JPH05196568A - Plated metal inspection device - Google Patents
Plated metal inspection deviceInfo
- Publication number
- JPH05196568A JPH05196568A JP4026194A JP2619492A JPH05196568A JP H05196568 A JPH05196568 A JP H05196568A JP 4026194 A JP4026194 A JP 4026194A JP 2619492 A JP2619492 A JP 2619492A JP H05196568 A JPH05196568 A JP H05196568A
- Authority
- JP
- Japan
- Prior art keywords
- light
- plating
- metal
- sample
- plated metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は鍍金の位置又は面積を計
測して検査する鍍金検査装置に係り、特に、銅および銅
合金から成る被検査物を検査する装置の改良に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plating inspection apparatus for measuring the position or area of plating and inspecting the same, and more particularly to an improvement of an apparatus for inspecting an inspection object made of copper and copper alloy.
【0002】[0002]
【背景技術】鍍金の検査を自動化する場合に画像処理装
置を使用しようとした場合、次のような方法で行うこと
ができる。まず図5を参照しながら説明する。ハロゲン
電球光源101からコンデンサレンズ102により集光
され、光ファイバ103により導かれた光は、同軸落射
照明装置104に内蔵されたハーフミラー105により
反射されて、被測定物106を照明する。被測定物10
6は銅に銀を鍍金したものである。被測定物106によ
り反射された光線は、顕微鏡のレンズ群107により屈
折され適当な倍率でビデオカメラ108の受光面に結像
する。その後ビデオカメラから出力された画像信号10
9は、画像処理装置114に入ると、制御回路113の
制御によりアナログ−デジタル(A/D)変換器110
によりA/D変換されてメモリ回路111に蓄えられた
後に信号処理回路112に入力される。信号処理回路1
12は、入力データの輝度から鍍金された部分を抽出
し、鍍金の位置情報,欠陥の検出等を行う。BACKGROUND ART When an image processing apparatus is to be used for automating a plating inspection, the following method can be used. First, a description will be given with reference to FIG. The light collected from the halogen bulb light source 101 by the condenser lens 102 and guided by the optical fiber 103 is reflected by the half mirror 105 incorporated in the coaxial epi-illumination device 104, and illuminates the DUT 106. DUT 10
No. 6 is copper plated with silver. The light beam reflected by the DUT 106 is refracted by the lens group 107 of the microscope and forms an image on the light receiving surface of the video camera 108 at an appropriate magnification. Image signal 10 output from the video camera after that
9 enters the image processing device 114, the analog-digital (A / D) converter 110 is controlled by the control circuit 113.
After being A / D-converted and stored in the memory circuit 111, the signal is input to the signal processing circuit 112. Signal processing circuit 1
Reference numeral 12 extracts the plated portion from the brightness of the input data, and performs the plating position information, defect detection, and the like.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上記の
ような装置を用いた場合には、銅の地の部分と鍍金され
た部分の反射率の差が少ないため、その少ない差を見分
ける高精度のA/D変換器が必要となる。その結果、装
置のコストアップを招く。However, when the apparatus as described above is used, the difference in the reflectance between the copper ground portion and the plated portion is small, so that it is possible to distinguish the small difference with high accuracy. An A / D converter is required. As a result, the cost of the device increases.
【0004】従って、本発明の目的は高精度の部品を必
要とせず、コストダウンが可能な鍍金検査装置を提供す
ることである。Therefore, an object of the present invention is to provide a plating inspection apparatus which does not require high-precision parts and which can reduce costs.
【0005】[0005]
【課題を解決するための手段】本発明は高精度の部品を
使用しないでコストダウンを図ったとしても所定の判定
結果が得られるようにするため、地金に地金の色と相違
した色の鍍金を施された試料を照射する照射手段と、前
記試料の反射光を受光する受光手段と、前記受光手段の
受光光像に基づいて前記鍍金の位置,或いは面積を判定
する判定手段を備え、前記受光手段は前記地金の反射率
と前記鍍金の反射率の間に所定の差を有する波長の反射
光を受光する鍍金検査装置を提供するものであり、試料
が銅,或いは銅合金に銀,錫,或いは白色金属の鍍金が
施されている場合は、前記照射手段は400nmから4
50nmの波長の光を透過するフィルタを通して前記試
料を照射しても良く、また、458nm,或いは477
nmの波長の光を出射するアルゴンイオンレーザーによ
って前記試料を出射しても良い。一方、照射手段に通常
の照射手段を用いる場合には、前記受光手段は400n
mから450nmの波長の光を透過するフィルタを通し
て前記試料の反射光を受光する構成で良い。According to the present invention, in order to obtain a predetermined judgment result even if the cost is reduced without using high-precision parts, the color of the metal is different from that of the metal. The irradiation means for irradiating the plated sample, the light receiving means for receiving the reflected light of the sample, and the judging means for judging the position or area of the plating based on the received light image of the light receiving means. The light receiving means provides a plating inspection device for receiving reflected light having a wavelength having a predetermined difference between the reflectance of the metal and the reflectance of the plating, and the sample is copper or copper alloy. When silver, tin, or white metal plating is applied, the irradiation means is 400 nm to 4 nm.
The sample may be illuminated through a filter that transmits light at a wavelength of 50 nm, or at 458 nm or 477.
The sample may be emitted by an argon ion laser that emits light having a wavelength of nm. On the other hand, when a normal irradiation means is used as the irradiation means, the light receiving means is 400 n
The reflected light of the sample may be received through a filter that transmits light having a wavelength of m to 450 nm.
【0006】[0006]
【作用】地金の反射率と鍍金の反射率の間に所定の差を
有する波長の反射光、例えば、400nmから450n
mの波長の反射光像に基づく信号が信号処理回路で処理
される。400nmから450nmの波長の光の銅に対
する反射率は銀に対する反射率よりも5dBから11d
B低く、反射光の受光信号のレベルに判別容易な差をも
たらす。この差により信号処理回路の設計に裕度が生
じ、高い精度の判定結果を得ることができる。The reflected light having a wavelength having a predetermined difference between the reflectance of the bare metal and the reflectance of the plating, for example, 400 nm to 450 n
A signal based on the reflected light image of the wavelength m is processed by the signal processing circuit. The reflectance of copper of the wavelength of 400 nm to 450 nm is 5 dB to 11 d more than that of silver.
B is low, which causes an easily discriminating difference in the level of the received light signal of the reflected light. This difference creates a margin in the design of the signal processing circuit, and a highly accurate determination result can be obtained.
【0007】[0007]
【実施例1】本発明の第1の実施例を図1を参照しなが
ら詳細に説明する。ハロゲン電球光源101からコンデ
ンサレンズ102により集光され、光ファイバ103に
より導かれた光は、同軸落射照明装置104の入光部に
設置された400nmから450nm付近の光を透過す
るフィルタ201を透過し、青色みがかった光となって
同軸落射照明装置104に入射する。前記照明光は、同
軸落射照明装置104に内蔵されたハーフミラー105
により反射されて、被測定物106を照明する。被測定
物106は銅に銀を鍍金したものである。被測定物10
6により反射された光線は、顕微鏡のレンズ群107に
より適当な倍率でビデオカメラ108の受光面に結像す
る。ビデオカメラ108から出力された画像信号109
は、画像処理装置114に入ると、制御回路113の制
御によりアナログ−デジタル(A/D)変換器110に
よりA/D変換されてメモリ回路111に蓄えられた後
に信号処理回路112に入力される。信号処理回路11
2は、入力データの輝度から鍍金された部分を抽出し、
鍍金の位置情報或いは欠陥の検出等を行う。First Embodiment A first embodiment of the present invention will be described in detail with reference to FIG. The light collected from the halogen light bulb light source 101 by the condenser lens 102 and guided by the optical fiber 103 passes through the filter 201 installed in the light incident part of the coaxial epi-illumination device 104 and transmitting the light in the vicinity of 400 nm to 450 nm. , And becomes bluish light and enters the coaxial epi-illumination device 104. The illumination light is emitted from the half mirror 105 built in the coaxial incident illumination device 104.
Is reflected by and illuminates the DUT 106. The DUT 106 is copper plated with silver. DUT 10
The light beam reflected by 6 is imaged on the light receiving surface of the video camera 108 by the lens group 107 of the microscope at an appropriate magnification. Image signal 109 output from video camera 108
When it enters the image processing device 114, it is A / D converted by the analog-digital (A / D) converter 110 under the control of the control circuit 113, stored in the memory circuit 111, and then input to the signal processing circuit 112. . Signal processing circuit 11
2 extracts the plated part from the brightness of the input data,
Position information of plating or detection of defects is performed.
【0008】図2はA/D変換器110における銅の反
射光のスペクトラム図,及び銀の反射光のスペクトラム
図である。銀に比較して、銅の反射率は450nm付近
では約5dB低く、400nm付近では約11dB低い
ことが判るので、この400nmから450nm付近の
光を透過するフィルタ201を同軸落射照明装置104
の入光部に配置している。銅の部分で反射された光線は
暗く、鍍金された部分からの反射光は明るいというよう
にコントラストが強いため、従来と同じA/Dコンバー
タ用いたとしても、電圧レベルの差が大きくなり、その
ために容易に鍍金の部分を判別できるような画像データ
が得られる。FIG. 2 is a spectrum diagram of reflected light of copper and a spectrum diagram of reflected light of silver in the A / D converter 110. It can be seen that the reflectance of copper is about 5 dB lower near 450 nm and about 11 dB lower than about 400 nm as compared to silver, so that the filter 201 that transmits light near 400 nm to 450 nm is installed in the coaxial epi-illumination device 104.
It is located in the light entrance part of. Since the light reflected from the copper part is dark and the light reflected from the plated part is bright, there is a strong contrast, so even if the same A / D converter as the conventional one is used, the difference in voltage level will be large. It is possible to obtain image data that allows the plated portion to be easily identified.
【0009】[0009]
【実施例2】本発明の第2の実施例を図3を参照しなが
ら説明する。ハロゲン電球光源101からコンデンサレ
ンズ102により集光され、光ファイバ103により導
かれた光は、同軸落射照明装置104に内蔵されたハー
フミラー105により反射されて被測定物106を照明
する。被測定物106により反射された光線は、前記光
学フィルタと同等な特性をもつ青色透過フィルタ301
を通過した後に顕微鏡のレンズ群107により適当な倍
率でビデオカメラ108の受光面に結像する。以後は、
第1の実施例と全く同様の操作を行うので詳細について
は省略する。Second Embodiment A second embodiment of the present invention will be described with reference to FIG. The light collected from the halogen bulb light source 101 by the condenser lens 102 and guided by the optical fiber 103 is reflected by the half mirror 105 incorporated in the coaxial epi-illumination device 104 to illuminate the DUT 106. The light beam reflected by the DUT 106 has a blue transmission filter 301 having characteristics equivalent to those of the optical filter.
After passing through, the image is formed on the light receiving surface of the video camera 108 at an appropriate magnification by the lens group 107 of the microscope. After that,
Since the operation is exactly the same as in the first embodiment, the details are omitted.
【0010】第2の実施例では、反射光から波長の長い
赤の成分を取り除くために、ビデオカメラ108に入射
する反射光成分は、第1の実施例と全く同様に青色光線
のみとなる。そのため、第1の実施例と全く同等の効果
を得ることができる。In the second embodiment, in order to remove the red component having a long wavelength from the reflected light, the reflected light component incident on the video camera 108 is only the blue light ray, just as in the first embodiment. Therefore, the same effect as that of the first embodiment can be obtained.
【0011】[0011]
【実施例3】本発明の第3の実施例を図4を参照しなが
ら説明する。アルゴンイオンレーザー401から発生し
た458又は477nmの光線をビームエキスパンダ4
02により光束を広げた後に、同軸落射照明装置104
に入射し、被測定物106を照明する。この後、本発明
の第1の実施例と全く同様の操作を行うので詳細ついて
は省略する。Third Embodiment A third embodiment of the present invention will be described with reference to FIG. The beam expander 4 converts the light of 458 or 477 nm generated from the argon ion laser 401.
After expanding the luminous flux by 02, the coaxial epi-illumination device 104
And illuminates the DUT 106. After that, the same operation as that of the first embodiment of the present invention is performed, and thus the details are omitted.
【発明の効果】以上説明したように、本発明の鍍金検査
装置によると、地金と鍍金との間で所定の反射率の差を
有する波長の光を使用するため、地金と鍍金の部分のコ
ントラストを高めることができる。そのため、鍍金部分
の認識が確実になり、高精度のA/D変換器を使わずに
装置を構成できるので、安価に高精度の装置を構成する
ことができる。As described above, according to the plating inspection apparatus of the present invention, since light of a wavelength having a predetermined reflectance difference between the metal and the plating is used, the metal and the plating part are used. Can increase the contrast. Therefore, the plated portion is surely recognized, and the device can be configured without using a highly accurate A / D converter, so that the highly accurate device can be configured at low cost.
【図1】本発明の鍍金検査装置の第1の実施例を示す説
明図。FIG. 1 is an explanatory view showing a first embodiment of a plating inspection apparatus of the present invention.
【図2】銅と銀の反射光のスペクトラム特性の測定結果
を表すグラフ。FIG. 2 is a graph showing measurement results of spectral characteristics of reflected light of copper and silver.
【図3】本発明の第2の実施例を示す説明図。FIG. 3 is an explanatory diagram showing a second embodiment of the present invention.
【図4】本発明の第3の実施例を示す説明図。FIG. 4 is an explanatory diagram showing a third embodiment of the present invention.
【図5】従来の鍍金検査装置を示す説明図。FIG. 5 is an explanatory view showing a conventional plating inspection device.
101 ハロゲン電球光源 102 コ
ンデンサレンズ 103 光ファイバ 104 同
軸落射照明装置 105 ハーフミラー 106 被
測定物 107 顕微鏡のレンズ群 108 ビ
デオカメラ 109 画像信号 110 アナログ−デジタル(A/D)変換器 111 メモリ回路 112 信
号処理回路 113 制御回路 114 画
像処理装置 201 フィルタ 301 フ
ィルタ 401 アルゴンレーザー装置 402 ビ
ームエキスパンダReference Signs List 101 halogen light source 102 condenser lens 103 optical fiber 104 coaxial epi-illumination device 105 half mirror 106 DUT 107 microscope lens group 108 video camera 109 image signal 110 analog-digital (A / D) converter 111 memory circuit 112 signal processing Circuit 113 Control circuit 114 Image processing device 201 Filter 301 Filter 401 Argon laser device 402 Beam expander
Claims (4)
された試料を照射する照射手段と、 前記試料の反射光を受光する受光手段と、 前記受光手段の受光光像に基づいて前記鍍金の位置,或
いは面積を判定する判定手段を備え、 前記受光手段は前記地金の反射率と前記鍍金の反射率の
間に所定の差を有する波長の反射光を受光することを特
徴とする鍍金検査装置。1. An irradiation means for irradiating a sample in which a metal is plated with a color different from the color of the metal, a light receiving means for receiving the reflected light of the sample, and a light receiving image of the light receiving means. A light receiving means for receiving reflected light of a wavelength having a predetermined difference between the reflectance of the base metal and the reflectance of the plating. Characteristic plating inspection device.
nmの波長の光を透過するフィルタを通して前記試料を
照射し、 前記試料は、銅,或いは銅合金に銀,錫,或いは白色金
属の鍍金が施されている構成の請求項1の鍍金検査装
置。2. The irradiation means is 400 nm to 450 nm.
The plating inspection apparatus according to claim 1, wherein the sample is irradiated through a filter that transmits light having a wavelength of nm, and the sample is formed by plating copper or copper alloy with silver, tin, or white metal.
77nmの波長の光を出射するアルゴンイオンレーザー
によって前記試料を照射し、 前記試料は、銅,或いは銅合金に銀,錫,或いは白色金
属の鍍金が施されている構成の請求項1の鍍金検査装
置。3. The irradiation means is 458 nm or 4
The plating test according to claim 1, wherein the sample is irradiated with an argon ion laser that emits light having a wavelength of 77 nm, and the sample is formed by plating copper or a copper alloy with silver, tin, or a white metal. apparatus.
nmの波長の光を透過するフィルタを通して前記試料の
反射光を受光し、 前記試料は、銅,或いは銅合金に銀,錫,或いは白色金
属の鍍金が施されている構成の請求項1の鍍金検査装
置。4. The light receiving means is 400 nm to 450 nm.
The plating according to claim 1, wherein reflected light of the sample is received through a filter that transmits light having a wavelength of nm, and the sample is formed by plating copper or copper alloy with silver, tin, or white metal. Inspection equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4026194A JPH05196568A (en) | 1992-01-17 | 1992-01-17 | Plated metal inspection device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4026194A JPH05196568A (en) | 1992-01-17 | 1992-01-17 | Plated metal inspection device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05196568A true JPH05196568A (en) | 1993-08-06 |
Family
ID=12186684
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4026194A Pending JPH05196568A (en) | 1992-01-17 | 1992-01-17 | Plated metal inspection device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05196568A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001088592A3 (en) * | 2000-05-15 | 2002-08-15 | Orbotech Ltd | Microscope inspection system |
JPWO2004040281A1 (en) * | 2002-10-30 | 2006-03-02 | 凸版印刷株式会社 | Wiring pattern inspection apparatus, inspection method, detection apparatus, and detection method |
JP2008101926A (en) * | 2006-10-17 | 2008-05-01 | Toppan Printing Co Ltd | Inspection method and inspection device for substrate having metal pattern |
JP2009204311A (en) * | 2008-02-26 | 2009-09-10 | Toppan Printing Co Ltd | Method and apparatus for inspecting surface of metal substrate |
JP2010145347A (en) * | 2008-12-22 | 2010-07-01 | Dainippon Printing Co Ltd | Visual inspection apparatus |
JP2010145353A (en) * | 2008-12-22 | 2010-07-01 | Dainippon Printing Co Ltd | Appearance inspection device |
JP4566374B2 (en) * | 2000-09-22 | 2010-10-20 | イビデン株式会社 | Image processing inspection method |
JP2012112688A (en) * | 2010-11-22 | 2012-06-14 | Seiko Epson Corp | Inspection apparatus |
-
1992
- 1992-01-17 JP JP4026194A patent/JPH05196568A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001088592A3 (en) * | 2000-05-15 | 2002-08-15 | Orbotech Ltd | Microscope inspection system |
JP4566374B2 (en) * | 2000-09-22 | 2010-10-20 | イビデン株式会社 | Image processing inspection method |
JPWO2004040281A1 (en) * | 2002-10-30 | 2006-03-02 | 凸版印刷株式会社 | Wiring pattern inspection apparatus, inspection method, detection apparatus, and detection method |
JP2008101926A (en) * | 2006-10-17 | 2008-05-01 | Toppan Printing Co Ltd | Inspection method and inspection device for substrate having metal pattern |
JP2009204311A (en) * | 2008-02-26 | 2009-09-10 | Toppan Printing Co Ltd | Method and apparatus for inspecting surface of metal substrate |
JP2010145347A (en) * | 2008-12-22 | 2010-07-01 | Dainippon Printing Co Ltd | Visual inspection apparatus |
JP2010145353A (en) * | 2008-12-22 | 2010-07-01 | Dainippon Printing Co Ltd | Appearance inspection device |
JP2012112688A (en) * | 2010-11-22 | 2012-06-14 | Seiko Epson Corp | Inspection apparatus |
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