【0023】[0023]

【発明の効果】本発明の方法によれば、極めて膜厚の均
一な保護膜が形成されるので、光記録媒体等に適用すれ
ば光学的歪み等が少ない、傷の発生も防止された実用上
大変好適な保護膜が得られる。
According to the method of the present invention, a protective film having an extremely uniform film thickness is formed. Therefore, when applied to an optical recording medium or the like, optical distortion is small and scratches are prevented from being practically used. A very suitable protective film can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】断面図FIG. 1 Sectional view

【図2】断面図FIG. 2 is a sectional view.

【図3】断面図FIG. 3 is a sectional view.

【符号の説明】[Explanation of symbols]

1 基板 7 保護膜 1 Substrate 7 Protective film

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 スピンコート法により保護膜を形成する
にあたり、保護膜が形成される基材の保護膜形成面をほ
ぼ水平にして回転させ、該回転面に粘度が20センチポ
イズ以下に調製された液状の保護膜形成物質をノズルか
ら110cm/秒以下の噴出速度で供給して液膜を形成
し、その後、該液膜を硬化させることを特徴とする保護
膜の形成方法。
1. When forming a protective film by a spin coating method, the base material on which the protective film is formed is rotated with its surface on which the protective film is formed being substantially horizontal, and the rotating surface is prepared to have a viscosity of 20 centipoise or less. A method for forming a protective film, which comprises supplying a liquid protective film-forming substance from a nozzle at a jet speed of 110 cm / sec or less to form a liquid film, and then curing the liquid film.
【請求項2】 基材の回転数が300〜2000rpm で
あることを特徴とする請求項1に記載の保護膜の形成方
法。
2. The method for forming a protective film according to claim 1, wherein the number of revolutions of the substrate is 300 to 2000 rpm.
【請求項3】 液状の保護膜形成物質が紫外線硬化性樹
脂であることを特徴とする請求項1に記載の保護膜の形
成方法。
3. The method for forming a protective film according to claim 1, wherein the liquid protective film forming substance is an ultraviolet curable resin.
【請求項4】 ノズルの内径が0.5〜2mmであること
を特徴とする請求項1に記載の保護膜の形成方法。
4. The method for forming a protective film according to claim 1, wherein the inner diameter of the nozzle is 0.5 to 2 mm.
JP2692192A 1992-02-13 1992-02-13 Method for forming protective film Pending JPH05220442A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2692192A JPH05220442A (en) 1992-02-13 1992-02-13 Method for forming protective film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2692192A JPH05220442A (en) 1992-02-13 1992-02-13 Method for forming protective film

Publications (1)

Publication Number Publication Date
JPH05220442A true JPH05220442A (en) 1993-08-31

Family

ID=12206657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2692192A Pending JPH05220442A (en) 1992-02-13 1992-02-13 Method for forming protective film

Country Status (1)

Country Link
JP (1) JPH05220442A (en)

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