JPH05174760A - Long-sized electron beam generating device - Google Patents

Abstract

PURPOSE:To generate an electron beam uniform in the longitudinal direction of the surface of a target by curving electrodes constituting an electron gun into the form of circular arcs having the same center of curvature, allowing the electron gun to widen as proceeding, and installing a plurality of such electron guns. CONSTITUTION:A cathode 1 is supported by a plate 11 and formed in curving in the longitudinal direction, while a grid 4 and an anode 3 are formed in a circular arc so that they have the same center of curvature as the cathode 1, and thus an electron gun 15 is constructed. A plurality of such electron guns 15 are installed in the lower part of a crucible 14, and electron beams 5 are drawn out of them in radial form into a magnetic field B to yield a continuous electron beam irradiation surface 12 on the surface 13 of a target. This permits generating a uniform vapor density uniform in the longitudinal direction of the crucible stretching long and enables high speed evaporative attachment of a film having uniform thickness.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus having an electron gun used as a heat source for generating metal vapor in a vacuum such as a vapor deposition apparatus.

[0002]

2. Description of the Related Art In the case of obtaining metal vapor from a vapor deposition apparatus, in order to obtain a uniform vapor deposition film lengthwise in the longitudinal direction, it is necessary to obtain a uniform vapor density distribution along the longitudinal direction. It is necessary to obtain a uniform electron beam. As an apparatus for this purpose, there are an apparatus using a spot type electron gun and an apparatus using an electron gun for generating a linear electron beam (referred to as a linear electron gun).

In the former device using a spot type electron gun, as shown in FIG. 5, one electron beam generator having a beam scanning device 16 in the electron gun 15 or a long tube is used. A plurality of targets 13 which are the molten metals in the long crucible 14 are installed along the longitudinal direction of 14
The electron beam 5 is radiated onto the surface to obtain metal vapor from the electron beam irradiation surface 12. In this case, the electron beam 5 is swung by the beam scanning device 16 in the longitudinal direction of the elongated crucible 14 and is deflected by the magnetic field B by 90 °.

In the latter linear electron gun, as shown in FIG. 6, the linear cathode 1 is heated by the electron impact from the heating filament, and the electron beam 5 is extracted by the high voltage applied to the anode 3 at the same time. 4 controls the electron beam amount and the focusing property. In FIG. 6, 7 is a filament heating power source, 9 is an acceleration power source, and 10 is a grid power source.

The apparatus using the linear electron gun shown in FIG. 6 is provided with the linear electron gun 15 shown in FIG. 6 along the longitudinal direction at the lower part of the long crucible 14 as shown in FIG. The electron beam 5 generated from the linear electron gun 15 is deflected by the magnetic field B and irradiated on the target 13 to obtain metal vapor from the electron beam irradiation surface 12 of molten metal.

[0006]

As described above, in order to obtain a uniform vapor density, the spot electron gun needs to perform high-speed scanning, and the linear electron gun needs to overlap a plurality of beams 5 on the target 13. There is. However, the scanning speed is technically difficult at 500 Hz or higher, which causes uneven vapor density. Also, with a linear electron gun, the beam length with which uniform power density is obtained is almost equal to the cathode length, and since the width of the electron gun is longer than the cathode length, it is difficult to overlap the beams on the target surface, and the vapor density is also uneven. Is occurring.

An object of the present invention is to provide a long electron beam generator capable of superimposing electron beams on a target surface so that the vapor density is not uneven.

[0008]

SUMMARY OF THE INVENTION The present invention for achieving the above-mentioned object is provided with an electron gun for generating a linear electron beam in the longitudinal direction in order to vaporize a long target in a vacuum. A plurality of electron guns in which the electron generating electrode is formed in an arc shape along the longitudinal direction, and the other electrodes are formed in an arc shape so as to have the same radius of curvature as the heating electron generating electrode in the longitudinal direction. It is characterized by being installed.

[0009]

By making each electrode of the electron gun arcuate along the longitudinal direction, the electron beam is radially extracted from the center of the radius of curvature. Therefore, it becomes possible to obtain a beam longer than the heating electron generating electrode length in the longitudinal direction on the target surface. Further, by arranging a plurality of these electron guns in line, the beams can be superposed on the crucible, and an arbitrary beam length can be obtained.

[0010]

EXAMPLES Examples of the present invention will now be described with reference to FIGS. In FIG. 1 and FIG. 2 showing the AA cross section of FIG. 1, 1 is a cathode, and 2 is a linear filament which is resistance-heated by a filament power supply 7. Of these, the cathode 1 is supported by a cathode support plate 11, is formed by being bent in an arc shape in the long longitudinal direction, and is bombard-heated by an electron beam 6 for electron impact heating by a bombard power source 8 to a predetermined length. Made to temperature. Further, the power sources 4 and 3 of the anode 3 to which high voltage is applied by the grid 4 and the acceleration power source 9 which are connected to the grid power source 10 by controlling the electron beam amount and the focusing degree and radially draw out thermoelectrons from the cathode 1 Are formed in an arc shape so as to have the same center of curvature as that of the cathode 1.

The radius of curvature r _k of the cathode 1 is given by the following equation. r _k = L × W ₀ / (W ₂₇₀ −W ₀ ) (mm) where L is the distance between the cathode 1 and the target (m
m), W ₂₇₀ is the beam length (mm) at the target surface, 2
70 represents a 270 ° deflection. W ₀ is the length (mm) of the cathode 1, and W is the width (mm) of the electron gun. In order to superimpose a plurality of beams on the target surface, the relationship of beam length (W ₂₇₀ )> electron gun width (w) is required.

By arranging such electron guns as shown in FIGS. 3 and 4, the electron beams 5 are radially drawn into the magnetic field B from a plurality of linear electron guns 15 provided under the crucible 14 and are deflected by 270 °. A continuous electron beam irradiation surface 12 is formed on the target surface 13 at the position.

[0013]

As specifically shown above, by using the linear electron gun of the present invention, a uniform vapor density can be obtained in the longitudinal direction of a long crucible, and a uniform film thickness can be deposited at high speed. It becomes possible. Further, by making the molten pool on the target surface continuous, it is possible to supply the target from the end portion, which simplifies the raw material supply mechanism.

[Brief description of drawings]

FIG. 1 is a configuration diagram of an electron gun according to an embodiment.

FIG. 2 is an AA diagram of FIG.

FIG. 3 is a perspective view of the device.

FIG. 4 mainly shows an electron beam, (a) is a plan view,
(B) is a side view, (c) is explanatory drawing of the beam position on a crucible.

FIG. 5 is a perspective view of a conventional device.

FIG. 6 is a plan view of an electron gun of another conventional device.

FIG. 7 mainly shows an electron beam, (a) is a plan view,
(B) is a side view.

[Explanation of symbols]

 1 cathode 2 filament 3 anode 5 electron beam

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Takamasa Nakamura 4-6-22 Kannon Shinmachi, Nishi-ku, Hiroshima-shi, Hiroshima Mitsubishi Heavy Industries Ltd. Hiroshima Works (72) Inventor Shigeo Konno 3-1-1 Musashino, Akishima-shi, Tokyo No. 2 JEOL Ltd. (72) Inventor Tadayoshi Otani 3-1-2 Musashino, Akishima-shi, Tokyo JEOL Ltd.

Claims (1)

[Claims] 1. An electron gun provided with a linear electron beam in a longitudinal direction to evaporate a long target in a vacuum, wherein a heating electron generating electrode is formed in an arc shape along the longitudinal direction. In addition, a long electron beam generator, wherein a plurality of electron guns each having another electrode formed in an arc shape so as to have the same radius of curvature as that of the heating electron generating electrode are installed in the longitudinal direction.