JPH0478003B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to reactors such as chemical vapor deposition (CVD) devices.

For example, the first reactor of a conventional CVD equipment
There is something like the one shown in the figure.

This reactor 1 consists of a main body 2 which is a cylindrical body with an open top, a bell gear 3 which is removably covered on the top of the main body 2, a support 4 which is erected at the center of the main body 2 which is a reactor core, and An intermediate base 5 supported horizontally on a column 4, a buffer 7 detachably supported on the upper end of a stand 6 erected on the base, and a main body 2.
A turntable 8 is installed to revolve on the bottom surface of the turntable 8, a plurality of support shafts 9 are supported perpendicularly to the turntable 8 so as to rotate, and a wafer 11 is fixed to the upper end of each shaft 9. Susceptor 1 to hold
0, a ring-shaped heater cover 13 supported by a plurality of support shafts 12 different from the support shaft 9, and having a plurality of through holes 14 that fit so as to surround the susceptor 10, and a lower part of the heater cover 13. The heater 15 is generally constructed of a heater 15 arranged in an annular manner.

Then, each susceptor 10 rotates while rotating the main body 2.
It revolves around the reactor core between the inner circumferential wall of the buffer 7 and the outer edge of the buffer 7, and this rotation ensures a homogeneous CVD reaction on the wafer 11 on the susceptor 10. Further, in order to promote this CVD reaction, the wafer 11 is heated from below the susceptor 10 by a heater 15, and a heater cover 13 is placed between the susceptor 10 and the susceptor 10 so that this heating is performed effectively and the reaction gas does not escape downward. surrounding the outside of

By the way, the conventional heater cover 13 in the reactor is deformed (warped into a dish shape) due to thermal expansion.
In order to avoid this, the ring is formed by arranging a plurality of arcuate pieces 16 in an annular shape, as shown in FIG.

However, in such a conventional heater cover, the mounting holes 17 for mounting each piece 16 to the support shaft 12 are set to have a slightly larger diameter to provide a margin for mounting. When the piece 16 is fitted to the support shaft 12 and the piece 16 is attached, the adjacent pieces 16, 1
6 may approach or separate from each other, resulting in a large gap 18 being formed in the entire ring-shaped heater cover. When such a gap is created, the heat from the heater escapes upward and the reaction gas escapes downward, impairing a homogeneous CVD reaction. In addition, in order to avoid the formation of such gaps, it is necessary to pay excessive attention to the assembly work, and this assembly work is performed frequently every time the furnace is cleaned, resulting in a decrease in productivity. do.

SUMMARY OF THE INVENTION An object of the present invention is to eliminate the drawbacks of the prior art and provide a reactor equipped with a heater cover that can prevent thermal deformation without creating large gaps.

The present invention will be described below with reference to embodiments shown in the drawings.

FIG. 3 shows a first embodiment of the reactor according to the present invention.
FIG. 3 is a plan view of a state in which a bell gear 3 is attached, which is shown when applied to the general CVD apparatus described with reference to the figures.

In this embodiment, the heater cover 20 is integrally formed into a ring shape from a material such as a heat-resistant metal, and the cover 20 has grooves 21 as notches at appropriate intervals on the inner and outer edges of the ring. Each is formed radially. Further, a predetermined number of through holes 14 for fitting the susceptor 10 are arranged in a ring shape at equal intervals between the inner and outer edges of the cover 20, and the holes 14 are arranged in a ring at equal intervals. A suitable number of mounting holes 17 to the support shaft are drilled.

In the reactor equipped with the heater cover 20 according to the above configuration, when the heater cover 20 is heated by the heater, the temperature is high on the back side near the heat source, and the temperature is low on the front side (outer periphery) far from the heat source. In addition to stretching in the circumferential direction, it also tries to warp from the back side to the front side. However, the heater cover 20 of this embodiment
Since the cut grooves 21 are radially formed on the inner and outer edges of the steel sheet, this warping deformation is absorbed by the cut grooves 21, and no warping due to thermal deformation occurs.

According to this embodiment, thermal deformation can be prevented even if the heater cover is integrally molded, so there is no need to make the heater cover have a split structure.
Manufacturing becomes easier, the assembly work to the reactor becomes easier in terms of positioning, etc., and monitoring of the positional shift of the heater cover can be omitted, and productivity can be improved. Furthermore, it does not have a structure that prevents thermal deformation by reducing the expansion coefficient.
It is possible to integrally mold the heater cover from an easily available material such as metal without using a quartz plate or the like which is easily damaged, which is economically advantageous. Further, since the heater cover is an integrally molded product, large gaps due to assembly errors will not occur, and leakage of heat and gas can be prevented from occurring.

Note that in FIG. 3, for convenience, the kerf 21 as a notch is shown to have a relatively large width, but the kerf 2
1 should be as small as possible within a range that can absorb and prevent thermal deformation. This is because if it is too large, heat and gas leakage will occur.

Further, the notch is not limited to the cut groove 21 in the above embodiment, but in FIGS. 4 and 5, the grooves 22 and 2 with the bottom are
3 is fine. These grooves 22 and 23 can also sufficiently absorb thermal deformation and prevent warping, and in the case of these grooves 22 and 23, there is no gap that communicates the upper and lower spaces, so that There is also no risk of heat or gas leaks. Incidentally, the groove 22 shown in FIG. 4 is inclined so that the bottom becomes deeper from the inner edge to the outer edge, and the groove 23 shown in FIG. 5 is formed to have a constant depth at the bottom.

Note that the present invention is not limited to reactors of CVD equipment;
It can be applied to general reaction furnaces such as vacuum evaporation equipment, epitaxial equipment, and dry etching equipment.

As described above, according to the present invention, it is possible to prevent thermal deformation of the heater cover, and also to prevent the generation of gaps in the heater cover.

[Brief explanation of drawings]

Figure 1 is a longitudinal cross-sectional view of a typical CVD device.
FIG. 2 is a plan view showing a conventional heater cover, FIG. 3 is a plan view showing an embodiment of the reactor according to the present invention, and FIGS. 4 and 5 are parts showing modified examples of the notch. FIG. 1...Reactor, 2...Main body, 3...Berjia,
4... Strut, 5... Intermediate base, 6... Stand, 7... Bumper, 8... Turntable, 9
... Support shaft, 10 ... Susceptor, 11 ... Wafer, 12 ... Support shaft, 14 ... Through hole, 15 ... Heater, 20 ... Heater cover, 21 ... Cut groove, 2
2, 23... Bottom groove.

Claims (1)

[Claims] 1. In a reactor in which a plurality of reactant susceptors revolving around the reactor core are arranged in a ring shape in a ring-shaped heater cover and are respectively positioned in a plurality of through holes formed, the heater cover is integrally molded and , a plurality of cut grooves protruding from each of an outer edge and an inner edge of the heater cover and facing each other are formed radially between the plurality of through holes of the ring-shaped heater cover along the ring shape of the heater cover. reactor.