JPH05175001A - High frequency resistor - Google Patents

High frequency resistor

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Publication number
JPH05175001A
JPH05175001A JP3355596A JP35559691A JPH05175001A JP H05175001 A JPH05175001 A JP H05175001A JP 3355596 A JP3355596 A JP 3355596A JP 35559691 A JP35559691 A JP 35559691A JP H05175001 A JPH05175001 A JP H05175001A
Authority
JP
Japan
Prior art keywords
resistor
thin film
high frequency
diamond thin
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3355596A
Other languages
Japanese (ja)
Other versions
JP3115071B2 (en
Inventor
Kazunori Hashiguchi
一徳 橋口
Junichi Ikeda
淳一 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Denpa Co Ltd
Original Assignee
Tokyo Denpa Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Denpa Co Ltd filed Critical Tokyo Denpa Co Ltd
Priority to JP03355596A priority Critical patent/JP3115071B2/en
Publication of JPH05175001A publication Critical patent/JPH05175001A/en
Application granted granted Critical
Publication of JP3115071B2 publication Critical patent/JP3115071B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To provide a high frequency resistor small in size which can dissipate large power by improving heat radiation. CONSTITUTION:A diamond thin film 2 is formed on a ceramic board 1, and a resistor 3 is provided on the upper surface of the film 2. Since the film 2 is provided between the board 1 and the resistor 3, heat generated from the resistor 1 can be efficiently transferred to the board via the diamond layer.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、高周波電力を減衰させ
る減衰器や、終端整合のための終端抵抗器として用いる
際に好適な高周波抵抗器に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an attenuator for attenuating high frequency power and a high frequency resistor suitable for use as a termination resistor for termination matching.

【0002】[0002]

【従来の技術】最近の無線通信分野では、自動車電話、
ポケットベル、衛星利用の通信方式など音声、画像、デ
−タ通信が急速なテンポで拡大しつつあり、これらの無
線装置は小型化の要請がますます強くなっている。自動
車電話等に使用される周波数は、800MHZ 帯や15
00MHZ 帯で数十Wから数百Wの電力のものがある
が、高周波抵抗器はこのような電力が入力されたとき、
かなり大きな発熱を伴う。従って、この熱を効率よく外
部へ放熱し、長期にわたり抵抗の劣化を生じないものが
必要である。また、高周波抵抗器で終端されるような回
路では、このような周波数帯において電圧定在波比VS
WRができるだけ1.0に近いものが要求される。
2. Description of the Related Art Recently, in the field of wireless communication, car telephones,
With the rapid expansion of voice, image, and data communications such as pagers and satellite-based communication methods, there is an increasing demand for miniaturization of these wireless devices. The frequencies used for car phones are 800 MHz Z band and 15
When there are those several tens W of power hundreds W at 00MH Z band, high-frequency resistor which such power is inputted,
With a fairly large fever. Therefore, it is necessary to efficiently dissipate this heat to the outside and prevent the resistance from deteriorating for a long period of time. In a circuit terminated with a high frequency resistor, the voltage standing wave ratio VS
A WR close to 1.0 is required.

【0003】更に、抵抗体内部で発生した熱を有効に外
部へ逃がすために、当然熱伝導率の大きな絶縁物が必要
である。この意味では、従来使われているセラミックで
最も安定した物質の部類に入るベリリア磁器(BeO)
が260W/m・Kと大きな熱伝導率を有するが、更に
携帯送信機等を小型するためには、より放熱性の高い構
造の抵抗器が要請されている。また、上記VSWR等の
周波数特性をよくするには、これらのサブストレ−ト上
に形成された薄膜あるいは厚膜の抵抗体と、対接地間に
生じるキャパシタンス(ストレ−キャパシティ)をでき
るだけ小さくする必要がある。
Further, in order to effectively dissipate the heat generated inside the resistor to the outside, an insulator having a large thermal conductivity is naturally required. In this sense, beryllia porcelain (BeO), which is one of the most stable ceramic materials used in the past,
Has a large thermal conductivity of 260 W / m · K, but in order to further miniaturize the portable transmitter and the like, a resistor having a structure with higher heat dissipation is required. Further, in order to improve the frequency characteristics such as VSWR, it is necessary to minimize the capacitance (stray capacity) generated between the thin film or thick film resistor formed on these sub-strats and the ground. There is.

【0004】ここで、キャパシタンスは一般に次式の様
に表わされるので、材料の比誘電率が小さいものが高い
周波数で良い特性を得られることがわかる。 CS =8.85×10-12 ×(S・ μ/t)[pF] 但し、Csはキャパシタンス、Sは抵抗体の表面積、μ
は比誘電率、tは抵抗体と接地との間隔である。実際の
抵抗体は純抵抗でなく、キャパシタンスやインダクタン
スを含むが、周波数が高くなると、これらによってイン
ピ−ダンスが乱されてVSWRが悪くなるのである。
Since the capacitance is generally expressed by the following equation, it can be seen that good characteristics can be obtained at high frequencies even if the material has a small relative dielectric constant. C S = 8.85 × 10 −12 × (S · μ / t) [pF] where Cs is capacitance, S is the surface area of the resistor, μ
Is the relative permittivity and t is the distance between the resistor and ground. An actual resistor does not have a pure resistance but includes a capacitance and an inductance. However, as the frequency becomes higher, the impedance is disturbed by these and the VSWR becomes worse.

【0005】[0005]

【発明が解決しようとする課題】このように、無線装置
に用いる電子部品の中でも電力回路に使用される高周波
抵抗器は、発熱の問題を解決しようとすると大型化し、
高周波特性を損なうことになるため、小型化が困難であ
り、発熱の問題を解決して小型化できたとしても高信頼
性を得ることが難しかった。また、高周波抵抗器の基板
材料として、従来から用いられるベリリア磁器は、熱伝
導率が良いものの、その有害性のため使用に障害があ
り、ベリリア磁器の代わりにアルミナ磁器(Al2
3 )を用いると、熱伝導率が小さいため形状が大きくな
ってしまうという問題があった。本発明の課題は、高周
波抵抗器の基板材料から有害物質を排除するとともに、
単位面積あたりの耐電力密度が高く、小型化された熱的
耐性の高い、高信頼性の高周波抵抗器を得ることであ
る。
As described above, among the electronic components used in the wireless device, the high frequency resistor used in the power circuit becomes large in size in order to solve the problem of heat generation,
Since high frequency characteristics are impaired, it is difficult to reduce the size, and even if the problem of heat generation is solved and the size can be reduced, it is difficult to obtain high reliability. Moreover, although beryllia porcelain conventionally used as a substrate material for high-frequency resistors has good thermal conductivity, it has a drawback in its use due to its harmfulness. Instead of beryllia porcelain, alumina porcelain (Al 2 O
When 3 ) is used, there is a problem that the shape becomes large because the thermal conductivity is small. The object of the present invention is to eliminate harmful substances from the substrate material of the high frequency resistor,
It is to obtain a high-reliability high-frequency resistor that has a high power withstanding density per unit area, a small size, and high thermal resistance.

【0006】[0006]

【課題を解決するための手段】本発明は、セラミック基
板上にダイヤモンドの薄膜を形成し、このダイヤモンド
の薄膜上に抵抗膜を形成することにより放熱性を向上さ
せて、有害物質を用いずに小型化された高信頼性の高周
波抵抗器を実現した。
SUMMARY OF THE INVENTION According to the present invention, a diamond thin film is formed on a ceramic substrate, and a resistive film is formed on the diamond thin film to improve heat dissipation and to eliminate harmful substances. We have realized a compact and highly reliable high frequency resistor.

【0007】[0007]

【作用】ダイヤモンド自体の熱伝導率は、例えば、前記
ベリリア磁器(BeO)等と比較するとその3〜8倍ぐ
らいに相当するため、このダイヤモンド薄膜層を使用す
る事により、従来よりさらに小型で、かつ放熱性の高い
高周波抵抗器を得ることができる。
The thermal conductivity of diamond itself is equivalent to, for example, 3 to 8 times that of beryllia porcelain (BeO) and the like. In addition, it is possible to obtain a high frequency resistor with high heat dissipation.

【0008】[0008]

【実施例】図1に、本発明の高周波抵抗器の第1実施例
を示す。図1において、1はセラミックからなる基板で
その基板材料として、たとえば窒化アルミニウム(Al
N)が使用されている。この基板1上に、ダイヤモンド
の薄膜2が形成されている。このダイヤモンド薄膜2
は、たとえば気相成長法を用いて形成されており、この
ダイヤモンドの薄膜2上に、薄膜あるいは厚膜の抵抗体
3が形成されている。この抵抗体3で電力が消費される
ことにより、抵抗体3から発生される熱は、ダイヤモン
ドの熱伝導率が極めて大きいため、熱はダイヤモンド薄
膜2上に急速に伝導される。さらにダイヤモンド薄膜2
から基板1表面上に熱が伝わるので、基板1は広い面積
から効率よく熱を吸収することができ、基板1の見掛け
上の熱伝導率が向上し、その放熱性を良好とすることが
できる。
1 shows a first embodiment of a high frequency resistor according to the present invention. In FIG. 1, reference numeral 1 is a substrate made of ceramics, and the substrate material is, for example, aluminum nitride (Al
N) are used. A diamond thin film 2 is formed on the substrate 1. This diamond thin film 2
Is formed by using, for example, a vapor phase growth method, and a thin film or thick film resistor 3 is formed on the diamond thin film 2. The electric power consumed by the resistor 3 causes the heat generated from the resistor 3 to have a very high thermal conductivity of diamond, so that the heat is rapidly conducted on the diamond thin film 2. Diamond thin film 2
Since the heat is transferred from the surface of the substrate 1 to the surface of the substrate 1, the substrate 1 can efficiently absorb the heat from a large area, the apparent thermal conductivity of the substrate 1 is improved, and the heat dissipation can be improved. ..

【0009】図2は、本発明の高周波抵抗器の第2実施
例である。図2において、3は薄膜または厚膜の抵抗
体、2aは第1のダイヤモンド薄膜、2bは第2のダイ
ヤモンド薄膜、2cは第3のダイヤモンド薄膜、1aは
セラミックからなる第1の基板層、1b、1cはセラミ
ックからなる第2、第3の基板層である。セラミック体
1a,1b,1cの各々の上面にダイヤモンド薄膜2
a,2b,2cをそれぞれ形成したものを、複数枚張り
合せて基板1が構成されている。図2の構成によると、
ダイヤモンド薄膜2、2a、2bの層が3層になってお
り、熱はこのダイヤモンド薄膜2、2a、2bで広い面
積に拡散されるためより一層熱の伝達が良好となり、基
板層1a,1b、1cは効率よく熱を吸収でき、基板1
の見掛け上の熱伝導率を一層向上することができる。
FIG. 2 shows a second embodiment of the high frequency resistor according to the present invention. In FIG. 2, 3 is a thin film or thick film resistor, 2a is a first diamond thin film, 2b is a second diamond thin film, 2c is a third diamond thin film, 1a is a first substrate layer made of ceramic, and 1b. Reference numerals 1c are second and third substrate layers made of ceramics. A diamond thin film 2 is formed on the upper surface of each of the ceramic bodies 1a, 1b, 1c.
A plurality of substrates each having a, 2b, and 2c formed thereon are bonded together to form the substrate 1. According to the configuration of FIG.
Since the diamond thin films 2, 2a and 2b have three layers and the heat is diffused in a large area by the diamond thin films 2, 2a and 2b, the heat transfer is further improved, and the substrate layers 1a and 1b, 1c can absorb heat efficiently, and substrate 1
The apparent thermal conductivity of can be further improved.

【0010】図3は、本発明の高周波抵抗器の第3実施
例である。図3において、基板11には多数の孔12が
開けられており、孔12の内側にはダイヤモンド12a
がコ−ティングされている。更に、基板11の上面には
ダイヤモンドの薄膜13が設けられており、この薄膜1
3上には抵抗体14が設けられている。図3の構成によ
れば、抵抗体14から発生された熱は、多数の孔12の
内側に設けたダイヤモンドコ−ティング12aを伝わっ
て急速に基板11に伝達されるので、基板11は極めて
広い面積から熱を吸収でき、基板11の見掛け上の熱伝
導率を大きく向上できる。
FIG. 3 shows a third embodiment of the high frequency resistor according to the present invention. In FIG. 3, a large number of holes 12 are formed in the substrate 11, and diamonds 12 a are formed inside the holes 12.
Is coated. Further, a diamond thin film 13 is provided on the upper surface of the substrate 11.
A resistor 14 is provided on the surface 3. According to the configuration of FIG. 3, the heat generated from the resistor 14 is rapidly transmitted to the substrate 11 through the diamond coating 12a provided inside the many holes 12, so that the substrate 11 is extremely wide. The heat can be absorbed from the area, and the apparent thermal conductivity of the substrate 11 can be greatly improved.

【0011】図4は、本発明の高周波抵抗器の第4実施
例である。図4において、基板21は多数のセラミック
体211、〜21n を張り合せることにより構成されてい
る。このセラミック体211 〜21n の各々は、図5に
示すように薄い板状をしており、板状のセラミック体2
1 〜21n の上面にダイヤモンド薄膜221 〜22n
がコ−ティングされている。そして、基板21は、この
セラミック体211 〜21n が積層された構成となって
いる。さらに、セラミック体211 〜21n からなる基
板21上には、ダイヤモンドコ−ティング23が施され
ており、薄膜または厚膜の抵抗体24が、ダイヤモンド
コ−ティング23の上に形成されている。図4の構成に
よれば、抵抗体24から発生された熱はダイヤモンドコ
−ティング23で表面横方向に急速に伝達され,さらに
ダイヤモンド薄膜221 〜22n基板1中を縦方向に素
早く伝わって、基板1を構成するセラミック体211
21n 全体に熱が伝えられるので、熱は極めて効率よく
基板1に吸収され基板1の見掛け上の熱伝導率がより一
層向上する。
FIG. 4 shows a fourth embodiment of the high frequency resistor according to the present invention. 4, the substrate 21 is a large number of ceramic body 21 1 is constituted by combining span the through 21 n. Each of the ceramic bodies 21 1 to 21 n has a thin plate shape as shown in FIG.
1 1 through 21 n top thin diamond film 22 1 through 22 n of
Is coated. The substrate 21 has a structure in which the ceramic bodies 21 1 to 21 n are laminated. Further, a diamond coating 23 is provided on the substrate 21 composed of the ceramic bodies 21 1 to 21 n , and a thin film or thick film resistor 24 is formed on the diamond coating 23. .. According to the structure shown in FIG. 4, the heat generated from the resistor 24 is rapidly transferred in the lateral direction of the surface by the diamond coating 23, and further quickly transferred in the vertical direction in the diamond thin film 22 1 to 22 n substrate 1. , The ceramic body 21 1 constituting the substrate 1 ~
Since heat is transferred to the entire 21 n , the heat is absorbed very efficiently by the substrate 1 and the apparent thermal conductivity of the substrate 1 is further improved.

【0012】図6に本発明の高周波抵抗器を、筐体に組
み込んだ構成を示す。図6おいて、31は本発明の高周
波抵抗器であり筐体の下面に固着されている。32は高
周波抵抗器31と接栓34とを接続する接続線、33は
抵抗器31からの熱を放散するとともに、抵抗器31を
遮蔽する金属性の筐体、34は同軸ケ−ブルを接続する
接栓、35は筐体から熱を放散するヒ−トシンクであ
る。第6図において、高周波抵抗器31から発生された
熱は筐体33を介してヒ−トシンク35に伝わり、ここ
で放熱されるようになっている。
FIG. 6 shows a structure in which the high frequency resistor of the present invention is incorporated in a housing. In FIG. 6, reference numeral 31 is a high frequency resistor of the present invention, which is fixed to the lower surface of the housing. Reference numeral 32 is a connecting wire that connects the high frequency resistor 31 and the plug 34, 33 is a metal housing that dissipates heat from the resistor 31 and shields the resistor 31, and 34 is a coaxial cable. The reference numeral 35 denotes a heat sink that dissipates heat from the housing. In FIG. 6, heat generated from the high frequency resistor 31 is transmitted to the heat sink 35 through the housing 33 and is radiated there.

【0013】[0013]

【発明の効果】以上説明したように、本発明の高周波抵
抗器は、熱伝導率の極めて優れているダイヤモンド薄膜
を介して、抵抗器から発生する熱を放熱しているため、
抵抗器の基板としてセラミックを用いても基板を薄くす
ることなく放熱を効率よく行えるので、VSWRを悪く
することなく高周波抵抗器を小型化することができる。
As described above, since the high frequency resistor of the present invention radiates the heat generated from the resistor through the diamond thin film having an extremely excellent thermal conductivity,
Even if ceramic is used as the substrate of the resistor, heat can be efficiently dissipated without thinning the substrate, so that the high frequency resistor can be miniaturized without degrading VSWR.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の高周波抵抗器の第1実施例の構成を示
す。
FIG. 1 shows the configuration of a first embodiment of a high frequency resistor according to the present invention.

【図2】本発明の高周波抵抗器の第2実施例の構成を示
す。
FIG. 2 shows the configuration of a second embodiment of the high-frequency resistor according to the present invention.

【図3】本発明の高周波抵抗器の第3実施例の構成を示
す。
FIG. 3 shows the configuration of a third embodiment of the high-frequency resistor according to the present invention.

【図4】本発明の高周波抵抗器の第4実施例の構成を示
す。
FIG. 4 shows the configuration of a fourth embodiment of the high-frequency resistor according to the present invention.

【図5】第4実施例の基板の1部を示す図である。FIG. 5 is a diagram showing a part of the substrate of the fourth embodiment.

【図6】本発明の高周波抵抗器を筐体に組み込んだ構成
を示す図である。
FIG. 6 is a diagram showing a configuration in which the high frequency resistor of the present invention is incorporated in a housing.

【符号の説明】[Explanation of symbols]

1 セラミック基板 2 ダイヤモンド薄膜 3 抵抗体 1 Ceramic substrate 2 Diamond thin film 3 Resistor

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 セラミック基板と、このセラミック基板
上に形成したダイヤモンド薄膜と、該ダイヤモンド薄膜
の上に形成した抵抗層を備え、前記抵抗層の両端に電極
を設けるとともに、前記セラミック基板を放熱体に接触
した状態で固定したことを特徴とする高周波抵抗器。
1. A ceramic substrate, a diamond thin film formed on the ceramic substrate, and a resistance layer formed on the diamond thin film, electrodes are provided at both ends of the resistance layer, and the ceramic substrate is a heat radiator. A high-frequency resistor characterized by being fixed while being in contact with.
【請求項2】 上面にダイヤモンド薄膜を設けたセラミ
ック板を、複数枚張り合せてセラミック基板を構成した
ことを特徴とする請求項1に記載の高周波抵抗器。
2. The high frequency resistor according to claim 1, wherein a ceramic substrate is constructed by laminating a plurality of ceramic plates each having a diamond thin film on the upper surface thereof.
【請求項3】 多数の孔を垂直に設けたセラミック体の
上面と、前記孔の内面にダイヤモンドの薄膜を形成し、
セラミック基板を構成したことを特徴とする請求項1に
記載の高周波抵抗器。
3. A diamond thin film is formed on the upper surface of a ceramic body provided with a large number of holes vertically and on the inner surface of the holes,
The high frequency resistor according to claim 1, wherein the high frequency resistor comprises a ceramic substrate.
【請求項4】 一面に第1のダイヤモンド薄膜を設けた
セラミック板を、複数枚張り合せてセラミック基板を構
成し、前記第1のダイヤモンド薄膜と直交するセラミッ
ク基板の一面に第2のダイヤモンド薄膜を設け、第2の
ダイヤモンド薄膜上に抵抗膜を形成することを特徴とす
る請求項1記載の高周波抵抗器。
4. A ceramic substrate is formed by laminating a plurality of ceramic plates having a first diamond thin film on one surface thereof, and a second diamond thin film is provided on one surface of the ceramic substrate orthogonal to the first diamond thin film. The high frequency resistor according to claim 1, wherein the high frequency resistor is provided and a resistive film is formed on the second diamond thin film.
【請求項5】 放熱体が放熱用のヒ−トシンクによって
構成されていることを特徴とする請求項1に記載の高周
波抵抗器。
5. The high frequency resistor according to claim 1, wherein the heat radiator is composed of a heat sink for heat radiation.
JP03355596A 1991-12-24 1991-12-24 High frequency resistor Expired - Lifetime JP3115071B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03355596A JP3115071B2 (en) 1991-12-24 1991-12-24 High frequency resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03355596A JP3115071B2 (en) 1991-12-24 1991-12-24 High frequency resistor

Publications (2)

Publication Number Publication Date
JPH05175001A true JPH05175001A (en) 1993-07-13
JP3115071B2 JP3115071B2 (en) 2000-12-04

Family

ID=18444792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03355596A Expired - Lifetime JP3115071B2 (en) 1991-12-24 1991-12-24 High frequency resistor

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CN114038640A (en) * 2021-09-18 2022-02-11 盛雷城精密电阻(江西)有限公司 Ultrahigh frequency radio frequency resistor and production method thereof

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WO2015129161A1 (en) * 2014-02-27 2015-09-03 パナソニックIpマネジメント株式会社 Chip resistor
CN105849827A (en) * 2014-02-27 2016-08-10 松下知识产权经营株式会社 Chip resistor
US20160343479A1 (en) * 2014-02-27 2016-11-24 Panasonic Intellectual Property Management Co., Ltd. Chip resistor
JPWO2015129161A1 (en) * 2014-02-27 2017-03-30 パナソニックIpマネジメント株式会社 Chip resistor
US10319501B2 (en) 2014-02-27 2019-06-11 Panasonic Intellectual Property Management Co., Ltd. Chip resistor
CN114038640A (en) * 2021-09-18 2022-02-11 盛雷城精密电阻(江西)有限公司 Ultrahigh frequency radio frequency resistor and production method thereof

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