JPH047834A - Heat treatment device for substrate - Google Patents

Heat treatment device for substrate

Info

Publication number
JPH047834A
JPH047834A JP11152390A JP11152390A JPH047834A JP H047834 A JPH047834 A JP H047834A JP 11152390 A JP11152390 A JP 11152390A JP 11152390 A JP11152390 A JP 11152390A JP H047834 A JPH047834 A JP H047834A
Authority
JP
Japan
Prior art keywords
cylindrical body
furnace core
exhaust
core tube
tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11152390A
Other languages
Japanese (ja)
Inventor
Sanenobu Matsunaga
実信 松永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP11152390A priority Critical patent/JPH047834A/en
Publication of JPH047834A publication Critical patent/JPH047834A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the outside air from intruding into a furnace core tube caused by the generation of a negative pressure by a method wherein an annular eccentric plate is mounted in a state that as the interval of a gap, which is formed between this annular eccentric plate and an inner side cylindrical body or an outer side cylindrical body, becomes nearer to an exhaust vent, the interval is made smaller. CONSTITUTION:A circular and annular baffle plate 13 having an eccentric opening 12 eccentric to the tube axis of a furnace core tube 1 is mounted on the outer peripheral surface of an inner side cylindrical body 7 between an exhaust vent 9 and an annular suction air port 20 in a space between the cylindrical body 7 and an outer side cylindrical body 8. In this case, the plate 13 is constituted into such a structure that it is mounted in a state that as the interval L between its outer peripheral surface and the inner peripheral surface of the cylindrical body 8 becomes nearer to the side of the vent 9, the interval L is made smaller, a large resistance is specially imparted to purge gas to be exhausted, which is near the side of the vent 9, and a suction exhaust force to act in open ends between the lower ends of the cylindrical bodies 7 and 8 is uniformized over the whole peripheries of the peripheral directions of the cylindrical bodies 7 and 8. Thereby, it is eliminated that gas which is exhausted from the interior of the tube 1 is one-sided to the side of the exhaust vent 9 and is exhausted, the generation of a negative pressure which accompanies the exhaust can be prevented and the outside air can be prevented from intruding into the tube 1.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、半導体基板やセラミックス基板といった各種
の基板に対して、酸化、アニーリング、CVD (化学
気相成長)、あるいは、拡散などの各種の熱処理を行う
ように、周囲に加熱手段を設けた炉芯管にガス導入孔を
設けるとともに、前記炉芯管の管軸芯方向一端側に基板
を保持した基板ボートを挿脱する開口を設けた基板用熱
処理装置に関する。
[Detailed Description of the Invention] <Industrial Application Field> The present invention applies various methods such as oxidation, annealing, CVD (chemical vapor deposition), or diffusion to various substrates such as semiconductor substrates and ceramic substrates. In order to perform heat treatment, a gas introduction hole is provided in a furnace core tube provided with a heating means around the periphery, and an opening for inserting and removing a substrate boat holding a substrate is provided at one end of the furnace core tube in the tube axis direction. The present invention relates to a heat treatment apparatus for substrates.

〈従来の技術〉 この種の基板用熱処理装置では、炉芯管に対する基板ボ
ートの挿脱時や基板ボートを抜き出した状態において、
その炉芯管内に外気が侵入すると、熱処理を行うときに
、例えば、酸素供給量の制御が不能になるなど、基板ボ
ートに保持された基板上の自然酸化膜の成長を助長した
り、外気中の炭酸ガスなどの不純物が基板に付着するな
ど、酸化やCVDプロセスなどに悪影響を及ぼす問題が
あった。
<Prior art> In this type of substrate heat treatment apparatus, when the substrate boat is inserted into or removed from the furnace core tube or when the substrate boat is pulled out,
If outside air enters the furnace core tube, it may cause the growth of natural oxide film on the substrates held in the substrate boat, for example, making it impossible to control the oxygen supply during heat treatment, or There is a problem in that impurities such as carbon dioxide gas adhere to the substrate, which adversely affects oxidation and CVD processes.

そこで、従来では、炉芯管内への外気の侵入を防止する
ために、炉芯管内へN2ガス等の不活性ガスからなるパ
ージガスを供給するとともに、炉芯管の前記開口側端部
に後述するスカベンジャーと呼ばれる吸引排気手段を付
設して、パージガスおよび外気をスカベンジャーが吸引
排気することによって、外気が炉芯管内へ侵入しようと
するのを阻止するように構成されている。
Therefore, conventionally, in order to prevent outside air from entering the furnace core tube, a purge gas made of an inert gas such as N2 gas is supplied into the furnace core tube, and at the same time, a purge gas made of an inert gas such as N2 gas is supplied to the opening side end of the furnace core tube. A suction/exhaust means called a scavenger is attached, and the scavenger suctions and exhausts the purge gas and outside air, thereby preventing outside air from entering the furnace core tube.

なお、スカベンジャーとは、炉芯管の基板ボート挿脱用
の開口端部に内側筒体を設け、内側筒体の炉芯管から遠
い方の端部の半径方向外側を周回するリング状の吸気口
を形成するように内側筒体の外周に外側筒体を設け、外
側筒体に排気口を開設して排気手段に連通し、外側筒体
と内側筒体との間の空間内を排気することでリング状の
吸気口から吸気するようにしたものである。
Note that the scavenger is a ring-shaped air intake that is provided with an inner cylinder at the open end of the furnace core tube for insertion and removal of the board boat, and that goes around the radial outside of the end of the inner cylinder that is far from the furnace core tube. An outer cylindrical body is provided on the outer periphery of the inner cylindrical body so as to form an opening, and an exhaust port is provided in the outer cylindrical body to communicate with an exhaust means to exhaust the space between the outer cylindrical body and the inner cylindrical body. This allows air to be taken in through a ring-shaped intake port.

〈発明が解決しようとする課題〉 しかし、スカベンジャー内、すなわち内側筒体と外側筒
体との間の空間において、排気手段と連通している排気
口に対し、近い側では吸引排気力が強いが、遠い側では
弱いのでスカベンジャーにおける前記リング状吸引口に
作用する吸引排気力は、周方向には一定でない。
<Problem to be solved by the invention> However, in the scavenger, that is, in the space between the inner cylinder and the outer cylinder, the suction and exhaust force is strong on the side closer to the exhaust port communicating with the exhaust means. , since it is weaker on the far side, the suction and exhaust force acting on the ring-shaped suction port in the scavenger is not constant in the circumferential direction.

このため、リング状の吸引口における排気口に近い側へ
向かってパージガスが強(引かれるような気流が生じ、
リング状の吸引口における排気口から遠い側の付近では
、かかる気流に引かれて部分的に負圧の状態となり、そ
れを補うように外気が流入するので、炉芯管内への外気
の侵入を期待したほどには阻止できなかった。
For this reason, a strong (pulling) airflow is generated in which the purge gas is drawn towards the side of the ring-shaped suction port that is closer to the exhaust port.
Near the side of the ring-shaped suction port far from the exhaust port, a partial negative pressure state is created due to the airflow, and outside air flows in to compensate for this, preventing outside air from entering the furnace core tube. I wasn't able to stop it as much as I had hoped.

本発明は、このような事情に鑑みてなされたものであっ
て、炉芯管の開口端における周方向での吸引排気力の差
を少なくして、負圧発生による外気の炉芯管内への侵入
を防止できるようにすることを目的とする。
The present invention has been made in view of the above circumstances, and reduces the difference in the suction and exhaust force in the circumferential direction at the open end of the furnace core tube, thereby reducing the flow of outside air into the furnace core tube due to the generation of negative pressure. The purpose is to prevent intrusion.

く課題を解決するための手段〉 本発明は、上述のような目的を達成するために、請求項
第(1)項の発明として、周囲に加熱手段を設けた炉芯
管にガス導入孔を設けるとともに、炉芯管の管軸芯方向
一端側に基板を保持した基板ボートを挿脱する開口を設
け、炉芯管の開口側端部に内側筒体を設け、内側筒体の
炉芯管から遠い方の端部の半径方向外側を周回するリン
グ状の吸気口を形成するように内側筒体の外周に外側筒
体を設け、外側筒体に排気口を開設して排気手段に連通
し、排気口を経て外側筒体と内側筒体との間の空間内を
排気することによりリング状の吸気口から吸気するよう
にした基板用熱処理装置において、内側筒体と外側筒体
との間の空間内で、排気口とリング状吸気口との間に、
外縁または内縁が偏心したリング状偏心板を、このリン
グ状偏心板と内側筒体または外側筒体との間に形成され
る隙間の間隔が排気口に近い側程小さくなるように取付
けて構成する。
Means for Solving the Problems> In order to achieve the above-mentioned object, the present invention, as the invention of claim (1), provides a method in which a gas introduction hole is provided in a furnace core tube around which a heating means is provided. At the same time, an opening for inserting and removing a substrate boat holding a substrate is provided at one end in the tube axis direction of the furnace core tube, an inner cylinder is provided at the open end of the furnace core tube, and an inner cylinder is provided at one end of the furnace core tube in the tube axis direction. An outer cylindrical body is provided on the outer periphery of the inner cylindrical body so as to form a ring-shaped intake port that goes around the radially outer side of the end farther from the inner cylindrical body, and an exhaust port is opened in the outer cylindrical body to communicate with the exhaust means. In a heat treatment apparatus for a substrate, in which air is taken in from a ring-shaped intake port by exhausting the space between the outer cylinder and the inner cylinder through the exhaust port, the space between the inner cylinder and the outer cylinder is In the space between the exhaust port and the ring-shaped intake port,
A ring-shaped eccentric plate having an eccentric outer edge or an inner edge is attached so that the gap formed between the ring-shaped eccentric plate and the inner cylinder or the outer cylinder becomes smaller as it approaches the exhaust port. .

また、請求項第(2)項の発明として、周囲に加熱手段
を設けた炉芯管にガス導入孔を設けるとともに、炉芯管
の管軸芯方向一端側に基板を保持した基板ボートを挿脱
する開口を設け、炉芯管の開口側端部に内側筒体を設け
、内側筒体の炉芯管から遠い方の端部の半径方向外側を
周回するリング状の吸気口を形成するように内側筒体の
外周に外側筒体を設け、外側筒体に排気口を開設して排
気手段に連通し、排気口を経て外側筒体と内側筒体との
間の空気内を排気することによりリング状の吸気口から
吸気するようにした基板用熱処理装置において、内側筒
体と外側筒体との間の空間内で排気口とリング状吸気口
との間に、外側筒体の内周面から半径方向内側へ張り出
す第1の邪魔板と、内側筒体の外周面から第1の邪魔板
との半径方向外側へ張り出す第2の邪魔板とを設けるこ
とによって、 内側筒体と外側筒体との間の空間内にて
、排気口に向かう排気流路をジグザグ状の流路に形成す
るように構成する。
Further, as the invention of claim (2), a gas introduction hole is provided in a furnace core tube provided with a heating means around the periphery, and a substrate boat holding a substrate is inserted into one end of the furnace core tube in the tube axis direction. An inner cylindrical body is provided at the opening side end of the furnace core tube, and a ring-shaped intake port is formed around the radially outer side of the end of the inner cylinder body that is far from the furnace core tube. An outer cylindrical body is provided on the outer periphery of the inner cylindrical body, an exhaust port is provided in the outer cylindrical body to communicate with the exhaust means, and the air between the outer cylindrical body and the inner cylindrical body is exhausted through the exhaust port. In a heat treatment apparatus for substrates in which air is taken in from a ring-shaped intake port, there is a gap between the exhaust port and the ring-shaped intake port in the space between the inner cylinder and the outer cylinder. By providing a first baffle plate that protrudes radially inward from the surface and a second baffle plate that protrudes radially outward from the outer peripheral surface of the inner cylinder body, The exhaust flow path toward the exhaust port is configured to be formed in a zigzag shape in the space between the outer cylindrical body and the exhaust port.

〈作用〉 請求項第(1)項の発明に係る基板用熱処理装置の構成
によれば、邪魔板の外周面と外側筒体の内周面、または
、邪魔板の内周面と内側筒体の外周面それぞれの間で形
成される排気流路の幅が、排気口に近い側程狭く、その
排気に対して付与する流動抵抗が排気口に近い側程大き
く、炉芯管から遠い端部側の全周において、炉芯管内か
ら排出されるガスに付与する吸引排気力を均一化できる
<Operation> According to the structure of the heat treatment apparatus for substrates according to the invention of claim (1), the outer circumferential surface of the baffle plate and the inner circumferential surface of the outer cylinder, or the inner circumferential surface of the baffle plate and the inner circumferential body The width of the exhaust flow path formed between the outer circumferential surfaces of the furnace tube is narrower on the side closer to the exhaust port, and the flow resistance given to the exhaust is larger on the side closer to the exhaust port, and The suction and exhaust force applied to the gas discharged from the furnace core tube can be made uniform over the entire circumference of the side.

また、請求項第(2)項の発明に係る基板用熱処理装置
の構成によれば、排気口を通じて作用する吸引排気力に
邪魔板で抵抗を付与し、その邪魔板によって周方向に吸
引排気力を分散し、炉芯管から遠い端部側の全周におい
て、炉芯管内から排出されるガスに付与する吸引排気力
に差が生じることを抑えることができる。
Further, according to the structure of the substrate heat treatment apparatus according to the invention of claim (2), the baffle plate provides resistance to the suction and exhaust force acting through the exhaust port, and the baffle plate provides the suction and exhaust force in the circumferential direction. This makes it possible to prevent differences in the suction and exhaust force applied to the gas discharged from the furnace core tube over the entire circumference of the end farthest from the furnace core tube.

〈実施例〉 以下、本発明の実施例を図面に基づいて詳細に説明する
<Example> Hereinafter, an example of the present invention will be described in detail based on the drawings.

第1図は、基板用熱処理装置の第1実施例の縦断面図で
あり、管軸芯方向が上下方向を向くように赤外線透過性
を有する石英材料によって形成された炉芯管lが設けら
れ、その炉芯管1の管軸芯方向上端側にパージガスとし
てのN2ガスや反応ガスを供給するガス導入孔2が設け
られ、一方、管軸芯方向下端側に、基板W・・・を保持
した基板ボート3を挿脱する開口4が設けられている。
FIG. 1 is a longitudinal cross-sectional view of a first embodiment of the heat treatment apparatus for substrates, in which a furnace core tube l formed of a quartz material having infrared transmittance is provided so that the tube axis direction is directed in the vertical direction. A gas introduction hole 2 for supplying N2 gas as a purge gas and a reaction gas is provided at the upper end side in the tube axis direction of the furnace core tube 1, and on the other hand, a substrate W is held at the lower end side in the tube axis direction. An opening 4 for inserting and removing the board boat 3 is provided.

ガス導入孔2には、図示しないパージガスの供給手段と
反応ガス供給手段とが選択的に連通接続可能に接続され
ている。
A purge gas supply means and a reaction gas supply means (not shown) are connected to the gas introduction hole 2 so as to be selectively communicable.

前記炉芯管1の周囲に、管軸芯方向に短い第1のヒータ
5aと長い第2のヒータ5bと短い第3のヒータ5cと
から成る加熱手段5が備えられている。
A heating means 5 is provided around the furnace core tube 1 and includes a first heater 5a that is short in the tube axis direction, a second heater 5b that is long, and a third heater 5c that is short.

炉芯管lの開口4側にスカベンジャー6が設けられ、基
板ボート3を炉芯管1に挿脱したり、基板ボート3を炉
芯管1から抜き出した空状態のときに、ガス導入孔2か
らN2ガスなどの不活性ガスによるパージガスを流すと
ともに、そのパージガスを炉芯管l内に侵入しようとす
る外気とともに開口4の周囲から排気するように構成さ
れている。
A scavenger 6 is provided on the side of the opening 4 of the furnace core tube l, and when the substrate boat 3 is inserted into and removed from the furnace core tube 1 or when the substrate boat 3 is taken out from the furnace core tube 1 in an empty state, a scavenger 6 is installed on the side of the opening 4 of the furnace core tube l. It is configured to flow a purge gas made of an inert gas such as N2 gas, and to exhaust the purge gas from around the opening 4 together with the outside air that is about to enter the furnace core tube l.

前記スカベンジャー6は、炉芯管1の開口4側端部に設
けた内側筒体7と、それを覆って設けられた外側筒体8
とから構成され、内側筒体7の下端と外側筒体8の下端
との間が全周にわたって開放されてリング状の吸気口2
0を形成するとともに、外側筒体8の上部に、図示しな
い排気手段に連通接続された排気口9が設けられている
The scavenger 6 includes an inner cylinder 7 provided at the end of the furnace core tube 1 on the side of the opening 4, and an outer cylinder 8 provided to cover it.
The space between the lower end of the inner cylinder body 7 and the lower end of the outer cylinder body 8 is open over the entire circumference, and a ring-shaped intake port 2 is formed.
0, and an exhaust port 9 is provided at the upper part of the outer cylindrical body 8 and is connected to an exhaust means (not shown).

なお、外側筒体8は、外側筒体本体部材8aと、仕切り
板8bとから構成される。仕切り板8bは、炉芯管1が
設置される領域と、基板ボート3を仮想線で示すように
炉芯管lから抜き出して基板Wを入れ替えする領域とを
区切る板材の一部を兼用させたものである。
Note that the outer cylinder 8 is composed of an outer cylinder main body member 8a and a partition plate 8b. The partition plate 8b doubles as a part of the plate material that separates the area where the furnace core tube 1 is installed and the area where the substrate boat 3 is extracted from the furnace core tube l and replaced with the substrate W, as shown by the imaginary line. It is something.

また、内外の筒体7.8を貫通し、内側筒体7内側に開
口するように、図示しない排気手段に連通接続された反
応ガス排気用の排気管10が設けられ、基板Wを保持し
た基板ボート3を炉芯管1内に挿入するとともに、開口
4を炉口キャップ11で蓋した状態で純酸素などの反応
ガスをガス導入孔2から流すときに、その反応ガスを排
気管10から排出していくように構成されている。
Further, an exhaust pipe 10 for exhausting a reaction gas, which is connected to an exhaust means (not shown) and is connected to an exhaust means (not shown), is provided so as to penetrate the inner and outer cylinders 7.8 and open inside the inner cylinder 7, and to hold the substrate W. When the substrate boat 3 is inserted into the furnace core tube 1 and a reactive gas such as pure oxygen is flowed through the gas introduction hole 2 with the opening 4 covered with the furnace mouth cap 11, the reactive gas is passed through the exhaust pipe 10. It is configured to be discharged.

内側筒体7と外側筒体8との間の空間内で排気口9とリ
ング状吸気口20との間、すなわち、かかる空間内で排
気口9と内側筒体7の下端との間において、第2図の要
部の拡大縦断面図、および、第3図の横断面図(第2図
の■−■線一部切欠矢視図)に示すように、炉芯管1の
管軸芯に対して偏心した開口12を有する円形環状の邪
魔板13が内側筒体7の外周面に取り付けられている。
Between the exhaust port 9 and the ring-shaped intake port 20 in the space between the inner cylinder 7 and the outer cylinder 8, that is, between the exhaust port 9 and the lower end of the inner cylinder 7 in this space, As shown in the enlarged vertical cross-sectional view of the main part in FIG. 2 and the cross-sectional view in FIG. 3 (partially cutaway view taken along the line ■-■ in FIG. A circular annular baffle plate 13 having an opening 12 eccentric with respect to the inner cylindrical body 7 is attached to the outer peripheral surface of the inner cylindrical body 7.

邪魔板13は、その外周面と外側筒体8の内周面との間
隔りが排気口9側程小さくなる状態で取り付けられ、排
気されるパージガスに対して、排気口9側程大きな抵抗
を付与し、それにより、内側筒体7と外側筒体8の下端
間の開放端において作用する吸引排気力が周方向全周に
わたって均一化されるように構成されている。
The baffle plate 13 is attached such that the distance between its outer peripheral surface and the inner peripheral surface of the outer cylindrical body 8 becomes smaller toward the exhaust port 9, and provides greater resistance to the exhausted purge gas toward the exhaust port 9. As a result, the suction and exhaust force acting at the open end between the lower ends of the inner cylinder body 7 and the outer cylinder body 8 is made uniform over the entire circumference in the circumferential direction.

この邪魔板13の別の実施の態様としては、その外径が
外側筒体8の内径にほぼ等しくなり、かつ、内側筒体7
よりも大径で炉芯管1の管軸芯に対して偏心した開口を
形成して構成し、それを外側筒体8に取り付け、邪魔板
13の内周面と内側筒体7との間隔が排気口9側程小さ
くなる状態で取り付けるようにしても良い。
Another embodiment of the baffle plate 13 is such that its outer diameter is approximately equal to the inner diameter of the outer cylinder 8 and the inner cylinder 7
It is configured by forming an opening having a larger diameter and eccentric to the tube axis of the furnace core tube 1, and attaching it to the outer cylindrical body 8, so that the distance between the inner circumferential surface of the baffle plate 13 and the inner cylindrical body 7 is It may be installed in such a manner that the distance becomes smaller toward the exhaust port 9 side.

基板ボート3ば、周方向に間隔を隔てて設けた基板支持
用の石英製で透明の3本の支柱3C・・・の長手方向両
端側それぞれに石英製の板体3a、3bを一体的に設け
て構成されている。
The substrate boat 3B has three transparent pillars 3C made of quartz for supporting the substrate provided at intervals in the circumferential direction... quartz plates 3a and 3b are integrally mounted on both longitudinal ends thereof. It is set up and configured.

支柱3C・・・それぞれには、長手方向に微小ピッチで
基板挿入溝(図示せず)が形成され、基板Wの手内部分
を挿入して三点で支持できるように構成されている。
Each of the pillars 3C has substrate insertion grooves (not shown) formed at minute pitches in the longitudinal direction, and is configured such that the inner portion of the substrate W can be inserted and supported at three points.

一方(図面上で下方側)の板体3a側には、支柱14・
・・に断熱板15・・・を取り付けた断熱支持部材16
が設けられている。
On one side (lower side in the drawing) of the plate body 3a, there is a column 14.
A heat insulating support member 16 with a heat insulating plate 15 attached to...
is provided.

図中、17は昇降支持アームを示し、この昇降支持アー
ム17を駆動昇降することによって炉口を閉じる炉口キ
ャップ11を保持し、その炉口キャップ11上に支持さ
れた基板ボート3を昇降して炉芯管1に挿脱するように
構成されている。
In the figure, reference numeral 17 indicates an elevating support arm, and by driving the elevating support arm 17 up and down, it holds the furnace opening cap 11 that closes the furnace opening, and lifts and lowers the substrate boat 3 supported on the furnace opening cap 11. It is configured so that it can be inserted into and removed from the furnace core tube 1.

に   の   に  る 負Ll 第4図は、第2実施例の要部の拡大縦断面図であり、内
側筒体7と外側筒体8との間の空間内で排気口9とリン
グ状吸気口20との間、すなわち、かかる空間内で排気
口9と内側筒体7の下端との間において、排気口9側の
外側筒体8の内周面に環状で等幅の第1の邪魔板13a
が取り付けられるとともに、その下方側の内側筒体7の
外周面に、環状で等幅の第2の邪魔板13bが取り付け
られ、そして、第1の邪魔板13aの内径が内側筒体7
の外径より大きく、かつ、第2の邪魔板13bの外径よ
りも小さい径に構成され、排気口9に向かう排気流路を
ジグザグ状の流路Rに形成し、第1の邪魔板13aによ
って、排気口9からの吸引排気力を内外の筒体7.8の
周方向に分散し、更に、その分散された吸引排気力を第
2の邪魔板13bによって内外の筒体7,8の周方向に
分散し、周方向において差の無い状態で、内側筒体7の
下方開放端のリング状の吸気口20の周方向全長にわた
って吸引排気力を付与できるようになっている。
Figure 4 is an enlarged vertical sectional view of the main part of the second embodiment, showing an exhaust port 9 and a ring-shaped intake port in the space between the inner cylinder 7 and the outer cylinder 8. 20, that is, between the exhaust port 9 and the lower end of the inner cylinder 7 in this space, an annular and equal width first baffle plate is provided on the inner peripheral surface of the outer cylinder 8 on the exhaust port 9 side. 13a
is attached, and a second annular baffle plate 13b having the same width is attached to the outer peripheral surface of the inner cylindrical body 7 on the lower side, and the inner diameter of the first baffle plate 13a is equal to the inner diameter of the inner cylindrical body 7.
is larger than the outer diameter of the second baffle plate 13b and smaller than the outer diameter of the second baffle plate 13b. This disperses the suction and exhaust force from the exhaust port 9 in the circumferential direction of the inner and outer cylinders 7 and 8, and further distributes the dispersed suction and exhaust force between the inner and outer cylinders 7 and 8 by the second baffle plate 13b. Suction and exhaust force can be applied over the entire circumferential length of the ring-shaped intake port 20 at the lower open end of the inner cylindrical body 7 in a state where it is distributed in the circumferential direction and there is no difference in the circumferential direction.

この第2実施例において、前述した第1実施例の、偏心
した開口を有する邪魔板を用いても良い。
In this second embodiment, the baffle plate having the eccentric opening of the first embodiment described above may be used.

次に、前述第1実施例に基づいて行った排気流について
の考察結果を説明する。
Next, the results of consideration regarding the exhaust flow based on the first embodiment described above will be explained.

比較例としては、第1実施例のものから、邪魔板13を
無くしたものに基づいた。
The comparative example was based on the first embodiment without the baffle plate 13.

上記第1実施例および比較例のいずれにおいても、ガス
導入孔2からパージガスとしてN!ガスを1.2nf/
hour、排気口9からの排気量を1.OnI/hou
rの割合で流すと設定し、炉芯管lの内周面の直径を2
00mとして空力学的演算に基づくシミュレーションに
より速度ヘクトルのプロフィールの予測を試みた。
In both the first embodiment and the comparative example, N! is used as the purge gas from the gas introduction hole 2! gas at 1.2nf/
hour, the exhaust amount from the exhaust port 9 is 1. OnI/hou
It is set to flow at a rate of r, and the diameter of the inner peripheral surface of the furnace core tube l is set to 2.
An attempt was made to predict the profile of the velocity in hectors by simulation based on aerodynamic calculations.

第5図は、第3図においてA−A線で示す部分に相当す
る箇所でのプロフィールを示し、(a)が第1実施例の
ものを、(b)が比較例のものをそれぞれ示し、また、
第6図は、第3図においてB−B線で示す部分に相当す
る箇所でのプロフィールを示し、(a)が第1実施例の
ものを、(b)が比較例のものをそれぞれ示し、そして
、第7図は、第3図においてC−C線で示す部分に相当
する箇所でのプロフィールを示し、(a)が第1実施例
のものを、(b)が比較例のものをそれぞれ示している
FIG. 5 shows the profile at a location corresponding to the part indicated by line A-A in FIG. 3, where (a) shows the profile of the first example, and (b) shows the profile of the comparative example. Also,
FIG. 6 shows the profile at a location corresponding to the portion shown by line B-B in FIG. 3, where (a) shows the profile of the first example, and (b) shows the profile of the comparative example. FIG. 7 shows the profile at a location corresponding to the portion shown by line C-C in FIG. 3, with (a) showing the profile of the first example and (b) showing the profile of the comparative example. It shows.

上記プロフィールにおいて、炉芯管1の内部に連なる内
側筒体7の内部側に相当する箇所では、図面上で下方側
に向かう程排気速度が高速であることを示し、一方、内
側筒体7の外周面と外側筒体8の内周面との間に相当す
る箇所では、図面上で上方側に向かう程排気速度が高速
であることを示している。
In the above profile, at a location corresponding to the inside of the inner cylindrical body 7 connected to the inside of the furnace core tube 1, the exhaust speed is higher toward the lower side in the drawing. At a location corresponding to the outer peripheral surface and the inner peripheral surface of the outer cylindrical body 8, it is shown that the exhaust speed increases as it goes upward in the drawing.

これらの結果から、比較例のものでは、内側筒体7の外
周面と外側筒体8の内周面との間に相当する箇所での速
度において、排気口9に近い側と遠い側とで大きな差が
あり、そのために排気口9に対して遠い側の内側筒体7
の内周面近くで負圧を生じ、第6図の(b)や第7図の
(b)で見られるように、内側筒体7の内部側に相当す
る箇所の速度が、内側筒体7の内周面側において開口側
とは反対方向に向かう内向き流れになっており、炉芯管
1内に外気が侵入しやすくなっている。これに対して、
第1実施例のものでは、内側筒体7の外周面と外側筒体
8の内周面との間に相当する箇所での速度において、周
方向全長にわたって差が無く、また、内側筒体7の内部
側に相当する箇所の速度が開口側に向かう外向き流れに
なっており、炉芯管1内への外気の侵入を良好に防止で
きていることが明らかであった。
From these results, in the comparative example, at the speed at a location corresponding to the outer circumferential surface of the inner cylinder 7 and the inner circumferential surface of the outer cylinder 8, the difference between the side closer to the exhaust port 9 and the side farther from the exhaust port 9 is determined. There is a large difference, and therefore the inner cylinder 7 on the far side from the exhaust port 9
Negative pressure is generated near the inner circumferential surface of the inner cylinder 7, and as shown in FIG. 6(b) and FIG. 7(b), the velocity at the part corresponding to the inside of the inner cylinder On the inner peripheral surface side of the furnace tube 7, the flow is inward in the opposite direction to the opening side, and outside air easily enters the furnace core tube 1. On the contrary,
In the first embodiment, there is no difference in speed between the outer peripheral surface of the inner cylinder 7 and the inner peripheral surface of the outer cylinder 8 over the entire length in the circumferential direction, and the inner cylinder 7 It was clear that the velocity at the portion corresponding to the inside of the furnace was an outward flow toward the opening side, and that the intrusion of outside air into the furnace core tube 1 could be effectively prevented.

上記実施例では、縦型タイプの基板用熱処理装置につい
て説明したが、本発明としては、横型タイプの基板用熱
処理装置にも適用できる。
In the above embodiment, a vertical type substrate heat treatment apparatus has been described, but the present invention can also be applied to a horizontal type substrate heat treatment apparatus.

また、ガス導入孔2の位置としては、炉芯管lの管軸芯
方向の開口4とは反対側の端部に設けるものに限らず、
炉芯管1の管軸芯方向の途中箇所に設けるタイプのもの
にも適用できる。
Further, the position of the gas introduction hole 2 is not limited to the one provided at the end of the furnace core tube l opposite to the opening 4 in the tube axis direction.
It can also be applied to a type that is provided in the middle of the furnace core tube 1 in the tube axis direction.

〈発明の効果〉 以上説明したように、請求項第(1)項の発明に係る基
板用熱処理袋!によれば、炉芯管の管軸芯に対して偏心
した開口を有する円形環状の邪魔板を、外側筒体の内周
面、または、内側筒体の外周面に所定の姿勢で取り付け
ることにより、炉芯管から遠い端部側の全周において、
炉芯管内から排出されるガスに付与する吸引排気力を均
一化するから、排気口側に偏って排気されることが無く
、排気に伴う負圧発生を防止でき、炉芯管内への外気の
侵入を阻止でき、熱処理時において、酸素供給量の制御
を適正に行って酸化やCVDプロセスなどを良好に行う
ことができ、品質を向上できるとともに製品歩留りを高
くできるようになった。
<Effects of the Invention> As explained above, the heat treatment bag for substrates according to the invention of claim (1)! According to the above, by attaching a circular annular baffle plate having an opening eccentric to the tube axis of the furnace core tube to the inner circumferential surface of the outer cylinder or the outer circumferential surface of the inner cylinder in a predetermined posture, , on the entire circumference of the end far from the furnace core tube,
Since the suction and exhaust force applied to the gas discharged from the furnace core tube is made uniform, the exhaust is not biased towards the exhaust port side, preventing the generation of negative pressure due to exhaust, and reducing the flow of outside air into the furnace core tube. Invasion can be prevented, and during heat treatment, the amount of oxygen supplied can be appropriately controlled to perform oxidation and CVD processes favorably, improving quality and increasing product yield.

しかも、少な(とも−枚の邪魔板を設けるだけで吸引排
気力を均一化でき、構成上簡単にできる。
Moreover, the suction and exhaust force can be made uniform by simply providing a small number of baffle plates, making the structure simple.

また、請求項第(2)項の発明に係る基板用熱処理装置
によれば、邪魔板によって吸引排気力を分散し、炉芯管
から遠い端部側の全周において、炉芯管内から排出され
るガスに付与する吸引排気力に差が生じることを抑える
から、排気口側に偏って排気されることが無く、排気に
伴う負圧発生を防止でき、炉芯管内への外気の取込みを
回避でき、熱処理時において、酸素供給量の制御を適正
に行って酸化やCVDプロセスなどを良好に行うことが
でき、品質を向上できるとともに製品歩留りを高くでき
るようになった。
Further, according to the substrate heat treatment apparatus according to the invention of claim (2), the suction and exhaust force is dispersed by the baffle plate, and the suction and exhaust force is dispersed from the inside of the furnace core tube around the entire circumference of the end side far from the furnace core tube. This suppresses the difference in the suction and exhaust force applied to the gas, which prevents exhaust from being concentrated toward the exhaust port, prevents the generation of negative pressure due to exhaust, and avoids the intake of outside air into the furnace core tube. During heat treatment, the amount of oxygen supplied can be appropriately controlled to perform oxidation and CVD processes favorably, thereby improving quality and increasing product yield.

【図面の簡単な説明】[Brief explanation of drawings]

図面は、本発明に係る基板用熱処理装置の実施例を示し
、第1図は第1実施例の縦断面図、第2図は要部の拡大
縦断面図、第3図は、第2図の■■綿線−切欠矢視図、
第4図は第2実施例の要部の拡大縦断面図、第5図、第
6図および第7図は、それぞれ第1実施例と比較例の排
気流の速度プロフィールを示す図である。 1・・・炉芯管      2・・・ガス導入孔3・・
・基板ボート    4・・・開口5・・・加熱手段 
    7・・・内側筒体8・・・外側筒体     
9・・・排気口12・・・偏心した開口  13・・・
邪魔板13a・・・第1の邪魔板 13b・・・第2の
邪魔板20・・・リング状吸気口  L・・・間隔R・
・・ジグザグ状の流路 W・・・基板出願人 大日本ス
クリーン製造株式会社代理人 弁理士  杉  谷  
  勉第 図 第 図 Bコ 第 図 第 図 (a) (b) 図 (a) (b) (a) 第 図 (b)
The drawings show an embodiment of the substrate heat treatment apparatus according to the present invention, FIG. 1 is a longitudinal sectional view of the first embodiment, FIG. 2 is an enlarged longitudinal sectional view of the main part, and FIG. ■■ Cotton wire - notch arrow view,
FIG. 4 is an enlarged longitudinal sectional view of the main part of the second embodiment, and FIGS. 5, 6, and 7 are diagrams showing velocity profiles of the exhaust flow in the first embodiment and the comparative example, respectively. 1...Furnace core tube 2...Gas introduction hole 3...
・Substrate boat 4...Opening 5...Heating means
7... Inner cylindrical body 8... Outer cylindrical body
9...Exhaust port 12...Eccentric opening 13...
Baffle plate 13a... First baffle plate 13b... Second baffle plate 20... Ring-shaped intake port L... Spacing R.
... Zigzag-shaped flow path W ... Substrate applicant Dainippon Screen Mfg. Co., Ltd. agent Patent attorney Sugitani
Figure (a) (b) Figure (a) (b) (a) Figure (b)

Claims (2)

【特許請求の範囲】[Claims] (1)周囲に加熱手段を設けた炉芯管にガス導入孔を設
けるとともに、前記炉芯管の管軸芯方向一端側に基板を
保持した基板ボートを挿脱する開口を設け、 前記炉芯管の前記開口側端部に内側筒体を設け、内側筒
体の炉芯管から遠い方の端部の半径方向外側を周回する
リング状の吸気口を形成するように内側筒体の外周に外
側筒体を設け、 外側筒体に排気口を開設して排気手段に連通し、排気口
を経て外側筒体と内側筒体との間の空間内を排気するこ
とによりリング状の吸気口から吸気するようにした基板
用熱処理装置において、内側筒体と外側筒体との間の空
間内で、排気口とリング状吸気口との間に、外縁または
内縁が偏心したリング状偏心板を、このリング状偏心板
と内側筒体または外側筒体との間に形成される隙間の間
隔が排気口に近い側程小さくなるように取付けることを
特徴とする基板用熱処理装置。
(1) A gas introduction hole is provided in a furnace core tube around which a heating means is provided, and an opening for inserting and removing a substrate boat holding a substrate is provided at one end of the furnace core tube in the tube axis direction, and the furnace core An inner cylindrical body is provided at the open end of the tube, and an inner cylindrical body is provided on the outer periphery of the inner cylindrical body so as to form a ring-shaped intake port that goes around the radially outer side of the end of the inner cylindrical body that is far from the furnace core tube. An outer cylindrical body is provided, an exhaust port is provided in the outer cylindrical body to communicate with the exhaust means, and the space between the outer cylindrical body and the inner cylindrical body is exhausted through the exhaust port, and air is discharged from the ring-shaped intake port. In a substrate heat treatment apparatus configured to take in air, a ring-shaped eccentric plate with an eccentric outer edge or an eccentric inner edge is disposed between an exhaust port and a ring-shaped intake port in a space between an inner cylinder and an outer cylinder. A heat treatment apparatus for substrates, characterized in that the ring-shaped eccentric plate is installed so that the gap formed between the inner cylinder or the outer cylinder becomes smaller as the side closer to the exhaust port approaches.
(2)周囲に加熱手段を設けた炉芯管にガス導入孔を設
けるとともに、前記炉芯管の管軸芯方向一端側に基板を
保持した基板ボートを挿脱する開口を設け、 前記炉芯管の前記開口側端部に内側筒体を設け、内側筒
体の炉芯管から遠い方の端部の半径方向外側を周回する
リング状の吸気口を形成するように内側筒体の外周に外
側筒体を設け、 外側筒体に排気口を開設して排気手段に連通し、排気口
を経て外側筒体と内側筒体との間の空間内を排気するこ
とによりリング状の吸気口から吸気するようにした基板
用熱処理装置において、内側筒体と外側筒体との間の空
間内で、排気口とリング状吸気口との間に、外側筒体の
内周面から半径方向内側へ張り出す第1の邪魔板と、内
側筒体の外周面から第1の邪魔板との半径方向外側へ張
り出す第2の邪魔板とを設けることによって、内側筒体
と外側筒体との間の空間内にて前記排気口に向かう排気
流路をジグザグ状の流路に形成するようにしたことを特
徴とする基板用熱処理装置。
(2) A gas introduction hole is provided in a furnace core tube provided with a heating means around the furnace core tube, and an opening for inserting and removing a substrate boat holding a substrate is provided at one end of the furnace core tube in the tube axis direction, and the furnace core An inner cylindrical body is provided at the open end of the tube, and an inner cylindrical body is provided on the outer periphery of the inner cylindrical body so as to form a ring-shaped intake port that goes around the radially outer side of the end of the inner cylindrical body that is far from the furnace core tube. An outer cylindrical body is provided, an exhaust port is provided in the outer cylindrical body to communicate with the exhaust means, and the space between the outer cylindrical body and the inner cylindrical body is exhausted through the exhaust port, and air is discharged from the ring-shaped intake port. In a heat treatment apparatus for substrates configured to take in air, the air is drawn radially inward from the inner peripheral surface of the outer cylinder between the exhaust port and the ring-shaped intake port in the space between the inner cylinder and the outer cylinder. By providing a first baffle plate that extends out and a second baffle plate that extends outward in the radial direction from the outer peripheral surface of the inner cylinder body to the first baffle plate, the space between the inner cylinder body and the outer cylinder body is reduced. A heat treatment apparatus for a substrate, characterized in that an exhaust flow path toward the exhaust port is formed in a zigzag-like flow path within the space.
JP11152390A 1990-04-25 1990-04-25 Heat treatment device for substrate Pending JPH047834A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11152390A JPH047834A (en) 1990-04-25 1990-04-25 Heat treatment device for substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11152390A JPH047834A (en) 1990-04-25 1990-04-25 Heat treatment device for substrate

Publications (1)

Publication Number Publication Date
JPH047834A true JPH047834A (en) 1992-01-13

Family

ID=14563491

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11152390A Pending JPH047834A (en) 1990-04-25 1990-04-25 Heat treatment device for substrate

Country Status (1)

Country Link
JP (1) JPH047834A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010182957A (en) * 2009-02-06 2010-08-19 Seiko Instruments Inc Semiconductor device manufacturing method, semiconductor device, and semiconductor manufacturing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010182957A (en) * 2009-02-06 2010-08-19 Seiko Instruments Inc Semiconductor device manufacturing method, semiconductor device, and semiconductor manufacturing device

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