JPH0499320A - Automatic centering method for wafer protective tape - Google Patents
Automatic centering method for wafer protective tapeInfo
- Publication number
- JPH0499320A JPH0499320A JP2217945A JP21794590A JPH0499320A JP H0499320 A JPH0499320 A JP H0499320A JP 2217945 A JP2217945 A JP 2217945A JP 21794590 A JP21794590 A JP 21794590A JP H0499320 A JPH0499320 A JP H0499320A
- Authority
- JP
- Japan
- Prior art keywords
- tape
- protective tape
- distance
- wafer
- eccentricity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001681 protective effect Effects 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000001514 detection method Methods 0.000 claims abstract description 33
- 239000003463 adsorbent Substances 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 abstract description 5
- 238000004804 winding Methods 0.000 abstract description 2
- 235000012431 wafers Nutrition 0.000 description 32
- 238000010586 diagram Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000012937 correction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 101100389815 Caenorhabditis elegans eva-1 gene Proteins 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明はIC,LSIの製造に係わるもので、ウェハの
裏面研磨の前工程で、ウェハ表面の保護と薄くて腕いウ
ェハの亀裂又は破壊防止のためにウェハ表面を保護テー
プ(例えばPvC系ラミネートテープ)で貼付ける工程
において、ウェハとほぼ同一サイズの外周をもつ保護テ
ープの芯合せ貼付けの精度を高めこれを完全自動化する
自動芯出し方法に関する。Detailed Description of the Invention <Industrial Application Field> The present invention is related to the manufacture of ICs and LSIs, and is used to protect the wafer surface and prevent cracks or breakage of thin wafers in the process before polishing the backside of the wafer. In the process of attaching protective tape (e.g. PvC laminated tape) to the wafer surface for prevention purposes, an automatic centering method that increases the accuracy of aligning and attaching the protective tape, which has an outer circumference approximately the same size as the wafer, and fully automates this process. Regarding.
(従来技術〉
従来は、手作業でウェハに粘着テープを貼合せた後、こ
のテープをウェハの外周に合せて切取っていた。(Prior Art) In the past, after adhesive tape was attached to a wafer by hand, the tape was cut to fit the outer circumference of the wafer.
なお、予めウェハの外周に合せた粘着テープを半自動又
は自動で貼合せが試みられているが、これにおいては、
貼付寸法精度が問題の一つである。It should be noted that attempts have been made to semi-automatically or automatically attach adhesive tape that has been adjusted to the outer circumference of the wafer, but in this case,
One of the problems is the accuracy of pasting dimensions.
く 発明が解決しようとする課題 〉
上記従来の方法においては、ウェハと同一サイズの保護
テープの貼合せで、偏心による周縁のテープのはみ出し
が発生し、これが次の研磨工程で、巻込みによるウェハ
の破壊の原因となっている。Problems to be Solved by the Invention In the above conventional method, when a protective tape of the same size as the wafer is attached, the tape protrudes at the peripheral edge due to eccentricity. causing the destruction of
そこで、本発明は、ウェハとほぼ同一サイズの保護テー
プの貼合せで、偏心による周縁のテープのはみ出しを防
止する自動芯出し方法の提供を目的とする。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide an automatic centering method that prevents the peripheral edge of the tape from protruding due to eccentricity when a protective tape of approximately the same size as the wafer is attached.
〈 課題を解決するための手段 〉
本発明による課題解決手段は、第1.2.3図の如く、
円形ウェハ1とほぼ同一サイズに予め裁断された複数の
円形保護テープ2を搬送テープ3上に縦列に一定間隔を
おいて剥離自在に貼着配置し、この搬送テープ3を間欠
的に搬送し、その搬送方向をX軸かつその直角方向PY
軸とすれば、円形保護テープ2の半径Rに近い間隔をお
いてY軸方向に二個の位置検出センサー5A、5Bを配
置し、このセンサー5A、5Bの中央を通るX軸方向を
その基準線xo−xoとし、搬送中検出された保護チー
12の中心位置から一時停止をする中心位置までの距離
を基準長Pとし、保護テープ2の円形周縁を位置検出セ
ンサー5A、5Bのうちの一方が検出し、次に位置検出
センサー5A5Bのうちの他方が検出し、これら位置検
出センサー5A、5Bの検出間の距離Sにより基準長P
に対しての偏心量−ΔXおよび基準線xo−x。<Means for solving the problem> The means for solving the problem according to the present invention is as shown in Fig. 1.2.3.
A plurality of circular protective tapes 2 cut in advance to approximately the same size as the circular wafers 1 are arranged in a column on a conveying tape 3 at regular intervals in a peelable manner, and the conveying tape 3 is intermittently conveyed. The transport direction is the X axis and the perpendicular direction PY
If the axis is defined as an axis, two position detection sensors 5A and 5B are arranged in the Y-axis direction with an interval close to the radius R of the circular protective tape 2, and the X-axis direction passing through the center of these sensors 5A and 5B is the reference point. The line xo-xo is defined as the distance from the center position of the protective chip 12 detected during transportation to the center position where it is temporarily stopped, and the circular periphery of the protective tape 2 is defined as one of the position detection sensors 5A and 5B. is detected, then the other of the position detection sensors 5A and 5B detects, and the reference length P is determined by the distance S between the detections of these position detection sensors 5A and 5B.
Eccentricity -ΔX and reference line xo-x with respect to.
からの偏心1±ΔYをマイクロコンピュータで算出する
方法である。This method uses a microcomputer to calculate the eccentricity 1±ΔY from .
〈作用〉 上記課題解決手段において、検出センサー5A。<Effect> In the above problem solving means, the detection sensor 5A.
5BでSの距離から搬送テープ3の巻取量をP+恒、/
)
ΔXの距離をmで一時停止し、一方、ウェハ1の吸着体
の一例であるグリッド7は、そのマイナス方向にLの距
離を進みながら、±△Yの補正を行って停止すれば、搬
送テープ3上の保護テープ2と間怠に位置する。5B, the winding amount of the transport tape 3 from the distance S is P + constant, /
) If the grid 7, which is an example of the suction body for the wafer 1, moves in the negative direction a distance of L while correcting ±△Y and then stops, the conveyance can be stopped at a distance of ΔX of m. It is located between the protective tape 2 and the tape 3.
ここで、吸引力を作用させながら、搬送テープ3と吸着
グリッド7を同速度でプラス方向へ移動すれば、保護テ
ープ2は搬送テープ3から剥がされ吸着グリッド7が■
ΔYの補正を行ってLの距離で停止すれば、原位置に復
帰し、ここでウェハ1と保護テープ2が間怠で貼付が開
始される。Here, if the transport tape 3 and suction grid 7 are moved in the positive direction at the same speed while applying suction force, the protective tape 2 will be peeled off from the transport tape 3 and the suction grid 7 will be
After correcting ΔY and stopping at a distance of L, it returns to its original position, and the wafer 1 and protective tape 2 begin to be lazily pasted here.
〈実施例〉
以下、本発明の一実施例を第1.2.3図に基づいて説
明すると、円形ウェハ1とほぼ同一サイズに予め裁断さ
れた複数の円形保護テープ2を搬送テープ3上に縦列に
一定間隔をおいて剥離自在に貼着配置し、この搬送テー
プ3が第一パルスモータ−4(後記偏心量ΔXの補正可
能)と巻取ローラ4A、搬送ガイド4B、案内ローラ4
C等で間欠的に搬送し、その搬送方向をX軸かつその直
角方向をY軸とすれば、円形保護テープ2の半径Rに近
い間隔をおいてY軸方向に二個の位置検出センサー5A
、5Bを配置し、このセンサー5A。<Example> Hereinafter, an example of the present invention will be described based on FIG. The conveying tape 3 is arranged in a column at regular intervals and releasably attached, and this conveying tape 3 connects a first pulse motor 4 (which can correct the eccentricity ΔX described later), a take-up roller 4A, a conveyance guide 4B, and a guide roller 4.
If the conveyance direction is the X-axis and the direction perpendicular to the X-axis is the Y-axis, two position detection sensors 5A are placed in the Y-axis direction at an interval close to the radius R of the circular protective tape 2.
, 5B, and this sensor 5A.
5Bの中央を通るX軸方向をその基準線X0−XOとし
、搬送中検出された保護テープ2の中心位置から一時停
止をする中心位置までの距離を基準長Pとし、保護テー
プ2の円形周縁を位置検出センサー5A、5Bのうちの
一方が検出し、次に位置検出センサー5A、5Bのうち
の他方が検出し、これら位置検出センサー5A、5Bの
検出間の距離Sにより基準長Pに対しての偏心量−ΔX
および基準線xo−xoからの偏心1±ΔYをマイクロ
コンピュータで算出する。5B is the reference line X0-XO, the distance from the center position of the protective tape 2 detected during transportation to the center position where it is temporarily stopped is the reference length P, and the circular periphery of the protective tape 2 is defined as the reference line X0-XO. is detected by one of the position detection sensors 5A and 5B, and then by the other of the position detection sensors 5A and 5B, and the distance S between the detections of these position detection sensors 5A and 5B is determined relative to the reference length P. Eccentricity - ΔX
And the eccentricity 1±ΔY from the reference line xo-xo is calculated by a microcomputer.
そして、基準線xo−xo上の特定距離りにある、ウェ
ハ1と間怠にある保護テープ2の吸着体の一例であるグ
リッド7で、±△Yを、吸着グリッド7を駆動する第二
パルスモータ−8、送りネジ8A、ナツト体8B、移動
案内i楕8C1移動板8D、基板8E及び第三パルスモ
ータ−9、送りネジ9A、ナツト体9B、移動案内機構
90、移動板9D及び基板9Eからなる装置により、補
正する。Then, at a grid 7, which is an example of an adsorbent for the protective tape 2 between the wafer 1 and the wafer 1, which is located at a specific distance on the reference line xo-xo, a second pulse for driving the adsorption grid 7 Motor 8, feed screw 8A, nut body 8B, moving guide i ellipse 8C1 moving plate 8D, board 8E and third pulse motor 9, feed screw 9A, nut body 9B, moving guide mechanism 90, moving plate 9D and board 9E This is corrected by a device consisting of:
すなわち、吸着グリ・・lドアを保護テープ2の同芯上
に移動して来て停止し、吸着グリッド7により保護テー
プ2を搬送テープ3から剥離吸着して、原位置に待機す
るウェハ1の位置までの特定距離して偏心量のYlll
l偏心量〒△Y(x軸偏心量は第一パルスモータ−で補
正)を補正して復帰する。That is, the suction grid 7 moves the door concentrically with the protective tape 2 and stops, and the suction grid 7 peels off the protective tape 2 from the transport tape 3 and adsorbs it to the wafer 1 waiting at its original position. Ylll of eccentricity by a specific distance to the position
1 Correct the eccentricity 〒ΔY (the x-axis eccentricity is corrected by the first pulse motor) and return.
前記保護テープ2をウェハ1の表面に貼り付けを行うに
際し、貼り面への気泡の混入と保護テープの皺の発生を
防止するために、貼付用プレスゴムローラ10、保護テ
ープ2およびその周辺から発生する高静電気力を制御し
、保護テープ2とブレスゴムローラ10間の静電気力を
活用している。When pasting the protective tape 2 onto the surface of the wafer 1, in order to prevent air bubbles from entering the pasting surface and wrinkles from forming on the protective tape, air bubbles generated from the pasting press rubber roller 10, the protective tape 2, and the surrounding area are prevented. The electrostatic force between the protective tape 2 and the breath rubber roller 10 is utilized.
前記保護テープ2を吸着搬送する真空吸着グリッド7に
取付けられたブレスゴムローラ10を昇降するエアシリ
ンダー11(これは、移動案内機構110、移動板11
D、基板11Eと組み合わされる)のストロークを保護
テープ2の厚さやその直径に従って調整可能とし、ブレ
スゴムローラ10の下面と吸着グリッド7の吸着面との
間の高さの差tを選択可能のものとしている。An air cylinder 11 (this includes a movement guide mechanism 110, a movement plate 11
D, the stroke of the tape (combined with the substrate 11E) can be adjusted according to the thickness and diameter of the protective tape 2, and the height difference t between the lower surface of the breath rubber roller 10 and the suction surface of the suction grid 7 can be selected. It is said that
第2図(イ)(ロ)のように、保護テープ2の貼付は始
端−が片持支持のため、垂れ下がり且つ電界の強さ等の
影響を受けて波をうった歪んだ表面を呈するため、ブレ
スゴムローラ10は第一の段階でエアシリンダー11に
より吸着グリッド面との高さの差t(例えば0.1mm
以下)迄降下すると、第2図(ロ)の点線で示すように
保護テープ2の始端2Aがブレスゴムローラ10に静電
力で吸着され始端2Aの波状変形も平滑となる。As shown in Figures 2 (a) and (b), when the protective tape 2 is applied, the starting end is supported in a cantilevered manner, resulting in a distorted surface that hangs and waves due to the influence of the electric field strength, etc. In the first stage, the breath rubber roller 10 is moved by an air cylinder 11 to a height difference t (for example, 0.1 mm) with respect to the suction grid surface.
(below), the starting end 2A of the protective tape 2 is attracted to the breath rubber roller 10 by electrostatic force, as shown by the dotted line in FIG.
次に、第2図(ハ)のように吸着グリッド7とブレスゴ
ムローラ10を昇降する第1図に示すエアシリンダー1
2(これは、移動案内機構12C1移動板12D、基板
12Eと組み合わされる)でブレスゴムローラ10を支
えるローラー支持フレームIOAを適当に調節された自
重でウェハ1の始端に圧接する。このときグリッド7と
ウェハ1の間隔Uは0.05mmが適している。Next, as shown in FIG. 2(C), the air cylinder 1 shown in FIG. 1 moves up and down the suction grid 7 and the breath rubber roller 10.
2 (this is combined with the movement guide mechanism 12C1, the movement plate 12D, and the substrate 12E), the roller support frame IOA supporting the breath rubber roller 10 is pressed against the starting end of the wafer 1 with its own weight adjusted appropriately. At this time, a suitable distance U between the grid 7 and the wafer 1 is 0.05 mm.
第2図(ニ)のように、第四パルスモータ−14、送り
ネジ14A、ナツト体14B、移動案内機構14C1移
動板14D、基板14Eからなる装置で、ウェハ1のテ
ーブル13を水平移動して貼付けを行う。As shown in FIG. 2(D), the table 13 of the wafer 1 is horizontally moved by a device consisting of a fourth pulse motor 14, a feed screw 14A, a nut body 14B, a movement guide mechanism 14C, a movement plate 14D, and a substrate 14E. Paste.
前記保護テープ2はウェハ1のサイズに合わせ精密ダイ
カットされており、これらの周縁を一致させるには両者
の中心点となる芯を合致させることが必要である。第1
図でウェハ1は所定の基準線xo−xo線上に保護テー
プ2の貼付を待機している。ウェハ1の中心位置と、こ
れに垂直同芯上に吸着グリッド7(真空ポンプに接続さ
れている)に吸着されるべき保護テープ2の中心が一致
同軸上の位置にある。The protective tape 2 is precisely die-cut to match the size of the wafer 1, and in order to match their peripheral edges, it is necessary to match their center points. 1st
In the figure, a wafer 1 is waiting for a protective tape 2 to be applied on a predetermined reference line xo-xo. The center position of the wafer 1 and the center of the protective tape 2 to be adsorbed to the adsorption grid 7 (connected to a vacuum pump) coaxially and perpendicularly to the center position are located on the same axis.
一方、搬送テープ3上の保護テープ2は搬送中に、その
周縁を夫々の位置の検出センサー5A5Bで検出し、そ
の間の距離SによりX方向の偏心1十ΔXとY方向の偏
心量上△Yを決定する。On the other hand, the peripheral edge of the protective tape 2 on the transport tape 3 is detected by the detection sensor 5A5B at each position during transport, and the eccentricity in the X direction is 10ΔX and the eccentricity in the Y direction is ΔY according to the distance S between them. Determine.
保護テープ2の直径2Rと保護テープ2,2の周縁間の
距離aを適当に定め、2R+a=Pとする検出を受けた
保護テープ2は基準線xo−x。The diameter 2R of the protective tape 2 and the distance a between the circumferential edges of the protective tapes 2, 2 are appropriately determined, and 2R+a=P.The detected protective tape 2 is located at the reference line xo-x.
線上にその中心点が一致しておれば、即ちΔX=Oあれ
ば、Pの距離を進んで停止すればよく、△Yの偏心のあ
るときは、P十ΔXを移動すれば、所定の位置で停止す
る。If the center points coincide on the line, that is, if ΔX=O, then all you have to do is advance a distance of P and stop. If there is an eccentricity of ΔY, just move P plus ΔX and you will reach the predetermined position. Stop at.
その算定基準は、第3図において基準線上にある円Oが
円Cに偏心しているとすれば、△Yの偏心量に対し検出
点のX方向の平均点d′は検出線dからΔX短くなる。The calculation standard is that if the circle O on the reference line in Figure 3 is eccentric to the circle C, then the average point d' of the detection points in the X direction is ΔX shorter than the detection line d for the eccentricity of △Y. Become.
即ち、第1図から、
ΔX=dd’
この(1)式は検出センサー5A、5Bの距離を保護テ
ープ2の半径−Rに選んだ場合である。That is, from FIG. 1, ΔX=dd' This equation (1) applies when the distance between the detection sensors 5A and 5B is chosen to be the radius of the protective tape 2 -R.
△Y=○C が導かれる。△Y=○C is guided.
第4図は検出値Smmに対する偏心量ΔXmmを図示し
、第5図は検出値Smmに対する偏心量±△Ymmを図
示している。FIG. 4 shows the amount of eccentricity ΔXmm with respect to the detected value Smm, and FIG. 5 shows the amount of eccentricity ±ΔYmm with respect to the detected value Smm.
保護テープ2を配列された搬送テープ3の移動中、位置
検出センサー5A、5Bで検出された測定値Sから定め
られた基準線xo−xo上の検出点から一時停止する保
護テープ2までの距離をP、この時、停止位置から保護
テープ2を待機するウェハ1のセンター迄の距離りおよ
び検出センサー5A、、5Bの配置間隔の精度は何れも
加工技術上から±0.01mm以内を保つことは容易で
あり、保護テープ2の吸着保持する吸着グリッド7を補
正位置決めを行うグリッド保持装置7Aの精度も±0.
01mmは得られる。Distance from the detection point on the reference line xo-xo determined from the measured values S detected by the position detection sensors 5A and 5B to the protective tape 2 at which it is temporarily stopped while the transport tape 3 with the protective tape 2 arranged is moving. P, at this time, the distance from the stop position to the center of the wafer 1 where the protective tape 2 is waiting and the accuracy of the arrangement interval of the detection sensors 5A, 5B must both be kept within ±0.01 mm from the viewpoint of processing technology. is easy, and the accuracy of the grid holding device 7A that performs corrective positioning of the suction grid 7 that holds the protective tape 2 under suction is also ±0.
01mm is obtained.
なお、本発明の実施例では、位置検出センサー5A、5
Bは反射型光電スイッチを、また精度を要求するときは
レーザ式光電スイッチを用いた。In addition, in the embodiment of the present invention, the position detection sensors 5A, 5
For B, a reflection type photoelectric switch was used, and when precision was required, a laser type photoelectric switch was used.
光線の最小スポット径は前者で0.03mm、後者でO
,01mm、繰返し精度は0.003〜0゜001mm
であり、市場から入手し易いものを使用したが、より精
度の高いものを用いればより高い精度が得られる。The minimum spot diameter of the light beam is 0.03 mm for the former and O for the latter.
,01mm, repeatability is 0.003~0゜001mm
Although we used the one that is easily available on the market, higher accuracy can be obtained by using a more accurate one.
この装置の一工程を述べると、検出センサー5エバ1の
吸着グリッド7は、そのマイナス方向にLの距離を進み
ながら、±△Yの補正を行って停止すれば、搬送テープ
3上の保護テープ2と回忌に位置する。Describing one process of this device, the suction grid 7 of the detection sensor 5 Eva 1 moves a distance L in the negative direction, corrects ±△Y, and stops, then the protective grid 7 on the conveying tape 3 2 and is located on the anniversary.
ここで、吸引力を作用させながら、搬送チー13と吸着
グリッド7を同速度でプラス方向へ移動すれば、保護テ
ープ2は搬送テープ3から剥がされ吸着グリッド7がT
△Yの補正を行ってLの距離で停止すれば、原位置に復
帰し、ここでウェハ1と保護テープ2が回忌で貼付が開
始される。Here, if the conveyance team 13 and suction grid 7 are moved in the positive direction at the same speed while applying suction force, the protective tape 2 is peeled off from the conveyance tape 3 and the suction grid 7 is
After correcting ΔY and stopping at a distance of L, it returns to its original position, and here the pasting of the wafer 1 and the protective tape 2 is started.
本発明はIC,LSIの製造工程の自動化に際し、ウェ
ハ1に保護テープ2の貼付けが必要不可欠の工程であり
、その目的からウェハ1のサイズに近い貼合せ精度が要
求される。In the present invention, when automating the manufacturing process of ICs and LSIs, attaching the protective tape 2 to the wafer 1 is an essential step, and for this purpose, bonding accuracy close to the size of the wafer 1 is required.
ウェハ1のサイズには3,4.5,6.8インチがあり
、保護テープ2はウェハ1の外周からのはみ出しは特に
許されないため、ウェハ1は保護テープ2より025〜
0.3mm小さいものを使用せざるを得す、その偏心量
は±025〜03mmに押えているのが多い。The sizes of the wafer 1 are 3, 4.5, and 6.8 inches, and since the protective tape 2 is not allowed to protrude from the outer periphery of the wafer 1, the wafer 1 has a size of 025 to 025 inches than the protective tape 2.
It is necessary to use one that is 0.3 mm smaller, and the amount of eccentricity is often kept within ±025 to 03 mm.
この二個の位置検出センサー5A、5Bの間隔をウェハ
1の半径Rに等しくとったのは、(i)偏心量ΔX、△
Y共保かな偏心量に対し検出量Sが均衡して大きく検出
されること、(ii > S量から偏心量ΔX、△Yの
算出が容易であること、から、マイクロコンピュータは
応答時間1ms以下で処理可能である。The reason why the interval between these two position detection sensors 5A and 5B is set equal to the radius R of the wafer 1 is that (i) the eccentricity ΔX, Δ
The microcomputer has a response time of 1 ms or less because the detected amount S is balanced and detected large with respect to the eccentric amount that is consistent with Y, and it is easy to calculate the eccentric amounts ΔX and ΔY from the amount of S. It can be processed by
なお、本発明は、上記実施例に限定されるものではなく
、本発明の範囲内で上記実施例に多くの修正および変更
を加え得ることは勿論である。It should be noted that the present invention is not limited to the above embodiments, and it goes without saying that many modifications and changes can be made to the above embodiments within the scope of the present invention.
〈発明の効果〉
以上の説明から明らかな通り、本発明によれば、二個の
位置検出センサーを適所適間隔に選んで配置し、これら
の検出間隔Sを測定し、基準点からの補正量ΔX、△Y
を簡単なマイクロコンピュータで計算する。計算値その
ものの誤差は(2〜3)/1000mm以下に、補正結
果は従来の0.25〜0.3mmを0.1mm以下に押
える数倍の精度を得た。<Effects of the Invention> As is clear from the above description, according to the present invention, two position detection sensors are selected and placed at appropriate intervals, their detection interval S is measured, and the amount of correction from the reference point is calculated. ΔX, ΔY
is calculated using a simple microcomputer. The error in the calculated value itself was less than (2-3)/1000 mm, and the correction result was several times more accurate than the conventional 0.25-0.3 mm to 0.1 mm or less.
このような芯出しはCCDカメラによる画像処理がよく
行われているが、これでは、本発明での精度が装置全体
の総合精度が0.1mm以下のものは得られず、且つこ
れは容積が大きく設置の制限もあり、価格も20倍〜2
00倍を要する。しかし、本発明の位置検出センサーは
取付は長さも20〜50mmの長さでコンパクトのため
、取付は位置の制限を受けることも少なく、高精度が得
られる優れた効果がある。Image processing using a CCD camera is often performed for this kind of centering, but with this method, it is not possible to obtain an overall accuracy of 0.1 mm or less for the entire device, and this is because the volume is small. There are major restrictions on installation, and the price is 20 times to 2
It takes 00 times more. However, since the position detection sensor of the present invention is compact and has a length of 20 to 50 mm, the installation is not limited by the position, and has the excellent effect of achieving high accuracy.
第1図は本発明方法を実施した装置の斜視図、第2図は
同じく吸着グリッド部の作用説明図、第3図は同じく芯
出し補正演算方法説明線図、第4図は検出値Smmに対
する偏心量ΔXmmを図示した線図、第5図は検出値S
mmに対する偏心量△Ymmを図示した線図である。
1:円形ウェハ、2:円形保護テープ、3・搬送テープ
、5A、5B:位置検出センサー、Xo−XO:基準線
、7:吸着体の一例の吸着グリッ出
願
人
株式会社ソアテック
代
理
人
中
村
恒
久
撹絢蘭鶴1F囁η
第5図
第4
因
放棄JiL S(笥町Fig. 1 is a perspective view of an apparatus that implements the method of the present invention, Fig. 2 is a diagram explaining the action of the suction grid section, Fig. 3 is a diagram explaining the centering correction calculation method, and Fig. 4 is a graph showing the relationship between the detected value Smm. A diagram illustrating the amount of eccentricity ΔXmm, Figure 5 shows the detected value S
FIG. 3 is a diagram illustrating eccentricity ΔYmm with respect to mm. 1: Circular wafer, 2: Circular protective tape, 3. Conveying tape, 5A, 5B: Position detection sensor, Xo-XO: Reference line, 7: Adsorption grip as an example of adsorption body Applicant: Soatec Co., Ltd. Agent, Permanent Stirrer Nakamura Ayranzuru 1F whisper η Figure 5 4 Waiver of causes JiLS
Claims (1)
の円形保護テープを搬送テープ上に縦列に一定間隔をお
いて剥離自在に貼着配置し、この搬送テープを間欠的に
搬送し、その搬送方向をX軸かつその直角方向をY軸と
すれば、円形保護テープの半径Rに近い間隔をおいてY
軸方向に二個の位置検出センサーを配置し、これらのセ
ンサーの中央を通るX軸方向をその基準線とし、搬送中
検出された保護テープの中心位置から一時停止をする中
心位置までの距離を基準長Pとし、保護テープの円形周
縁を位置検出センサーのうちの一方が検出し、次に位置
検出センサーのうちの他方が検出し、これら位置検出セ
ンサーの検出間の距離Sにより基準長Pに対しての偏心
量−ΔXおよび基準線からの偏心量±ΔYをマイクロコ
ンピュータで算出することを特徴とする自動芯出し方法
。 2 請求項1において、基準線上の特定距離Lにある、
ウェハと同芯にある保護テープの吸着体で両偏心量−Δ
X、±ΔYを補正することを特徴とする自動芯出し方法
。 3 請求項1において、吸着体を保護テープの同芯上に
移動して来て停止させ、吸着体により保護テープを搬送
テープから剥離吸着して、原位置に待機するウェハの位
置までの特定距離LでY軸偏心量■ΔYを補正して復帰
することを特徴とする自動芯出し方法。[Claims] 1. A plurality of circular protective tapes cut in advance to approximately the same size as a circular wafer are arranged in a column on a carrier tape at regular intervals so as to be peelable, and the carrier tape is applied intermittently. If the conveyance direction is the X axis and the direction perpendicular to the Y axis is the Y axis, then Y
Two position detection sensors are arranged in the axial direction, and the reference line is the X-axis direction passing through the center of these sensors, and the distance from the center position of the protective tape detected during transport to the center position where it is temporarily stopped is calculated. One of the position detection sensors detects the circular periphery of the protective tape, then the other position detection sensor detects it, and the reference length P is determined by the distance S between the detections of these position detection sensors. An automatic centering method characterized in that an eccentricity -ΔX from a reference line and an eccentricity ±ΔY from a reference line are calculated by a microcomputer. 2. In claim 1, at a specific distance L on the reference line,
The amount of eccentricity on both sides is −Δ due to the adsorbent of the protective tape that is concentric with the wafer.
An automatic centering method characterized by correcting X and ±ΔY. 3 In claim 1, the adsorbent is moved concentrically with the protective tape and stopped, and the adsorbent peels off the protective tape from the transport tape and adsorbs it, and the distance is set at a specific distance to the position of the wafer waiting at the original position. An automatic centering method characterized by correcting the Y-axis eccentricity ■ΔY with L and returning.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2217945A JPH0499320A (en) | 1990-08-17 | 1990-08-17 | Automatic centering method for wafer protective tape |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2217945A JPH0499320A (en) | 1990-08-17 | 1990-08-17 | Automatic centering method for wafer protective tape |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0499320A true JPH0499320A (en) | 1992-03-31 |
Family
ID=16712170
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2217945A Pending JPH0499320A (en) | 1990-08-17 | 1990-08-17 | Automatic centering method for wafer protective tape |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0499320A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007042811A (en) * | 2005-08-02 | 2007-02-15 | Tokyo Seimitsu Co Ltd | Grinding method and apparatus of wafer periphery |
KR100901040B1 (en) * | 2001-12-03 | 2009-06-04 | 닛토덴코 가부시키가이샤 | Semiconductor wafer transport method and semiconductor wafer transport apparatus using the same |
JP2011258604A (en) * | 2010-06-04 | 2011-12-22 | Toyota Motor Corp | Method for manufacturing semiconductor device and device for applying protection tape to semiconductor wafer |
-
1990
- 1990-08-17 JP JP2217945A patent/JPH0499320A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100901040B1 (en) * | 2001-12-03 | 2009-06-04 | 닛토덴코 가부시키가이샤 | Semiconductor wafer transport method and semiconductor wafer transport apparatus using the same |
JP2007042811A (en) * | 2005-08-02 | 2007-02-15 | Tokyo Seimitsu Co Ltd | Grinding method and apparatus of wafer periphery |
JP2011258604A (en) * | 2010-06-04 | 2011-12-22 | Toyota Motor Corp | Method for manufacturing semiconductor device and device for applying protection tape to semiconductor wafer |
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