JPH0518843Y2 - - Google Patents
Info
- Publication number
- JPH0518843Y2 JPH0518843Y2 JP13262887U JP13262887U JPH0518843Y2 JP H0518843 Y2 JPH0518843 Y2 JP H0518843Y2 JP 13262887 U JP13262887 U JP 13262887U JP 13262887 U JP13262887 U JP 13262887U JP H0518843 Y2 JPH0518843 Y2 JP H0518843Y2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- laser light
- alarm
- inductively coupled
- mass spectrometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000009616 inductively coupled plasma Methods 0.000 claims description 11
- 230000003321 amplification Effects 0.000 claims description 8
- 150000002500 ions Chemical class 0.000 claims description 8
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 8
- 230000002159 abnormal effect Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 239000007789 gas Substances 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 6
- 238000011109 contamination Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Description
【考案の詳細な説明】
＜産業上の利用分野＞
本考案は、レーザ光で気化させた試料を不純物
を含まずに供給できるようにするため、不純物を
含むようになる異常状態を事前に警報で知らせる
ようにした高周波誘導結合プラズマ質量分析計に
関する。[Detailed description of the invention] <Industrial application field> This invention provides advance warning of abnormal conditions in which impurities may be present, in order to be able to supply samples vaporized by laser light without containing impurities. This article relates to a high-frequency inductively coupled plasma mass spectrometer.
＜従来の技術＞
高周波誘導結合プラズマ質量分析計は、高周波
誘導結合プラズマを用いて試料を励起させ、生じ
たイオンをノズルとスキマーからなるインターフ
エイスを介して質量分析計に導いて電気的に検出
し該イオン量を精密に測定することにより、試料
中の被測定元素を高精度に分析するように構成さ
れている。第２図は、このような高周波誘導結合
プラズマ質量分析計の従来例構成説明図である。
この図において、プラズマトーチ１の外室１ｂと
最外室１ｃにはガス調節器２を介してアルゴンガ
ス供給源３からアルゴンガスが供給されている。
また、レーザ光源４ａからのレーザ光は、鏡４ｂ
で全反射されてのち試料チヤンバーのガラス４ｃ
を透過し試料台４ｄ上の試料５に照射されて該試
料５を気化させる。このようにして気化された試
料は、試料チヤンバーの入口４ｅから導入された
アルゴンガスによつて搬送され、試料チヤンバー
の出口４ｆを通つてプラズマトーチ１の内室１ａ
へと搬入される。更に、プラズマトーチ１に巻回
された高周波誘導コイル６には高周波電源１０に
よつて高周波電流が流され、該コイル６の周囲に
高周波磁界（図示せず）が形成されている。一
方、ノズル８とスキマー９に挟まれたフオアチヤ
ンバー１１内は、真空ポンプ１２によつて例えば
1Torr.に吸引されている。また、センターチヤ
ンバー１３内には中心軸上に光の進入を阻止する
小円板１４ａと該小円板と一定距離を保つように
配置されたイオンレンズ１４ｂ，１４ｃが設けら
れると共に、該センターチヤンバー１３の内部は
第１油拡散ポンプ１５によつて例えば１０10-4
Torr.に吸引され、マスフイルタ（例えば四重極
マスフイルタ）１６を収容しているリアチヤンバ
ー１７内は第２油拡散ポンプ１８によつて例えば
10-5torr.に吸引されている。この状態で上記高周
波磁界の近傍でアルゴンガス中に電子かイオンが
植え付けられると、該高周波磁界の作用によつて
瞬時に高周波誘導プラズマ７が生ずる。該プラズ
マ７内のイオンは、ノズル８やスキマー９を経由
してのち例えば小円板１４ａとイオンレンズ１４
ｂ，１４ｃ（若しくはダブレツト四重極レンズ）
の間を通つて収束されてのちマスフイルタ１６を
通り二次電子増倍管１９に導かれて検出され、該
検出信号が信号処理部２０に送出されて演算・処
理されることによつて前記試料中の被測定元素分
析値が求められるようになつている。<Conventional technology> A high-frequency inductively coupled plasma mass spectrometer uses high-frequency inductively coupled plasma to excite a sample, and the generated ions are guided to a mass spectrometer through an interface consisting of a nozzle and a skimmer, where they are electrically detected. By precisely measuring the amount of ions, the element to be measured in the sample is analyzed with high precision. FIG. 2 is an explanatory diagram of the configuration of a conventional example of such a high frequency inductively coupled plasma mass spectrometer.
In this figure, argon gas is supplied from an argon gas supply source 3 to an outer chamber 1 b and an outermost chamber 1 c of a plasma torch 1 via a gas regulator 2 .
Further, the laser light from the laser light source 4a is transmitted to the mirror 4b.
After being totally reflected by the glass 4c of the sample chamber
The light passes through the beam and irradiates the sample 5 on the sample stage 4d, thereby vaporizing the sample 5. The sample thus vaporized is transported by argon gas introduced from the inlet 4e of the sample chamber, and passes through the outlet 4f of the sample chamber into the inner chamber 1a of the plasma torch 1.
will be transported to. Furthermore, a high frequency current is passed through a high frequency induction coil 6 wound around the plasma torch 1 by a high frequency power source 10, and a high frequency magnetic field (not shown) is formed around the coil 6. On the other hand, the inside of the fore chamber 11 sandwiched between the nozzle 8 and the skimmer 9 is operated by a vacuum pump 12, for example.
It is attracted to 1Torr. Further, inside the center chamber 13, there is provided a small disk 14a for blocking light from entering on the center axis, and ion lenses 14b and 14c arranged at a constant distance from the small disk. The inside of the chamber 13 is heated to 1010 -4 by the first oil diffusion pump 15.
Torr. The inside of the rear chamber 17, which houses a mass filter (for example, a quadrupole mass filter) 16, is pumped by a second oil diffusion pump 18, for example.
It is attracted to 10 -5 torr. In this state, when electrons or ions are planted in the argon gas near the high frequency magnetic field, high frequency induced plasma 7 is instantaneously generated by the action of the high frequency magnetic field. The ions in the plasma 7 pass through a nozzle 8 and a skimmer 9, and then enter, for example, a small disk 14a and an ion lens 14.
b, 14c (or double quadrupole lens)
After passing through the mass filter 16 and being guided to the secondary electron multiplier tube 19 for detection, the detection signal is sent to the signal processing section 20 for calculation and processing, whereby the sample is Analytical values of the elements to be measured inside are now required.
＜考案が解決しようとする問題点＞
然しながら、上記従来例においては、試料の厚
みが薄い場合、上記レーザ光が試料を透過して試
料台４ｄに到達することが多かつた。このように
レーザ光が試料台４ｂに到達すると、試料台４ｄ
を構成する材料がレーザ光によつて一部気化さ
れ、試料５がレーザ光によつて気化されて生じた
サンプルとの間にコンタミネーシヨンを起こしな
がらプラズマトーチ１の内室１ａ内に導入され究
極的に被測定元素の測定値に大きな誤差を与える
という欠点があつた。<Problems to be Solved by the Invention> However, in the conventional example described above, when the thickness of the sample is thin, the laser beam often passes through the sample and reaches the sample stage 4d. When the laser beam reaches the sample stage 4b in this way, the sample stage 4d
The material constituting the plasma torch 1 is partially vaporized by the laser beam, and the sample 5 is introduced into the inner chamber 1a of the plasma torch 1 while causing contamination with the sample vaporized by the laser beam. Ultimately, the drawback was that it caused large errors in the measured values of the elements to be measured.
本考案は、かかる従来例の欠点に鑑みてなされ
たものであり、その目的は、試料の厚みが薄くレ
ーザ光が試料を透過して試料台に到達してコンタ
ミネーシヨンを生じるような場合、レーザ光が試
料を透過して試料台に到達した異常状態を警報で
知らせ測定を中止する等して究極的に被測定元素
を正確に測定できる状態を確保するような高周波
誘導結合プラズマ質量分析計を提供することにあ
る。 The present invention was devised in view of the drawbacks of the conventional examples, and its purpose is to solve cases where the sample is thin and the laser beam passes through the sample and reaches the sample stage, causing contamination. A high-frequency inductively coupled plasma mass spectrometer that alerts you to an abnormal condition in which the laser beam passes through the sample and reaches the sample stage, and stops the measurement, ultimately ensuring a state in which the element to be measured can be measured accurately. Our goal is to provide the following.
＜問題点を解決するための手段＞
上述のような問題点を解決する本考案の特徴
は、高周波誘導結合プラズマ質量分析計におい
て、レーザ光源からのレーザ光を試料に照射して
該試料を気化させる試料チヤンバーと、前記レー
ザ光を検出するセンサの上に前記試料が位置する
ようにして前記試料を保持する試料台と、前記セ
ンサからの光信号を導く光ガイド穴と、該光ガイ
ド穴を通つて導かれた光信号を検出して増幅する
信号増幅部と、該信号増幅部の出力を受けて一定
の警報を発する警報器とを設け、前記レーザ光が
前記試料を透過して前記試料台に到達するような
異常状態を事前に前記警報で知らせるように構成
したことにある。<Means for solving the problems> The feature of the present invention that solves the above problems is that in a high-frequency inductively coupled plasma mass spectrometer, the sample is vaporized by irradiating the sample with laser light from a laser light source. a sample chamber that holds the sample so that the sample is positioned above a sensor that detects the laser beam; a light guide hole that guides a light signal from the sensor; and a light guide hole that guides the light signal from the sensor. A signal amplification section detects and amplifies the optical signal guided through the sample, and an alarm device receives the output of the signal amplification section and issues a certain alarm. The present invention is configured such that the alarm is notified in advance of an abnormal condition that may reach the stand.
＜実施例＞
以下、本考案について図を用いて詳細に説明す
る。第１図は本考案実施例の構成説明図であり、
図中、第２図と同一記号は同一意味をもたせて使
用しここでの重複説明は省略する。また、２１は
レーザ光を検出するセンサ、４′ｄはセンサ２１
の上に試料５が位置するようにして試料５を保持
する試料台、２２はセンサ２１からの光信号を導
く光ガイド穴、２３ａは光ガイド穴２２を通つて
導かれた光信号を検出するフオトダイオード、２
３ｂは増幅器、２３はフオトダイオード２３ａと
増幅器２３ｂでなる信号増幅部、２４は信号増幅
部２３の出力を受けて一定の警報を発する警報器
である。<Example> Hereinafter, the present invention will be described in detail using figures. FIG. 1 is an explanatory diagram of the configuration of an embodiment of the present invention,
In the figure, the same symbols as in FIG. 2 are used with the same meaning, and redundant explanation will be omitted here. Further, 21 is a sensor that detects laser light, and 4'd is a sensor 21.
A sample stage holds the sample 5 with the sample 5 positioned above it, 22 is a light guide hole that guides the optical signal from the sensor 21, and 23a detects the optical signal guided through the light guide hole 22. Photodiode, 2
Reference numeral 3b is an amplifier; 23 is a signal amplification unit consisting of a photodiode 23a and an amplifier 23b; and 24 is an alarm that receives the output of the signal amplification unit 23 and issues a certain alarm.
このような構成からなる本考案の実施例におい
て、レーザ光源４ａからのレーザ光は、鏡４ｂで
全反射されてのち試料チヤンバーのガラス４ｃを
透過しセンサ２１上の試料５に照射されて該試料
５を気化させる。このようにして気化された試料
は、試料チヤンバーの入口４ｅから導入されたア
ルゴンガスによつて搬送され、試料チヤンバーの
出口４ｆを通つてプラズマトーチ１の内室１ａへ
と搬入される。一方、試料５の厚みが薄い場合に
は、レーザ光が試料５を透過してセンサ２１に到
達する。センサ２１は該レーザ光を検出し、セン
サ２１の検出信号たる光出力信号は光ガイド穴２
２を通つて信号増幅部２３に至り、ここで、フオ
トトランジスタ２３ｂで受光されてのち増幅器２
３ｂで増幅され、その後、警報器２４へ送出され
て該警報器２４を鳴らす。従つて、レーザ光が試
料５を透過して試料台４d′に到達し試料台４d′を
構成する材料がレーザ光によつて一部気化され、
試料５がレーザ光によつて気化されて生じたサン
プルとの間にコンタミネーシヨンを起こしながら
フラズマトーチ１の内室１ａ内に導入される可能
性が高いことを、警報器２４が鳴らす警報により
知ることができるようになる。このため、レーザ
光が試料５を透過して試料台４d′に到達するよう
な異常状態を事前に察知し測定を中止する等して
究極的に被測定元素を正確に測定できる状態を確
保できるようになる。、本考案は上述の実施例に
限定されることなく種々の変形が可能であり、例
えばセンサ２１としてレーザ光が当たると温度が
上昇する部材を使用し該部材の温度変化を熱伝対
で検出するような構成にしても良いものとする。 In the embodiment of the present invention having such a configuration, the laser light from the laser light source 4a is totally reflected by the mirror 4b, passes through the glass 4c of the sample chamber, and is irradiated onto the sample 5 on the sensor 21, so that the sample 5 is exposed to the sample 5 on the sensor 21. Vaporize 5. The sample vaporized in this manner is carried by argon gas introduced from the inlet 4e of the sample chamber, and is carried into the interior chamber 1a of the plasma torch 1 through the outlet 4f of the sample chamber. On the other hand, when the sample 5 is thin, the laser beam passes through the sample 5 and reaches the sensor 21 . The sensor 21 detects the laser beam, and the optical output signal which is the detection signal of the sensor 21 is transmitted to the light guide hole 2.
2 to the signal amplification section 23, where the light is received by the phototransistor 23b and then transmitted to the amplifier 2.
3b, and then sent to the alarm 24, causing the alarm 24 to sound. Therefore, the laser light passes through the sample 5 and reaches the sample stage 4d', and the material constituting the sample stage 4d' is partially vaporized by the laser light.
It is known from the alarm that the alarm 24 sounds that there is a high possibility that the sample 5 will be introduced into the interior chamber 1a of the plasma torch 1 while causing contamination with the sample that has been vaporized by the laser beam. You will be able to do this. Therefore, it is possible to detect in advance an abnormal state in which the laser beam passes through the sample 5 and reaches the sample stage 4d', and to stop the measurement, ultimately ensuring a state in which the element to be measured can be accurately measured. It becomes like this. The present invention is not limited to the above-mentioned embodiments, and can be modified in various ways. For example, the sensor 21 may be a member whose temperature increases when it is irradiated with laser light, and the temperature change of the member may be detected by a thermocouple. It is also possible to configure it in such a way.
＜考案の効果＞
以上詳しく説明したような本考案の実施例によ
れば、試料５の厚みが薄くレーザ光が試料５を透
過して試料台４d′に到達してコンタミネーシヨン
を生じるような場合であつても、レーザ光が試料
５を透過して試料台４d′に到達するような異常状
態を事前に警報で知らせることにより、測定を中
止する等して究極的に被測定元素を正確に測定で
きる状態を確保するような高周波誘導結合プラズ
マ質量分析計が実現する。<Effects of the invention> According to the embodiment of the invention as described in detail above, the thickness of the sample 5 is so thin that the laser beam passes through the sample 5 and reaches the sample stage 4d', causing contamination. Even in cases where the laser beam passes through the sample 5 and reaches the sample stage 4d', it is possible to ultimately accurately determine the element to be measured by notifying in advance of an abnormal condition such as the laser beam passing through the sample 5 and reaching the sample stage 4d'. A high-frequency inductively coupled plasma mass spectrometer will be realized that will ensure that measurements can be made in a state that is possible.
第１図は本考案実施例の構成説明図、第２図は
従来例の構成説明図である。
１……プラズマトーチ、３……アルゴンガス供
給源、４ａ……レーザ光源、４ｄ，４d′……試料
台、５……試料、７……高周波誘導結合プラズ
マ、８……ノズル、９……スキマー、１１……フ
オアチヤンバー、１３……センターチヤンバー、
１６……マスフイルタ、１７……リアチヤンバ
ー、２０……信号処理部、２１……センサ、２２
……光ガイド穴、２３……信号増幅部、２４……
警報器。
FIG. 1 is an explanatory diagram of the configuration of an embodiment of the present invention, and FIG. 2 is an explanatory diagram of the configuration of a conventional example. 1... Plasma torch, 3... Argon gas supply source, 4a... Laser light source, 4d, 4d'... Sample stage, 5... Sample, 7... High frequency inductively coupled plasma, 8... Nozzle, 9... Skimmer, 11...Four chamber, 13...Center chamber,
16... Mass filter, 17... Rear chamber, 20... Signal processing unit, 21... Sensor, 22
...Light guide hole, 23...Signal amplification section, 24...
alarm.
Claims (1)
し生じたイオンを真空中に導入しイオン光学系
を通して質量分析計検出器に導いて検出するこ
とにより前記試料中の被測定元素を分析する分
析計において、レーザ光源からのレーザ光を試
料に照射して該試料を気化させる試料チヤンバ
ーと、前記レーザ光を検出するセンサの上に前
記試料が位置するようにして前記試料を保持す
る試料台と、前記センサからの光信号を導く光
ガイド穴と、該光ガイド穴を通つて導かれた光
信号を検出して増幅する信号増幅部と、該信号
増幅部の出力を受けて一定の警報を発する警報
器とを具備し、前記レーザ光が前記試料を透過
して前記試料台に到達するような異常状態を事
前に前記警報で知らせるように構成したことを
特徴とする高周波誘導結合プラズマ質量分析
計。 (2) 前記信号増幅部は、前記光ガイド穴を通つて
導かれた光信号を検出するフオトダイオードと
該フオトダイオードの出力を増幅する増幅器と
からなる実用新案登録請求範囲第(1)項記載の高
周波誘導結合プラズマ質量分析計。[Claims for Utility Model Registration] (1) Ions produced by exciting a sample using high-frequency inductively coupled plasma are introduced into a vacuum, guided to a mass spectrometer detector through an ion optical system, and detected. In an analyzer for analyzing elements to be measured, the sample is positioned above a sample chamber that vaporizes the sample by irradiating the sample with laser light from a laser light source, and a sensor that detects the laser light. a sample stage that holds the sample; a light guide hole that guides the optical signal from the sensor; a signal amplification section that detects and amplifies the optical signal guided through the light guide hole; and an alarm that issues a certain alarm upon receiving the output, and is configured to notify in advance of an abnormal state in which the laser light passes through the sample and reaches the sample stage with the alarm. A high-frequency inductively coupled plasma mass spectrometer. (2) The signal amplification unit includes a photodiode that detects the optical signal guided through the light guide hole and an amplifier that amplifies the output of the photodiode, as described in claim (1) of the utility model registration. high frequency inductively coupled plasma mass spectrometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13262887U JPH0518843Y2 (en) | 1987-08-31 | 1987-08-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13262887U JPH0518843Y2 (en) | 1987-08-31 | 1987-08-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6436962U JPS6436962U (en) | 1989-03-06 |
| JPH0518843Y2 true JPH0518843Y2 (en) | 1993-05-19 |
Family
ID=31389766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13262887U Expired - Lifetime JPH0518843Y2 (en) | 1987-08-31 | 1987-08-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0518843Y2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003106833A1 (en) | 2002-06-18 | 2003-12-24 | 大阪瓦斯株式会社 | Adsorbent of latent-heat storage type for canister and process for producing the same |
| US7841321B2 (en) | 2005-01-28 | 2010-11-30 | Aisan Kogyo Kabushiki Kaisha | Canister and method of manufacturing the same |
| JP2008303846A (en) | 2007-06-11 | 2008-12-18 | Mahle Filter Systems Japan Corp | Canister |
-
1987
- 1987-08-31 JP JP13262887U patent/JPH0518843Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6436962U (en) | 1989-03-06 |
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