JPH0482838U - - Google Patents

Info

Publication number
JPH0482838U
JPH0482838U JP12434190U JP12434190U JPH0482838U JP H0482838 U JPH0482838 U JP H0482838U JP 12434190 U JP12434190 U JP 12434190U JP 12434190 U JP12434190 U JP 12434190U JP H0482838 U JPH0482838 U JP H0482838U
Authority
JP
Japan
Prior art keywords
reticle
wafer stage
wafer
control unit
projection exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12434190U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12434190U priority Critical patent/JPH0482838U/ja
Publication of JPH0482838U publication Critical patent/JPH0482838U/ja
Pending legal-status Critical Current

Links

JP12434190U 1990-11-28 1990-11-28 Pending JPH0482838U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12434190U JPH0482838U (enrdf_load_stackoverflow) 1990-11-28 1990-11-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12434190U JPH0482838U (enrdf_load_stackoverflow) 1990-11-28 1990-11-28

Publications (1)

Publication Number Publication Date
JPH0482838U true JPH0482838U (enrdf_load_stackoverflow) 1992-07-20

Family

ID=31871999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12434190U Pending JPH0482838U (enrdf_load_stackoverflow) 1990-11-28 1990-11-28

Country Status (1)

Country Link
JP (1) JPH0482838U (enrdf_load_stackoverflow)

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