JPH0480043U - - Google Patents
Info
- Publication number
- JPH0480043U JPH0480043U JP12539090U JP12539090U JPH0480043U JP H0480043 U JPH0480043 U JP H0480043U JP 12539090 U JP12539090 U JP 12539090U JP 12539090 U JP12539090 U JP 12539090U JP H0480043 U JPH0480043 U JP H0480043U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- atmospheric pressure
- cvd apparatus
- pressure cvd
- tray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12539090U JPH0480043U (enExample) | 1990-11-27 | 1990-11-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12539090U JPH0480043U (enExample) | 1990-11-27 | 1990-11-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0480043U true JPH0480043U (enExample) | 1992-07-13 |
Family
ID=31872990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12539090U Pending JPH0480043U (enExample) | 1990-11-27 | 1990-11-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0480043U (enExample) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59162275A (ja) * | 1983-02-26 | 1984-09-13 | ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | 陰極スパツタリングにより基板上に回転対称の厚みプロフイ−ルを有する層を製造する装置及び該装置の運転法 |
| JPH01318235A (ja) * | 1988-06-20 | 1989-12-22 | Kawasaki Steel Corp | 半導体製造装置 |
-
1990
- 1990-11-27 JP JP12539090U patent/JPH0480043U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59162275A (ja) * | 1983-02-26 | 1984-09-13 | ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | 陰極スパツタリングにより基板上に回転対称の厚みプロフイ−ルを有する層を製造する装置及び該装置の運転法 |
| JPH01318235A (ja) * | 1988-06-20 | 1989-12-22 | Kawasaki Steel Corp | 半導体製造装置 |