JPH0511573B2 - - Google Patents

Info

Publication number
JPH0511573B2
JPH0511573B2 JP60018151A JP1815185A JPH0511573B2 JP H0511573 B2 JPH0511573 B2 JP H0511573B2 JP 60018151 A JP60018151 A JP 60018151A JP 1815185 A JP1815185 A JP 1815185A JP H0511573 B2 JPH0511573 B2 JP H0511573B2
Authority
JP
Japan
Prior art keywords
transparent
plate
line array
imaging device
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60018151A
Other languages
Japanese (ja)
Other versions
JPS61176838A (en
Inventor
Masami Okino
Yasuhiro Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanebo Ltd
Original Assignee
Kanebo Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanebo Ltd filed Critical Kanebo Ltd
Priority to JP1815185A priority Critical patent/JPS61176838A/en
Publication of JPS61176838A publication Critical patent/JPS61176838A/en
Publication of JPH0511573B2 publication Critical patent/JPH0511573B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • G01N21/8903Optical details; Scanning details using a multiple detector array
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958Inspecting transparent materials or objects, e.g. windscreens

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、透明または半透明のフイルム、シー
ト等の板状体を検査して異物の混入、フイツシユ
アイ等の欠点部を検出する検査方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an inspection method for inspecting a plate-like object such as a transparent or translucent film or sheet to detect defects such as contamination of foreign matter and hard eyes. .

〔従来の技術とその問題点〕[Conventional technology and its problems]

透明または半透明のフイルム、シート等を製造
する際には、原料が完全に溶解していない部分が
あつたり、一度溶けたものが配管ライン内で再凝
固して溶液中に混入すること等によつて、良質部
分と同材質であるが密度が異なるフイツシユアイ
と呼ばれる欠点部が発生したり表面に盛り上がり
へこみができて欠点部となることがある。このよ
うな欠点部は、板状体の良質部分と同様に透明ま
たは半透明であるために、目で観察して見分ける
ことが困難である。また従来から、透明または半
透明の板状体に混入した異物を検出するために光
の透過度の大小を利用する方法が用いられている
が、このような方法では前記のような透明または
半透明の欠点部については検出不可能であつたり
検出の確実性に欠けるという問題点があつた。
When manufacturing transparent or semi-transparent films, sheets, etc., there is a risk that some parts of the raw material may not be completely dissolved, or that once melted material may re-solidify in the piping line and mix into the solution. As a result, defective parts called "fissure eyes", which are made of the same material as the good quality part but have a different density, may occur, or bulges and dents may be formed on the surface, resulting in defective parts. Since such defective parts are transparent or semitransparent like the good quality parts of the plate-shaped body, it is difficult to visually observe and distinguish them. Furthermore, conventionally, methods have been used that utilize the degree of light transmittance to detect foreign substances mixed into a transparent or semi-transparent plate; There was a problem that transparent defective parts could not be detected or detection was not reliable.

このため、多面鏡でレーザ光をスキヤンさせる
フライングスポツト方式が用いられているが、光
学系が複雑となるとともに装置が高価になるとい
う問題点があつた。
For this reason, a flying spot method is used in which the laser beam is scanned with a polygon mirror, but this method has the problems of complicating the optical system and making the device expensive.

したがつて本発明の目的は、不透明な異物の混
入による欠点部だけでなく、良質部分と同様に透
明または半透明の鶏点部を正確に検出可能で、か
つ複雑な装置を用いずに安価に実施できる透明ま
たは半透明の板状体の欠点検査方法を提供するこ
とにある。
Therefore, it is an object of the present invention to accurately detect not only defects caused by opaque foreign matter but also transparent or translucent spots as well as good quality parts, and to be able to detect them at low cost without using complicated equipment. An object of the present invention is to provide a method for inspecting defects on a transparent or semi-transparent plate-like body, which can be carried out in a number of ways.

〔問題点を解決するための手段〕[Means for solving problems]

上記の問題点を解決するために本発明の欠点検
査方法は、前記のような良質部分と同材質で密度
が異なる欠点部においては光の屈折率が良質部分
と異なり、また表面の盛り上がりやへこみによる
欠点部においてはレンズ作用により光が良質部分
と異なつた屈折を行なうことを利用したものであ
り、検出すべき欠点部の大きさよりも狭い間隔で
等間隔に複数の線を配してなる線列1を、検査す
べき透明または半透明の板状体2を介してCCD
カメラなどの撮像装置3により撮像し、前記板状
体2の欠点部を前記線列1の乱れとして検出し
て、この線列の乱れに対応する不規則部分を含む
信号を得て、この信号をバンドパスフイルタに通
して前記不規則部分をカツトしたあと、包絡線回
路によつて包絡線に比例する電圧に変換し、さら
にコンパレータ回路によつてしきい値より高い部
分を矩形波として取出し、これを反転回路によつ
て反転して検出信号を得るものである。
In order to solve the above-mentioned problems, the defect inspection method of the present invention detects that the refractive index of light is different from that of the good quality part in the defect part which is made of the same material as the good quality part but has a different density, and also the defect inspection method This method takes advantage of the fact that light is refracted differently in defective areas due to lens action than in good-quality areas, and is a line consisting of multiple lines arranged at equal intervals narrower than the size of the defective area to be detected. Column 1 is transferred to the CCD via a transparent or semi-transparent plate 2 to be inspected.
An image is taken by an imaging device 3 such as a camera, a defective part of the plate-shaped body 2 is detected as a disturbance in the line array 1, and a signal including an irregular part corresponding to the disturbance in the line array is obtained. is passed through a bandpass filter to cut out the irregular portions, and then converted into a voltage proportional to the envelope by an envelope circuit, and further, a portion higher than the threshold is extracted as a rectangular wave by a comparator circuit. This is inverted by an inverting circuit to obtain a detection signal.

〔作用〕[Effect]

検出すべき欠点部の大きさよりも狭い間隔で等
間隔に配された前記線列1を、検出すべき透明ま
たは半透明の板状体2を介して観察すると、第3
図に示すように、前記板状体2に良質部分と同材
質で密度が異なる欠点部2aや表面の一部が盛り
上がつたりへこんだりした欠点部2aが存在する
と、その部分においては光の屈折の仕方が他の部
分と異なるので、線列1が乱れて、すなわち線列
の間隔、線の太さや濃淡が良質部分と異なつて観
察され、それによつて良質部分と欠点部2aとを
判別でき欠点部2aが検出される。また前記板状
体2に不透明な異物の混入による欠点部が存在す
る場合には、その部分においては前記線列1が観
察されない。そして、このような配列の乱れを
CCDカメラなどの撮像装置により撮像し、線列
の乱れに対応する不規則部分を含む信号を得て、
この信号をバンドパルスフイルタ、包絡線回路、
コンパレータ回路、反転回路によつて順次処理し
て検出信号を得る。
When the line arrays 1 arranged at equal intervals narrower than the size of the defect to be detected are observed through the transparent or translucent plate-like body 2 to be detected, the third
As shown in the figure, if there is a defective part 2a in the plate-shaped body 2 that is made of the same material as the good quality part but has a different density, or a defective part 2a in which a part of the surface is raised or depressed, the light will not be absorbed in that part. Since the way of refraction is different from that of other parts, the line array 1 is disordered, that is, the interval between the line arrays, the thickness and shade of the lines are observed to be different from those of the good quality part, which makes it possible to distinguish between the good quality part and the defective part 2a. A distinguishable defective portion 2a is detected. Further, if there is a defective part in the plate-shaped body 2 due to the contamination of opaque foreign matter, the line array 1 is not observed in that part. Then, such a disordered arrangement is
The image is captured by an imaging device such as a CCD camera, and a signal containing irregular parts corresponding to the disturbance of the line array is obtained.
This signal is passed through a band pulse filter, an envelope circuit,
A detection signal is obtained by sequential processing by a comparator circuit and an inversion circuit.

〔実施例〕〔Example〕

以下、本発明の実施例を図面を用いて説明す
る。
Embodiments of the present invention will be described below with reference to the drawings.

第4図は本発明の方法を実施するための欠点検
査装置であり、検出すべき欠点部の大きさよりも
狭い間隔で等間隔に複数の直線を配してなる線列
1が、直方体の基台4の上面に描かれ、2次元の
撮像装置3が支持棒5を介して上下に移動可能に
基台4に取り付けられたものである。撮像装置3
としては、CCDイメージセンサを利用したCCD
カメラが用いられる。この撮像装置3は、その撮
像視野内に線列1が位置するように調整されてい
る。基台4には撮像装置3の視野の範囲を調整た
り、撮像装置3を上下に移動させたりするための
制御回路、撮像装置3からの信号から欠点部を判
別する信号処理回路、欠点部の位置や大きさ等を
記憶する記憶回路、欠点部の位置や大きさ等を表
示するデイスプレイ等が内蔵されている。
FIG. 4 shows a defect inspection device for carrying out the method of the present invention, in which a line array 1 consisting of a plurality of straight lines arranged at equal intervals narrower than the size of the defect to be detected is the base of a rectangular parallelepiped. A two-dimensional imaging device 3 is depicted on the top surface of a base 4 and is attached to the base 4 via a support rod 5 so as to be movable up and down. Imaging device 3
As a CCD using a CCD image sensor
A camera is used. This imaging device 3 is adjusted so that the line array 1 is located within its imaging field of view. The base 4 includes a control circuit for adjusting the field of view of the imaging device 3 and moving the imaging device 3 up and down, a signal processing circuit for determining a defective portion from a signal from the imaging device 3, and a signal processing circuit for determining a defective portion from a signal from the imaging device 3. It has a built-in memory circuit that stores the position, size, etc., and a display that displays the position, size, etc. of the defective part.

第5図は信号処理回路の構成を示すブロツク図
である。10は信号の一定の周波数の部分だけを
通すバンドパスフイルタで、11は半波または全
波整流回路と低域フイルタを用いて信号の包絡線
に比例した電圧をとり出す包絡線回路である。そ
して12は電圧があるしきい値よりも高いか低い
かを比較するコンパレータ回路であり、13は出
力を反転する反転回路である。
FIG. 5 is a block diagram showing the configuration of the signal processing circuit. 10 is a bandpass filter that passes only a certain frequency portion of the signal, and 11 is an envelope circuit that uses a half-wave or full-wave rectifier circuit and a low-pass filter to extract a voltage proportional to the envelope of the signal. 12 is a comparator circuit that compares whether the voltage is higher or lower than a certain threshold value, and 13 is an inverting circuit that inverts the output.

次にこの装置の動作について説明する。撮像装
置3は検査すべき透明または半透明の板状体2を
介して線列1をそれと直交する方向に水平走査す
る(第6図参照)。線列1は等間隔に配されてい
るので、一定周期の規則正しいパルス信号が得ら
れる(第7図の参照)。しかし、板状体2に、
良質部分と同材質で密度が異なる欠点部2aや表
面の一部が盛り上がつたりへこんだりした欠点部
2aが存在すると、その部分においては、他の部
分と光の屈折の仕方が異なるので、前記線列1の
間隔、線の太さや濃度が変化したものが撮像さ
れ、周期やパルス幅等が前記の規則正しいパルス
信号とは異なる信号が現われる(第7図の
()〜()参照)。信号処理回路において前記
パルス信号は、まずバンドパスフイルタ10に通
され、規則信号と同一の周波数を有する信号部分
以外がカツトされ、第7図ののような波形にな
る。次にこの信号は包絡線回路11によつて包絡
線に比例する電圧に変換され(第7図)、さら
にコンパレータ回路12によつてしきい値TH
り高いか低いかが比較され、第7図のの波形に
なる。そして反転回路13によつて反転され検出
信号とされる(第7図の)。
Next, the operation of this device will be explained. The imaging device 3 horizontally scans the line array 1 in a direction orthogonal thereto through the transparent or semi-transparent plate-like body 2 to be inspected (see FIG. 6). Since the line arrays 1 are arranged at equal intervals, a regular pulse signal with a constant period can be obtained (see FIG. 7). However, in the plate-like body 2,
If there is a defective part 2a made of the same material as the good quality part but with a different density or a defective part 2a where a part of the surface is raised or depressed, the way light is refracted in that part is different from that in other parts. , an image is taken of the line array 1 whose interval, line thickness, and density have changed, and a signal whose period, pulse width, etc. differ from the regular pulse signal described above appears (see () to () in Fig. 7). . In the signal processing circuit, the pulse signal is first passed through a band pass filter 10, and the signal portion other than the signal portion having the same frequency as the regular signal is cut out, resulting in a waveform as shown in FIG. Next, this signal is converted into a voltage proportional to the envelope by the envelope circuit 11 (Fig. 7), and further compared by the comparator circuit 12 to see whether it is higher or lower than the threshold value T H , as shown in Fig. 7. The waveform will be as follows. Then, it is inverted by the inverting circuit 13 and used as a detection signal (see FIG. 7).

一回の水平走査が終ると、それに垂直な方向へ
所定距離だけずらして同様に水平走査が行なわれ
る。これが第6図のI〜のように順次繰り返さ
れて所要範囲が2次元に走査され、欠点部2aの
有無やその大きさが検査される。
When one horizontal scan is completed, a similar horizontal scan is performed with a predetermined distance shifted in the direction perpendicular to the horizontal scan. This is repeated sequentially as shown in I to 6 of FIG. 6, and the required range is two-dimensionally scanned, and the presence or absence of the defective portion 2a and its size are inspected.

また、前記板状体2に不透明な欠点部が存在す
ると、その部分においては線列1が撮像されず、
この線列1に対応する信号が現われないので、信
号の規則性が乱れて、前記と同様に検出信号が得
られる。
Further, if there is an opaque defective part in the plate-like body 2, the line array 1 will not be imaged in that part,
Since the signal corresponding to this line array 1 does not appear, the regularity of the signal is disturbed and a detection signal is obtained in the same way as above.

なお、撮像装置3としては、CCDカメラのほ
かに、MOS形イメージセンサ等の固体撮像デバ
イスや撮像管を用いたカムラが使用される。
As the imaging device 3, in addition to a CCD camera, a camera using a solid-state imaging device such as a MOS image sensor or an imaging tube is used.

また、上記の実施例のような2次元の撮像装置
3を用いずに第8図に示すようにラインセンサで
あるCCDやMOS形イメージセンサを用いた一次
元撮像装置6を使用し、検査対象となる透明また
は半透明の板状体2を介して、線列1をそれと直
交する方向に走査し、搬送装置7を用いて板状体
2を線列1に沿う方向に移動させることによつ
て、板状体2の所要範囲を2次元に走査するよう
にしてもよい。第8図において、6aは撮像装置
6を使用するために必要な照度を供給する光源
で、7aは搬送装置7の駆動用モータ、7bは搬
送用ベルトである。そして9は撮像装置6の出力
信号から欠点部の検出信号を得るための処理装置
である。
In addition, instead of using the two-dimensional imaging device 3 as in the above embodiment, a one-dimensional imaging device 6 using a line sensor such as a CCD or a MOS image sensor is used as shown in FIG. By scanning the line array 1 in a direction perpendicular to it through a transparent or translucent plate-like body 2, and moving the plate-like body 2 in the direction along the line array 1 using the conveying device 7. Accordingly, the required range of the plate-shaped body 2 may be scanned two-dimensionally. In FIG. 8, 6a is a light source that supplies illuminance necessary for using the imaging device 6, 7a is a driving motor for the conveying device 7, and 7b is a conveying belt. Reference numeral 9 denotes a processing device for obtaining a defect detection signal from the output signal of the imaging device 6.

なお、本発明の検出方法によると、線列1の間
隔によつて欠点部2aの検出分解能が決まるの
で、線列1の間隔を変えることによつて検出でき
る欠点部2aの大きさを容易に選択することがで
きる。
According to the detection method of the present invention, the detection resolution of the defective part 2a is determined by the interval between the line arrays 1, so by changing the interval between the line arrays 1, the size of the detectable defective part 2a can be easily adjusted. You can choose.

本発明の欠点検査方法は、撮像装置を用いずに
検査対象となる板状体2を介して線列1を目視す
る場合も含まれる。
The defect inspection method of the present invention also includes a case where the line array 1 is visually observed through the plate-shaped object 2 to be inspected without using an imaging device.

〔発明の効果〕〔Effect of the invention〕

以上詳述したように、本発明の欠点検査方法は
光の透過度の大小ではなく光の屈折の違いを利用
しているので、不透明な異物の混入による欠点部
だけでなく、良質部分と同材質で密度が異なる欠
点部や表面の一部が盛り上がつたりへこんだりし
た欠点部等の透明または半透明の欠点部をも確実
に検出できる。しかも、検査の対象となる透明ま
たは半透明の板状体を介して線列を観察するだけ
で、板状体の欠点部を容易にかつ簡単な装置で安
価に実施できる。さらに本発明では、基準となる
等間隔の線列を、検査すべき透明または半透明の
板状体を介して撮像することにより板状体の欠点
部を線列の乱れとしてとらえ、撮像により得られ
た信号から線列の乱れに対応する不規則部分のみ
を検出回路により取出すものであるから、前記線
列を正確に等間隔に配しておきさえすれば、撮像
装置と線列との相対的位置関係が設定後に変動し
た場合でも欠点部を正確に検出できる。
As detailed above, the defect inspection method of the present invention utilizes differences in light refraction rather than the magnitude of light transmittance, so it detects not only defects caused by opaque foreign matter but also defects that are the same as good quality parts. It is also possible to reliably detect transparent or translucent defects such as defects with different densities depending on the material and defects where a portion of the surface is raised or depressed. Moreover, by simply observing the line array through the transparent or semi-transparent plate-like object to be inspected, defective parts of the plate-like object can be easily and inexpensively inspected using a simple device. Furthermore, in the present invention, by imaging a standard line array at regular intervals through a transparent or semi-transparent plate-like body to be inspected, defects in the plate-like body are detected as disturbances in the line array, and the image is obtained by imaging. Since the detection circuit extracts only the irregular portions corresponding to the disturbances in the line array from the received signal, as long as the line arrays are arranged at exactly equal intervals, the relative relationship between the imaging device and the line array is Even if the target positional relationship changes after setting, the defective part can be detected accurately.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の欠点検査方法を示す斜視図、
第2図は同方法を示す正面図、第3図は本発明の
方法の原理を示す平面図、第4図は本発明の方法
を実施するための装置の一例を示す斜視図、第5
図は同装置の信号処理回路の構成を示すブロツク
図、第6図は撮像装置による板状体の走査を示す
平面図、第7図は第6図の各部に対応する撮像装
置からの信号および第5図に対応する各部の信号
を示す動作特性図、第8図は本発明の方法を実施
するための装置の他の例を示す斜視図である。 符号の説明、1……線列、2……透明または半
透明の板状体、2a……欠点部、3,6……撮像
装置、10……バンドパスフイルタ、11……包
絡線回路、12……コンパレータ回路、13……
反転回路。
FIG. 1 is a perspective view showing the defect inspection method of the present invention;
FIG. 2 is a front view showing the method, FIG. 3 is a plan view showing the principle of the method of the present invention, FIG. 4 is a perspective view showing an example of an apparatus for carrying out the method of the present invention, and FIG.
The figure is a block diagram showing the configuration of the signal processing circuit of the same device, FIG. 6 is a plan view showing scanning of a plate-like object by the imaging device, and FIG. FIG. 5 is an operating characteristic diagram showing signals of each part corresponding to FIG. 5, and FIG. 8 is a perspective view showing another example of an apparatus for carrying out the method of the present invention. Explanation of symbols, 1... Line array, 2... Transparent or translucent plate-like body, 2a... Defect part, 3, 6... Imaging device, 10... Band pass filter, 11... Envelope circuit, 12... Comparator circuit, 13...
Inverting circuit.

Claims (1)

【特許請求の範囲】[Claims] 1 透明または半透明の板状体を検査して欠点部
を検出する検査方法において、検出すべき欠点部
の大きさよりも狭い間隔で等間隔に複数の線を配
してなる線列を検査すべき透明または半透明の板
状体を介してCCDカメラなどの撮像装置により
撮像することにより、前記板状体の欠点部に起因
する前記線列の乱れを撮像し、この線列の乱れに
対応する不規則部分を含む信号を前記撮像装置か
らバンドパスフイルタに送つて前記不規則部分を
カツトし、包絡線回路によつて包絡線に比例する
電圧に変換し、さらにコンパレータ回路によつて
しきい値より高い部分を矩形波として取出し、こ
れを反転回路によつて反転して検出信号を得るこ
とにより前記欠点部を検出することを特徴とする
透明または半透明の板状体の欠点検査方法。
1 In an inspection method that detects defects by inspecting a transparent or translucent plate-like object, a line array consisting of a plurality of lines arranged at equal intervals narrower than the size of the defect to be detected is inspected. By capturing an image with an imaging device such as a CCD camera through a transparent or semi-transparent plate-like body, disturbances in the line array caused by defects in the plate-like body are imaged, and countermeasures are taken to deal with the disorder in the line array. A signal containing an irregular part is sent from the imaging device to a bandpass filter to cut out the irregular part, converted into a voltage proportional to the envelope by an envelope circuit, and further converted to a voltage proportional to the envelope by a comparator circuit. A defect inspection method for a transparent or semi-transparent plate-shaped body, characterized in that the defect is detected by extracting a portion higher than the value as a rectangular wave and inverting it by an inverting circuit to obtain a detection signal.
JP1815185A 1985-01-31 1985-01-31 Inspection of defect of transparent or semi-transparent plate-shaped body Granted JPS61176838A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1815185A JPS61176838A (en) 1985-01-31 1985-01-31 Inspection of defect of transparent or semi-transparent plate-shaped body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1815185A JPS61176838A (en) 1985-01-31 1985-01-31 Inspection of defect of transparent or semi-transparent plate-shaped body

Publications (2)

Publication Number Publication Date
JPS61176838A JPS61176838A (en) 1986-08-08
JPH0511573B2 true JPH0511573B2 (en) 1993-02-15

Family

ID=11963609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1815185A Granted JPS61176838A (en) 1985-01-31 1985-01-31 Inspection of defect of transparent or semi-transparent plate-shaped body

Country Status (1)

Country Link
JP (1) JPS61176838A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000018922A (en) * 1998-07-02 2000-01-21 Toshiba Eng Co Ltd Apparatus for thickness defect inspection and its inspection method

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750038B2 (en) * 1990-10-04 1995-05-31 三井東圧化学株式会社 Measuring method of see-through characteristics of plastic film
JP2795595B2 (en) * 1992-06-26 1998-09-10 セントラル硝子株式会社 Defect detection method for transparent plate
JP3178644B2 (en) * 1995-02-10 2001-06-25 セントラル硝子株式会社 Defect detection method for transparent plate
JP3806557B2 (en) * 1999-10-25 2006-08-09 トタニ技研工業株式会社 Heat seal position detection device for plastic film
JP4650096B2 (en) * 2005-05-20 2011-03-16 凸版印刷株式会社 Coating unevenness inspection method and program thereof
JPWO2010117004A1 (en) * 2009-04-09 2012-10-18 旭硝子株式会社 Ream detection method for light transmitting plate-like object

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48102653A (en) * 1972-04-10 1973-12-24

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48102653A (en) * 1972-04-10 1973-12-24

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000018922A (en) * 1998-07-02 2000-01-21 Toshiba Eng Co Ltd Apparatus for thickness defect inspection and its inspection method

Also Published As

Publication number Publication date
JPS61176838A (en) 1986-08-08

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