JPH05118909A - Infrared ray detecting element - Google Patents

Infrared ray detecting element

Info

Publication number
JPH05118909A
JPH05118909A JP30987291A JP30987291A JPH05118909A JP H05118909 A JPH05118909 A JP H05118909A JP 30987291 A JP30987291 A JP 30987291A JP 30987291 A JP30987291 A JP 30987291A JP H05118909 A JPH05118909 A JP H05118909A
Authority
JP
Japan
Prior art keywords
infrared
lens
infrared ray
substrate
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP30987291A
Other languages
Japanese (ja)
Inventor
Shinji Kirihata
慎司 桐畑
Motoo Igari
素生 井狩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP30987291A priority Critical patent/JPH05118909A/en
Publication of JPH05118909A publication Critical patent/JPH05118909A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To provide an infrared ray detection element capable of being manufactured easily in a compact size, having an excellent responsiveness for the detection of infrared ray, and providing no inconvenience of usage with a required lense set outside. CONSTITUTION:An infrared ray detection element is provided with an infrared ray detection part 2 on one side of infrared ray transmission board 1, while an infrared ray transmission filter 3 is formed on the opposite face of the board 1. Below the detection part 2 of the board 1 a heat separation space 5 for restraining heat conduction between the detection part 2 and the board 1 is formed. A lens 8 is formed on the inner wall face 5A of the space 5 being in a face-to-face relation with the detection part 2.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、赤外線吸収による温度
変化に伴った抵抗体の電気抵抗等の変化を利用して赤外
線を検出する方式の赤外線検出素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an infrared detecting element of a type which detects infrared rays by utilizing a change in electric resistance of a resistor due to a temperature change due to absorption of infrared rays.

【0002】[0002]

【従来の技術】赤外線検出に際しては、微弱な赤外線の
検出感度を高めるために、赤外線検出部とは別に、赤外
線以外の電磁波を遮断するための赤外線透過フィルタが
併用されている。ここに、従来では、これら赤外線検出
部と赤外線透過フィルタとは別々に製作され、互いの光
軸を合わせて組立てられていたのが一般的であった。す
なわち、図7はその従来例の一例を示すもので、ステム
20にサーミスタ等の赤外線検出部を形成した赤外線検
出チップ21を取付け、また該チップ21の上方には、
赤外線のみを通過させて雑音となる不要な波長成分の通
過を遮断する赤外線透過フィルタ3eを、キャップ22
で保持させて配置したものである。一方、従来では、例
えば赤外線検出により人体検知を行うような場合には、
その赤外線検出感度を高めるために、赤外線検出装置に
集光レンズ等のレンズを組み込んで併用していた。
2. Description of the Related Art In detecting infrared rays, an infrared transmitting filter for blocking electromagnetic waves other than infrared rays is used together with the infrared detecting section in order to increase the sensitivity of detecting weak infrared rays. Here, conventionally, the infrared detecting section and the infrared transmitting filter were generally manufactured separately and assembled by aligning their optical axes. That is, FIG. 7 shows an example of the conventional example, in which an infrared detection chip 21 having an infrared detection portion such as a thermistor is attached to the stem 20, and above the chip 21,
The infrared transmission filter 3e, which passes only infrared rays and blocks unnecessary wavelength components that become noise, is attached to the cap 22.
It is held and placed in. On the other hand, in the past, for example, when detecting a human body by infrared detection,
In order to increase the infrared detection sensitivity, a lens such as a condenser lens is incorporated in the infrared detection device and used together.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、赤外線
検出に際して他のレンズを併用する手段では、赤外線検
出装置にレンズを組み付ける加工が煩雑となって製造コ
ストが高価となり、また赤外線検出装置の全体が大型化
するという難点がある。しかも、上記従来の図7に示す
ものでは、赤外線透過フィルタ3eをキャップ22の開
口部23の形状に合わせた微細な形状に切り出し、これ
をキャップ22の開口部23へ接着剤で貼付ける必要が
ある等、その組立工程が多く、その製造コストが一層高
くなる欠点があった。更に、上記従来のものでは、各部
品の組立作業性等の制約から、赤外線透過フィルタ3e
と赤外線検出チップ21とをある程度離しておく必要が
あるために、これらの全体構造も嵩張るという欠点もあ
った。尚、赤外線検出チップ21の表面に赤外線透過フ
ィルタ3eを直接重ね合わせれば、両者の取付構造の簡
略化、コンパクト化が図れるが、かかる手段では赤外線
検出チップ21からステム20側への熱吸収以外とし
て、赤外線検出チップ21から赤外線透過フィルタ3e
への熱吸収も加わるために、赤外線吸収に応じた赤外線
検出チップ21の温度変化が鈍くなり、赤外線検出の感
度が低下する。また、赤外線検出部位全体の見かけ上の
熱容量が増加することにも原因して応答性が一層悪化
し、実用性に劣る難点がある。それ故、本発明は、簡易
に且つ小型に製造できて、赤外線検出の応答性に優れた
ものとし、しかも所望のレンズを外付けして使用するよ
うな不便さを解消することができる赤外線検出素子を提
供することを、その目的とする。
However, in the means of using another lens together in detecting infrared rays, the process of assembling the lens in the infrared detecting apparatus becomes complicated and the manufacturing cost becomes high, and the whole infrared detecting apparatus is large in size. There is a drawback that In addition, in the conventional device shown in FIG. 7, it is necessary to cut out the infrared transmitting filter 3e into a fine shape that matches the shape of the opening 23 of the cap 22 and attach this to the opening 23 of the cap 22 with an adhesive. However, there are drawbacks that the number of assembling steps is large and the manufacturing cost is further increased. Further, in the above-mentioned conventional one, the infrared transmission filter 3e is limited due to restrictions such as assembling workability of each component.
Since it is necessary to separate the infrared detection chip 21 and the infrared detection chip 21 to some extent, there is also a drawback that the overall structure of these is bulky. Incidentally, if the infrared transmission filter 3e is directly superposed on the surface of the infrared detection chip 21, the mounting structure of both can be simplified and made compact. However, with such means, other than heat absorption from the infrared detection chip 21 to the stem 20 side, , Infrared detection chip 21 to infrared transmission filter 3e
Since the heat absorption to the infrared rays is also added, the temperature change of the infrared ray detection chip 21 due to the infrared ray absorption becomes slow, and the sensitivity of the infrared ray detection decreases. Further, the responsiveness is further deteriorated due to an increase in the apparent heat capacity of the entire infrared detection site, and there is a drawback that it is inferior in practicality. Therefore, the present invention can be manufactured easily and compactly and has excellent responsiveness for infrared detection, and can eliminate the inconvenience of using a desired lens externally. The purpose is to provide an element.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
に提案された本発明に係る赤外線検出素子は、赤外線透
過基板の片面には赤外線検出部が設けられているととも
に、該赤外線透過基板の反対面には赤外線透過フィルタ
が形成され、赤外線透過基板の赤外線検出部の下方に
は、該赤外線検出部と赤外線透過基板との相互間の熱伝
導を抑制する熱分離空間部が形成された赤外線検出素子
であって、前記赤外線検出部と対面する熱分離空間部の
内壁面にレンズが形成された構成である。
The infrared detecting element according to the present invention, which has been proposed to achieve the above object, has an infrared detecting portion provided on one surface of the infrared transmitting substrate and the infrared transmitting substrate An infrared ray transmitting filter is formed on the opposite surface, and an infrared ray separating space is formed below the infrared ray detecting portion of the infrared ray transmitting substrate to suppress heat conduction between the infrared ray detecting portion and the infrared ray transmitting substrate. In the detection element, a lens is formed on the inner wall surface of the heat separation space section facing the infrared detection section.

【0005】[0005]

【作用】上記構成を特徴とする赤外線検出素子では、赤
外線透過基板の反対面側から赤外線透過フィルタ及び赤
外線透過基板を透過する赤外線が、熱分離空間部の内壁
面のレンズを通過して集光又は分散された状態で赤外線
検出部に吸収され、赤外線の検出がなされる。従って、
当該赤外線検出素子とは別個に集光用又は分散用のレン
ズを併用する必要はなくなる。前記レンズを集光用の凸
レンズとして形成すれば、視野角を狭めて拡大像が得ら
れ、感度のよい赤外線検出を行うことができる。また、
凹レンズとすれば、視野角を拡大して縮小像が得られ
る。また、前記レンズは熱分離空間部の内壁面に形成さ
れているから、赤外線透過フィルタが設けられた赤外線
透過基板の反対面側を、赤外線透過フィルタの形成に最
適なフラット面の状態に形成しておくことができる。更
に、赤外線検出部は熱分離空間部によって基板と熱分離
され、しかも赤外線透過フィルタとも離間しているため
に、赤外線検出部からこれら各部への不当な熱伝導が抑
制され、また赤外線検出部の位置全体における見かけ上
の熱容量も小さくなる。従って、赤外線吸収による赤外
線検出部の温度変化が鋭敏なものとなって、赤外線検出
部における赤外線検出の感度、並びに応答性が向上す
る。当該赤外線検出素子では、赤外線検出部を備えた赤
外線透過基板に、赤外線透過フィルタ及びレンズを形成
しているから、その全体が嵩張らず、全体をワンチップ
状の小サイズに形成できる。しかも、赤外線検出部と赤
外線透過フィルタを接近させることができるから、視野
角の拡大も図れることとなる。
In the infrared detecting element having the above-mentioned structure, the infrared rays passing through the infrared transmitting filter and the infrared transmitting substrate from the side opposite to the infrared transmitting substrate pass through the lens on the inner wall surface of the heat separation space and are condensed. Alternatively, the infrared light is absorbed by the infrared detecting portion in a dispersed state, and infrared rays are detected. Therefore,
It is not necessary to use a condensing or dispersing lens separately from the infrared detecting element. If the lens is formed as a converging convex lens, the viewing angle can be narrowed to obtain a magnified image, and infrared detection with high sensitivity can be performed. Also,
If it is a concave lens, the viewing angle is enlarged and a reduced image is obtained. Further, since the lens is formed on the inner wall surface of the heat separation space, the opposite surface side of the infrared transmission substrate provided with the infrared transmission filter is formed into a flat surface state which is optimum for forming the infrared transmission filter. Can be kept. Furthermore, since the infrared detecting section is thermally separated from the substrate by the heat separating space section and is also separated from the infrared transmitting filter, improper heat conduction from the infrared detecting section to each of these sections is suppressed, and the infrared detecting section The apparent heat capacity at the entire location is also reduced. Therefore, the temperature change of the infrared detecting section due to the infrared absorption becomes sensitive, and the infrared detecting sensitivity and responsiveness of the infrared detecting section are improved. In the infrared detecting element, since the infrared transmitting filter and the lens are formed on the infrared transmitting substrate having the infrared detecting portion, the whole is not bulky, and the whole can be formed in a one-chip small size. Moreover, since the infrared detector and the infrared transmission filter can be brought close to each other, the viewing angle can be expanded.

【0006】[0006]

【実施例】以下、本発明の実施例について図面を参照し
て説明する。図1は本発明に係る赤外線検出素子Aの断
面図、図2はその平面図である。当該赤外線検出素子A
は、赤外線透過基板1の表面側に赤外線検出部2を、裏
面側に赤外線透過フィルタ3を各々設け、又赤外線検出
部2の下方の赤外線透過基板1の内部に熱分離空間部5
を設け、その内壁面にレンズ8を形成したものである。
ここに、赤外線透過基板1は、上下二枚の基板1a、1
bを一体的に接着して一枚の基板として構成されたもの
で、その材質としては、赤外線を良好に透過させ得るも
のであれば一般の半導体基板材料の中から適当なものを
選択して用いることが可能である。具体的には、シリコ
ン基板が好ましく、特に比抵抗0.1Ωcm以上のシリ
コン基板が赤外線透過性に優れ望ましい。赤外線透過基
板1の表面には絶縁膜4が設けられているが、当該絶縁
膜4は赤外線吸収膜としての機能をも兼備するもので、
半導体プロセスに適し且つ赤外線吸収率の高い物質で形
成されている。その具体例としては、酸化シリコン膜又
は酸化シリコンと窒化シリコンの多層膜が適用される。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of an infrared detecting element A according to the present invention, and FIG. 2 is a plan view thereof. The infrared detection element A
Is provided with an infrared detecting portion 2 on the front surface side of the infrared transmitting substrate 1 and an infrared transmitting filter 3 on the rear surface side thereof, and a heat separation space portion 5 inside the infrared transmitting substrate 1 below the infrared detecting portion 2.
Is provided, and the lens 8 is formed on the inner wall surface thereof.
Here, the infrared transparent substrate 1 is composed of two upper and lower substrates 1a and 1a.
b is integrally bonded to form a single substrate, and as a material thereof, an appropriate one can be selected from general semiconductor substrate materials as long as it can transmit infrared rays well. It can be used. Specifically, a silicon substrate is preferable, and a silicon substrate having a specific resistance of 0.1 Ωcm or more is particularly preferable because it has excellent infrared transmittance. An insulating film 4 is provided on the surface of the infrared transmitting substrate 1, but the insulating film 4 also has a function as an infrared absorbing film.
It is made of a material that is suitable for a semiconductor process and has a high infrared absorption rate. As a specific example, a silicon oxide film or a multilayer film of silicon oxide and silicon nitride is applied.

【0007】熱分離空間部5は、絶縁膜4よりも下層側
の赤外線透過基板1を一部除去して形成されたものであ
る。これは、後述する如く上下の基板1a、1bを接着
させる以前に、上側の基板1aの裏面側をエッチング等
によって所望の切欠凹部を形成することにより構成され
る。レンズ8は、前記熱分離空間部5の内壁面のうち赤
外線検出部2と対面する位置に存する内壁面5Aが加工
されて、例えば集光用のフレネルレンズとして形成され
たものである。フレネルレンズの形成手段としては、上
下基板1a、1bを接着させる以前において、下側の基
板1b上に電子ビームレジストをコーティングし、電子
ビームリソグラフィにより所望のレンズパターンを作成
してイオンビームエッチングを行い、電子ビームレジス
トの形を基板1bの表面に転写させればよい。
The heat separation space 5 is formed by removing a part of the infrared transmitting substrate 1 below the insulating film 4. This is formed by forming a desired notch concave portion on the back surface side of the upper substrate 1a by etching or the like before adhering the upper and lower substrates 1a and 1b as described later. The lens 8 is formed, for example, as a Fresnel lens for condensing by processing the inner wall surface 5A of the inner wall surface of the heat separation space portion 5 located at a position facing the infrared detection portion 2. As a Fresnel lens forming means, before bonding the upper and lower substrates 1a and 1b, an electron beam resist is coated on the lower substrate 1b, a desired lens pattern is formed by electron beam lithography, and ion beam etching is performed. The shape of the electron beam resist may be transferred to the surface of the substrate 1b.

【0008】赤外線検出部2は、前記熱分離空間部5の
上方位置に相当する絶縁膜4上に、薄膜抵抗体2b及び
電極2a、2aを順次重ねて設けることにより構成さ
れ、赤外線透過基板1とは熱分離空間部5を介して熱分
離されている。このうち、薄膜抵抗体2bは、例えば膜
厚が0.1〜5.0μmの非結晶シリコン又は多結晶シ
リコンからなるもので、赤外線吸収による温度変化に伴
って抵抗値が変化するものである。薄膜抵抗体2bとし
ては、温度上昇によって抵抗値が増加するものと減少す
るものの両方があり、本発明では何れのタイプでもよ
い。電極2a、2aは、薄膜抵抗体2bの抵抗値の変化
が正確に検出できるように、互いに対向する櫛型の平面
形状に形成されて、薄膜抵抗体2bと広面積で接触する
ように構成され、又その各端部は後述する信号処理回路
6に接続されている。電極2a、2aの材料も、好まし
くは半導体プロセスに適した薄膜材料で形成され、その
材料としては、AuやAl等の通常の電極材料の他、T
i、Zr、V、Nb、Ta、Cr、Mo、W、Ni、P
t、Pd等の金属合金、或いは多結晶シリコンとのシリ
サイドを用いると、赤外線の吸収率が高いので、検出感
度を向上させることが可能である。
The infrared detecting section 2 is constructed by sequentially stacking a thin film resistor 2b and electrodes 2a, 2a on an insulating film 4 corresponding to a position above the heat separation space 5, and the infrared transmitting substrate 1 And are thermally separated via the heat separation space 5. Among them, the thin film resistor 2b is made of, for example, amorphous silicon or polycrystalline silicon having a film thickness of 0.1 to 5.0 μm, and its resistance value changes with temperature change due to infrared absorption. The thin film resistor 2b includes both a resistor whose resistance value increases and a resistor whose resistance value decreases as the temperature rises, and any type may be used in the present invention. The electrodes 2a, 2a are formed in a comb-shaped planar shape facing each other so that a change in the resistance value of the thin film resistor 2b can be accurately detected, and are configured to contact the thin film resistor 2b in a large area. Further, each end thereof is connected to a signal processing circuit 6 described later. The materials of the electrodes 2a, 2a are also preferably formed of a thin film material suitable for a semiconductor process. Examples of the material include normal electrode materials such as Au and Al, and T
i, Zr, V, Nb, Ta, Cr, Mo, W, Ni, P
When a metal alloy of t, Pd, or the like or a silicide with polycrystalline silicon is used, the infrared absorption rate is high, and thus the detection sensitivity can be improved.

【0009】赤外線透過基板1の裏面側の赤外線透過フ
ィルタ3は、赤外線以外の電磁波を遮断し、赤外線を通
過させるもので、その一例としては、高屈折率の酸化マ
グネシウムと低屈折率の弗化マグネシウムの多層膜が適
用される。尚、赤外線透過基板1の絶縁膜4よりも下層
の他の部位には、通常の赤外線検出装置と同様の増幅回
路やその他の回路を備えた信号処理回路6が設けられ、
その適所には前記電極2a、2aの各端部が絶縁膜4を
通過した状態で接続されている。
The infrared transmitting filter 3 on the back surface side of the infrared transmitting substrate 1 blocks electromagnetic waves other than infrared rays and allows infrared rays to pass therethrough. For example, magnesium oxide having a high refractive index and fluorine having a low refractive index are used. A multilayer film of magnesium is applied. A signal processing circuit 6 including an amplification circuit and other circuits similar to those of a normal infrared detection device is provided in another portion of the infrared transmission substrate 1 below the insulating film 4.
The ends of the electrodes 2a, 2a are connected to the appropriate places in a state of passing through the insulating film 4.

【0010】上記構成の赤外線検出素子Aの製造に際し
ては、赤外線透過基板1の上下基板1a、1bを各々個
別に製作した後に、これらを相互に接着させるが、基板
1a側においては、図3の(a)に示すように、基板1
a上に信号処理回路6を通常の半導体プロセスに則した
方法で作製した後に、基板1aの表面に絶縁膜4を成膜
させる。次に、同図(b)に示すように、赤外線検出部
2が設けられる予定位置の基板1aの下面側を異方性エ
ッチング等によって除去し、熱分離空間部5を形成す
る。その後、同図(c)に示すように、熱分離空間部5
の上方の絶縁膜4上に薄膜抵抗体2b及び電極2a、2
aを蒸着やスパッタリング等により成膜させる。一方、
同図(d)に示すように、基板1b側においては、その
下面側に赤外線透過フィルタ3を蒸着等によって成膜さ
せると共に、上面側の熱分離空間部5と対応する位置に
前記既述のエッチング手段等によりレンズ8を形成して
おく。従って、その後にこれら両基板1a、1bを従来
既知の適当な手段で接着させれば、前記図1に示す赤外
線検出素子Aが得られる。
In manufacturing the infrared detecting element A having the above structure, the upper and lower substrates 1a and 1b of the infrared transmitting substrate 1 are individually manufactured and then adhered to each other. As shown in FIG.
After the signal processing circuit 6 is formed on a by a method according to a normal semiconductor process, the insulating film 4 is formed on the surface of the substrate 1a. Next, as shown in FIG. 3B, the lower surface side of the substrate 1a at the position where the infrared detecting section 2 is to be provided is removed by anisotropic etching or the like to form the heat separation space section 5. After that, as shown in FIG.
On the insulating film 4 above the thin film resistor 2b and the electrodes 2a, 2
A is deposited by vapor deposition, sputtering, or the like. on the other hand,
As shown in FIG. 3D, on the substrate 1b side, the infrared transmission filter 3 is formed on the lower surface side by vapor deposition or the like, and at the position corresponding to the heat separation space portion 5 on the upper surface side as described above. The lens 8 is formed by etching means or the like. Therefore, if the two substrates 1a and 1b are thereafter adhered by an appropriate means known in the related art, the infrared detecting element A shown in FIG. 1 can be obtained.

【0011】上記構成の赤外線検出素子Aは、赤外線透
過基板1の両面に赤外線検出部2と赤外線透過フィルタ
3を設け、且つ熱分離空間部の内部にレンズ8が一体的
に形成された半導体チップとして構成されたものであ
り、そのサイズを非常に小さくできるものである。次い
で、その使用に際して、赤外線透過基板1の裏面下方側
から赤外線が赤外線透過フィルタ3を透過して赤外線透
過基板1内に入射すると、当該赤外線は集光用のレンズ
8によって集光された状態で赤外線吸収膜として機能す
る絶縁膜4中の酸化シリコン又は窒化シリコンに吸収さ
れ、絶縁膜4上に設けられた赤外線検出部2の薄膜抵抗
体2bの温度が変化する。かかる温度変化に伴う薄膜抵
抗体2bの抵抗値の変化は、電極2a、2aが接続され
た信号処理回路6を通じて検出できることとなる。赤外
線透過基板1の表裏に設けられた赤外線透過フィルタ3
と赤外線検出部2とは相互に接近しているから、その視
野角は広くなる。
The infrared detecting element A having the above structure is a semiconductor chip in which an infrared detecting portion 2 and an infrared transmitting filter 3 are provided on both sides of an infrared transmitting substrate 1, and a lens 8 is integrally formed inside a heat separation space. It is configured as, and its size can be made extremely small. Next, when the infrared rays are transmitted from the lower side of the back surface of the infrared transmission substrate 1 through the infrared transmission filter 3 and enter the infrared transmission substrate 1 in use, the infrared rays are collected by the condenser lens 8. It is absorbed by silicon oxide or silicon nitride in the insulating film 4 functioning as an infrared absorbing film, and the temperature of the thin film resistor 2b of the infrared detecting unit 2 provided on the insulating film 4 changes. A change in the resistance value of the thin film resistor 2b due to such a temperature change can be detected through the signal processing circuit 6 to which the electrodes 2a and 2a are connected. Infrared transmission filter 3 provided on the front and back of infrared transmission substrate 1
Since the infrared detector 2 and the infrared detector 2 are close to each other, the viewing angle is wide.

【0012】而して、赤外線検出部2で受光する赤外線
は、レンズ8によって集光されたものであるから、赤外
線検出素子Aが受光する赤外線が微量であってもこれを
集光して検出感度を高めることが可能となる。即ち、集
光レンズ8を設けたことにより、赤外線検出部2で受光
する視野角を絞り、赤外線像を等価的に拡大したのと同
様な作用が得られる。また、赤外線検出部2と赤外線透
過基板1とは熱分離空間部5によって熱分離された状態
であるから、赤外線検出部2から赤外線透過基板1側へ
熱が逃げることが抑制される。更に、赤外線透過フィル
タ3は赤外線透過基板1の裏面側に設けられているか
ら、赤外線検出部2の熱が赤外線透過フィルタ3に奪わ
れることもない。従って、赤外線吸収による赤外線検出
部2の温度変化は鋭敏となり、赤外線検出の応答速度を
速めることができる。また、赤外線検出部2は赤外線透
過基板1と熱分離されて設けられていることにより、そ
の全体の見かけ上の熱容量も小さくでき、赤外線検出の
感度を一層向上させることが可能となる。尚、赤外線透
過基板1に信号処理回路6を設けたことにより、当該信
号処理回路6が赤外線検出部2等とともにワンチップに
集積され、その取扱いに利便であり、また赤外線検出部
2等の一連の製造過程において信号処理回路6の製造が
能率良く行える。しかも、赤外線検出部2と信号処理回
路6との配線距離を短くできるために、信号の減衰や雑
音の侵入を少なくでき、赤外線検出性能を一層向上させ
ることが可能である。
Since the infrared light received by the infrared detecting section 2 is condensed by the lens 8, even if the infrared detecting element A receives a small amount of infrared light, it is condensed and detected. It is possible to increase the sensitivity. That is, by providing the condenser lens 8, the same action as that of the infrared image is magnified equivalently by narrowing the viewing angle received by the infrared detecting section 2 can be obtained. Further, since the infrared detecting section 2 and the infrared transmitting substrate 1 are in a state of being thermally separated by the heat separating space section 5, it is possible to prevent heat from escaping from the infrared detecting section 2 to the infrared transmitting substrate 1 side. Furthermore, since the infrared transmission filter 3 is provided on the back surface side of the infrared transmission substrate 1, the heat of the infrared detection unit 2 is not absorbed by the infrared transmission filter 3. Therefore, the temperature change of the infrared detector 2 due to the infrared absorption becomes sensitive, and the response speed of infrared detection can be increased. Further, since the infrared detecting section 2 is provided separately from the infrared transmitting substrate 1, the apparent heat capacity of the entire infrared detecting section 2 can be reduced, and the infrared detecting sensitivity can be further improved. Since the signal processing circuit 6 is provided on the infrared transparent substrate 1, the signal processing circuit 6 is integrated together with the infrared detecting section 2 and the like in one chip, which is convenient for handling, and a series of the infrared detecting section 2 and the like. In the manufacturing process of, the signal processing circuit 6 can be manufactured efficiently. Moreover, since the wiring distance between the infrared detecting section 2 and the signal processing circuit 6 can be shortened, signal attenuation and noise intrusion can be reduced, and the infrared detecting performance can be further improved.

【0013】図4は、熱分離空間部5の内壁面5Aを凸
状曲面に形成して凸レンズ8aを形成した場合を示し、
図5は内壁面5Aを凹状曲面に形成して凹レンズ8bを
形成した場合を示している。請求項1記載の本発明で
は、レンズ8がフレネルレンズに限定されず、これら図
4、図5に示すような形態のレンズとして構成してもよ
い。尚、本発明では、凹レンズとして形成した場合に
は、受光する赤外線を分散させることができるから、赤
外線検出部2で受光する視野角を拡大し、赤外線像を縮
小させることが可能である。図6に示す赤外線検出素子
Aは、上下二枚の電極2a、2aで薄膜抵抗体2bを挟
み込む構造としたものであり、本発明ではかかる電極構
造であっても構わない。
FIG. 4 shows a case where the inner wall surface 5A of the heat separation space 5 is formed into a convex curved surface to form a convex lens 8a.
FIG. 5 shows a case where the inner wall surface 5A is formed into a concave curved surface to form the concave lens 8b. In the present invention as set forth in claim 1, the lens 8 is not limited to the Fresnel lens, and may be configured as a lens having a form as shown in FIGS. 4 and 5. In the present invention, when the concave lens is formed, the infrared rays to be received can be dispersed, so that the viewing angle received by the infrared detecting section 2 can be expanded and the infrared image can be reduced. The infrared detection element A shown in FIG. 6 has a structure in which the thin film resistor 2b is sandwiched between the upper and lower electrodes 2a and 2a, and the electrode structure may be used in the present invention.

【0011】[0011]

【発明の効果】以上のように、本発明に係る赤外線検出
素子によれば、簡易な製造手段によって全体をワンチッ
プ状の非常に小型のものに製作でき、また赤外線検出の
視野角も広く確保できる効果が得られるのに加え、人体
検知の使用用途等に際して従来のように外付用レンズを
別個に使用する必要性もなくなり、そのまま人体検知等
に使用できる等の利便性が得られる。しかも、赤外線検
出部から赤外線透過基板や赤外線透過フィルタ側への不
当な熱伝導も抑制できて、赤外線検出の応答性能をも向
上させることができる。また、レンズを熱分離空間部の
内壁面に形成しているために、赤外線検出素子の大型化
が抑制できることは勿論のこと、赤外線透過フィルタを
形成する赤外線透過基板の裏面をフラット面として形成
できることとなって、赤外線透過フィルタの形成に際し
て支障を生じさせないという利点もある。
As described above, according to the infrared detecting element of the present invention, the whole can be manufactured in a very small one-chip shape by a simple manufacturing means, and a wide viewing angle for infrared detection can be secured. In addition to the effect that can be obtained, there is no need to separately use an external lens as in the conventional case when the human body is used, and the convenience that the lens can be directly used for human body detection can be obtained. In addition, it is possible to suppress unreasonable heat conduction from the infrared detecting section to the infrared transmitting substrate or the infrared transmitting filter side, and improve the response performance of infrared detection. In addition, since the lens is formed on the inner wall surface of the heat separation space, it is possible to suppress the increase in size of the infrared detection element, and it is possible to form the back surface of the infrared transmission substrate forming the infrared transmission filter as a flat surface. Therefore, there is also an advantage that no trouble occurs in forming the infrared transmission filter.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る赤外線検出素子の一実施例を示す
断面図。
FIG. 1 is a sectional view showing an embodiment of an infrared detection element according to the present invention.

【図2】本発明に係る赤外線検出素子の一実施例を示す
平面図。
FIG. 2 is a plan view showing an embodiment of an infrared detection element according to the present invention.

【図3】本発明に係る赤外線検出素子の製造工程の一例
を示す断面図。
FIG. 3 is a cross-sectional view showing an example of a manufacturing process of the infrared detection element according to the present invention.

【図4】赤外線検出素子に形成するレンズの他の実施例
を示す要部断面図。
FIG. 4 is a sectional view of an essential part showing another embodiment of the lens formed in the infrared detection element.

【図5】赤外線検出素子に形成するレンズの他の実施例
を示す要部断面図。
FIG. 5 is a cross-sectional view of essential parts showing another embodiment of the lens formed in the infrared detection element.

【図6】赤外線検出素子に形成する電極の他の実施例を
示す要部断面図。
FIG. 6 is a cross-sectional view of essential parts showing another embodiment of the electrodes formed on the infrared detection element.

【図7】従来の赤外線検出装置の一例を示す要部断面
図。
FIG. 7 is a cross-sectional view of essential parts showing an example of a conventional infrared detection device.

【符号の説明】[Explanation of symbols]

1 赤外線透過基板 2 赤外線検出部 2a 電極 2b 薄膜抵抗体 3 赤外線透過フィルタ 4 絶縁膜 5 熱分離空間部 5A 内壁面 6 信号処理部 8 レンズ A 赤外線検出素子 1 Infrared Transmission Substrate 2 Infrared Detection Section 2a Electrode 2b Thin Film Resistor 3 Infrared Transmission Filter 4 Insulation Film 5 Thermal Separation Space Section 5A Inner Wall Surface 6 Signal Processing Section 8 Lens A Infrared Detection Element

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】赤外線透過基板の片面には赤外線検出部が
設けられているとともに、該赤外線透過基板の反対面に
は赤外線透過フィルタが形成され、赤外線透過基板の赤
外線検出部の下方には、該赤外線検出部と赤外線透過基
板との相互間の熱伝導を抑制する熱分離空間部が形成さ
れた赤外線検出素子であって、 前記赤外線検出部と対面する熱分離空間部の内壁面にレ
ンズが形成されていることを特徴とする赤外線検出素
子。
1. An infrared detecting portion is provided on one surface of the infrared transmitting substrate, and an infrared transmitting filter is formed on the opposite surface of the infrared transmitting substrate. Below the infrared detecting portion of the infrared transmitting substrate, An infrared detection element in which a heat separation space part for suppressing heat conduction between the infrared detection part and the infrared transmission substrate is formed, wherein a lens is provided on an inner wall surface of the heat separation space part facing the infrared detection part. An infrared detection element characterized by being formed.
【請求項2】前記レンズが、熱分離空間部の内壁面の表
面をエッチングにより複数の波状部を同心円状に形成し
て構成されたフレネルレンズである請求項1記載の赤外
線検出素子。
2. The infrared detection element according to claim 1, wherein the lens is a Fresnel lens formed by etching a surface of an inner wall surface of the heat separation space to form a plurality of corrugated portions in a concentric shape.
JP30987291A 1991-10-28 1991-10-28 Infrared ray detecting element Withdrawn JPH05118909A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30987291A JPH05118909A (en) 1991-10-28 1991-10-28 Infrared ray detecting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30987291A JPH05118909A (en) 1991-10-28 1991-10-28 Infrared ray detecting element

Publications (1)

Publication Number Publication Date
JPH05118909A true JPH05118909A (en) 1993-05-14

Family

ID=17998319

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30987291A Withdrawn JPH05118909A (en) 1991-10-28 1991-10-28 Infrared ray detecting element

Country Status (1)

Country Link
JP (1) JPH05118909A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007171170A (en) * 2005-11-25 2007-07-05 Matsushita Electric Works Ltd Method for manufacturing thermal type infrared sensing device
JP2007171174A (en) * 2005-11-25 2007-07-05 Matsushita Electric Works Ltd Thermal type infrared sensing device and its manufacturing method
WO2011046163A1 (en) * 2009-10-17 2011-04-21 三菱マテリアル株式会社 Infrared sensor and circuit substrate equipped therewith
JP2012211789A (en) * 2011-03-30 2012-11-01 Mitsubishi Materials Corp Infrared sensor and circuit board equipped with the same
JP2014235064A (en) * 2013-05-31 2014-12-15 シャープ株式会社 Infrared sensor and infrared sensor device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007171170A (en) * 2005-11-25 2007-07-05 Matsushita Electric Works Ltd Method for manufacturing thermal type infrared sensing device
JP2007171174A (en) * 2005-11-25 2007-07-05 Matsushita Electric Works Ltd Thermal type infrared sensing device and its manufacturing method
WO2011046163A1 (en) * 2009-10-17 2011-04-21 三菱マテリアル株式会社 Infrared sensor and circuit substrate equipped therewith
JP2011102791A (en) * 2009-10-17 2011-05-26 Mitsubishi Materials Corp Infrared-ray sensor and circuit substrate equipped with the same
CN102483349A (en) * 2009-10-17 2012-05-30 三菱综合材料株式会社 Infrared sensor and circuit substrate equipped therewith
US20120269228A1 (en) * 2009-10-17 2012-10-25 Mitsubishi Materials Corporation Infrared sensor and a circuit board equipped therewith
US9182286B2 (en) 2009-10-17 2015-11-10 Mitsubishi Materials Corporation Infrared sensor and a circuit board equipped therewith
JP2012211789A (en) * 2011-03-30 2012-11-01 Mitsubishi Materials Corp Infrared sensor and circuit board equipped with the same
JP2014235064A (en) * 2013-05-31 2014-12-15 シャープ株式会社 Infrared sensor and infrared sensor device

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