JPH05205686A - Differential air exhaust resistance device - Google Patents
Differential air exhaust resistance deviceInfo
- Publication number
- JPH05205686A JPH05205686A JP3571892A JP3571892A JPH05205686A JP H05205686 A JPH05205686 A JP H05205686A JP 3571892 A JP3571892 A JP 3571892A JP 3571892 A JP3571892 A JP 3571892A JP H05205686 A JPH05205686 A JP H05205686A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- differential
- high vacuum
- container
- resistance device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ガス系に連結される高
真空差動排気系を構成するのに用いる差動排気抵抗装置
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a differential exhaust resistance device used to construct a high vacuum differential exhaust system connected to a gas system.
【０００２】従来、図４に示すように、ガス系１に、高
真空差動排気系２を、ゲ―ト弁３を介して連結し、その
高真空差動排気系２内で、ガス系１におけるガスを分析
することが行われている。Conventionally, as shown in FIG. 4, a high vacuum differential exhaust system 2 is connected to a gas system 1 through a gate valve 3, and the high vacuum differential exhaust system 2 is connected to the gas system 1. The gas in 1 is being analyzed.
【０００３】この場合、ガス系１は、そこにおいて、種
々の材料でなる層を、例えば気相成長法によって形成す
るようになされているとした場合、少なくとも、形成せ
んとする層の原料ガスを導入させるガス導入管５を連結
し、且つ排気用真空ポンプ６を連結しているとともに、
高真空差動排気系２にゲ―ト弁３を介して連結している
反応容器４を有する。なお、７は、反応容器４に連結し
ている圧力計を示す。In this case, when the gas system 1 is designed to form a layer made of various materials therein by, for example, a vapor phase growth method, at least the source gas for the layer to be formed is used. The gas introduction pipe 5 to be introduced is connected, and the exhaust vacuum pump 6 is connected,
It has a reaction vessel 4 connected to a high vacuum differential evacuation system 2 via a gate valve 3. In addition, 7 shows the pressure gauge connected to the reaction container 4.
【０００４】また、高真空差動排気系２は、ガス系１
を、いま述べたように、種々の材料でなる層を気相成長
法によって形成するようになされているとしたことか
ら、その高真空差動排気系２において、ガス系１の容器
４内にガス導入管５を用いて導入された原料ガスにもと
ずくガスを、ガス系１におけるガスとして分析するよう
になされているとした場合、質量分析計９を連結し且つ
排気用真空ポンプ１０を連結している真空容器８を有す
るとともに、その真空容器８を、上述したゲ―ト弁３を
介して、ガス系１の反応容器４に連結している差動排気
抵抗装置１１を有する。なお、１２は、真空容器８に連
結している圧力計を示す。The high vacuum differential evacuation system 2 is a gas system 1.
As described above, since the layers made of various materials are formed by the vapor phase epitaxy method, the high vacuum differential evacuation system 2 is provided in the container 4 of the gas system 1. When the gas derived from the raw material gas introduced using the gas introduction pipe 5 is analyzed as the gas in the gas system 1, the mass spectrometer 9 is connected and the exhaust vacuum pump 10 is connected. It has a vacuum container 8 connected thereto, and also has a differential exhaust resistance device 11 which connects the vacuum container 8 to the reaction container 4 of the gas system 1 via the gate valve 3 described above. Reference numeral 12 indicates a pressure gauge connected to the vacuum container 8.
【０００５】この場合、差動排気抵抗装置１１は、図示
詳細説明は省略するが、一端をゲ―ト弁３に固定連結
し、他端を真空容器７に固定連結しているオリフィスを
有するオリフィス板でなるか、または、一端をゲ―ト弁
３に固定連結し、他端を真空容器７に固定連結している
細管でなり、差動排気抵抗装置１１それ自身が、その差
動排気抵抗を随時変更できない構成を有し、従って、固
定差動排気抵抗型である。In this case, the differential exhaust resistance device 11 has an orifice having an orifice, one end of which is fixedly connected to the gate valve 3 and the other end of which is fixedly connected to the vacuum container 7, although detailed description thereof is omitted. It may be a plate or a thin tube whose one end is fixedly connected to the gate valve 3 and the other end is fixedly connected to the vacuum container 7, and the differential exhaust resistance device 11 itself has its differential exhaust resistance. Is a fixed differential exhaust resistance type.
【０００６】高真空差動排気系２内での、ガス系１にお
けるガスの分析は、以下、ガス系１が、上述した構成を
有し、そして、そこにおいて、上述したように、種々の
材料でなる層を気相成長法によって形成し、また、高真
空差動排気系２が、上述した構成を有し、そして、そこ
において、上述したように、ガス系１の反応容器４内に
導入された原料ガスにもとずくガスを分析する場合で例
示して述べれば、次のようにして行われる。The analysis of the gas in the gas system 1 in the high vacuum differential evacuation system 2 will be described below, in which the gas system 1 has the above-mentioned structure, and, as mentioned above, there are various materials. And a high vacuum differential evacuation system 2 has the structure described above, and is introduced into the reaction container 4 of the gas system 1 as described above. As an example, in the case of analyzing a gas based on the obtained source gas, the following is performed.
【０００７】すなわち、ガス系１及び高真空差動排気系
２間のゲ―ト弁３を予め閉じ、且つ高真空差動排気系２
において、排気用真空ポンプ１０を作動させて、真空容
器８内を、１０-5〜１０-9 Ｔｏｒｒのような高い真空
状態に排気させている状態で、ガス系１において、排気
用真空ポンプ６を作動させて、反応容器４内を排気させ
ながら、反応容器４内に、ガス導入管５を用いて、形成
されるべき層の原料ガスを導入させることによって、反
応容器４内を、１０-4〜１０2 Ｔｏｒｒのような高真
空差動排気系２の真空容器８内に比し高いガス圧に保た
せ、その状態で、反応容器４内で、気相成長法によっ
て、原料ガスにもとずく材料でなる層を形成させている
過程で、ゲ―ト弁３を開き、反応容器４内の原料ガスに
もとずくガスを、高真空差動排気系２の真空容器８内
に、差動排気抵抗装置１１のオリフィス板のオリフィ
ス、または細管を通って導入させ、そのガスを、質量分
析計９によって分析させる。That is, the gate valve 3 between the gas system 1 and the high vacuum differential evacuation system 2 is closed in advance, and the high vacuum differential evacuation system 2 is closed.
In the gas system 1, the evacuation vacuum pump 10 is operated to evacuate the interior of the vacuum container 8 to a high vacuum state such as 10 −5 to 10 −9 Torr. Is operated to evacuate the inside of the reaction container 4 and introduce the raw material gas of the layer to be formed into the reaction container 4 by using the gas introduction pipe 5 so that the inside of the reaction container 4 becomes 10 −. The gas pressure is kept higher than that in the vacuum container 8 of the high vacuum differential evacuation system 2 such as 4 to 10 2 Torr, and in that state, even in the raw material gas by the vapor phase growth method in the reaction container 4. During the process of forming the layer made of the scrap material, the gate valve 3 is opened, and the gas based on the raw material gas in the reaction container 4 is introduced into the vacuum container 8 of the high vacuum differential exhaust system 2. Guide the gas through the orifice of the orifice plate of the differential exhaust resistance device 11 or a thin tube. Is, the gas to be analyzed by the mass spectrometer 9.
【０００８】[0008]
【発明が解決しようとする課題】この場合、高真空差動
排気系２を構成している差動排気抵抗装置１１が、上述
したように、固定差動排気抵抗型であり、そして、その
差動排気抵抗が、オリフィス板のオリフィス、または細
管の大きさによって決められた一定の値を有している。In this case, the differential evacuation resistance device 11 constituting the high vacuum differential evacuation system 2 is of the fixed differential evacuation resistance type, as described above, and the difference therebetween. The dynamic exhaust resistance has a constant value determined by the orifice of the orifice plate or the size of the capillary.
【０００９】このため、ガス系１の排気用真空ポンプ６
を、それによる排気量が変更するように制御したり、反
応容器４内への、ガス導入管５を用いた原料ガスの流量
を調整したりして、ガス系１の反応容器４内のガス圧を
変更した場合、これに応じて、高真空差動排気系２の真
空容器８内の圧力が、高真空差動排気系２の質量分析計
９を破損に導くような、質量分析計９の最適圧力範囲よ
りも高い圧力に変更したり、ガス系１の反応容器４によ
るガスを低い精度でしか分析できないような、質量分析
計９の最適圧力範囲よりも低い圧力に変更したりする。Therefore, the vacuum pump 6 for exhausting the gas system 1
Of the gas in the reaction vessel 4 of the gas system 1 by controlling the flow rate of the raw material gas using the gas introduction pipe 5 into the reaction vessel 4 by controlling When the pressure is changed, accordingly, the pressure in the vacuum container 8 of the high vacuum differential evacuation system 2 leads to damage to the mass spectrometer 9 of the high vacuum differential evacuation system 2, and the mass spectrometer 9 is damaged. Is changed to a pressure higher than the optimum pressure range, or to a pressure lower than the optimum pressure range of the mass spectrometer 9 such that the gas in the reaction container 4 of the gas system 1 can be analyzed only with low accuracy.
【００１０】従って、上述したガス系１の反応容器４に
おけるガスの分析ができるようにした状態で、所要に応
じて、ガス系１の反応容器４内のガス圧を変更させる場
合、高真空差動排気系２の真空容器２内の圧力が質量分
析計９の最適圧力範囲内に収まるように、オリフィス板
でなる差動排気抵抗装置１１を、ガス圧を変更させる前
とは異なる大きさのオリフィスを有する他のオリフィス
板でなる差動排気抵抗装置に取替えるか、または細管で
なる差動排気抵抗装置１１を、ガス圧を変更させる前と
は異なる大きさの細管でなる差動排気抵抗装置１１に取
替えない限り、質量分析計９を破損させたり、質量分析
計９によるガスの分析が低い精度でしか行われなかった
りすることを、回避することができない、という欠点を
有していた。Therefore, when the gas pressure in the reaction container 4 of the gas system 1 is changed as required in the state where the analysis of the gas in the reaction container 4 of the gas system 1 is enabled, a high vacuum difference is obtained. In order that the pressure in the vacuum container 2 of the dynamic exhaust system 2 be within the optimum pressure range of the mass spectrometer 9, the differential exhaust resistance device 11 formed of an orifice plate has a size different from that before changing the gas pressure. The differential exhaust resistance device is replaced with a differential exhaust resistance device formed of another orifice plate having an orifice, or the differential exhaust resistance device 11 formed of a thin tube is formed of a thin tube having a size different from that before changing the gas pressure. Unless replaced with 11, the mass spectrometer 9 has a drawback that it cannot be prevented from being damaged or that the gas analysis by the mass spectrometer 9 is performed with low accuracy.
【００１１】また、上述したガス系１の反応容器４にお
けるガスの分析ができるようにした状態で、ガス系１の
反応容器４及びその周り、並びに高真空差動排気系２の
真空容器８及びその周りに、外部から、漏洩チェック用
ガス（ヘリウム）を吸付け、そして、その漏洩チェック
用ガスを、高真空差動排気系２の質量分析計９で検出さ
せるようにすれば、ガス系１の反応容器４及びその周
り、並びに高真空差動排気系２の真空容器８及びその周
りの漏洩チェックを行なわせることができるが、この場
合、ガス系１の反応容器４内及び高真空差動排気系２の
真空容器８内を、上述したようにしてガス系１の反応容
器４におけるガスを分析する場合に比し、十分低い圧力
になるように、高真空差動排気系２の排気用真空ポンプ
１０によって十分排気させる必要がある。しかしなが
ら、差動排気抵抗装置１１が、上述したようにしてガス
系１の反応容器４におけるガスを分析するときに用いる
差動排気抵抗装置であるとすれば、その差動排気抵抗装
置１１が、高真空差動排気系２の真空容器８の圧力を質
量分析計９の最適圧力に収まらせる必要から、比較的高
い差動排気抵抗を有しているので、差動排気抵抗装置１
１を、ガス系１の反応容器４におけるガスを分析すると
きの場合に比し十分大きなオリフィスを有するオリフィ
ス板でなる差動排気抵抗装置１１に取替えるか、また
は、ガス系１の反応容器４におけるガスを分析するとき
の場合に比し十分大きな細管でなる差動排気抵抗装置１
１に取替えない限り、ガス系１の反応容器４内及び高真
空差動排気系２の真空容器８内、とくに前者の反応容器
４内を、上述した圧力になるように、十分排気すること
ができないか、できるとしても、それにきわめて長い時
間を要し、また、ガス系１の反応容器４及びその周り、
並びに高真空差動排気系２の真空容器８及びその周りの
漏洩チェックを、高精度に行うことができない。Further, in a state where the gas in the reaction container 4 of the gas system 1 can be analyzed, the reaction container 4 of the gas system 1 and its surroundings, and the vacuum container 8 of the high vacuum differential evacuation system 2 and If a leak check gas (helium) is sucked from the outside from the outside and the leak check gas is detected by the mass spectrometer 9 of the high vacuum differential exhaust system 2, the gas system 1 The leak check of the reaction container 4 and its surroundings, and the vacuum container 8 of the high vacuum differential exhaust system 2 and its surroundings can be performed. In this case, the inside of the reaction container 4 of the gas system 1 and the high vacuum differential are checked. For evacuation of the high vacuum differential evacuation system 2 so that the pressure in the vacuum container 8 of the evacuation system 2 is sufficiently lower than that in the case of analyzing the gas in the reaction container 4 of the gas system 1 as described above. Sufficiently exhausted by the vacuum pump 10. There is a need to be. However, if the differential exhaust resistance device 11 is the differential exhaust resistance device used when analyzing the gas in the reaction container 4 of the gas system 1 as described above, the differential exhaust resistance device 11 is: Since the pressure in the vacuum container 8 of the high vacuum differential evacuation system 2 must be kept within the optimum pressure of the mass spectrometer 9, the differential evacuation resistance device 1 has a relatively high differential evacuation resistance.
1 is replaced with a differential exhaust resistance device 11 composed of an orifice plate having a sufficiently large orifice as compared with the case of analyzing the gas in the reaction container 4 of the gas system 1, or in the reaction container 4 of the gas system 1. Differential exhaust resistance device 1 consisting of a sufficiently large thin tube as compared with the case of analyzing gas 1
Unless replaced with 1, the inside of the reaction container 4 of the gas system 1 and the inside of the vacuum container 8 of the high vacuum differential evacuation system 2, especially the inside of the reaction container 4 of the former can be sufficiently exhausted to the above-mentioned pressure. If you can or can not, it takes a very long time, and the reaction vessel 4 of the gas system 1 and its surroundings,
In addition, it is not possible to perform a highly accurate leak check of the vacuum container 8 of the high vacuum differential evacuation system 2 and its surroundings.
【００１２】従って、上述したガス系１の反応容器４に
おけるガスの分析ができるようにした状態で、上述した
漏洩チェックを行わせる場合、いま述べたように、差動
排気抵抗装置１１を、ガス系１の反応容器４におけるガ
スを分析するときの場合に比し十分大きなオリフィスを
有するオリフィス板でなる差動排気抵抗装置１１に取替
えるか、または、ガス系１の反応容器４におけるガスを
分析するときの場合に比し十分大きな細管でなる差動排
気抵抗装置１１に取替えない限り、ガス系１の反応容器
４内及び高真空差動排気系２の真空容器８内、とくに前
者の反応容器４内を、上述した圧力になるように、十分
排気することができないか、できるとしても、それにき
わめて長い時間を要し、また、ガス系１の反応容器４及
びその周り、並びに高真空差動排気系２の真空容器８及
びその周りの漏洩チェックを、高精度に行うことができ
ない、という欠点を有していた。Therefore, when the above-described leakage check is performed in a state where the gas in the reaction container 4 of the gas system 1 described above can be analyzed, as described above, the differential exhaust resistance device 11 is operated as a gas. The gas in the reaction container 4 of the gas system 1 is analyzed by replacing the gas in the reaction container 4 of the system 1 with a differential exhaust resistance device 11 formed of an orifice plate having a sufficiently large orifice. In the reaction container 4 of the gas system 1 and the vacuum container 8 of the high-vacuum differential exhaust system 2, especially the former reaction container 4 unless replaced with a differential exhaust resistance device 11 made of a sufficiently large thin tube. The inside cannot be exhausted sufficiently to reach the above-mentioned pressure, or if it is possible, it takes a very long time, and the reaction container 4 of the gas system 1 and its surroundings Leakage checking of a high vacuum differential pumping system 2 of the vacuum container 8 and around, can not be performed with high accuracy, has a disadvantage in that.
【００１３】さらに、上述したガス系１の反応容器４に
おけるガスの分析ができるようにした状態で、上述した
ように、ガス系１の反応容器４のガス圧を変更させた場
合、及び上述した漏洩チェックを行う場合において、上
述した欠点を有していることから、差動排気抵抗装置１
１を、異なる大きさのオリフィスを有する他のオリフィ
ス板、または異なる大きさを有する他の細管でなる差動
排気抵抗装置に取替えるとすれば、その取替えに当り、
まず、ゲ―ト弁３を閉じて後、少なくとも、高真空差動
排気系２の排気用真空ポンプ１０による排気動作を停止
させ、次で、真空容器８を大気に開き、その真空容器８
内を大気圧にさせる手順が必要であるとともに、差動排
気抵抗装置１１を、他のオリフィス板、または他の細管
でなる差動排気抵抗装置に取替えて後、少なくとも、高
真空差動排気系２の真空容器８を大気から閉じ、次で、
排気用真空ポンプ１０を再度作動させ、真空容器８内
を、所要の圧力になるように排気させる必要がある、と
いう欠点を有していた。Further, when the gas pressure in the reaction container 4 of the gas system 1 is changed as described above in a state in which the gas in the reaction container 4 of the gas system 1 is enabled to be analyzed, and as described above. When performing a leak check, the differential exhaust resistance device 1 has the above-mentioned drawbacks.
If 1 is replaced with another orifice plate having orifices of different sizes, or a differential exhaust resistance device composed of other thin tubes having different sizes, the replacement is as follows:
First, after closing the gate valve 3, at least the evacuation operation by the evacuation vacuum pump 10 of the high-vacuum differential evacuation system 2 is stopped, and then the vacuum container 8 is opened to the atmosphere.
At the same time, it is necessary to set the inside to atmospheric pressure, and after replacing the differential exhaust resistance device 11 with a differential exhaust resistance device composed of another orifice plate or another thin tube, at least the high vacuum differential exhaust system Close the vacuum container 8 of No. 2 from the atmosphere, then
There is a drawback in that it is necessary to operate the exhaust vacuum pump 10 again to exhaust the interior of the vacuum container 8 to a required pressure.
【００１４】また、そのようにして、少なくとも、高真
空差動排気系２の真空容器８を再度排気する場合、その
再排気前において、少なくとも、真空容器８内が大気に
触れており、また、差動排気抵抗装置１１が大気に触れ
た差動排気抵抗装置によって取替えられることから、真
空容器８内に水分が含まれ、また、少なくとも真空容器
８の内面や、差動排気抵抗装置１１の真空容器８側の内
面などに、比較的多量な水分が付着しているので、その
真空容器８の再排気には、それら水分を十分排出するよ
うに、高温でのベ―キング処理を施しながらの、十分長
い時間を必要とする、という欠点を有していた。When the vacuum container 8 of the high vacuum differential evacuation system 2 is evacuated again in this way, at least the inside of the vacuum container 8 is in contact with the atmosphere before evacuating again. Since the differential exhaust resistance device 11 is replaced by the differential exhaust resistance device exposed to the atmosphere, the vacuum container 8 contains water, and at least the inner surface of the vacuum container 8 and the vacuum of the differential exhaust resistance device 11 are included. Since a relatively large amount of water is attached to the inner surface of the container 8 side, the vacuum container 8 should be evacuated again while being baked at a high temperature so as to sufficiently discharge the water. However, it has a drawback that it requires a sufficiently long time.
【００１５】よって、本発明は、上述した欠点を有効に
回避し得る、新規な差動排気抵抗装置を提案せんとする
ものである。Therefore, the present invention proposes a new differential exhaust resistance device which can effectively avoid the above-mentioned drawbacks.
【００１６】[0016]
【課題を解決するための手段】本発明による差動排気抵
抗装置は、（ｉ）ガス系に連結されるガス導入口と、高
真空差動排気系に連結されるガス導出口とを有する容器
を有し、そして、その上記容器内に、（ａ）互に異なる
大きさを有する複数のオリフィスを貫通配設しているオ
リフィス板が、上記複数のオリフィス中の選択されたオ
リフィスを上記ガス導入口と上記ガス導出口との間の所
定の位置に位置できるように可動自在に配され、且つ
（ｂ）上記ガス導入口と、上記オリフィス板の上記所定
の位置に位置している選択されたオリフィスとの間に、
ガス路が、上記ガス導入口からのガスを上記所定の位置
に位置しているオリフィスに導くように形成されてい
る。A differential exhaust resistance device according to the present invention comprises (i) a container having a gas inlet connected to a gas system and a gas outlet connected to a high vacuum differential exhaust system. And (a) an orifice plate having a plurality of orifices having mutually different sizes penetratingly disposed therein, the selected orifice of the plurality of orifices being introduced into the gas. Selected so as to be movably arranged so as to be located at a predetermined position between the mouth and the gas outlet, and (b) located at the predetermined position of the gas inlet and the orifice plate. Between the orifice,
A gas passage is formed to guide the gas from the gas inlet to the orifice located at the predetermined position.
【００１７】[0017]
【作用・効果】本発明による差動排気抵抗装置によれ
ば、オリフィス板の複数のオリフィス中の選択されたオ
リフィスを、容器内のガス導入口とガス導出口との間の
所定の位置に、随時、容易に位置させることができる。
そして、その状態で、その状態でのオリフィス板の選択
されたオリフィスとガス導入口との間に、ガス路が形成
されているので、ガス導入口に外部から導入されるガス
を、ガス路を通じ、次で、オリフィス板の選択されたオ
リフィスを通じ、次で、ガス導出口を通じて外部に導出
させることができる。According to the differential exhaust resistance device of the present invention, the selected orifice among the plurality of orifices of the orifice plate is placed at a predetermined position between the gas inlet and the gas outlet in the container. It can be easily positioned at any time.
Then, in this state, since the gas passage is formed between the selected orifice of the orifice plate and the gas inlet in that state, the gas introduced from the outside to the gas inlet is passed through the gas passage. , Through the selected orifice of the orifice plate, and then through the gas outlet, to the outside.
【００１８】このため、ガス導出口を、図４を伴って上
述した高真空差動排気系１の真空容器８と同様の真空容
器に連結させることによって、図４を伴って上述した高
真空差動排気系２と同様の高真空差動排気系を構成する
ことができ、また、ガス導入口を、図４を伴って上述し
たゲ―ト弁３と同様のゲ―ト弁の一端に連結し、一方、
そのゲ―ト弁の他端を、図４を伴って上述したガス系１
と同様のガス系に連結し、そして、オリフィス板の選択
されたオリフィスを、容器内のガス導入口とガス導出口
との間の所定の位置に位置させることによって、この場
合の高真空差動排気系で、この場合のガス系におけるガ
スを、図４を伴って上述したと同様に、分析させるよう
にすることができる。Therefore, by connecting the gas outlet to a vacuum container similar to the vacuum container 8 of the high vacuum differential evacuation system 1 described above with reference to FIG. 4, the high vacuum difference described above with reference to FIG. A high vacuum differential exhaust system similar to the dynamic exhaust system 2 can be constructed, and the gas inlet is connected to one end of a gate valve similar to the gate valve 3 described above with reference to FIG. On the other hand,
The other end of the gate valve is connected to the gas system 1 described above with reference to FIG.
And a selected orifice of the orifice plate at a predetermined position in the container between the gas inlet and the gas outlet, thereby providing a high vacuum differential in this case. In the exhaust system, the gas in the gas system in this case can be analyzed as described above with reference to FIG.
【００１９】また、ガス導入口を、上述したようにゲ―
ト弁を介してガス系に連結し、且つガス導出口を、上述
したように高真空差動排気系に連結している状態で、オ
リフィス板の選択されたオリフィスを、容器内のガス導
入口とガス導出口との間の所定の位置に位置させれば、
それだけで、ガス導入口とガス導出口との間でみた差動
排気抵抗を、オリフィス板の選択されたオリフィスの大
きさに応じた値にさせることができ、そして、そのと
き、ガス系及び高真空差動排気系内が外気にさらされる
ことがない。Further, the gas inlet is connected to the gate as described above.
The selected orifice of the orifice plate is connected to the gas system through the valve and the gas outlet is connected to the high vacuum differential exhaust system as described above. If you put it in a predetermined position between the gas outlet and
With that alone, the differential exhaust resistance seen between the gas inlet and the gas outlet can be adjusted to a value corresponding to the size of the selected orifice of the orifice plate, and at that time, the gas system and high The vacuum differential exhaust system is not exposed to the outside air.
【００２０】以上のことから、詳細説明は省略するが、
本発明による差動排気抵抗装置によれば、それを用いた
高真空差動排気系をガス系に連結させて、高真空差動排
気系でガス系におけるガスを分析できるようにした場
合、図４を伴って上述した欠点を、有効に回避させるこ
とができる。From the above, a detailed description is omitted,
According to the differential evacuation resistance device of the present invention, a high vacuum differential evacuation system using the same is connected to a gas system so that the gas in the gas system can be analyzed by the high vacuum differential evacuation system. It is possible to effectively avoid the drawbacks described above with reference to FIG.
【００２１】[0021]
【実施例】次に、図１を伴って、本発明による差動排気
抵抗装置の実施例を述べよう。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, an embodiment of the differential exhaust resistance device according to the present invention will be described with reference to FIG.
【００２２】図１に示す本発明による差動排気抵抗装置
は、次に述べる構成を有する。The differential exhaust resistance device according to the present invention shown in FIG. 1 has the following construction.
【００２３】すなわち、下部に、図４を伴って上述した
ガス系１の反応容器４に、図４を伴って上述したゲ―ト
弁３を介して連結されるガス導入口２１を有し、且つ上
部に、図４を伴って上述した高真空差動排気系２の真空
容器８に連結されるガス導出口２２を有する容器２０を
有する。That is, in the lower part, there is a gas inlet 21 connected to the reaction container 4 of the gas system 1 described with reference to FIG. 4 via the gate valve 3 described with reference to FIG. Further, at the upper part, there is a container 20 having a gas outlet 22 connected to the vacuum container 8 of the high vacuum differential evacuation system 2 described above with reference to FIG.
【００２４】そして、その容器２０内に、互に異なる大
きさを有する複数のオリフィス２４を貫通配設している
オリフィス板２３が、複数のオリフィス２４中の選択さ
れたオリフィス２４をガス導入口２１とガス導出口２２
との間の所定の位置Ｐに位置できるように、可動自在に
配されている。In the container 20, an orifice plate 23 having a plurality of orifices 24 having mutually different sizes penetratingly arranged, and a selected orifice 24 among the plurality of orifices 24 is introduced into the gas inlet 21. And gas outlet 22
It is movably arranged so that it can be located at a predetermined position P between and.
【００２５】この場合、オリフィス板２３は、円板でな
り、そして、その円板の中心を中心とした同心円上に、
複数のオリフィス２４を配設し、また、その円板の中心
から、軸２５を、容器２０の上壁を通って上方に延長さ
せている。そして、その軸２５の遊端が、容器２０の上
壁の外面上に取付けた回動自在なベロ―装置２６に連結
されていることによって、オリフィス板２３が回動自在
に構成されている。In this case, the orifice plate 23 is a disk, and on a concentric circle centered on the center of the disk,
A plurality of orifices 24 are provided and a shaft 25 extends upward from the center of the disc through the upper wall of the container 20. The free end of the shaft 25 is connected to a rotatable tongue device 26 mounted on the outer surface of the upper wall of the container 20, so that the orifice plate 23 is rotatable.
【００２６】また、容器２０内に、ガス導入口２１と、
オリフィス板２３の容器２０内の所定の位置Ｐに位置し
ている選択されたオリフィス２４との間に、ガス路２７
が、ガス導入口２１からのガスを容器２０内の所定の位
置に位置しているオリフィス２４に導くように設けられ
ている。Further, in the container 20, a gas inlet 21 and
A gas passage 27 is formed between the orifice plate 23 and a selected orifice 24 located at a predetermined position P in the container 20.
However, it is provided so as to guide the gas from the gas introduction port 21 to the orifice 24 located at a predetermined position in the container 20.
【００２７】この場合、ガス路２７は、容器２０の下壁
の内面とオリフィス板２３の下面との間に、上方からみ
てガス導入口２１を内装している関係に配されているＯ
―リング２８によって形成されている。そして、そのよ
うなＯ―リング２８によるガス路２７に気密を保持させ
るため、貫通孔３０を有する押え板２９が、オリフィス
板２３の上面上に、Ｏ―リング３１を介して、上方から
みて、貫通孔２９及びＯ―リング３１がオリフィス板２
３の選択されたオリフィス２４を内装している関係に配
され、そして、その押え板３０が、一端を、杆３３を介
して、容器２０の側壁の外面上に横方向に進退自在なベ
ロ―装置３４に連結している、横方向に直線的に進退自
在であり且つその横方向の進退に応じて、押え板２９を
オリフィス板２３に上方から押付け、またはそれを解除
できるように支持している、それ自体は公知の種々の支
持具３２によって、オリフィス板２３に押付けまたはそ
れを解除するようになされている。In this case, the gas passage 27 is arranged between the inner surface of the lower wall of the container 20 and the lower surface of the orifice plate 23 so that the gas inlet port 21 is installed from above.
-Formed by the ring 28. Then, in order to keep the gas passage 27 by the O-ring 28 airtight, a holding plate 29 having a through hole 30 is provided on the upper surface of the orifice plate 23 through the O-ring 31 as viewed from above, The through hole 29 and the O-ring 31 form the orifice plate 2
3 of the three selected orifices 24 are installed in a relationship, and the holding plate 30 has one end, via the rod 33, which is laterally movable back and forth on the outer surface of the side wall of the container 20. It is connected to the device 34 and is linearly movable back and forth in a lateral direction, and depending on the lateral movement, a pressing plate 29 is pressed against the orifice plate 23 from above or is supported so that it can be released. The support plate 32, which is known per se, presses or releases the orifice plate 23.
【００２８】以上が、本発明による差動排気抵抗装置の
実施例の構成である。The above is the configuration of the embodiment of the differential exhaust resistance device according to the present invention.
【００２９】このような構成を有する本発明による差動
排気抵抗装置によれば、それを図４を伴って上述した差
動排気抵抗装置１１に代えた差動排気抵抗装置として、
そのガス導出口２２を、図４を伴って上述した高真空差
動排気系２の真空容器８に連結することによって、図４
を伴って上述した高真空差動排気系２を構成することが
できる。According to the differential exhaust resistance device of the present invention having such a configuration, it is replaced with the differential exhaust resistance device 11 described above with reference to FIG.
By connecting the gas outlet 22 to the vacuum container 8 of the high vacuum differential evacuation system 2 described above with reference to FIG.
Accordingly, the high vacuum differential evacuation system 2 described above can be configured.
【００３０】また、ガス導出口２１を、図４を伴って上
述したゲ―ト弁３を介して、ガス系１の反応容器４に連
結することができる。The gas outlet 21 can be connected to the reaction container 4 of the gas system 1 via the gate valve 3 described above with reference to FIG.
【００３１】このため、上述したように高真空差動排気
系２を構成し、また上述したようにゲ―ト弁３を介して
ガス系１の反応容器４に連結した状態で、オリフィス板
２３を、ベロ―装置２６を介して回動させることによっ
て、選択されたオリフィス２４を、容器２０内の所定の
位置Ｐに位置させることができ、また、そのような状態
で、押え板２９を、支持具３２及びベロ―装置３４を介
して、オリフィス板２３を押付ければ気密なガス路が形
成される。Therefore, the high vacuum differential exhaust system 2 is constructed as described above, and the orifice plate 23 is connected to the reaction container 4 of the gas system 1 through the gate valve 3 as described above. The selected orifice 24 can be positioned at a predetermined position P in the container 20 by rotating the tongue through the bellows device 26, and in such a state, the holding plate 29 is By pressing the orifice plate 23 through the support 32 and the bellows device 34, an airtight gas passage is formed.
【００３２】従って図４を伴って上述したと同様に、図
１に示す本発明による差動排気抵抗装置１１を用いた高
真空差動排気系２の質量分析計９によって、ガス系１の
真空容器４におけるガスを分析させるようにすることが
できる。Therefore, as described above with reference to FIG. 4, the vacuum of the gas system 1 is reduced by the mass spectrometer 9 of the high vacuum differential evacuation system 2 using the differential evacuation resistance device 11 according to the present invention shown in FIG. The gas in the container 4 can be analyzed.
【００３３】また、ガス導入口２２及びガス導出口２３
をそれぞれ上述したようにガス系１の反応容器４及び高
真空差動排気系２の真空容器８に連結した状態で、オリ
フィス板２３を回動させて、他の選択されたオリフィス
２４を容器２０内の所定の一Ｐに位置させれば、それだ
けで、差動排気抵抗装置の差動排気抵抗を、選択された
オリフィスの大きさに応じた値にさせることができ、そ
して、そのとき、ガス系１及び高真空差動排気系２が外
気にさらされることがない。Further, the gas inlet 22 and the gas outlet 23
Are connected to the reaction container 4 of the gas system 1 and the vacuum container 8 of the high vacuum differential evacuation system 2 respectively as described above, the orifice plate 23 is rotated to set the other selected orifice 24 to the container 20. If it is located at a predetermined point P in that, the differential exhaust resistance of the differential exhaust resistance device can be made to have a value corresponding to the size of the selected orifice, and at that time, the gas The system 1 and the high vacuum differential evacuation system 2 are not exposed to the outside air.
【００３４】以上のことから、詳細説明は省略するが、
図１に示す本発明による差動排気抵抗装置１１によれ
ば、それを用いた高真空差動排気系２をガス系１に連結
させて、高真空差動排気系２で、ガス系１におけるガス
を分析できるようにした場合、図４を伴って上述した欠
点を有効に回避させることができる。From the above, a detailed description is omitted,
According to the differential evacuation resistance device 11 according to the present invention shown in FIG. 1, the high vacuum differential evacuation system 2 using the same is connected to the gas system 1 so that the high vacuum differential evacuation system 2 is connected to the gas system 1. When the gas can be analyzed, the drawbacks described above with reference to FIG. 4 can be effectively avoided.
【００３５】ちなみに、ガス系１の反応容器４の圧力に
対する高真空差動排気系２の真空容器８の圧力を、オリ
フィス板２３の複数のオリフィス２４の大きさをパラメ
―タとして、図２に示すように得ることができた。Incidentally, the pressure of the vacuum container 8 of the high vacuum differential evacuation system 2 with respect to the pressure of the reaction container 4 of the gas system 1 is shown in FIG. 2 with the size of the plurality of orifices 24 of the orifice plate 23 as parameters. I was able to get as shown.
【００３６】また、本発明による差動排気抵抗装置１１
のオリフィス板の複数のオリフィス中から所要のオリフ
ィスを選択した場合の、その選択開始時点から、ガス系
１におけるガスの分析ができるようにするまでの手順及
びそれに要する時間が、高真空差動排気系２に用いてい
る差動排気抵抗装置１１が、従来のそれである場合にお
いて、その差動排気抵抗装置を取替えることによって差
動排気抵抗装置１１の差動排気抵抗を変更させた場合
の、その差動排気抵抗装置の取替え開始時点から、図３
に示すように、得られたのに対し、同図３に示すように
得ることができた。Also, the differential exhaust resistance device 11 according to the present invention.
When a desired orifice is selected from a plurality of orifices of the orifice plate of No. 1, the procedure from the start of the selection to the time when the gas in the gas system 1 can be analyzed and the time required therefor are high vacuum differential evacuation. In the case where the differential exhaust resistance device 11 used in the system 2 is a conventional one, the differential exhaust resistance device 11 is changed by replacing the differential exhaust resistance device. From the start of replacement of the differential exhaust resistance device, as shown in FIG.
While it was obtained as shown in FIG. 3, it could be obtained as shown in FIG.
【００３７】なお、上述においては、本発明のわずかな
実施例を示したに留まり、その他、本発明の精神を脱す
ることなしに、種々の変型、変更をなし得るであろう。In the above description, only a few examples of the present invention are shown, and other various modifications and changes can be made without departing from the spirit of the present invention.
【図１】本発明による差動排気抵抗装置の実施例を示す
略線的断面図である。FIG. 1 is a schematic cross-sectional view showing an embodiment of a differential exhaust resistance device according to the present invention.
【図２】図１に示す本発明による差動排気抵抗装置の説
明に供する、ガス系に、図１に示す本発明による差動排
気抵抗装置を用いた高真空差動排気系を連結し、そし
て、その高真空差動排気系で、ガス系におけるガスを分
析するようにした場合の、図１に示す本発明による差動
排気抵抗装置のオリフィス板の複数のオリフィスの大き
さをパラメ―タとした、ガス系の圧力と、高真空差動排
気系の圧力との関係を示す図である。FIG. 2 is a schematic view of a differential exhaust resistance device according to the present invention shown in FIG. 1, and a high vacuum differential exhaust system using the differential exhaust resistance device according to the present invention shown in FIG. When the gas in the gas system is analyzed by the high vacuum differential exhaust system, the size of a plurality of orifices of the orifice plate of the differential exhaust resistance device according to the present invention shown in FIG. 1 is set as a parameter. FIG. 3 is a diagram showing the relationship between the pressure of the gas system and the pressure of the high vacuum differential exhaust system.
【図３】ガス系に本発明による差動排気抵抗装置を用い
た高真空差動排気系を連結し、そして、その高真空差動
排気系で、ガス系におけるガスを分析するようにした場
合において、高真空差動排気系に用いる差動排気抵抗装
置の差動排気抵抗を変更したときに、その変更開始時点
から、高真空差動排気系でガス系におけるガス分析を行
うことができるまでにとるべき処理及びその時間を、ガ
ス系に、従来の差動排気抵抗装置を用いた高真空差動排
気系を連結し、そして、その高真空差動排気系で、ガス
系におけるガスを分析するようにした場合において、高
真空差動排気系に用いる差動排気抵抗装置を他の差動排
気抵抗装置に取替えたときに、その取替え開始時点か
ら、高真空差動排気系でガス系におけるガス分析を行う
ことができるまでにとるべき処理及びその時間と対比し
て示す図である。FIG. 3 shows a case where a high vacuum differential exhaust system using the differential exhaust resistance device according to the present invention is connected to the gas system, and the gas in the gas system is analyzed by the high vacuum differential exhaust system. In, when the differential exhaust resistance of the differential exhaust resistance device used for the high vacuum differential exhaust system is changed, from the start of the change until the gas analysis in the gas system can be performed by the high vacuum differential exhaust system. The high vacuum differential exhaust system using the conventional differential exhaust resistance device is connected to the gas system, and the gas in the gas system is analyzed by the high vacuum differential exhaust system. In such a case, when the differential exhaust resistance device used in the high vacuum differential exhaust system is replaced with another differential exhaust resistance device, from the start of the replacement, the high vacuum differential exhaust system operates in the gas system. By the time gas analysis can be performed Shows in comparison with Rubeki processing and its time.
【図４】本発明による差動排気抵抗装置、及び従来の差
動排気抵抗装置の説明に供する、ガス系に、差動排気抵
抗装置を用いた高真空差動排気系を連結し、その高真空
差動排気系で、ガス系におけるガスを分析することを一
般に示す系統図である。FIG. 4 is a diagram illustrating a differential exhaust resistance device according to the present invention and a conventional differential exhaust resistance device, and a high vacuum differential exhaust system using a differential exhaust resistance device is connected to a gas system, FIG. 3 is a system diagram generally showing analysis of gas in a gas system by a vacuum differential exhaust system.
１ ガス系 ２ 高真空差動排気系 ３ ゲ―ト弁 ４ 反応容器 ５ ガス導入管 ６ 排気用真空ポンプ ７、１２ 圧力計 ８ 真空容器 ９ 質量分析計 １０ 排気用真空ポンプ １１ 差動排気抵抗装置 ２０ 容器 ２１ ガス導入口 ２２ ガス導出口 ２３ オリフィス板 ２４ オリフィス ２６ ベロ―装置 ２７ ガス路 ２８ Ｏ―リング ２９ 押え板 ３０ 貫通孔 ３１ Ｏ―リング ３２ 支持具 ３３ 杆 ３４ ベロ―装置 Ｐ 所定の位置 1 gas system 2 high vacuum differential exhaust system 3 gate valve 4 reaction vessel 5 gas introduction pipe 6 exhaust vacuum pump 7, 12 pressure gauge 8 vacuum container 9 mass spectrometer 10 exhaust vacuum pump 11 differential exhaust resistance device 20 Container 21 Gas Inlet Port 22 Gas Outlet Port 23 Orifice Plate 24 Orifice 26 Bello Device 27 Gas Channel 28 O-ring 29 Holding Plate 30 Through Hole 31 O-ring 32 Support Tool 33 Rod 34 Bero Device P P Predetermined Position
Claims (1)
空差動排気系に連結されるガス導出口とを有する容器を
有し、 上記容器内に、（ａ）互に異なる大きさを有する複数の
オリフィスを貫通配設しているオリフィス板が、上記複
数のオリフィス中の選択されたオリフィスを上記ガス導
入口と上記ガス導出口との間の所定の位置に位置できる
ように可動自在に配され、且つ（ｂ）上記ガス導入口
と、上記オリフィス板の上記所定の位置に位置している
選択されたオリフィスとの間に、ガス路が、上記ガス導
入口からのガスを上記所定の位置に位置している選択さ
れたオリフィスに導くように形成されていることを特徴
とする差動排気抵抗装置。1. A container having a gas inlet connected to a gas system and a gas outlet connected to a high vacuum differential evacuation system, wherein (a) different sizes are provided in the container. An orifice plate having a plurality of orifices extending therethrough is movable so that a selected orifice of the plurality of orifices can be positioned at a predetermined position between the gas inlet and the gas outlet. And (b) a gas passage between the gas introduction port and a selected orifice located at the predetermined position of the orifice plate has a gas passage from the gas introduction port to the predetermined position. Differential exhaust resistance device formed to direct to a selected orifice located at the position.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3571892A JPH05205686A (en) | 1992-01-27 | 1992-01-27 | Differential air exhaust resistance device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3571892A JPH05205686A (en) | 1992-01-27 | 1992-01-27 | Differential air exhaust resistance device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05205686A true JPH05205686A (en) | 1993-08-13 |
Family
ID=12449643
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3571892A Pending JPH05205686A (en) | 1992-01-27 | 1992-01-27 | Differential air exhaust resistance device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05205686A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006500752A (en) * | 2002-09-25 | 2006-01-05 | バリアン・セミコンダクター・イクイップメント・アソシエーツ・インコーポレーテッド | Load-lock vacuum conductance limiting aperture |
| JP2010092633A (en) * | 2008-10-06 | 2010-04-22 | Hitachi High-Technologies Corp | Method for measuring gas component in vacuum chamber, and vacuum device |
| JP2011003426A (en) * | 2009-06-19 | 2011-01-06 | Jeol Ltd | Electron microscope |
| JP2013020918A (en) * | 2011-07-14 | 2013-01-31 | Hitachi High-Technologies Corp | Charged particle beam device |
-
1992
- 1992-01-27 JP JP3571892A patent/JPH05205686A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006500752A (en) * | 2002-09-25 | 2006-01-05 | バリアン・セミコンダクター・イクイップメント・アソシエーツ・インコーポレーテッド | Load-lock vacuum conductance limiting aperture |
| KR101162368B1 (en) * | 2002-09-25 | 2012-07-04 | 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. | Load lock vacuum conductance limiting aperture |
| JP2010092633A (en) * | 2008-10-06 | 2010-04-22 | Hitachi High-Technologies Corp | Method for measuring gas component in vacuum chamber, and vacuum device |
| JP2011003426A (en) * | 2009-06-19 | 2011-01-06 | Jeol Ltd | Electron microscope |
| JP2013020918A (en) * | 2011-07-14 | 2013-01-31 | Hitachi High-Technologies Corp | Charged particle beam device |
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