JPH05107305A - Testing method for semiconductor integrated circuit - Google Patents

Testing method for semiconductor integrated circuit

Info

Publication number
JPH05107305A
JPH05107305A JP3193293A JP19329391A JPH05107305A JP H05107305 A JPH05107305 A JP H05107305A JP 3193293 A JP3193293 A JP 3193293A JP 19329391 A JP19329391 A JP 19329391A JP H05107305 A JPH05107305 A JP H05107305A
Authority
JP
Japan
Prior art keywords
measurement
semiconductor integrated
items
test
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP3193293A
Other languages
Japanese (ja)
Inventor
Toshihiko Muramatsu
利彦 村松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamaha Corp
Original Assignee
Yamaha Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamaha Corp filed Critical Yamaha Corp
Priority to JP3193293A priority Critical patent/JPH05107305A/en
Publication of JPH05107305A publication Critical patent/JPH05107305A/en
Withdrawn legal-status Critical Current

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  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To reduce measurement time so as to reduce a cost by precedingly measuring the item for which required measurement time is short and which is strongly related with measurement items, and selectively measuring specific items based on them. CONSTITUTION:The characteristics of individual semiconductor integrated circuits formed on a semiconductor wafer are measured, and the acceptance-or- rejection of these circuits are judged based on the result. In this case, the item for which measurement time is relatively short and the measurement result is strongly related to acceptance rate of other measurement items are precedingly measured. Specific items among the items except the measurement- finished items are selectively measured based on the measured result. Optimum measurement items in compliance with the circuit characteristics are selectively measured among all measurement items for individual semiconductor integrated circuits, the time required for the test of each semiconductor integrated circuit can be reduced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、半導体ウェハに形成
された個々の半導体集積回路が目的とする機能を果し得
るか否かの合否判定を行う半導体集積回路の試験方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor integrated circuit test method for determining whether each individual semiconductor integrated circuit formed on a semiconductor wafer can fulfill its intended function.

【0002】[0002]

【従来の技術】IC(半導体集積回路)の生産におい
て、半導体ウェハ上にICが形成された段階において、
所定のテストプログラムに従って、個々のICが目的と
する機能を果し得るか否かの電気的特性試験が行われ
る。例えばMOS(金属酸化膜半導体型トランジスタ)
ICの場合、図2にそのフローを例示するテストプログ
ラムに従って、個々のICの合否判定が行われていた。
まず、ステップS1に進み、ICチップ上の各端子(こ
の場合はボンディングパッド)に対するオープン/ショ
ートチェックが行われる。このオープン/ショートチェ
ックにおいては、各端子(この場合はボンディングパッ
ド)と、半導体基板間との間の導通試験が行われ、この
導通試験の結果に基づいて、各端子とそれに接続される
入力回路の入力端あるいは出力回路の出力端との間の配
線の断線の有無が判定されると共に、各端子と他の配線
または半導体基板との短絡の有無が判定される。このオ
ープン/ショートチェックの結果が不合格である場合は
そのICチップを不良品であると判断して試験を終了
し、合格である場合はステップS2に進む。次にステッ
プS2に進むと、保証電源電圧範囲の上限よりも所定の
電圧値だけ高い電源電圧設定により、ICチップの機能
試験を行う。この機能試験においては、ICチップの各
入力端子に対し、所定の時系列パターンによる入力信号
が供給され、各出力端子から正常な出力信号が得られる
か否かが判定される。この機能試験の結果が不合格であ
る場合はそのICチップが不良品であると判断して試験
を終了し、合格である場合はステップS3に進む。次に
ステップS3に進むと、保証電源電圧範囲の下限よりも
所定電圧値だけ低い電源電圧設定によりステップS2に
て行ったのと同様な機能試験を行う。この機能試験の結
果が不合格である場合はそのICチップが不良品である
と判断して試験を終了し、合格である場合はステップS
4に進む。次にステップS4に進むと、出力端子電流テ
ストを行う。この出力端子電流テストにおいては、各出
力端子がハイレベルである時にその出力端子からICテ
スタ側に流れ出すハイレベル出力電流IOHと、各出力
端子がロウレベルである時にICテスタ側からその出力
端子に流れ込むロウレベル出力電流IOLとが共に規格
値を満足するか否かが判定される。そして、ステップS
4における測定結果が不合格である場合はそのICチッ
プが不良品であると判断して試験を終了し、合格である
場合はステップS5に進む。次にステップS5に進む
と、各入力端子に対して所定の電圧を印加し、各入力端
子におけるリーク電流の値が所定値以下であるか否かが
判定される。この判定結果が不合格である場合はそのI
Cが不良品であると判断して試験を終了し、合格である
場合はそのICが良品であると判断して試験を終了す
る。
2. Description of the Related Art In the production of ICs (semiconductor integrated circuits), when ICs are formed on a semiconductor wafer,
According to a predetermined test program, an electrical characteristic test is performed to determine whether each IC can perform its intended function. For example, MOS (metal oxide semiconductor transistor)
In the case of IC, the pass / fail judgment of each IC is made according to the test program whose flow is illustrated in FIG.
First, in step S1, an open / short check is performed on each terminal (bonding pad in this case) on the IC chip. In this open / short check, a continuity test is performed between each terminal (bonding pad in this case) and the semiconductor substrate, and based on the result of this continuity test, each terminal and the input circuit connected to it. The presence or absence of disconnection of the wiring between the input terminal or the output terminal of the output circuit is determined, and the presence or absence of a short circuit between each terminal and another wiring or the semiconductor substrate is determined. If the result of this open / short check is unsuccessful, the IC chip is judged to be a defective product and the test is terminated. If it is acceptable, the process proceeds to step S2. Next, in step S2, a functional test of the IC chip is performed by setting the power supply voltage higher than the upper limit of the guaranteed power supply voltage range by a predetermined voltage value. In this functional test, an input signal having a predetermined time-series pattern is supplied to each input terminal of the IC chip, and it is determined whether a normal output signal is obtained from each output terminal. If the result of this function test is unacceptable, it is determined that the IC chip is a defective product, and the test is terminated. If the result is acceptable, the process proceeds to step S3. Next, in step S3, the same function test as that performed in step S2 is performed by setting the power supply voltage lower by the predetermined voltage value than the lower limit of the guaranteed power supply voltage range. If the result of this function test is unacceptable, it is determined that the IC chip is a defective product, and the test is terminated.
Go to 4. Next, in step S4, an output terminal current test is performed. In this output terminal current test, a high level output current IOH flowing from the output terminal to the IC tester side when each output terminal is at the high level, and a high level output current IOH flowing from the IC tester side to the output terminal when each output terminal is at the low level It is determined whether the low level output current IOL and the low level output current IOL both satisfy the standard value. And step S
If the measurement result in 4 is unacceptable, it is determined that the IC chip is a defective product, and the test is terminated. If the result is acceptable, the process proceeds to step S5. Next, proceeding to step S5, a predetermined voltage is applied to each input terminal, and it is determined whether or not the value of the leak current at each input terminal is equal to or less than the predetermined value. If this judgment result is unacceptable, I
When C is judged to be a defective product, the test is ended, and when it is acceptable, the IC is judged to be a good product and the test is ended.

【0003】[0003]

【発明が解決しようとする課題】ところで、半導体ウェ
ハにICが形成された段階で行う試験は、ウェハ上に形
成された極めて多数のICチップのすべてを試験対象と
している。また、この試験は、多数の不良ICチップが
次工程たる組み立て工程に投入されることがないよう
に、未然に除去することを目的として行うものである。
従って、IC1個を試験するための測定時間は極力短い
ことが好ましい。しかしながら、上述した従来の試験方
法は、1個の良品ICチップが良品であると判定される
までに行われる測定項目が多く、IC1個当りの測定時
間が長いという問題があった。特にICの回路構成が大
規模であったり、複雑であったりする場合、機能試験に
要する時間が長くなり、全測定時間は極めて長くなる。
また、各測定項目が一定の順序に従って実施されるた
め、最終測定項目において不合格となった場合における
時間的損失が大きい。このようにICの試験に要する時
間が長かったため、製造コストの増大を招いていた。こ
の発明は上述した事情に鑑みてなされたものであり、1
個当りの測定時間が短くて済む半導体集積回路の試験方
法を提供することを目的とする。
By the way, the test carried out at the stage when ICs are formed on a semiconductor wafer targets all of a large number of IC chips formed on the wafer. Further, this test is performed for the purpose of removing a large number of defective IC chips in advance so that they are not put into the assembly process which is the next process.
Therefore, it is preferable that the measurement time for testing one IC is as short as possible. However, the conventional test method described above has a problem in that many measurement items are performed until one good IC chip is determined to be a good product, and the measurement time per IC is long. Especially when the circuit configuration of the IC is large-scale or complicated, the time required for the functional test becomes long and the total measurement time becomes extremely long.
Moreover, since each measurement item is performed in a fixed order, the time loss is large when the final measurement item fails. As described above, the time required to test the IC is long, which causes an increase in manufacturing cost. The present invention has been made in view of the above-mentioned circumstances.
It is an object of the present invention to provide a semiconductor integrated circuit test method that requires a short measurement time for each unit.

【0004】[0004]

【課題を解決するための手段】この発明は、半導体ウェ
ハに形成された個々の半導体集積回路の各種電気的特性
を測定し、各測定結果に基づいて当該半導体集積回路の
合否を判定する半導体集積回路の試験方法において、比
較的測定時間が短く、かつ、当該測定結果と他の測定項
目における合格率との相関関係の強い測定項目を先行し
て実施し、前記測定結果に基づいて、実施済みの測定項
目以外の測定項目のうち特定の測定項目を選択して実施
することを特徴とする。
SUMMARY OF THE INVENTION The present invention is a semiconductor integrated circuit which measures various electrical characteristics of individual semiconductor integrated circuits formed on a semiconductor wafer and judges pass / fail of the semiconductor integrated circuit based on the measurement results. In the circuit test method, the measurement time is relatively short, and the measurement item with a strong correlation between the measurement result and the pass rate of other measurement items is performed in advance, and the measurement result has already been performed. It is characterized in that a specific measurement item is selected and executed from the measurement items other than the measurement item of.

【0005】[0005]

【作用】上記試験方法によれば、個々の半導体集積回路
に対し、全測定項目のうち、当該半導体集積回路の特性
に応じた最適な測定項目が選択されて実施される。従っ
て、半導体集積回路1個当りの試験に要する時間が短く
て済む。
According to the above test method, for each semiconductor integrated circuit, the optimum measurement item according to the characteristics of the semiconductor integrated circuit is selected from all the measurement items and executed. Therefore, the time required for the test per semiconductor integrated circuit can be shortened.

【0006】[0006]

【実施例】以下、図面を参照し、この発明の一実施例を
説明する。図1はこの発明の一実施例による試験方法を
適用したMOSICのテストプログラムを示すフローチ
ャートである。まず、ステップS11に進み、オープン
/ショートチェックを行う。この測定結果が不合格であ
る場合はそのICチップが不良品であると判断して試験
を終了し、合格である場合はステップS12に進む。次
にステップS12に進むと、各出力端子について、ハイ
レベル出力電流IOHおよびロウレベル出力電流IOL
を測定する。この測定結果が不合格である場合はそのI
Cチップが不良品であると判断して試験を終了し、合格
である場合はステップS13に進む。次にステップS1
3に進むと、ステップS12において測定したIOHお
よびIOLの値と所定値Aとを比較する。そして、IO
HおよびIOLがA以上である場合はステップS14に
進み、Aより低い値である場合はステップS16に進
む。ステップS14に進むと、保証電源電圧範囲よりも
所定電圧値だけ高い電源電圧設定により機能試験を行
う。この機能試験の結果が不合格であればそのICチッ
プが不良品であると判断して試験を終了し、合格であれ
ばステップS15に進む。次にステップS15に進む
と、各入力端子のリーク電流を測定する。この測定結果
が不合格である場合はそのICが不良品であると判断し
て試験を終了し、合格である場合はそのICが良品であ
ると判断して試験を終了する。一方、ステップS13か
らステップS16に進むと、保証電源電圧範囲よりも所
定電圧値だけ低い電源電圧設定により機能試験を行う。
この機能試験の結果が不合格であればそのICチップが
不良品であると判断して試験を終了し、合格であればス
テップS16に進む。次にステップS16に進むと、各
入力端子のリーク電流を測定する。この測定結果が不合
格である場合はそのICが不良品であると判断して試験
を終了し、合格である場合はそのICが良品であると判
断して試験を終了する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a flowchart showing a MOSIC test program to which a test method according to an embodiment of the present invention is applied. First, in step S11, an open / short check is performed. If the measurement result is unacceptable, the IC chip is determined to be a defective product and the test is terminated. If the result is acceptable, the process proceeds to step S12. Next, when proceeding to step S12, the high level output current IOH and the low level output current IOL are output for each output terminal.
To measure. If this measurement result is unacceptable, I
The test is terminated by determining that the C chip is defective, and if the test is acceptable, the process proceeds to step S13. Then step S1
In step 3, the values of IOH and IOL measured in step S12 are compared with the predetermined value A. And IO
When H and IOL are A or more, it progresses to step S14, and when it is a value lower than A, it progresses to step S16. In step S14, the function test is performed by setting the power supply voltage higher than the guaranteed power supply voltage range by a predetermined voltage value. If the result of this function test is unacceptable, it is determined that the IC chip is a defective product, and the test is terminated. If the result is acceptable, the process proceeds to step S15. Next, in step S15, the leak current of each input terminal is measured. If this measurement result is unacceptable, the IC is judged to be a defective product and the test is ended, and if it is acceptable, the IC is judged to be a non-defective product and the test is ended. On the other hand, when the process proceeds from step S13 to step S16, the functional test is performed by setting the power supply voltage lower than the guaranteed power supply voltage range by the predetermined voltage value.
If the result of this function test is unacceptable, it is determined that the IC chip is a defective product, and the test is terminated. If the result is acceptable, the process proceeds to step S16. Next, in step S16, the leak current of each input terminal is measured. If this measurement result is unacceptable, the IC is judged to be a defective product and the test is ended, and if it is acceptable, the IC is judged to be a non-defective product and the test is ended.

【0007】このように、ステップS13において、出
力電流IOLおよびIOHの電流値に基づいて分岐を行
い、高い電源電圧による機能試験と低い電源電圧による
機能試験の一方のみを行うようにしている。ここで、こ
のように機能試験の一方を省略することができる理由を
説明する。測定された出力電流値が高い場合、IC内部
のトランジスタの負荷駆動能力が大きく、IC内部の個
々のゲートの伝播遅延時間が短くなっていることが予測
される。このような場合、内部ゲートの動作速度が速く
なることに起因する機能障害が発生し易い。他方、MO
SICの場合、電源電圧が高い程、個々のトランジスタ
の負荷駆動能力が高くなる。このため、出力電流値が高
い場合には、電源電圧値が高い場合に上記動作速度が速
くなることに起因する機能障害が発生し易くなり、IC
が正常に機能し得る電源電圧範囲の上限が低くなる。従
って、出力電流値が大きい場合には、高い電源電圧設定
による機能試験のみを行うようにした。これに対し、測
定された出力電流値が低い場合、IC内部のトランジス
タの負荷駆動能力が小さく、内部ゲートの動作速度が遅
くなることに起因する機能障害が発生し易い。このた
め、出力電流値が低い場合には、電源電圧値が低くした
時に上記動作速度が遅くなることよって生じる機能障害
が発生し易くなり、ICが正常に機能し得る電源電圧範
囲の下限が高くなる。従って、出力電流値が低い場合に
は、低い電源電圧設定による機能試験のみを行うように
した。上記ステップS13における判断分岐を行うため
の基準値Aは、製造条件の異なった多様なウェハについ
て、出力電流値と動作可能電源電圧範囲との相関関係を
評価し、この評価結果に基づいて決定する。
As described above, in step S13, branching is performed based on the current values of the output currents IOL and IOH, and only one of a functional test with a high power supply voltage and a functional test with a low power supply voltage is performed. Here, the reason why one of the functional tests can be omitted will be described. When the measured output current value is high, it is predicted that the load driving capability of the transistor inside the IC is large and the propagation delay time of each gate inside the IC is short. In such a case, a functional failure is likely to occur due to the increased operating speed of the internal gate. On the other hand, MO
In the case of SIC, the higher the power supply voltage, the higher the load driving capability of each transistor. Therefore, when the output current value is high, the functional failure is likely to occur due to the increase in the operating speed when the power supply voltage value is high, and the IC
Lowers the upper limit of the power supply voltage range in which the can function normally. Therefore, when the output current value is large, only the function test with the high power supply voltage setting is performed. On the other hand, when the measured output current value is low, the load driving capability of the transistor inside the IC is small, and the functional failure due to the slow operation speed of the internal gate is likely to occur. Therefore, when the output current value is low, a functional failure is likely to occur due to the slow operation speed when the power supply voltage value is lowered, and the lower limit of the power supply voltage range in which the IC can normally function is high. Become. Therefore, when the output current value is low, only the function test with the low power supply voltage setting is performed. The reference value A for performing the determination branch in step S13 is determined based on the evaluation result by evaluating the correlation between the output current value and the operable power supply voltage range for various wafers having different manufacturing conditions. ..

【0008】[0008]

【発明の効果】以上説明したように、この発明によれ
ば、半導体ウェハに形成された個々の半導体集積回路の
各種電気的特性を測定し、各測定結果に基づいて当該半
導体集積回路の合否を判定する半導体集積回路の試験方
法において、比較的測定時間が短く、かつ、当該測定結
果と他の測定項目における合格率との相関関係の強い測
定項目を先行して実施し、前記測定結果に基づいて、実
施済みの測定項目以外の測定項目のうち特定の測定項目
を選択して実施するので、1個の半導体集積回路を試験
するための測定時間が短縮され、製造コストが低減され
るという効果が得られる。
As described above, according to the present invention, various electrical characteristics of individual semiconductor integrated circuits formed on a semiconductor wafer are measured, and whether the semiconductor integrated circuit is passed or rejected is determined based on each measurement result. In the semiconductor integrated circuit test method to determine, the measurement time is relatively short, and a measurement item having a strong correlation with the relevant measurement result and the pass rate in other measurement items is performed first, and based on the measurement result. Since a specific measurement item is selected from the measurement items other than the already-executed measurement item and the measurement is performed, the measurement time for testing one semiconductor integrated circuit is shortened and the manufacturing cost is reduced. Is obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】 この発明の一実施例による半導体集積回路の
試験方法を説明するフローチャートである。
FIG. 1 is a flowchart illustrating a method for testing a semiconductor integrated circuit according to an embodiment of the present invention.

【図2】 従来の試験方法を説明するフローチャートで
ある。
FIG. 2 is a flowchart illustrating a conventional test method.

【符号の説明】[Explanation of symbols]

S13……出力電流値に基づき次に実施する測定項目を
決定するステップ
S13: Step of deciding the next measurement item to be performed based on the output current value

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 半導体ウェハに形成された個々の半導体
集積回路の各種電気的特性を測定し、各測定結果に基づ
いて当該半導体集積回路の合否を判定する半導体集積回
路の試験方法において、 比較的測定時間が短く、かつ、当該測定結果と他の測定
項目における合格率との相関関係の強い測定項目を先行
して実施し、 前記測定結果に基づいて、実施済みの測定項目以外の測
定項目のうち特定の測定項目を選択して実施することを
特徴とする半導体集積回路の試験方法。
1. A method for testing a semiconductor integrated circuit, which comprises measuring various electrical characteristics of an individual semiconductor integrated circuit formed on a semiconductor wafer, and judging whether the semiconductor integrated circuit is acceptable or unacceptable based on each measurement result. The measurement time is short, and the measurement item having a strong correlation with the relevant measurement result and the pass rate in other measurement items is performed first, and based on the measurement result, the measurement items other than the already performed measurement items A test method for a semiconductor integrated circuit, which is characterized in that a specific measurement item is selected and executed.
JP3193293A 1991-08-01 1991-08-01 Testing method for semiconductor integrated circuit Withdrawn JPH05107305A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3193293A JPH05107305A (en) 1991-08-01 1991-08-01 Testing method for semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3193293A JPH05107305A (en) 1991-08-01 1991-08-01 Testing method for semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPH05107305A true JPH05107305A (en) 1993-04-27

Family

ID=16305509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3193293A Withdrawn JPH05107305A (en) 1991-08-01 1991-08-01 Testing method for semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH05107305A (en)

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