JPH05136008A - Solid electrolytic capacitor - Google Patents
Solid electrolytic capacitorInfo
- Publication number
- JPH05136008A JPH05136008A JP29283191A JP29283191A JPH05136008A JP H05136008 A JPH05136008 A JP H05136008A JP 29283191 A JP29283191 A JP 29283191A JP 29283191 A JP29283191 A JP 29283191A JP H05136008 A JPH05136008 A JP H05136008A
- Authority
- JP
- Japan
- Prior art keywords
- valve action
- metal wire
- insulating member
- solid electrolytic
- valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は固体電解コンデンサに関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid electrolytic capacitor.
【0002】[0002]
【従来の技術】近年、部品業界においては、電気製品の
軽薄短小化,高信頼性化の要求が高まっており、それに
使用される電子部品であるタンタル固体電解コンデンサ
においても、基板実装時の熱ストレスに対してより高信
頼性化の要求が高まっている。2. Description of the Related Art In recent years, in the parts industry, there has been an increasing demand for light, thin, short, compact, and highly reliable electric products, and even tantalum solid electrolytic capacitors, which are electronic parts used in such products, have the heat generated during board mounting. The demand for higher reliability against stress is increasing.
【0003】以下、従来のタンタル固体電解コンデン
サ、特にチップ形タンタル固体電解コンデンサについて
図4にもとづいて説明する。図4において、1は電極体
で、この電極体1はタンタルよりなる弁作用金属粉末に
タンタルよりなる弁作用金属線2を植設して成形し、か
つ焼結することにより構成している。そして前記弁作用
金属線2は陽極引出し線となるもので、この弁作用金属
線2には半導体母液の這い上がりを防止するために撥水
性を有する絶縁部材3を挿入している。また前記電極体
1の表面には電解液中における電気化学反応(陽極酸
化)により誘電体層を形成し、その後、この誘電体層の
上に熱分解により固体電解質である二酸化マンガンから
なる半導体層を形成し、そしてこの半導体層の上にカー
ボン層,銀塗料層よりなる陰極層を形成している。そし
てまた前記弁作用金属線2には外部に導出される陽極引
出し端子4を接続し、かつ陰極層には外部に導出される
陰極引出し端子5を接続し、そしてこの陽極引出し端子
4と陰極引出し端子5の一部が露出するように前記電極
体1の外側を外装樹脂6でモールド成型し、その後、前
記陽極引出し端子4と陰極引出し端子5を外装樹脂6の
両側面および底面に沿って折り曲げることにより、チッ
プ形タンタル固体電解コンデンサを構成していた。A conventional tantalum solid electrolytic capacitor, in particular, a chip type tantalum solid electrolytic capacitor will be described below with reference to FIG. In FIG. 4, reference numeral 1 denotes an electrode body, and this electrode body 1 is constituted by implanting a valve action metal wire 2 made of tantalum in a valve action metal powder made of tantalum, molding it, and sintering it. The valve action metal wire 2 serves as an anode lead wire, and a water repellent insulating member 3 is inserted in the valve action metal wire 2 in order to prevent the semiconductor mother liquor from creeping up. Further, a dielectric layer is formed on the surface of the electrode body 1 by an electrochemical reaction (anodic oxidation) in an electrolytic solution, and then a semiconductor layer made of manganese dioxide which is a solid electrolyte by thermal decomposition on the dielectric layer. And a cathode layer composed of a carbon layer and a silver coating layer is formed on the semiconductor layer. Also, the valve action metal wire 2 is connected to an anode lead-out terminal 4 led out to the outside, and the cathode layer is connected to a cathode lead-out terminal 5 led out to the outside, and the anode lead-out terminal 4 and the cathode lead-out terminal are connected. The outside of the electrode body 1 is molded with the exterior resin 6 so that a part of the terminal 5 is exposed, and then the anode lead terminal 4 and the cathode lead terminal 5 are bent along both side surfaces and the bottom surface of the exterior resin 6. As a result, a chip-type tantalum solid electrolytic capacitor was constructed.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、上記従
来の構成における半導体母液の這い上がりを防止するた
めの撥水性を有する絶縁部材3は、弁作用金属線2に単
に挿入しているだけであるため、電極体1の表面に誘電
体層や二酸化マンガンからなる半導体層を形成する際
に、撥水性を有する絶縁部材3が浮き上がってしまって
弁作用金属線2と電極体1との密着が悪くなり、これに
より、半導体母液が弁作用金属線2の陽極引出し端子4
側へ這い上がるという現象が起こってしまう場合があっ
た。そしてこのままの状態で組立を行うと、漏れ電流不
良が発生したり、最悪の場合は短絡状態になってコンデ
ンサとしての機能を果たさなくなってしまうという問題
点を有していた。However, the insulating member 3 having water repellency for preventing the rising of the semiconductor mother liquor in the above-mentioned conventional structure is simply inserted into the valve action metal wire 2. When the dielectric layer or the semiconductor layer made of manganese dioxide is formed on the surface of the electrode body 1, the insulating member 3 having water repellency is lifted and the adhesion between the valve metal wire 2 and the electrode body 1 is deteriorated. As a result, the semiconductor mother liquor causes the anode lead-out terminal 4 of the valve action metal wire 2 to
The phenomenon of climbing up to the side sometimes occurred. If the assembling is performed in this state, there is a problem that a leakage current failure occurs or, in the worst case, a short circuit occurs and the capacitor does not function.
【0005】本発明はこのような問題点を解決するもの
で、弁作用金属線への半導体母液の這い上がりを確実に
防止して、製造時の歩留りを向上させることができると
ともに、ユーザーでの実使用時の信頼性も著しく向上さ
せることができる固体電解コンデンサを提供することを
目的とするものである。The present invention solves such a problem, and it is possible to surely prevent the semiconductor mother liquor from creeping up to the valve action metal wire to improve the yield at the time of manufacturing, and at the same time for the user. It is an object of the present invention to provide a solid electrolytic capacitor that can significantly improve reliability during actual use.
【0006】[0006]
【課題を解決するための手段】上記目的を達成するため
に本発明の固体電解コンデンサは、弁作用金属粉末に弁
作用金属線を植設して成形し、かつ焼結してなる電極体
を備え、この電極体の前記弁作用金属線を植設した根元
部に、撥水性を有する絶縁部材を前記弁作用金属線に貫
通させた状態で固着し、さらに前記電極体の表面に誘電
体層,半導体層,陰極層を順次形成したものである。In order to achieve the above object, a solid electrolytic capacitor of the present invention comprises an electrode body obtained by implanting a valve metal wire in a valve metal powder, molding the metal wire, and sintering the metal wire. The valve body is provided with an insulating member having water repellency fixed to the root of the electrode body where the valve metal line is implanted, and a dielectric layer is further formed on the surface of the electrode body. , A semiconductor layer and a cathode layer are sequentially formed.
【0007】[0007]
【作用】上記構成によれば、弁作用金属粉末に弁作用金
属線を植設して成形し、かつ焼結してなる電極体の前記
弁作用金属線を植設した根元部に、撥水性を有する絶縁
部材を前記弁作用金属線に貫通させた状態で固着してい
るため、電極体の表面に誘電体層,半導体層を形成する
際に、撥水性を有する絶縁部材が浮き上がるということ
はなくなり、その結果、半導体母液が弁作用金属線の陽
極引出し端子側へ這い上がるのを確実に防止することが
できるため、製造時の歩留りも向上し、さらには漏れ電
流不良の発生もなくなるため、ユーザーでの実使用時の
信頼性も著しく向上させることができるものである。According to the above construction, a valve-repellent metal powder is planted with a valve-acting metal wire, molded, and sintered. Since the insulating member having is fixed in a state of penetrating the valve action metal wire, it means that the insulating member having water repellency floats up when the dielectric layer and the semiconductor layer are formed on the surface of the electrode body. As a result, since it is possible to reliably prevent the semiconductor mother liquor from creeping up to the anode lead terminal side of the valve action metal wire, the yield at the time of manufacturing is improved, and furthermore, the occurrence of leakage current defects is eliminated. The reliability when actually used by the user can be significantly improved.
【0008】[0008]
【実施例】以下、本発明の一実施例を添付図面にもとづ
いて説明する。図1において、11は電極体で、この電
極体11は弁作用金属であるタンタル金属粉末にタンタ
ルよりなる弁作用金属線12を植設して成形し、かつ焼
結することにより構成している。13は撥水性を有する
絶縁部材で、この絶縁部材13は前記電極体11の弁作
用金属線12を植設した根元部に前記弁作用金属線12
に貫通させた状態で耐熱性,耐薬品性に優れているエポ
キシ系の接着剤14により固着している。また前記電極
体11の表面には電解液中における電気化学反応(陽極
酸化)により誘電体層を形成し、その後、この誘電体層
の上に熱分解により固体電解質である二酸化マンガンか
らなる半導体層を形成し、そしてこの半導体層の上には
カーボン層,銀塗料層よりなる陰極層を形成している。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the accompanying drawings. In FIG. 1, reference numeral 11 denotes an electrode body, and this electrode body 11 is constituted by implanting a valve action metal wire 12 made of tantalum in a tantalum metal powder which is a valve action metal, molding and sintering it. . Reference numeral 13 denotes an insulating member having water repellency. This insulating member 13 has the valve action metal wire 12 at the root of the electrode body 11 in which the valve action metal wire 12 is implanted.
It is fixed by an epoxy adhesive 14 which is excellent in heat resistance and chemical resistance in a state of being penetrated through. Further, a dielectric layer is formed on the surface of the electrode body 11 by an electrochemical reaction (anodic oxidation) in an electrolytic solution, and then a semiconductor layer made of manganese dioxide which is a solid electrolyte by thermal decomposition is formed on the dielectric layer. And a cathode layer composed of a carbon layer and a silver coating layer is formed on the semiconductor layer.
【0009】また前記弁作用金属線12には外部に導出
される陽極引出し端子15を接続し、かつ陰極層には外
部に導出される陰極引出し端子16を接続し、そしてこ
の陽極引出し端子15と陰極引出し端子16の一部が露
出するように前記電極体11の外側を外装樹脂17でモ
ールド成型し、その後、前記陽極引出し端子15と陰極
引出し端子16を外装樹脂17の両側面および底面に沿
って折り曲げることにより、チップ形タンタル固体電解
コンデンサを構成している。The valve action metal wire 12 is connected to an anode lead-out terminal 15 led out to the outside, and the cathode layer is connected to a cathode lead-out terminal 16 led out to the outside. The outside of the electrode body 11 is molded with the exterior resin 17 so that a part of the cathode extraction terminal 16 is exposed, and then the anode extraction terminal 15 and the cathode extraction terminal 16 are formed along both side surfaces and the bottom surface of the exterior resin 17. The chip-type tantalum solid electrolytic capacitor is constructed by bending it.
【0010】図2は撥水性を有する絶縁部材13の固着
方法を示したもので、まず、金属板18に電極体11を
溶接等で整列固定する時に、撥水性を有する絶縁部材1
3を電極体11の弁作用金属線12に貫通させるととも
に、絶縁部材13の上面にエポキシ系の接着剤14を塗
布する。この後、約125℃の熱風乾燥炉内に10分〜
15分入れることにより、前記エポキシ系の接着剤14
を乾燥硬化させて、撥水性を有する絶縁部材13を電極
体11の弁作用金属線12を植設した根元部に固着す
る。そしてこの後、電極体11の表面に誘電体層,二酸
化マンガンからなる半導体層、カーボン層と銀塗料層よ
りなる陰極層を順次形成する。FIG. 2 shows a method of fixing the water-repellent insulating member 13. First, when the electrode body 11 is aligned and fixed to the metal plate 18 by welding or the like, the water-repellent insulating member 1 is formed.
3 is penetrated through the valve action metal wire 12 of the electrode body 11, and an epoxy adhesive 14 is applied to the upper surface of the insulating member 13. Then, in a hot air drying oven at about 125 ° C for 10 minutes
The epoxy adhesive 14 can be put in for 15 minutes.
Is dried and cured, and the water-repellent insulating member 13 is fixed to the root portion of the electrode body 11 in which the valve metal wire 12 is implanted. After that, a dielectric layer, a semiconductor layer made of manganese dioxide, a cathode layer made of a carbon layer and a silver coating layer are sequentially formed on the surface of the electrode body 11.
【0011】(表1)は本発明の実施例のように絶縁部
材13を弁作用金属線12に固着したものと、従来例の
ように絶縁部材3を弁作用金属線2に固着していないも
のとの、絶縁部材の浮き上がり不良個数の比較を示した
ものである。Table 1 shows that the insulating member 13 is fixed to the valve action metal wire 12 as in the embodiment of the present invention and that the insulating member 3 is not fixed to the valve action metal wire 2 as in the conventional example. 3 shows a comparison of the number of defective rising members of the insulating member.
【0012】[0012]
【表1】 [Table 1]
【0013】この(表1)から明らかなように、本発明
の実施例においては、絶縁部材13を弁作用金属線12
に固着しているため、絶縁部材13の浮き上がり不良と
いうことはなくなるものである。As is clear from this (Table 1), in the embodiment of the present invention, the insulating member 13 is connected to the valve action metal wire 12.
Since it is adhered to the insulating member 13, the rising defect of the insulating member 13 can be eliminated.
【0014】(表2)は本発明の実施例のように半導体
母液の弁作用金属線への這い上がりを防止したものと、
従来例のように絶縁部材を弁作用金属線に固着していな
いものとの、組立完成後の初期の漏れ電流不良個数の比
較を示したものである。Table 2 shows that semiconductor mother liquor was prevented from creeping up to the valve action metal wire as in the embodiment of the present invention.
FIG. 5 shows a comparison of the number of defective leakage currents in the initial stage after assembly is completed with a case where the insulating member is not fixed to the valve action metal wire as in the conventional example.
【0015】[0015]
【表2】 [Table 2]
【0016】この(表2)から明らかなように、本発明
の実施例のものは、従来例に比べ、組立完成後の初期の
漏れ電流不良率を大幅に低減することができるものであ
る。As is clear from this (Table 2), in the embodiment of the present invention, the initial leakage current defective rate after the assembly is completed can be greatly reduced as compared with the conventional example.
【0017】図3は本発明の実施例における固体電解コ
ンデンサと、従来の固体電解コンデンサについて、組立
後と完成後の漏れ電流比較および260℃の半田槽で1
0秒間ディップしたときの漏れ電流比較を示したもので
ある。FIG. 3 is a comparison of the leakage currents of the solid electrolytic capacitor in the embodiment of the present invention and the conventional solid electrolytic capacitor after assembling and after completion and in the solder bath at 260 ° C.
It shows the leakage current comparison when dipping for 0 seconds.
【0018】この図3からも明らかなように、本発明の
実施例のものは、従来例に比べ、漏れ電流を少なくする
ことができるものである。As is clear from FIG. 3, the embodiment of the present invention can reduce the leakage current as compared with the conventional example.
【0019】[0019]
【発明の効果】以上のように本発明の固体電解コンデン
サは、弁作用金属粉末に弁作用金属線を植設して成形
し、かつ焼結してなる電極体の前記弁作用金属線を植設
した根元部に、撥水性を有する絶縁部材を前記弁作用金
属線に貫通させた状態で固着しているため、電極体の表
面に誘電体層,半導体層を形成する際に、撥水性を有す
る絶縁部材が浮き上がるということはなくなり、その結
果、半導体母液が弁作用金属線の陽極引出し端子側へ這
い上がるのを確実に防止することができるため、製造時
の歩留りも向上し、さらには漏れ電流不良の発生もなく
なるため、ユーザーでの実使用時の信頼性も著しく向上
させることができるものである。As described above, according to the solid electrolytic capacitor of the present invention, the valve action metal wire of the electrode body formed by implanting the valve action metal wire in the valve action metal powder and molding and sintering is implanted. Since the insulating member having water repellency is fixed to the provided root portion while penetrating the valve action metal wire, water repellency can be prevented when forming the dielectric layer and the semiconductor layer on the surface of the electrode body. Since the insulating member that it has does not float up, as a result, it is possible to reliably prevent the semiconductor mother liquor from creeping up to the anode lead terminal side of the valve action metal wire, improving the manufacturing yield and further preventing leakage. Since the occurrence of current failure is eliminated, the reliability of the user during actual use can be significantly improved.
【図1】本発明の一実施例を示すチップ形タンタル固体
電解コンデンサの断面図FIG. 1 is a sectional view of a chip-type tantalum solid electrolytic capacitor showing an embodiment of the present invention.
【図2】同コンデンサにおける撥水性を有する絶縁部材
の固着方法を示す平面図FIG. 2 is a plan view showing a method of fixing an insulating member having water repellency in the same capacitor.
【図3】本発明の実施例における固体電解コンデンサ
と、従来の固体電解コンデンサの漏れ電流の比較を示す
特性図FIG. 3 is a characteristic diagram showing a comparison of leakage current between a solid electrolytic capacitor according to an embodiment of the present invention and a conventional solid electrolytic capacitor.
【図4】従来のチップ形タンタル固体電解コンデンサの
断面図FIG. 4 is a sectional view of a conventional chip type tantalum solid electrolytic capacitor.
【符号の説明】 11 電極体 12 弁作用金属線 13 絶縁部材 14 エポキシ系の接着剤[Explanation of Codes] 11 Electrode Body 12 Valve Metal Wire 13 Insulation Member 14 Epoxy Adhesive
Claims (2)
成形し、かつ焼結してなる電極体を備え、この電極体の
前記弁作用金属線を植設した根元部に、撥水性を有する
絶縁部材を前記弁作用金属線に貫通させた状態で固着
し、さらに前記電極体の表面に誘電体層,半導体層,陰
極層を順次形成してなる固体電解コンデンサ。1. A valve-action metal powder is provided with an electrode body formed by implanting and molding a valve-action metal wire, and the electrode body is provided with a sintered body. A solid electrolytic capacitor in which an insulating member having water repellency is fixed in a state of penetrating the valve action metal wire, and a dielectric layer, a semiconductor layer, and a cathode layer are sequentially formed on the surface of the electrode body.
を有する絶縁部材を弁作用金属線に貫通させ、かつ絶縁
部材にエポキシ系の接着剤を塗布し、この接着剤を硬化
させることにより行うようにした請求項1記載の固体電
解コンデンサ。2. The fixing of the water-repellent insulating member is performed by penetrating the water-repellent insulating member through the valve metal wire, applying an epoxy adhesive to the insulating member, and curing the adhesive. The solid electrolytic capacitor according to claim 1, wherein
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29283191A JPH05136008A (en) | 1991-11-08 | 1991-11-08 | Solid electrolytic capacitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29283191A JPH05136008A (en) | 1991-11-08 | 1991-11-08 | Solid electrolytic capacitor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05136008A true JPH05136008A (en) | 1993-06-01 |
Family
ID=17786920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29283191A Pending JPH05136008A (en) | 1991-11-08 | 1991-11-08 | Solid electrolytic capacitor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05136008A (en) |
-
1991
- 1991-11-08 JP JP29283191A patent/JPH05136008A/en active Pending
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