JPH0492884A - Device of pulling up single crystal - Google Patents

Device of pulling up single crystal

Info

Publication number
JPH0492884A
JPH0492884A JP20676590A JP20676590A JPH0492884A JP H0492884 A JPH0492884 A JP H0492884A JP 20676590 A JP20676590 A JP 20676590A JP 20676590 A JP20676590 A JP 20676590A JP H0492884 A JPH0492884 A JP H0492884A
Authority
JP
Japan
Prior art keywords
single crystal
crucible
inner crucible
raw material
pulling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20676590A
Other languages
Japanese (ja)
Inventor
Teruyuki Sekine
関根 輝幸
Masaharu Toyama
外山 正春
Katsumi Nishizaki
西崎 克己
Kazuhiko Echizenya
一彦 越前谷
Hiroshi Kaneda
洋 金田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP20676590A priority Critical patent/JPH0492884A/en
Publication of JPH0492884A publication Critical patent/JPH0492884A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reduce adhesion of SiO to an inner crucible and to continuously pull up single crystal for many hours in a device of feeding a Si raw material to gap between an inner and an outer crucible and successively pulling up single crystal by adopting specific constitution as the shape of the inner crucible. CONSTITUTION:In a device wherein an inner crucible 11 is arranged, a Si raw material 8 is fed 7 to gap between the inner 11 and an outer crucibles 1 and single crystal 6 is continuously pulled up, the inner crucible 11 comprises a cylindrical lower part and an upper part which is bent into a trumpet shape with a enlarge diamete on the top.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は機能性電子材料としてのシリコン単結晶の製造
装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an apparatus for producing silicon single crystals as a functional electronic material.

[従来の技術] シリコン単結晶製造において、固体原料を連続的に供給
しながら、シリコン単結晶を引上げる装置がある。この
とき供給した固体原料が完全に溶融する前に単結晶上に
析出し、多結晶化することを防止するために、内坩堝を
用いることが知られている。例えば特開昭63−303
893号公報では、第3図に示すように坩堝31に供給
管32を経て固体原料33を供給しながらシリコン単結
晶35を引上げるもので、供給した原料33が単結晶3
5上に析出することを防ぐため内坩堝36を用いている
[Prior Art] In silicon single crystal manufacturing, there is an apparatus that pulls a silicon single crystal while continuously supplying a solid raw material. It is known to use an inner crucible in order to prevent the solid raw material supplied at this time from precipitating on a single crystal and becoming polycrystallized before it is completely melted. For example, JP-A-63-303
In the No. 893 publication, as shown in FIG. 3, a silicon single crystal 35 is pulled while supplying a solid raw material 33 to a crucible 31 through a supply pipe 32, and the supplied raw material 33 is pulled up into a single crystal 3.
An inner crucible 36 is used to prevent precipitation on the surface of the molten metal.

[発明が解決しようとする課題] このような従来の内坩堝36の円筒状の形状では炉内の
Arガスの流れが妨げられる。その結果内坩堝の配設に
よって炉内雰囲気が円滑に流れな(なり、内坩堝36へ
のSiOの付@37が起こる。このような状態で長時間
引上を行うと、付着成長したSiOが融液34の液面へ
落下し、単結晶35の多結晶化を引き起こすという問題
点があった。また原料33の飛散38も避けられない。
[Problems to be Solved by the Invention] Such a conventional cylindrical shape of the inner crucible 36 impedes the flow of Ar gas in the furnace. As a result, the atmosphere in the furnace does not flow smoothly due to the arrangement of the inner crucible (and SiO is deposited on the inner crucible 36). If pulling is performed for a long time in such a state, the deposited and grown SiO will There is a problem in that the raw material 33 falls onto the surface of the melt 34 and causes polycrystallization of the single crystal 35. Also, scattering 38 of the raw material 33 is unavoidable.

本発明は前記問題点を解決するため、内坩堝の適切な形
状に関する技術を提供する。
In order to solve the above problems, the present invention provides a technique regarding an appropriate shape of the inner crucible.

[課題を解決するための手段1 本発明は、前記問題点を解決するため、内坩堝の形状を
下部は円筒形とし上部はラッパ状に上広に湾曲させ、A
rガスが滞留することなく、内坩堝外へ円滑に流れるよ
うにしたものである。
[Means for Solving the Problems 1] In order to solve the above problems, the present invention has an inner crucible whose lower part is cylindrical and whose upper part is curved into a trumpet-like shape.
This allows r gas to flow smoothly to the outside of the inner crucible without stagnation.

[作用] 本発明によれば内坩堝の形状を、その上部において、外
側にラッパ状にすなわち上広に湾曲させているから、炉
内雰囲気であるArは半径方向内側から坩堝外方に円滑
に流れる。
[Operation] According to the present invention, since the shape of the inner crucible is curved outward in a trumpet-like shape at the upper part thereof, the Ar atmosphere in the furnace is smoothly moved from the inside in the radial direction to the outside of the crucible. flows.

これによって、融液より蒸発し、Arガスにより運ばれ
るSiOは、内坩堝に付着することなく、坩堝外へ排出
される。したがって、SiOの堆積、液面への落下によ
る単結晶の多結晶化を防止することができ、単結晶の長
時間の連続引上が可能となった。
As a result, SiO evaporated from the melt and carried by the Ar gas is discharged to the outside of the crucible without adhering to the inner crucible. Therefore, polycrystallization of the single crystal due to deposition of SiO and dropping to the liquid surface can be prevented, and continuous pulling of the single crystal for a long period of time has become possible.

[実施例] 第1図は本発明による内坩堝を用い、原料を連続的に供
給しながら引上げる装置の1実施例を示す構成図である
。また第2図は第1図の構成例で用いた本発明による実
施例の内坩堝の形状図である。
[Example] Fig. 1 is a configuration diagram showing an example of an apparatus for pulling raw materials while continuously supplying them using an inner crucible according to the present invention. Moreover, FIG. 2 is a shape diagram of the inner crucible of the embodiment according to the present invention used in the configuration example of FIG. 1.

第1図において、坩堝1は回転装置2によって回転を与
えられ、ヒータ3により加熱され、融液4を保持する。
In FIG. 1, a crucible 1 is rotated by a rotating device 2, heated by a heater 3, and holds a melt 4.

引上ワイヤ5は単結晶6を成長させながら引上げる。坩
堝1内には本発明の実施例の内坩堝11を備えている。
The pulling wire 5 pulls up the single crystal 6 while growing it. The crucible 1 includes an inner crucible 11 according to an embodiment of the present invention.

多結晶の粉体原料シリコン8は供給管7を通って、内坩
堝11の外側に装入され、溶解する。この内坩堝11は
第2図に示すように下部が円筒形で上部が上に開いたラ
ッパ型である。その具体的な寸法は第2図に示した。こ
の内坩堝11は吊装置12から吊下げている。
Polycrystalline powder raw material silicon 8 is charged to the outside of inner crucible 11 through supply pipe 7 and melted. As shown in FIG. 2, this inner crucible 11 has a trumpet shape with a cylindrical lower part and an upwardly opened upper part. Its specific dimensions are shown in FIG. This inner crucible 11 is suspended from a hanging device 12.

直径18インチ(457mm)の外坩堝lに第2図に示
した実施例の内坩堝11を用い、単結晶6及び外坩堝1
を回転させながら第1図に示した構成で原料を連続的に
供給し、直径6インチ(150mm)のシリコン単結晶
6を引上げ製造した。
Using the inner crucible 11 of the embodiment shown in FIG. 2 in an outer crucible 1 with a diameter of 18 inches (457 mm),
While rotating, raw materials were continuously supplied using the configuration shown in FIG. 1, and a silicon single crystal 6 having a diameter of 6 inches (150 mm) was pulled and produced.

実施例では、内坩堝は上方を外側に湾曲させ、Arガス
13.14が円滑に流れるようにしたためSiOの内坩
堝への付着が減少した。その結果、SiOが堆積し、液
面へ落下し単結晶の多結晶化が起こるまでの引上可能な
時間を、従来の1.5〜2.0倍とすることができた。
In the example, the upper part of the inner crucible was curved outward to allow the Ar gas 13,14 to flow smoothly, thereby reducing the adhesion of SiO to the inner crucible. As a result, the time during which SiO can be pulled up until it is deposited, falls to the liquid surface, and polycrystallization of a single crystal occurs can be increased by 1.5 to 2.0 times compared to the conventional method.

また、供給した原料や原料中に含まれる粉塵が内坩堝内
へ入ることを防止し、これによる単結晶の多結晶化が起
こることを防止することができた。
In addition, it was possible to prevent the supplied raw materials and dust contained in the raw materials from entering the inner crucible, thereby preventing polycrystallization of the single crystal.

なお、前記実例では内坩堝を上方より吊り下げる場合に
ついて説明したが、本発明はこれに限るものではな(、
内外坩堝を底部で一体としたものでもよい。
In addition, although the case where the inner crucible is suspended from above was explained in the above example, the present invention is not limited to this.
The inner and outer crucible may be integrated at the bottom.

[発明の効果] 本発明は、内坩堝を配設し、内外坩堝の間隙に原料を供
給し連続的に引上げる単結晶Si製造方法に際し、内坩
堝の形状を上広で外側に湾曲しているようにしたから、
炉内のArガスにより、内坩堝中側のSiOが円滑に坩
堝外へ排出されるようになり、内坩堝へのSiOの付着
を減少させ、長時間の連続引上が可能になった。
[Effects of the Invention] The present invention provides a single-crystal Si manufacturing method in which an inner crucible is disposed, raw materials are supplied to the gap between the inner and outer crucibles, and the material is continuously pulled. Because I made sure that there was
The Ar gas in the furnace allowed the SiO in the middle of the inner crucible to be smoothly discharged to the outside of the crucible, reducing the adhesion of SiO to the inner crucible and making continuous pulling possible for a long time.

また、内坩堝の上部湾曲部は、原料を供給する内外坩堝
の間隙を覆うから、原料中に含まれる粉塵等が内坩堝に
入り単結晶が多結晶化することを防止できるという効果
もある。
Furthermore, since the upper curved portion of the inner crucible covers the gap between the inner and outer crucibles for supplying raw materials, there is also the effect of preventing dust contained in the raw materials from entering the inner crucible and turning the single crystal into polycrystals.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による内坩堝を用いた引上の一例を示す
装置略図、第2図は第1図における本発明の内坩堝の概
形図、第3図は従来の内坩堝を用い原料を連続的に供給
しながら単結晶を引上げる方法の一例の説明図である。 1・・・坩堝        2・・・回転装置3・・
・ヒータ        4−・・融液5・・・引上ワ
イヤ     6・・・単結晶7・・・供給管    
   8・・・多結晶原料11・・・内坩堝     
12・・・吊装置13、l 4− A r
FIG. 1 is a schematic diagram of an apparatus showing an example of pulling the raw material using the inner crucible according to the present invention, FIG. 2 is a schematic diagram of the inner crucible of the present invention shown in FIG. 1, and FIG. FIG. 2 is an explanatory diagram of an example of a method for pulling a single crystal while continuously supplying . 1... Crucible 2... Rotating device 3...
・Heater 4-... Melt 5... Pulling wire 6... Single crystal 7... Supply pipe
8... Polycrystalline raw material 11... Inner crucible
12... Hanging device 13, l4-A r

Claims (1)

【特許請求の範囲】[Claims] 1 内坩堝を配設し、内外坩堝の間隙に原料を供給し連
続的に引上げる単結晶引上装置において、内坩堝は下部
を円筒形とし上部をラッパ状にわん曲拡径した形状とし
たことを特徴とする単結晶引上装置。
1 In a single crystal pulling device that is equipped with an inner crucible and feeds raw materials into the gap between the inner and outer crucibles and continuously pulls the crystal, the inner crucible has a cylindrical lower part and a trumpet-shaped upper part with a curved diameter expansion. A single crystal pulling device characterized by:
JP20676590A 1990-08-06 1990-08-06 Device of pulling up single crystal Pending JPH0492884A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20676590A JPH0492884A (en) 1990-08-06 1990-08-06 Device of pulling up single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20676590A JPH0492884A (en) 1990-08-06 1990-08-06 Device of pulling up single crystal

Publications (1)

Publication Number Publication Date
JPH0492884A true JPH0492884A (en) 1992-03-25

Family

ID=16528721

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20676590A Pending JPH0492884A (en) 1990-08-06 1990-08-06 Device of pulling up single crystal

Country Status (1)

Country Link
JP (1) JPH0492884A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104685113A (en) * 2012-09-10 2015-06-03 Gtatip控股有限责任公司 Continuous CZ method and apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104685113A (en) * 2012-09-10 2015-06-03 Gtatip控股有限责任公司 Continuous CZ method and apparatus
JP2015527295A (en) * 2012-09-10 2015-09-17 ジーティーエイティー アイピー ホールディング エルエルシーGtat Ip Holding Llc Continuous Czochralski method and equipment
EP2893057A4 (en) * 2012-09-10 2016-06-15 Gtat Ip Holding Llc Continuous czochralski method and apparatus
US9745666B2 (en) 2012-09-10 2017-08-29 Gtat Ip Holding Llc Continuous czochralski method and apparatus
JP2018168060A (en) * 2012-09-10 2018-11-01 ジーティーエイティー アイピー ホールディング エルエルシーGtat Ip Holding Llc Continuous czochralski method and apparatus

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