JPH05107167A - System and device for measuring odorous gas - Google Patents
System and device for measuring odorous gasInfo
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- JPH05107167A JPH05107167A JP33110191A JP33110191A JPH05107167A JP H05107167 A JPH05107167 A JP H05107167A JP 33110191 A JP33110191 A JP 33110191A JP 33110191 A JP33110191 A JP 33110191A JP H05107167 A JPH05107167 A JP H05107167A
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- gas
- sensor
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- measurement
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Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は公害ガス、臭気ガスなど
の測定、モニタリングに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to measurement and monitoring of pollution gas, odor gas and the like.
【０００２】[0002]
【従来の技術】従来、臭気を測定する方法として、人間
の嗅覚による官能試験法、半導体センサーや人工脂質２
分子膜センサーを用いてニオイを相対値として測定する
方法、ガス検知管によりガス濃度を測定し臭気の強度に
対応させる方法等が用いられている。2. Description of the Related Art Conventionally, as a method for measuring odor, a sensory test method based on human olfaction, a semiconductor sensor, and an artificial lipid 2
There are used a method of measuring odor as a relative value using a molecular film sensor, a method of measuring a gas concentration with a gas detector tube and making it correspond to the intensity of odor.
【０００３】[0003]
【発明が解決しようとする課題】現在ガスセンサーある
いはニオイセンサーとして一般に半導体センサーあるい
は脂質二分子膜センサーなどが利用されている。水晶発
振子に二分子構造の有機膜を添着したいわゆる脂質二分
子膜センサーにおいては、ナノグラム単位のニオイを重
量として測定可能であり、かつ人間の嗅細胞が二分子構
造であることから人間の嗅覚で測定する官能試験の臭気
濃度に対応する値が測定できる利点がある。しかし、測
定ガス中の数＋ｐｐｍ（ｐｐｍは百万分の一の単位）の
ニオイの量を測定する場合にもその測定ガス中には温度
にもよるが数千から数万ｐｐｍの水分が含まれ水分補正
なしでニオイを測定することは困難であり、現実にはニ
オイを測定しているというより水分重量を測定している
といっても過言でない。同様に半導体センサーでも公知
の事実として、水分の測定値に及ぼす影響は極めて大き
い。ゼロ値を設定する標準空気の絶対湿度が測定ガスの
絶対湿度と異なればその分誤差となってあらわれる。す
なわち、温湿度の異なる測定時間、測定日の違いにより
同じ濃度のニオイに対し、再現性がほとんど得られない
欠点がある。しかし、測定ガス中の水分の影響を考慮し
た連続測定方法は実現されておらずゼロ値の設定に用い
るべき標準空気すら使用されていない現実である。本発
明は、測定ガス中に含まれる水分の量を自動的に補正す
ることにより臭気ガスの分析特に、連続測定、モニタリ
ングを目的とするものである。Currently, a semiconductor sensor or a lipid bilayer sensor is generally used as a gas sensor or an odor sensor. In a so-called lipid bilayer sensor in which a bilayer-structured organic film is attached to a crystal oscillator, it is possible to measure odors in nanogram units as weight, and since human olfactory cells have a bimolecular structure, the human olfactory sense There is an advantage that the value corresponding to the odor concentration of the sensory test measured in 1. can be measured. However, even when measuring several + ppm (ppm is a unit of one millionth) odor in the measurement gas, the measurement gas contains thousands to tens of thousands of ppm of water depending on the temperature. It is difficult to measure odor without moisture correction, and it is no exaggeration to say that the weight of water is actually measured rather than the odor is measured. Similarly, it is a well-known fact that semiconductor sensors have an extremely large effect on the measured value of water. If the absolute humidity of the standard air for setting the zero value differs from the absolute humidity of the measured gas, an error will appear accordingly. In other words, there is a drawback that reproducibility is hardly obtained for odors of the same concentration due to the difference in measurement time and measurement day with different temperature and humidity. However, a continuous measurement method that considers the influence of water in the measurement gas has not been realized, and even standard air that should be used for setting a zero value is not actually used. The present invention is directed to analysis of odorous gas by automatically correcting the amount of water contained in the measurement gas, and particularly to continuous measurement and monitoring.
【０００４】[0004]
【課題を解決するための手段】上記目的を達成するため
には、測定ガス中の水分量すなわち測定ガスの絶対湿度
と等しい絶対湿度の空気を製造し、それを標準空気とし
てゼロ値の設定に用いれば測定値より水分の影響は自動
的に補正できる。In order to achieve the above object, air having an absolute humidity equal to the amount of water in the measurement gas, that is, the absolute humidity of the measurement gas, is manufactured, and it is set as a standard air to a zero value. If used, the effect of water content can be automatically corrected from the measured value.
【０００５】目的を達成する為には、任意の温度・湿度
の測定ガス並びにゼロ設定に用いる空気の温度を冷却槽
によって同時に飽和湿度となる温度に冷却したのち、加
温することによって本発明の目的は達成できる。冬、早
春、晩秋の比較的温度・湿度の低い時期には、冷却槽の
温度を０〜５°Ｃ程度に設定し、夏や温度・湿度の比較
的高い時期には冷却槽の温度を１０°Ｃ程度に設定する
ことにより、冷却槽を通過する測定ガス・空気の湿度を
飽和湿度すなわち同一温度での飽和湿度にすることが可
能である。すなわち、絶対湿度の等しい測定ガス・標準
空気に変換することが可能である。飽和湿度のガス・空
気は配管等に接触すると水分がさらに除去され、絶対湿
度は容易に変わってしまうので、加温槽によって再び加
温することによって、絶対湿度の変わらない安定したガ
ス・標準空気の製造が可能となる。加温槽における加温
温度は人間の嗅覚がもっとも鋭敏に働く２６°Ｃ前後に
設定することが望ましい。さらに、温度・湿度が時間的
に変動する測定ガスの連続測定は、測定ガスの絶対湿度
と等しい標準空気を常に参照用センサーに流すことによ
って達成できる。冷却槽としては、間接冷却でも直接冷
却でも目的は達成でき、必ずしもウオータバスに限定さ
れない。In order to achieve the object, the temperature of the measurement gas of any temperature and humidity and the temperature of the air used for zero setting are simultaneously cooled by a cooling tank to a temperature at which the saturated humidity is reached, and then heated to obtain the present invention. The purpose can be achieved. In winter, early spring, and late fall, when the temperature and humidity are relatively low, the temperature of the cooling tank is set to 0 to 5 ° C, and in summer and when the temperature and humidity are relatively high, the temperature of the cooling tank is set to 10 By setting the temperature to about ° C, the humidity of the measurement gas / air passing through the cooling tank can be saturated humidity, that is, the saturated humidity at the same temperature. That is, it is possible to convert the measurement gas and the standard air having the same absolute humidity. When the gas / air with saturated humidity comes into contact with piping etc., the water content is further removed, and the absolute humidity changes easily.Therefore, by reheating with a heating tank, stable gas / standard air whose absolute humidity does not change Can be manufactured. The heating temperature in the heating tank is preferably set to around 26 ° C at which the human sense of smell is most sensitive. Furthermore, continuous measurement of the measurement gas whose temperature and humidity fluctuate with time can be achieved by constantly flowing standard air equal to the absolute humidity of the measurement gas through the reference sensor. The cooling tank can achieve the purpose by either indirect cooling or direct cooling, and is not necessarily limited to the water bath.
【０００６】[0006]
【実施例】本発明の実施例を図によって説明すると、１
図はガス濃度検出センサーが水晶発振子に二分子構造の
有機膜を添着したセンサーでかつガス濃度が官能試験で
測定される臭気濃度に対応する値を測定する公害ガスの
臭気測定システムを示す。Embodiments of the present invention will be described with reference to the drawings.
The figure shows a odor measuring system of a pollution gas in which a gas concentration detecting sensor is a sensor in which an organic film having a bimolecular structure is attached to a crystal oscillator and the gas concentration measures a value corresponding to the odor concentration measured by a sensory test.
【０００７】２図は測定用センサーの参照センサーを設
けることにより連続測定する場合の公害ガスの臭気測定
システムを示す。FIG. 2 shows a pollution gas odor measuring system for continuous measurement by providing a reference sensor of a measuring sensor.
【０００８】３図は測定用センサーとして半導体センサ
ーを用い、参照センサーを設け、連続的に公害ガスの臭
気を測定するシステムである。FIG. 3 shows a system in which a semiconductor sensor is used as a measuring sensor and a reference sensor is provided to continuously measure the odor of pollution gas.
【０００９】１図において、ゼロ設定工程では、測定部
（１）の測定ガスポンプ（７）が作動すると、電磁弁
（１０）が閉じ、電磁弁（８）が開く。空気は測定ガス
ポンプ（７）の吸引作用により空気取入口（１２）より
系内に流入し、冷却槽（３ ）によって冷却され、飽和
湿度となったのち、加温槽（４）によって再び加温さ
れ、標準空気となって測定用センサー（５）を通り、ガ
ス排出口（１３）より系外に排出される。この工程でセ
ンサーのゼロ値を設定する。In FIG. 1, in the zero setting step, when the measuring gas pump (7) of the measuring section (1) is operated, the solenoid valve (10) is closed and the solenoid valve (8) is opened. The air flows into the system through the air inlet (12) by the suction action of the measurement gas pump (7), is cooled by the cooling tank (3) to reach saturated humidity, and is heated again by the heating tank (4). Then, it becomes standard air, passes through the measuring sensor (5), and is discharged from the system through the gas discharge port (13). This process sets the zero value of the sensor.
【００１０】測定工程においては、電磁弁（１０）が開
き、電磁弁（８）は閉じる。測定ガスは測定ガス取入口
（１１）より系内に流入し、冷却槽（３）及び加温槽
（４）により、標準空気の絶対湿度と等しい測定ガスに
変換され、測定センサーで測定されたのちガス排出口
（１３）より系外に排出される。In the measuring process, the solenoid valve (10) is opened and the solenoid valve (8) is closed. The measurement gas flows into the system through the measurement gas inlet (11), is converted into a measurement gas having the same absolute humidity as standard air by the cooling tank (3) and the heating tank (4), and is measured by the measurement sensor. After that, the gas is discharged from the system through the gas discharge port (13).
【００１１】２図において、ゼロ工程では、測定ガスポ
ンプ（７）が作動すると電磁弁（８）、（９）が開き、
電磁弁（１０）は閉じる。ゼロ値設定用空気は、空気取
入口（１２）より系内に流入し、冷却槽（３）によって
飽和湿度の空気に変換されたのち再び加温槽（４）で加
温され、標準空気となって測定用センサー（５）及び参
照センサー（６）を通り、ガス排出口（１３）より系外
に排出される。この工程でゼロ値が設定される。In FIG. 2, in the zero step, when the measuring gas pump (7) is operated, the solenoid valves (8) and (9) are opened,
The solenoid valve (10) is closed. The zero value setting air flows into the system through the air inlet (12), is converted into air of saturated humidity by the cooling tank (3), and is then heated again in the heating tank (4) to become standard air. After passing through the measurement sensor (5) and the reference sensor (6), the gas is discharged from the gas outlet (13) to the outside of the system. A zero value is set in this step.
【００１２】測定工程に入ると、電磁弁（８）が閉じ、
電磁弁（９）及び（１０）は開いた状態となる。測定ガ
スは測定ガス取入口（１１）より系内に流入し、冷却槽
（３）で飽和湿度の測定ガスに変換されたのち、再び加
温槽（４）で加温され測定用センサー（５）を通りガス
排出口（１３）より系外に排出される。測定ガスの絶対
湿度と等しい標準空気は連続的に参照センサー（６）を
通り、ガス排出口（１３）より系外に排出される。測定
用センサーと参照センサーの測定値の差は水分の影響を
自動的に補正した値となる。測定ガスに直接接触する電
磁弁（１０）はピンチバルブが望ましいことは当然であ
る。When the measurement process is started, the solenoid valve (8) is closed,
The solenoid valves (9) and (10) are open. The measurement gas flows into the system through the measurement gas inlet (11), is converted into the measurement gas of saturated humidity in the cooling tank (3), and is then heated again in the heating tank (4), and the measurement sensor (5 ) And is discharged to the outside of the system through the gas discharge port (13). Standard air having the same absolute humidity as the measurement gas continuously passes through the reference sensor (6) and is discharged from the gas discharge port (13) to the outside of the system. The difference between the measured values of the measurement sensor and the reference sensor is a value that automatically corrects the influence of moisture. As a matter of course, the solenoid valve (10) that is in direct contact with the measurement gas is preferably a pinch valve.
【００１３】図３において、半導体センサーを用いる場
合、センサーの洗浄工程が新たに加わる。ゼロ設定工程
では、測定ガスポンプ（７）が作動すると、電磁弁
（８）、（９）及び（１５）が開き、電磁弁（１０）及
び（１６）は閉じた状態となる。ゼロ値を設定する空気
は空気取入口（１２）より系内に流入し、冷却槽（３）
で飽和湿度の空気に変換されたのち、再び加温槽（４）
で加温され標準空気となって測定用センサー（５）並び
に参照センサー（６）を経由してガス排出口（１３）よ
り系外に排出される。この工程でゼロ値の設定を行な
う。In FIG. 3, when a semiconductor sensor is used, a sensor cleaning step is newly added. In the zero setting step, when the measurement gas pump (7) is operated, the solenoid valves (8), (9) and (15) are opened and the solenoid valves (10) and (16) are closed. The air that sets the zero value flows into the system through the air intake (12) and the cooling tank (3)
After being converted to air with saturated humidity at, the heating tank (4) again
Is heated to become standard air and discharged from the gas discharge port (13) to the outside of the system via the measurement sensor (5) and the reference sensor (6). The zero value is set in this step.
【００１４】測定工程では、電磁弁（８）及び（１６）
は閉じた状態となり、電磁弁（９）、（１０）、（１
５）は開いた状態である。測定ガスは測定ガス取入口
（１１）より系内に流入し、標準空気の絶対湿度と等し
い測定ガスに変換され測定用センサー（５）で測定され
たのち、ガス排出口（１３）より系外に排出される。ま
た、測定ガスと絶対湿度の等しい標準空気は連続的に参
照センサー（６）を流れ、水分補正が自動的に行なわれ
る。In the measuring process, the solenoid valves (8) and (16)
Is closed and the solenoid valves (9), (10), (1
5) is an open state. The measurement gas flows into the system through the measurement gas inlet (11), is converted into a measurement gas having the same absolute humidity as the standard air, is measured by the measurement sensor (5), and then out of the system through the gas outlet (13). Is discharged to. Further, the standard air having the same absolute humidity as the measurement gas continuously flows through the reference sensor (6), and the water content is automatically corrected.
【００１５】洗浄工程では、従来、環境の湿度を有する
空気をそのまま用いているが、シリカゲル充填槽（１
４）を設置して乾燥空気で各くセンサーを洗浄したほう
がより効果的であることは言うまでもない。すなわち、
電磁弁（１０）及び（１５）が閉じ、電磁弁（８）、
（９）及び（１６）が開いた状態となる。空気は空気と
取入口（１２）より系内に流入し、シリカゲル充填槽
（１４）によって乾燥空気に変換され、測定用センサー
（５）並びに参照センサー（６）を十分洗浄したのち、
ガス排出口（１３）より系外に排出される。In the washing step, air having an environmental humidity has been used as it is, but a silica gel-filled tank (1
It goes without saying that it is more effective to install 4) and wash each sensor with dry air. That is,
Solenoid valves (10) and (15) are closed, solenoid valves (8),
(9) and (16) are opened. Air flows into the system from the air and the intake port (12), is converted into dry air by the silica gel filling tank (14), and after thoroughly cleaning the measurement sensor (5) and the reference sensor (6),
The gas is discharged from the system through the gas discharge port (13).
【００１６】[0016]
【作用】前処理部１を設けることにより常に測定ガスの
絶対湿度と等しい標準空気が製造でき、測定ガス中の水
分を自動補正できる。前処理部における冷却槽は飽和湿
度の空気・測定ガスをつくる作用し、加温槽は絶対湿度
を安定させる作用をする。By providing the pretreatment section 1, standard air having the same absolute humidity as the measuring gas can always be produced, and the water content in the measuring gas can be automatically corrected. The cooling tank in the pretreatment section acts to create air and measurement gas with saturated humidity, and the heating tank acts to stabilize absolute humidity.
【００１７】[0017]
【効果】測定ガスの水分に影響されない公害ガスの臭気
測定が可能となる。[Effect] The odor of pollution gas can be measured without being affected by the moisture content of the measurement gas.
【００１８】[0018]
【図１】水晶発振子に二分子構造の有機膜を添着したセ
ンサーを用いる場合の公害ガスの臭気測定システムであ
る。FIG. 1 is an odor measuring system for a pollution gas when a sensor in which a bilayer organic film is attached to a crystal oscillator is used.
【図２】水晶発振子に二分子構造の有機膜を展着したセ
ンサーを用い、公害ガスの臭気を連続測定するシステム
である。FIG. 2 is a system for continuously measuring an odor of a pollution gas by using a sensor in which a bilayer organic film is spread on a crystal oscillator.
【図３】半導体センサーを用いた公害ガスの臭気を連続
的に測定するシステムである。FIG. 3 is a system for continuously measuring the odor of pollution gas using a semiconductor sensor.
１ 前処理部 ２ 測定部 ３ 冷却槽 ４ 加温槽 ５ 測定用センサー ６ 参照センサー ７ 測定ガスポンプ ８、９、１０、１５、１６ 電磁弁 １１ 測定ガス取入口 １２ 空気取入口 １３ ガス排出口 １４ シリカゲル充填槽 １７ 配管 1 Pretreatment Part 2 Measuring Part 3 Cooling Tank 4 Heating Tank 5 Measurement Sensor 6 Reference Sensor 7 Measurement Gas Pump 8, 9, 10, 15, 16 Solenoid Valve 11 Measurement Gas Intake 12 Air Intake 13 Gas Outlet 14 Silica Gel Filling tank 17 Piping
Claims (3)
もった空気を製造するための前処理部（１）と測定ガス
のガス濃度を検出する測定部（２）で構成されることを
特徴とした臭気ガスの測定システム及び装置。1. A pretreatment section (1) for producing air having an absolute humidity equal to the absolute humidity of the measurement gas, and a measurement section (2) for detecting the gas concentration of the measurement gas. And measuring system for odorous gas.
を製造する冷却槽（３）、空気・ガスを加温する加温槽
（４）で構成され、測定部（２）が測定用センサー
（５）で構成されることを特徴とした請求項１記載の臭
気ガスの測定システム及び装置。2. The pretreatment section (1) comprises a cooling tank (3) for producing gas / air of saturated humidity and a heating tank (4) for heating air / gas, and the measuring section (2) is The odorous gas measuring system and device according to claim 1, characterized by comprising a measuring sensor (5).
参照センサー（６）を設けることにより連続測定を行な
うことを特徴とした請求項１記載の臭気ガスの測定シス
テム及び装置。3. The odorous gas measuring system and device according to claim 1, wherein the measuring unit (2) is provided with a reference sensor (6) of the measuring sensor (5) for continuous measurement.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33110191A JPH05107167A (en) | 1991-10-14 | 1991-10-14 | System and device for measuring odorous gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33110191A JPH05107167A (en) | 1991-10-14 | 1991-10-14 | System and device for measuring odorous gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05107167A true JPH05107167A (en) | 1993-04-27 |
Family
ID=18239874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33110191A Pending JPH05107167A (en) | 1991-10-14 | 1991-10-14 | System and device for measuring odorous gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05107167A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003065926A (en) * | 2001-08-27 | 2003-03-05 | Mitsubishi Electric Corp | Detection apparatus and method |
| JP2011505554A (en) * | 2007-11-29 | 2011-02-24 | エッセアチエンメイ・ コーペラティヴァ・メカニチ・イモラ・ソシエタ・コーペラティヴァ | Method and apparatus for detecting the composition of a gas mixture |
| WO2020054455A1 (en) * | 2018-09-11 | 2020-03-19 | 味の素株式会社 | Food sample aroma analysis method, analysis apparatus and analysis gas preparation apparatus |
| WO2020065981A1 (en) * | 2018-09-28 | 2020-04-02 | 日本電気株式会社 | Data processing device, measurement system, data processing method, measurement method, and program |
| WO2020065983A1 (en) * | 2018-09-28 | 2020-04-02 | 日本電気株式会社 | Information processing device, control method, and program |
| JP2022537230A (en) * | 2018-08-09 | 2022-08-25 | ケイリクス，インコーポレイテッド | Gas sampling with controlled humidity |
-
1991
- 1991-10-14 JP JP33110191A patent/JPH05107167A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003065926A (en) * | 2001-08-27 | 2003-03-05 | Mitsubishi Electric Corp | Detection apparatus and method |
| JP2011505554A (en) * | 2007-11-29 | 2011-02-24 | エッセアチエンメイ・ コーペラティヴァ・メカニチ・イモラ・ソシエタ・コーペラティヴァ | Method and apparatus for detecting the composition of a gas mixture |
| JP2022537230A (en) * | 2018-08-09 | 2022-08-25 | ケイリクス，インコーポレイテッド | Gas sampling with controlled humidity |
| WO2020054455A1 (en) * | 2018-09-11 | 2020-03-19 | 味の素株式会社 | Food sample aroma analysis method, analysis apparatus and analysis gas preparation apparatus |
| JPWO2020054455A1 (en) * | 2018-09-11 | 2021-08-30 | 味の素株式会社 | Food sample aroma analysis method, analyzer and analytical gas preparation device |
| WO2020065981A1 (en) * | 2018-09-28 | 2020-04-02 | 日本電気株式会社 | Data processing device, measurement system, data processing method, measurement method, and program |
| WO2020065983A1 (en) * | 2018-09-28 | 2020-04-02 | 日本電気株式会社 | Information processing device, control method, and program |
| JPWO2020065983A1 (en) * | 2018-09-28 | 2021-08-30 | 日本電気株式会社 | Information processing equipment, control methods, and programs |
| JPWO2020065981A1 (en) * | 2018-09-28 | 2021-08-30 | 日本電気株式会社 | Data processing equipment, measurement systems, data processing methods, measurement methods, and programs |
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