JPH05163582A - Treatment of surface - Google Patents

Treatment of surface

Info

Publication number
JPH05163582A
JPH05163582A JP35155291A JP35155291A JPH05163582A JP H05163582 A JPH05163582 A JP H05163582A JP 35155291 A JP35155291 A JP 35155291A JP 35155291 A JP35155291 A JP 35155291A JP H05163582 A JPH05163582 A JP H05163582A
Authority
JP
Japan
Prior art keywords
nickel
plating film
phosphorus
hardness
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP35155291A
Other languages
Japanese (ja)
Other versions
JP3101669B2 (en
Inventor
Muneyori Matsumura
宗順 松村
Takayuki Nakamura
孝之 中村
Itaru Chiba
格 千葉
Masuo Okada
益雄 岡田
Hideaki Matsunami
秀明 松波
Masahiko Ayame
正彦 綾目
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SAMITSUKUSU KK
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Original Assignee
SAMITSUKUSU KK
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SAMITSUKUSU KK, Uemera Kogyo Co Ltd, C Uyemura and Co Ltd filed Critical SAMITSUKUSU KK
Priority to JP03351552A priority Critical patent/JP3101669B2/en
Publication of JPH05163582A publication Critical patent/JPH05163582A/en
Application granted granted Critical
Publication of JP3101669B2 publication Critical patent/JP3101669B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To form a plating film having high mechanical strength and excellent wear resistance on the surface of stock with satisfactory adhesion. CONSTITUTION:An Ni-P alloy plating film 2 is formed on the surface of stock 1 and heat-treated. A composite plating film 3 contg. fluororesin particles codeposited in an Ni or Ni alloy plating film is then formed on the heat-treated Ni-P alloy plating film 2.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、機械的強度、耐摩耗性
等が要求される部品の製造に好適に採用される表面処理
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment method which is preferably used for manufacturing parts requiring mechanical strength, abrasion resistance and the like.

【0002】[0002]

【従来の技術】従来より、各種機械類などにおいて、耐
摩耗性、潤滑性等を付与する目的でニッケル又はニッケ
ル合金めっき皮膜中に複合材を共析させた複合めっき皮
膜、特に無電解ニッケルめっき皮膜中にポリテトラフル
オロエチレン(PTFE)等のフッ素樹脂粒子を共析さ
せた無電解Ni−P複合めっき皮膜を部品表面に形成す
ることが知られている。
2. Description of the Related Art Conventionally, in various machines and the like, a composite plating film in which a composite material is co-deposited in a nickel or nickel alloy plating film for the purpose of imparting wear resistance, lubricity, etc., particularly electroless nickel plating It is known to form an electroless Ni-P composite plating film in which fluororesin particles such as polytetrafluoroethylene (PTFE) are co-deposited on the surface of a component.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、このよ
うなニッケル又はニッケル合金の複合めっき皮膜は、そ
の用途によっては密着性、硬度などの機械的強度の点で
不十分な場合がある。
However, such a nickel or nickel alloy composite plating film may be insufficient in terms of mechanical strength such as adhesion and hardness depending on its application.

【0004】即ち、各種機械の鋼製摺動部材などには、
その表面硬度を高めるために浸炭又は浸炭窒化処理を施
すことがしばしば行われるが、この場合部材表面の浸炭
又は浸炭窒化層とニッケル又はニッケル合金複合めっき
皮膜との密着性が必ずしも十分ではなく、用途によって
は剥離等の不都合を生じる場合がある。
That is, for steel sliding members of various machines,
Carburizing or carbonitriding is often performed to increase the surface hardness, but in this case the adhesion between the carburizing or carbonitriding layer on the surface of the member and the nickel or nickel alloy composite plating film is not always sufficient, Depending on the case, inconvenience such as peeling may occur.

【0005】また、ニッケル又はニッケル合金めっき皮
膜は、クロムめっき皮膜などに比べて硬度に劣るもので
ある。この場合、Ni−Pめっき皮膜は熱処理を行うこ
とにより、クロムめっき皮膜と同等の硬度を得ることが
可能であるが、複合材としてフッ素樹脂粒子を共析させ
た場合は、このフッ素樹脂粒子の融点が低いため高温で
熱処理することが困難である。
Further, the nickel or nickel alloy plating film is inferior in hardness to a chromium plating film or the like. In this case, it is possible to obtain the hardness equivalent to that of the chromium plating film by heat-treating the Ni-P plating film, but when the fluororesin particles are co-deposited as the composite material, It is difficult to heat-treat at high temperature because of its low melting point.

【0006】本発明は、上記事情に鑑みなされたもの
で、表面に浸炭又は浸炭窒化層を有する素材であって
も、十分な硬度及び耐摩耗性を有するめっき皮膜を密着
性よく形成することができる表面処理方法を提供するこ
とを目的とする。
The present invention has been made in view of the above circumstances, and it is possible to form a plating film having sufficient hardness and abrasion resistance with good adhesiveness even with a material having a carburized or carbonitrided layer on its surface. An object is to provide a surface treatment method that can be performed.

【0007】[0007]

【課題を解決するための手段及び作用】本発明者は、上
記目的を達成するため鋭意検討を行った結果、素材表面
に複合材を含まないニッケル−リン合金めっき皮膜を形
成し、このニッケル−リン合金めっき皮膜を熱処理して
ニッケルの拡散による素材との密着性向上及びその硬度
の向上を図ると共に、熱処理後のニッケル−リン合金め
っき層上にフッ素樹脂粒子を共析させたニッケル又はニ
ッケル合金複合めっき皮膜を形成することにより、表面
に浸炭又は浸炭窒化層を有する素材であっても、十分な
機械的強度を有し、かつ耐摩耗性に優れためっき皮膜を
密着性よく形成し得ることを見出し、本発明を完成した
ものである。
Means for Solving the Problems The present inventor has conducted diligent studies to achieve the above object, and as a result, formed a nickel-phosphorus alloy plating film containing no composite material on the surface of the raw material. Nickel or nickel alloy in which fluororesin particles are co-deposited on the nickel-phosphorus alloy plating layer after heat treatment, while improving heat treatment of the phosphorus alloy plating film to improve adhesion to the material by diffusion of nickel and its hardness. By forming a composite plating film, it is possible to form a plating film with sufficient mechanical strength and excellent wear resistance with good adhesion, even if the material has a carburized or carbonitrided layer on the surface. That is, the present invention has been completed.

【0008】即ち、上記方法によれば、下層のニッケル
−リン合金めっき皮膜が熱処理によって素材と良好に密
着すると共に、十分な高硬度化が図られ、この上にフッ
素樹脂粒子が共析したニッケル又はニッケル合金複合め
っき皮膜を形成することにより、下層のニッケル−リン
合金めっき皮膜とこのニッケル又はニッケル合金複合め
っき皮膜とは十分な密着性が得られるので、十分な密着
性を有するめっき皮膜が得られる。またこの場合、下層
のニッケル−リン合金めっき皮膜層が熱処理によって高
硬度化され、上層のニッケル又はニッケル合金複合めっ
き皮膜が下層の高硬度のニッケル−リン合金めっき皮膜
により支持されているので、めっき皮膜全体の硬度も顕
著に向上するものである。
That is, according to the above method, the nickel-phosphorus alloy plating film of the lower layer adheres well to the material by the heat treatment and has a sufficiently high hardness, and nickel on which fluororesin particles are co-deposited Alternatively, by forming a nickel alloy composite plating film, sufficient adhesion can be obtained between the lower nickel-phosphorus alloy plating film and this nickel or nickel alloy composite plating film, so that a plating film having sufficient adhesion is obtained. Be done. In this case, the lower nickel-phosphorus alloy plating film layer is hardened by heat treatment, and the upper nickel or nickel alloy composite plating film is supported by the lower high-hardness nickel-phosphorus alloy plating film. The hardness of the entire coating is also significantly improved.

【0009】従って、本発明は、素材表面にニッケル−
リン合金めっき皮膜を形成し、該ニッケル−リンめっき
皮膜を熱処理した後、この上にニッケル又はニッケル合
金めっき皮膜中にフッ素樹脂粒子が共析した複合めっき
皮膜を形成することを特徴とする表面処理方法を提供す
るものである。
Therefore, according to the present invention, the surface of the material is nickel-coated.
A surface treatment characterized by forming a phosphorus alloy plating film, heat-treating the nickel-phosphorus plating film, and then forming a composite plating film in which fluororesin particles are co-deposited in the nickel or nickel alloy plating film thereon. It provides a method.

【0010】以下、本発明について更に詳しく説明す
る。本発明のニッケルめっき皮膜の形成方法は、図1に
示したように、素材1の表面にニッケル−リン合金めっ
き皮膜層2を形成し、このニッケル−リン合金めっき皮
膜層2を熱処理した後、この上にフッ素樹脂粒子(図示
せず)が均一に共析したニッケル又はニッケル合金複合
めっき皮膜層3を形成するものである。なお、図中4は
ニッケル−リンの素材への拡散層である。
The present invention will be described in more detail below. As shown in FIG. 1, the method for forming a nickel plating film of the present invention comprises forming a nickel-phosphorus alloy plating film layer 2 on the surface of a raw material 1 and heat treating the nickel-phosphorus alloy plating film layer 2, A nickel or nickel alloy composite plating film layer 3 in which fluororesin particles (not shown) are uniformly co-deposited is formed thereon. Reference numeral 4 in the figure is a diffusion layer for nickel-phosphorus material.

【0011】上記ニッケル−リン合金めっき皮膜層2の
形成は、電気めっき法で行っても無電解めっき法で行っ
てもよいが、均一な皮膜が得られることから無電解めっ
き法で形成することが好ましい。この場合、リンの含有
量は1〜12重量%、特に3〜10%とすることが好ま
しい。なお、このニッケルめっき皮膜層2の厚さは、特
に制限されるものではないが、2〜30μm、特に5〜
20μmとすることが好ましく、2μm未満では良好な
密着性及び硬度を有するニッケル複合めっき皮膜が得ら
れない場合がある。
The nickel-phosphorus alloy plating film layer 2 may be formed by an electroplating method or an electroless plating method, but it is formed by an electroless plating method because a uniform film can be obtained. Is preferred. In this case, the phosphorus content is preferably 1 to 12% by weight, particularly 3 to 10%. The thickness of the nickel plating film layer 2 is not particularly limited, but is 2 to 30 μm, and particularly 5 to
The thickness is preferably 20 μm, and if it is less than 2 μm, a nickel composite plating film having good adhesion and hardness may not be obtained.

【0012】このニッケル−リン合金めっき皮膜2を熱
処理するときの条件は、特に限定されるものではない
が、処理温度190〜600℃、特に200〜400℃
で、10分〜3時間、通常60分程度熱処理することが
好ましい。この場合、処理温度が190℃未満である
と、このニッケルめっき皮膜2と素材1との間に良好な
密着性が得られない場合がある。また、あまり高温であ
ると熱処理雰囲気が酸化性雰囲気の場合皮膜表面が酸化
されてしまい、ニッケル−リン合金めっき皮膜2とニッ
ケル又はニッケル合金複合めっき皮膜層3との間に良好
な密着性が得られない場合がある。
The conditions for heat-treating the nickel-phosphorus alloy plating film 2 are not particularly limited, but the treatment temperature is 190 to 600 ° C., particularly 200 to 400 ° C.
Then, it is preferable to perform heat treatment for 10 minutes to 3 hours, usually about 60 minutes. In this case, if the treatment temperature is less than 190 ° C., good adhesion may not be obtained between the nickel plating film 2 and the material 1. If the temperature is too high, the coating surface is oxidized when the heat treatment atmosphere is an oxidizing atmosphere, and good adhesion is obtained between the nickel-phosphorus alloy plating coating 2 and the nickel or nickel alloy composite plating coating layer 3. You may not be able to.

【0013】この熱処理によってニッケルが素材1に拡
散してニッケル−リン合金めっき皮膜2の素材1に対す
る密着性が向上する。また、ニッケル−リン合金めっき
皮膜2の硬度も顕著に向上させることができる。この場
合、硬度はビッカース硬度Hvとして500〜100
0、特に550〜800となるように熱処理することが
好ましい。
By this heat treatment, nickel diffuses into the material 1 and the adhesion of the nickel-phosphorus alloy plating film 2 to the material 1 is improved. Also, the hardness of the nickel-phosphorus alloy plating film 2 can be significantly improved. In this case, the hardness is 500 to 100 as Vickers hardness Hv.
It is preferable that the heat treatment is performed so that it becomes 0, particularly 550 to 800.

【0014】この熱処理後のニッケル−リン合金めっき
皮膜2上に形成するフッ素樹脂粒子が共析したニッケル
又はニッケル合金複合めっき皮膜層3の形成は、電気め
っき法で行っても無電解めっき法で行ってもよいが、皮
膜の均一性の点から無電解めっき法で行うことが好まし
く、特に無電解Ni−P/フッ素樹脂粒子複合めっき皮
膜とすることが好ましい。この場合、リンの含有量は1
〜12重量%、特に3〜10%とすることが好ましい。
The formation of the nickel or nickel alloy composite plating film layer 3 in which the fluororesin particles are formed on the nickel-phosphorus alloy plating film 2 after the heat treatment is performed by electroplating or electroless plating. Although it may be carried out, it is preferably carried out by an electroless plating method from the viewpoint of the uniformity of the film, and an electroless Ni-P / fluorine resin particle composite plating film is particularly preferred. In this case, the phosphorus content is 1
It is preferable to be ˜12% by weight, especially 3 to 10%.

【0015】このニッケル又はニッケル合金複合めっき
皮膜層3の厚さは、特に制限されるものではないが、2
〜50μm、特に5〜10μmとすることが好ましく、
このニッケル又はニッケル合金複合めっき皮膜層3の厚
さが2μm未満であると、十分な耐摩耗性、潤滑性が得
られない場合がある。
The thickness of the nickel or nickel alloy composite plating film layer 3 is not particularly limited, but is 2
˜50 μm, particularly preferably 5 to 10 μm,
If the thickness of the nickel or nickel alloy composite plating film layer 3 is less than 2 μm, sufficient wear resistance and lubricity may not be obtained.

【0016】ここで、このニッケル又はニッケル合金複
合めっき皮膜層3中に共析させるフッ素樹脂粒子として
は、ポリテトラフルオロエチレン(PTFE)、テトラ
フルオロエチレン/ヘキサフルオロプロピレン共重合体
(FEP)、テトラフルオロエチレン/パーフルオロア
ルキルビニルエーテル共重合体(PFA)などの粒子が
挙げられ、これらの1種又は2種以上を用いることがで
きる。これらフッ素樹脂粒子の共析量は、特に制限され
るものではないが、2〜10重量%、特に3〜9重量%
とすることが好ましく、フッ素樹脂粒子共析量が2重量
%未満であると、良好な耐摩耗性、潤滑性が得られない
場合があり、一方10重量%を超えると、皮膜の硬度が
低下する場合がある。
Here, as the fluororesin particles to be co-deposited in the nickel or nickel alloy composite plating layer 3, polytetrafluoroethylene (PTFE), tetrafluoroethylene / hexafluoropropylene copolymer (FEP), tetra Particles of fluoroethylene / perfluoroalkyl vinyl ether copolymer (PFA) and the like can be mentioned, and one kind or two or more kinds thereof can be used. The eutectoid amount of these fluororesin particles is not particularly limited, but is 2 to 10% by weight, particularly 3 to 9% by weight.
When it is less than 2% by weight, good abrasion resistance and lubricity may not be obtained. On the other hand, when it exceeds 10% by weight, the hardness of the coating decreases. There is a case.

【0017】なお、このニッケル又はニッケル合金複合
めっき皮膜層3には、上記フッ素樹脂粒子と共に、フッ
化黒鉛、炭化珪素、セラミック、窒化金属、金属酸化物
などの粒子や繊維を共析させることもできる。また、ニ
ッケル又はニッケル合金複合めっき皮膜層3を形成した
後、特にNi−P複合めっき皮膜の場合は、これを熱処
理することも可能であるが、この場合フッ素樹脂粒子の
融点が低いので、200〜350℃、特に250〜32
0℃程度の比較的低い温度で0.5〜3時間、特に0.
5〜1時間熱処理することが好ましい。
In this nickel or nickel alloy composite plating film layer 3, particles or fibers of fluorinated graphite, silicon carbide, ceramics, metal nitrides, metal oxides, etc. may be codeposited together with the above-mentioned fluororesin particles. it can. Further, after forming the nickel or nickel alloy composite plating film layer 3, particularly in the case of Ni-P composite plating film, it is possible to heat-treat this, but in this case, since the melting point of the fluororesin particles is low, 200 ~ 350 ° C, especially 250-32
0.5 to 3 hours at a relatively low temperature of about 0 ° C., in particular 0.
It is preferable to perform heat treatment for 5 to 1 hour.

【0018】なおまた、上記ニッケル−リン合金めっき
皮膜層2及びニッケル又はニッケル合金複合めっき層3
を形成するめっき浴及びめっき条件は、ニッケル−リン
合金めっきやニッケル又はニッケル合金複合めっきを行
う場合の通常のめっき浴及び条件とすることができる。
The nickel-phosphorus alloy plating film layer 2 and the nickel or nickel alloy composite plating layer 3 are also used.
The plating bath and the plating conditions for forming the can be the usual plating bath and conditions for nickel-phosphorus alloy plating or nickel or nickel alloy composite plating.

【0019】[0019]

【実施例】以下、実施例を示して本発明を具体的に説明
するが、本発明は下記実施例に制限されるものではな
い。表面に浸炭窒化層が形成されたスチール製の素材を
市販の無電解ニッケル−リンめっき液(上村工業(株)
社製ニムデンSX)に浸漬して、その素材表面に厚さ1
0μm、リン含有量9%の無電解Ni−Pめっき皮膜を
形成した後、素材ごと加熱炉内に収容し、大気雰囲気
中、300℃で60分熱処理した。
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to the following examples. Commercially available electroless nickel-phosphorus plating solution made of steel with a carbonitrided layer formed on its surface (Uemura Industry Co., Ltd.)
Nimden SX manufactured by the company), thickness of 1 on the surface of the material
After forming an electroless Ni-P plating film having a thickness of 0 μm and a phosphorus content of 9%, each material was placed in a heating furnace and heat-treated at 300 ° C. for 60 minutes in an air atmosphere.

【0020】この素材を更に市販の無電解ニッケル−リ
ン/フッ素樹脂複合めっき液(上村工業(株)社製ニム
フロン)に浸漬して、上記無電解Ni−Pめっき皮膜上
に厚さ10μm、リン含有量9%、フッ素樹脂粒子(P
TFE)共析量約7重量%の無電解Ni−P/PTFE
複合めっき皮膜を形成した後、再び加熱炉内に仕込ん
で、大気雰囲気中、300℃で60分間熱処理した。
This material was further dipped in a commercially available electroless nickel-phosphorus / fluorine resin composite plating solution (Nimflon manufactured by Uemura Kogyo Co., Ltd.) to form a phosphorus film having a thickness of 10 μm on the electroless Ni-P plating film. 9% content, fluororesin particles (P
TFE) Electroless Ni-P / PTFE with an eutectoid amount of about 7% by weight
After forming the composite plating film, it was charged again in the heating furnace and heat-treated at 300 ° C. for 60 minutes in the air atmosphere.

【0021】得られた無電解Ni−P/PTFEめっき
皮膜の素材との密着性を下記方法により評価したとこ
ろ、素材表面に直接無電解Ni−P/PTFEめっき皮
膜を形成した場合に比べて極めて良好な密着性を有する
ことが確認された。また、下記方法により、皮膜全体の
ビッカース硬度を評価したところ、直接無電解Ni−P
/PTFEめっき皮膜を形成した従来のものに比べてH
v300のものが約Hv650にまで向上することが確
認された。
The adhesion of the obtained electroless Ni-P / PTFE plating film to the material was evaluated by the following method, and was found to be extremely higher than that when the electroless Ni-P / PTFE plating film was formed directly on the surface of the material. It was confirmed to have good adhesion. Moreover, when the Vickers hardness of the entire coating was evaluated by the following method, it was found that direct electroless Ni-P
/ H compared to the conventional one with a PTFE plating film
It was confirmed that v300 was improved to about Hv650.

【0022】密着性評価方法 JIS H8615に準じる折り曲げ試験ビッカース硬度評価方法 JIS H8615に準じる微小硬度測定試験 荷重 50g、荷重保持時間 15秒 Adhesion evaluation method Bending test according to JIS H8615 Vickers hardness evaluation method Micro hardness measurement test according to JIS H8615 Load 50 g, load holding time 15 seconds

【0023】[0023]

【発明の効果】以上説明したように、本発明の表面処理
方法によれば、素材の表面に機械的強度が高く、耐摩耗
性に優れためっき皮膜を密着性よく形成することができ
る。
As described above, according to the surface treatment method of the present invention, a plating film having high mechanical strength and excellent wear resistance can be formed on the surface of the material with good adhesion.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の表面処理方法により得られためっき皮
膜を示す断面図である。
FIG. 1 is a cross-sectional view showing a plating film obtained by a surface treatment method of the present invention.

【符号の説明】[Explanation of symbols]

1 素材 2 ニッケル−リン合金めっき皮膜 3 ニッケル又はニッケル合金複合めっき皮膜 4 ニッケル−リン/素材拡散層 1 Material 2 Nickel-Phosphorus Alloy Plating Film 3 Nickel or Nickel Alloy Composite Plating Film 4 Nickel-Phosphorus / Material Diffusion Layer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 千葉 格 大阪府枚方市出口1丁目5番1号 上村工 業株式会社中央研究所内 (72)発明者 岡田 益雄 大阪府守口市梶町3丁目35番23号 株式会 社サミックス内 (72)発明者 松波 秀明 大阪府守口市梶町3丁目35番23号 株式会 社サミックス内 (72)発明者 綾目 正彦 大阪府守口市梶町3丁目35番23号 株式会 社サミックス内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor, Chiba Chiba, 1-5-1, Exit, Hirakata, Osaka Prefecture, Central Research Laboratory, Uemura Industrial Co., Ltd. No.23 In stock company Samix (72) Inventor Hideaki Matsunami 3-35-3 Kajimachi, Moriguchi City, Osaka Prefecture Stock number 23 in stock company Samix (72) Masahiko Ayame 3-35-23 Kajimachi, Moriguchi City, Osaka Prefecture No. Stock Company Samix

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 素材表面にニッケル−リン合金めっき皮
膜を形成し、該ニッケル−リンめっき皮膜を熱処理した
後、この上にニッケル又はニッケル合金めっき皮膜中に
フッ素樹脂粒子が共析した複合めっき皮膜を形成するこ
とを特徴とする表面処理方法。
1. A composite plating film in which a nickel-phosphorus alloy plating film is formed on a surface of a material, the nickel-phosphorus plating film is heat-treated, and then fluororesin particles are co-deposited in the nickel or nickel alloy plating film. A surface treatment method, which comprises:
JP03351552A 1991-12-12 1991-12-12 Surface treatment method Expired - Fee Related JP3101669B2 (en)

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JP03351552A JP3101669B2 (en) 1991-12-12 1991-12-12 Surface treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03351552A JP3101669B2 (en) 1991-12-12 1991-12-12 Surface treatment method

Publications (2)

Publication Number Publication Date
JPH05163582A true JPH05163582A (en) 1993-06-29
JP3101669B2 JP3101669B2 (en) 2000-10-23

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WO2004006977A3 (en) * 2002-07-10 2004-04-08 Univ Dundee Coatings
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US7729639B2 (en) 2006-03-20 2010-06-01 Sharp Kabushiki Kaisha Charging apparatus and image forming apparatus
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CN106958013A (en) * 2017-03-24 2017-07-18 东北电力大学 A kind of Electroless Plating Ni P PTFE composite deposite preparation technologies
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US7267150B2 (en) 2000-02-21 2007-09-11 Fujifilm Corporation Method of and apparatus for manufacturing instant photographic film units
WO2004006977A3 (en) * 2002-07-10 2004-04-08 Univ Dundee Coatings
US8247064B2 (en) 2002-07-10 2012-08-21 The University Court Of The University Of Dundee Coatings
US7302211B2 (en) 2004-09-17 2007-11-27 Sharp Kabushiki Kaisha Charging apparatus and image forming apparatus with plated electrode
JP2006132732A (en) * 2004-11-09 2006-05-25 Akutowan:Kk Bearing component made of resin and its manufacturing method
JP2007256397A (en) * 2006-03-20 2007-10-04 Sharp Corp Electrifying device and image forming apparatus
US7729639B2 (en) 2006-03-20 2010-06-01 Sharp Kabushiki Kaisha Charging apparatus and image forming apparatus
JP2007256396A (en) * 2006-03-20 2007-10-04 Sharp Corp Electrifying device and image forming apparatus
JP2009265192A (en) * 2008-04-22 2009-11-12 Sharp Corp Charging device and image forming apparatus
JP4522464B2 (en) * 2008-04-22 2010-08-11 シャープ株式会社 Charging device and image forming apparatus
AT511572A1 (en) * 2011-06-01 2012-12-15 Ke Kelit Kunststoffwerk Gmbh COATING INCLUDING NI-P-PTFE IN COMBINATION WITH A POLYMERIC POLYMER
AT511572B1 (en) * 2011-06-01 2013-02-15 Ke Kelit Kunststoffwerk Gmbh COATING INCLUDING NI-P-PTFE IN COMBINATION WITH A POLYMERIC POLYMER
CN106958013A (en) * 2017-03-24 2017-07-18 东北电力大学 A kind of Electroless Plating Ni P PTFE composite deposite preparation technologies
WO2019110425A1 (en) * 2017-12-08 2019-06-13 Robert Bosch Gmbh Electric motor
JP2019218608A (en) * 2018-06-20 2019-12-26 日本製鉄株式会社 Die for press of titanium plate, and press molding method of titanium plate

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