JPH05164815A - Test method for semiconductor memory element - Google Patents

Test method for semiconductor memory element

Info

Publication number
JPH05164815A
JPH05164815A JP3336481A JP33648191A JPH05164815A JP H05164815 A JPH05164815 A JP H05164815A JP 3336481 A JP3336481 A JP 3336481A JP 33648191 A JP33648191 A JP 33648191A JP H05164815 A JPH05164815 A JP H05164815A
Authority
JP
Japan
Prior art keywords
test
semiconductor memory
tester
holding
air conditioner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3336481A
Other languages
Japanese (ja)
Inventor
Kazunori Nakajima
一典 中嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3336481A priority Critical patent/JPH05164815A/en
Publication of JPH05164815A publication Critical patent/JPH05164815A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a stable wiring voltage characteristic optimum for a test and to improve measurement precision of a memory holding characteristic test, by holding stand-by mode condition with a clock signal longer than the specific time before a normal test. CONSTITUTION:A test board 2 having semiconductor memory elements 4 inserted in sockets 3 is inserted into a board socket 6 in a thermostat 1. First, by setting an air conditioner 11 at a normal temperature (35 deg.C or below) and using an IC tester 5, erasings and writings of the elements 4 are done once or mode times for holding hold mode condition for one hour. Secondary, by judging the test is the first one or the second one, and in the case of the first one, the air conditioner 11 is settled at a high temperature (125 deg.C), and by using the IC tester 5 for holding the elements 4 in stand-by mode condition with a clock signal for two hours or more, and then by setting the air conditioner 11 at the normal temperature, power supply of the element 4 is turned off by using the IC tester 5 and a stable writing voltage characteristic optimum for a test is secured, test process is transferred to a normal test for testing a memory holding characteristic of the elements 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体メモリ素子の試
験方法に係り、特にICテスタを使用しての試験方法に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor memory device testing method, and more particularly to a testing method using an IC tester.

【0002】[0002]

【従来の技術】図2は半導体メモリ素子の試験を実施す
るための装置の構成を示す模式図である。この図におい
て、1は恒温槽で、試験用ボード2上に設けられた半導
体メモリ素子用ソケット3に半導体メモリ素子4がセッ
トされている。5は前記半導体メモリ素子4を試験する
ためのICテスタ、6はボード用ソケット、7aは前記
恒温槽1内の給気側ファン、7bは同じく排気側ファ
ン、7cは、空気調節装置11の給気側ファン、7dは
同じく排気側ファンである。8は前記恒温槽1の給気
口、9は同じく排気口、10は外気である。また、11
は前記した空気調節装置で、恒温槽1内へ半導体メモリ
素子4の試験に最適で一定した温度に調節した空気を送
り込むためのものである。12はこの空気調節装置11
の給気口、13は同じく排気口である。
2. Description of the Related Art FIG. 2 is a schematic diagram showing the structure of an apparatus for carrying out a test on a semiconductor memory device. In this figure, reference numeral 1 is a thermostatic chamber, in which a semiconductor memory element 4 is set in a semiconductor memory element socket 3 provided on a test board 2. 5 is an IC tester for testing the semiconductor memory device 4, 6 is a board socket, 7a is an air supply side fan in the constant temperature bath 1, 7b is also an exhaust side fan, and 7c is an air supply device 11 supply. The air side fan and 7d are also exhaust side fans. Reference numeral 8 is an air supply port of the constant temperature bath 1, 9 is an exhaust port, and 10 is outside air. Also, 11
Is an air conditioner described above, which is for feeding the air, which is optimum for the test of the semiconductor memory element 4 and adjusted to a constant temperature, into the constant temperature bath 1. 12 is this air conditioner 11
The air supply port 13 and the exhaust port 13 are also provided.

【0003】図3は、図2の装置による従来の半導体メ
モリ素子4の試験方法のフローチャートを示す図であ
る。図3において、(1)〜(6)は各ステップを示
し、(1)は常温(35℃以下)にて電源をONするス
テップ、(2)は常温(35℃以下)にて消去・書込み
を交互にm(m≧1)回実施するステップ、(3)は常
温(35℃以下)にてホールドモード状態を1時間保持
するステップ、(4)は高温(125℃)にてクロック
信号有りスタンドバイモード状態(半導体メモリ素子4
の機能上の動作モード)をn(n≧8)時間保持するス
テップ、(5)は常温(35℃以下)にて電源をOFF
するステップ、(6)は高温(75℃)にて記憶保持特
性試験を実施するステップである。
FIG. 3 is a flowchart showing a conventional method of testing the semiconductor memory device 4 by the apparatus of FIG. In FIG. 3, (1) to (6) show respective steps, (1) a step of turning on the power at room temperature (35 ° C. or lower), and (2) erasing / writing at room temperature (35 ° C. or lower). Alternating m times (m ≧ 1) times, (3) holding the hold mode state for 1 hour at room temperature (35 ° C. or less), and (4) at high temperature (125 ° C.) with clock signal Standby mode state (semiconductor memory device 4
Step (5) is to turn off the power at room temperature (35 ° C or less).
Step (6) is a step of carrying out a memory retention characteristic test at a high temperature (75 ° C.).

【0004】次に、図2の動作を図3のフローチャート
に基づいて説明する。図2において、半導体メモリ素子
4を半導体メモリ素子用ソケット3に挿入した試験用ボ
ード2を恒温槽1内のボード用ソケット6に挿入する。
次いで、空気調節装置11により常温(35℃以下)に
設定し、ICテスタ5を使用し、半導体メモリ素子4に
ついて電源をONにし(1)、消去・書込みを交互にm
(m≧1)回実施した後(2)、ホールドモード状態を
1時間保持する(3)。次いで、空気調節装置11によ
り高温(125℃)に設定し、ICテスタ5を使用し、
半導体メモリ素子4についてクロック信号有りスタンド
バイモード状態をn(n≧8)時間保持する(4)。次
いで、空気調節装置11により常温(35℃以下)に設
定し、ICテスタ5を使用し、半導体メモリ素子4につ
いて電源をOFFにする(5)。次いで、空気調節装置
11により高温(75℃)に設定し、ICテスタ5を使
用し、半導体メモリ素子4について記憶保持特性試験を
実施する(6)。
Next, the operation of FIG. 2 will be described with reference to the flowchart of FIG. In FIG. 2, the test board 2 in which the semiconductor memory device 4 is inserted into the semiconductor memory device socket 3 is inserted into the board socket 6 in the constant temperature bath 1.
Then, the temperature is set to room temperature (35 ° C. or less) by the air conditioner 11, the power is turned on for the semiconductor memory element 4 using the IC tester 5 (1), and erase / write is alternately performed.
After performing (m ≧ 1) times (2), the hold mode state is held for 1 hour (3). Then, the temperature is set to a high temperature (125 ° C.) by the air conditioner 11, and the IC tester 5 is used.
The semiconductor memory device 4 is held in the standby mode state with a clock signal for n (n ≧ 8) time (4). Next, the temperature is set to room temperature (35 ° C. or lower) by the air conditioner 11, the IC tester 5 is used, and the power supply of the semiconductor memory element 4 is turned off (5). Next, the temperature is set to a high temperature (75 ° C.) by the air conditioner 11, and the IC memory 5 is used to carry out a memory retention characteristic test on the semiconductor memory element 4 (6).

【0005】上記動作中は、常時恒温槽1内の給気口8
より、給気側ファン7a,7cを回転させて、恒温槽1
内に空気調節装置11から試験に最適で一定した温度に
調節した空気を取り入れる。また、恒温槽1内の排気口
9より排気側ファン7bを回転させて、恒温槽1内の空
気を外気10へ排気する。
During the above operation, the air supply port 8 in the constant temperature bath 1 is constantly operated.
By rotating the air supply side fans 7a and 7c,
From the air conditioner 11, the air adjusted to a constant temperature which is optimum for the test is taken in. Further, the exhaust side fan 7b is rotated from the exhaust port 9 in the constant temperature bath 1 to exhaust the air in the constant temperature bath 1 to the outside air 10.

【0006】[0006]

【発明が解決しようとする課題】従来の半導体メモリ素
子4の試験は、以上のような方法で実施されているの
で、半導体メモリ素子4の書込み電圧特性が不安定とな
り、記憶保持特性試験時の測定精度が低下するという問
題点があった。
Since the conventional semiconductor memory device 4 has been tested by the method as described above, the write voltage characteristic of the semiconductor memory device 4 becomes unstable, and the semiconductor memory device 4 is not tested. There is a problem that the measurement accuracy is reduced.

【0007】本発明は、上記のような問題点を解消する
ためになされたもので、半導体メモリ素子について最適
で、安定した書込み電圧特性が確保できるとともに、特
性試験時の正確な測定精度を得ることができる半導体メ
モリ素子の試験方法を得ることを目的とする。
The present invention has been made to solve the above-mentioned problems, and is optimum for a semiconductor memory device, and a stable write voltage characteristic can be secured, and an accurate measurement accuracy at the time of a characteristic test can be obtained. An object of the present invention is to obtain a test method for a semiconductor memory device that can be used.

【0008】[0008]

【課題を解決するための手段】本発明に係る半導体メモ
リ素子の試験方法は、クロック信号有りスタンドバイモ
ード状態を2時間以上保持した後、常温で電源をOFF
にした後、従来と同様な操作でICテスタにより半導体
メモリ素子の特性試験を行うようにしたものである。
According to a method of testing a semiconductor memory device of the present invention, a power supply is turned off at room temperature after holding a standby mode state with a clock signal for two hours or more.
After that, the characteristic test of the semiconductor memory device is performed by the IC tester by the same operation as the conventional one.

【0009】[0009]

【作用】本発明においては、通常の操作の前にクロック
信号有りスタンドバイモード状態を2時間以上保持する
操作を付加したので、試験に最適な安定した書込み電圧
特性が確保され、特性試験時の測定精度が向上する。
In the present invention, since the operation for holding the standby mode state with the clock signal for two hours or more is added before the normal operation, the stable write voltage characteristic optimum for the test is ensured and the characteristic test at the time of the characteristic test is performed. Measurement accuracy is improved.

【0010】[0010]

【実施例】以下、本発明の一実施例を図について説明す
る。図1は本発明の半導体メモリ素子の試験方法を説明
するフローチャートで、(1)〜(9)は各ステップを
示す。なお、図3との比較が容易なように、ステップ
(1)〜(6)は図3と同じものを表し、本発明で追加
されたステップを(7)〜(9)で表している。したが
って、操作順序は必ずしも番号順になっていない。そし
て、この実施例では、半導体メモリ素子4を2個同時に
試験する場合について説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a flowchart illustrating a method for testing a semiconductor memory device according to the present invention, in which (1) to (9) show respective steps. For easy comparison with FIG. 3, steps (1) to (6) represent the same as FIG. 3, and steps added in the present invention are represented by (7) to (9). Therefore, the operation order is not necessarily the numerical order. In this embodiment, a case where two semiconductor memory devices 4 are tested simultaneously will be described.

【0011】図1において、(1)は常温(35℃以
下)にて電源をONするステップ、(2)は常温(35
℃以下)にて消去・書込みを交互にm(m≧1)回実施
するステップ、(3)は常温(35℃以下)にてホール
ドモード状態を1時間保持するステップ、(4)は高温
(125℃)にてクロック信号有りスタンバイモード状
態をn(n≧8)時間保持するステップ、(5)は常温
(35℃以下)にて電源をOFFにするステップであ
る。(6)は高温(75℃)にて記憶保持特性試験を実
施するステップ、(7)は1回目または2回目のチェッ
クを実施する場合の判定を行うステップ、(8)はクロ
ック有りスタンドバイモード状態i(i≧2)時間保持
(高温125℃)するステップ、(9)は常温(35℃
以下)で電源OFFするステップで有る。
In FIG. 1, (1) is a step of turning on the power at room temperature (35 ° C. or lower), and (2) is room temperature (35 ° C.).
The step of performing erasing / writing alternately m (m ≧ 1) times at (° C. or lower), (3) the step of holding the hold mode state for 1 hour at room temperature (35 ° C. or lower), and (4) the high temperature ( A step of maintaining the standby mode state with a clock signal at 125 ° C. for n (n ≧ 8) hours, and (5) is a step of turning off the power at room temperature (35 ° C. or lower). (6) is a step for carrying out a memory retention characteristic test at a high temperature (75 ° C.), (7) is a step for making a judgment when carrying out the first or second check, and (8) is a standby mode with a clock. State i (i ≧ 2) time holding (high temperature 125 ° C.), step (9) is normal temperature (35 ° C.)
In the following), the power is turned off.

【0012】次に、動作について説明する。半導体メモ
リ素子4を半導体メモリ素子用ソケット3に挿入した試
験用ボード2を恒温槽1内のボード用ソケット6に挿入
する。まず、1回目として、空気調節装置11により常
温(35℃以下)に設定し、ICテスタ5を使用し、半
導体メモリ素子4について電源をONにし(1)、消去
・書込みを交互にm(m≧1)回実施する(2)。次い
で、ホールドモード状態を1時間保持する(3)。次い
で、この試験が1回目か2回目かを判断し(7)、1回
目ならば空気調節装置11により高温(125℃)に設
定し、ICテスタ5を使用して、半導体メモリ素子4に
ついてクロック信号有りスタンドバイモード状態をi
(i≧2)時間保持する(8)。次いで、空気調節装置
11により常温(35℃以下)に設定し、ICテスタ5
を使用し、半導体メモリ素子4について電源をOFFす
る(9)。
Next, the operation will be described. The test board 2 in which the semiconductor memory device 4 is inserted into the semiconductor memory device socket 3 is inserted into the board socket 6 in the constant temperature bath 1. First, as the first time, the air conditioner 11 is set to room temperature (35 ° C. or lower), the IC tester 5 is used, and the semiconductor memory device 4 is turned on (1), and erase / write is alternately performed m (m Carry out ≧ 1) times (2). Next, the hold mode state is held for 1 hour (3). Then, it is judged whether this test is the first time or the second time (7), and if it is the first time, the temperature is set to a high temperature (125 ° C.) by the air conditioner 11, and the IC tester 5 is used to clock the semiconductor memory device 4 with the clock. Standby mode status with signal i
Hold for (i ≧ 2) time (8). Next, the temperature is set to room temperature (35 ° C or lower) by the air conditioner 11, and the IC tester 5
The semiconductor memory device 4 is turned off by using (9).

【0013】次に、2回目として、再びステップ(1)
〜(3)を実施する。その後、クロック信号有りスタン
ドバイモード状態をn(n≧8)時間保持し(4)、空
気調節装置11により常温(35℃以下)に設定し、I
Cテスタ5を使用して半導体メモリ素子4について電源
をOFFにする(5)。次いで、空気調節装置11によ
り高温(75℃)に設定し、ICテスタ5を使用し、半
導体メモリ素子4について、記憶保持特性試験を実施す
る(6)。上記1回目と2回目を実施することにより書
込み電圧の深さが約2倍となり、試験に最適な安定した
書込み電圧特性が確保され、記憶保持特性試験時の測定
精度が向上する。
Next, as the second time, the step (1) is performed again.
~ (3) is implemented. Then, the standby mode state with a clock signal is maintained for n (n ≧ 8) hours (4), and the temperature is set to room temperature (35 ° C. or lower) by the air conditioning device 11, and I
The power of the semiconductor memory device 4 is turned off using the C tester 5 (5). Next, the temperature is set to a high temperature (75 ° C.) by the air conditioner 11, the IC tester 5 is used, and the memory retention characteristic test is performed on the semiconductor memory element 4 (6). By performing the first and second times, the depth of the write voltage is approximately doubled, stable write voltage characteristics optimal for the test are secured, and the measurement accuracy during the memory retention characteristic test is improved.

【0014】なお、上記実施例では2個の半導体メモリ
素子4を同時に試験する方法について説明したが、n
(n≧2)個同時でも、上記実施例と同様の効果が得ら
れる。
Although a method of simultaneously testing two semiconductor memory devices 4 has been described in the above embodiment, n
Even when (n ≧ 2) pieces are simultaneously produced, the same effect as that of the above-described embodiment can be obtained.

【0015】また、上記実施例では高温(75℃)(ス
テップ(6))にて記憶保持特性試験を実施する試験方
法について説明したが、常温(25℃)にても、上記実
施例と同様の効果が得られる。
Further, in the above-mentioned embodiment, the test method for conducting the memory retention characteristic test at high temperature (75 ° C.) (step (6)) has been described, but even at room temperature (25 ° C.) the same as in the above-mentioned embodiment. The effect of is obtained.

【0016】さらに、上記実施例では、従来方式を実施
する事前に1回目のクロック信号有りスタンドバイモー
ド状態をi(i≧2)時間保持する試験方法について説
明したが、このステップは2回以上実施しても同様の効
果が得られる。
Further, in the above embodiment, the test method of holding the standby mode state with the clock signal for the first time i (i ≧ 2) time before the conventional method is carried out was explained, but this step is performed twice or more. Even if it implements, the same effect is acquired.

【0017】[0017]

【発明の効果】以上説明したように、本発明は、通常の
試験の前に、クロック信号有りスタンドバイモード状態
を2時間以上保持する工程を少なくとも1回以上行うよ
うにしたので、試験に最適な安定した書込み電圧特性を
確保でき、測定精度の高い記憶保持特性試験が実施で
き、また、半導体メモリ素子の品質向上が得られる効果
がある。
As described above, according to the present invention, the step of holding the standby mode state with the clock signal for 2 hours or more is performed at least once before the normal test, and therefore, it is suitable for the test. That is, stable write voltage characteristics can be secured, a memory retention characteristic test with high measurement accuracy can be performed, and the quality of the semiconductor memory device can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例による半導体メモリ素子の試
験方法を示すフローチャートである。
FIG. 1 is a flowchart illustrating a method of testing a semiconductor memory device according to an exemplary embodiment of the present invention.

【図2】半導体メモリ素子の試験装置を示す模式図であ
る。
FIG. 2 is a schematic diagram showing a semiconductor memory device testing apparatus.

【図3】従来の半導体メモリ素子の試験方法を示すフロ
ーチャート図である。
FIG. 3 is a flowchart showing a conventional method for testing a semiconductor memory device.

【符号の説明】[Explanation of symbols]

1 恒温槽 2 試験用ボード 3 半導体メモリ素子用ソケット 4 半導体メモリ素子 5 ICテスタ 6 ボード用ソケット 7a,7c 給気側ファン 7b,7d 排気側ファン 8 恒温槽の給気口 9 恒温槽の排気口 10 外気 11 空気調節装置 12 空気調節装置の給気口 13 空気調節装置の排気口 1 constant temperature tank 2 test board 3 semiconductor memory element socket 4 semiconductor memory element 5 IC tester 6 board socket 7a, 7c air supply side fan 7b, 7d exhaust side fan 8 constant temperature tank air supply port 9 constant temperature tank exhaust port 10 Outside Air 11 Air Conditioner 12 Air Supply Port for Air Conditioner 13 Exhaust Port for Air Conditioner

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 電気的に記憶・消去可能な複数個の半導
体メモリ素子を恒温槽内にセットし、ICテスタを用い
て試験する方法において、常温にて電源ONし、消去・
書き込みを交互に任意回数実施し、ホールドモード状態
で1時間保持し、高温にてクロック信号有りスタンドバ
イモード状態を2時間以上保持する工程を少なくとも1
回行った後、常温にて電源をOFFし、再び常温にて電
源をONし、消去・書き込みを交互に任意回数実施し、
ホールドモード状態で1時間保持し、次いで、クロック
信号有りスタンドバイモード状態を8時間以上保持し、
常温以下で電源OFFした後、高温にてICテスタによ
り前記半導体メモリ素子の特性試験を行うことを特徴と
する半導体メモリ素子の試験方法。
1. In a method of setting a plurality of electrically storable / erasable semiconductor memory elements in a thermostatic chamber and testing them using an IC tester, the power is turned on at room temperature to erase the semiconductor memory elements.
At least one step of performing the writing alternately for an arbitrary number of times, maintaining the hold mode state for 1 hour, and maintaining the standby mode state with the clock signal at high temperature for 2 hours or more
After repeating the operation, turn off the power at room temperature, turn on the power again at room temperature, and erase / write alternately for any number of times.
Hold for 1 hour in hold mode, then hold for 8 hours or more in standby mode with clock signal,
A method for testing a semiconductor memory device, which comprises conducting a characteristic test of the semiconductor memory device with an IC tester at a high temperature after powering off at room temperature or lower.
JP3336481A 1991-12-19 1991-12-19 Test method for semiconductor memory element Pending JPH05164815A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3336481A JPH05164815A (en) 1991-12-19 1991-12-19 Test method for semiconductor memory element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3336481A JPH05164815A (en) 1991-12-19 1991-12-19 Test method for semiconductor memory element

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JPH05164815A true JPH05164815A (en) 1993-06-29

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100383763B1 (en) * 2000-12-29 2003-05-14 주식회사 하이닉스반도체 Method of testing a memory cell in semiconductor device
JP2006214892A (en) * 2005-02-04 2006-08-17 Fujitsu Ltd Method of testing semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100383763B1 (en) * 2000-12-29 2003-05-14 주식회사 하이닉스반도체 Method of testing a memory cell in semiconductor device
JP2006214892A (en) * 2005-02-04 2006-08-17 Fujitsu Ltd Method of testing semiconductor device

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