JPH05121486A - Tab type semiconductor device and manufacture thereof - Google Patents

Tab type semiconductor device and manufacture thereof

Info

Publication number
JPH05121486A
JPH05121486A JP27921791A JP27921791A JPH05121486A JP H05121486 A JPH05121486 A JP H05121486A JP 27921791 A JP27921791 A JP 27921791A JP 27921791 A JP27921791 A JP 27921791A JP H05121486 A JPH05121486 A JP H05121486A
Authority
JP
Japan
Prior art keywords
semiconductor device
tab
type semiconductor
insulating film
tab type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27921791A
Other languages
Japanese (ja)
Inventor
Hirotaka Ashihara
弘高 芦原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP27921791A priority Critical patent/JPH05121486A/en
Publication of JPH05121486A publication Critical patent/JPH05121486A/en
Pending legal-status Critical Current

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  • Wire Bonding (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

PURPOSE:To provide a TAB type semiconductor device and an apparatus for manufacturing the same in which peeling or damage of electrically connecting parts of inner leads to a semiconductor pellet is prevented by partly aiding a bending properties of an insulating film. CONSTITUTION:Metal foil leads 3 are laminated and formed on an insulating film 18 in which a plurality of through holes 7 are opened at a predetermined pitch, and inner leads 3a of the leads 3 are extended in the holes 7 in a TAB tape. The leads 3a of the tape are electrically connected to bump electrodes 4 of a semiconductor pellet 1 in a TAB type semiconductor 17a. Bending properties aiding means 18a is provided on a boundary region of each hole 7.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、TABテープのインナ
ーリードと半導体ペレットとをボンディングした構造の
TAB式半導体装置及びその製造装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a TAB type semiconductor device having a structure in which an inner lead of a TAB tape and a semiconductor pellet are bonded together, and a manufacturing apparatus thereof.

【0002】[0002]

【従来の技術】TAB型半導体装置は、例えばフレキシ
ブルなフィルム状プリント基板等に組み付けられるカメ
ラ用IC等に用いられ、その一例を図4及び図5を参照
して次に示すと、(1)は半導体ペレット(以下、ペレ
ットと称す。)、(2)は枠状フィルム、(3)は金属
箔リードである。そして、金属箔リード(3)を枠状フ
ィルム(2)の内側から外側に向って放射状に配置する
と共に、その中間部分を枠状フィルム(2)に接着し、
且つ、ペレット(1)の表面外周縁に金メッキにより形
成したバンプ電極(4)…とインナーリード(3a)と
を熱圧着してボンディングすることによりペレット
(1)を枠状フィルム(2)の内側に支持する。
2. Description of the Related Art A TAB type semiconductor device is used, for example, in a camera IC mounted on a flexible film-like printed circuit board or the like. One example of the TAB type semiconductor device is shown in FIG. 4 and FIG. Is a semiconductor pellet (hereinafter referred to as a pellet), (2) is a frame film, and (3) is a metal foil lead. Then, the metal foil leads (3) are radially arranged from the inner side to the outer side of the frame-shaped film (2), and an intermediate portion thereof is adhered to the frame-shaped film (2),
Further, the pellet electrodes (4) formed by gold plating on the outer peripheral edge of the surface of the pellet (1) and the inner leads (3a) are thermocompression bonded to each other to bond the pellet (1) to the inside of the frame film (2). To support.

【0003】上記TAB型半導体装置(5)は、図6に
示すように、TAB式半導体装置(6)を所定のピッチ
と形状で切断したもので、TAB式半導体装置(6)
は、透孔(7)…と窓開け部(8)…とスプロケット穴
(9)…とを有する長尺な絶縁性フィルム(10)の表
面に所定パターンの金属箔リード(3)を被着・形成す
ると共に、透孔(7)内においてバンプ電極(4)…と
インナーリード(3a)とをボンディングすることによ
りペレット(1)を透孔(7)内に支持してなる。
As shown in FIG. 6, the TAB type semiconductor device (5) is a TAB type semiconductor device (6) cut at a predetermined pitch and shape.
Is coated with a metal foil lead (3) having a predetermined pattern on the surface of a long insulating film (10) having through holes (7), window openings (8), and sprocket holes (9). The pellet (1) is supported in the through hole (7) by forming and forming bonding of the bump electrodes (4) ... And the inner lead (3a) in the through hole (7).

【0004】上記TAB式半導体装置(6)を組立る
際、図7に示すインナーリードボンダ(11)を用いて
おり、図において(12)はテープガイド、(13)は
ボンディングステージ、(14)はTABテープ、(1
5a)(15b)はスプールである。上記テープガイド
(12)は長尺な板金の両端を折り曲げ成形し、中間部
に窓孔(16)を穿設したもので、且つ、図示しない
が、裏面に後述するTABテープ(14)の金属箔リー
ド(3)が嵌まる溝部を有する。ボンディングステージ
(13)はテープガイド(12)の下方に昇降動自在に
配置され、ペレット(1)を位置決め・載置し、且つ、
加熱手段を内蔵してマウント前にペレット(1)を下地
加熱する。又、テープガイド(12)の窓孔(16)の
上方にボンディングステージ(13)に対向して加熱手
段内蔵のボンディングツール(図示せず)を配置する。
TABテープ(14)は、図6に示すように、長尺な絶
縁性フィルム(10)上に金属箔リード(3)を被着し
て形成したものである(尚、透孔(7)(8)は図7で
は省略)。スプール(15a)(15b)はボンディン
グポジションの前後に配され、ボンディング前のTAB
テープ(14)を順次、繰り出してボンディングポジシ
ョンへ送ると共に、ボンディング後にスプール(15
b)にて巻き取って行く。この時、、図8に示すよう
に、予め絶縁性フィルム(10)の両側端部でスプロケ
ット穴(9)…とは異なる位置とピッチでエンボスによ
るセパレータ(9a)を設けておき、ペレット同士が接
触しないようにして巻き取って行く。
When assembling the TAB type semiconductor device (6), an inner lead bonder (11) shown in FIG. 7 is used. In the figure, (12) is a tape guide, (13) is a bonding stage, and (14). Is the TAB tape, (1
5a) and (15b) are spools. The tape guide (12) is formed by bending both ends of a long sheet metal and forming a window hole (16) in the middle part thereof, and, although not shown, the back surface of the TAB tape (14) is made of metal. It has a groove into which the foil lead (3) fits. The bonding stage (13) is arranged below the tape guide (12) so as to be movable up and down, to position and place the pellet (1), and
The pellet (1) is heated as a base by incorporating a heating means before mounting. Further, a bonding tool (not shown) having a built-in heating means is arranged above the window hole (16) of the tape guide (12) so as to face the bonding stage (13).
As shown in FIG. 6, the TAB tape (14) is formed by adhering a metal foil lead (3) on a long insulating film (10) (the through hole (7) ( 8) is omitted in FIG. 7.) The spools (15a) and (15b) are arranged before and after the bonding position, and the TAB before bonding is provided.
The tape (14) is sequentially fed out and sent to the bonding position, and after bonding, the spool (15
Take it up in b). At this time, as shown in FIG. 8, separators (9a) by embossing are provided in advance at positions and pitches different from those of the sprocket holes (9) ... Take it up without touching it.

【0005】上記インナーリードボンダ(11)におい
て、まずスプール(15a)に巻き取ったTABテープ
(14)をテープガイド(12)に沿ってボンディング
ポジションへ送り、その透孔(7)をテープガイド(1
2)の窓孔(16)に対応させて位置決めする。そし
て、ペレット(1)をボンディングステージ(13)上
に位置決め載置して下地加熱した後、ペレット(1)の
バンプ電極(4)…を各金属箔リード(3)…のインナ
ーリード(3a)に当接させる。そこで、上記ボンディ
ングツールを加熱させた状態で下降させ、各バンプ電極
(4)…と各金属箔リード(3)…のインナーリード
(3a)…とをボンディングすると、TABテープ(1
4)にペレット(1)を電気的接続したTAB式半導体
装置(6)を得て次の検査、樹脂被覆、及び樹脂硬化の
各工程に送る。この時、上記ボンディング工程を含めて
ペレット表面の樹脂被覆工程やその硬化工程等、各作業
工程が変わる毎にその始めと終わりに一対のスプール
(15a)(15b)の取り付けと取り外しを繰り返
し、スプール単位で各工程毎に独立して作業を行なう。
In the inner lead bonder (11), the TAB tape (14) wound on the spool (15a) is first sent to the bonding position along the tape guide (12), and the through hole (7) is passed through the tape guide (12). 1
Position it so as to correspond to the window hole (16) of 2). Then, after positioning the pellet (1) on the bonding stage (13) and heating the base, the bump electrodes (4) of the pellet (1) are replaced with the inner leads (3a) of the metal foil leads (3). Abut. Therefore, the bonding tool is lowered while being heated, and the bump electrodes (4) ... And the inner leads (3a) of the metal foil leads (3) ...
A TAB type semiconductor device (6) in which the pellet (1) is electrically connected to (4) is obtained and sent to the following steps of inspection, resin coating and resin curing. At this time, every time when each working process such as the resin coating process on the pellet surface including the bonding process and the hardening process thereof is changed, the pair of spools (15a) and (15b) are repeatedly attached and removed at the beginning and the end of the working process. Work independently for each process in units.

【0006】[0006]

【発明が解決しようとする課題】解決しようとする課題
は、ボンディング後のTAB式半導体装置(6)をスプ
ール(15b)に巻き取る際、図8に示すように、TA
Bテープ(14)はスプールのハブ径に対応して湾曲す
るため、その径が小さいと、各バンプ電極(4)…とイ
ンナーリード(3a)…とのボンディング部分におい
て、特にインナーリード(3a)…に上方の剥離方向に
応力が加わって上記ボンディング部分が剥離し易くなる
点である。そこで、ハブ径を大きくして湾曲量を小さく
すると、巻き取り量が減少し、更にスプール単位で作業
を行なっているため、スプールの交換頻度が高くなり、
作業性の低下を招く。又、ボンディング時においてもス
プール(15a)(15b)からボンディングポジショ
ンまで傾斜しているため、その中間位置にあるテープガ
イド(12)の途中を湾曲させざるを得ず、その位置で
上記同様に各バンプ電極(4)…とインナーリード(3
a)…との接続部分が剥離し易くなる。
The problem to be solved by the present invention is, as shown in FIG. 8, when the TAB type semiconductor device (6) after bonding is wound on the spool (15b), as shown in FIG.
Since the B tape (14) is curved corresponding to the hub diameter of the spool, if the diameter is small, the inner lead (3a), in particular, the bonding portion between the bump electrodes (4) ... And the inner leads (3a). The stress is applied to the upper side in the peeling direction, and the above-mentioned bonding portion is easily peeled off. Therefore, if you increase the hub diameter and decrease the amount of bending, the winding amount will decrease, and since you are working in spool units, the replacement frequency of spools will increase,
This leads to a reduction in workability. Also, during bonding, the tape guide (12) at the intermediate position has to be curved because it is inclined from the spools (15a) and (15b) to the bonding position. Bump electrodes (4) ... and inner leads (3
The connection part with a) ... becomes easy to peel off.

【0007】[0007]

【課題を解決するための手段】本発明に係るTAB式半
導体装置は、所定ピッチで複数の透孔を穿設した絶縁性
フィルム上に金属箔リードを積層・形成すると共に、上
記透孔内に金属箔リードのインナーリードを延在したT
ABテープの、上記インナーリードと半導体ペレットの
バンプ電極とを電気的接続したTAB式半導体装置にお
いて、各透孔の境界領域に湾曲性助長手段を設けたこと
を特徴とし、湾曲性助長手段は、上記絶縁性フィルム裏
面にその幅方向に形成した溝部であること、又は、上記
絶縁性フィルム裏面にその幅方向で上記透孔間に略跨が
って形成した幅広の溝部であること、又は、上記絶縁性
フィルムの幅方向に形成した長穴であること、又は、上
記絶縁性フィルム上の長手方向の両側端部に各半導体装
置と並んでエンボスを設け、各エンボス間に生じた凹部
にて湾曲性助長手段を形成し、
In a TAB type semiconductor device according to the present invention, a metal foil lead is laminated and formed on an insulating film having a plurality of through holes formed at a predetermined pitch, and the metal foil leads are formed in the through holes. T that extends the inner lead of the metal foil lead
In a TAB type semiconductor device in which the inner lead of the AB tape and the bump electrode of the semiconductor pellet are electrically connected, a bendability promoting means is provided in a boundary region of each through hole, and the bendability promoting means comprises: That is a groove portion formed in the width direction on the insulating film back surface, or a wide groove portion formed substantially across the through holes in the width direction on the insulating film back surface, or It is a long hole formed in the width direction of the insulating film, or embossing is provided along with each semiconductor device at both longitudinal ends on the insulating film, and in a recess formed between each embossing. Forming a curvaceous facilitating means,

【0008】その製造装置として、上記TABテープの
搬送路に沿って、インナーリードと半導体ペレットを電
気的接続するボンディング部と、ボンディングされた半
導体ペレット表面を樹脂被覆して保護する樹脂被覆部
と、被覆樹脂を硬化させる樹脂硬化部とを連続的に配置
したことを特徴とし、又は、樹脂被覆部と樹脂硬化部と
の間に一定長さのTABテープを保持して待機させるバ
ッファ領域を設けたことを特徴とする。
As its manufacturing apparatus, a bonding portion for electrically connecting the inner leads and the semiconductor pellets along the transport path of the TAB tape, and a resin coating portion for coating and protecting the surface of the bonded semiconductor pellets with a resin. A resin curing portion for curing the coating resin is continuously arranged, or a buffer area for holding a TAB tape of a certain length and waiting is provided between the resin coating portion and the resin curing portion. It is characterized by

【0009】[0009]

【作用】上記技術的手段によれば、TABテープのイン
ナーリードと半導体ペレットのバンプ電極とをボンディ
ングしたTAB式半導体装置において、TABテープの
各透孔の境界領域に湾曲性助長手段を設け、巻取り等の
際、湾曲性助長手段にてTABテープを多角形状に湾曲
させ、インナーリードと半導体ペレットのバンプ電極と
のボンディング部分を平坦に保持する。
According to the above technical means, in the TAB type semiconductor device in which the inner lead of the TAB tape and the bump electrode of the semiconductor pellet are bonded, the bending promoting means is provided in the boundary region of each through hole of the TAB tape, At the time of taking or the like, the TAB tape is curved in a polygonal shape by the curving promoting means to keep the bonding portion between the inner lead and the bump electrode of the semiconductor pellet flat.

【0010】[0010]

【実施例】本発明に係るTAB式半導体装置及びその製
造装置の実施例を図1乃至図3を参照して以下に説明す
る。図1は本発明に係るTAB式半導体装置(17a)
(17b)(17c)(17d)の各実施例を示し、ま
ず図1(a)において(1)はペレット、(3)は金属
箔リード、(4)はバンプ電極、(18)は絶縁性フィ
ルム、(18a)は湾曲性助長手段としての溝部であ
る。上記TAB式半導体装置(17a)は、従来と同
様、透孔(7)…と窓開け部(8)…とスプロケット穴
(図示せず)とを有する長尺な絶縁性フィルム(18)
の表面に所定パターンの金属箔リード(3)を被着・形
成すると共に、ペレット(1)を金属箔リード(3)に
電気的接続して透孔(7)内に支持してなる。本発明の
特徴は、絶縁性フィルム(18)の裏面の各透孔(7)
の境界領域にフィルム幅方向に溝部(18a)をプレス
等で形成したことである。
Embodiments of the TAB type semiconductor device and its manufacturing apparatus according to the present invention will be described below with reference to FIGS. FIG. 1 shows a TAB semiconductor device (17a) according to the present invention.
Examples (17b), (17c), and (17d) are shown. First, in FIG. 1A, (1) is a pellet, (3) is a metal foil lead, (4) is a bump electrode, and (18) is an insulating material. The film, (18a), is a groove portion as a bendability promoting means. The TAB type semiconductor device (17a) is a long insulating film (18) having through holes (7), window openings (8), and sprocket holes (not shown) as in the conventional case.
A metal foil lead (3) having a predetermined pattern is adhered and formed on the surface of, and the pellet (1) is electrically connected to the metal foil lead (3) and supported in the through hole (7). The feature of the present invention is that each through hole (7) on the back surface of the insulating film (18).
The groove portion (18a) is formed in the boundary region of the film in the film width direction by pressing or the like.

【0011】上記構成によれば、TAB式半導体装置
(17a)を、例えばスプールに巻き取っていくと、主
に溝部(18a)を関節として屈曲して多角形状に湾曲
する。そのため、ペレット(1)の周辺で絶縁性フィル
ム(18)が変形しにくくて略平坦面を保持し、インナ
ーリード(3a)とバンプ電極(4)とのボンディング
部分においてその剥離方向に応力が加わらなくなってボ
ンディングの剥離や損傷を防止出来る。
According to the above structure, when the TAB semiconductor device (17a) is wound on a spool, for example, the groove (18a) is mainly bent as a joint to be bent in a polygonal shape. Therefore, the insulating film (18) is hard to deform around the pellet (1) and holds a substantially flat surface, and stress is applied in the peeling direction at the bonding portion between the inner lead (3a) and the bump electrode (4). It is possible to prevent peeling and damage of the bonding.

【0012】又、本発明の他の実施例を図1(b)
(c)(d)に示すと、図1(b)に示すTAB式半導
体装置(17b)は、絶縁性フィルム(19)の裏面の
各透孔(7)の境界領域にその幅方向で透孔(7)間に
略跨がって幅広の溝部(19a)を湾曲性助長手段とし
て形成したものである。又、図1(c)に示すTAB式
半導体装置(17c)は、湾曲性助長手段として絶縁性
フィルム(20)の各透孔(7)の境界領域に幅方向に
長穴(20a)を形成したものである。更に、図1
(d)に示すTAB式半導体装置(17d)は、絶縁性
フィルム(21)上の長手方向の両側端部に各ペレット
(1)と並んでエンボス(21a)を設けて変形しにく
い領域とし、各エンボス(21a)間で各透孔(7)の
境界領域に生じた凹部(21b)にて湾曲性助長手段を
形成したものである。又、エンボス(21a)に代えて
紫外線硬化型樹脂を同じ平面形状に塗布して硬化させて
も良い。
Another embodiment of the present invention is shown in FIG.
As shown in (c) and (d), the TAB semiconductor device (17b) shown in FIG. 1 (b) is transparent in the width direction in the boundary region of each through hole (7) on the back surface of the insulating film (19). A wide groove portion (19a) is formed as a bendability promoting means so as to substantially extend between the holes (7). Further, in the TAB type semiconductor device (17c) shown in FIG. 1 (c), a long hole (20a) is formed in the width direction in the boundary region of each through hole (7) of the insulating film (20) as a bending promoting means. It was done. Furthermore, FIG.
In the TAB semiconductor device (17d) shown in (d), embossing (21a) is provided alongside each pellet (1) on both ends of the insulating film (21) in the longitudinal direction to form a region that is difficult to deform, The concave portion (21b) formed in the boundary region of the through holes (7) between the embossments (21a) forms the bending promoting means. Further, instead of the embossing (21a), an ultraviolet curable resin may be applied in the same planar shape and cured.

【0013】次に、本発明に係るTAB式半導体装置
(17)を用いると、製造の際、図3に示すように、樹
脂被覆部と樹脂硬化部との間で、TABテープ(14)
を多角形状に湾曲させて迂回させるバッファ領域(2
2)を設けることが出来る。上記バッファ領域(22)
は、樹脂被覆後で樹脂硬化前のTABテープ(14)の
搬送路に沿って第1、第2搬送ドラム(23)(24)
を配置すると共に、各ドラム間にTABテープ(14)
を迂回させて搬送する上下動式バッファドラム(25)
を配置したものである。そして、TABテープ(14)
を各ドラム(23)(24)(25)に巻き取ると、ド
ラム径はスプール(15a)(15b)のハブ径よりも
小さくても、上記同様に主に湾曲助長手段(18a)
(19a)(20a)(21a)を関節として多角形状
に湾曲し、インナーリード(3a)とバンプ電極(4)
とのボンディング部分に応力が加わらず、その剥離や損
傷を防止出来る。
Next, when the TAB type semiconductor device (17) according to the present invention is used, at the time of manufacturing, as shown in FIG. 3, the TAB tape (14) is provided between the resin coating portion and the resin curing portion.
Buffer area (2
2) can be provided. The buffer area (22)
Is the first and second transport drums (23) (24) along the transport path of the TAB tape (14) after resin coating and before resin curing.
TAB tape (14) between each drum
Vertical movement type buffer drum (25)
Is arranged. And TAB tape (14)
Is wound around each drum (23) (24) (25), even if the drum diameter is smaller than the hub diameter of the spools (15a) (15b), the bending promoting means (18a) is mainly used in the same manner as above.
The inner leads (3a) and the bump electrodes (4) are curved in a polygonal shape with (19a), (20a), and (21a) as joints.
Since no stress is applied to the bonding portion with and, the peeling and damage can be prevented.

【0014】そこで、TAB式半導体装置の製造装置と
して、一対のスプール(15a)(15b)間に相異な
る作業設備、即ちTABテープ(14)の搬送路に沿っ
て、インナーリード(3a)とペレット(1)を電気的
接続するボンディング部と、ボンディングされたペレッ
ト表面を樹脂被覆して保護する樹脂被覆部と、被覆樹脂
を硬化させる樹脂硬化部とを連続的に配置すると共に、
樹脂被覆部と樹脂硬化部との間にバッファ領域(22)
を設ける。
Therefore, as a TAB type semiconductor device manufacturing apparatus, a pair of spools (15a) and (15b) are provided with different working equipment, that is, inner leads (3a) and pellets along the transport path of the TAB tape (14). (1) A bonding portion for electrically connecting, a resin coating portion for coating and protecting the bonded pellet surface with a resin, and a resin curing portion for curing the coating resin are continuously arranged, and
A buffer region (22) between the resin coating portion and the resin curing portion
To provide.

【0015】上記構成において、樹脂被覆済み部分のT
ABテープ(14)の樹脂硬化中に他のペレットの樹脂
被覆が終わると、ボンディングや樹脂被覆等に要する時
間が比較的短いのに対して樹脂の硬化は一定時間、保持
する必要があるため、バッファドラム(25)を下降さ
せて樹脂被覆直後のTABテープ(14)を樹脂硬化直
前で一定時間、待機・保持しておく。そして、一定時間
経過して樹脂硬化中のTABテープ(14)の作業が終
わると、バッファドラム(25)を上昇させ、硬化直後
のTABテープ(14)を一度に送り出すと共に、樹脂
被覆直後のTABテープ(14)を硬化工程に供給し、
樹脂被覆から硬化に到る間を時間的に連続させる。即
ち、上記製造装置によれば、スプール(15a)(15
b)間に相異なる工程を場所的、時間的に連続して配置
出来て各作業毎にスプール(15a)(15b)の取り
替えが不要となり、且つ、スプール毎の巻き取り量も増
してその交換頻度が激減する。同時に、相異なる作業ポ
ジション毎のスプール取り付け領域等も不要となって設
備面積が縮小する。
In the above structure, the T of the resin coated portion is
When the resin coating of the other pellets is completed during the resin curing of the AB tape (14), the time required for bonding and resin coating is relatively short, whereas the resin curing needs to be held for a certain time. The buffer drum (25) is lowered to hold and hold the TAB tape (14) immediately after resin coating for a certain period of time immediately before resin curing. Then, when the work of the TAB tape (14) being cured of the resin is finished after a certain period of time, the buffer drum (25) is raised, the TAB tape (14) immediately after the curing is sent at once, and the TAB tape immediately after the resin coating is performed. Supply the tape (14) to the curing process,
The time from the resin coating to the curing is continuous in time. That is, according to the manufacturing apparatus, the spool (15a) (15
b) Different processes can be arranged continuously in terms of location and time, so that it is not necessary to replace the spools (15a) and (15b) for each work, and the winding amount for each spool is increased to replace them. The frequency is drastically reduced. At the same time, the spool mounting area for each different work position becomes unnecessary and the equipment area is reduced.

【0016】[0016]

【発明の効果】本発明によれば、スプールにTAB式半
導体装置を巻き取って各作業を実施する際、インナーリ
ードとバンプ電極との電気的接続部分に応力が加わら
ず、その剥離や損傷を防止出来る。又、スプールのハブ
径を小さく出来て巻き取り量が増し、且つ、製造装置と
して一対のスプール間に相異なる作業工程を連続的に配
置出来、スプール交換頻度が減少するため、工数が減っ
て作業性が向上する共に、作業時間も短縮して生産性が
向上する。更に、設備面積も縮小されて設備が小型にな
る。
According to the present invention, when the TAB type semiconductor device is wound around a spool and each work is performed, no stress is applied to the electrical connection portion between the inner lead and the bump electrode, and peeling or damage is caused. It can be prevented. In addition, the hub diameter of the spool can be reduced to increase the winding amount, and different manufacturing processes can be arranged continuously between a pair of spools as a manufacturing device, and the frequency of spool replacement can be reduced, resulting in a reduction in man-hours. Productivity is improved and productivity is improved by shortening work time. Furthermore, the equipment area is reduced and the equipment becomes smaller.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)(b)共に本発明に係るTAB式半導体
装置の各実施例を示す要部側断面図である。(c)
(d)共に本発明に係るTAB式半導体装置の各実施例
を示す要部平面図である。
FIG. 1A and FIG. 1B are side sectional views of essential parts showing respective embodiments of a TAB type semiconductor device according to the present invention. (C)
(D) Both are main part plan views showing respective examples of the TAB type semiconductor device according to the present invention.

【図2】図1(a)に示す半導体装置の動作説明図であ
る。
FIG. 2 is an operation explanatory diagram of the semiconductor device shown in FIG.

【図3】本発明に係るTAB式半導体装置の製造装置の
実施例を示す要部側面図である。
FIG. 3 is a side view of essential parts showing an embodiment of a TAB type semiconductor device manufacturing apparatus according to the present invention.

【図4】TAB型半導体装置の一例を示す一部断面側面
図である。
FIG. 4 is a partial cross-sectional side view showing an example of a TAB semiconductor device.

【図5】図4の平面図である。FIG. 5 is a plan view of FIG.

【図6】従来のTAB式半導体装置の一例を示す部分平
面図である。
FIG. 6 is a partial plan view showing an example of a conventional TAB semiconductor device.

【図7】従来のTAB式半導体装置の製造装置の一例を
示すインナーリードボンダの一部断面側面図である。
FIG. 7 is a partial cross-sectional side view of an inner lead bonder showing an example of a conventional TAB type semiconductor device manufacturing apparatus.

【図8】本発明の課題の説明図である。FIG. 8 is an explanatory diagram of a problem of the present invention.

【符号の説明】[Explanation of symbols]

1 半導体ペレット 3 金属箔リード 3a インナーリード 4 バンプ電極 7 透孔 18、19、20、21 絶縁性フィルム 18a 溝部 19a 幅広の溝部 20a 長穴 21a エンボス 1 Semiconductor Pellet 3 Metal Foil Lead 3a Inner Lead 4 Bump Electrode 7 Through Hole 18, 19, 20, 21 Insulating Film 18a Groove 19a Wide Groove 20a Long Hole 21a Embossing

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 透孔を穿設した絶縁性フィルム上に金属
箔リードを積層し、このリードを上記透孔内に延在させ
てインナーリードを形成したTABテープの、上記イン
ナーリードと半導体ペレットのバンプ電極とを電気的接
続したTAB式半導体装置において、 各透孔の境界領域に湾曲性助長手段を設けたことを特徴
とするTAB式半導体装置。
1. An inner lead and a semiconductor pellet of a TAB tape in which a metal foil lead is laminated on an insulating film having a through hole and the lead is extended into the through hole to form an inner lead. In the TAB type semiconductor device which is electrically connected to the bump electrode, the TAB type semiconductor device is provided with a bendability promoting means in a boundary region of each through hole.
【請求項2】 湾曲性助長手段は、上記絶縁性フィルム
裏面にその幅方向に形成した溝部であることを特徴とす
る請求項1記載のTAB式半導体装置。
2. The TAB type semiconductor device according to claim 1, wherein the bendability promoting means is a groove formed on the back surface of the insulating film in the width direction thereof.
【請求項3】 湾曲性助長手段は、上記絶縁性フィルム
裏面にその幅方向で上記透孔間に略跨がって形成した幅
広の溝部であることを特徴とする請求項1記載のTAB
式半導体装置。
3. The TAB according to claim 1, wherein the bendability promoting means is a wide groove formed on the back surface of the insulating film so as to extend substantially across the through holes in the width direction thereof.
Semiconductor device.
【請求項4】 湾曲性助長手段は、上記絶縁性フィルム
の幅方向に形成した長穴であることを特徴とする請求項
1記載のTAB式半導体装置。
4. The TAB type semiconductor device according to claim 1, wherein the bendability promoting means is an elongated hole formed in a width direction of the insulating film.
【請求項5】 上記絶縁性フィルム上の長手方向の両側
端部に各半導体装置と並んでエンボスを設け、各エンボ
ス間に生じた凹部にて湾曲性助長手段を形成したことを
特徴とする請求項1記載のTAB式半導体装置。
5. The embossing is provided on both sides of the insulating film in the longitudinal direction side by side with the respective semiconductor devices, and the concave portion formed between the embossing forms the curving promoting means. Item 2. A TAB semiconductor device according to item 1.
【請求項6】 上記TABテープの搬送路に沿って、イ
ンナーリードと半導体ペレットを電気的接続するボンデ
ィング部と、ボンディングされた半導体ペレット表面を
樹脂被覆して保護する樹脂被覆部と、被覆樹脂を硬化さ
せる樹脂硬化部とを連続的に配置したことを特徴とする
請求項1記載のTAB式半導体装置の製造装置。
6. A bonding portion for electrically connecting the inner lead and the semiconductor pellet along the transporting path of the TAB tape, a resin coating portion for coating and protecting the surface of the bonded semiconductor pellet with a resin, and a coating resin. The TAB type semiconductor device manufacturing apparatus according to claim 1, wherein a resin curing portion to be cured is arranged continuously.
【請求項7】 樹脂被覆部と樹脂硬化部との間に一定長
さのTABテープを保持して待機させるバッファ領域を
設けたことを特徴とする請求項1記載のTAB式半導体
装置の製造装置。
7. The TAB type semiconductor device manufacturing apparatus according to claim 1, further comprising a buffer region between the resin coating portion and the resin curing portion, which holds a TAB tape of a predetermined length and stands by. ..
JP27921791A 1991-10-25 1991-10-25 Tab type semiconductor device and manufacture thereof Pending JPH05121486A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27921791A JPH05121486A (en) 1991-10-25 1991-10-25 Tab type semiconductor device and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27921791A JPH05121486A (en) 1991-10-25 1991-10-25 Tab type semiconductor device and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH05121486A true JPH05121486A (en) 1993-05-18

Family

ID=17608061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27921791A Pending JPH05121486A (en) 1991-10-25 1991-10-25 Tab type semiconductor device and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH05121486A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000054323A1 (en) * 1999-03-11 2000-09-14 Seiko Epson Corporation Flexible wiring substrate, film carrier, tapelike semiconductor device, semiconductor device, method of manufacture of semiconductor device, circuit board, and electronic device
WO2000054324A1 (en) * 1999-03-11 2000-09-14 Seiko Epson Corporation Flexible wiring substrate, film carrier, tapelike semiconductor device, semiconductor device, method of manufacture of semiconductor device, circuit board, and electronic device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000054323A1 (en) * 1999-03-11 2000-09-14 Seiko Epson Corporation Flexible wiring substrate, film carrier, tapelike semiconductor device, semiconductor device, method of manufacture of semiconductor device, circuit board, and electronic device
WO2000054324A1 (en) * 1999-03-11 2000-09-14 Seiko Epson Corporation Flexible wiring substrate, film carrier, tapelike semiconductor device, semiconductor device, method of manufacture of semiconductor device, circuit board, and electronic device
US6509630B1 (en) 1999-03-11 2003-01-21 Seiko Epson Corporation Flexible interconnecting substrate, film, carrier, tape-shaped semiconductor device, semiconductor device and method of manufacturing the same, circuit board, and electronic equipment
KR100396925B1 (en) * 1999-03-11 2003-09-03 세이코 엡슨 가부시키가이샤 Flexible wiring substrate, film carrier, tapelike semiconductor device, semiconductor device, method of manufacture of semiconductor device, circuit board, and electronic device
KR100404997B1 (en) * 1999-03-11 2003-11-10 세이코 엡슨 가부시키가이샤 Flexible wiring substrate, film carrier, tapelike semiconductor device, semiconductor device, method of manufacture of semiconductor device, circuit board, and electronic device
US6744120B1 (en) 1999-03-11 2004-06-01 Seiko Epson Corporation Flexible interconnect substrate of a tape-shaped semiconductor device, semiconductor device and circuit board

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