JPH05110197A - Semiconductor laser - Google Patents
Semiconductor laserInfo
- Publication number
- JPH05110197A JPH05110197A JP29481391A JP29481391A JPH05110197A JP H05110197 A JPH05110197 A JP H05110197A JP 29481391 A JP29481391 A JP 29481391A JP 29481391 A JP29481391 A JP 29481391A JP H05110197 A JPH05110197 A JP H05110197A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- quantum well
- active layer
- semiconductor
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体レーザに関し、
特に、半導体レーザの低しきい値化、高効率化、及び高
出力化に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor laser,
In particular, the present invention relates to a semiconductor laser having a lower threshold, higher efficiency, and higher output.
【0002】[0002]
【従来の技術】従来、面内方向の導波路を有する半導体
レーザであって、活性層に量子井戸が形成された量子井
戸レーザは、Japanese Journal of Applied Physics 2
6, (1987) L302で報告されているように、活性層に(0
01)方向あるいは(111)方向の量子井戸が形成さ
れている。この様な構造を有する量子井戸レーザでは、
量子井戸を有していない半導体レーザに比べ、活性層で
のTE波に対する光学遷移行列要素が1.5倍になると
いう特徴がある。2. Description of the Related Art Conventionally, a quantum well laser having a quantum well formed in an active layer, which is a semiconductor laser having an in-plane waveguide, is disclosed in Japanese Journal of Applied Physics 2
6, (1987) L302, the active layer (0
Quantum wells of (01) direction or (111) direction are formed. In a quantum well laser having such a structure,
It is characterized in that the optical transition matrix element for TE waves in the active layer is 1.5 times as large as that of a semiconductor laser having no quantum well.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、半導体
レーザでは、さらなる低しきい値化、高効率化、及び高
出力化、即ち光学遷移行列要素を大きくすることが望ま
れている。本発明は、活性層に(001)方向あるいは
(111)方向の量子井戸を形成した半導体レーザより
もさらに光学遷移行列要素の大きい半導体レーザを提供
することを目的とする。However, in the semiconductor laser, it is desired to further reduce the threshold, increase the efficiency, and increase the output, that is, increase the optical transition matrix element. An object of the present invention is to provide a semiconductor laser having an optical transition matrix element larger than that of a semiconductor laser in which a quantum well of (001) direction or (111) direction is formed in an active layer.
【0004】[0004]
【課題を解決するための手段】本発明によれば、活性層
中に量子井戸を有する半導体レーザにおいて、前記量子
井戸を閃亜鉛鉱型結晶構造の半導体による(001)方
向及び(111)方向を除く所定方向の量子井戸とした
ことを特徴とする半導体レーザが得られる。According to the present invention, in a semiconductor laser having a quantum well in an active layer, the quantum well is formed in a (001) direction and a (111) direction by a semiconductor having a zinc blende type crystal structure. A semiconductor laser having a quantum well in a predetermined direction other than that can be obtained.
【0005】[0005]
【実施例】以下に図面を参照して本発明の実施例を説明
する。本実施例の半導体レーザは、GaAs(110)
基板11上に、Al0.35Ga0.65As n型クラッド層
12を1μm、GaAs/Al0.35Ga0.65As多重量
子井戸 活性層13を0.05μm、Al0.35Ga0.65
As p型クラッド層14を1μm、及びGaAsキャ
ップ層15を0.5μm、順次有機金属気相エピタキシ
法により成長させてある。ここで、活性層13は、膜厚
5nmのAl組成35%のAlGaAs層と、膜厚5n
mのGaAs層を5周期積層した(110)方向の多重
量子井戸である。また、活性層13は幅4μmの[00
1]方向のリッジ構造とし、[001]方向の導波路を
形成している。さらに、この半導体レーザは、両端面を
反応性イオンエッチングにより鏡面としてファブリーペ
ロー型共振器が形成されている。Embodiments of the present invention will be described below with reference to the drawings. The semiconductor laser of this embodiment is GaAs (110).
On the substrate 11, Al 0.35 Ga 0.65 As n-type cladding layer 12 is 1 μm, GaAs / Al 0.35 Ga 0.65 As multiple quantum well active layer 13 is 0.05 μm, and Al 0.35 Ga 0.65.
The As p-type clad layer 14 and the GaAs cap layer 15 were sequentially grown to a thickness of 1 μm and 0.5 μm, respectively, by a metalorganic vapor phase epitaxy method. Here, the active layer 13 includes an AlGaAs layer having a film thickness of 5 nm and an Al composition of 35%, and a film thickness of 5 n.
It is a multiple quantum well in the (110) direction in which five m GaAs layers are stacked. In addition, the active layer 13 has a width of 4 μm [00
A ridge structure in the [1] direction is formed, and a waveguide in the [001] direction is formed. Further, in this semiconductor laser, Fabry-Perot resonators are formed by mirroring both end surfaces by reactive ion etching.
【0006】上記構成の半導体レーザでは、[001]
方向に伝搬するTE波に対する光学遷移行列要素は、量
子井戸を形成しない場合に比べ、約1.6倍になる。即
ち、半導体レーザのさらなる低しきい値化、高効率化、
及び高出力化を計ることができた。なお、素子特性であ
るしきい値電流密度は160A/cm2 であった。In the semiconductor laser having the above structure, [001]
The optical transition matrix element for the TE wave propagating in the direction is about 1.6 times that in the case where no quantum well is formed. That is, the threshold value of the semiconductor laser is further lowered, the efficiency is improved,
And it was possible to measure high output. The threshold current density, which is a device characteristic, was 160 A / cm 2 .
【0007】なお、上記実施例では、AlGaAs系の
半導体レーザについて説明したが、活性層が閃亜鉛鉱型
結晶構造の半導体からなる半導体レーザであれば、Al
GaInP系及びGaInAsP系などのIII −V族
系、あるいはII−IV族系半導体レーザであっても本発明
を適用することができる。また、上記実施例では、活性
層をリッジ構造とすることで導波路の形成を行ったが、
他の方法により導波路を形成しても良い。さらに、上記
実施例では、ファブリーペロー型半導体レーザについて
説明したが、分布帰還型半導体レーザや分布反射型半導
体レーザであっても良い。さらにまた、上記実施例では
n型基板上に半導体レーザを作製したが、極性のことな
る基板を使用しても良い。In the above embodiment, the AlGaAs semiconductor laser has been described, but if the active layer is a semiconductor laser having a zincblende crystal structure semiconductor, Al
The present invention can be applied to a III-V group semiconductor laser or a II-IV group semiconductor laser such as a GaInP system and a GaInAsP system. Further, in the above embodiment, the waveguide is formed by forming the active layer into a ridge structure.
The waveguide may be formed by another method. Furthermore, although the Fabry-Perot type semiconductor laser has been described in the above embodiment, it may be a distributed feedback type semiconductor laser or a distributed reflection type semiconductor laser. Furthermore, although the semiconductor laser is manufactured on the n-type substrate in the above embodiment, a substrate having different polarities may be used.
【0008】[0008]
【発明の効果】本発明によれば、活性層中に量子井戸を
有する半導体レーザにおいて、前記量子井戸を閃亜鉛鉱
型結晶構造の半導体による(001)方向及び(11
1)方向を除く所定方向の量子井戸としたことにより、
半導体レーザの低しきい値化、高効率化、及び高出力化
を図ることができる。According to the present invention, in a semiconductor laser having a quantum well in an active layer, the quantum well is formed by a semiconductor having a zinc blende type crystal structure in the (001) direction and (11).
1) By using quantum wells in a predetermined direction excluding the direction,
It is possible to reduce the threshold value, increase the efficiency, and increase the output of the semiconductor laser.
【図1】本発明の一実施例の斜視図である。FIG. 1 is a perspective view of an embodiment of the present invention.
11 GaAs(110)基板 12 Al0.35Ga0.65As n型クラッド層 13 GaAs/Al0.35Ga0.65As多重量子井
戸 活性層 14 Al0.35Ga0.65As p型クラッド層 15 GaAsキャップ層11 GaAs (110) substrate 12 Al 0.35 Ga 0.65 As n-type cladding layer 13 GaAs / Al 0.35 Ga 0.65 As multiple quantum well active layer 14 Al 0.35 Ga 0.65 As p-type cladding layer 15 GaAs cap layer
Claims (4)
レーザにおいて、前記量子井戸を閃亜鉛鉱型結晶構造の
半導体からなる(001)方向及び(111)方向を除
く所定方向の量子井戸としたことを特徴とする半導体レ
ーザ。1. A semiconductor laser having a quantum well formed in an active layer, wherein the quantum well is a quantum well made of a semiconductor having a zinc blende type crystal structure and having a predetermined direction other than the (001) direction and the (111) direction. A semiconductor laser characterized in that
の振動子強度が最大となる基板面内方向の導波路が形成
されていることを特徴とする請求項1の半導体レーザ。2. The semiconductor laser according to claim 1, wherein a waveguide is formed in the in-plane direction of the substrate that maximizes the oscillator strength of optical transition with respect to TE waves in the active layer.
請求項1または請求項2の半導体レーザ。3. The semiconductor laser according to claim 1, which is formed on a surface of a substrate in the predetermined direction.
とを特徴とする請求項1、請求項2、または請求項3の
半導体レーザ。4. The semiconductor laser according to claim 1, wherein the predetermined direction is a (110) direction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29481391A JPH05110197A (en) | 1991-10-16 | 1991-10-16 | Semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29481391A JPH05110197A (en) | 1991-10-16 | 1991-10-16 | Semiconductor laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05110197A true JPH05110197A (en) | 1993-04-30 |
Family
ID=17812588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29481391A Withdrawn JPH05110197A (en) | 1991-10-16 | 1991-10-16 | Semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05110197A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5102649A (en) * | 1989-11-13 | 1992-04-07 | Sakai Chemical Industry Co. | Process for producing peroxoniobic acid sol |
-
1991
- 1991-10-16 JP JP29481391A patent/JPH05110197A/en not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5102649A (en) * | 1989-11-13 | 1992-04-07 | Sakai Chemical Industry Co. | Process for producing peroxoniobic acid sol |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19990107 |