JPH0479143A - High-frequency induction coupling plasma mass spectrometer - Google Patents
High-frequency induction coupling plasma mass spectrometerInfo
- Publication number
- JPH0479143A JPH0479143A JP2194442A JP19444290A JPH0479143A JP H0479143 A JPH0479143 A JP H0479143A JP 2194442 A JP2194442 A JP 2194442A JP 19444290 A JP19444290 A JP 19444290A JP H0479143 A JPH0479143 A JP H0479143A
- Authority
- JP
- Japan
- Prior art keywords
- sampling cone
- cone
- sampling
- optical axis
- sample ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000006698 induction Effects 0.000 title description 2
- 230000008878 coupling Effects 0.000 title 1
- 238000010168 coupling process Methods 0.000 title 1
- 238000005859 coupling reaction Methods 0.000 title 1
- 150000002500 ions Chemical class 0.000 claims abstract description 31
- 238000005070 sampling Methods 0.000 claims abstract description 29
- 238000004949 mass spectrometry Methods 0.000 claims description 9
- 238000009616 inductively coupled plasma Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 abstract description 10
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 241000238634 Libellulidae Species 0.000 description 5
- 239000007788 liquid Substances 0.000 description 3
- 239000006199 nebulizer Substances 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は、高周波誘導結合プラズマ（ＩＣＰ）イオン源
と質量分析装置とを結合した高周波誘導結合プラズマ質
量分析装置（ＩＣＰ−ＭＳ）に関するものである。[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to an inductively coupled plasma mass spectrometer (ICP-MS) that combines an inductively coupled plasma (ICP) ion source and a mass spectrometer. be.
［従来の技術］ 第４図はＩＣＰ−ＭＳの一例を示している。[Conventional technology] FIG. 4 shows an example of ICP-MS.
同図において、１はＩＣＰイオン源で、高周波誘導コイ
ル２を巻回した石英等の電気絶縁体製プラズマトーチ３
と試料液を噴霧するためのネプライザ４とから構成され
ている。５は前記コイル２に高周波電圧を印加するため
の高周波電源、６は試料液７を収納すると共に前記ネプ
ライザ４に導入管８を介して接続された試料ボトルであ
る。９は前記コイル２からの高周波をシールドするため
のケースで、このケースは前記高周波電源５のアース側
と接続されている。In the figure, 1 is an ICP ion source, and a plasma torch 3 made of an electrical insulator such as quartz around which a high-frequency induction coil 2 is wound.
and a nebulizer 4 for spraying the sample liquid. 5 is a high frequency power source for applying a high frequency voltage to the coil 2; 6 is a sample bottle that stores a sample liquid 7 and is connected to the nebulizer 4 via an introduction tube 8; Reference numeral 9 denotes a case for shielding high frequency waves from the coil 2, and this case is connected to the ground side of the high frequency power source 5.
１０はサンプリングコーン１１とスキマー１２゜１３か
らなるインターフェース、１４は質量分析装置で、内部
に質量分析系１５が設けである。１６はイオンを加速、
収束してこの質量分析系１５に導入するための電極群で
ある。１７は前記質量分析装置１４内を高真空に保つた
めの油拡散ポンプ、１８１９は前記ノズル１１とスキマ
ー１２の間の空間Ａ１及びスキマー１２と１３の間の空
間Ａ２を排気するための油回転ポンプである。10 is an interface consisting of a sampling cone 11 and skimmers 12 and 13, and 14 is a mass spectrometer, in which a mass spectrometry system 15 is provided. 16 accelerates ions,
This is an electrode group for converging and introducing into this mass spectrometry system 15. 17 is an oil diffusion pump for keeping the interior of the mass spectrometer 14 in a high vacuum; 1819 is an oil rotary pump for evacuating the space A1 between the nozzle 11 and the skimmer 12 and the space A2 between the skimmers 12 and 13. It is.
この様な構成において、プラズマトーチ３内には図示外
のガス供給源からアルゴンガスが供給され、また、ネプ
ライザ４から試料液７が霧状となって導入される。この
状態において、高周波電源５からコイル２に高周波電力
を印加して高周波磁界を形成すると、高周波誘導プラズ
マ（以下プラズマと称す）Ｐが発生するため、このプラ
ズマ内の試料イオンがサンプリングコーン１１．各スキ
マー１２．１３を通ってインターフェース１０内に進入
する。このインターフェース内に進入したイオンは電極
群１６により加速、収束されて質量分析系１５に導入さ
れ質量分析される。この質量分析系としては、Ｑポール
型及び磁場型のいずれを用いてもよい
［発明が解決しようとする課題］
プラズマ内の試料イオンがサンプリングコーンを介して
充分にインターフェイス内に導入されているにもかかわ
らず感度が低下し、電極群でのフォーカスも困難になる
ことがしばしば起こったために調査したところ、サンプ
リングコーンの導入孔の形状つまり加工精度上の、ぼり
等によって導入された試料イオンの向きが変わりイオン
光軸を通らず、スリットから大きく外れることが分かっ
た。In such a configuration, argon gas is supplied into the plasma torch 3 from a gas supply source not shown, and the sample liquid 7 is introduced in the form of a mist from the nebulizer 4. In this state, when high-frequency power is applied from the high-frequency power source 5 to the coil 2 to form a high-frequency magnetic field, high-frequency induced plasma (hereinafter referred to as plasma) P is generated, and sample ions in this plasma are transferred to the sampling cone 11. Each skimmer 12.13 enters the interface 10. Ions that have entered this interface are accelerated and focused by the electrode group 16, introduced into the mass spectrometry system 15, and subjected to mass analysis. As this mass spectrometry system, either a Q-pole type or a magnetic field type may be used [Problem to be solved by the invention] When sample ions in the plasma are sufficiently introduced into the interface via the sampling cone, Despite this, sensitivity often decreased and focusing with the electrode group often became difficult, so we investigated the shape of the introduction hole of the sampling cone, that is, the direction of the sample ions introduced by the beam etc. due to the machining accuracy. It was found that the ion beam changed and the ion beam did not pass through the optical axis, and it deviated significantly from the slit.
そこで、本発明はかかる点に鑑みてなされたものであり
、導入された試料イオンの入射条件によるイオン光軸か
らの大幅なずれを防止し、試料イオンを効率良く質量分
析系に導入することかでき、測定感度を向上させ得る装
置を提供することを目的とするものである。Therefore, the present invention has been made in view of the above points, and it is an object of the present invention to prevent the introduced sample ions from being significantly deviated from the ion optical axis due to the incident conditions, and to efficiently introduce the sample ions into a mass spectrometry system. The object of the present invention is to provide an apparatus that can improve measurement sensitivity.
［課題を解決するための手段］
上記目的を達成するため、本発明は高周波誘導結合プラ
ズマイオン源を用いて試料をイオン化し、生じたイオン
をサンプリングコーンを介して質量分析系に導入するよ
うにした装置において、前記サンプリングコーンとコー
ン支持部材との間で球体軸受けを形成させてサンプリン
グコーンの導入孔を中心としたサンプリングコーンを回
動可能に設けたことを特徴とするものである。[Means for Solving the Problems] In order to achieve the above object, the present invention ionizes a sample using a high frequency inductively coupled plasma ion source and introduces the generated ions into a mass spectrometry system through a sampling cone. The device is characterized in that a spherical bearing is formed between the sampling cone and the cone support member so that the sampling cone can rotate around the introduction hole of the sampling cone.
［作用コ
サンプリングコーンの導入孔の形状等により導入される
試料イオンがイオン光軸からずれても、サンプリングコ
ーンを導入孔を中心として任意に回動させることにより
、試料イオンの進行方向を変え、イオン光軸に沿って試
料イオンが導入されるように調整できる。[Operation] Even if the introduced sample ions are deviated from the ion optical axis due to the shape of the introduction hole of the cosampling cone, the traveling direction of the sample ions can be changed by arbitrarily rotating the sampling cone around the introduction hole. Adjustment can be made so that sample ions are introduced along the ion optical axis.
［実施例］ 以下、本発明の実施例を図面に基づいて詳述する。[Example] Hereinafter, embodiments of the present invention will be described in detail based on the drawings.
第１図は本発明の一実施例装置の要部を示した概略拡大
図であり、第４図と同一番号のものは同一構成要素を示
す。FIG. 1 is a schematic enlarged view showing the main parts of an apparatus according to an embodiment of the present invention, and the same numbers as in FIG. 4 indicate the same components.
第１図の装置において、第４図の従来例と異なるのは、
サンプリングコーン２０とコーン支持部材２８との間で
球体軸受けを形成し、サンプリングコーン２０を駆動部
２６ａ〜２６ｄによって導入孔２１を中心として回動可
能にしたことである。The difference between the device shown in Fig. 1 and the conventional example shown in Fig. 4 is as follows.
A spherical bearing is formed between the sampling cone 20 and the cone support member 28, so that the sampling cone 20 can be rotated about the introduction hole 21 by the driving parts 26a to 26d.
またこの球体軸受けの滑り面にＯリング２７を配して気
密性を高めた。この駆動部２６ａ〜２６ｄは、第２図に
示したように、上下左右の対称位置にそれぞれ設けられ
、ツマミ２５を回すことによりベアリング２４を介して
ブツシュロッド２３を摺動させ、サンプリングコーン２
０を回動させる。Additionally, an O-ring 27 is arranged on the sliding surface of this spherical bearing to improve airtightness. As shown in FIG. 2, the driving parts 26a to 26d are provided at symmetrical positions vertically and horizontally, and by turning the knob 25, the bushing rod 23 is slid through the bearing 24, and the sampling cone 2
Rotate 0.
駆動部２６ａ及び２６ｂで上下方向に、これと直交する
駆動部２６ｃ及び２６ｄで左右方向にサンプリングコー
ン２０を回動させることができる。The sampling cone 20 can be rotated vertically by the driving parts 26a and 26b, and horizontally by the driving parts 26c and 26d perpendicular thereto.
この様な構成において、従来例と同様の方法によって、
高周波誘導プラズマ（以下プラズマと称す）Ｐを発生さ
せ、このプラズマ内の試料イオンがサンプリングコーン
２０の導入孔２１から導入される。そして、導入孔２１
の加工精度上の、ぼり等によって導入された試料イオン
の向きが変わって、第３図（ａ）のようにイオン光軸Ｏ
から大きく外ずれ、電極群での質量分析系へのフォーカ
スが困難になった場合、駆動部２６ａ〜２６ｄによって
第３図（ｂ）のようにサンプリングコーン２０を導入孔
２１を中心として回動させれば、試料イオンの進行方向
が変わり、イオン光軸Ｏに沿って進むように調整できる
。In such a configuration, by the same method as the conventional example,
High frequency induced plasma (hereinafter referred to as plasma) P is generated, and sample ions within this plasma are introduced through the introduction hole 21 of the sampling cone 20. And the introduction hole 21
Due to the processing accuracy, the direction of the sample ions introduced by the streamer etc. may change, and the ion optical axis O as shown in Figure 3(a) may change.
If the sampling cone 20 deviates significantly from the center and it becomes difficult to focus the mass spectrometry system using the electrode group, the driving units 26a to 26d rotate the sampling cone 20 around the introduction hole 21 as shown in FIG. 3(b). If so, the traveling direction of the sample ions changes and can be adjusted so that they travel along the ion optical axis O.
尚、上述した実施例においては、サンプリングコーンの
み回動可能に設けたが、駆動部を真空シ−ルすればスキ
マーコーンにも適用できる。また、コーンに電圧を印加
する場合、ツマミ部分を絶縁物にすれば可能である。そ
れから、向かい合う２個の駆動部の片側にスプリング等
を用いて、片側のツマミだけで調整するようにしても良
い。更に、ツマミ部にモータを接続すればＣＰＵ等によ
る遠隔操作も可能である。また、これらは全てＩＣＰ／
ＭＳに限らず一般の大気圧ＭＳにも使用できる。In the above-mentioned embodiment, only the sampling cone was rotatably provided, but the present invention can also be applied to a skimmer cone if the driving section is vacuum-sealed. Furthermore, when applying a voltage to the cone, it is possible to make the knob part an insulator. Alternatively, a spring or the like may be used on one side of the two opposing drive units so that adjustment can be made using only a knob on one side. Furthermore, if a motor is connected to the knob, remote control by a CPU or the like is also possible. Also, all of these are ICP/
It can be used not only for MS but also for general atmospheric pressure MS.
［効果コ
以上詳述したように本発明によれば、サンプリングコー
ンを導入孔を中心に回動可能に設けたため、試料イオン
をイオン光軸に沿って進行させ、質量分析系に効率よく
導入することができ、測定感度を向上させることができ
る。[Effects] As detailed above, according to the present invention, the sampling cone is provided so as to be rotatable around the introduction hole, so sample ions are allowed to travel along the ion optical axis and efficiently introduced into the mass spectrometry system. It is possible to improve measurement sensitivity.
第１図は本発明の一実施例装置の要部を示した概略拡大
図、第２図は第１図のＡＡ矢視図、第３図はイオン光軸
からのずれの補正を示す図、第４図は従来例を説明する
ための図である。
２０：サンプリングコーン
２１：導入孔 ２３
２４：ベアリング ２５
２６ａ 〜２６ｄ ：駆動部
２７：０リング ２８
：プッシュロット
ツマミ
：支持部材FIG. 1 is a schematic enlarged view showing the main parts of an apparatus according to an embodiment of the present invention, FIG. 2 is a view taken along arrow AA in FIG. 1, and FIG. 3 is a diagram showing correction of deviation from the ion optical axis. FIG. 4 is a diagram for explaining a conventional example. 20: Sampling cone 21: Introduction hole 23 24: Bearing 25 26a to 26d: Drive section 27: 0 ring 28: Push slot knob: Support member
Claims (1)
化し、生じたイオンをサンプリングコーンを介して質量
分析系に導入するようにした装置において、前記サンプ
リングコーンとコーン支持部材との間で球体軸受けを形
成させてサンプリングコーンの導入孔を中心としたサン
プリングコーンを回動可能に設けたことを特徴とする高
周波誘導結合プラズマ質量分析装置。In an apparatus in which a sample is ionized using a high-frequency inductively coupled plasma ion source and the generated ions are introduced into a mass spectrometry system via a sampling cone, a spherical bearing is formed between the sampling cone and a cone support member. A high frequency inductively coupled plasma mass spectrometer characterized in that a sampling cone is rotatably provided around an introduction hole of the sampling cone.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2194442A JPH0479143A (en) | 1990-07-23 | 1990-07-23 | High-frequency induction coupling plasma mass spectrometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2194442A JPH0479143A (en) | 1990-07-23 | 1990-07-23 | High-frequency induction coupling plasma mass spectrometer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0479143A true JPH0479143A (en) | 1992-03-12 |
Family
ID=16324655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2194442A Pending JPH0479143A (en) | 1990-07-23 | 1990-07-23 | High-frequency induction coupling plasma mass spectrometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0479143A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0591342A1 (en) * | 1991-06-18 | 1994-04-13 | Synopsys, Inc. | Basic cell architecture for mask programmable gate array |
| JP2010225442A (en) * | 2009-03-24 | 2010-10-07 | Canon Inc | Gas cluster ion beam irradiation device |
-
1990
- 1990-07-23 JP JP2194442A patent/JPH0479143A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0591342A1 (en) * | 1991-06-18 | 1994-04-13 | Synopsys, Inc. | Basic cell architecture for mask programmable gate array |
| EP0591342B1 (en) * | 1991-06-18 | 2001-10-17 | Artisan Components, Inc. | Basic cell architecture for mask programmable gate array |
| JP2010225442A (en) * | 2009-03-24 | 2010-10-07 | Canon Inc | Gas cluster ion beam irradiation device |
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